Patents Issued in October 12, 2004
  • Patent number: 6803154
    Abstract: Disclosed is a method of manufacturing a two-dimensional phase type element, which includes the steps of forming, on a substrate, a first etching mask in a checkered pattern, forming segments of multiple levels at a portion not covered by the first mask, forming a second etching mask corresponding to an inversion of the first etching mask, removing the first etching mask, and forming segments of multiple levels at a portion not covered by the second etching mask.
    Type: Grant
    Filed: September 1, 2000
    Date of Patent: October 12, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventor: Ichiro Tanaka
  • Patent number: 6803155
    Abstract: A method of formulating and fabricating a mask pattern and resulting mask for forming isolated or closely spaced contact holes in an integrated circuit. The mask has a transparent mask substrate and patterned regions of attenuating phase shift material and opaque, partially transmissive or transparent material arranged to reduce the effect of side lobes and improve depth of focus. The rims, frames and outrigger patterns for the attenuating phase shift material and opaque, partially transmissive or transparent material are determined according to calculations performed on a processor with imaging software for various optical conditions and exposed feature criteria.
    Type: Grant
    Filed: July 31, 2001
    Date of Patent: October 12, 2004
    Assignee: Micron Technology, Inc.
    Inventors: H. Daniel Dulman, William A. Stanton
  • Patent number: 6803156
    Abstract: A photomask (8) protected against electrostatic damage and a method of manufacturing such a photomask is disclosed. The photomask (8) comprises a transparent substrate (10) on which is deposited an opaque pattern such as lines (12), (14), (16) and (18). A transparent conductive film (30) is deposited over the substrate (10) and pattern such that the various portions of the pattern (lines (12), (14), (16) and (18)) are all maintained at the same electrical potential thereby preventing damage due to an electrostatic discharge.
    Type: Grant
    Filed: August 1, 2001
    Date of Patent: October 12, 2004
    Assignee: Infineon Technologies Richmond, LP
    Inventor: Shahzad Akbar
  • Patent number: 6803157
    Abstract: A semiconductor pattern mask that might otherwise exhibit three-fold symmetry, which could give rise to distorted semiconductor features in the presence of three-leaf aberration in the optical system used to expose a semiconductor wafer through the mask, is altered to break up the three-fold symmetry without altering the semiconductor features that are formed. This accomplished by adding features to the mask that break up the symmetry. One way of achieving that result is to make the added features of “sub-resolution” size that do not produce features on the exposed wafer. Another way of achieving that result is to change existing features that do form structures in such a way (e.g., with optical elements) that changes the relative phase, amplitude or other characteristic of light transmitted through those features.
    Type: Grant
    Filed: March 1, 2002
    Date of Patent: October 12, 2004
    Assignee: Micron Technology, Inc.
    Inventors: Pary Baluswamy, William A. Stanton, William J. Baggenstoss
  • Patent number: 6803158
    Abstract: A photomask and a method for forming an opaque border on the same are disclosed. In an example method of manufacturing a photomask, no more than one patterning operation is used to form a mask field with an opaque border substantially surrounding the mask field. The border region may be substantially covered by an opaque material, and features in the mask field may be free from the opaque material. When the photomask is used to expose a pattern on an object, the opaque border may substantially prevent electromagnetic radiation (EMR) from exposing portions of the object outside the field of exposure associated with the mask field. The operation of forming the mask field may include forming an insulating clear region surrounding the features and leaving the border region outside the insulating clear region. The opaque layer may be deposited by electroplating or spraying an opaque material onto the border region.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: October 12, 2004
    Assignee: DuPont Photomasks, Inc.
    Inventors: Joseph Stephen Gordon, Gregory P. Hughes, Franklin Dean Kalk, Hakki Ufuk Alpay
  • Patent number: 6803159
    Abstract: The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system attached to the pellicle spacer. The present invention further describes a method of keeping contaminants away from a vicinity of a mask during exposure, the contaminants including an uncharged or neutral particle, a positively-charged particle, or a negatively-charged particle, comprising: inducing a positive or negative charge on the uncharged or neutral particle; attracting the positively-charged particle with a negatively-charged electric field; and attracting the negatively-charged particle with a positively-charged electric field.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: October 12, 2004
    Assignee: Intel Corporation
    Inventor: Dan Enloe
  • Patent number: 6803160
    Abstract: A multi-tone photomask and method for manufacturing the same are disclosed. A photomask includes a filter layer formed on at least a portion of a substrate. The filter layer includes a first pattern formed by a first etch process. A barrier layer including the first pattern is formed on at least a portion of the filter layer by a second etch process. An absorber layer including a second pattern is formed on at least a portion of the barrier layer by a third etch process. The barrier layer further acts as an etch stop for the third etch process.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: October 12, 2004
    Assignee: DuPont Photomasks, Inc.
