Abstract: In a group III nitride compound semiconductor light-emitting device, a light-emitting layer having a portion where an InGaN layer is interposed between AlGaN layers on both sides thereof is employed. By controlling the thickness, growth rate and growth temperature of InGaN layer which is a well layer and the thickness of AlGaN layer which is a barrier layer so that they are optimized, the output of the light-emitting device is enhanced.

Abstract: Numerous embodiments of a heat spreader, comprised of a plurality of downset legs, which provides a simple and lower cost method of forming a heat spreader as compared to conventional methods are disclosed, as well as novel apparatus and methods for attaching the heat spreader to a substrate and a secondary device to the heat spreader, are disclosed.

Abstract: Precision Zener diodes, methods for manufacturing precision Zener diodes, and consumer electronics employing the Zener diodes are disclosed. The Zener diodes are made from a semiconductor substrate layer on which is grown an epitaxial layer. The epitaxial layer has a resistivity greater than that of the substrate. The diode also has an interior region of doped semiconductor material of the same conductivity type as the substrate. The interior region extends through the epitaxial layer and into the substrate layer. The diode also has a junction layer of a conductivity type different from the substrate. The junction layer is formed in the epitaxial surface, and the junction layer forms an interior P/N junction with the interior region and a peripheral P/N junction with a peripheral portion of the device.

Abstract: A semiconductor memory which operates at low power supply voltage with lower power consumption without decreasing writes rate is provided. During data read, a virtual ground line VGj provided to correspond to a bit line pair BLj, /BLj of a read target memory cell 11ij is connected to a ground voltage GND through a transistor 31j. As a result, the bit line BLj (or /BLj) corresponding to “L” level is connected to the ground voltage GND through an acceleration circuit AC provided in the memory cell 11ij to thereby accelerate read rate. During data write, the virtual ground line VGj corresponding to the write target bit line pair BLj, /BLj is connected to a power supply voltage VDD through a transistor 33j. As a result, a current is prevented from flowing from the bit line BLj (or /BLj) at “H” level to the virtual ground line VGj and the write rate is not decreased.

Abstract: A semiconductor device includes: a semiconductor element; a die pad with the semiconductor element mounted thereon; a plurality of electrode terminals each having a connecting portion electrically connected with the semiconductor element; and a sealing resin for sealing the semiconductor element, the die pad and the electrode terminals so that a surface of each electrode terminal on an opposite side from a surface having the connecting portion is exposed as an external terminal surface. A recess having a planar shape of a circle is formed on the surface of each electrode terminal with the connecting portion, and the recess is arranged between an end portion of the electrode terminal exposed from an outer edge side face of the sealing resin and the connecting portion. While a function of the configuration for suppressing the peeling between the electrode terminal and the sealing resin can be maintained by mitigating an external force applied to the electrode terminal, the semiconductor device can be downsized.

Abstract: A self aligned method of forming a semiconductor memory array of floating gate memory cells in a semiconductor substrate, along with strap regions interlaced within the array. The array includes word lines and source lines that connect together control gates and source regions from memory cells contained in row within the array. The strap regions include word line strap cells through which the word lines traverse, wherein the word lines completely traverse across the strap regions, and source line strap cells in which the source lines terminate without completely traversing across the strap region. A first plurality of conductive metal contacts are each connected to one of the word lines in one of the word line strap cells. A second plurality of conductive metal contacts are each connected to one of the source lines in one of the source line strap cells.

Abstract: A wire width and a wiring space of each of signal wires 1 and ground/power wires 2 are determined to be a wire width W1 (the minimum wire width) and a wiring space S1, respectively. A wire width and a wiring space of the via-hole neighboring region 1a or 2a are determined to be a wire width W2 (>W1) and a wiring space S2 (<S1), respectively. The wire widths W1 and W2 and the wiring spaces S1 and S2 are respectively determined so as to maintain the minimum wiring pitch P. The wiring space S1 is determined also so as to satisfy {S1/P≧0.6}. Further, the signal wires 1 and the ground/power wires 2 have the same wire thickness of a wire thickness T1 which allows an aspect ratio (T1/W1) to be equal to, or higher than, 2.

