Patents Issued in January 6, 2004
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Patent number: 6673496Abstract: A film-type lithium secondary battery in which at least one of a positive electrode (2), a negative electrode (3) and a separator (1) contains an electrolyte having a specified structure, the electrolyte having the above specified structure is composed of a liquid electrolyte and an organic polymer, the organic polymer is formed by polymerizing an organic monomer having a polymeric functional group at its molecular chain end, the organic polymer contains in its molecule a first chemical structure and a second chemical structure, the first chemical structure is at least one of an ethylene oxide structure and a propylene oxide structure, and the second chemical structure is at least one kind selected from among an alkyl structure, a fluoroalkyl structure, a benzene structure, an ether group and an ester group.Type: GrantFiled: July 27, 1999Date of Patent: January 6, 2004Assignee: Yuasa CorporationInventors: Hiroe Nakagawa, Seijiro Ochiai, Syuichi Izuchi
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Patent number: 6673497Abstract: Novel volume holographic elements were made from Bragg diffractive gratings in photo-thermo-refractive (PTR) glass with absolute diffraction efficiency ranging from greater than approximately 50% up to greater than approximately 93% and total losses below 5%. Both transmitting and reflecting volume diffractive elements were done from PTR glasses because of high spatial resolution enabling recording spatial frequencies up to 10000 mm−1. The use of such diffractive elements as angular selector, spatial filter, attenuator, switcher, modulator, beam splitter, beam sampler, beam deflectors controlled by positioning of grating matrix, by a small-angle master deflector or by spectral scanning, selector of particular wavelengths (notch filter, add/drop element, spectral shape former (gain equalizer), spectral sensor (wavelength meter/wavelocker), angular sensor (pointing locker), Bragg spectrometer (spectral analyzer), transversal and longitudinal mode selector in laser resonator were described.Type: GrantFiled: December 28, 2000Date of Patent: January 6, 2004Assignee: University of Central FloridaInventors: Oleg M. Efimov, Leonid B. Glebov, Vadim I. Smirnov
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Patent number: 6673498Abstract: A method of forming a reticle is provided. In general, a metal containing material is vaporized through simple vaporization. The metal containing material is condensed on a substrate to form a metal containing layer on the substrate. A patterned photoresist layer is formed over the metal containing layer, defining exposed metal containing layer regions and covered metal containing layer regions. The metal containing layer in the exposed metal containing layer regions is removed from the substrate, while the metal containing layer in the covered metal containing layer regions remains on the substrate to form a metal containing mask. The substrate is plasma etched. The remaining metal containing layer is removed from the substrate.Type: GrantFiled: November 2, 2001Date of Patent: January 6, 2004Assignee: LSI Logic CorporationInventors: Sheldon Aronowitz, Vladimir Zubkov, Richard Schinella
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Patent number: 6673499Abstract: An organophotoreceptor comprising (a) at least one photoconductive element capable of retaining an electrophotographic latent image; (b) an electrically conductive substrate having an electrically conductive surface; (c) an electrically conductive ground stripe adjacent to the photoconductive element and in electrical contact with the electrically conductive substrate, wherein the electrically conductive ground stripe comprising a film forming binder, conductive particles, inorganic particles having a Mohs hardness greater than 5, and a surfactant; (d) at least a charge transport compound; and (e) at least a charge generating compound.Type: GrantFiled: October 23, 2001Date of Patent: January 6, 2004Assignee: Samsung Electronics Co., Ltd.Inventors: Nam Jeong Lee, Zbigniew Tokarski, Kam Wah Law
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Patent number: 6673500Abstract: A process comprising applying a toner security mark on a document generated by xerographic means, and which mark possesses white glossy characteristics, and wherein said toner is comprised of a waterborne polymer resin and a colorant, and optionally a second security mark generated by a toner comprised of a waterborne polymer resin and a UV fluorescent component.Type: GrantFiled: August 20, 2002Date of Patent: January 6, 2004Assignee: Xerox CorporationInventors: Raj D. Patel, Fatima M. Mayer, Michael A. Hopper, Kurt I. Halfyard