    Inventors: Eric V. Johnstone, Franklin D. Kalk
  • Patent number: 6803161
    Abstract: An improvement is provided in the photolithographic patterning of a photoresist layer by pattern-wise exposure to short-wavelength ultraviolet light through a pattern-bearing photomask which is dustproof protected by mounting a framed pellicle thereon. With an object to overcome the troubles therein due to absorption of short-wavelength ultraviolet light by oxygen and the interaction of atmospheric oxygen in the space surrounded by the photomask and the framed pellicle with the energy of the short-wavelength ultraviolet, the framed pellicle is provided in the frame with at least two gas-passage openings through which the air inside is replaced with nitrogen in conducting the ultraviolet exposure. The openings are preferably covered with a filter member and covered further with a covering member having a gas nozzle which is connected to a feed source of an inert gas such as nitrogen.
    Type: Grant
    Filed: April 22, 2003
    Date of Patent: October 12, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Toru Shirasaki
  • Patent number: 6803162
    Abstract: An image forming apparatus including a photoreceptor, wherein the photoreceptor includes an image forming portion having two ends substantially parallel to the rotating direction and a gap forming member located outside of each of the two ends of the image forming portion; a charging roller configured to charge the photoreceptor, wherein the charging roller contacts the gap forming members of the photoreceptor to form a gap g between the surface of the image forming portion and the peripheral surface thereof; an imagewise light irradiator; an image developer; and an image transfer device, wherein the relationship t≧2g is satisfied, where g represents the gap and t represents a distance between an inside edge of one of the gap forming members and nearer one of the two ends of the image forming portion of the photoreceptor.
    Type: Grant
    Filed: July 26, 2002
    Date of Patent: October 12, 2004
    Assignee: Ricoh Company, Ltd.
    Inventor: Tatsuya Niimi
  • Patent number: 6803163
    Abstract: A high-sensitivity and long-life electrophotographic photoreceptor comprising an electroconductive substrate and at least a photosensitive layer on the electroconductive substrate is provided, wherein the photosensitive layer contains a polyarylate resin not having a nitrogen atom in its repeating unit, and the Hall mobility at an electric field strength of 3×105 (V/cm) and at a temperature of 21° C. of the photosensitive layer is 3×10−6 (cm2/Vs) or more.
    Type: Grant
    Filed: June 3, 2003
    Date of Patent: October 12, 2004
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Teruyuki Mitsumori, Akiteru Fujii, Mamoru Nozomi, Satoshi Kato, Yuuta Kumano
  • Patent number: 6803164
    Abstract: A magnetic black toner comprising magnetic black toner particles containing at least a binder resin and a magnetic material. The toner has a weight-average particle diameter of from 5 &mgr;m to 12 &mgr;m, and the toner has, in its particles of 3 &mgr;m or more in diameter, at least 90% by number of particles with a circularity of 0.900 or more and has an average circularity of from 0.940 to 0.970. The magnetic material comprises iron oxide particles which have an average particle diameter of from 0.10 &mgr;m to 0.30 &mgr;m, contain titanium or a titanium compound in an amount of from 0.3% by weight to 1.5% by weight in terms of titanium, based on the total weight of the iron oxide particles, and have the ratio of the proportion of FeO to the total Fe content in 10% by weight from the particle surface, A %, to the proportion of FeO to the total Fe content in the remainder 90% by weight, B %, which satisfies the expression: 0.7≦A/B≦1.0.
    Type: Grant
    Filed: September 11, 2002
    Date of Patent: October 12, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yuichi Mizoo, Tadashi Dojo, Nene Shibayama, Yusuke Hasegawa
  • Patent number: 6803165
    Abstract: A toner for electrophotography contains at least one kind of cyclic compound selected from cyclic oligomers and cyclic polymers substantially having no terminal group, and the image forming device includes at least an electrostatic latent image carrier, an electrostatic latent image forming means for forming electrostatic latent images on the electrostatic latent image carrier, a developing means for forming visible images by developing the electrostatic latent images containing a developing agent for electrophotography, and a transfer means for transferring the visible images to a transfer material. Thus, the present invention provides a toner for electrophotography capable of providing well-balanced electrostatic property and fixing property during the image forming process in order to form images of high quality in a stable manner, and an image forming device.
