Patents Issued in April 1, 2003
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Patent number: 6541145Abstract: An improved flow field design for a flow field plate comprises fluid distribution channels having an average width W and separated by landings in which the channels are configured such that unsupported rectangular surfaces of length L and width W on an adjacent fluid diffusion layer have a ratio L/W less than about 3. Improved support may be obtained for instance by using sinusoidally shaped channels. Certain fluid diffusion layer embodiments offer desirable characteristics (for example, low cost, thickness) for use in fuel cells but may also be undesirably weak mechanically and consequently will benefit from improved mechanical support from adjacent flow field plates comprising the present flow field design.Type: GrantFiled: December 28, 2000Date of Patent: April 1, 2003Assignee: Ballard Power Systems, Inc.Inventors: David Pentreath Wilkinson, Olen R. Vanderleeden, Joerg Zimmerman
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Patent number: 6541146Abstract: A composite sealant for in-situ sealing a fuel cell stack is provided. A paste of the sealant mixture is initially formed by mixing a glass precursor powder and a reacting filler material. The sealant mixture paste is applied to selected sealing locations of the fuel cell stack. The sealant mixture paste is then transformed into a composite sealant material to seal the selected sealing locations by heat treatment in air to about 900° C. The composite sealant material comprises a glass matrix phase and a reinforcing phase including a plurality of interlocked elongated single crystal grains. The reacting fillers modify the CTE and significantly improve the gap filling capacity of the composite sealant material and provide superior pressure containment capability at elevated temperatures.Type: GrantFiled: November 7, 2000Date of Patent: April 1, 2003Assignee: Hybrid Power Generation Systems, LLCInventors: Liang A. Xue, James Piascik, Jean Yamanis
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Patent number: 6541147Abstract: A proton exchange membrane (PEM)-type fuel cell is formed from layered undulate MEA structures and separator plates alternating with each other in the stack dimension so that each layered MEA structure is disposed between and attached to an associated pair of separator plates so as to form at least one discrete conduit on each side of each layered MEA structure through which conduit reactant gas may be circulated. Each layered MEA structure is formed from proton exchange membrane material sandwiched between a pair of spaced-apart current collectors with electro-catalyst particles between the membrane material and each current collector so that the membrane material and electro-catalyst particles fill the space between the current collectors, forming together with the current collectors a layered MEA structure.Type: GrantFiled: April 9, 2001Date of Patent: April 1, 2003Assignee: Ballard Power Systems Inc.Inventors: Gerard Francis McLean, Jeremy Lindstrom
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Patent number: 6541148Abstract: A fuel cell system includes a fuel cell stack, a manifold and a hinge. The manifold forms a sealed interface to communicate reactants with the stack, and the hinge forms a pivotable connection between the stack and the manifold. The fuel cell system also includes at least one gas/water separator that is disposed in the manifold to collect water from one of the flows.Type: GrantFiled: October 31, 2000Date of Patent: April 1, 2003Assignee: Plug Power Inc.Inventors: Michael M. Walsh, James H. Kralick, Daniel F. Woolley
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Patent number: 6541149Abstract: Improved micro fuel cells suitable for portable electrical devices are provided, and processes for forming such cells. In one embodiment of the invention, silicon substrates are used both as the gas delivery structure for the fuel and the oxidant, and as the current collectors. Such use of silicon is advantageous in that it becomes possible both to utilize micromachining and lithographic techniques to form the desired structures, e.g., the gas delivery channels, and also to integrate the fuel cell with silicon-based control circuitry. Advantageously, the silicon substrates comprise both gas delivery tunnels and porous silicon gas diffusion regions formed over the tunnels in the surface of the substrate, i.e., the porous regions over the gas delivery tunnels are integral with the silicon substrate. In another embodiment of the invention, a monolithic structure is employed.Type: GrantFiled: February 29, 2000Date of Patent: April 1, 2003Assignee: Lucent Technologies Inc.Inventors: Helen Louise Maynard, Jeremy Patrick Meyers
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Patent number: 6541150Abstract: In order to improve gas permeability and electric conductivity, a solid polymer electrolyte fuel cell is so designed as to include an electrolyte 100 in the boom of an ion exchange membrane, a gas diffusion layer 110/120 arranged on each side of the electrolyte 100, and an electrode catalyst substance, dispersed in the gas diffusion layer 110/120.Type: GrantFiled: July 31, 2000Date of Patent: April 1, 2003Assignee: Aisin Seiki Kabushiki KaishaInventors: Gang Xie, Harumi Hashiguchi, Norio Nakaya, Atsushi Tomita
