Abstract: A first aspect of the present invention is a method of determining an optical proximity correction for a primary feature having sub-resolution assist features for increasing the depth of focus of the primary features, comprising: generating a line/space pair; placing sub-resolution assist features on opposite sides of the line of the line/space pair; generating a set of linewidth biases; applying the set of linewidth biases to the line of the line/space pair to generate a set of biased-line/space pairs; determining for each biased-line/space pair, a deviation from a design linewidth of the line/space pair when the set of biased-line/space pairs are printed or simulated; and determining from the deviation a correction bias to apply to the line of the line/space pair. The invention also encompasses apparatus and computer programs for carrying out the methods.

Abstract: A method of evaluating process effects of multiple exposure photolithographic processes by first determining a set of expected images for each exposure step or process of the multiple exposure process individually and then obtaining a composite set of images by sequentially perturbing images from a first or previous exposure step by weighted images from the subsequent exposure step. Preferably, the expected images are determined by simulation in the form of normalized aerial images over a range of defocus for each exposure step, and the weighting factor used is the dose-ratio of the subsequent exposure dose to the prior step exposure dose. The resulting composite set of images may be used to evaluate multiple exposure processes, for example, to provide an estimate of yield for a given budget of dose and focus errors, or alternatively, to provide specifications for tool error budgets required to obtain a target yield.

Abstract: Disclosed are a novel organic photoconductive material suitable as a charge-transporting material in a photosensitive layer of an electrophotographic photoreceptor or usable in various display devices, and an electrophotographic photoreceptor which uses the above organic photoconductive material in a photosensitive layer and which exhibits a high charge potential and high sensitivity and also exhibits little or almost no change in various properties in repeated use and can exhibit stabilized performances. The present invention provides an organic photoconductive material comprising a compound having a specific structure and an electrophotographic photoreceptor having a photosensitive layer containing the above photoconductive material.

Abstract: An image forming apparatus including at least an image irradiator configured to irradiate a photoreceptor with a coherent light beam while scanning to form pixel light spots thereon for forming an electrostatic latent image thereon, wherein the light spots overlap with adjacent light spots; and an image developer configured to develop the electrostatic latent image with a developer, wherein the photoreceptor comprises an intermediate layer located overlying an electroconductive substrate, a charge generation layer located overlying the intermediate layer and a charge transport layer located overlying the charge generation layer, wherein the charge generation layer satisfies the following relationship: T1≦3.5% wherein T1 represents a relative mirror reflectance of the charge generation layer against the coherent light beam when the coherent light beam irradiates the charge generation layer at an incident angle of 5°.

Abstract: A coating liquid for an electrophotographic photoconductor intermediate layer comprising a titanium oxide and a polycarboxylic acid polymer in a solvent is provided. The content of the polycarboxylic acid polymer is 0.3 to 10 parts by weight in respect to 100 parts by weight of the titanium oxide, and an acid value of the polycarboxylic acid polymer is 30 to 400 mgKOH/g.

Abstract: The present invention relates to a negatively chargeable toner, comprising: toner particles prepared by means of a wet granulation method; and external additives externally added to the toner particles, wherein the external additives comprises a first hydrophobic silica having a mean primary particle size of 5 nm to 18 nm, a second hydrophobic silica having a mean primary particle size of 18 nm to 50 nm, which is greater than that of the first hydrophobic silica, and a hydrophobic titanium oxide having a mean primary particle size of 10 nm to 40 nm, and a full color image-forming method using the negatively chargeable toner.

Abstract: By atomizing a siloxane and an organic titanium compound for flame combustion, spherical complex oxide fine particles of amorphous silica-titania are obtained having a particle size of 10-300 nm, a specific surface area of 10-100 m2/g, and a titania content of 1-99% by weight. By hydrophobizing the fine particles and adding them to a toner, a developer is obtained which is improved in fluidity, cleanability and uniform and stable charging.