Abstract: In one aspect, the invention encompasses a semiconductor circuit construction including a material which comprises Q, R, S and B. In such construction, Q comprises one or more refractory metals, R is selected from the group consisting of one or more of tungsten, aluminum and silicon, S is selected from the group consisting of one or more of nitrogen and oxygen, and B is boron. Also, in such construction R and Q do not comprise a common element. In another aspect, the invention encompasses a method of forming a capacitor. A first capacitor electrode is formed, a diffusion barrier layer is formed proximate the first capacitor electrode, and a dielectric layer is formed to be separated from the first capacitor electrode by the diffusion barrier layer. A second capacitor electrode is formed to be separated from the first electrode by the dielectric layer.

Abstract: The present invention provides a structure of Metal Oxide Semiconductor Field Effect Transistor (MOSFET), which comprises a SOI (Silicon-On-Insulator) device, a MOS (Metal Oxide Semiconductor) formed on said SOI device, and a metal-silicide layer. Said SOI device includes a substrate, an insulation layer formed on said substrate, and a silicon layer formed on said insulation layer, and the MOS is formed on said SOI device. The metal-silicide layer is formed in accordance with a metal aligned process by a metal layer being deposited on said SOI device and on said MOS for reacting with said silicon layer, and an implant-to-silicide process is employed to form a high-density source region and a high-density drain region for modifying Schottky Barrier and diminishing Carrier Injection Resistance.

Abstract: An SOI GAA device is created by etching a buried oxide layer of an SOI wafer structure that is provided over a silicon substrate. A portion of the buried oxide layer remains over the silicon substrate after etching. A plurality of silicon fingers is formed so that the silicon fingers extend over the remaining buried oxide layer. A gate oxide is formed all around each of the silicon fingers, and a common silicon gate is formed all around all of the gate oxides. A common source and a common drain are formed by suitably doping opposite ends of the silicon fingers leaving a channel therebetween.

Abstract: A high-performance recessed channel CMOS device including an SOI layer having a recessed channel region and adjoining extension implant regions and optional halo implant regions; and at least one gate region present atop the SOI layer and a method for fabricating the same are provided. The adjoining extension and optional halo implant regions have an abrupt lateral profile and are located beneath said gate region.

Abstract: The invention encompasses a method of forming a semiconductor-on-insulator construction. A substrate is provided. The substrate includes a semiconductor-containing layer over an insulative mass. The insulative mass comprises silicon dioxide. A band of material is formed within the insulative mass. The material comprises one or more of nitrogen argon, fluorine, bromine, chlorine, iodine and germanium.

Abstract: A semiconductor device with substrate-triggered ESD protection technique includes a guard ring, a first MOS transistor array, a second MOS transistor array and a substrate-triggered portion. The first MOS transistor array, the second MOS transistor array and the substrate-triggered portion are formed in a region surrounded by the guard ring, and the substrate-triggered portion is located between the first MOS transistor array and the second MOS transistor array. Therefore, when the ESD event occurs, the substrate-triggered portion can be used for biasing a base of at least one parasitic BJT in the first MOS transistor array and a base of at least one parasitic BJT in the second MOS transistor array to achieve uniform turn-on among the multiple fingers of MOS transistor array. By using this layout design, the MOS transistor array can have a high ESD robustness.

Abstract: Thermal cooling structures of diamond or diamond-like materials are provided for conducting heat away from semiconductor devices. A first silicon-on-insulator embodiment comprises a plurality of thermal paths, formed after shallow trench and device fabrication steps are completed, which extend through the buried oxide and provide heat dissipation through to the underlying bulk silicon substrate. The thermal conduction path material is preferably diamond which has high thermal conductivity with low electrical conductivity. A second diamond trench cooling structure, formed after device fabrication has been completed, comprises diamond shallow trenches disposed between the devices and extending through the buried oxide layer. An alternative diamond thermal cooling structure includes a diamond insulation layer deposited over the semiconductor devices in either an SOI or bulk silicon structure.

Abstract: A method of passivation layer deposition using a cyclical deposition process is described. The cyclical deposition process may comprise alternately adsorbing a silicon-containing precursor and a reactant gas on a substrate structure. Thin film transistors, such as a bottom-gate transistor or a top-gate transistor, including a silicon-containing passivation layer, may be formed using such cyclical deposition techniques.

Abstract: A plurality of N-type first impurity layers (111) are provided that form stripes in a main surface (110S) of a P-type semiconductor substrate (110). At least one N-type second impurity layer (112) overlaps (or touches) one of the first impurity layers (111). A plurality of gate electrodes are provided on a gate insulating film (121). A plurality of gate electrodes form stripes crossing the first impurity layers (111). A plurality of low-resistance wires (140) are provided on an interlayer insulating film (122). The plurality of low-resistance wires (140) form stripes extending in the same direction as that of the first impurity layers (111). An end (123T2) of each contact plug (123) is entirely in contact with the second impurity layer 112, and does not touch a P-type region of the semiconductor substrate (110).

