Patents Issued in July 1, 2003
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Patent number: 6586149Abstract: A light-receiving member comprising a conductive substrate, and formed superposingly thereon a photosensitive layer and a surface protective layer in order. The light-receiving member has a surface roughness Ra of from 15 nm to 100 nm. Also disclosed is an image-forming apparatus having such a light-receiving member, and an image-forming method of rendering visible an electrostatic pattern formed on the light-receiving member. The light-receiving member promises stable formation of images over a long period of time.Type: GrantFiled: March 16, 2001Date of Patent: July 1, 2003Assignee: Canon Kabushiki KaishaInventors: Kunimasa Kawamura, Shigenori Ueda, Toshiyuki Ehara, Junichiro Hashizume, Ryuji Okamura, Masaya Kawada, Tetsuya Karaki, Hironori Ohwaki
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Patent number: 6586150Abstract: An improved blending tool with an enlarged collision profile and method of use by rotation in a blending machine. The improved blending tool comprises an enlarged collision surface fixed at the end of the tool's center shank wherein at least half of the trailing surface of the collision surface is negatively sloped.Type: GrantFiled: June 14, 2002Date of Patent: July 1, 2003Assignee: Xerox CorporationInventor: James M. Proper
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Patent number: 6586151Abstract: A toner manufacturing method includes grinding and classification to produce a toner containing a binder resin and a colorant with a weight mean particle size of 5 microns to 12 microns and sharp particle density distribution. The toner has a specific circularity, relationship between cut ratio and weight mean size, and relationship between circularity and weight mean size as disclosed in the specification.Type: GrantFiled: October 6, 2000Date of Patent: July 1, 2003Assignee: Canon Kabushiki KaishaInventors: Takeshi Naka, Yuichi Mizoo, Satoshi Matsunaga, Masami Azuma, Takashige Kasuya, Tadashi Dojo, Tsuneo Nakanishi, Nene Shibayama, Katsuhisa Yamazaki, Yusuke Hasegawa
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Patent number: 6586152Abstract: The present invention relates to an agent for reducing substrate dependence useful as an ingredient of a resist composition used for preparation of semiconductor devices and the like, which comprises a compound shown by the following general formula [1]: wherein R41 is a hydrogen atom or a methyl group, R42 is a hydrogen atom, a methyl group, an ethyl group or a phenyl group, R43 is a straight chained, branched or cyclic alkyl group having 1 to 6 carbon atoms, and n is 0 or 1.Type: GrantFiled: June 12, 2000Date of Patent: July 1, 2003Assignee: Wako Pure Chemical Industries, Ltd.Inventors: Fumiyoshi Urano, Naoki Katano, Tomoko Kiryu
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Patent number: 6586153Abstract: A thermal transfer element for forming a multilayer device may include a substrate and a multicomponent transfer unit that, when transferred to a receptor, is configured and arranged to form a first operational layer and a second operational layer of a multilayer device. In at least some instances, the thermal transfer element also includes a light-to-heat conversion (LTHC) layer that can convert light energy to heat energy to transfer the multicomponent transfer unit. Transferring the multicomponent transfer unit to the receptor may include contacting a receptor with a thermal transfer element having a substrate and a multicomponent transfer unit. Then, the thermal transfer element is selectively heated to transfer the multicomponent transfer unit to the receptor according to a pattern to form at least first and second operational layers of a device.Type: GrantFiled: May 2, 2002Date of Patent: July 1, 2003Assignee: 3M Innovative Properties CompanyInventors: Martin B. Wolk, Paul F. Baude, Jeffrey M. Florczak, Fred B. McCormick, Yong Hsu
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Patent number: 6586154Abstract: The present invention discloses a photoresist polymer of following formula 1, and a photoresist composition comprising the same: where AC1, AC2, x and y are those defined herein. The photoresist composition has excellent transparency in deep ultraviolet region, etching resistance and heat resistance, and can form a good pattern without a developing step. Accordingly, the photoresist composition can be applied to a high density minute pattern below 0.15 &mgr;m (e.g., for fabrication of DRAM over 1G), and efficiently employed for the lithography process using ArF, KrF, VUV, EUV, E-beam and X-ray.Type: GrantFiled: October 11, 2000Date of Patent: July 1, 2003Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Jae Hak Choi, Chang Il Choi, Hak Joon Kim
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Patent number: 6586155Abstract: The invention is to enable easy formation of a fine electroconductive film pattern with a composition utilizing aqueous solvent of easy handling and little environmental burden. An electroconductive film forming composition composed of a water-soluble photosensitive resinous component, a water-soluble organometallic compound component capable of forming an electroconductive film by baking, and an aqueous solvent component is coated on a substrate and, after exposure based on the necessary pattern of the electroconductive film and development, is baked to form the required electroconductive film.Type: GrantFiled: February 7, 2001Date of Patent: July 1, 2003Assignee: Canon Kabushiki KaishaInventors: Tsuyoshi Furuse, Masahiro Terada, Shosei Mori