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Patent number: 6541151Abstract: A battery assembly system used for an electric vehicle having a configuration in which electrolyte is not released from an exhaust passage even if the electrolyte is released in a mist state from a cell. A battery assembly case is provided behind a rear seat in a cabin. An exhaust duct having a cooling fan is connected to the battery assembly case, and an air inlet port is provided to the battery assembly case at the side opposite to the portion where the exhaust duct is connected. As the cooling fan, a sirocco fan or an axial-flow fan is used. The air for forcibly cooling the battery assembly is allowed to flow in the cabin, the air inlet port, the battery assembly case, the exhaust duct, the cooling fan, and the exhaust duct in this order. A mist state electrolyte released from the cell together with the air is allowed to collide with and is attached to a cascade of the fan or the wall surface of the fan.Type: GrantFiled: March 30, 2001Date of Patent: April 1, 2003Assignees: Matsushita Electric Industrial Co., Ltd., Toyota Jidosha Kabushiki KaishaInventors: Keiichi Minamiura, Toshiaki Nakanishi
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Patent number: 6541152Abstract: In the process of manufacturing a cylindrical battery, when a tubular separator (3) and bottom separator (5) are inserted into a battery casing (1) in which are accommodated positive electrode mixture pellets (2), by inserting the bottom separator (5) such that it is pushed into the battery casing (1) at the leading end of the tubular separator (3), the peripheral portion of the bottom separator (5) is raised up, so that both separators (3,5) are inserted into the battery casing (1) in a condition with the leading end of the tubular separator (3) surrounded from the outside by this peripheral raised-up portion.Type: GrantFiled: November 30, 2000Date of Patent: April 1, 2003Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Yasuhiko Shoji, Seiji Wada, Shigeto Noya, Tadahiro Sawada, Takayuki Aoi, Minoru Koda, Saburo Nakatsuka, Tsutomu Moriwaki
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Patent number: 6541153Abstract: An electrical power generator includes a plastic cylindrical case that has an interior divided into a plurality of chambers. A copper electrode and a zinc electrode are disposed within each of the chambers. The copper electrodes have a positive electromotive force. The zinc electrodes have a negative electromotive force. The electrodes are in a circuit arrangement that has a negative terminal and a positive terminal. The negative output and a positive output terminals are respectively connected to the positive and negative outputs of the generator.Type: GrantFiled: February 28, 2001Date of Patent: April 1, 2003Inventor: Iradj Hessabi
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Patent number: 6541154Abstract: A multi-cell structure battery (1A) comprising: a plurality of columnar cells accommodated in a casing (11); bus bars (23A, 23B) to connect respective terminals of the cells; signal transmitting wires (16) to connect the respective cells to an external device; a cell holder (12) to hold the cells; and a covering (13) fixed to the cell holder so as to oppose against the terminals of the cells, the bus bars being disposed on an inner surface of the covering opposed to the terminals of the cells and the signal transmitting wires being disposed in an outer surface of the covering.Type: GrantFiled: March 13, 2001Date of Patent: April 1, 2003Assignees: Nissan Motor Co., Ltd., Shin-Kobe Electric Machinery Co., Ltd.Inventors: Etsuo Oogami, Tatsuo Horiba
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Patent number: 6541155Abstract: In one implementation, a bicell battery apparatus includes first and second counter electrodes and an intermediate electrode positioned therebetween. Respective end edges of the first and second counter electrodes are received outwardly beyond a respective end edge of the intermediate electrode at a region. A current collector extension extends from one of the end edges of the intermediate electrode within the region and extends outwardly beyond the respective end edges of the first and second counter electrodes within the region. A first substantially electrolyte impermeable insulative layer is received between the current collector extension and the first counter electrode. A second substantially electrolyte impermeable insulative layer is received between the current collector extension and the second counter electrode.Type: GrantFiled: December 21, 2000Date of Patent: April 1, 2003Assignee: Valence Technology, Inc.Inventors: Wade W. Guindy, David Irwin
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Patent number: 6541156Abstract: The present invention relates to a negative electrode material for a non-aqueous lithium secondary battery comprising a metal material M consisting of solid phases A and B, a graphite material, and a carbonaceous material having a crystallinity lower than that of said graphite material, wherein said metal material M has a structure in which a part or all of the surface of a core particle consisting of said solid phase A is covered with said solid phase B; said solid phase A contains at least silicon as a constitutive element; and said solid phase B is a solid solution or an intermetallic compound of silicon and a specific element.Type: GrantFiled: November 15, 2000Date of Patent: April 1, 2003Assignees: Mitsubishi Chemical Corporation, Matsushita Electric IndustrialInventors: Tooru Fuse, Hideharu Satou, Keiko Nishioka, Shinji Kasamatsu, Yoshiaki Nitta