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Patent number: 6673501Abstract: Disclosed is a toner comprising particles of a polyester resin, an optional colorant, and polypyrrole, wherein said toner particles are prepared by an emulsion aggregation process. Another embodiment of the present invention is directed to a process which comprises (a) generating an electrostatic latent image on an imaging member, and (b) developing the latent image by contacting the imaging member with charged toner particles comprising a polyester resin, an optional colorant, and polypyrrole, wherein said toner particles are prepared by an emulsion aggregation process.Type: GrantFiled: November 28, 2000Date of Patent: January 6, 2004Assignee: Xerox CorporationInventors: James R. Combes, Karen A. Moffat, Maria N. V. McDougall
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Patent number: 6673502Abstract: A carrier for the development of an electrostatic latent image, comprising a core material and a resin coating the core material therewith, wherein the coating resin comprises a copolymer of at least four kinds of monomers including: (1) a monomer containing a carboxyl group; (2) an acrylic acid alkylester monomer or methacrylic acid alkylester monomer, containing a C1-C3 linear alkyl group; (3) an acrylic acid alkylester monomer or methacrylic acid alkylester monomer, containing a C4-C10 linear alkyl group or C3-C10 branched alkyl group; and (4) a monomer containing fluorine. Also disclosed is a two-component developer for the development of an electrostatic latent image, comprising a toner and the carrier.Type: GrantFiled: October 16, 2001Date of Patent: January 6, 2004Assignee: Fuji Xerox Co., Ltd.Inventors: Sakon Takahashi, Hiroshi Nakazawa, Tomohito Nakajima, Masahiro Takagi, Atsuhiko Eguchi
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Patent number: 6673503Abstract: A reactive toner that is energy-activated is printed by means of an electrographic device such as a laser printer. The reactive toner is printed onto a substrate. Toner components that cross-link and bond the printed toner permanently onto the substrate, or another substrate through a transfer process, are activated by the application of energy to react after printing. Reaction of the energy-activated components may be inhibited with blocking or protecting agents. The image is permanently bonded onto the substrate when the protection provided by the protecting agents is removed by the application of energy to the printed toner. The toner may comprise energy-activated components, colorants, color enhancing polymeric materials, binder resins, internal and external additives such as waxes and charge control agents.Type: GrantFiled: October 15, 2001Date of Patent: January 6, 2004Inventors: Barbara Wagner, Rebecca Silveston, Ming Xu
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Patent number: 6673504Abstract: A method for applying a coating to a surface of a material while using electrophotography. According to this invention, a supporting material provided with a photoconductive layer has an electrostatic charge pattern, a coating material is applied to the supporting material with the aid of electrostatic forces, and the coating material is applied to the subject to be coated. In order to produce high-quality surface coatings, according to this invention, at least the duromer constituents including a resin and a hardener are applied, together or in succession, as a coating material to the supporting material.Type: GrantFiled: April 26, 2002Date of Patent: January 6, 2004Inventors: Michael Zimmer, Horst Stedron, Waldemar Weinberg
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Patent number: 6673505Abstract: A process for the preparation of a toner by mixing a colorant, a latex, optionally a wax and a polyamine salt coagulant to form toner size aggregates, wherein the polyamine salt is then neutralized or converted to an amide or hydrolyzed to an acid by the introduction of a base followed by a pH reduction with an acid to enable rapid coalescence or fusion of the aggregates.Type: GrantFiled: March 25, 2002Date of Patent: January 6, 2004Assignee: Xerox CorporationInventors: Lu Jiang, Armin R. Volkel, Chieh-Min Cheng, Michael A. Hopper, Walter Mychajlowskij, Raj D. Patel
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Patent number: 6673506Abstract: In a toner production process having at least a kneading step, a pulverization step using a mechanical grinding machine, and a classification step, the grinding means comprises a mechanical grinding machine having at least a rotor which is a rotator attached to the center rotating shaft and a stator which is provided around the rotor, keeping a constant gap between the stator and the rotor surface, the grinding machine being so constructed that a circular space formed by keeping the gap stands airtight, and the surface of at least one of the rotor and the stator is coated by the plating of a chromium alloy containing at least chromium carbide.Type: GrantFiled: December 14, 2001Date of Patent: January 6, 2004Assignee: Canon Kabushiki KaishaInventors: Tsuneo Nakanishi, Hirohide Tanikawa, Tsutomu Onuma, Nobuyuki Okubo, Kaori Hiratsuka