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Patent number: 6586156Abstract: A chemically amplified (CA) photoresist system wherein a terpolymer containing ketal/phenolic/silicon based sidechains is provided. Among other things, the terpolymers provide for improved bake technologies. In another aspect a process for lithographic treatment of a substrate by means of ketal/phenolic/silicon based compositions and corresponding processes for the production of an object, particularly an electronic component are provided.Type: GrantFiled: July 17, 2001Date of Patent: July 1, 2003Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Wu-Song Huang, Dai Junyan, Ranee W. Kwong, Robert N. Lang, Arpan P. Mahorowala, David R. Medeiros, Wayne M. Moreau, Karen E. Petrillo
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Patent number: 6586157Abstract: An ester compound of the following formula (1) is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is C1-C15 alkyl, Z is a divalent C2-C20 hydrocarbon group which forms a single ring or bridged ring with the carbon atom, m is 0 or 1, n is 0, 1, 2 or 3, and 2m+n=2 or 3. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity and resolution, and is suited for micropatterning using electron beams or deep-UV.Type: GrantFiled: April 19, 2001Date of Patent: July 1, 2003Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Takeru Watanabe, Mutsuo Nakashima, Seiichiro Tachibana, Jun Hatakeyama
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Patent number: 6586158Abstract: This invention discloses an anti-charging layer for beam lithography and mask fabrication. This invention reduces beam displacement and increases pattern placement accuracy. The process will be used in the beam fabrication of high-resolution lithographic masks as well as beam direct write lithography of electronic devices. The anti-charging layer is formed by the use of metal films bound to metal ligating self-assembled monolayers (SAMs) as discharge layers.Type: GrantFiled: May 25, 2001Date of Patent: July 1, 2003Assignee: The United States of America as represented by the Secretary of the NavyInventors: Elizabeth Dobisz, Walter J. Dressick, Susan L. Brandow, Mu-San Chen
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Patent number: 6586159Abstract: A dust cover having a film with an inorganic, anti-reflective coating and method for use during semiconductor fabrication. The dust cover is primarily for use during photolithography. The dust cover may include an amorphous fluoropolymer film having an inorganic, anti-reflective coating attached to a frame. The inorganic, anti-reflective coating preferably has a refractive index below 1.4.Type: GrantFiled: January 30, 2001Date of Patent: July 1, 2003Assignee: DuPont Photomasks, Inc.Inventor: Joseph S. Gordon
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Patent number: 6586160Abstract: A resist layer (34) on a semiconductor wafer (20) is patterned by using a scanning exposure system (50) which provides light, containing pattern information which is intended to be transferred to the wafer. The lithographic system is a step and scan system in which a reticle (16) passes between a light source and a lens system(18). The wafer with the resist layer is passed through a focal plane of the patterned light at a tilt angle (&thgr;). The user selects a desirable range for the depth of the resist to be exposed at the focus of the patterned light. The tilt angle is calculated by taking the arc tangent of the desirable range divided by a width of a slit region (52) of the projected light. The depth of focus increases over standard step and scan techniques.Type: GrantFiled: March 26, 2001Date of Patent: July 1, 2003Assignee: Motorola, Inc.Inventors: Chung-Peng Ho, Bernard J. Roman, Chong-Cheng Fu
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Patent number: 6586161Abstract: In order to prevent the contamination of wafers made of a transition metal in a semiconductor mass production process, the mass production method of a semiconductor integrated circuit device of the invention comprises the steps of depositing an Ru film on individual wafers passing through a wafer process, removing the Ru film from outer edge portions of a device side and a back side of individual wafers, on which said Ru film has been deposited, by means of an aqueous solution containing orthoperiodic acid and nitric acid, and subjecting said individual wafers, from which said Ru film has been removed, to a lithographic step, an inspection step or a thermal treating step that is in common use relation with a plurality of wafers belonging to lower layer steps (an initial element formation step and a wiring step prior to the formation of a gate insulating film).Type: GrantFiled: September 18, 2002Date of Patent: July 1, 2003Assignees: Hitachi, Ltd., Hitachi ULSI Systems Co., Ltd.Inventors: Takuya Futase, Tomonori Saeki, Mieko Kashi