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Patent number: 6541157Abstract: It is intended to provide a nonaqueous electrolyte battery that satisfies both of a large discharge capacity and a superior cycle life characteristic by developing a novel negative electrode material. A nonaqueous electrolyte battery uses a negative electrode active material that is a compound expressed by Formula (1): AzMXy (1) where A is at least one element selected from the alkali metals, M is at least one element selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Ru, Rh, Pd, Os, Ir, Pt, and Mg, X is at least one element selected from the group consisting of B, N, Al, Si, P, Ga, Ge, As, In, Sn, Sb, Pb, and Bi, 0≦z≦20, and 0.2≦y≦6.Type: GrantFiled: August 9, 2000Date of Patent: April 1, 2003Assignee: Kabushiki Kaisha ToshibaInventors: Hiroki Inagaki, Norio Takami, Tatsuoki Kohno, Tomokazu Morita
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Patent number: 6541158Abstract: Cobalt-based alloys are provided for use as a positive electrode current collector in a solid cathode, nonaqueous liquid electrolyte, alkali metal anode active electrochemical cell. The cobalt-based alloys are characterized by chemical compatibility with aggressive cell environments, high corrosion resistance and resistance to fluorination and passivation at elevated temperatures, thus improving the longevity and performance of the electrochemical cell. The cell can be of either a primary or a secondary configuration.Type: GrantFiled: July 12, 2001Date of Patent: April 1, 2003Assignee: Wilson Greatbatch Ltd.Inventors: Christine A. Frysz, Sally Ann Smesko, Peter A. Kreidler, W. Richard Brown, Esther S. Takeuchi
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Patent number: 6541159Abstract: A solid-state hydroxide (OH−) conductive membrane provides up to five times higher ionic conductivity and surface oxygen exchange rate than conventional MIEC membranes, while operating at significantly lower temperatures and providing reduced overall system cost. The hydroxide conductive membrane utilizes a porous ceramic backbone, pores of which are injected with an electrolyte. A catalyst is provided as discrete layers disposed at the anode and cathode. The membrane of the present invention may be utilized in combination with an external voltage source to drive the oxygen generating reaction. Alternatively, the pores may be metallized and a pressure gradient utilized to drive the reaction. The membrane thus provides discrete materials to provide ionic conduction, electronic conduction, and structural support.Type: GrantFiled: August 12, 1999Date of Patent: April 1, 2003Assignee: Reveo, Inc.Inventors: Lin-Feng Li, Wayne Yao, Muguo Chen
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Patent number: 6541160Abstract: A battery separator for use in a zinc-based battery containing sulfide ions is employed to minimize copper ion diffusion into the electrodes by placing a regenerated cellulose separator next to the copper-containing layer containing low solubility sulfide salts and precipitating the copper ions.Type: GrantFiled: April 19, 2001Date of Patent: April 1, 2003Assignee: Zinc Matrix Power, Inc.Inventors: Michael Cheiky, Wilson Hago
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Patent number: 6541161Abstract: An electrolyte for an electrochemical cell consisting of a di-lithium phthalocyanine.Type: GrantFiled: September 10, 2001Date of Patent: April 1, 2003Assignee: The United States of America as represented by the Secretary of the Air ForceInventor: Lawrence G. Scanlon, Jr.
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Patent number: 6541162Abstract: An electrolyte for a rechargeable lithium battery is provided. The electrolyte includes a non-aqueous organic solvent and a lithium salt. The non aqueous organic solvent includes cyclic carbonate such as ethylene carbonate and propylene carbonate, chain carbonate such as dimethyl carbonate, diethyl carbonate, methyl ethyl carbonate and methyl propyl carbonate, and alkyl acetate such as n-methyl acetate, n-ethyl acetate and n-propyl acetate. The electrolyte can be used in a rechargeable lithium battery to provide good low temperature characteristics and safety.Type: GrantFiled: December 16, 1999Date of Patent: April 1, 2003Assignee: Samsung SDI Co., Ltd.Inventors: Eui-Hwan Song, Sergey V. Sazhin, Mikhail Yu Khimchenko, Yevgeniy N. Tritenichenko
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Patent number: 6541163Abstract: The invention relates to a process for making medicated bath powder from natural plants. The process comprises multiple cycles of extraction with heating; combining the resulting extracts and concentrating, freezing drying or spraying drying them to form a drug powder, which then mixed with the volatile oils obtained from the first extraction. The active components of these natural plants can be effectively preserved in the medicated bath powder of the present invention.Type: GrantFiled: January 23, 2001Date of Patent: April 1, 2003Assignee: Tibet Yutuo Institute of Tibetan MedicineInventor: Jufang Lei
