Patents Issued in July 29, 2008
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Patent number: 7405152Abstract: A damascene process incorporating a GCIB step is provided. The GCIB step can replace one or more CMP steps in the traditional damascene process. The GCIB step allows for selectable removal of unwanted material and thus, reduces unwanted erosion of certain nearby structures during damascene process. A GCIB step may also be incorporated in the damascene process as a final polish step to clean up surfaces that have been planarized using a CMP step.Type: GrantFiled: January 31, 2005Date of Patent: July 29, 2008Assignee: International Business Machines CorporationInventors: Jeffrey P. Gambino, Anthony K. Stamper
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Patent number: 7405153Abstract: A process for the formation of an interconnect in a semiconductor structure including the steps of forming a dielectric layer on a substrate, forming a first barrier layer on the dielectric layer, forming a second barrier layer on the first barrier layer, wherein the second barrier layer is selected from the group consisting of ruthenium, platinum, palladium, rhodium and iridium and wherein the formation of the second barrier layer is manipulated so that the bulk concentration of oxygen in the second barrier layer is 20 atomic percent or less, and forming a conductive layer on the second barrier layer. The process may additionally include a step of treating the second barrier to reduce the amount of oxide on the surface of the second barrier layer.Type: GrantFiled: January 17, 2006Date of Patent: July 29, 2008Assignee: International Business Machines CorporationInventors: Sandra G. Malhotra, Hariklia Deligianni, Stephen M. Rossnagel, Xiaoyan Shao, Tsong-Lin Tai, Oscar van der Straten
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Patent number: 7405154Abstract: A contact metallurgy structure comprising a patterned dielectric layer having cavities on a substrate; a silicide or germanide layer such as of cobalt and/or nickel located at the bottom of cavities; a contact layer comprising Ti or Ti/TiN located on top of the dielectric layer and inside the cavities and making contact to the silicide or germanide layer on the bottom; a diffusion barrier layer located on top of the contact layer and inside the cavities; optionally a seed layer for plating located on top of the barrier layer; a metal fill layer in vias is provided along with a method of fabrication. The metal fill layer is electrodeposited with at least one member selected from the group consisting of copper, rhodium, ruthenium, iridium, molybdenum, gold, silver, nickel, cobalt, silver, gold, cadmium and zinc and alloys thereof. When the metal fill layer is rhodium, ruthenium, or iridium, an effective diffusion barrier layer is not required between the fill metal and the dielectric.Type: GrantFiled: March 24, 2006Date of Patent: July 29, 2008Assignee: International Business Machines CorporationInventors: Cyril Cabral, Jr., Hariklia Deligianni, Randolph F. Knarr, Sandra G. Malhotra, Stephen Rossnagel, Xiaoyan Shao, Anna Topol, Philippe M. Vereecken
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Patent number: 7405155Abstract: A circuit package includes a substrate having an opening and a single unitary heat sink adapted to effectively dissipate heat is positioned in the opening to expose top and bottom surfaces which are respectively coplanar with top and bottom surfaces of the substrate. Selective plating includes applying first and second metal patterns to a substrate surface, creating a potential voltage difference between the first metal pattern and a metal source, and plating the first metal pattern by attracting a first metal type to the voltage potential of the first metal pattern. The voltage potential of the first metal pattern is less than the voltage potential of the metal source.Type: GrantFiled: January 18, 2006Date of Patent: July 29, 2008Assignee: Intel CorporationInventors: Xiaowei Yao, Tam Nguyen, Marc Finot, Rickie C. Lake, Jeffrey A. Bennett, Robert Kohler
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Patent number: 7405156Abstract: A photoresist pattern is formed on an insulating substrate so that it has a reverse tapered cross section and a reverse pattern of a wiring pattern to be formed. Next, a nanoparticles-containing ink is injected on a wiring region using an inkjet system, followed by a leveling process, a drying process, a resist separation process and a baking process. Thus a wiring pattern is formed.Type: GrantFiled: July 6, 2005Date of Patent: July 29, 2008Assignee: NEC LCD Technologies, Ltd.Inventor: Hiroaki Tanaka
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Patent number: 7405157Abstract: Methods are provided for electrochemically depositing copper on a work piece. One method includes the step of depositing overlying the work piece a barrier layer having a surface and subjecting the barrier layer surface to a surface treatment adapted to facilitate deposition of copper on the barrier layer. Copper then is electrochemically deposited overlying the barrier layer.Type: GrantFiled: March 2, 2005Date of Patent: July 29, 2008Assignee: Novellus Systems, Inc.Inventors: Jon Reid, Seyang Park