    Type: Grant
    Filed: March 22, 2002
    Date of Patent: October 12, 2004
    Assignee: Fuji Xerox, Co., Ltd.
    Inventors: Seijiro Ishimaru, Yasushige Nakamura
  • Patent number: 6803166
    Abstract: A process comprising heating a latex and a colorant, and optionally a wax, and wherein the latex contains a polymer with a Mz value of from about 60,000 to about 150,000.
    Type: Grant
    Filed: February 18, 2003
    Date of Patent: October 12, 2004
    Assignee: Xerox Corporation
    Inventors: Chieh-Min Cheng, Emily L. Moore, Amy A. Albright, Tie Hwee Ng
  • Patent number: 6803167
    Abstract: Processes for imaging and developing imageable elements useful as lithographic printing plate precursors either thermally or with ultraviolet radiation that use the same developer are disclosed. The imageable elements comprise a top layer and an underlayer. The top layer contains a phenolic polymer and a material that has either the o-benzoquinonediazide functionality or the o-diazonaphthoquinone functionality. The developer is a 20:80 to 80:20 mixture of (1) an aqueous alkaline developer that has a pH greater than 11 and contains about 2 wt % to about 8 wt % of an alkali metal silicate, and (2) a solvent based developer that contains about 0.5 wt % to about 15 wt % of an organic solvent or mixture of organic solvents.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: October 12, 2004
    Assignee: Kodak Polychrome Graphics, LLC
    Inventors: Jayanti Patel, Kevin B. Ray, Jianbing Huang
  • Patent number: 6803168
    Abstract: A composition for an anti-reflective coating or a radiation absorbing coating which can form an anti-reflective coating or a radiation absorbing coating having high absorption to exposed radiation in the range of 100 to 450 nm, no diffusion of photo-generated acid to anti-reflective coating and so on, no intermixing of resist and anti-reflective coating layer, good shelf-life stability, and good step coverage and novel compounds and polymers being preferably used in the composition are disclosed. The composition contains an acrylic or methacrylic compound or polymer with an isocyanate or thioisocyanate group bonded through an alkylene group to a side chain thereof or with an amino or hydroxyl group-containing organic chromophore which absorbs radiation in the range of 100 to 450 nm wavelength and is bonded, for example, through an alkylene group to the isocyanate or thioisocyanate group. Resist patters with high resolution are formed on a substrate.
    Type: Grant
    Filed: January 26, 1999
    Date of Patent: October 12, 2004
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Munirathna Padmanaban, Wen-Bing Kang, Hatsuyuki Tanaka, Ken Kimura, Georg Pawlowski
  • Patent number: 6803169
    Abstract: The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size.
    Type: Grant
    Filed: February 17, 2001
    Date of Patent: October 12, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: James F. Cameron, James Michael Mori, George W. Orsula, James W. Thackeray
  • Patent number: 6803170
    Abstract: A resist composition comprises: at least one type of a first compound having two or more intramolecular adamantyl structures represented by the chemical formula 1 below; a base resin; and a second compound which generates an acid by active beam irradiation. wherein X is —(OCO)m—(CH2)n—(COO)m—, where m=0 or 1 and n=0, 1, 2 or 3 provided when n=0, m=0; and Y and Z are H, OH, F, Cl, Br, R or COOR, where Y may be Z, or Y and Z may be introduced in a single adamantyl structure and R represents a straight or branched alkyl group having 1 to 8 carbon atoms.
    Type: Grant
    Filed: August 10, 2001
    Date of Patent: October 12, 2004
    Assignees: Semiconductor Leading Edge Technologies, Inc., Idemitsu Petrochemical Co., Ltd.
    Inventors: Minoru Toriumi, Isao Satou, Hiroyuki Watanabe, Shunji Katai, Shintaro Suzuki
  • Patent number: 6803171
    Abstract: Disclosed are photoimageable compositions containing silsesquioxane binder polymers and photoactive compounds, methods of forming relief images using such compositions and methods of manufacturing electronic devices using such compositions. Such compositions are useful as photoresists and in the manufacture of optoelectronic devices.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: October 12, 2004
    Assignee: Shipley Company L.L.C.
    Inventors: Dana A. Gronbeck, George G. Barclay, Leo L. Linehan, Kao Xiong, Subbareddy Kanagasabapathy
  • Patent number: 6803172
    Abstract: An organic anti-reflective material, in particular one which prevents back reflection from the surface of or lower layers in the semiconductor device and eliminates the standing waves and reflective notching due to the optical properties of lower layers on the wafer, and due to the changes in the thickness of the photosensitive film applied thereon. The organic anti-reflective polymer is useful for forming ultrafine patterns of 64M, 256M, 1G, and 4G DRAM semiconductor devices. A composition containing such an organic anti-reflective polymer, and an anti-reflective coating formed therefrom and a preparation method thereof are also disclosed.