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Patent number: 6541164Abstract: A method for etching and removing an anti-reflective coating from a substrate. The method comprises providing a substrate supporting a conductive layer (a tungsten-silicide layer) having an anti-reflective coating (e.g., a dielectric anti-reflective coating) disposed thereon. The anti-reflective coating is etched with an etchant gas consisting of NF3 and Cl2 to break through and to remove at least a portion of the anti-reflective coating to expose at least part of the conductive layer. The conductive layer is subsequently etched with the etchant gas to produce an anti-reflective coating gate structure which is used in semiconductor integrated circuits containing transistors.Type: GrantFiled: February 12, 1998Date of Patent: April 1, 2003Assignee: Applied Materials, Inc.Inventors: Ajay Kumar, Jeffrey Chinn
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Patent number: 6541165Abstract: Techniques are provided for extending the use of phase shift techniques to implementation of masks used for complex layouts in the layers of integrated circuits, beyond selected critical dimension features such as transistor gates to which such structures have been limited in the past. The method includes identifying features for which phase shifting can be applied, automatically mapping the phase shifting regions for implementation of such features, resolving phase conflicts which might occur according to a given design rule, and application of sub-resolution assist features within phase shift regions and optical proximity correction features to phase shift regions. Both opaque field phase shift masks and complementary binary masks defining interconnect structures and other types of structures that are not defined using phase shifting, necessary for completion of the layout of the layer are produced.Type: GrantFiled: September 26, 2000Date of Patent: April 1, 2003Assignee: Numerical Technologies, Inc.Inventor: Christophe Pierrat
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Patent number: 6541166Abstract: The present invention relates generally to a method for lithographically printing a mask pattern on a substrate, in particular a semiconductor substrate, wherein the mask pattern includes features with diverse pitches. These features may include device features such as vias or contact holes and lines in integrated circuits. The method comprises splitting the mask pattern into a plurality of masks, wherein one or more of the masks contains relatively tightly nested features and one or more of the masks contains relatively isolated features. Each of the plurality of masks is then successively exposed on a photoresist layer on the substrate. For each exposure, the exposure conditions, photoresist layer, other thin films layers, etching process, mask writing process, and/or mask pattern bias may be optimized for the tightly nested feature pattern or isolated feature pattern.Type: GrantFiled: January 18, 2001Date of Patent: April 1, 2003Assignee: International Business Machines CorporationInventors: Scott M. Mansfield, Timothy A. Brunner, James A. Culp, Alfred K. Wong
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Patent number: 6541167Abstract: Method for utilizing halftoning structures to manipulate the relative magnitudes of diffraction orders to ultimately construct the desired projected-image. At the resolution limit of the mask maker, this is especially useful for converting strongly shifted, no-0th-diffraction-order, equal-line-and-space chromeless phase edges to weak phase-shifters that have some 0th order. Halftoning creates an imbalance in the electric field between the shifted regions, and therefore results in the introduction of the 0th diffraction order.Type: GrantFiled: April 24, 2001Date of Patent: April 1, 2003Assignee: ASML Masktools Netherlands B.V.Inventors: John S. Petersen, Jang Fung Chen
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Patent number: 6541168Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.Type: GrantFiled: April 24, 2001Date of Patent: April 1, 2003Assignee: Corning IncorporatedInventors: John T. Brown, Stephen C. Currie, Lisa A. Moore, Susan L. Schiefelbein, Robert S. Pavlik, Jr.
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Patent number: 6541169Abstract: Methods and apparatus are provided for performing charged-particle-beam microlithography at improved accuracy. A pattern is formed on a substrate (wafer) by repeated shot exposure of respective areas on a wafer substrate mounted on a wafer stage. Exposure of the wafer is made while the wafer stage is undergoing continuous motion and the charged particle beam making the exposure is being deflected continuously. As the magnitude of the beam deflection changes according to the motion of the stage, correction data for deflecting the beam are updated appropriately so as to correct deflection aberrations continuously.Type: GrantFiled: August 11, 2000Date of Patent: April 1, 2003Assignee: Nikon CorporationInventors: Teruaki Okino, Shinichi Kojima
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Patent number: 6541170Abstract: Before forming a resist pattern, the light reflectivity of the undercoat of the wafer is measured by a reflectivity measuring unit. The conditions are controlled according to the measured reflectivity when forming the resist pattern. The conditions when forming the resist pattern are the rotation speed when supplying the resist solution while rotating the wafer inside the resist coating unit, the exposure time in the exposing unit, the developing time in the developing unit, and so forth. Thus, by controlling the conditions when forming the resist pattern according to the light reflectivity of the wafer's undercoat, a highly fine control of the line width of the resist pattern is made possible.Type: GrantFiled: June 19, 2001Date of Patent: April 1, 2003Assignee: Tokyo Electron LimitedInventors: Yuji Fukuda, Kunie Ogata
