Patents Issued in February 17, 2004
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Patent number: 6692864Abstract: A battery pack suppresses temperature rise of secondary battery during charging and discharging. The battery pack includes a plurality of batteries stacked up, a case enclosing the plurality of batteries, a heat collector disposed near the battery positioned in the center of the plurality of batteries, a heat radiator placed at one side of the case, and a first heat transfer unit placed for connecting the heat collector and heat radiator. Further, the battery pack includes a heat transfer plate placed at the other side of the case, and a second heat transfer unit placed between the heat collector and heat transfer plate.Type: GrantFiled: June 4, 2001Date of Patent: February 17, 2004Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Yoshitaka Dansui, Hironori Ura, Sadaaki Yokoo, Michio Hirota
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Patent number: 6692865Abstract: A new sandwich cathode design is provided having a first cathode structure of a first cathode active material of a relatively low energy density but of a relatively high rate capability, for example SVO, mixed with a second cathode active material having a relatively high energy density but a relatively low rate capability, for example CFx, with the percentage of SVO being less than that of CFx and sandwiched between two current collectors. Then, a second cathode mixture of SVO and CFx active materials is contacted to the outside of the current collectors. However, the percentage of SVO to CFx is greater in the second structure than in the first. Such an exemplary cathode design might look like: (100−y)% SVO+y% CFx, wherein 0≦y≦100/current collector/(100−x)% SVO+x% CFx, wherein 0≦x≦100/current collector/(100−y)% SVO+y% CFx, wherein 0≦y≦100, and wherein the ratio of x to y is selected from the group consisting of y<x, x<y and x=y.Type: GrantFiled: October 24, 2001Date of Patent: February 17, 2004Assignee: Wilson Greatbatch Ltd.Inventors: Hong Gan, Esther S. Takeuchi
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Patent number: 6692866Abstract: The present invention provides a lamination type secondary battery, in which accurate positioning can be performed for positive electrodes and negative electrodes arranged face-to-face to each other. The invention provides a lamination type secondary battery, which comprises positive electrodes and negative electrodes having different surface areas, said positive electrodes and said negative electrodes being laminated on each other with a separator between them, each of the electrodes having smaller surface area is arranged at the center with equal spacing from outer periphery of a separator main body and is covered with the separator main body, and outer periphery of each of the electrodes having larger surface area is equal in size with outer periphery of the separator main body to cover the electrode having smaller surface area.Type: GrantFiled: February 25, 2002Date of Patent: February 17, 2004Assignees: NEC Mobile Energy Corporation, NEC CorporationInventors: Hideto Watanabe, Katsuichi Mogami, Eiko Motegi
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Patent number: 6692867Abstract: A method for removing a pin from a battery assembly by the step of providing a separator comprising: a microporous membrane having an exterior surface portion of polypropylene, the polypropylene including at least 50 ppm of metallic stearate, preferably calcium stearate Static and being adapted to exhibit a pin removal force ≦7100 g.Type: GrantFiled: October 12, 2001Date of Patent: February 17, 2004Assignee: Celgard Inc.Inventors: Robert A. Nark, Ronald W. Call, Donald K. Simmons, Mark W. Ferebee
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Patent number: 6692868Abstract: Battery separators made of a wettable, uniform mat of melt blown fibers. The melt blown fibers are thermally bonded to one another. These fibers are made of a thermoplastic material. The fibers have a diameter in the range of 0.1 to 13 microns (&mgr;) and lengths greater than 12 millimeters (mm). The mat has a basis weight ranging from 6 to 160 grams per square meter (g/m2), a thickness of less than 75 microns (&mgr;), and an average pore size of 0.3 to 50 microns (&mgr;).Type: GrantFiled: December 19, 2001Date of Patent: February 17, 2004Assignee: Daramic, Inc.Inventor: Jerry Zucker
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Patent number: 6692869Abstract: The objective of the present invention is to produce a surface treated steel sheet for a battery container of which electric contact to the positive electrode active material is improved, a method of surface treatment for a battery container, a battery container and a battery, wherein the surface treated steel sheet has a graphite dispersed nickel plating layer or a graphite dispersed nickel-alloy plating layer formed on the one side to be the inner surface of a battery container, in which nickel-cobalt alloy, nickel-cobalt-iron alloy, nickel-manganese alloy, nickel-phosphorus alloy, nickel-bismuth alloy or the like is preferable as an alloy plating layer, the battery container is manufactured from these surface treated steel sheets by DI forming or DTR forming, and the battery uses this battery container.Type: GrantFiled: April 23, 2001Date of Patent: February 17, 2004Assignee: Toyo Kohan Co., Ltd.Inventors: Hitoshi Ohmura, Tatsuo Tomomori, Hideo Ohmura, Keiji Yamane