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Patent number: 6586162Abstract: A method of using resist planarization to prepare for silicidation while protecting silicon nitride spacers in the fabrication of integrated circuits is described. Field oxide areas are formed on a semiconductor substrate surrounding and electrically isolating a logic device area and a memory device area. Polysilicon gate electrodes having silicon nitride sidewall spacers and associated source/drain regions are formed in the device areas. A silicon oxide layer is deposited overlying the gate electrodes and source/drain regions. The silicon oxide layer is covered with a photoresist layer. The photoresist layer is developed until the silicon oxide layer overlying the gate electrodes is exposed and the photoresist layer is below the tops of the gate electrodes. The exposed silicon oxide layer is etched away whereby the tops of the gate electrodes are exposed and wherein the silicon nitride spacers are undamaged by the etching. All of the silicon oxide layer in the logic device area is etched away.Type: GrantFiled: December 1, 2000Date of Patent: July 1, 2003Assignee: Taiwan Semiconductor Manufacturing CompanyInventor: Yu-Hua Lee
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Patent number: 6586163Abstract: There is described a method of forming a fine pattern aimed at depositing a silicon-nitride-based anti-reflection film which is stable even at high temperature and involves small internal stress. The method is also intended to preventing occurrence of a footing pattern (a rounded corner) in a boundary surface between a photoresist and a substrate at the time of formation of a chemically-amplified positive resist pattern on the anti-reflection film. The method includes the steps of forming a silicon-nitride-based film directly on a substrate or on a substrate by way of another layer; and forming a photoresist directly on the silicon-nitride-based film or on the silicon-nitride-based film by way of another layer. The silicon-nitride-based film is deposited while the temperature at which the substrate is to be situated is set so as to fall within the range of 400 to 700° C., through use of a plasma CVD system.Type: GrantFiled: June 2, 2000Date of Patent: July 1, 2003Assignees: Semiconductor Leading Edge Technologies Inc., ASM Japan K.K.Inventors: Ichiro Okabe, Hiroki Arai
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Patent number: 6586164Abstract: The present invention is directed toward effective photoresist stripping compositions that are less corrosive and do not cause skin irritation. One form of the present invention is a composition useful as a photoresist remover that includes an alkylene carbonate, and one or more additional components chosen from the group that includes alkyl hydrogen peroxides, hydroxyalkyl ureas, urea-hydrogen peroxides, N-substituted morpholines and alcohols. Another form of the present invention is a composition for removing photoresist from a surface that includes an N-substituted morpholine.Type: GrantFiled: June 6, 2002Date of Patent: July 1, 2003Assignee: Huntsman Petrochemical CorporationInventors: James R. Machac, Jr., Edward T. Marquis, Wheeler C. Crawford
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Patent number: 6586165Abstract: The present invention is a photographic element which includes, in order, a transparent support, at least one silver halide emulsion layer superposed on the support, optionally a white or diffuse reflective layer, and a processing-solution-permeable protective layer on the backside, which protective layer becomes water-resistant in the final product without lamination or fusing. The present invention is also directed to a method of making a photographic print involving developing the photographic element. The resulting print is viewed through the support, which provides protection against scratches and stains, while the polymeric overcoat provides water and stain protection to the reverse of the print where minor scratches or damage are not critical, since the image is not viewed from this side. Thus, this invention provides for a tough, stain resistant and transparent viewing surface and a stain resistant back side, which is permeable to processing solutions.Type: GrantFiled: April 27, 2001Date of Patent: July 1, 2003Assignee: Eastman Kodak CompanyInventors: Kevin M. Donovan, Glenn M. Brown, Lloyd A. Lobo
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Patent number: 6586166Abstract: This invention involves use of ionic liquids as addenda in a photothermographic system. The presence of an ionic liquid was found to increase image density. A preferred ionic liquid comprises an organic cation associated with a suitable anion, which ionic liquid melts at a temperature of 50° C. or less.Type: GrantFiled: November 21, 2001Date of Patent: July 1, 2003Assignee: Eastman Kodak CompanyInventors: Leif P. Olson, James H. Reynolds