Abstract: A Hall effect device comprising: (a) an electrically-conductive layer or plate having a top surface; and (b) a ferromagnetic layer comprised of a magnetic insulator. Such magnetic insulator can be a ferrite or a perovskite ferromagnetic oxide. Also, a Hall effect device can have a ferromagnetic element that is a multilayer (e.g., a bilayer), and a device in which the Hall plate comprises an indium compound, germanium or mixtures thereof. The devices are useful for a variety of applications such as a memory element in a nonvolatile random access memory array (NRAM) and as a logic gate.

Abstract: A photoelectric conversion element comprising a substrate and a light sensor disposed on a surface of the substrate and receiving high speed optical pulse signals and converting them into high frequency waves in which the light sensor comprises at least carbon nano-tubes, as well as a photoelectric conversion device having the element, for directly converting high speed optical pulses signals in a communication band into signals of high frequency waves or electromagnetic waves.

Abstract: A surface-mountable light emitting diode structural element in which an optoelectronic chip is attached to a chip carrier part of a lead frame, is described. The lead frame has a connection part disposed at a distance from the chip carrier part, and which is electrically conductively connected with an electrical contact of the optoelectronic chip. The chip carrier part presents a number of external connections for improved conduction of heat away from the chip. The external connections project from a casing and at a distance from each other.

Abstract: In a photoelectric conversion element which is formed by alternately stacking a region of a first conductivity type and a region of a second conductivity type as a conductivity type opposite to the first conductivity type to form a multi-layered structure, in which junction surfaces between the neighboring regions of the first and second conductivity types are formed to have depths suited to photoelectrically convert light in a plurality of different wavelength ranges, and which outputs signals for respective wavelength ranges, a region of a conductivity type opposite to the conductivity type of a surface-side region of the junction surface closest to a surface is formed in the surface of the surface-side region. Thus, highly color-separable signals which suffer less color mixture upon reading out signals from a plurality of photodiode layers is read out.

Abstract: A semiconductor structure (1), comprising a isolation region (5) formed on a semiconductor material (10). A pillar (15) is formed in the semiconductor material under the isolation region, where the pillar is capped with a first dielectric material (20) to form a void (16).

Abstract: A self-aligned bipolar transistor and a method of formation thereof are provided. The bipolar transistor has a raised extrinsic base such that the link base resistance is reduced by providing an extrinsic base which is thicker than the intrinsic base. The increase in thickness of the extrinsic base provides a less resistive layer of the heavily doped base region. The method of forming the bipolar transistor includes depositing a first epitaxial layer on a substrate to form a base region having an intrinsic base region and an extrinsic base region. The extrinsic base region is raised by depositing a second epitaxial layer over a portion of the first epitaxial layer such that the thickness of the extrinsic base layer is x and the thickness of the intrinsic layer is y, wherein x>y. The second epitaxial layer is deposited using a chemical vapor epitaxial device where the concentration of Ge to Si is gradually reduced from above 5% to close to 0% during the epitaxy process.

Abstract: An n-type low impurity concentration semiconductor layer is provided, by epitaxial growth or the like, on a p-type semiconductor substrate. In order to vertically form a semiconductor device in the low impurity concentration semiconductor layer, at least a p-type diffusion region is provided. In a surface of the semiconductor layer, a collector electrode and a base electrode are respectively formed in electrical connection to the n-type low impurity concentration semiconductor layer and the p-type diffusion region. The collector electrode is formed on a surface of the n+-type low resistance region of a polycrystal semiconductor formed depthwise in the low impurity concentration semiconductor layer.

Abstract: A dielectric thin film element enables controlling of a crystal orientation of a dielectric thin film and optimization of a variety of characteristics such as electric characteristics. This dielectric thin film element (10) comprises a substrate (11), a first electrode (12) formed on the substrate (11), a dielectric thin film (13) formed on the first electrode (12) and a second electrode (14) formed on the dielectric thin film (13) and is fabricated with the substrate (11) being heated. A material having a predetermined thermal expansion coefficient is used as the material of the substrate (11), and a crystal orientation of the dielectric thin film (13) is controlled by the thermal expansion coefficient of the substrate (11).

