Patents Issued in February 17, 2004
  • Patent number: 6692864
    Abstract: A battery pack suppresses temperature rise of secondary battery during charging and discharging. The battery pack includes a plurality of batteries stacked up, a case enclosing the plurality of batteries, a heat collector disposed near the battery positioned in the center of the plurality of batteries, a heat radiator placed at one side of the case, and a first heat transfer unit placed for connecting the heat collector and heat radiator. Further, the battery pack includes a heat transfer plate placed at the other side of the case, and a second heat transfer unit placed between the heat collector and heat transfer plate.
    Type: Grant
    Filed: June 4, 2001
    Date of Patent: February 17, 2004
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshitaka Dansui, Hironori Ura, Sadaaki Yokoo, Michio Hirota
  • Patent number: 6692865
    Abstract: A new sandwich cathode design is provided having a first cathode structure of a first cathode active material of a relatively low energy density but of a relatively high rate capability, for example SVO, mixed with a second cathode active material having a relatively high energy density but a relatively low rate capability, for example CFx, with the percentage of SVO being less than that of CFx and sandwiched between two current collectors. Then, a second cathode mixture of SVO and CFx active materials is contacted to the outside of the current collectors. However, the percentage of SVO to CFx is greater in the second structure than in the first. Such an exemplary cathode design might look like: (100−y)% SVO+y% CFx, wherein 0≦y≦100/current collector/(100−x)% SVO+x% CFx, wherein 0≦x≦100/current collector/(100−y)% SVO+y% CFx, wherein 0≦y≦100, and wherein the ratio of x to y is selected from the group consisting of y<x, x<y and x=y.
    Type: Grant
    Filed: October 24, 2001
    Date of Patent: February 17, 2004
    Assignee: Wilson Greatbatch Ltd.
    Inventors: Hong Gan, Esther S. Takeuchi
  • Patent number: 6692866
    Abstract: The present invention provides a lamination type secondary battery, in which accurate positioning can be performed for positive electrodes and negative electrodes arranged face-to-face to each other. The invention provides a lamination type secondary battery, which comprises positive electrodes and negative electrodes having different surface areas, said positive electrodes and said negative electrodes being laminated on each other with a separator between them, each of the electrodes having smaller surface area is arranged at the center with equal spacing from outer periphery of a separator main body and is covered with the separator main body, and outer periphery of each of the electrodes having larger surface area is equal in size with outer periphery of the separator main body to cover the electrode having smaller surface area.
    Type: Grant
    Filed: February 25, 2002
    Date of Patent: February 17, 2004
    Assignees: NEC Mobile Energy Corporation, NEC Corporation
    Inventors: Hideto Watanabe, Katsuichi Mogami, Eiko Motegi
  • Patent number: 6692867
    Abstract: A method for removing a pin from a battery assembly by the step of providing a separator comprising: a microporous membrane having an exterior surface portion of polypropylene, the polypropylene including at least 50 ppm of metallic stearate, preferably calcium stearate Static and being adapted to exhibit a pin removal force ≦7100 g.
    Type: Grant
    Filed: October 12, 2001
    Date of Patent: February 17, 2004
    Assignee: Celgard Inc.
    Inventors: Robert A. Nark, Ronald W. Call, Donald K. Simmons, Mark W. Ferebee
  • Patent number: 6692868
    Abstract: Battery separators made of a wettable, uniform mat of melt blown fibers. The melt blown fibers are thermally bonded to one another. These fibers are made of a thermoplastic material. The fibers have a diameter in the range of 0.1 to 13 microns (&mgr;) and lengths greater than 12 millimeters (mm). The mat has a basis weight ranging from 6 to 160 grams per square meter (g/m2), a thickness of less than 75 microns (&mgr;), and an average pore size of 0.3 to 50 microns (&mgr;).
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: February 17, 2004
    Assignee: Daramic, Inc.
    Inventor: Jerry Zucker
  • Patent number: 6692869
    Abstract: The objective of the present invention is to produce a surface treated steel sheet for a battery container of which electric contact to the positive electrode active material is improved, a method of surface treatment for a battery container, a battery container and a battery, wherein the surface treated steel sheet has a graphite dispersed nickel plating layer or a graphite dispersed nickel-alloy plating layer formed on the one side to be the inner surface of a battery container, in which nickel-cobalt alloy, nickel-cobalt-iron alloy, nickel-manganese alloy, nickel-phosphorus alloy, nickel-bismuth alloy or the like is preferable as an alloy plating layer, the battery container is manufactured from these surface treated steel sheets by DI forming or DTR forming, and the battery uses this battery container.