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Patent number: 6673507Abstract: A radiographic silver halide film has improved processability because it includes a silver halide emulsion composed of cubic grains having a critical molar ratio of chloride, iodide, and bromide. In particular, the cubic grains comprise from about 1 to about 20 mol % of chloride and from about 0.25 to about 1.5 mol % of iodide, with the remainder being bromide. The cubic grains also have an ECD of from about 0.65 to about 0.8 &mgr;m. This film is particularly useful in mammography for imaging dense soft tissue.Type: GrantFiled: May 19, 2003Date of Patent: January 6, 2004Assignee: Eastman Kodak CompanyInventors: Robert E. Dickerson, Anthony Adin, Richard E. Beal, Anthony D. Gingello
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Patent number: 6673508Abstract: A planographic printing plate material and a method of preparing a planographic printing plate are disclosed, the planographic printing plate material comprising a support and provided thereon, one or more structural layers containing light sensitive silver halide grains, organic silver salt grains, a reducing agent, a contrast-increasing agent and a physical developing nucleus.Type: GrantFiled: March 12, 2002Date of Patent: January 6, 2004Assignee: Konica CorporationInventor: Takeshi Sampei
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Patent number: 6673509Abstract: The invention relates to a photopolymerizable recording element and process for preparing flexographic printing forms, whereby the photo-polymerizable recording element comprises a support, at least one photo-polymerizable layer, an adhesive wax layer, and a layer sensitive to infrared radiation and opaque to actinic radiation.Type: GrantFiled: February 24, 2000Date of Patent: January 6, 2004Assignee: E. I. du Pont de Nemours and CompanyInventor: Berhnard Metzger
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Patent number: 6673510Abstract: The present invention provides a photosensitive composition comprising an infrared absorbing agent represented by the following formula (I) and a polymer compound which is insoluble in water and soluble in an aqueous alkali solution and becoming soluble in an aqueous alkali solution by radiation of an infrared laser. In the formula described below, R1 and R2 independently represent an alkyl group having 1 to 18 carbon atoms or an alkyl group having 9 to 30 carbon atoms and Z represents a heptamethine group which may have a substituent. The definitions of other substituents are shown in the specification. According to the present invention, a photosensitive composition having high development latitude and storage stability, together with a positive type planographic printing plate for direct plate-making which can form an image with high sensitivity by using an infrared laser, are provided.Type: GrantFiled: October 19, 2000Date of Patent: January 6, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Ippei Nakamura, Hiromichi Kurita
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Patent number: 6673511Abstract: Although use of a nitrogen-containing compound as a basic compound component of a resist composition makes it possible to ease the T-top problem at an acid dissociation constant pKa falling within a range of 2 to 6, it is accompanied with the problem that the reaction, that is, acid diffusion upon use of a highly-reactive acid-labile group cannot be controlled. In order to overcome this problem, one or more basic compounds selected from those represented by the following formulas (I) to (III) and (1) to (4) are employed.Type: GrantFiled: October 27, 2000Date of Patent: January 6, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Youichi Ohsawa, Takeru Watanabe
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Patent number: 6673512Abstract: A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray, which is excellent in sensitivity and resolution and has a rectangular profile, comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, and a crosslinking agent which initiates crosslinking by the acid:Type: GrantFiled: January 17, 2001Date of Patent: January 6, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuya Uenishi, Yutaka Adegawa, Koji Shirakawa
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Patent number: 6673513Abstract: There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure: wherein X is one of a linear alkyl vinyl ether and a cyclic alkyl vinyl ether, which are respectively represented by the structures wherein y is one of the integer values 1 through 4, R1 is one of a hydrogen atom and a methyl group, R2 is a C1 to C20 hydrocarbon, and R3 is one of a hydrogen atom, a C1 to C3 alkyl group and an alkoxy group.Type: GrantFiled: January 19, 2001Date of Patent: January 6, 2004Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Hyun-woo Kim