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Patent number: 6541171Abstract: A photoconductive sleeved primary image-forming member roller for use in an electrophotographic machine comprising a central member including a rigid cylindrical core member and a compliant layer formed on the core member; and a flexible replaceable removable photoconductive sleeve member in the form of an endless tubular belt that surrounds and non-adhesively intimately contacts the central member.Type: GrantFiled: October 4, 2000Date of Patent: April 1, 2003Assignee: NexPress Solutions LLCInventors: Arun Chowdry, Steven Cormier, Dennis Grabb, Diane M. Herrick, John W. May, Edward T. Miskinis, Michel F. Molaire, Biao Tan, Thomas N. Tombs
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Patent number: 6541172Abstract: The present invention provides an electrophotographic photosensitive member wherein a maximum height (RmaxD) of a surface roughness of a support portion is 1.2 &mgr;m RmaxD≦5.0 &mgr;m, an average roughness (Rz) of 10 points is 1.2 &mgr;m≦Rz≦3.0 m, an arithmetic average roughness (Ra) is 0.15 &mgr;m≦Ra≦0.5 &mgr;m, and an irregularity average interval (Sm) is 30 &mgr;m≦Sm≦80 &mgr;m. The photosensitive member's charge generation layer contains a phthalocyanine compound, its charge transport layer has a thickness which is at least 9 &mgr;m but not larger than 18 &mgr;m, the electrophotographic photosensitive member in every 1 cm2 area has an electrostatic capacity (C) of 130 pF or more. This invention also provides a process cartridge and an electrophotographic apparatus containing the electrophotographic photosensitive member.Type: GrantFiled: September 26, 2001Date of Patent: April 1, 2003Assignee: Canon Kabushiki KaishaInventors: Hideaki Nagasaka, Kazushige Nakamura, Noriyuki Takagi
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Patent number: 6541173Abstract: The present invention provide a toner comprising: a coloring agent; a binder resin comprising a first binder resin and a second binder resin, the first binder resin being composed of a linear polyester resin having a number-average molecular weight (Mn) of from 2,500 to 7,000, a weight-average molecular weight (Mw) of from 8,000 to 25,000, and a Mw/Mn ratio of 2 to 4, the second binder resin being composed of a non-linear polyester resin having a number-average molecular weight (Mn) of from 3,500 to 11,000, a weight-average molecular weight (Mw) of from 40,000 to 250,000, and a Mw/Mn ratio of 10 to 35, and a ratio of the first binder resin to the second binder resin (the first binder resin:the second binder resin) being 15:85 to 85:15 by weight, a first releasing agent having a softening point of 55 to 110° C., and a second releasing agent having a softening point of 110 to 160° C.Type: GrantFiled: May 31, 2000Date of Patent: April 1, 2003Assignee: Minolta Co., Ltd.Inventors: Kenichi Kido, Masayuki Hagi, Takeshi Arai, Yoshihiro Mikuriya, Megumi Aoki, Yoshitaka Sekiguchi, Tetsuo Sano, Junichi Tamaoki
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Patent number: 6541174Abstract: A toner for developing an electrostatic image is formed of toner particles; wherein each toner particle includes (i) 100 wt. parts of a binder resin having a glass transition point (Tg) of 50-70° C., (ii) 0.2-20 wt. parts of solid wax, and (iii) colorant particles or magnetic powder; (iv) lubricant particles carrying a liquid lubricant, so that the toner particle retains at its surface the liquid lubricant gradually released from the particles (iv). The toner may be further blended with an organically treated inorganic fine powder to provide a developer. The toner or developer retains good lubricity and releasability so that it is suitable to be used in an image forming method including means contacting a latent image-bearing means, such as a contact charging means, a contact transfer means or a contact cleaning means.Type: GrantFiled: September 1, 2000Date of Patent: April 1, 2003Assignee: Canon Kabushiki KaishaInventors: Hirohide Tanikawa, Toshiaki Nakahara, Keita Nozawa, Kazuyoshi Hagiwara, Minoru Shimojo, Rika Shinba, Masami Fujimoto, Tsutomu Onuma
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Patent number: 6541175Abstract: A process involving, for example, providing or generating an emulsion latex comprised of sodio sulfonated polyester resin particles by adding with shearing to the latex a colorant dispersion comprising from about 20 to about 50 percent of a predispersed colorant in water, followed by the addition of an organic or an inorganic acid; heating the resulting mixture at a temperature of from about 45° C. to about 65° C. followed by the addition of an water insoluble metal salt or water insoluble metal oxide thereby releasing metal ions and permitting aggregation and coalescence, resulting in toner particles; and optionally cooling the mixture and isolating the product.Type: GrantFiled: February 4, 2002Date of Patent: April 1, 2003Assignee: Xerox CorporationInventors: Lu Jiang, Walter Mychajlowskij, Guerino G. Sacripante, Raj D. Patel, Michael A. Hopper