    Type: Grant
    Filed: April 23, 2001
    Date of Patent: February 17, 2004
    Assignee: Toyo Kohan Co., Ltd.
    Inventors: Hitoshi Ohmura, Tatsuo Tomomori, Hideo Ohmura, Keiji Yamane
  • Patent number: 6692870
    Abstract: The present invention provides an improved electrode material for a lithium secondary battery to provide a lithium secondary battery that is light in weight and has high energy density. Sulfur and a catalyst material such as active carbon, and the like, that reduces activation energy of an addition reaction of lithium to sulfur and allows the reaction to occur at not greater than 60° C., are included in the electrode material.
    Type: Grant
    Filed: April 24, 2001
    Date of Patent: February 17, 2004
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Masahide Miyake, Masahisa Fujimoto, Shin Fujitani
  • Patent number: 6692871
    Abstract: A new sandwich cathode design having a first cathode active material of a relatively low energy density but of a relatively high rate capability sandwiched between two current collectors and with a second cathode active material having a relatively high energy density but of a relatively low rate capability in contact with the opposite sides of the two current collectors, is described. The present cathode design is relatively safer under short circuit and abuse conditions than cells having a cathode active material of a relatively high rate density but a relatively low energy capability alone. A preferred cathode is: CFx/current collector/SVO/current collector/CFx. The SVO provides the discharge end of life indication since CFx and SVO cathode cells discharge under different voltage profiles. This is useful as an end-of-replacement indicator (ERI) for an implantable medical device, such as a cardiac pacemaker.
    Type: Grant
    Filed: October 2, 2001
    Date of Patent: February 17, 2004
    Assignee: Wilson Greatbatch Ltd.
    Inventors: Hong Gan, Esther S. Takeuchi
  • Patent number: 6692872
    Abstract: There is provided a metal hydride negative electrode having excellent discharge characteristics at the beginning of a charge and discharge cycle, excellent gas absorptivity during charge, and an excellent cycle life, and a method for producing the same without the need of any complicated producing processes. The metal hydride negative electrode (1) is used for a nickel hydride cell, and comprises a substrate (2) and a negative electrode plate (3) which is formed by applying a hydrogen absorbing alloy composition containing a hydrogen absorbing alloy powder, a conductive material, a binder and a dispersing agent on the substrate, wherein the negative electrode plate has a surface portion (4) which has a predetermined water repellent rate and a plurality of convex portions.
    Type: Grant
    Filed: June 19, 2001
    Date of Patent: February 17, 2004
    Assignees: Honda Giken Kogyo Kabushiki Kaisha, Japan Metals & Chemicals Co., Ltd., Sanoh Kogyo Kabushiki Kaisha
    Inventors: Hiroyuki Suzuki, Kyoichi Ariga, Kenichi Kobayashi, Hiroshi Ogura, Nobuyuki Muromachi, Mieko Nagamori, Hideki Toshima
  • Patent number: 6692873
    Abstract: An electrode active material forming composition, a separator forming composition and a manufacturing method of a lithium secondary battery using the compositions are provided.
    Type: Grant
    Filed: August 1, 2000
    Date of Patent: February 17, 2004
    Assignee: SKC Co., Ltd.
    Inventors: Chi-kyun Park, Archana Kakirde, Peikang Liu, Venkatesan Manivannan, Chul Chai, Dong-joon Ihm, Jon-ha Lee, Kwon-sun Roh
  • Patent number: 6692874
    Abstract: The present invention relates to a lithium ion battery, more particularly to a new electrolyte for a lithium ion battery, the new electrolyte comprising a compound which is either 4-carbomethoxymethyl 1,3-dioxan-2-one or 4-carboethoxymethyl 1,3-dioxan-2-one. Each of these compounds comprises a cyclic ring carbonate structure and a linear carbonate structure. The battery also comprises an anode including graphitized carbon and a cathode including a lithium transition metal oxide, and exhibits a superior charge-discharge life cycle characteristic and low temperature performance.
    Type: Grant
    Filed: September 7, 2001
    Date of Patent: February 17, 2004
    Assignee: LG Chemical Co., Ltd.