Abstract: A microelectromechanical system may be enclosed in a hermetic cavity defined by joined, first and second semiconductor structures. The joined structures may be sealed by a solder sealing ring, which extends completely around the cavity. One of the semiconductor structures may have the system formed thereon and an open area may be formed underneath said system. That open area may be formed from the underside of the structure and may be closed by covering with a suitable film in one embodiment.

Abstract: A microelectronic package and method for manufacture. The package can include a support member and a microelectronic substrate positioned at least proximate to the support member. The microelectronic substrate can have a first surface and a second surface facing opposite the first surface, with the first surface having an outer edge and facing toward the support member. At least a portion of the first surface can be spaced apart from an interior surface of the support member to define an intermediate region. At least one conductive coupler is coupled between the microelectronic substrate and the support member. A generally electrically non-conductive material is positioned in the intermediate region with the material contacting the support member and the first surface of the microelectronic substrate and having an outer surface recessed inwardly from the outer edge of the microelectronic substrate.

Abstract: A semiconductor device comprises a semiconductor substrate having a bonding pad region; and a bonding pad and a fuse box formed in the bonding pad region. Thus, the chip size can be reduced and the manufacturing yield can be increased.

Abstract: A flip chip assembly comprises an IC chip having a plurality of first solder bumps formed on a lower surface thereof and a heat sink having a plurality of second solder bumps, wherein the heat sink are attached to an upper surface of the IC chip via the second solder bumps. The present invention further provides a method for producing the flip chip assembly.

Abstract: A semiconductor built-in millimeter-wave band module includes: an insulating substrate made of a mixture containing an inorganic filler and a thermosetting resin; a high thermal conductivity substrate made of a dielectric material having thermal conductivity higher than the insulating substrate and laminated on one surface of the insulating substrate; a plurality of wiring patterns formed on the high thermal conductivity substrate and the insulating substrate; a semiconductor device operating at millimeter-wave band, which is arranged inside of the insulating substrate, is packaged on the high thermal conductivity substrate in a face-up manner, and is connected electrically with the wiring patterns; and a distributed constant circuit element and an active element provided on the semiconductor device. In this module, a void is provided inside of the insulating substrate and in the vicinity of a surface of the distributed constant circuit element and the active element.

Abstract: A decoupling device for decoupling a high-frequency noise wave in a digital circuit is formed as a line device including a portion of a semiconductor substrate, an insulator film formed thereon as a gate oxide film, and an interconnect line formed thereon as a gate electrode. The line capacitance between the interconnect line and the semiconductor substrate is 100 pF or above, whereby the decoupling device effectively decouples the electromagnetic noise wave generated by a switching device in a frequency range between 10 and 1000 GHz.

Abstract: Increasing the number of MOSFET gate bump contacts makes MOSFET gate contacts more durable and reliable. Extension of the under-bump metal laterally from the gate contact with the gate pad metallization out to two or more gate pads overlying the source pad metallization reduces the risk of delamination of the metallization due to thermal and mechanical stresses in assembly and operation. Use of more than one gate pad further reduces such failure risks. The result is a reliable, durable MOSFET gate contact.

Abstract: A chip structure having a chip, an adhesion layer, and a metal layer. The chip has an active surface and many conductive pads. The conductive pads are disposed on the active surface, wherein the conductive pads are made of copper. The adhesion layer is directly formed on the conductive pads, wherein the material of the adhesion layer includes copper. The metal layer is formed on the adhesion layer, wherein the material of the metal layer includes copper.

Abstract: A semiconductor package including a double-faced semiconductor chip having integrated circuitry on both sides thereof, and a method of fabricating the same is provided, wherein the semiconductor package includes the semiconductor chip; a lead-on-chip (LOC)-type substrate, having metal patterns on both sides, bonded with the first side of the semiconductor chip; first wires for connecting the first side of the semiconductor chip to the second side of the LOC-type substrate; second wires for connecting the second side of the semiconductor chip to the first side of the LOC-type substrate; a first sealing material for covering the semiconductor chip, the first wires, and the second side of the LOC-type substrate; a second sealing material for covering the semiconductor chip, the second wires, and the first side of the LOC-type substrate; and solder balls attached to the second side of the LOC-type substrate.

Abstract: A semiconductor device that includes a semiconductor substrate having a main surface, the main surface including a first area formed with a high-frequency circuit element and a second area located around the first area and formed with a low-frequency circuit element. The semiconductor device also includes a sealing resin which covers the main surface; a plurality of first external terminals which are formed above the second area and which are electrically connected to the high-frequency circuit element, the first external terminals protruding from the surface of the sealing resin. The semiconductor device further includes a plurality of second external terminals which are formed above the second area and which are electrically connected to the low-frequency circuit element, the second external terminals protruding from the surface of the sealing resin.