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Patent number: 6586167Abstract: A method for thermally forming images for plate making, which comprises forming an image for plate making by using a thermally processed image recording material comprising a silver salt of an organic acid, a reducing agent, a color image forming material and an organic binder on a support, wherein the image consists essentially of a developed silver image and a color forming dye image and the color forming dye image shows an absorbance for ultraviolet region higher than that for visible region and has a transmission density of 0.3 or more for the region of 360-450 nm. There are provided a thermally processed image recording material and method for thermally forming images that provide significant difference of ultraviolet absorption between image areas and non-image areas suitable for printing plate making.Type: GrantFiled: July 23, 2001Date of Patent: July 1, 2003Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazunobu Katoh, Toyohisa Oya
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Patent number: 6586168Abstract: A multiple exposure method using plural masks includes exposing a position where an image of a low-contrast pattern is to be formed on the basis of a mask, of the plural masks, having fine lines extending in different directions, with an image of a pattern of a mask having a phase difference of 180 degrees between adjacent patterns, whereby a contrast of an exposure amount distribution related to the pattern of the low contrast is increased, and making the exposure with the image of the pattern having the phase difference of 180 degrees while registering the boundaries of the pattern with the fine lines of the pattern, extending in different directions, where the fine lines or extensions thereof intersect with each other at a single point. The boundaries having a phase difference of 180 degrees serve to divide a pattern region into zones of an even number regardless of whether the number of the fine lines is even or odd, and the fine lines are reproduced on the basis of the boundaries.Type: GrantFiled: June 30, 2000Date of Patent: July 1, 2003Assignee: Canon Kabushiki KaishaInventor: Yumiko Ohsaki
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Patent number: 6586169Abstract: In order to create a lithography exposure device for producing structures extending in a surface area in a light-sensitive layer, with which a radiation field can be generated in the light-sensitive layer and with a control for controlling the intensity and position of the radiation field in such a manner that by means of a large number of successive exposure steps a plurality of conversion areas can be generated, in which the material of the light-sensitive layer is converted from an initial state into an end state and which together result in the structures, with which it is possible to produce, without masks, structures which have in at least one direction an extension which is smaller than that of one of the radiation fields used, it is suggested that with at least some of the exposure steps the control generate radiation fields with a distribution of energy which makes the action of at least two radiation fields on the same conversion area necessary in order to transfer the material of the light-sensitivType: GrantFiled: January 19, 2001Date of Patent: July 1, 2003Assignee: Deutsches Zentrum fuer Luft- und Raumfahrt e.V.Inventors: Uwe Brauch, Hans Opower
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Patent number: 6586170Abstract: A thermographic recording element having at least one image forming layer contains an organic silver salt, a reducing agent, and optionally, a photosensitive silver halide. The element further contains a substituted alkene derivative of specific structure and preferably a specific hydrazine derivative. The element can be processed in a fully dry basis to produce images having high Dmax and gradation and free of black pepper.Type: GrantFiled: April 28, 1998Date of Patent: July 1, 2003Assignee: Fuji Photo Film Co., Ltd.Inventors: Kohzaburoh Yamada, Toshiaki Kubo, Hiroyuki Suzuki
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Patent number: 6586171Abstract: Since a coating film is cured to some extent by the gelation of the coating film in the chilling-zone process and the first-stage drying in the PAC drying process, then, it is fully dried by the second-stage drying in the HAC drying process, liquid scattering from the surface of the coating film during drying can be prevented, even if the binder is difficult to cure as in the coating film for a thermal-developable light-sensitive material. Thereby, good coating film surface condition and good photographic performance can be obtained.Type: GrantFiled: April 29, 2002Date of Patent: July 1, 2003Assignee: Fuji Photo Film Co., Ltd.Inventor: Junpei Iwado
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Patent number: 6586172Abstract: The present invention relates to a method and apparatus for effective inactivation of micro-organisms in fluids with relatively high absorbance so as to limit damage. The apparatus has a large diameter passage (2) flow-through UV radiation system with a static mixer system (11) providing an intensive fluid flow mixing within an irradiation area in which the fluid flow is controlled to provide a flow rate not less than a minimum flow rate corresponding to a maximum fluid residence time within said irradiation area required for efficient mixing, and a maximum flow rate providing a minimum residence time for effective inactivation.Type: GrantFiled: March 30, 2001Date of Patent: July 1, 2003Assignee: Iatros LimitedInventors: Andrew Gunn, Ian David Cameron, Duncan Stephen Pepper, Shirley Lynn MacDonald, Qiangyi Li