    Inventors: Hyeong-Jin Kim, Seung-II Yoo, Jae-Sik Chung
  • Patent number: 6692875
    Abstract: A mask contains a transparent carrier material on which an opaque region is disposed as an image structure. Also disposed on the carrier material is a semitransparent dummy structure, which is spaced apart from all the image structures and differs from the image structure in terms of transparency and phase rotation. The smallest lateral extent of the dummy structure is then selected to be at least half as large as the smallest lateral extent of the image structure. The semitransparent dummy structure is formed in such a way that it is suitable for increasing the depth of focus of structures that stand individually or at least partially individually, in order thereby to improve the process window of the optical projection.
    Type: Grant
    Filed: April 20, 2001
    Date of Patent: February 17, 2004
    Assignee: Infineon Technologies AG
    Inventors: Werner Fischer, Fritz Gans, Rainer Pforr, Jörg Thiele
  • Patent number: 6692876
    Abstract: The invention includes a method of patterning radiation. The radiation is simultaneously passed through a structure and at least one subresolution assist feature proximate the structure. The structure defines a pattern of radiation intensity. The at least one subresolution assist feature comprises a material that is transmissive of at least a portion of the radiation. The subresolution assist feature alters the pattern of radiation intensity defined by the structure relative to a pattern of radiation intensity that would be defined in the absence of the subresolution assist feature. The invention also includes another method of patterning radiation. The radiation is simultaneously passed through a first material structure and at least one second material subresolution assist feature proximate the first material structure. The second material is different than the first material.
    Type: Grant
    Filed: June 18, 2001
    Date of Patent: February 17, 2004
    Assignee: Micron Technology, Inc.
    Inventor: Bill Baggenstoss
  • Patent number: 6692877
    Abstract: In a mask for beam exposure, a membrane structure for endless patterns and a stencil structure for terminated patterns are provided in combination.
    Type: Grant
    Filed: October 17, 2001
    Date of Patent: February 17, 2004
    Assignee: NEC Electronics Corporation
    Inventor: Yasuhisa Yamada
  • Patent number: 6692878
    Abstract: An apparatus comprising a mask having an active device area and a moat. The moat substantially surrounds the mask active device area and has a width greater than a plasma specie diffusional length. A method comprising depositing a layer of resist on a mask substrate having transparent and opaque layers; and exposing the resist layer to radiation. The radiation is patterned to produce features within an active device area. The radiation is also patterned to produce a moat substantially surrounding the active device area having a width greater than a plasma specie diffusional length.
    Type: Grant
    Filed: August 15, 2002
    Date of Patent: February 17, 2004
    Assignee: Intel Corporation
    Inventors: Wilman Tsai, Marilyn Kamna, Frederick Chen, Jeff Farnsworth
  • Patent number: 6692879
    Abstract: There is provided a thermal transfer image-receiving sheet which has dyeability high enough to realize high-speed printing and low-energy printing, permits a protective layer to be thermally transferred onto an image formed on the thermal transfer image-receiving sheet, is free from heat fusing to a thermal transfer sheet at the time of image formation on the thermal transfer image-receiving sheet, and has satisfactory separability from the thermal transfer sheet.
    Type: Grant
    Filed: October 21, 2002
    Date of Patent: February 17, 2004
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Shino Suzuki, Masahiro Yuki, Takenori Omata, Munenori Ieshige, Hidemasa Kaida
  • Patent number: 6692880
    Abstract: Toner formulations and developers containing the toner formulations are described. The toner contains at least one toner resin, at least one first charge control agent capable of providing a consistent level of charge, at least one second charge control agent capable of providing a sustained level of charge, at least one surface treatment agent, and at least one release agent and optionally at least one colorant. The toners of the present invention preferably provide a consistent level of charge of from about −10 to about −30 micro C/gm and also provide this level of charge for a sustained period of time, such as from about 2 to about 10 minutes. The toners of the present invention also provides excellent ruboff values for an image printed from the toners of the present invention. Methods of improving ruboff are described as well as methods to develop an image using the toner of the present invention.