Abstract: A polyhydroxyalkanoate characterized by having in the molecule a unit represented by Chemical Formula (1): wherein n may assume any one integral value within the range of from 1 to 8. Also disclosed are a process for producing the polyhydroxyalkanoate by the use of a microorganism having the ability to produce the polyhydroxyalkanoate and accumulate it in the bacterial body; a charge control agent, a toner binder and a toner which contain this polyhydroxyalkanoate; and an image-forming method and an image-forming apparatus which make use of the toner.

Abstract: A toner for a liquid developer and the like which have low cohesive force and excellent dispersion stability and storage stability and which enable formation of high-quality images and are highly reliable. The toner for a liquid developer comprises an epoxy compound whose epoxy equivalent weight is 1000 or less. An aspect in which the epoxy compound is at least one selected from bisphenol A epoxy resins, novalak epoxy resins, bisphenol F epoxy resins, biphenyl epoxy resins, isocyanate-modified epoxy resins, naphthalene epoxy resins, dicyclo epoxy resins, and brominated epoxy resins, and the like are preferable.

Abstract: A photosensitive lithographic printing plate comprising: a support; and a photosensitive layer, wherein the photosensitive layer comprises: a polyurethane resin binder comprising an aliphatic cyclic structure which has a carboxyl group as a substituent directly or indirectly attached to the structure; or a polyvinyl alcohol resin binder modified with an acetal skeleton comprising an aliphatic cyclic structure.

Abstract: A directly imageable planographic printing plate precursor, which may be of the positive or negative type, has at least a heat sensitive layer on a substrate. The heat sensitive layer contains a light-to-heat conversion material and a metal-containing organic compound.

Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.

Abstract: The invention discloses an improvement in the photo-lithographic patterning process of a photoresist layer in the manufacture of semiconductor devices in which occurrence of defects in the patterned resist layer can be greatly suppressed resulting in increased reliability of the semiconductor devices and productivity thereof. The improvement can be accomplished by using a chemical-amplification positive-working photoresist composition which exhibits a rate of film thickness reduction in the range from 0.09 to 1.0 nm/second when the photoresist layer before light-exposure is kept in a 2.38% aqueous solution of tetramethylammonium hydroxide at 23° C. to dissolve away the resist layer.

Abstract: This invention relates to a photosensitive polyimide material having positive-type or negative-type photosensitivity, which may be developed with a high resolution with an irradiation energy having short wavelength such as ultraviolet light or electron beam. The positive-type photosensitive polyimide composition comprising a solvent-soluble polyimide which shows positive-type photosensitivity in the presence of a photoacid generator, which is obtained by polycondensation of at least one aliphatic tetracarboxylic dianhydride and/or alicyclic tetracarboxylic dianhydride and at least one aliphatic diamine and/or alicyclic diamine and/or diaminosiloxane; and the photoacid generator. Since the polyimide has negative-type photosensitivity when irradiated with electron beam in the absence of a photoacid generator, a method for forming negative-type polyimide pattern using the polyimide is also provided.

Abstract: A positive-working resist composition comprising (A) a specific resin which has an aliphatic cyclic hydrocarbon group and enhances in the dissolution rate in an alkaline developing solution by an action of an acid, and (B) a specific compound generating an acid by irradiation of actinic ray or radiation. The composition is excellent in the resolving power and the exposure margin, and can be suitably used for micro-photofabrication using far ultraviolet rays, particularly ArF eximer laser beams.

Abstract: To provide a lower layer resist composition for a silicon-containing two-layer resist, which is excellent in the dry etching resistance and film thickness uniformity. A lower layer resist composition for a silicon-containing two-layer resist, comprising (a) a phenol-based polymer, (b) a compound capable of generating a sulfonic acid at a temperature of 100° C. or more, (c) a phenol-based acid crosslinking agent having two or more benzene rings and capable of crosslinking with the polymer under the action of an acid, and (d) a solvent.

Abstract: A photosensitive polymer having a hydroxy alkyl vinyl ether monomer and a resist composition are provided. The photosensitive polymer includes an alkyl vinyl ether monomer having the formula, and the photosensitive polymer has a weight average molecular weight of 3,000 to 50,000: where x is an integer from 3 to 6 inclusive, R1 and R2 are independently alkyl having from 1 to 20 carbon atoms, fluorinated alkyl having from 1 to 10 carbon atoms or perfluoronated alkyl having from 1 to 10 carbon atoms.