    Type: Grant
    Filed: October 16, 2002
    Date of Patent: October 12, 2004
    Assignee: Hynix Semiconductor Inc.
    Inventors: Min-ho Jung, Joong-il Choi
  • Patent number: 6803173
    Abstract: A positive resist composition comprising: (A) a polymer having a silicon atom in a side chain thereof, which is insoluble or sparingly soluble in an aqueous alkali solution and becomes soluble in an aqueous alkali solution by an action of an acid; and (B) an acid generator capable of generating an acid on exposure to active light rays or a radiation, which is represented by the formula (I) defined in the present specification.
    Type: Grant
    Filed: January 14, 2003
    Date of Patent: October 12, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuya Uenishi, Kunihiko Kodama
  • Patent number: 6803174
    Abstract: Disclosed is a method for forming a photosensitive insulating film pattern and a reflection electrode each having an uneven upper surface, and a method for manufacturing an LCD having a reflection electrode using the same. A photosensitive insulating film is formed on a first substrate on which a first electrode having a reflection property is formed. The photosensitive insulating film is exposed to a light. The exposed photosensitive insulating film is developed to form an uneven surface with prominences and recesses. The reflection electrode is formed on the photosensitive insulating film. A second substrate having a transparent electrode is formed to face the first substrate. A liquid crystal layer is sandwiched between the first substrate and the second substrate.
    Type: Grant
    Filed: July 9, 2002
    Date of Patent: October 12, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yong-Kyu Jang, Jae-Hyun Kim
  • Patent number: 6803175
    Abstract: A method of producing a pattern-formed structure, comprising: preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer whose characteristic at a surface thereof can be modified by the action of photocatalyst; preparing a photocatalyst-containing-layer side substrate having a photocatalyst-containing layer formed on a base material, the photocatalyst-containing layer containing photocatalyst; arranging the substrate for a pattern-formed structure and the photocatalyst-containing-layer side substrate such that the characteristic-modifiable layer faces the photocatalyst-containing layer with a clearance of no larger than 200 &mgr;m therebetween; and irradiating energy to the characteristic-modifiable layer from a predetermined direction, and modifying characteristic of a surface of the characteristic-modifiable layer, thereby forming a pattern at the characteristic-modifiable layer.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: October 12, 2004
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventor: Hironori Kobayashi
  • Patent number: 6803176
    Abstract: A method for forming a fine pattern in a semiconductor substrate, by coating a target layer to be etched on a semiconductor substrate with a resist composition including at least one compound capable of forming a photoresist pattern by a photolithography process, and a free radical initiator. The free radical initiator is capable of being decomposed by a thermal process at a temperature equal to or higher than the glass transition temperature of the at least one compound. A lithography process is performed on the resist compound layer to form a photoresist pattern. The resist compound layer having the photoresist pattern formed therein is heated to a temperature equal to or higher than the glass transition temperature of the at least one compound, and wherein a partial cross-linking reaction in the resist composition occurs.
    Type: Grant
    Filed: August 23, 2002
    Date of Patent: October 12, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-jun Choi, Yool Kang, Joo-tae Moon, Jeong-hee Chung, Sang-gyun Woo
  • Patent number: 6803177
    Abstract: Novel silver compounds can include a primary core of a photosensitive silver halide and a shell covering the primary core. This shell includes one or more non-photosensitive silver salts, each silver salt including an organic silver coordinating ligand. Other novel silver compounds are homogeneous silver salts of organic silver coordinating ligands throughout (non-core-shell). Still other silver compounds can include a primary core of a non-photosensitive metal salt and a shell covering the primary core. This shell includes one or more non-photosensitive silver salts, each silver salt including an organic silver coordinating ligand. These types of silver compounds can be used as sources of reducible silver ions in thermally developable imaging materials including thermographic and photothermographic materials.
    Type: Grant
    Filed: July 30, 2002
    Date of Patent: October 12, 2004
    Assignee: Eastman Kodak Company
    Inventors: Boris B. Bokhonov, Lilia P. Burleva, David R. Whitcomb, Nepal C. Howlader, Louis M. Leichter
  • Patent number: 6803178
    Abstract: There is provided a method of making plurality of features in a first layer. A photoresist layer is formed over the first layer. Dense regions in the photoresist layer are exposed through a first mask under a first set of illumination conditions. Isolated regions in the photoresist layer are exposed through a second mask different from the first mask under a second set of illumination conditions different from the first set of illumination conditions. The exposed photoresist layer is patterned and then the first layer is patterned using the patterned photoresist layer as a mask.