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: February 17, 2004
    Assignee: Heidelberger Druckmaschinen AG
    Inventors: Robert D. Fields, Dinesh Tyagi, John C. Wilson, Peter Alexandrovich, Robert Guistina
  • Patent number: 6692881
    Abstract: A recording liquid including a colorant and a carrier liquid including at least one of a liquid paraffin and a linear silicone oil. The recording liquid is an inkjet ink, a printing ink, a marker ink, a stencil ink, an electronic recording ink, a non-aqueous paint, a liquid developer or the like. When the recording liquid is a non-aqueous paint or a liquid developer, the recording ink further includes a resin.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: February 17, 2004
    Assignee: Ricoh Company Limited
    Inventors: Kazuo Tsubuko, Tsuyoshi Asami, Aiko Ishikawa
  • Patent number: 6692882
    Abstract: A method of forming a toner image is disclosed. The photoreceptor is installed so that the center axis of the cylinder is to be almost horizontal, front edge of the cleaning blade is pressed against surface of the photoreceptor at the top, ratio of width of the photosensitive layer of the photoreceptor to length of the cylindrical electroconductive substrate is 80/100 to 99/100, and a number ratio of toner particles having a shape coefficient of 1.2 to 1.6 is at least 65 percent in the toner particles.
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: February 17, 2004
    Assignee: Konica Corporation
    Inventors: Takeo Oshiba, Fumitaka Mochizuki, Kazuhisa Shida
  • Patent number: 6692883
    Abstract: A positive photoresist composition is disclosed, comprising a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, and a compound capable of generating an acid upon irradiation with actinic rays or radiation.
    Type: Grant
    Filed: April 20, 2001
    Date of Patent: February 17, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiyuki Nishiyama, Toru Fujimori, Shiro Tan
  • Patent number: 6692884
    Abstract: A positive photoresist composition comprises: a compound capable of generating an acid upon irradiation with an actinic ray or a radiation, in which the compound contains (A1) a sulfonate compound of a sulfonium, and (A2) a sulfonate compound of an N-hydroxyimide or a disulfonyldiazomethane compound; and a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developing solution, in which the resin contains a repeating unit having a specific lactone structure.
    Type: Grant
    Filed: April 5, 2002
    Date of Patent: February 17, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toru Fujimori, Kunihiko Kodama, Kenichiro Sato, Toshiaki Aoai
  • Patent number: 6692885
    Abstract: Disclosed is a method of fabricating barrier ribs in a plasma display panel using photosensitive glass powder includes the steps of preparing photosensitive glass powder by reducing a photosensitive glass material to fine powder, putting the photosensitive glass powder or the photosensitive glass powder mixed with a UV-ray transmitting organic material in a mold, aligning a photomask over the photosensitive glass powder and carrying out exposure thereon, carrying out first and second thermal treatment on the photosensitive glass powder so as to generate different crystalline phases at exposed and non-exposed portions, respectively, and forming barrier ribs by etching the portion where the crystalline phase is generated.
    Type: Grant
    Filed: December 28, 2001
    Date of Patent: February 17, 2004
    Assignee: LG Electronics Inc.
    Inventor: Myung-Won Lee
  • Patent number: 6692886
    Abstract: An object of the present invention is to provide a method for manufacturing an aluminum printing plate which is superior in fine line reproduction and has no occurrence of spot-like defect in the silver image part. According to the present invention, a method for manufacturing a lithographic printing plate is provided, wherein an aluminum plate subjected to at least graining treatment and anodizing treatment is rinsed with water, then coated with a liquid containing physical development nuclei, and subsequently coated with a silver halide emulsion layer.
    Type: Grant
    Filed: March 8, 2002
    Date of Patent: February 17, 2004
    Assignee: Mitsubishi Paper Mills Limited
    Inventor: Jun Yamada
  • Patent number: 6692887
    Abstract: A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.
    Type: Grant
    Filed: November 23, 1998
    Date of Patent: February 17, 2004
    Assignee: JSR Corporation
    Inventors: Mitsuhito Suwa, Toru Kajita, Shin-ichiro Iwanaga, Toshiyuki Ota
  • Patent number: 6692888
    Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group. Polymers and resists of the invention can exhibit substantial resistance to plasma etchants.
    Type: Grant
    Filed: October 7, 1999
    Date of Patent: February 17, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Zhibiao Mao, Robert J. Kavanagh
  • Patent number: 6692889
    Abstract: A polymeric compound of the invention includes at least one monomer unit selected from the following formulae (I), (II), (III) and (IV): (wherein R1 is a hydrogen atom or a methyl group, R2 and R3 are each a hydrogen atom, a hydroxyl group or a —COOR4 group, where R4 is, e.g.