Abstract: Disclosed is a layer to electrically connect targets during a circuit edit of an integrated circuit and systems and methods for forming the layer. The layer contains a conductive material, such as gold or another metal, which has been physically deposited by sputtering, thermal evaporation, and other physical deposition technique.

Abstract: The invention encompasses stacked semiconductor devices including gate stacks, wordlines, PROMs, conductive interconnecting lines, and methods for forming such structures. In one aspect, the invention includes a method of forming a conductive line comprising: a) forming a polysilicon layer; forming a silicide layer against the polysilicon layer; b) providing a conductivity-enhancing impurity within the silicide layer; and c) providing the polysilicon layer and the silicide layer into a conductive line shape. In another aspect, the invention includes a programmable-read-only-memory device comprising: a) a first dielectric layer over a substrate; b) a floating gate over the first dielectric layer; c) a second dielectric layer over the floating gate; d) a conductive line over the second dielectric layer; and e) a metal-silicide layer over the conductive line, the metal-silicide layer comprising a Group III dopant or a Group V dopant.

Abstract: An improved dual damascene structure is provided for use in the wiring-line structures of multi-level interconnects in integrated circuit. In this dual damascene structure, low-K (low dielectric constant) dielectric materials are used to form both the dielectric layers and the etch-stop layers between the metal interconnects in the IC device. With this feature, the dual damascene structure can prevent high parasite capacitance to occur therein that would otherwise cause large RC delay to the signals being transmitted through the metal interconnects and thus degrade the performance of the IC device. With the dual damascene structure, such parasite capacitance can be reduced, thus assuring the performance of the IC device.

Abstract: Herein disclosed is a semiconductor integrated circuit device fabricating process for forming MISFETs over the principal surface in those active regions of a substrate, which are surrounded by inactive regions formed of an element separating insulating film and channel stopper regions, comprising: the step of for forming a first mask by a non-oxidizable mask and an etching mask sequentially over the principal surface of the active regions of the substrate; the step of forming a second mask on and in self-alignment with the side walls of the first mask by a non-oxidizable mask thinner than the non-oxidizable mask of the first mask and an etching mask respectively; the step of etching the principal surface of the inactive regions of the substrate by using the first mask and the second mask; the step of forming the element separating insulating film over the principal surface of the inactive regions of the substrate by an oxidization using the first mask and the second mask; and the step of forming the channel s

Abstract: A rerouting element for a semiconductor device that includes a dielectric film that carries conductive vias, conductive elements, and contact pads. The conductive vias are positioned at locations that correspond to the locations of bond pads of a semiconductor device with which the rerouting element is to be used. The conductive elements, which communicate with corresponding conductive vias, reroute the bond pad locations to corresponding contact pad locations located adjacent to one peripheral edge or two adjacent peripheral edges of the rerouted semiconductor device. The rerouting element is particularly useful for rerouting centrally located bond pads of a semiconductor device, as well as for rerouting the peripheral locations of bond pads of a semiconductor device to one or two adjacent peripheral edges thereof. Methods for designing and using the rerouting element are also disclosed, as are semiconductor device assemblies including one or more rerouting elements.

Abstract: A substrate includes first and second regions over which first and second semiconductor devices are to be respectively positioned. The first region is located at least partially within the second region. Contact areas are located external to the first region, but within the second region. In one embodiment, in which semiconductor devices are to stacked over and secured to the substrate in a flip-chip type arrangement, the contact areas correspond to bond pads of an upper, second semiconductor device, while other contact areas located within the first region corresponding to bond pads of a lower, first semiconductor device. In another embodiment, the contact pads correspond to bond pads of the first semiconductor device, which are electrically connected thereto by way of laterally extending discrete conductive elements, while other contact pads that are located external to the second region correspond to bond pads of the upper, second semiconductor device.

Abstract: A semiconductor device including a package body, a substrate contained within the package body and having a first side and an opposite second side, a first chip mounted on the first side of the substrate and within the package body, a second chip mounted on the second side of the substrate and within the package body and a plurality of leads each including an inner lead portion contained within the package body and an outer lead portion located outside the package body wherein each inner lead portion includes first and second bends to define a step configuration and wherein a distal end of each inner lead portion is mounted to the second side of the substrate.