Abstract: The invention relates to a process and apparatus for forming a photopolymerizable element useful as a flexographic printing plate having at least one layer of particulate material. The process includes forming a layer of a molten photopolymerizable material onto a support; and applying the particulate material onto an exterior surface of the photopolymerizable layer opposite the support within 48 hours of forming the layer of photopolymerizable material. The process optionally includes heating of the surface of the photopolymerizable layer.

Abstract: The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided is anodized but not subsequently modified by means of a post-anodic treatment compound, and the coating does not comprise a colorant dye. The polymeric substance may also comprise pendent infra-red or developer dissolution inhibiting groups, and these groups may also be the colorant groups themselves.

Abstract: Photopolymerization type photosensitive phosphor paste composition useful for formation of a fluorescent film in a plasma display panel which is one of flat panel display, and method for forming a fluorescent film in a plasma display panel by using the same, the composition consisting of a binder polymer, a multifunctional monomer or oligomer, a UV photosensitizer, a flourescent material, a solvent, additives and dispersant, whereby, different from the related art photosensitive flourescent paste, as the photopolymerization type photosensitive flourescent paste of the present invention can be developed by pure water, the paste is environment friendly and has a low baking temperature, that permits an easy flourescent film formation, the present invention is suitable for formation of a flourescent film for a large sized screen over 40″ and an HDTV PDP.

Abstract: The present invention discloses a lens arrangement for the particle-optical imaging of an object to be imaged and positionable in an object plane into an image area. In one embodiment, the lens arrangement includes a first focusing lens device for providing a field having a focusing effect on the imaging particles for imaging the object from the object area into an intermediate image area, a second focusing lens device for providing a further field having a focusing effect on the imaging particles for imaging the object, which has been imaged into the intermediate image area, into the image area, and a deflection lens device for providing a field having a deflecting effect on the imaging particles in a region of the intermediate image area. The deflection lens device is disposed in the intermediate image area primarily to compensate for aberrations, such as image field curvature.

Abstract: The present invention relates to a method of producing a structure of etch-resistant polymer on a substrate. A layer of sterol capable of polymerizing to form this structure is first deposited on a face of the substrate. Then, a first region of the layer of sterol is exposed to an electron beam to locally polymerize this layer and form the structure of etch-resistant polymer. A second region of the layer of sterol that has not been exposed to the electron beam is removed to leave on the face of the substrate only the structure of etch-resistant polymer. Finally, a region of the face of the substrate not covered by the structure of etch-resistant polymer can be etched away, and the structure of etch-resistant polymer removed following this etching.

Abstract: A photoresist layer is exposed two or more times. At least one exposure is conducted through a regular mask, and at least one exposure through a modified mask with a clear region overlapping the position of a non-clear region of the first mask. The radiation dose used with the modified mask is insufficient by itself to create a resist pattern on the substrate. The exposure through the modified mask alleviates the resist underexposure in concave corners of the opaque pattern of the regular mask. Instead of the modified mask, an exposure without a mask can be performed.

Abstract: A method of forming emitter tips for use in a field emission display. A dielectric layer, an insulating layer, and a conductor layer are formed on a substrate in sequence. An annular groove is formed the conductive layer and the insulating layer. A tip cavity with an insulating tip within is formed by isotropic wet etching. A molybdenum metal layer is formed on the insulating tip. The method of the present invention can substantially reduce the consumption of molybdenum.

Abstract: Methods for the preparation of multilayered resists are described. A first layer of photoresist is deposited onto a substrate. First portions of the first layer are exposed to a first dose of radiant energy. A second layer of photoresist is deposited at atop the first layer and second portions of the second layer are exposed to a second varied dose of radiant energy. The dose is modulated over different portions of a layer to preferentially enhance development within the interior of the structure to reduce total development times.