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Patent number: 6586173Abstract: The present invention relates to parasitic helminth aromatic amino acid decarboxylase proteins; to parasitic helminth aromatic amino acid decarboxylase nucleic acid molecules, including those that encode such aromatic amino acid decarboxylase proteins; to antibodies raised against such aromatic amino acid decarboxylase proteins; and to compounds that inhibit parasitic helminth aromatic amino acid decarboxylase activity. The present invention also includes methods to obtain such proteins, nucleic acid molecules, antibodies, and inhibitory compounds. Also included in the present invention are therapeutic compositions comprising such proteins, nucleic acid molecules, antibodies and/or inhibitory compounds as well as the use of such therapeutic compositions to protect animals from diseases caused by filariids. The present invention also includes a method for detecting the presence of amino acid decarboxylases.Type: GrantFiled: February 5, 2001Date of Patent: July 1, 2003Assignee: Heska CorporationInventor: Liang Tang
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Patent number: 6586174Abstract: The present invention relates to a bioactive molecule, herein referred to as the CD8+ suppressor molecule, that is produced by the CD8+ subset of human T-lymphocytes and suppresses type-1 human immunodeficiency virus (HIV-1) replication through inhibition of viral transcription. The invention relates to isolation of clonal CD8+ cells lines that produce the antiviral activity and the development of an assay system for detection of the antiviral activity. The clonal cell lines and the assay system, described herein, may be utilized to purify, characterize and clone the CD8+ suppressor molecule. The CD8+ suppressor molecule may have therapeutic applications for treatment of diseases associated with HIV-1 infection.Type: GrantFiled: November 29, 1999Date of Patent: July 1, 2003Assignee: Duke UniversityInventors: Dani P. Bolognesi, Chin-Ho Chen, Michael Greenberg, Kent Weinhold, Simon F. Lacey
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Patent number: 6586175Abstract: Genetic polymorphisms are identified in the human UGT2B4, UGT2B7 and UGT2B15 genes that alter UGT2B activity. Nucleic acids comprising the polymorphic sequences are used to screen patients for altered metabolism for UGT2B substrates, potential drug-drug interactions, and adverse/side effects, as well as diseases that result from environmental or occupational exposure to toxins. The nucleic acids are used to establish animal, cell and in vitro models for drug metabolism.Type: GrantFiled: July 20, 1999Date of Patent: July 1, 2003Assignee: DNA Sciences Laboratories, Inc.Inventors: Margaret Galvin, Andrew Miller, Laura Penny, Michael Riedy
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Patent number: 6586176Abstract: The invention provides methods of nucleic acid analysis. Such methods entail forming a population of gel microdrops encapsulating a population of biological entities, each entity comprising a nucleic acid, whereby at least some microdrops in the population each encapsulate a single entity. The population of gel microdrops is then contacted with a probe under conditions whereby the probe specifically hybridizes to at least one complementary sequence in the nucleic acid in at least one gel microdrop. At least one gel microdrop is then analyzed or detected. The biological entities can be cells, viruses, nuclei and chromosomes.Type: GrantFiled: August 6, 1999Date of Patent: July 1, 2003Assignee: Cellay, LLCInventors: Jan Trnovsky, Patricia McGrath
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Patent number: 6586177Abstract: The present invention provides methods for detecting disease by analysis of a patient sample to determine the integrity of nucleic acids in the sample.Type: GrantFiled: December 7, 1999Date of Patent: July 1, 2003Assignee: Exact Sciences CorporationInventor: Anthony P. Shuber
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Patent number: 6586178Abstract: A nucleic acid probe which is a single-stranded nucleic acid complementary to a specific nucleic acid sequence and is labeled so as to give off a measurable fluorescent signal on hybridization with a nucleic acid containing the specific nucleic acid sequence, wherein the 3′ end of the probe is modified as represented by the following formula (1): wherein R is —COOH, —CONH2, —(CH2)nOH, —CH(OH)—CH2OH, or —CH[(CH2)n—NHR1]—CH2OH, R1 is H, a dye, or an amino protecting group such as Fmoc, and n is an integer of at least 1.Type: GrantFiled: March 6, 2000Date of Patent: July 1, 2003Assignee: Tosoh CorporationInventors: Ryuichi Horie, Takahiko Ishiguro, Takumi Tokunaga, Takashi Yamamoto, Juichi Saitoh, Toshitaka Taya