    Type: Grant
    Filed: June 25, 2001
    Date of Patent: October 12, 2004
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Ramkumar Subramanian, Scott A. Bell, Todd P. Lukanc, Marina V. Plat, Uzodinma Okoroanyanwu, Hung-Eli Kim
  • Patent number: 6803179
    Abstract: Concentrated and working strength photographic color developing compositions are stabilized with the inclusion of two specific types of calcium ion sequestering agents. One of the sequestering agents is a polyelectrolyte such as a polycarboxylic acid or salt thereof having a molecular weight of from about 2000 to about 100,000. The other one is a non-polymeric aminocarboxylic acid, polyphosphonic acid, or a salt thereof. The weight ratio of the first calcium ion sequestering agent to the second calcium ion sequestering agent is from about 1:1 to about 20:1. These compositions can be used to process color photographic materials such as color photographic papers.
    Type: Grant
    Filed: August 12, 2003
    Date of Patent: October 12, 2004
    Assignee: Eastman Kodak Company
    Inventors: Shirleyanne E. Haye, Janet M. Huston
  • Patent number: 6803180
    Abstract: An information recording material which contains a fluorine-containing nonionic surfactant, 1.5×10−5 mol/m2 or more of a polyvalent metal salt, and an anionic surfactant capable of forming a sparingly soluble salt in an aqueous solution with the polyvalent metal, in the outermost layer on a support on the side of an information recording layer. The information recording material is less in static charge and improved in surface deficiencies due to coating.
    Type: Grant
    Filed: April 21, 2003
    Date of Patent: October 12, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tomoaki Nagahara, Gen Hayashi
  • Patent number: 6803181
    Abstract: A dye-forming coupler of the formula (I). A silver halide photographic light-sensitive material that contains at least one dye-forming coupler of the formula (I). A method for producing an azomethine dye, which method comprises using a compound of the formula (I): wherein E is an aryl, heterocyclic, or —C(═O)W group, in which W is a nitrogen-containing heterocyclic group, Z is an aryl or heterocyclic group, and X and Y each independently are ═O, ═S or ═N—R, in which R is a substituent, with the proviso that when E is an aryl or heterocyclic group, X and Y each are ═O, and that when E is a —C(═O)W group, Z is a substituted aryl group.
    Type: Grant
    Filed: October 15, 2002
    Date of Patent: October 12, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shigeki Uehira, Jun Ogasawara, Kiyoshi Takeuchi, Yasuhiro Shimada, Yasuaki Deguchi
  • Patent number: 6803182
    Abstract: A gallium halide coordination complex is described of the formula (I): [RxNHy]3GaX6 wherein R represents a lower alkyl group of from 1-3 carbon atoms; X is Cl, Br, or I; and x is from 1-3, y is from 1-3, and x+y=4. In a further aspect, a process for incorporating gallium in a silver halide emulsion is described comprising precipitating silver halide emulsion grains in a reaction vessel, wherein a gallium halide coordination complex of the formula (I) is introduced into the reaction vessel or formed in situ during precipitation of the silver halide grains. The isolation, or in-situ preparation, of a six coordinate gallium halide complex of Formula (I) in accordance with the invention has been found to enable the preparation of gallium doped silver halide emulsions with improved speed/grain performance.
    Type: Grant
    Filed: April 30, 2003
    Date of Patent: October 12, 2004
    Assignee: Eastman Kodak Company
    Inventor: Tommie L. Royster, Jr.
  • Patent number: 6803183
    Abstract: In general, a method for removal of pyrogens from plasma or blood according to the present invention comprises: (1) passing the biological fluid through a resin comprising two components: (a) a first component comprising a polymeric support with a multiplicity of ligands comprising a C10-C24 alkylamino group, the ligands specifically binding endotoxin; and (b) a second component comprising a halogenated quinolone moiety immobilized on an amino-group-containing solid support by the formation of an amide linkage, the first component and the second component being present in the resin at a ratio of from about 20:80 (v/v) to about 80:20 (v/v); and (2) collecting the biological fluid from which pyrogens have been removed. Preferably, the alkylamino group is a stearylamino group, and the ligands are cross-linked and quaternized by reaction with a dibromoalkanol. Preferably, the polymeric support of the first component is agarose in particulate form.