Abstract: A method of forming a silicon carbide layer, a silicon nitride layer, an organosilicate layer is disclosed. The silicon carbide layer is formed by reacting a gas mixture comprising a silicon source, a carbon source, and a fluorine source in the presence of an electric field. The silicon nitride layer is formed by reacting a gas mixture comprising a silicon source, a nitrogen source, and a fluorine source in the presence of an electric field. The organosilicate layer is formed by reacting a gas mixture comprising a silicon source, a carbon source, an oxygen source and a fluorine source in the presence of an electric field. The silicon carbide layer, the silicon nitride layer and the organosilicate layer are all compatible with integrated circuit fabrication processes.

Abstract: A method for using an excimer laser to pattern electrodeposited photoresist on a sloped surface of a wafer substrate includes depositing a layer of photoresist on top of a substrate that includes a sloped surface and scanning an excimer laser beam over the layer of photoresist to expose the layer of photoresist in a desired pattern. The scanning step includes projecting the excimer laser beam in a small beam spot onto the substrate and scanning the small beam spot of the excimer layer beam relative to the substrate to define the pattern sequentially onto the substrate, including the sloped surface.

Abstract: H2O vapor is used as a processing gas for stripping photoresist material from a substrate having a patterned photoresist layer previously used as an ion implantation mask, wherein the patterned photoresist layer is defined by a photoresist crust covering a bulk photoresist portion. Broadly speaking, the H2O vapor is demonstrated to more efficiently strip the photoresist material having a cross-linked photoresist crust without causing the photoresist crust to pop and without causing the bulk photoresist to be undercut. Thus, H2O vapor provides a safe, efficient, and economical processing gas for stripping photoresist material having a photoresist crust resulting from an ion implantation process.

Abstract: The invention provides a silver halide color photographic photosensitive material including a substrate and photographic layers containing a yellow color-developing blue light-sensitive silver halide emulsion layer, a magenta color-developing green light-sensitive silver halide emulsion layer, a cyan color-developing red light-sensitive silver halide emulsion layer and a non-photosensitive hydrophilic colloid layer, wherein a total gelatin coating amount in the photographic layers is within a range from 3 to 6 g/m2 and/or a total silver coating amount in the photographic layers is within a range from 0.2 to 0.5 g/m2, the yellow color-developing blue light-sensitive silver halide emulsion layer includes a silver halide emulsion having silver halide grains which have a sphere-equivalent diameter of no more than 0.6 &mgr;m and a silver chloride content of at least 90 mol %, and an image forming method utilizing the photosensitive material.

Abstract: A silver halide photographic material for direct observation comprising a support having on one side of the support, (a) a photosensitive layer comprising a silver halide emulsion; and (b) a non-photosensitive layer, wherein the photographic material comprises at least one oil-soluble dye having a maximum absorption wavelength of a spectral reflection density curve in a range of 540 to 580 nm and exhibiting an absorption density at 440 nm of not more than ¼ of an absorption density at the maximum absorption wavelength.

Abstract: The bacterial phosphotransferase system (PTS) as a drug target system catalyses the uptake and phosphorylation of carbohydrates. It is further involved in signal transduction, e.g. catabolite repression, chemotaxis, and allosteric regulation of metabolic enzymes and transporters. It is ubiquitous in bacteria but does not occur in eukaryotes. This uniqueness and the pleiotropic function make the PTS a target for the development of new antimicrobials. Assays are described that lead to the discovery of compounds which uncouple the PTS, by acting as protein histidine/cysteine phosphatases. Uncoupling of the PTS leads to inhibition of carbohydrate transport, repression of catabolite controlled genes (e.g. certain virulence genes) and depletion of phosphoenolpyruvate. Compounds from combinatorial libraries with high affinity for phosphoenolpyruvate-protein-phosphatase (Enzyme 1) serve as lead structures for the development of inhibitors and uncouplers of the PTS.

Abstract: The present invention provides methods of identifying cellular genes necessary for viral growth and cellular genes that function as tumor suppressors. Thus, the present invention provides nucleic acids related to and methods of reducing or preventing viral infection or cancer. The invention also provides methods of producing substantially virus-free cell cultures and methods for screening for additional such genes.