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Patent number: 6586179Abstract: The invention provides isolated nucleic acid and amino acid sequences of Eag2, antibodies to Eag2, methods of detecting Eag2, and methods of screening for modulators of Eag2 potassium channels using biologically active Eag2. The invention further provides, in a computer system, a method of screening for mutations of human Eag2 genes as well as a method for identifying a three-dimensional structure of Eag2 polypeptide monomers.Type: GrantFiled: July 10, 2000Date of Patent: July 1, 2003Assignee: ICAgen, IncorporatedInventors: Timothy J. Jegla, Yi Liu
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Patent number: 6586180Abstract: A method for making a directed antisense library against a target transcript is described. A cDNA of the target transcript is cloned in an appropriate cloning vector. Next, a plurality of deletion derivatives of the cloned cDNA is prepared such that the deletions serially extend into the cDNA from one end thereof. The resulting deletion library is then treated such that cDNA is removed from the other end of each cDNA insert, thus obtaining a fragment library having fragments of a selected size. A catalytic core is then inserted into each fragment of the fragment library, resulting in the directed antisense library. An illustrative antisense gene in the hammerhead ribozyme catalytic core. Plasmids for making the antisense library, plasmids and methods for making the fragment library, and a method for identifying target sites for antisense-mediated gene inhibition are also described.Type: GrantFiled: December 4, 2000Date of Patent: July 1, 2003Assignee: University of UtahInventors: Duane E. Ruffner, Michael L. Pierce, Zhidong Chen
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Patent number: 6586181Abstract: A method for detecting allelic imbalance (AI) in sample nucleic acid, which method comprises providing multiple copies of a target nucleic acid region present in the sample, the target nucleic acid region comprising a marker of heterozygosity, separating the multiple copies into individual strands then allowing the individual strands to reanneal under conditions which permit the formation of homoduplexes and heteroduplexes, removing any heteroduplexes so formed, subjecting the remaining homoduplexes to the above steps of separation, reannealing and heteroduplex removal one or more times so that any difference in the initial ratio of allelic variants is amplified, and detecting the presence or absence of AI by reference to any difference in allele ratio so detected.Type: GrantFiled: October 17, 2000Date of Patent: July 1, 2003Assignee: Syngenta LimitedInventors: Jayne C Fox, Kemal Haque, Stephen Little
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Patent number: 6586182Abstract: Methods are provided for the evolution of proteins of industrial and pharmaceutical interest, including methods for effecting recombination and selection. Compositions produced by these methods are also disclosed.Type: GrantFiled: October 20, 2000Date of Patent: July 1, 2003Assignee: Maxygen, Inc.Inventors: Phillip A. Patten, Willem P. C. Stemmer
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Patent number: 6586183Abstract: Genotypes and haplotypes for thirteen polymorphic sites in the &bgr;2-adrenergic receptor (&bgr;2AR) gene are disclosed. Compositions and methods for predicting genetic predisposition to disease associated with polymorphic sites in the (&bgr;2AR) gene, as well as for predicting response to &bgr;-agonists, are also disclosed.Type: GrantFiled: March 16, 2001Date of Patent: July 1, 2003Assignee: Genaissance Pharmaceuticals, Inc.Inventors: Connie M. Drysdale, Richard S. Judson, Stephen B. Liggett, Krishnan Nandabalan, Catherine B. Stack, J. Claiborne Stephens
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Patent number: 6586184Abstract: The invention is based on the discovery that recombinagenic oligonucleobases are active in prokaryotic cells that contain a strand transfer activity (RecA) and mismatch repair activity (MutS). Using this system a type of Duplex Mutational Vector termed a Heteroduplex Mutational Vector, was shown to be more active in prokaryotic cells than the types of mutational vectors heretofore tested. Further improvements in activity were obtained by replacing the tetrathymidine linker by a nuclease resistant oligonucleotide, such as tetra-2′-O-methyl-uridine, to link the two strands of the recombinagenic oligonucleobase and removing the DNA-containing intervening segment. The claims concern Duplex Mutational Vectors that contain the above improvements. In an alternative embodiment the claims concern the use of Duplex Mutational Vectors in prokaryotic cells.Type: GrantFiled: April 3, 2001Date of Patent: July 1, 2003Assignee: ValiGen (U.S.), Inc.Inventors: Ramesh Kumar, Richard A. Metz
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Patent number: 6586185Abstract: Method of using of polypeptides or nucleic acids encoding these for the diagnosis and/or prevention and/or treatment of diseases of skin cells and/or of wound healing and/or its pathological disorders, and their use for the identification of pharmacologically active substance.Type: GrantFiled: June 20, 2001Date of Patent: July 1, 2003Assignee: Switch Biotech AGInventors: Eckard Wolf, Sabine Werner, Jörn-Peter Halle, Johannes Regenbogen, Andreas Goppelt