    Type: Grant
    Filed: April 5, 2001
    Date of Patent: February 17, 2004
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Yoshinori Funaki, Kiyoharu Tsutsumi, Akira Takaragi, Keizo Inoue
  • Patent number: 6692890
    Abstract: The present invention includes a radiation-imageable element for lithographic printing having a hydrophilic anodized aluminum base with a surface having pores and a image-forming layer having polymer particles coated on the aluminum base. The ratio of the average pore diameter to the average particle diameter is from 0.4:1 to 10:1. The present invention further includes a method of producing the imaged element. The method includes the steps of imagewise exposing the radiation-imageable element to radiation to produce exposed and unexposed regions and contacting the imagewise exposed radiation-imageable element and a developer to remove the exposed or the unexposed regions.
    Type: Grant
    Filed: April 4, 2001
    Date of Patent: February 17, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Jen-Chi Huang, Xing-Fu Zhong, S. Peter Pappas, Shashikant Saraiya
  • Patent number: 6692891
    Abstract: The present invention relates to a photoresist composition containing a photo radical generator, more specifically, to a photoresist composition which comprises (a) photoresist resin, (b) a photoacid generator, (c) an organic solvent and (d) a photo radical generator. The present photoresist composition reduces or prevents a sloping pattern formation due to a higher concentration of acid in the upper portion of the photoresist relative to the lower portion of the photoresist.
    Type: Grant
    Filed: June 12, 2001
    Date of Patent: February 17, 2004
    Assignee: Hynix Semiconductor Inc
    Inventors: Jae Chang Jung, Geun Su Lee, Min Ho Jung, Ki Ho Baik
  • Patent number: 6692892
    Abstract: A resist pattern having a good form without any T-top or round top is obtained by coating on a photoresist layer an anti-reflective coating composition containing at least (a) polyacrylic acid, (b) polyvinyl pyrrolidone, (c) CnF2n+1COOOH (wherein n represents an integer of 3 to 11) and (d) tetramethylammonium hydroxide to form an anti-reflective coating, and conducting patternwise exposure and development.
    Type: Grant
    Filed: July 10, 2001
    Date of Patent: February 17, 2004
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Yusuke Takano, Hatsuyuki Tanaka, Dong Han Lee
  • Patent number: 6692893
    Abstract: Onium salts of arylsulfonyloxynaphthalenesulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, improved focal latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.
    Type: Grant
    Filed: October 23, 2001
    Date of Patent: February 17, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Youichi Ohsawa, Jun Watanabe, Takeshi Nagata, Jun Hatakeyama
  • Patent number: 6692894
    Abstract: Disclosed is a photolithographic pattern-forming material capable of giving a fine patterned resist layer rapidly and being used repeatedly. The pattern-forming material is a multilayered body comprising a substrate and a photoresist layer thereon which is overlaid with a three-layered composite film for near-field light generation consisting of an intermediate layer of a non-linear optical material such as antimony sandwiched between two dielectric layers. When irradiated with active rays focused on the optically nonlinear layer, a fine optical window or light scattering point is formed therein where a near-field light is generated to pattern-wise expose the photoresist layer.
    Type: Grant
    Filed: August 30, 2000
    Date of Patent: February 17, 2004
    Assignee: Agency of Industrial Science and Technology
    Inventors: Takashi Nakano, Masashi Kuwahara, Junji Tominaga, Nobufumi Atoda
  • Patent number: 6692895
    Abstract: A laser imageable article includes an imageable layer that comprises the reaction product of a metal precursor and a reactant. The imageable article also includes a first boundary layer on a first side of the imageable layer, the first boundary layer being substantially transparent to laser radiation, and a second boundary layer on a second side of the imageable layer. The imageable layer may be imaged with a laser through the first boundary layer while maintaining the continuity of the first boundary layer. In a preferred embodiment, the imageable layer comprises the reaction product of an ion of one or more metals selected from columns 8, 9, and 10 of the periodic table of elements and a reducing agent selected from hypophosphorus acid and salts thereof, sodium borohydride, and dimethylamine borane. One preferred embodiment of the imageable layer comprises from 1 to 30 mole percent phosphorus and up to 99 mole percent nickel.
    Type: Grant
    Filed: May 25, 2001
    Date of Patent: February 17, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Haitao Huang, Michael N. Miller, Gary A. Shreve, Robert D. Waid
  • Patent number: 6692896
    Abstract: The present invention relates to a heat mode-compatible planographic printing plate comprising a photosensitive layer which is capable of recording with an infrared laser and formed by applying a photosensitive layer coating solution onto a hydrophilic support and then drying the photosensitive layer coating solution, the photosensitive layer coating solution being obtained by dissolving or dispersing I) an IR absorber, II) a polymerization initiator, and III) a compound having a polymerizable unsaturated group in a solvent, wherein the residual solvent in the photosensitive layer is 5% by weight or less relative to the weight of the photosensitive layer.