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Patent number: 6673514Abstract: A thermally imagable article comprises a substrate on which is coated a positive working heat-sensitive composition comprising a hydroxyl group-containing polymer and a heat-labile moiety which decreases the developer solubility of the composition as compared to the developer solubility of the composition without the heat-labile moiety, wherein the heat-sensitive composition does not comprise an acid generating moiety. The invention also provides novel positive working compositions comprising heat-labile moieties, and imagable articles comprising said compositions.Type: GrantFiled: September 7, 2001Date of Patent: January 6, 2004Assignee: Kodak Polychrome Graphics LLCInventors: Anthony Paul Kitson, Diane Cook, Kevin Barry Ray, Colin Adrian Wright
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Patent number: 6673515Abstract: The invention provides a polymer comprising recurring units of formula (1—1) or (1-2) wherein k is 0 or 1, m is 0, 1, 2, 3 or 4, and n is 1 or 2 and having a weight average molecular weight of 1,000 to 500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.Type: GrantFiled: September 14, 2001Date of Patent: January 6, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe, Jun Hatakeyama
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Patent number: 6673516Abstract: A coating composition for a chemically amplified positive resist includes (A) an acid generator which generates an acid upon irradiation with active light or radiant ray, (B) a resin ingredient which exhibits increased solubility in an alkaline aqueous solution by action of an acid, (C) an organic solvent, and (D) an octanone in a proportion of from 0.1 to 5 parts by weight relative to 100 parts by weight of the ingredient (B). Using this coating composition, a method of patterning a resist. The coating composition and the method can yield a positive resist having improved definition and depth of focus.Type: GrantFiled: November 6, 2001Date of Patent: January 6, 2004Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Satoshi Kumon, Kazufumi Sato
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Patent number: 6673517Abstract: A polymer comprising recurring units of formula (1) and/or (2) wherein R1 and R2 are H, C1-15 alkyl, acyl or alkylsulfonyl or C2-15 alkoxycarbonyl or alkoxyalkyl which may have halogen substituents; R3 and R4 are H, C1-15 alkyl or alkoxy or C2-15, alkoxyalkyl which may have halogen substituents, and R3 and R4 may together bond with the carbon atom to form an aliphatic ring, or R3 and R4, taken together, may be an oxygen atom; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.Type: GrantFiled: December 6, 2001Date of Patent: January 6, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tsunehiro Nishi, Takeshi Kinsho
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Patent number: 6673518Abstract: A polymer comprising recurring units of formula (1) wherein R1 is H or methyl, R2 is H or C1-8 alkyl, R3 is hydrogen or CO2R4, and R4 is C1-15 alkyl and recurring units having a carboxylic acid protected with an acid-decomposable protecting group containing an adamantane or tetracyclo-[4.4.0.12,5.17,10]dodecane structure and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution and etching resistance and lends itself to micropatterning with electron beams or deep-UV.Type: GrantFiled: June 14, 2002Date of Patent: January 6, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tsunehiro Nishi, Koji Hasegawa, Takeshi Kinsho
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Patent number: 6673519Abstract: A printing plate for computer-to plate lithography having a laser-ablatable member supported by a substrate. At least one portion of the laser-ablatable member is formed form an acrylic polymer containing laser-sensitive particles. The laser-sensitive particles absorb imaging radiation and cause the portion of the laser-ablatable member containing the laser sensitive particles and any overlying layers to be ablated. Alternatively, the printing plate may include a printing member with an initial affinity for a printing fluid that changes to another affinity to printing fluid upon treatment with radiation.Type: GrantFiled: July 14, 2001Date of Patent: January 6, 2004Assignee: Alcoa Inc.Inventors: David S. Bennett, Sallie L. Blake, Robert E. Bombalski, Daniel L. Serafin, Jean Ann Skiles
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Patent number: 6673520Abstract: A desired pattern is formed in a photoresist layer that overlies a semiconductor wafer using a reflective mask. This mask is formed by consecutively depositing a reflective layer, an absorber layer and an anti-reflective (ARC) layer. The ARC layer is patterned according to the desired pattern. The ARC layer is inspected to find areas in which the desired pattern is not achieved. The ARC layer is then repaired to achieve the desired pattern with the absorber layer protecting the reflective layer. The desired pattern is transferred to the absorber layer to reveal the reflective portion of mask. Radiation is reflected off the reflective mask to the semiconductor wafer to expose the photoresist layer overlying the semiconductor wafer with the desired pattern.Type: GrantFiled: August 24, 2001Date of Patent: January 6, 2004Assignee: Motorola, Inc.Inventors: Sang-in Han, Pawitter Mangat, James R. Wasson, Scott D. Hector