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Patent number: 6692870Abstract: The present invention provides an improved electrode material for a lithium secondary battery to provide a lithium secondary battery that is light in weight and has high energy density. Sulfur and a catalyst material such as active carbon, and the like, that reduces activation energy of an addition reaction of lithium to sulfur and allows the reaction to occur at not greater than 60° C., are included in the electrode material.Type: GrantFiled: April 24, 2001Date of Patent: February 17, 2004Assignee: Sanyo Electric Co., Ltd.Inventors: Masahide Miyake, Masahisa Fujimoto, Shin Fujitani
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Patent number: 6692871Abstract: A new sandwich cathode design having a first cathode active material of a relatively low energy density but of a relatively high rate capability sandwiched between two current collectors and with a second cathode active material having a relatively high energy density but of a relatively low rate capability in contact with the opposite sides of the two current collectors, is described. The present cathode design is relatively safer under short circuit and abuse conditions than cells having a cathode active material of a relatively high rate density but a relatively low energy capability alone. A preferred cathode is: CFx/current collector/SVO/current collector/CFx. The SVO provides the discharge end of life indication since CFx and SVO cathode cells discharge under different voltage profiles. This is useful as an end-of-replacement indicator (ERI) for an implantable medical device, such as a cardiac pacemaker.Type: GrantFiled: October 2, 2001Date of Patent: February 17, 2004Assignee: Wilson Greatbatch Ltd.Inventors: Hong Gan, Esther S. Takeuchi
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Patent number: 6692872Abstract: There is provided a metal hydride negative electrode having excellent discharge characteristics at the beginning of a charge and discharge cycle, excellent gas absorptivity during charge, and an excellent cycle life, and a method for producing the same without the need of any complicated producing processes. The metal hydride negative electrode (1) is used for a nickel hydride cell, and comprises a substrate (2) and a negative electrode plate (3) which is formed by applying a hydrogen absorbing alloy composition containing a hydrogen absorbing alloy powder, a conductive material, a binder and a dispersing agent on the substrate, wherein the negative electrode plate has a surface portion (4) which has a predetermined water repellent rate and a plurality of convex portions.Type: GrantFiled: June 19, 2001Date of Patent: February 17, 2004Assignees: Honda Giken Kogyo Kabushiki Kaisha, Japan Metals & Chemicals Co., Ltd., Sanoh Kogyo Kabushiki KaishaInventors: Hiroyuki Suzuki, Kyoichi Ariga, Kenichi Kobayashi, Hiroshi Ogura, Nobuyuki Muromachi, Mieko Nagamori, Hideki Toshima
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Patent number: 6692873Abstract: An electrode active material forming composition, a separator forming composition and a manufacturing method of a lithium secondary battery using the compositions are provided.Type: GrantFiled: August 1, 2000Date of Patent: February 17, 2004Assignee: SKC Co., Ltd.Inventors: Chi-kyun Park, Archana Kakirde, Peikang Liu, Venkatesan Manivannan, Chul Chai, Dong-joon Ihm, Jon-ha Lee, Kwon-sun Roh
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Patent number: 6692874Abstract: The present invention relates to a lithium ion battery, more particularly to a new electrolyte for a lithium ion battery, the new electrolyte comprising a compound which is either 4-carbomethoxymethyl 1,3-dioxan-2-one or 4-carboethoxymethyl 1,3-dioxan-2-one. Each of these compounds comprises a cyclic ring carbonate structure and a linear carbonate structure. The battery also comprises an anode including graphitized carbon and a cathode including a lithium transition metal oxide, and exhibits a superior charge-discharge life cycle characteristic and low temperature performance.Type: GrantFiled: September 7, 2001Date of Patent: February 17, 2004Assignee: LG Chemical Co., Ltd.Inventors: Hyeong-Jin Kim, Seung-II Yoo, Jae-Sik Chung