    Type: Grant
    Filed: February 27, 2001
    Date of Patent: February 17, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuto Shimada, Kazuto Kunita, Ippei Nakamura, Ikuo Kawauchi
  • Patent number: 6692897
    Abstract: A positive resist composition comprises: (A) a resin having an aliphatic cyclic hydrocarbon group and increasing the solubility to an alkali developer by the action of an acid; (B) a compound generating an acid upon irradiation with an actinic ray or radiation; and (C) a nitrogen-containing compound having in the molecule at least one partial structure represented by following formula (I).
    Type: Grant
    Filed: July 12, 2001
    Date of Patent: February 17, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toru Fujimori, Yasumasa Kawabe, Hajime Nakao
  • Patent number: 6692898
    Abstract: Method of forming a magnetic memory device are disclosed. In one embodiment, a first plurality of conductive lines are formed over a semiconductor workpiece. A plurality of magnetic material lines are formed over corresponding ones of the first plurality of conductive lines and a second plurality of conductive lines are formed over the semiconductor workpiece. The second plurality of conductive lines cross over the first conductive lines and the magnetic material lines. These second lines can be used as a mask to while the magnetic material lines are patterned.
    Type: Grant
    Filed: August 3, 2001
    Date of Patent: February 17, 2004
    Assignee: Infineon Technologies AG
    Inventor: Xian J. Ning
  • Patent number: 6692899
    Abstract: A method of forming a TFT-LCD device with a rough pixel electrode is disclosed. The method comprises the following steps. First, a first passivation layer is formed on the transparent insulator substrate to cover the transistor. The first passivation layer is etched to form contact holes therein to expose a source structure and a drain structure of the transistor. A pixel electrode is formed on the first passivation layer and filled into the contact holes to connect electrically to the drain structure. A second passivation layer is formed on the first passivation layer and the pixel electrode to cover uniformly the transistor for planarization. Then a lithography procedure is done to etch the second passivation layer to make surfaces thereof rough.
    Type: Grant
    Filed: November 16, 2001
    Date of Patent: February 17, 2004
    Assignee: Au Optronics Corp.
    Inventor: Han-Chung Lai
  • Patent number: 6692900
    Abstract: The invention includes a method of patterning radiation. The radiation is simultaneously passed through a structure and through a sub resolution assist feature that is transmissive of at least a portion of the radiation. The sub resolution assist feature alters a pattern of radiation intensity defined by the structure relative to a pattern of radiation intensity that would be defined in the absence of the sub resolution assist feature. The invention further includes methods of forming radiation-patterning tools, and the radiation-patterning tools themselves.
    Type: Grant
    Filed: May 19, 2003
    Date of Patent: February 17, 2004
    Assignee: Micron Technology, Inc.
    Inventor: Bill Baggenstoss
  • Patent number: 6692901
    Abstract: A polymethylglutaramide layer is formed on a given base material, and then, the surface of the polymethylglutaramide layer is washed with an organic solvent. Then, a photoresist layer is formed on the polymethylglutaramide layer. The photoresist layer is exposed and developed. The remaining polymethylglutaramide layer is partially removed, to form a resist pattern having a T-shaped longitudinal cross section which is constructed of a main body having a substantially rectangular longitudinal cross section and a supplemental body to support the main body on a given base material. The supplemental body has a substantially rectangular longitudinal cross section, which is narrower than the longitudinal cross section of the main body.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: February 17, 2004
    Assignee: TDK Corporation
    Inventor: Akifumi Kamijima
  • Patent number: 6692902
    Abstract: A manufacturing method and structure of slanting diffusive reflectors simplifies their manufacturing process and reduces cost. A photo mask comprising a plurality of half-tone exposure units is used. A half-tone photolithography process is performed on the positive photoresist formed on a substrate. Only one exposure process and a suitable drying step are required to form a plurality of slants and rough astigmatisms on the slants. The size of the half-tone exposure units is randomly selected. Each half-tone exposure unit comprises a plurality of parallel transmitting strips or shadow strips. The pitch of the transmitting strips or the shadow strips in one half-tone exposure unit can be arbitrary. The width of the shadow strips is gradually changing from one side of the half-tone exposure unit to the other side.