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Patent number: 6541176Abstract: There is disclosed a process for making a lithographic printing plate, which comprises subjecting a lithographic printing material having at least a silver halide emulsion layer and a physical development nuclei layer on a support and having a sensitivity at a wavelength of 400 nm to 440 nm of 20 &mgr;J/cm2 or less, and having substantially no sensitivity at a wavelength of 450 nm or longer to scanning exposure by a scanning type exposure device on which a violet laser diode is mounted, and then subjecting to developing treatment.Type: GrantFiled: April 2, 2001Date of Patent: April 1, 2003Assignee: Mitsubishi Paper Mills, Ltd.Inventors: Takashi Miyazaki, Satoshi Shimonodan, Etsuji Tanaka, Motozo Yamano
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Patent number: 6541177Abstract: A self-developing diffusion transfer photographic film unit which includes a latent image which becomes visible upon photographic processing of the film unit. The latent image is formed with a chemical compound such as an indicator dye and the visible image formed from the latent image as a result of photographic processing may be transient or permanent. Also described are diffusion transfer photographic methods.Type: GrantFiled: April 16, 2001Date of Patent: April 1, 2003Assignee: Polaroid CorporatiionInventors: James A. Foley, Michael P. Filosa, Stephen J. Telfer, John L. Marshall, David P. Waller
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Patent number: 6541178Abstract: The photoacid generator according to the present invention is represented by the general formula (1): wherein R1 and R2 are respectively H, OH or alkyl or alkoxy group of C1-5 and are the same or different, n is an integer from 1 to 3, and Ar1 is a naphthalene unit. The photosensitive resin used in a composition of the invention is represented by the general formula (2): wherein X is a tetravalent aromatic or aliphatic organic radical, Y is a bivalent aromatic or aliphatic organic radical, and R3 and R4 independently are H or a monovalent aliphatic organic protecting group removable by acid.Type: GrantFiled: December 29, 2000Date of Patent: April 1, 2003Assignee: Samsung Electronics Co., Ltd.Inventors: Myung-Sup Jung, Seung-Ju Seo
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Patent number: 6541179Abstract: A resist composition contains a base resin, a photoacid generator, and a solvent. The photoacid generator is a sulfonium salt of formula (1). R1 is a monovalent cyclic or bridgedring C3-20, hydrocarbon group, R2 is hydroxyl, nitro, halogen, or a straight, branched or cyclic monovalent C1-15 hydrocarbon group which may contain O, N, S or halogen atom, K− is a non-nucleophilic counter ion, x is equal to 1 or 2, and y is an integer of 0-3. The resist composition is sensitive to ArF excimer laser light, has good sensitivity and resolution, and forms a thick film which is advantageous in etching.Type: GrantFiled: March 20, 2001Date of Patent: April 1, 2003Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Youichi Ohsawa, Tsunehiro Nishi, Jun Watanabe
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Patent number: 6541180Abstract: A photosensitive lithographic printing including mats provided thereon wherein the number of the mats each having volume of not less than 4,500 &mgr;m3 and less than 18,000 &mgr;m3 exceeds 20% of the total number of the provided mats. Prominent deterioration in a vacuum-adhesion-time-shortening effect, which is the primary function of the mats, is prevented even in case where the matted surface of the photosensitive lithographic printing plate is subjected to pressure after production but before use.Type: GrantFiled: July 26, 2000Date of Patent: April 1, 2003Assignee: Fuji Photo Film Co., Ltd.Inventor: Toru Onogawa
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Patent number: 6541181Abstract: A positive acting, composition that can be heat-sensitive is presented, either coated on a lithographic base, or on a printing circuit board base, and comprises a water soluble heat-sensitive resin, a novel adhesion promoter and a radiation absorbing agent—a dye or a pigment. An excellent film forming polymer that comprises acetal units directly pendant from the polymer polyvinyl alcohol backbone may be the only binder resin, when other resins being optional. The solubility of the coated material in the areas exposed to near -IR laser radiation in mild alkaline developers becomes considerably higher, allowing to obtain high resolved patterns of the etch-resistant material on printing circuit boards or lithographic printing plates. The composition can be applied on the substrate from a liquid of laminated as a dry film. Sensitizers may be added to render the composition sensitive to radiation in a non-thermal sense.Type: GrantFiled: July 26, 2000Date of Patent: April 1, 2003Assignee: Creo IL. Ltd.Inventors: Moshe Levanon, Emmanuel Lurie, Sergei Malikov, Oleg Naigertsik, Larisa Postel
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Patent number: 6541182Abstract: A method for forming a pattern in a resist is provided. A resist is formed on a surface of a substrate. A first portion of the resist is exposed to a charged particle beam, such as an electron beam, to alter a first characteristic of the first portion of the resist. A second portion of the resist is exposed to electromagnetic radiation, such as UV light, to alter a second characteristic of the second portion of the resist. The second portion is larger than the first portion. At least part of the first portion is removed using the altered characteristics of the resist such that a remaining portion defines the pattern in the resist. Using this method, fine pattern resists having less than 100 nm resolution may be created at high throughput rates.Type: GrantFiled: October 18, 2000Date of Patent: April 1, 2003Assignee: TDK CorporationInventors: Isabelle Louis Joseph Dogue, Hitoshi Hatate, Tsuneo Kagotani, Tsutomu Aoyama