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Patent number: 6692875Abstract: A mask contains a transparent carrier material on which an opaque region is disposed as an image structure. Also disposed on the carrier material is a semitransparent dummy structure, which is spaced apart from all the image structures and differs from the image structure in terms of transparency and phase rotation. The smallest lateral extent of the dummy structure is then selected to be at least half as large as the smallest lateral extent of the image structure. The semitransparent dummy structure is formed in such a way that it is suitable for increasing the depth of focus of structures that stand individually or at least partially individually, in order thereby to improve the process window of the optical projection.Type: GrantFiled: April 20, 2001Date of Patent: February 17, 2004Assignee: Infineon Technologies AGInventors: Werner Fischer, Fritz Gans, Rainer Pforr, Jörg Thiele
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Patent number: 6692876Abstract: The invention includes a method of patterning radiation. The radiation is simultaneously passed through a structure and at least one subresolution assist feature proximate the structure. The structure defines a pattern of radiation intensity. The at least one subresolution assist feature comprises a material that is transmissive of at least a portion of the radiation. The subresolution assist feature alters the pattern of radiation intensity defined by the structure relative to a pattern of radiation intensity that would be defined in the absence of the subresolution assist feature. The invention also includes another method of patterning radiation. The radiation is simultaneously passed through a first material structure and at least one second material subresolution assist feature proximate the first material structure. The second material is different than the first material.Type: GrantFiled: June 18, 2001Date of Patent: February 17, 2004Assignee: Micron Technology, Inc.Inventor: Bill Baggenstoss
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Patent number: 6692877Abstract: In a mask for beam exposure, a membrane structure for endless patterns and a stencil structure for terminated patterns are provided in combination.Type: GrantFiled: October 17, 2001Date of Patent: February 17, 2004Assignee: NEC Electronics CorporationInventor: Yasuhisa Yamada
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Patent number: 6692878Abstract: An apparatus comprising a mask having an active device area and a moat. The moat substantially surrounds the mask active device area and has a width greater than a plasma specie diffusional length. A method comprising depositing a layer of resist on a mask substrate having transparent and opaque layers; and exposing the resist layer to radiation. The radiation is patterned to produce features within an active device area. The radiation is also patterned to produce a moat substantially surrounding the active device area having a width greater than a plasma specie diffusional length.Type: GrantFiled: August 15, 2002Date of Patent: February 17, 2004Assignee: Intel CorporationInventors: Wilman Tsai, Marilyn Kamna, Frederick Chen, Jeff Farnsworth
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Patent number: 6692879Abstract: There is provided a thermal transfer image-receiving sheet which has dyeability high enough to realize high-speed printing and low-energy printing, permits a protective layer to be thermally transferred onto an image formed on the thermal transfer image-receiving sheet, is free from heat fusing to a thermal transfer sheet at the time of image formation on the thermal transfer image-receiving sheet, and has satisfactory separability from the thermal transfer sheet.Type: GrantFiled: October 21, 2002Date of Patent: February 17, 2004Assignee: Dai Nippon Printing Co., Ltd.Inventors: Shino Suzuki, Masahiro Yuki, Takenori Omata, Munenori Ieshige, Hidemasa Kaida
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Patent number: 6692880Abstract: Toner formulations and developers containing the toner formulations are described. The toner contains at least one toner resin, at least one first charge control agent capable of providing a consistent level of charge, at least one second charge control agent capable of providing a sustained level of charge, at least one surface treatment agent, and at least one release agent and optionally at least one colorant. The toners of the present invention preferably provide a consistent level of charge of from about −10 to about −30 micro C/gm and also provide this level of charge for a sustained period of time, such as from about 2 to about 10 minutes. The toners of the present invention also provides excellent ruboff values for an image printed from the toners of the present invention. Methods of improving ruboff are described as well as methods to develop an image using the toner of the present invention.Type: GrantFiled: May 6, 2002Date of Patent: February 17, 2004Assignee: Heidelberger Druckmaschinen AGInventors: Robert D. Fields, Dinesh Tyagi, John C. Wilson, Peter Alexandrovich, Robert Guistina
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Patent number: 6692881Abstract: A recording liquid including a colorant and a carrier liquid including at least one of a liquid paraffin and a linear silicone oil. The recording liquid is an inkjet ink, a printing ink, a marker ink, a stencil ink, an electronic recording ink, a non-aqueous paint, a liquid developer or the like. When the recording liquid is a non-aqueous paint or a liquid developer, the recording ink further includes a resin.Type: GrantFiled: May 30, 2002Date of Patent: February 17, 2004Assignee: Ricoh Company LimitedInventors: Kazuo Tsubuko, Tsuyoshi Asami, Aiko Ishikawa