Abstract: A c143 monoclonal antibody which is used for detecting a bovine individual having a possibility of onset of bovine leukemia; a monoclonal antibody which is used for detecting a bovine individual having a possibility of onset of bovine leukemia, wherein the monoclonal antibody has the substantially same reactivity as the c143 monoclonal antibody to a bovine MHC Class II DR molecule to which a possibility of onset of bovine leukemia is attributable; and an agent for diagnosing a possibility of onset of bovine leukemia which comprises the aforementioned monoclonal antibody. Bovine individuals having a possibility of onset of bovine leukemia can be conveniently and accurately detected.

Abstract: Method for screening for an antiviral agent, by determining whether a potential agent interacts with a virus or cellular component which allows or prevents preferential translation of a virus RNA compared to a host RNA under virus infection conditions; and determining whether any interaction of the agent with the component reduces the level of translation of an RNA of the virus.

Abstract: The present invention provides a method for isolating a double-stranded cDNA having a nucleotide sequence of a complete open reading frame which comprises: (A) admixing (i) an isolated single-stranded cDNA, (ii) a first primer capable of forming a stem-loop structure, comprising (a) at the 3′ end of the primer, a first random sequence, linked to (b) a second sequence, linked to (c) a third sequence which forms a loop structure, linked to (d) a fourth sequence, at the 5′ end of the first primer, which is complementary to the second sequence, under hybridization conditions sufficient for annealing the first sequence of the first primer to the sequence at the 3′ end of the single-stranded cDNA, and (iii) a polymerase; (B) incubating the mixture from step (A) under suitable conditions for DNA synthesis; and (C) performing a polymerase chain reaction by admixing (i) an aliquot of the mixture from (B), (ii) a second primer which specifically binds to the single-stranded cDNA, (iii) a third primer

Abstract: A method for separating and collecting nucleic acids, which comprises: a step of bringing a sample nucleic acid solution into contact with a nucleic acid-immobilized substrate comprising a substrate and two or more kinds of single-stranded nucleic acids separately immobilized on the substrate, to allow hybridization of the immobilized single-stranded nucleic acids and single-stranded nucleic acids complementary to the immobilized single-stranded nucleic acids, and a step of separating the hybridized single-stranded nucleic acids according to immobilized portions of the immobilized nucleic acids, to collect the hybridized single-stranded nucleic acids without disassembling the nucleic acid-immobilized substrate.

Abstract: The present invention relates to markers of endometriosis which are differentially expressed in the endometrial cells of females with endometriosis compared to endometriosis-free females. The invention also relates to methods for determining likelihood of endometriosis in female subjects, to methods for grading endometriosis in females suffering from endometriosis and to methods for treating this disease. The invention is also concerned with polynucleotides, probes, primers and kits useful for reducing into practice the above-mentioned methods which are more rapid, non invasive, much less complicated and much less costly than laparoscopy.

Abstract: Disclosed are methods for allele discrimination involving the use of rolling circle amplification (RCA) coupled with primer extension and utilizing exonuclease deficient polymerases to distinguish matched and unmated single nucleotide sites, such as in the case of a single nucleotide polymorphism (SNP).

Abstract: Methods, systems and assays are provided for FP detection of nucleic acid hybridization.

Abstract: The present invention provides methods of regulating gene expression using recombinant zinc finger proteins, for functional genomics and target validation applications.

Abstract: The invention provides methods of detecting a nucleic acid. The methods comprise contacting the nucleic acid with one or more types of particles having oligonucleotides attached thereto. In one embodiment of the method, the oligonucleotides are attached to nanoparticles and have sequences complementary to portions of the sequence of the nucleic acid. A detectable change (preferably a color change) is brought about as a result of the hybridization of the oligonucleotides on the nanoparticles to the nucleic acid. The invention also provides compositions and kits comprising particles. The invention further provides methods of synthesizing unique nanoparticle-oligonucleotide conjugates, the conjugates produced by the methods, and methods of using the conjugates. In addition, the invention provides nanomaterials and nanostructures comprising nanoparticles and methods of nanofabrication utilizing nanoparticles. Finally, the invention provides a method of separating a selected nucleic acid from other nucleic acids.