    Type: Grant
    Filed: July 18, 2002
    Date of Patent: October 12, 2004
    Assignee: Clarigen, Inc.
    Inventors: Marie-Claude Amoureux, Edit Hegyi, Peter Grandics, Susan Szathmary
  • Patent number: 6803184
    Abstract: Novel human MOAT genes and their encoded proteins are provided herein. The MRP-related ABC transporters encoded by the disclosed nucleic acid sequences play a pivotal role in the efflux of pharmacologically beneficial reagents from tumor cells. MOAT genes and their encoded protein provide valuable therapeutic targets for the design of anti-cancer agents which inhibit the aberrant growth of malignant cells.
    Type: Grant
    Filed: September 27, 2000
    Date of Patent: October 12, 2004
    Assignee: Fox Chase Cancer Center
    Inventors: Gary Kruh, Kun Lee
  • Patent number: 6803185
    Abstract: The invention provides a method for measuring an acyl coenzyme A (acyl CoA) ester or esters in a sample, comprising the steps of: a) forming a reaction mixture comprising the sample to be tested and a derivatizing agent; b) allowing the sample and said derivatizing agent to react, so as to form a fluorescent derivative(s) of any acyl CoA ester(s) present in the sample; and c) determining a level of said fluorescent derivative(s).
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: October 12, 2004
    Assignee: The University of York
    Inventors: Ian Alexander Graham, Tony Robert Larson
  • Patent number: 6803186
    Abstract: The present invention provides novel isolated and purified nucleic acid (RNA or DNA) encoding, or complementary to, a canine PepT1 (cPepT1). The present invention also provide a method for determining canine PepT1-transportability of a peptide, or method for determining a peptide with beneficial nutritional property in an animal. The present invention further provides a dietary composition for an animal comprising a peptide identified by the method described above.
    Type: Grant
    Filed: March 1, 2002
    Date of Patent: October 12, 2004
    Assignee: The IAMS Company
    Inventors: Gary Mitchell Davenport, Jamie Clyde Matthews
  • Patent number: 6803187
    Abstract: The present invention relates to a method for the rapid and reliable detection of drug-selected mutations in the HIV protease gene allowing the simultaneous charaterization of a range of codons involved in drug resistance using specific sets of probes optimized to function together in a reverse-hybridization assay.
    Type: Grant
    Filed: June 25, 2001
    Date of Patent: October 12, 2004
    Assignee: Innogenetics N.V.
    Inventor: Lieven Stuyver
  • Patent number: 6803188
    Abstract: This invention provides tandem fluorescent protein construct including a donor fluorescent protein moiety, an acceptor fluorescent protein moiety and a linker moiety that couples the donor and acceptor moieties. The donor and acceptor moieties exhibit fluorescence resonance energy transfer which is eliminated upon cleavage. The constructs are useful in enzymatic assays.
    Type: Grant
    Filed: January 31, 1996
    Date of Patent: October 12, 2004
    Assignee: The Regents of the University of California
    Inventors: Roger Y. Tsien, Roger Heim
  • Patent number: 6803189
    Abstract: The invention provides a wide range of methods and compositions for detecting and treating cervical cancer in an individual. Specifically, the invention provides target cervical cancer-associated proteins, which permit a rapid detection, preferably before metastases occur, of cervical cancer. The target cervical cancer-associated protein, may be detected, for example, by reacting the sample with a labeled binding moiety, for example, a labeled antibody capable of binding specifically to the protein. The invention also provides kits useful in the detection of cervical cancer in an individual. In addition, the invention provides methods utilizing the cervical cancer-associated proteins either as targets for treating cervical cancer or as indicators for monitoring of the efficacy of such a treatment.
    Type: Grant
    Filed: May 17, 1999
    Date of Patent: October 12, 2004
    Assignee: Matritech, Inc.
    Inventors: Susan K. Keesee, Robert Obar, Ying-Jye Wu
  • Patent number: 6803190
    Abstract: Genetic markers in the Porcine melanocortin-4 receptor (MC4R) gene are disclosed which are associated with fat content, growth rate, and feed consumption. Further, novel sequence data from regions of the gene are disclosed which may be used in a PCR test to screen for the presence of the marker. The genetic marker may be used to screen animals for breeding purposes which have the desired traits regarding fat content, growth rate, and feed consumption. Kits which take advantage of the PCR test are also disclosed.
    Type: Grant
    Filed: July 24, 2000
    Date of Patent: October 12, 2004
    Assignee: Iowa State University Research Foundation, Inc.