    Type: Grant
    Filed: November 16, 2001
    Date of Patent: February 17, 2004
    Assignee: Industrial Technology Research Institute
    Inventors: Yi-Chun Wong, Ming-Dar Wei, Shang-Wen Chang
  • Patent number: 6692903
    Abstract: A method of processing a substrate 30 comprises exposing the substrate 30 to an energized process gas to etch features 67 on the substrate 30 and exposing the substrate 30 to an energized cleaning gas to remove etchant residue 70 and/or remnant resist 60 from the substrate 30. To enhance the cleaning process, the substrate 30 may be treated before, during or after the cleaning process by exposing the substrate 30 to an energized treating gas comprising a halogen species.
    Type: Grant
    Filed: December 13, 2000
    Date of Patent: February 17, 2004
    Assignee: Applied Materials, Inc
    Inventors: Haojiang Chen, James S. Papanu, Mark Kawaguchi, Harald Herchen, Jeng H. Hwang, Guangxiang Jin, David Palagashvili
  • Patent number: 6692904
    Abstract: A photographic washing bath comprises a chamber containing a wash solution for a silver halide photographic material having a pH of less than 7 and comprising water having dissolved therein an oxidizing agent, said oxidizing agent having an oxidizing potential of at least 1 volt and being in a concentration of from 0.05 to 2 Molar. The oxidation potential of the oxidizing agent is preferably at least 1.2 volts and may be hydrogen peroxide or a source of hydrogen peroxide, a persulphate, a perborate, a bromate, or an iodate. A washing process using the invention is suitable for being carried out in same chamber as the development and fixing stages in which case hydrogen peroxide is the preferred oxidizing agent because any peroxide remaining at the end of the wash stage can be removed by evaporation, thereby avoiding risk of contamination of the next stage to be carried out in the chamber.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: February 17, 2004
    Assignee: Eastman Kodak Company
    Inventors: John R. Fyson, Jeffrey L. Hall, Peter J. Twist
  • Patent number: 6692905
    Abstract: A silver halide photographic emulsion comprising a methine dye compound having in a molecule thereof at least one atomic group in which at least two groups selected from the group consisting of groups represented by formulas (I) and (II) are adjacent to each other or adjacent to each other through an atom: X—H  (I) wherein X represents an atom electrically more negative than a carbon atom, Y  (II) wherein Y represents an atom electrically more negative than a carbon atom, and has one or more lone electron pairs; and a silver halide photographic material comprising the silver halide photographic emulsion.
    Type: Grant
    Filed: May 4, 2001
    Date of Patent: February 17, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Katsumi Kobayashi, Takanori Hioki
  • Patent number: 6692906
    Abstract: The present disclosure relates to aqueous dispersions of silver (carboxylate-azine toner) particles wherein the azine content of the particles is from about 0.01 to 10% by weight relative to silver carboxylate. The carboxylates are typically silver salts of long chain fatty acids and the azine toners are the compounds that function as development accelerators and toning agents such as phthalazine. These silver (carboxylate-azine) particles can be used to formulate imaging forming compositions that are useful in aqueous thermographic or photothermographic imaging elements.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: February 17, 2004
    Assignee: Eastman Kodak Company
    Inventors: Mark Lelental, Peter J. Ghyzel, John W. Boettcher, James L. Wakley, David A. Dickinson, Joe E. Maskasky, Roger L. Klaus, Victor P. Scaccia, Thomas Blanton
  • Patent number: 6692907
    Abstract: The hypervariable region (E2HV) of the putative hepatitis C virus (HCV) glycoprotein E2/NS1, between about amino acid 384 to about amino acid 414, is a rapidly evolving region of HCV, and is likely to be under positive immune selection. A newly discovered motif within this hypervariable region is immunogenic and conserved with respect to the character of the amino acids. In many isolates, this motif falls between amino acids 401 to 406 or 407. The discovery of this motif allows for additional materials and methods to treat and diagnose HCV.