Abstract: There is provided a semiconductor device in which a plurality of semiconductor chips is stacked in layers and sealed in a package, including: a lower-layer semiconductor chip which is mounted on a package board; an upper-layer semiconductor chip which is stacked via a plurality of spacers on the lower-layer semiconductor chip; at least one first conductor interconnecting electrically at least one first electrode on the lower-layer semiconductor chip and at least one first internal terminal on the package board; at least one second conductor electrically interconnecting at least one second electrode on the upper-layer semiconductor chip and at least one second internal terminal on the package board; and the package for sealing therein the lower-layer semiconductor chip, the upper-layer semiconductor chip, and the at least one first conductor and the at least one second conductor which are all on the package board.

Abstract: A flip-chip bonding structure suited for bonding a first connect pad and a second connect pad. The flip-chip bonding structure includes a metal layer, a bump and an adhesion body. The metal layer is placed on the first connect pad. The bump, lead-free material, is placed on the metal layer. The adhesion body, made of lead-free material, is placed on the bump and is bonded onto the second connect pad.

Abstract: An under-ball-metallurgy layer over a contact pad is provided. The contact pad and corresponding contact surface of the under-bump-metallurgy layer are made of copper. The under-ball-metallurgy layer is constructed from a stack of metallic layers selected from a group consisting of titanium/copper, titanium-tungsten alloy/copper, tantalum/copper, titanium/titanium-nitride compound/copper, tantalum/tantalum-nitride compound/copper, tantalum/nickel-vanadium alloy/copper, tantalum/nickel/copper, copper/nickel-vanadium alloy/copper, titanium/nickel/copper, copper/chromium-copper alloy/copper, or chromium-copper alloy/chromium/chromium-copper alloy/copper.

Abstract: A microelectronic package and method for forming such packages. In one embodiment, the package can be formed by providing a support member having a first surface, a second surface facing opposite the first surface, and a projection extending away from the first surface. A quantity of adhesive material can be applied to the projection to form an attachment structure, and the adhesive material can be connected to a microelectronic substrate with the attachment structure providing no electrically conductive link between the microelectronic substrate and the support member. The microelectronic substrate and the support member can then be electrically coupled, for example, with a wire bond. In one embodiment, the projection can be formed by disposing a first material on a support member while the first material is at least partially flowable, reducing the flowability of the first material, and disposing a second material (such as the adhesive) on the first material.

Abstract: A semiconductor module is provided with a module substrate, a plurality of semiconductor chips formed on the module substrate, and a mold resin formed so as to integrally cover the plurality of semiconductor chips. Then, a plurality of trenches is formed on the main surface of the module substrate, so as to be parallel to one side forming the main surface, on the side on which the bare chips are formed. Thereby, a semiconductor module can be obtained wherein it is possible to restrict separation of the mold resin from the module substrate.

Abstract: A process for preparing a polarizer is described whereby a pre-polarizing article comprising an oriented, vinylalcohol polymer film layer, and an acid donor layer comprising a thermal acid generator, is exposed to radiant energy at a temperature sufficient to effect a partial dehydration of the vinylalcohol polymer to a vinylalcohol/poly(acetylene) copolymer.

Abstract: A method is disclosed for casting a concrete product using two or more different grades of concrete mix, in which method predetermined amounts of different grades of concrete mix are delivered at appropriate instants into the feeder hopper of the slip-form casting machine.

Abstract: A method of utilizing an adjustable height bladder securement mechanism to effect advantageous bladder movement during a loading and shaping process is disclosed. A tire press comprises a lower mold, an upper mold, and a center mechanism. The center mechanism has an upper clamping mechanism for securing the upper periphery of a bladder and a lower clamping mechanism for securing the lower periphery of the bladder. A center mechanism tube has a center rod positioned therein. A piston is disposed within the center mechanism tube. The piston provides reciprocating motion to the center rod. A position sensor mechanism is operatively associated with the center mechanism.

Abstract: Method for mold clamping of the present invention is capable of shortening a molding cycle without any initial setting works for an engaging position of a tie bars. The method is constituted the steps of moving the tie bars in the direction of mold closing during mold close operation, judging a relative moving speed between a movable die plate and the tie bar to be within a predetermined value, engaging the tie bars with the movable die plate mechanically by operating an engaging means when the relative moving speed is judged to be within the value, then further moving the movable die plate against a fixed die plate under engagement, and after contact of a movable mold with a fixed mold driving a mold clamping cylinder, thereby executing mold clamping operation.