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Patent number: 6692882Abstract: A method of forming a toner image is disclosed. The photoreceptor is installed so that the center axis of the cylinder is to be almost horizontal, front edge of the cleaning blade is pressed against surface of the photoreceptor at the top, ratio of width of the photosensitive layer of the photoreceptor to length of the cylindrical electroconductive substrate is 80/100 to 99/100, and a number ratio of toner particles having a shape coefficient of 1.2 to 1.6 is at least 65 percent in the toner particles.Type: GrantFiled: December 5, 2001Date of Patent: February 17, 2004Assignee: Konica CorporationInventors: Takeo Oshiba, Fumitaka Mochizuki, Kazuhisa Shida
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Patent number: 6692883Abstract: A positive photoresist composition is disclosed, comprising a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, and a compound capable of generating an acid upon irradiation with actinic rays or radiation.Type: GrantFiled: April 20, 2001Date of Patent: February 17, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Fumiyuki Nishiyama, Toru Fujimori, Shiro Tan
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Patent number: 6692884Abstract: A positive photoresist composition comprises: a compound capable of generating an acid upon irradiation with an actinic ray or a radiation, in which the compound contains (A1) a sulfonate compound of a sulfonium, and (A2) a sulfonate compound of an N-hydroxyimide or a disulfonyldiazomethane compound; and a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developing solution, in which the resin contains a repeating unit having a specific lactone structure.Type: GrantFiled: April 5, 2002Date of Patent: February 17, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Toru Fujimori, Kunihiko Kodama, Kenichiro Sato, Toshiaki Aoai
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Patent number: 6692885Abstract: Disclosed is a method of fabricating barrier ribs in a plasma display panel using photosensitive glass powder includes the steps of preparing photosensitive glass powder by reducing a photosensitive glass material to fine powder, putting the photosensitive glass powder or the photosensitive glass powder mixed with a UV-ray transmitting organic material in a mold, aligning a photomask over the photosensitive glass powder and carrying out exposure thereon, carrying out first and second thermal treatment on the photosensitive glass powder so as to generate different crystalline phases at exposed and non-exposed portions, respectively, and forming barrier ribs by etching the portion where the crystalline phase is generated.Type: GrantFiled: December 28, 2001Date of Patent: February 17, 2004Assignee: LG Electronics Inc.Inventor: Myung-Won Lee
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Patent number: 6692886Abstract: An object of the present invention is to provide a method for manufacturing an aluminum printing plate which is superior in fine line reproduction and has no occurrence of spot-like defect in the silver image part. According to the present invention, a method for manufacturing a lithographic printing plate is provided, wherein an aluminum plate subjected to at least graining treatment and anodizing treatment is rinsed with water, then coated with a liquid containing physical development nuclei, and subsequently coated with a silver halide emulsion layer.Type: GrantFiled: March 8, 2002Date of Patent: February 17, 2004Assignee: Mitsubishi Paper Mills LimitedInventor: Jun Yamada
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Patent number: 6692887Abstract: A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.Type: GrantFiled: November 23, 1998Date of Patent: February 17, 2004Assignee: JSR CorporationInventors: Mitsuhito Suwa, Toru Kajita, Shin-ichiro Iwanaga, Toshiyuki Ota
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Patent number: 6692888Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group. Polymers and resists of the invention can exhibit substantial resistance to plasma etchants.Type: GrantFiled: October 7, 1999Date of Patent: February 17, 2004Assignee: Shipley Company, L.L.C.Inventors: George G. Barclay, Zhibiao Mao, Robert J. Kavanagh
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Patent number: 6692889Abstract: A polymeric compound of the invention includes at least one monomer unit selected from the following formulae (I), (II), (III) and (IV): (wherein R1 is a hydrogen atom or a methyl group, R2 and R3 are each a hydrogen atom, a hydroxyl group or a —COOR4 group, where R4 is, e.g.Type: GrantFiled: April 5, 2001Date of Patent: February 17, 2004Assignee: Daicel Chemical Industries, Ltd.Inventors: Yoshinori Funaki, Kiyoharu Tsutsumi, Akira Takaragi, Keizo Inoue