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Patent number: 6541183Abstract: This patent describes a lithographic printing plate comprising on a substrate a semisolid radiation-sensitive layer capable of hardening upon exposure to a suitable radiation, and a method of imaging such a plate using laser radiation. The utilization of a semisolid radiation-sensitive layer allows faster photospeed and better curing efficiency as desired for digital laser exposure. Several plate designs can be utilized to overcome the tackiness issue associate with the semisolid layer, such as conformally coating the radiation-sensitive layer on a rough substrate and utilizing an overcoat. Plates having an ink and/or fountain solution or dispersible semisolid radiation-sensitive layer can be directly developed with ink and/or fountain solution while solution while mounted on press, with the imagewise laser exposure being carried out on press or off press.Type: GrantFiled: June 4, 2001Date of Patent: April 1, 2003Inventor: Gary Ganghui Teng
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Patent number: 6541184Abstract: A system and method is provided that facilitates the application of a uniform layer of developer material on a photoresist material layer. The system includes a multiple tip nozzle and a movement system that moves the nozzle to an operating position above a central region of a photoresist material layer located on a substrate, and applies a volume of developer as the nozzle scan moves across a predetermined path. The movement system moves the nozzle in two dimensions by providing an arm that has a first arm member that is pivotable about a first rotational axis and a second arm member that is pivotable about a second rotational axis or is movable along a translational axis. The system also provides a measurement system that measures the thickness uniformity of the developed photoresist material layer disposed on a test wafer. The thickness uniformity data is used to reconfigure the predetermined path of the nozzle as the developer is applied.Type: GrantFiled: September 6, 2000Date of Patent: April 1, 2003Assignee: Advanced Micro Devices, Inc.Inventors: Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur
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Patent number: 6541185Abstract: A polarized element formed by arranging a dichroic molecule in a micropattern form on a thin film layer of a liquid crystalline resin having a photoactive group irradiated by a linearly polarized light. The micropattern polarized element can be produced without need of a very high position-matching precision as sticking.Type: GrantFiled: September 20, 2000Date of Patent: April 1, 2003Assignees: Japan Chemical Innovation Institute, Agency of Industrial Science and TechnologyInventors: Daisaku Matsunaga, Kunihiro Ichimura, Takashi Tamaki
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Patent number: 6541186Abstract: An optical disk includes a standard area of a standard recording density provided on an inner peripheral sided and a high density area of a higher recording density provided on an outer peripheral side. In each of the standard area and the high density area, a program area is provided so that an independent program can be recorded in each program area. In one aspect of the invention, an optical disk includes, from the inner preriphery to the outer periphery of the disk, a ROM area for read-only purpsoe, a RAM area in which information can be rewritten and a WO area in which information can be written only once.Type: GrantFiled: August 15, 2001Date of Patent: April 1, 2003Assignee: Yamaha CorporationInventors: Nobuyuki Sato, Katsuichi Osakabe
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Patent number: 6541187Abstract: A process for producing an article with a microstructure includes the steps of forming a primary relief structure on a surface of a substrate, applying a photo resist on the substrate, exposing part of the photo resist using a photo mask so as to form a microstructure pattern, developing the microstructure pattern in the exposed photo resist, thereby allowing access to a part of the primary relief structure from the photo resist, and thereby forming a patterned surface with a microstructure relief that is bounded by the exposed part of the primary relief structure and by remainder of the photo resist on the substrate, and forming a metal layer on the patterned surface to form the article having the microstructure with a profile corresponding to the microstructure relief on the patterned surface.Type: GrantFiled: November 13, 2000Date of Patent: April 1, 2003Assignee: Taiwan Nano Electro-Optical Technology Co., LtdInventors: Ying-Fu Wang, Yi-Tang Wang