Abstract: Improved methods and reagents for chromosome walking of nucleic acid are discussed herein. A library of amplifiable nick translation molecules is generated, and a chromosome walk is initiated from a known sequence in the nucleic acid by producing at least one nick translate molecule, sequencing part of the nick translate molecule, and producing a second nick translate molecule by initiating the primer extension from the region of the obtained sequence of the prior nick translate molecule.

Abstract: The present invention relates to a method for genotyping a diploid organism by cleaving segments of two alleles such that 7-20 nucleotide fragments that contain a suspected polymorphic locus are produced and comparing the masses of those fragments.

Abstract: One embodiment of the invention is a method of producing an oligonucleotide extended by a single nucleotide base. An oligonucleotide and an extension terminating nucleotide are mixed with an enzyme having terminal transferase activity. The reaction produces an oligonucleotide extended by a single base. The extended oligonucleotide may be used as a size standard for single base extension reactions. Another embodiment of the invention is a method of producing a mixture of oligonucleotides extended by different single bases. An oligonucleotide, a first extension terminating nucleotide, and a second extension terminating nucleotide are mixed with an enzyme having terminal transferase activity. The first and second extension terminating nucleotides comprise different nucleotide bases and are labeled with different labels. The identity of the different extension terminating nucleotides (and hence the extended oligonucleotides) may be ascertained by reference to the specific label incorporated.

Abstract: Assay for detecting the amount or presence of target ligand in a sample. The assay includes a ligand analogue conjugate having a linkage site and a binding site, a ligand receptor, and a sample. The assay includes the steps of providing at least one crosstalk inhibitor. This inhibitor, under assay conditions, competes with the linkage site of the ligand analogue conjugate for binding to the ligand receptor, and does not compete with the binding site of the ligand analogue conjugate for binding to the ligand receptor. In the invention, the assay is performed for the target ligand in the presence of a sufficient amount of the crosstalk inhibitor to reduce the amount of binding of the linkage site of the ligand analogue conjugate to the ligand receptor. The invention also features a method for identifying crosstalk inhibitors, and the crosstalk inhibitors themselves.

Abstract: The invention concerns the use of functional derivatives of ICAM-1 to treat viral infection. The invention also provides a vaccine to prevent such infection, and a diagnostic assay to determine the existence and extent of such infection.

Abstract: The present invention provides isolated bovine Neospora cultures. Also provided are recombinant immunodominant Neospora antigens. The cultures and antigens are used to develop diagnostic assays for the detection of Neospora infections in cattle and other animals. Also provided are pharmaceutical compositions for the treatment and prevention of Neospora infections.

Abstract: Methods for detecting anti-lipidic particles antibodies and lipidic particles in cellular membranes for the diagnosis of diseases associated to the antiphospholipid syndrome are disclosed. Kits or sets to put these methods of diagnosis into practice are also disclosed. Methods for the therapeutically treatment of diseases associated to the antiphospholipid syndrome are disclosed as well. In addition, methods for the detection of the diverse physiologic states of cells, and those kits useful for this are also disclosed.

Abstract: The present invention relates to monoclonal antibodies against the human Mcm3 protein, hybridoma cell lines that produce such antibodies, procedures for the production and their use, pharmaceutical compositions comprising a monoclonal antibody according to the present invention, their use for the prevention and treating of certain diseases as well as methods relating to the prevention and treatment of diseases associated with Mcm3 expression. Monoclonal antibodies according to the invention detect and bind human Mcm3 monospecifically both in immunohistological and immunobiochemical detection systems. The process for the production of these monoclonal antibodies comprises an initial screening of excess hybridoma supernatant with immunobiochemical methods followed by a second screening of positive hybridoma by means of an immunohistochemical method.

Abstract: Methods of treatment of subjects for decreasing cell mediated autoimmunity or humoral autoimmunity by administering an R′-Glu-Trp-R″ pharmaceutical preparation useful in subjects having autoimmune diseases.