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Patent number: 6673521Abstract: A process of silylation of object surfaces using a mixture of a silylation agent in admixture with an inert liquified gas, such as carbon dioxide.Type: GrantFiled: December 12, 2000Date of Patent: January 6, 2004Assignee: lnternational Business Machines CorporationInventors: Wayne M. Moreau, Kenneth J. McCullough, David R. Medeiros, John P. Simons, Charles J. Taft
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Patent number: 6673522Abstract: A method of fabricating a plasma display panel includes forming one or more electrodes on a substrate, forming a dielectric layer on the first electrode including the substrate, laminating a dry film photoresist on the dielectric layer, patterning the dry film photoresist using a mask, forming one or more capillary discharge sites in the dielectric layer using sand blasting, and removing the patterned dry film photoresist from the substrate. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.Type: GrantFiled: March 13, 2002Date of Patent: January 6, 2004Assignee: Plasmion Displays LLCInventors: Dae-Il Kim, Steven Kim
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Patent number: 6673523Abstract: A resist film is formed by applying, on a semiconductor substrate, a resist material including at least one atom or group selected from the group consisting of a halogen atom, a cyano group, a nitro group, an alkoxy group, an amino group, an alkyl group, a trifluoromethyl group and a mercapto group. The resist film is irradiated with exposing light of a wavelength of a 1 nm through 180 nm band for pattern exposure, and the resist film is developed after the pattern exposure, so as to form a resist pattern.Type: GrantFiled: March 8, 2000Date of Patent: January 6, 2004Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Shinji Kishimura, Akiko Katsuyama, Masaru Sasago
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Patent number: 6673524Abstract: An exemplary method of forming an attenuating extreme ultraviolet (EUV) phase-shifting mask is described. This method can include providing a multi-layer mirror over an integrated circuit substrate or a mask blank, providing a buffer layer over the multi-layer mirror, providing a dual element material layer over the buffer layer, and selectively growing features on the integrated circuit substrate or mask blank using a photon assisted chemical vapor deposition (CVD) process when depositing the dual element layer.Type: GrantFiled: February 9, 2001Date of Patent: January 6, 2004Inventors: Kouros Ghandehari, Bruno LaFontaine, Bhanwar Singh
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Patent number: 6673525Abstract: A method for patterning of resist surfaces which is particularly advantageous for systems having low photon flux and highly energetic, strongly attenuated radiation. A thin imaging layer is created with uniform silicon distribution in a bilayer format. An image is formed by exposing selected regions of the silylated imaging layer to radiation. The radiation incident upon the silyliated resist material results in acid generation which either catalyzes cleavage of Si—O bonds to produce moieties that are volatile enough to be driven off in a post exposure bake step or produces a resist material where the exposed portions of the imaging layer are soluble in a basic solution, thereby desilylating the exposed areas of the imaging layer. The process is self limiting due to the limited quantity of silyl groups within each region of the pattern. Following the post exposure bake step, an etching step, generally an oxygen plasma etch, removes the resist material from the de-silylated areas of the imaging layer.Type: GrantFiled: February 22, 2000Date of Patent: January 6, 2004Assignee: EUV LLCInventor: David R. Wheeler
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Patent number: 6673526Abstract: A pattern formation method and method and apparatus for production of a semiconductor device using that method which irradiate light from a light source to a phase shifting mask through a fly's-eye lens comprised of an assembly of a plurality of lenses, transfer the pattern of the phase shifting mask onto the substrate, and form the pattern on the substrate, wherein the amount of light made incident upon the center portion of the fly's-eye lens is lowered by 2 to 90 percent, preferably 10 to 90 percent, further preferably 20 to 80 percent or 20 to 60 percent, relative to the amount of light incident upon the peripheral portion of the fly's-eye lens.Type: GrantFiled: August 23, 1995Date of Patent: January 6, 2004Assignee: Sony CorporationInventors: Tohru Ogawa, Masaya Uematsu