    Inventors: Max F. Rothschild, Kwan Suk Kim, Niels J. Larson
  • Patent number: 6803191
    Abstract: A Candida albicans gene, CaNik1, is involved in phenotypic switching which is significant because of a direct correlation between the switching and the level of virulence of the organism. A method of screening for anti-fungal pharmaceutical candidates entails bringing a test substance into contact with cells containing a CaNik1 gene or a variant thereof and then monitoring the effect, if any, on the level of expression of the gene.
    Type: Grant
    Filed: January 20, 2000
    Date of Patent: October 12, 2004
    Assignee: University of Iowa Research Foundation
    Inventors: Thyagarajan Srikantha, David R. Soll
  • Patent number: 6803192
    Abstract: The invention provides novel polypeptides useful for co-stimulating T cells, isolated nucleic acid molecules encoding them, vectors containing the nucleic acid molecules, and cells containing the vectors. Also included are methods of making and using these co-stimulatory polypeptides.
    Type: Grant
    Filed: November 30, 1999
    Date of Patent: October 12, 2004
    Assignee: Mayo Foundation for Medical Education and Research
    Inventor: Lieping Chen
  • Patent number: 6803193
    Abstract: An assay for the detection of substances agonistic or antagonistic to the mevalonate pathway are disclosed.
    Type: Grant
    Filed: June 22, 2000
    Date of Patent: October 12, 2004
    Assignee: The Penn State Research Foundation
    Inventors: Anita K. Hopper, Nancy C. Martin, Ann Benko, Gabriela Vaduva
  • Patent number: 6803194
    Abstract: Double stranded DNAs, expression vectors and methods for their use are provided in which the intracellular expression of the double stranded DNAs is used to alter the phenotype of a target cell so that the function of a target nucleic acid that includes a nucleotide sequence encoding a motif of interest can be determined using a combinatorial ribozyme library. The members of the library are catalytic RNAs that disrupt the expression of the transcription product of the target nucleic acid. Disruption of transcription product expression results in an altered cell phenotype which is used to determine the function of the target nucleic acid. The specific phenotype or response may be associated with normal cellular processes, or it may contribute to the generation of pathogenesis involved in disease development. The compositions find use in high-throughput screens to assign gene functions.
    Type: Grant
    Filed: August 9, 2000
    Date of Patent: October 12, 2004
    Assignee: HK Pharmaceuticals, Inc.
    Inventors: James G. Keck, Justin G. P. Wong
  • Patent number: 6803195
    Abstract: There is provided a method for the detection of cancer and cancer risk by analyzing the coordination between alleles within isolated cells whereby an alteration in an inherent pattern of coordination within isolated cells corresponds to cancer or cancer risk. Also provided is a method of determining the genotoxic effect of various environmental agents and drugs by assaying isolated cells to determine the coordination between alleles following in-vivo and/or in-vitro exposure to the various agents. Allelic coordination characters are selected from replication, conformation, methyalation and acetylation patterns. A diagnostic test for detecting cancer or the risk of cancer having an allelic replication viewing device for viewing the mode of allelic replication of a DNA entity, a standardized table of replication patterns and an analyzer to determine an altered pattern of replication, whereby such altered pattern is a cancer characteristic is also provided.
    Type: Grant
    Filed: September 12, 2000
    Date of Patent: October 12, 2004
    Assignee: Ramot At Tel-Aviv University Ltd.
    Inventors: Lydia Avivi, Aviva Dotan, Yehoshua Ravia
  • Patent number: 6803196
    Abstract: Methods and compounds are provided for detecting target molecules in a sample using specific binding assays. In particular, methods are provided for detecting a nucleic acid target in a sample. In one embodiment, the presently claimed invention provides a method of labeling a hybridized target wherein the target comprises a binding ligand. In another embodiment, the presently claimed invention provides methods of signal amplification.
    Type: Grant
    Filed: October 13, 2000
    Date of Patent: October 12, 2004
    Assignee: Affymetrix, Inc.
    Inventors: William A. Lyon, Huu Minh Tran
  • Patent number: 6803197
    Abstract: The present invention relates to a prognostic method and means for determining susceptibility to bone damage in a subject, by screening for polymorphisms in the Vitamin D receptor or collagen I&agr;1 genes. In particular, the method for determining susceptibility to bone damage comprises analyzing the genetic material of a subject to determine which of the B/b, A/a or T/t alleles of the restriction enzyme sites BsmI, ApaI and TaqI respectively are present. The method may further comprise determining which allele is present at die SpI restriction site of the collagen I&agr;1 gene. Specific combinations of the above alleles represent a haplotype which is associated with susceptibility to bone damage.