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Patent number: 6692890Abstract: The present invention includes a radiation-imageable element for lithographic printing having a hydrophilic anodized aluminum base with a surface having pores and a image-forming layer having polymer particles coated on the aluminum base. The ratio of the average pore diameter to the average particle diameter is from 0.4:1 to 10:1. The present invention further includes a method of producing the imaged element. The method includes the steps of imagewise exposing the radiation-imageable element to radiation to produce exposed and unexposed regions and contacting the imagewise exposed radiation-imageable element and a developer to remove the exposed or the unexposed regions.Type: GrantFiled: April 4, 2001Date of Patent: February 17, 2004Assignee: Kodak Polychrome Graphics LLCInventors: Jen-Chi Huang, Xing-Fu Zhong, S. Peter Pappas, Shashikant Saraiya
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Patent number: 6692891Abstract: The present invention relates to a photoresist composition containing a photo radical generator, more specifically, to a photoresist composition which comprises (a) photoresist resin, (b) a photoacid generator, (c) an organic solvent and (d) a photo radical generator. The present photoresist composition reduces or prevents a sloping pattern formation due to a higher concentration of acid in the upper portion of the photoresist relative to the lower portion of the photoresist.Type: GrantFiled: June 12, 2001Date of Patent: February 17, 2004Assignee: Hynix Semiconductor IncInventors: Jae Chang Jung, Geun Su Lee, Min Ho Jung, Ki Ho Baik
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Patent number: 6692892Abstract: A resist pattern having a good form without any T-top or round top is obtained by coating on a photoresist layer an anti-reflective coating composition containing at least (a) polyacrylic acid, (b) polyvinyl pyrrolidone, (c) CnF2n+1COOOH (wherein n represents an integer of 3 to 11) and (d) tetramethylammonium hydroxide to form an anti-reflective coating, and conducting patternwise exposure and development.Type: GrantFiled: July 10, 2001Date of Patent: February 17, 2004Assignee: Clariant Finance (BVI) LimitedInventors: Yusuke Takano, Hatsuyuki Tanaka, Dong Han Lee
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Patent number: 6692893Abstract: Onium salts of arylsulfonyloxynaphthalenesulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, improved focal latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.Type: GrantFiled: October 23, 2001Date of Patent: February 17, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Youichi Ohsawa, Jun Watanabe, Takeshi Nagata, Jun Hatakeyama
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Patent number: 6692894Abstract: Disclosed is a photolithographic pattern-forming material capable of giving a fine patterned resist layer rapidly and being used repeatedly. The pattern-forming material is a multilayered body comprising a substrate and a photoresist layer thereon which is overlaid with a three-layered composite film for near-field light generation consisting of an intermediate layer of a non-linear optical material such as antimony sandwiched between two dielectric layers. When irradiated with active rays focused on the optically nonlinear layer, a fine optical window or light scattering point is formed therein where a near-field light is generated to pattern-wise expose the photoresist layer.Type: GrantFiled: August 30, 2000Date of Patent: February 17, 2004Assignee: Agency of Industrial Science and TechnologyInventors: Takashi Nakano, Masashi Kuwahara, Junji Tominaga, Nobufumi Atoda
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Patent number: 6692895Abstract: A laser imageable article includes an imageable layer that comprises the reaction product of a metal precursor and a reactant. The imageable article also includes a first boundary layer on a first side of the imageable layer, the first boundary layer being substantially transparent to laser radiation, and a second boundary layer on a second side of the imageable layer. The imageable layer may be imaged with a laser through the first boundary layer while maintaining the continuity of the first boundary layer. In a preferred embodiment, the imageable layer comprises the reaction product of an ion of one or more metals selected from columns 8, 9, and 10 of the periodic table of elements and a reducing agent selected from hypophosphorus acid and salts thereof, sodium borohydride, and dimethylamine borane. One preferred embodiment of the imageable layer comprises from 1 to 30 mole percent phosphorus and up to 99 mole percent nickel.Type: GrantFiled: May 25, 2001Date of Patent: February 17, 2004Assignee: 3M Innovative Properties CompanyInventors: Haitao Huang, Michael N. Miller, Gary A. Shreve, Robert D. Waid