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Patent number: 6673527Abstract: A color developer solution capable of inhibiting precipitation or tar-staining occurring in the processing tank or the roller rack, even when being processed rapidly or at low replenishing rate and a concentrated composition thereof is disclosed, comprising at least one selected from specified N-disubstituted hydroxylamine derivatives and at least one selected from specified N-monosubstituted hydroxylamine derivatives in a molar ratio falling within the range of 1000:1 to 1:1.Type: GrantFiled: July 29, 2002Date of Patent: January 6, 2004Assignee: Konica CorporationInventor: Hiroshi Yamashita
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Patent number: 6673528Abstract: A black-and-white photographic developing composition has improved stability and is more compatible with the environment when discarded. The composition includes one or more ascorbic acid developing agents and is essentially free of hydroquinone and similar developing agents. It comprises a mono- or disaccharide such as ribose, fructose, lactose, glucose or galactose as a stabilizing agent for the developing agent.Type: GrantFiled: January 23, 2003Date of Patent: January 6, 2004Assignee: Eastman Kodak CompanyInventors: Shirleyanne E. Haye, Janet M. Huston, Jacques Roussilhe
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Patent number: 6673529Abstract: A process of preparing a high bromide tabular grain emulsion comprising a dispersion medium and silver halide grains including tabular grains having {111} major faces and an aspect ratio of at least 2, which contain greater than 50 mole percent bromide, based on silver, and which account for greater than 50 percent of total grain projected area, where such tabular grains have an average aspect ratio of at least 5, the process comprising (i) in a grain nucleation step creating in a dispersing medium tabular silver halide grain nuclei containing parallel twin planes and (ii) in a grain growth step subsequently growing the tabular grain nuclei into tabular grains in a silver halide reaction vessel by adding a silver ion source and a halide ion source to the reaction vessel and precipitating silver halide onto the tabular grain nuclei, wherein thiocyanate ion is introduced into the silver halide reaction vessel prior to the addition of at least the final 10 mole percent of the total silver added to theType: GrantFiled: July 11, 2002Date of Patent: January 6, 2004Assignee: Eastman Kodak CompanyInventors: Richard L. Daubendiek, Jon N. Eikenberry, Barbara J. Fisher, Timothy R. Gersey, Joseph G. Lighthouse, Douglas L. Oehlbeck
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Patent number: 6673530Abstract: Variation of charged amount accompanying production amount change does not affect photograph performance, a flexible production of an optimal amount corresponding to commercial scene needs may be performed, and a silver halide emulsion having monodispersibility may be produced with sufficient productivity. In the first line a series of continuous operations are performed that a silver salt aqueous solution, a halide salt aqueous solution, and a hydrophilic dispersion medium aqueous solution are mixed and reacted to generate silver halide grain nuclei, and a mother liquor containing the silver halide grain nuclei is stored in cooled state until a amount of production reaches a desired production amount of a silver halide emulsion.Type: GrantFiled: September 30, 2002Date of Patent: January 6, 2004Assignee: Fuji Photo Film Co., Ltd.Inventor: Hirokazu Saito
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Patent number: 6673531Abstract: A silver halide emulsion is disclosed, comprising at least one monovalent Au(I) complex coordinated with a compound represented by the following formula (1): R1—Ch—R2 (1) wherein R1 and R2 each independently represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group, R1 and R2 may combine with each other to form a 3-, 4-, 5-, 6- or 7-membered ring, and Ch represents a sulfur atom, a selenium atom or a tellurium atom.Type: GrantFiled: March 1, 2002Date of Patent: January 6, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Hiroyuki Suzuki, Hirotomo Sasaki
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Patent number: 6673532Abstract: The inventive bioprocessing system (and technique) relies on non-invasive optical chemical sensing technology wherein an optical excitation source excites an optical chemical sensor. The optical chemical sensor then emits luminescence or absorbs light which is measured by a detector. The luminescence emitted from the chemical sensor or the amount of light absorbed by the chemical sensor is related to the concentration of an analyte, such as oxygen. If the luminescence emitted changes, or if the amount of light absorbed changes, then the concentration of the analyte has changed. Using such a system to measure and adjust multiple parameters at one time allows one to efficiently and cost-effectively determine optimal conditions for a given cell type and/or cell environment, for example.Type: GrantFiled: August 14, 2001Date of Patent: January 6, 2004Assignee: University of Maryland, Baltimore CountyInventor: Govind Rao