    Type: Grant
    Filed: May 10, 2001
    Date of Patent: October 12, 2004
    Assignee: Erasmus Universiteit Rotterdam
    Inventors: Andreas Gerardus Uitterlinden, Johannes Petrus Thomas Maria Van Leeuwen, Huibert Adriaan Pieter Pols
  • Patent number: 6803198
    Abstract: Nucleosides and oligonucleosides functionalized to include carbamate functionality, and derivatives thereof. In certain embodiments, the compounds of the invention further include steroids, reporter molecules, reporter enzymes, lipophilic molecules, peptides or proteins attached to the nucleosides through the carbamate group.
    Type: Grant
    Filed: August 21, 2001
    Date of Patent: October 12, 2004
    Assignee: ISIS Pharmaceuticals, Inc.
    Inventors: Phillip Dan Cook, Muthiah Manoharan
  • Patent number: 6803199
    Abstract: The present invention provides a purified and isolated nucleic acid encoding a sodium/iodide symporter. The present invention also provides purified sodium/iodide symporter, a vector comprising nucleic acid encoding sodium/iodide symporter, a host cell transformed with the vector, and a method for producing recombinant sodium/iodide symporter. In addition, the present invention provides nucleic acid probes and mixtures thereof specific for sodium/iodide symporter nucleic acid and antibodies immunoreactive with sodium/iodide symporter. The present invention also provides a method for diagnosing and treating thyroid disorders associated with non-functional sodium/iodide symporter. Furthermore, the present invention provides a method for the selective ablation of tissue. The present invention also provides a method for identifying an iodide transport protein in non-thyroid tissue. Finally, the present invention provides a non-human, transgenic model for a thyroid disorder.
    Type: Grant
    Filed: November 26, 2001
    Date of Patent: October 12, 2004
    Assignee: Albert Einstein College of Medicine of Yeshiva University
    Inventors: Nancy Carrasco, Ge Dai, Orlie Levy
  • Patent number: 6803200
    Abstract: The present invention relates to compositions and methods for releasing nucleic acid molecules from solid matrices. The invention further relates to compositions and methods for purifying and isolating nucleic acid molecules from biological materials such as animal tissues and plant matter. The methods of the invention can be readily adapted for rapid processing of multiple samples. Thus, the invention further provides automated methods for the purification of nucleic acid molecules from numerous samples. The invention also relates to kits for removing nucleic acid molecules from solid matrices.
    Type: Grant
    Filed: December 12, 2001
    Date of Patent: October 12, 2004
    Assignee: Invitrogen Corporation
    Inventors: Jiu-Lin Xia, Mindy D. Goldsborough, Michael A. Connolly, Gulilat Gebeyehu
  • Patent number: 6803201
    Abstract: The present invention relates to a method for identifying a nucleotide at a predetermined location on a target polynucleotide. The method involves single nucleotide extension reaction comprising an oligonucleotide primer comprising a first sequence and a second sequence or a tag. The method may further comprises a probe which hybridizes to the second sequence or an anti-tag molecule which interacts with the tag, where the hybridization or interaction causes a detectable signal transfer which is indicative of the identity of the nucleotide base at the predetermined location. The invention further provides compositions and kits for performing the subject method of the invention.
    Type: Grant
    Filed: January 24, 2002
    Date of Patent: October 12, 2004
    Assignee: Stratagene
    Inventors: Joseph A. Sorge, Bahram Arezi, Holly Hogrefe
  • Patent number: 6803202
    Abstract: The existence of any one of a plurality of 2N−1 bioagents in a sample (1) may be determined by dividing the sample into N parts and performing separate ELISA processes (TEST 1 & TEST 2) on each of the N parts concurrently, where N is an integer greater than 1, each of the separate ELISA processes possessing the capability to identify a bioagent from a combination of possible bioagents (3), and in which the combination of possible bioagents of any one of the separate ELISA processes is different (7) from the combination of possible bioagents of any other of the separate ELISA processes.
    Type: Grant
    Filed: October 23, 2001
    Date of Patent: October 12, 2004
    Assignee: Northrop Grumman Corporation
    Inventors: Brian M. Sullivan, Denes L. Zsolnay
  • Patent number: 6803203
    Abstract: The present invention provides a method for detecting DNA-activated protein kinase (DNA-PK) activity in a biological sample.
    Type: Grant
    Filed: October 24, 2000
    Date of Patent: October 12, 2004
    Assignee: Brookhaven Science Associates
    Inventors: Carl W. Anderson, Margery A. Connelly