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Patent number: 6692896Abstract: The present invention relates to a heat mode-compatible planographic printing plate comprising a photosensitive layer which is capable of recording with an infrared laser and formed by applying a photosensitive layer coating solution onto a hydrophilic support and then drying the photosensitive layer coating solution, the photosensitive layer coating solution being obtained by dissolving or dispersing I) an IR absorber, II) a polymerization initiator, and III) a compound having a polymerizable unsaturated group in a solvent, wherein the residual solvent in the photosensitive layer is 5% by weight or less relative to the weight of the photosensitive layer.Type: GrantFiled: February 27, 2001Date of Patent: February 17, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuto Shimada, Kazuto Kunita, Ippei Nakamura, Ikuo Kawauchi
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Patent number: 6692897Abstract: A positive resist composition comprises: (A) a resin having an aliphatic cyclic hydrocarbon group and increasing the solubility to an alkali developer by the action of an acid; (B) a compound generating an acid upon irradiation with an actinic ray or radiation; and (C) a nitrogen-containing compound having in the molecule at least one partial structure represented by following formula (I).Type: GrantFiled: July 12, 2001Date of Patent: February 17, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Toru Fujimori, Yasumasa Kawabe, Hajime Nakao
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Patent number: 6692898Abstract: Method of forming a magnetic memory device are disclosed. In one embodiment, a first plurality of conductive lines are formed over a semiconductor workpiece. A plurality of magnetic material lines are formed over corresponding ones of the first plurality of conductive lines and a second plurality of conductive lines are formed over the semiconductor workpiece. The second plurality of conductive lines cross over the first conductive lines and the magnetic material lines. These second lines can be used as a mask to while the magnetic material lines are patterned.Type: GrantFiled: August 3, 2001Date of Patent: February 17, 2004Assignee: Infineon Technologies AGInventor: Xian J. Ning
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Patent number: 6692899Abstract: A method of forming a TFT-LCD device with a rough pixel electrode is disclosed. The method comprises the following steps. First, a first passivation layer is formed on the transparent insulator substrate to cover the transistor. The first passivation layer is etched to form contact holes therein to expose a source structure and a drain structure of the transistor. A pixel electrode is formed on the first passivation layer and filled into the contact holes to connect electrically to the drain structure. A second passivation layer is formed on the first passivation layer and the pixel electrode to cover uniformly the transistor for planarization. Then a lithography procedure is done to etch the second passivation layer to make surfaces thereof rough.Type: GrantFiled: November 16, 2001Date of Patent: February 17, 2004Assignee: Au Optronics Corp.Inventor: Han-Chung Lai
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Patent number: 6692900Abstract: The invention includes a method of patterning radiation. The radiation is simultaneously passed through a structure and through a sub resolution assist feature that is transmissive of at least a portion of the radiation. The sub resolution assist feature alters a pattern of radiation intensity defined by the structure relative to a pattern of radiation intensity that would be defined in the absence of the sub resolution assist feature. The invention further includes methods of forming radiation-patterning tools, and the radiation-patterning tools themselves.Type: GrantFiled: May 19, 2003Date of Patent: February 17, 2004Assignee: Micron Technology, Inc.Inventor: Bill Baggenstoss
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Patent number: 6692901Abstract: A polymethylglutaramide layer is formed on a given base material, and then, the surface of the polymethylglutaramide layer is washed with an organic solvent. Then, a photoresist layer is formed on the polymethylglutaramide layer. The photoresist layer is exposed and developed. The remaining polymethylglutaramide layer is partially removed, to form a resist pattern having a T-shaped longitudinal cross section which is constructed of a main body having a substantially rectangular longitudinal cross section and a supplemental body to support the main body on a given base material. The supplemental body has a substantially rectangular longitudinal cross section, which is narrower than the longitudinal cross section of the main body.Type: GrantFiled: September 28, 2001Date of Patent: February 17, 2004Assignee: TDK CorporationInventor: Akifumi Kamijima