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Patent number: 6586186Abstract: The present invention generally provides a rapid efficient method for analyzing polymorphic or biallelic markers, and arrays for carrying out these analyses. In general, the methods of the present invention employ arrays of oligonucleotide probes that are complementary to target nucleic acids which correspond to the marker sequences of an individual. The probes are typically arranged in detection blocks, each block being capable of discriminating the three genotypes for a given marker, e.g., the heterozygote or either of the two homozygotes. The method allows for rapid, automatable analysis of genetic linkage to even complex polygenic traits.Type: GrantFiled: August 24, 2001Date of Patent: July 1, 2003Assignee: Affymetrix, Inc.Inventors: Robert J. Lipshutz, Ronald Sapolsky, Ghassan Ghandour
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Patent number: 6586187Abstract: Compounds of the formula are useful in the treatment of various disorders including, but not limited to, cancer (tumor metathesis, tumorgenesis/tumor growth), angiogenesis (as in cancer, diabetic retinopathy, rheumatoid arthritis), restenosis (following balloon angioplasty or stent implantation), inflammation (as in rheumatoid arthritis, psoriasis), bone diseases (osteopenia induced by bone metastases, immobilization and glucocortocoid treatment, periodontal disease, hyperparathyroidism and rheumatoid arthritis), and as antiviral agents. Novel method of making compounds of formula I are also provided.Type: GrantFiled: April 13, 2000Date of Patent: July 1, 2003Assignee: WyethInventors: Ariamala Gopalsamy, Hui Y. Yang
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Patent number: 6586188Abstract: According to the invention &bgr;-tubulin, as well as a 65 kDa polypeptide present in pancreatic &bgr;-cells, have been identified as molecular targets for sulfonylurea compounds. These findings enable for the identification of new insulin secretagogues. The invention thus relates to the use of sulfonylurea compounds, such as e.g. glibenclamide, in methods for identification of compounds binding the 65 kDa polypeptide or tubulin, or stimulating tubulin polymerization and/or turnover, thereby stimulating insulin secretion.Type: GrantFiled: August 11, 2000Date of Patent: July 1, 2003Assignee: Biovitrum ABInventors: Per-Olof Berggren, Thomas Lundbäck, Alejandro Bertorello
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Patent number: 6586189Abstract: The invention relates to a method of identifying nuclear receptor controlled genes in specific tissues. In particular, the method also provides a method of activating PPAR&ggr; nuclear receptor controlled target genes in vivo in a tissue-specific manner and screening for PPAR&ggr; ligands.Type: GrantFiled: February 7, 2001Date of Patent: July 1, 2003Assignee: City of HopeInventor: Barry Forman
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Patent number: 6586190Abstract: A parallel high throughput method and kit for the discovery of small molecule interactors of target proteins, in particular, target proteins expressed from entire genomes or subsets thereof. The target module is prepared by binding selectively a target protein, modified to allow its detection, to a surrogate ligand that is linked to an individually detectable bead. Sets of target modules are mixed together in each chamber of a multi-chamber container. A test compound or collection of test compounds is added to each chamber, and the interaction of a compound with each target module is observed. A compound that is specific for a particular target protein will displace that protein from its target module. The identity of the target module so disrupted is determined by identifying the particular bead to which the displaced target protein was attached.Type: GrantFiled: July 30, 2001Date of Patent: July 1, 2003Assignee: Syngenta Participations AGInventors: Paul Bernasconi, Ray Donald Carpenter, Gary Keith Powell, Robert Michael Petrovich, Kimberly Ann White, Jennifer Audrey Hunt
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Patent number: 6586191Abstract: This invention provides isolated nucleic acids encoding mammalian galanin receptors, isolated galanin receptor proteins, vectors comprising isolated nucleic acid encoding a mammalian galanin receptor, cells comprising such vectors, antibodies directed to a mammalian galanin receptor, nucleic acid probes useful for detecting nucleic acid encoding a mammalian galanin receptor, antisense oligonucleotides complementary to unique sequences of nucleic acid encoding a mammalian galanin receptor, nonhuman transgenic animals which express DNA encoding a normal or a mutant mammalian galanin receptor, as well as methods of determining binding of compounds to mammalian galanin receptors.Type: GrantFiled: July 23, 1997Date of Patent: July 1, 2003Assignee: Synaptic Pharmaceutical CorporationInventors: Kelli E. Smith, David Linemeyer, Christophe P. G. Gerald, Theresa Branchek, Richard L. Weinshank, Carlos Forray
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Patent number: 6586192Abstract: The invention relates to a methods of obtaining and expanding a purified population of long-term repopulating hematopoietic stem cells. The invention also relates to the uses of a purified population of long-term repopulating hematopoietic stem cells.Type: GrantFiled: May 28, 1999Date of Patent: July 1, 2003Assignees: Thomas Jefferson University, Instituto Superiore di SanitaInventors: Cesare Peschle, Benedikt L. Ziegler