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Patent number: 6673533Abstract: Materials and methods are provided for producing patterned multi-array, multi-specific surfaces for use in diagnostics. The invention provides for electrochemiluminescence methods for detecting or measuring an analyte of interest. It also provides for novel electrodes for ECL assays. Materials and methods are provided for the chemical and/or physical control of conducting domains and reagent deposition for use multiply specific testing procedures.Type: GrantFiled: September 17, 1997Date of Patent: January 6, 2004Assignee: Meso Scale Technologies, LLC.Inventors: Jacob N. Wohlstadter, James Wilbur, George Sigal, Mark Martin, Liang-Hong Guo, Alan Fischer, Jon Leland, Mark A. Billadeau, Larry R. Helms, Ramin Darvari
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Patent number: 6673534Abstract: Methods for detecting allelic variants of the myostatin (growth and differentiation factor-8) gene are provided. Specifically provided are methods of identifying subjects having or having a predisposition for increased muscle mass as compared to subjects having wild-type myostatin. Increased muscle mass is particularly desirable for identification of animals used to produce food products, including bovine, porcine, ovine, avian and piscine species.Type: GrantFiled: November 10, 1997Date of Patent: January 6, 2004Assignee: The Johns Hopkins University School of MedicineInventors: Se-Jin Lee, Alexander C. McPherron
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Patent number: 6673535Abstract: The present invention provides isolated nucleic acids encoding human SCA2 protein, or fragments thereof, and isolated SCA2 proteins encoded thereby. Further provided are vectors containing invention nucleic acids, probes that hybridize thereto, host cells transformed therewith, antisense oligonucleotides thereto and compositions containing antibodies that specifically bind to invention polypeptides, as well as transgenic non-human mammals that express the invention protein. In addition, methods for diagnosing spinocerebellar Ataxia Type 2 are provided.Type: GrantFiled: May 22, 1998Date of Patent: January 6, 2004Assignee: Cedars-Sinai Medical CenterInventor: Stefan M. Pulst
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Patent number: 6673536Abstract: The present invention provides methods and systems, particularly computer systems, for determining the relative specificity with which a particular polynucleotide molecule hybridizes to a polynucleotide probe. For example, the methods and systems of the invention enable a user to compare the specificity with which different polynucleotides hybridize to a given probe and/or rank these polynucleotides according to their specificity to that probe. The methods and systems of the invention also enable a user to compare the specificity with which a particular polynucleotide hybridizes to different probes, and/or rank those different probes according to their specificity for that particular polynucleotide.Type: GrantFiled: September 29, 1999Date of Patent: January 6, 2004Assignee: Rosetta Inpharmatics LLC.Inventors: Roland Stoughton, Julja Burchard, Stephen H. Friend
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Patent number: 6673537Abstract: The invention is directed to novel promoters or mutants thereof from Chlorella virus DNA methyltansferase genes. A Chlorella virus gene promoter is operably linked to a first and/or second DNA sequence encoding a gene that is different from the Chlorella virus to form an expression cassette. An expression cassette can be introduced into prokaryotic and/or eukaryotic cells and can provide for a high level of expression of the gene encoded by the first and/or second DNA sequence. The invention also provides a method for screening other Chlorella virus genes for promoters that can function to express a heterologous gene in prokaryotic and/or eukaryotic hosts.Type: GrantFiled: October 12, 1999Date of Patent: January 6, 2004Assignee: Board of Regents, University of Nebraska-LincolnInventors: Amitava Mitra, James L. Van Etten
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Patent number: 6673538Abstract: Methods and compositions are described for determining a statistically significant number of different strains within a species of bacteria indicative of the species population structure as a whole in order to permit the evaluation of a vaccine target.Type: GrantFiled: April 21, 2000Date of Patent: January 6, 2004Assignee: The Trustees of Boston UniversityInventor: Richard N. Goldstein