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Patent number: 6692902Abstract: A manufacturing method and structure of slanting diffusive reflectors simplifies their manufacturing process and reduces cost. A photo mask comprising a plurality of half-tone exposure units is used. A half-tone photolithography process is performed on the positive photoresist formed on a substrate. Only one exposure process and a suitable drying step are required to form a plurality of slants and rough astigmatisms on the slants. The size of the half-tone exposure units is randomly selected. Each half-tone exposure unit comprises a plurality of parallel transmitting strips or shadow strips. The pitch of the transmitting strips or the shadow strips in one half-tone exposure unit can be arbitrary. The width of the shadow strips is gradually changing from one side of the half-tone exposure unit to the other side.Type: GrantFiled: November 16, 2001Date of Patent: February 17, 2004Assignee: Industrial Technology Research InstituteInventors: Yi-Chun Wong, Ming-Dar Wei, Shang-Wen Chang
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Patent number: 6692903Abstract: A method of processing a substrate 30 comprises exposing the substrate 30 to an energized process gas to etch features 67 on the substrate 30 and exposing the substrate 30 to an energized cleaning gas to remove etchant residue 70 and/or remnant resist 60 from the substrate 30. To enhance the cleaning process, the substrate 30 may be treated before, during or after the cleaning process by exposing the substrate 30 to an energized treating gas comprising a halogen species.Type: GrantFiled: December 13, 2000Date of Patent: February 17, 2004Assignee: Applied Materials, IncInventors: Haojiang Chen, James S. Papanu, Mark Kawaguchi, Harald Herchen, Jeng H. Hwang, Guangxiang Jin, David Palagashvili
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Patent number: 6692904Abstract: A photographic washing bath comprises a chamber containing a wash solution for a silver halide photographic material having a pH of less than 7 and comprising water having dissolved therein an oxidizing agent, said oxidizing agent having an oxidizing potential of at least 1 volt and being in a concentration of from 0.05 to 2 Molar. The oxidation potential of the oxidizing agent is preferably at least 1.2 volts and may be hydrogen peroxide or a source of hydrogen peroxide, a persulphate, a perborate, a bromate, or an iodate. A washing process using the invention is suitable for being carried out in same chamber as the development and fixing stages in which case hydrogen peroxide is the preferred oxidizing agent because any peroxide remaining at the end of the wash stage can be removed by evaporation, thereby avoiding risk of contamination of the next stage to be carried out in the chamber.Type: GrantFiled: February 14, 2003Date of Patent: February 17, 2004Assignee: Eastman Kodak CompanyInventors: John R. Fyson, Jeffrey L. Hall, Peter J. Twist
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Patent number: 6692905Abstract: A silver halide photographic emulsion comprising a methine dye compound having in a molecule thereof at least one atomic group in which at least two groups selected from the group consisting of groups represented by formulas (I) and (II) are adjacent to each other or adjacent to each other through an atom: X—H (I) wherein X represents an atom electrically more negative than a carbon atom, Y (II) wherein Y represents an atom electrically more negative than a carbon atom, and has one or more lone electron pairs; and a silver halide photographic material comprising the silver halide photographic emulsion.Type: GrantFiled: May 4, 2001Date of Patent: February 17, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Katsumi Kobayashi, Takanori Hioki
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Patent number: 6692906Abstract: The present disclosure relates to aqueous dispersions of silver (carboxylate-azine toner) particles wherein the azine content of the particles is from about 0.01 to 10% by weight relative to silver carboxylate. The carboxylates are typically silver salts of long chain fatty acids and the azine toners are the compounds that function as development accelerators and toning agents such as phthalazine. These silver (carboxylate-azine) particles can be used to formulate imaging forming compositions that are useful in aqueous thermographic or photothermographic imaging elements.Type: GrantFiled: July 22, 2002Date of Patent: February 17, 2004Assignee: Eastman Kodak CompanyInventors: Mark Lelental, Peter J. Ghyzel, John W. Boettcher, James L. Wakley, David A. Dickinson, Joe E. Maskasky, Roger L. Klaus, Victor P. Scaccia, Thomas Blanton
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Patent number: 6692907Abstract: The hypervariable region (E2HV) of the putative hepatitis C virus (HCV) glycoprotein E2/NS1, between about amino acid 384 to about amino acid 414, is a rapidly evolving region of HCV, and is likely to be under positive immune selection. A newly discovered motif within this hypervariable region is immunogenic and conserved with respect to the character of the amino acids. In many isolates, this motif falls between amino acids 401 to 406 or 407. The discovery of this motif allows for additional materials and methods to treat and diagnose HCV.Type: GrantFiled: May 9, 1995Date of Patent: February 17, 2004Assignee: Chiron CorporationInventors: Amy J. Weiner, Michael Houghton