    Type: Grant
    Filed: May 9, 1995
    Date of Patent: February 17, 2004
    Assignee: Chiron Corporation
    Inventors: Amy J. Weiner, Michael Houghton
  • Patent number: 6692908
    Abstract: Human monoclonal antibodies binding to epitopes common to type 1 and 2 HCV are provided, as well as conformationally conserved HCV E2 2a and 2b proteins. Compositions comprising the antibodies find use in diagnosis and therapy. The antibodies recognize conformational epitopes that are conserved across multiple genotypes of HCV. Thus the antibodies have the potential to be useful in the prevention and treatment of the majority of HCV infections. A subset of the antibodies (CBH-2, CBH-5, CBH-7, CBH-8C, CBH-8E, and CBH-11) have the ability to prevent the binding of HCV E2 proteins of multiple genotypes to human CD81, a possible co-receptor for HCV infection. A subset of the antibodies (CBH-2 and CBH-5) have been shown to inhibit the binding of HCV virions (as opposed to purified E2 protein) to human CD81. A further subset of the antibodies (CBH-4D, CBH4B, CBH-8C, and CBH-9) have been shown to prevent HCV envelope mediated fusion using an HCV psuedotype system.
    Type: Grant
    Filed: October 29, 1999
    Date of Patent: February 17, 2004
    Assignee: Stanford University
    Inventors: Steven K. H. Foung, Kenneth G. Hadlock
  • Patent number: 6692909
    Abstract: The invention provides nucleic acid segments of the human genome, particularly necleic acid segments from the coding region of a gene, including polymorphic sites. Allele-specific primers and probes hybridizing to regions flanking or containing these sites are also provided. The nucleic acids, primers and probes are used in applications such as phenotype correlations, forensics, paternity testing, medicine and genetic analysis.
    Type: Grant
    Filed: April 1, 1998
    Date of Patent: February 17, 2004
    Assignee: Whitehead Institute for Biomedical Research
    Inventors: Eric S. Lander, George Q. Daley, Michele Cargill, James S. Ireland, Steven G. Rozen
  • Patent number: 6692910
    Abstract: Methods of reducing gene expression, protein production and messenger RNA output in a cell are disclosed. Also disclosed is a method for delivering a selected ribozyme to a target mRNA in a cell. The methods are useful for prophylactic and therapeutic purposes.
    Type: Grant
    Filed: July 27, 1998
    Date of Patent: February 17, 2004
    Assignee: The University of Connecticut
    Inventors: David W. Rowe, Mary Louise Stover, Akin Beckley
  • Patent number: 6692911
    Abstract: The present invention provides improved cell delivery compositions. In particular, the invention provides biocompatible endosomolytic agents. In a preferred embodiment, the endosomolytic agents are also biodegradable and can be broken down within cells into components that the cells can either reuse or dispose of. Preferred endosomolytic agents include cationic polymers, particularly those comprised of biomolecules, such as histidine, polyhistidine, polylysine or any combination thereof. Other exemplary endosomolytic agents include, but are not limited to, other imidazole containing compounds such as vinylimidazole and histamine. More particularly preferred are those agents having multiple proton acceptor sites and acting as a “proton sponge”, disrupting the endosome by osmolytic action. In preferred embodiments, the endosomolytic agent comprises a plurality of proton acceptor sites having pKas within the range of 4 to 7, which endosomal lysing component is polycationic at pH 4.
    Type: Grant
    Filed: February 17, 1999
    Date of Patent: February 17, 2004
    Assignee: Massachusetts Institute of Technology
    Inventors: Daniel W. Pack, David A. Putnam, Robert S. Langer
  • Patent number: 6692912
    Abstract: Disclosed is a polymerizable complex containing a covalently attached nucleic acid molecule which, under appropriate conditions, is capable of copolymerization with a second polymerizable ethylene-containing monomer unit to form a polymerized layer. The polymerized layer containing attached nucleic acid is useful in a variety of contexts including, for example, hybridization assays. The polymerized layer containing the covalently attached nucleic acid molecule can be formed into a variety of shapes, or attached to a formed material through appropriate chemistry.
    Type: Grant
    Filed: April 18, 2000
    Date of Patent: February 17, 2004
    Assignee: Matrix Technologies Corporation
    Inventors: T. Christian Boles, Stephen J. Kron, Christopher P. Adams
  • Patent number: 6692913
    Abstract: A process for determining cell vitality and efficiency after gene transfer in eukaryotic cells by measuring reporter gene activity, which comprises determining in a reaction vessel the cell count of the transfected cells by a representative enzyme activity, and ascertaining in the same reaction vessel the efficiency of the gene transfer by determining the reporter gene activity after changing the pH.
    Type: Grant
    Filed: May 8, 2000
    Date of Patent: February 17, 2004
    Assignee: Max-Delbruck-Centrum fur Mdekular Medizin
    Inventors: Detlev Groth, Regina Reszka