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Patent number: 6673539Abstract: A method of increasing the fluorous nature of a compound includes the step of reacting the compound with at least one second compound having the formula: wherein Rf is a fluorous group and m is 0, 1 or 2.Type: GrantFiled: May 31, 2000Date of Patent: January 6, 2004Assignee: University of PittsburghInventors: Peter Wipf, Jon Reeves, Stephan Roever
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Patent number: 6673540Abstract: This invention relates to modified host cells which express heterologous fused proteins and methods of screening for test samples having peptide binding activity; wherein the modified host cell comprises: (a) a gene sequence encoding a heterologous fusion protein; the fusion protein comprising a first peptide of a peptide binding pair, or segment of the first peptide, which is joined to either a DNA binding domain or its corresponding transcriptional activation domain of a transcriptional activation protein; (b) a gene sequence encoding a heterologous fusion protein, the fusion protein comprising a second peptide of the peptide binding pair in (a), or a segment thereof, fused to either a DNA binding domain or its corresponding transcriptional activation domain, whichever one is not employed in (a); (c) a reporter gene operatively associated with the transcriptional activation protein, or a portion thereof; (d) optionally, a deletion or mutation in the chromosomal DNA of the host cell for the transcriptional aType: GrantFiled: November 17, 2000Date of Patent: January 6, 2004Assignee: American Cyanamid CompanyInventors: Kathleen H. Young, Bradley A. Ozenberger
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Patent number: 6673541Abstract: The present invention relates to a novel method for the amplification of DNA, this method being particularly useful for the amplification of the DNA or the whole genome of a single cell, chromosomes or fragments thereof. Described is also the use of the method in DNA analysis for medical, forensic, diagnostic or scientific purposes, like comparative genomic hybridization (CGH)-, fluorescence in situ hybridization (FISH)-, polymerase chain reaction (PCR)-, single strand conformation polymorphism (SSCP)-, DNA sequence-, “loss of heterozygosity” (LOH)-, fingerprint- and/or restriction fragment length polymorphism (RFLP)-analysis.Type: GrantFiled: June 18, 2001Date of Patent: January 6, 2004Assignee: Micromet AGInventors: Christoph Klein, Oleg Schmidt-Kittler
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Patent number: 6673542Abstract: A method for assaying a sample for a nucleic acid damaging activity using at least one singular double-stranded nucleic acid with at least one electrochemiluminescent label, and a method for measuring an inhibitor of a nucleic acid damaging activity with at least one singular double-stranded nucleic acid using at least one electrochemiluminescent label, are disclosed.Type: GrantFiled: March 7, 2001Date of Patent: January 6, 2004Assignee: IGEN International Inc.Inventors: Jeffrey A. Heroux, George B. Sigal, Reid W. von Borstel
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Patent number: 6673543Abstract: The invention provides solid support synthetic methods for producing combinatorial libraries of modulators of LXRs. The combinatorial libraries thus produced are useful both as diagnostic indicators of LXR&agr; function and as pharmacologically active agents. The combinatorial libraries find particular use in the treatment of disease states associated with cholesterol metabolism, particularly atherosclerosis and hypercholesterolemia.Type: GrantFiled: April 4, 2001Date of Patent: January 6, 2004Assignees: Tularik, Inc., Sumitomo Pharmaceuticals Co., Ltd.Inventors: Julio Medina, Naonori Imazaki
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Patent number: 6673544Abstract: The present invention relates to a method for the photolithographic synthesis of biochips in which photolabile protective groups of the 2-(2-nitrophenyl)ethyl type are used, whereby the irradiation step that is common in the photolithographic chip synthesis is carried out in the presence of a base, preferably a secondary or uerriary base.Type: GrantFiled: November 28, 2001Date of Patent: January 6, 2004Assignee: Deutsches Krebsforschungszentrum Stiftung des öffentlichen RechtsInventors: Markus Beier, Stefan Matysiak, Jorg Hoheisel
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Patent number: 6673545Abstract: The present invention relates to a composition comprising a plurality of cDNAs which are differentially expressed in prostate cancer and which may be used in their entirety or in part as to diagnose, to stage to treat or to monitor the treatment of a subject with prostate cancer.Type: GrantFiled: July 30, 2001Date of Patent: January 6, 2004Assignee: Incyte CorporationInventors: Mary Faris, Christopher M. Turner