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Patent number: 6541188Abstract: An aqueous alkaline developing system for alkaline-developable lithographic printing plates and a method for its use are disclosed. The developing system comprises one or more water-soluble suppressors of the following structure: R1 (CHOH)nR2 in which: n is 4 to 7; and either (i) R1 is hydrogen, aryl, or CH2OH; and R2 is alkyl group having 1 to 4 carbon atoms, CH2OR3 in which R3 is an alkyl group having 1 to 4 carbon atoms, CH2N(R4R5) in which R4 and R5 are each independently hydrogen or an alkyl group having 1 to 4 carbon atoms, or CO2H; or (ii) R1 and R2 together form a carbon-carbon single bond. The developing system is especially suited for developing imageable elements useful as lithographic printing plates. The developing system is especially suited for use with elements in which (1) the imageable layer comprises at least one phenolic resin or at least one polymeric compound having pendent sulfonamide groups, and (2) the substrate is aluminum or and an aluminum alloy.Type: GrantFiled: May 11, 2001Date of Patent: April 1, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Ulrich Fiebag, Hans-Joachim Timpe, Uwe Tondock, Andreas Vihs
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Patent number: 6541189Abstract: A method of marking a polymer-based laminate including a core layer, a cover layer on at least one side of said core layer and an adhesive layer acting between the core layer and the cover layer is provided. The core, adhesive and cover layers have different radiation transmission coefficients. The method comprises the step of selectively irradiating the laminate with laser radiation having a fluence sufficient to mark the adhesive layer at selected locations while maintaining the cover layer intact.Type: GrantFiled: September 15, 1999Date of Patent: April 1, 2003Assignee: Agra Vadeko Inc.Inventors: Omar Caporaletti, Nikolay Stoev
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Patent number: 6541190Abstract: A photographic fixing composition has reduced odor and improved storage stability. It comprises a thiosulfate fixing agent, sulfite ions, and a phthalic acid or salt thereof. This fixing composition can be used in various photographic processing protocols to provide color images from color photographic silver halide materials.Type: GrantFiled: October 30, 2001Date of Patent: April 1, 2003Assignee: Eastman Kodak CompanyInventors: Shirleyanne E. Haye, Janet M. Huston, Therese M. Feller, Eric R. Schmittou
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Patent number: 6541191Abstract: A photographic aqueous processing solution containing at least one solid compound that has a maximum solubility therein corresponding to a desired operating level, which solution is kept in equilibrium with the solid form of the compound, thus maintaining its concentration at the desired level without the need for a replenishing system.Type: GrantFiled: June 12, 2001Date of Patent: April 1, 2003Assignee: Eastman Kodak CompanyInventors: Peter Jeffery Twist, John Demita Goddard
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Patent number: 6541192Abstract: A silver halide color photographic lightsensitive material comprising at least one layer on a support, wherein the at least one layer contains a coupler represented by formula (I) below wherein X represents a hydrogen atom, halogen atom, arylthio group, carbamoyloxy group, heterocyclic carbonyloxy group, etc., each of R1 and R2 represents an electron-attracting group having a Hammett's substituent constant &sgr;p value of not less than 0.20, the sum of the &sgr;p values of R1 and R2 being not less than 0.65, each of R3 and R4 represents a alkyl group, alkenyl group, alkynyl group, cycloalkyl group, cycloalkenyl group, etc., or alternatively, R3 and R4 may bond together to form a ring structure; and each of R11 to R15 independently represents a hydrogen atom or a substituent.Type: GrantFiled: November 21, 2001Date of Patent: April 1, 2003Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasuhiro Kato, Hisashi Mikoshiba, Naoto Matsuda, Tetsuro Kojima
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Patent number: 6541193Abstract: The invention relates to a method for screening of neuroactive drugs using the fruit fly Drosophila melanogaster, which comprises the steps of, generating a double mutant line of K+ channel genes in Drosophila melanogaster; culturing the Sh5eag1 mutant flies on Dorsophila medium under standard conditions; and anesthetizing flies with diethyl ether and observing the time taken by flies to recover from anesthesia.Type: GrantFiled: February 22, 2001Date of Patent: April 1, 2003Assignee: Council of Scientific & Industrial ResearchInventors: Abhay Sharma, Sushil Kumar
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Patent number: 6541194Abstract: Disclosed herein is a method to detect the presence of potentially inhibitory species that could interfere with a chemiluminescent assay procedure for determination of an analyte of interest. According to the disclosed method, a surface to be analyzed for the presence of an analyte of interest is first sampled by wiping the surface with a polymeric sampling swab. The sample thus obtain is mixed with a known amount of the analyte of interest and the chemiluminescence generated by a reaction with a suitable reactant system is measured. The resultant emission level is then compared with the expected level of emission based on the known amount of the analyte of interest mixed with the sample. If the emission level is below that expected based on the known amount of analyte, then the sampled surface is contaminated with inhibitory species.Type: GrantFiled: March 29, 2001Date of Patent: April 1, 2003Assignee: Neogen CorporationInventor: Joseph L. DiCesare