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Patent number: 6692908Abstract: Human monoclonal antibodies binding to epitopes common to type 1 and 2 HCV are provided, as well as conformationally conserved HCV E2 2a and 2b proteins. Compositions comprising the antibodies find use in diagnosis and therapy. The antibodies recognize conformational epitopes that are conserved across multiple genotypes of HCV. Thus the antibodies have the potential to be useful in the prevention and treatment of the majority of HCV infections. A subset of the antibodies (CBH-2, CBH-5, CBH-7, CBH-8C, CBH-8E, and CBH-11) have the ability to prevent the binding of HCV E2 proteins of multiple genotypes to human CD81, a possible co-receptor for HCV infection. A subset of the antibodies (CBH-2 and CBH-5) have been shown to inhibit the binding of HCV virions (as opposed to purified E2 protein) to human CD81. A further subset of the antibodies (CBH-4D, CBH4B, CBH-8C, and CBH-9) have been shown to prevent HCV envelope mediated fusion using an HCV psuedotype system.Type: GrantFiled: October 29, 1999Date of Patent: February 17, 2004Assignee: Stanford UniversityInventors: Steven K. H. Foung, Kenneth G. Hadlock
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Patent number: 6692909Abstract: The invention provides nucleic acid segments of the human genome, particularly necleic acid segments from the coding region of a gene, including polymorphic sites. Allele-specific primers and probes hybridizing to regions flanking or containing these sites are also provided. The nucleic acids, primers and probes are used in applications such as phenotype correlations, forensics, paternity testing, medicine and genetic analysis.Type: GrantFiled: April 1, 1998Date of Patent: February 17, 2004Assignee: Whitehead Institute for Biomedical ResearchInventors: Eric S. Lander, George Q. Daley, Michele Cargill, James S. Ireland, Steven G. Rozen
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Patent number: 6692910Abstract: Methods of reducing gene expression, protein production and messenger RNA output in a cell are disclosed. Also disclosed is a method for delivering a selected ribozyme to a target mRNA in a cell. The methods are useful for prophylactic and therapeutic purposes.Type: GrantFiled: July 27, 1998Date of Patent: February 17, 2004Assignee: The University of ConnecticutInventors: David W. Rowe, Mary Louise Stover, Akin Beckley
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Patent number: 6692911Abstract: The present invention provides improved cell delivery compositions. In particular, the invention provides biocompatible endosomolytic agents. In a preferred embodiment, the endosomolytic agents are also biodegradable and can be broken down within cells into components that the cells can either reuse or dispose of. Preferred endosomolytic agents include cationic polymers, particularly those comprised of biomolecules, such as histidine, polyhistidine, polylysine or any combination thereof. Other exemplary endosomolytic agents include, but are not limited to, other imidazole containing compounds such as vinylimidazole and histamine. More particularly preferred are those agents having multiple proton acceptor sites and acting as a “proton sponge”, disrupting the endosome by osmolytic action. In preferred embodiments, the endosomolytic agent comprises a plurality of proton acceptor sites having pKas within the range of 4 to 7, which endosomal lysing component is polycationic at pH 4.Type: GrantFiled: February 17, 1999Date of Patent: February 17, 2004Assignee: Massachusetts Institute of TechnologyInventors: Daniel W. Pack, David A. Putnam, Robert S. Langer
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Patent number: 6692912Abstract: Disclosed is a polymerizable complex containing a covalently attached nucleic acid molecule which, under appropriate conditions, is capable of copolymerization with a second polymerizable ethylene-containing monomer unit to form a polymerized layer. The polymerized layer containing attached nucleic acid is useful in a variety of contexts including, for example, hybridization assays. The polymerized layer containing the covalently attached nucleic acid molecule can be formed into a variety of shapes, or attached to a formed material through appropriate chemistry.Type: GrantFiled: April 18, 2000Date of Patent: February 17, 2004Assignee: Matrix Technologies CorporationInventors: T. Christian Boles, Stephen J. Kron, Christopher P. Adams
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Patent number: 6692913Abstract: A process for determining cell vitality and efficiency after gene transfer in eukaryotic cells by measuring reporter gene activity, which comprises determining in a reaction vessel the cell count of the transfected cells by a representative enzyme activity, and ascertaining in the same reaction vessel the efficiency of the gene transfer by determining the reporter gene activity after changing the pH.Type: GrantFiled: May 8, 2000Date of Patent: February 17, 2004Assignee: Max-Delbruck-Centrum fur Mdekular MedizinInventors: Detlev Groth, Regina Reszka