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Patent number: 6586193Abstract: Method for specific detection of one or more analytes in a sample. The method includes specifically associating any one or more analytes in the sample with a scattered-light detectable particle, illuminating any particle associated with the analytes with light under conditions which produce scattered light from the particle and in which light scattered from one or more particles can be detected by a human eye with less than 500 times magnification and without electronic amplification. The method also includes detecting the light scattered by any such particles under those conditions as a measure of the presence of the analytes.Type: GrantFiled: October 17, 1997Date of Patent: July 1, 2003Assignees: Genicon Sciences Corporation, The Regents of the University of CaliforniaInventors: Juan Yguerabide, Evangelina E. Yguerabide, David E. Kohne, Jeffrey T. Jackson
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Patent number: 6586194Abstract: A method for measuring the activity of creatine kinase MB (CK-MB) isozyme which is accurate, high in specificity, convenient, by inhibiting the activity of a mitochondria localized creatine kinase (mCK) isozyme to avoid the influence of mCK and a measurement reagent therefor.Type: GrantFiled: September 19, 2000Date of Patent: July 1, 2003Assignee: International Reagents CorporationInventors: Yasushi Shirahase, Tadahiro Kajita, Tadashi Hoshino
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Patent number: 6586195Abstract: A method for detecting reducing sugars in samples using a test reagent containing an indicator capable of producing calorimetric changes when contacted with reducing sugars. Under alkaline conditions, reducing sugars present in a sample affect a reduction of the indicator to a colorless or differently colored reduced form. The method may include the additional step of pretreating the sample with a glycosidase to convert non-reducing sugars to reducing sugars.Type: GrantFiled: November 19, 2001Date of Patent: July 1, 2003Assignee: R.E. Davis Chemical CorporationInventor: Arthur J. Friedman
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Patent number: 6586196Abstract: The present invention discloses multiple enzyme assays which measure the activity of at least one endogenous enzyme in a single aliquot and a method of measuring the activity of multiple enzymes in an aliquot of a cell extract, wherein at least one of the enzymes is an endogenous enzyme. In one embodiment of the invention the activity of a first enzyme is quantified by measuring the light signal produced by degradation of a first enzyme substrate by the first enzyme and the activity of the second enzyme is quantified by measuring the light signal produced by the degradation of a second substrate. In the method of the present invention, both quantifications are performed on the same aliquot of cell extract. Different embodiments of the present invention provide for the detection of more than one endogenous enzyme and for the detection of at least one reporter enzyme and at least one endogenous enzyme. The present invention also discloses kits for detecting the activity of multiple enzymes.Type: GrantFiled: December 14, 1999Date of Patent: July 1, 2003Assignee: Tropix, Inc.Inventors: Irena Bronstein, Christopher Martin, Corinne Olesen, John Voyta, Yu-xin Yan
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Patent number: 6586197Abstract: Materials and methods for identifying novel pesticide agents are disclosed herein. Specifically exemplified is a full length aminopeptidase N isolated from Manduca sexta, insect cells expressing APN, and methods of screening pesticide agents using the same. Also disclosed are methods of identifying novel APN inhibitors.Type: GrantFiled: September 7, 2000Date of Patent: July 1, 2003Assignee: University of Georgia Research Foundation, Inc.Inventors: Michael J. Adang, Ke Luo
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Patent number: 6586198Abstract: Deficiencies in certain physiological pathways are linked with ACE or vasopeptidase inhibitor associated angioedema. Additionally, detection and/or measurement of dipeptidyl peptidase IV (DPP IV) enzyme activity and aminopeptidase P (APP) enzyme activity is a predictor of this risk. The present invention provides biological markers, diagnostic tests, and pharmaceutical indications that are useful in the diagnosis and treatment of angioedema and in the marketing and safety of certain medications. This ability can be important for the treatment of a subject that is in need of or are taking an angiotensin-converting enzyme (ACE) inhibitor and/or a vasopeptidase inhibitor (combined ACE and neutral endopeptidase (NEP) inhibitor), which are commonly used in the treatment of hypertension (high blood pressure), diabetes, and cardiac and renal diseases.Type: GrantFiled: October 31, 2001Date of Patent: July 1, 2003Assignee: Vanderbilt UniversityInventor: Nancy J. Brown