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Patent number: 7405158Abstract: In one embodiment of the invention, a method for forming a tungsten-containing layer on a substrate is provided which includes positioning a substrate containing a barrier layer disposed thereon in a process chamber, exposing the substrate to a first soak process for a first time period and depositing a nucleation layer on the barrier layer by flowing a tungsten-containing precursor and a reductant into the process chamber. The method further includes exposing the nucleation layer to a second soak process for a second time period and depositing a bulk layer on the nucleation layer.Type: GrantFiled: January 19, 2005Date of Patent: July 29, 2008Assignee: Applied Materials, Inc.Inventors: Ken Kaung Lai, Ravi Rajagopalan, Amit Khandelwal, Madhu Moorthy, Srinivas Gandikota, Joseph Castro, Averginos V. Gelatos, Cheryl Knepfler, Ping Jian, Hongbin Fang, Chao-Ming Huang, Ming Xi, Michael X. Yang, Hua Chung, Jeong Soo Byun
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Patent number: 7405159Abstract: A semiconductor device is disclosed, which comprises a semiconductor element in which a laminated film composed of a plurality of layers including an insulating film is formed on a surface of a semiconductor substrate, and a portion of the laminated film is removed from the surface of the semiconductor substrate so that the semiconductor substrate is exposed at the portion, a mounting substrate on which the semiconductor element is mounted, and a resin layer which seals at least a surface side of the semiconductor element with resin.Type: GrantFiled: March 1, 2007Date of Patent: July 29, 2008Assignee: Kabushiki Kaisha ToshibaInventors: Takashi Imoto, Chiaki Takubo, Ryuji Hosokawa, Yoshihisa Imori, Takao Sato, Tetsuya Kurosawa, Mika Kiritani
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Patent number: 7405160Abstract: A plasma processing method, which enables the etching controllability for a high-dielectric-constant insulating film to be improved. A substrate having a high-dielectric-constant gate insulating film and a hard mask formed thereon is subjected to etching processing using a plasma of a processing gas containing a noble gas and a reducing gas.Type: GrantFiled: December 13, 2005Date of Patent: July 29, 2008Assignee: Tokyo Electron LimitedInventors: Shinichi Kozuka, Naoto Umehara
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Patent number: 7405161Abstract: Method for fabricating a semiconductor device in which a by-product of etching is deposited on a photoresist film for using as a mask. The method for fabricating a semiconductor device includes the steps of depositing a polysilicon, and a bottom anti-refection coating on an entire surface of a substrate in succession, forming a photoresist film pattern on a predetermined portion of the bottom anti-refection coating, etching the bottom anti-refection coating by using the photoresist film pattern to deposit by-product of the etching on sidewalls of the photoresist pattern to form spacers, and etching the polysilicon by using the photoresist film pattern and the spacers, to form a line.Type: GrantFiled: December 30, 2005Date of Patent: July 29, 2008Assignee: Dongbu Electronics Co., Ltd.Inventors: Jeong Yel Jang, Kang Hyun Lee
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Patent number: 7405162Abstract: An etching method forms an opening with a substantially vertical profile extending to a stopper layer by performing an etching with a plasma of an etching gas acting on an object to be processed loaded in an evacuable processing vessel, wherein the object has a mask layer of a predetermined pattern, a silicon layer to be etched formed below the mask layer and the stopper layer formed below the silicon layer. The etching method includes a first etching process for forming an opening with a tapered wall surface in the silicon layer by using a first etching gas including a fluorine-containing gas and O2 but not HBr; and a second etching process for etching the opening by using a second etching gas including a fluorine-containing gas, O2 and HBr.Type: GrantFiled: September 22, 2005Date of Patent: July 29, 2008Assignee: Tokyo Electron LimitedInventors: Koji Maruyama, Yusuke Hirayama, Nozomi Hirai, Takanori Mimura
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Patent number: 7405163Abstract: An accelerator solution is globally applied to a workpiece to form an accelerator film, and then a portion of the accelerator film is selectively removed from the workpiece to form an acceleration region having a higher concentration of accelerator. The higher concentration of accelerator causes metal to deposit at a faster rate in the acceleration region than in a non-accelerated region for the duration of metal deposition. To make a metal feature, a resist layer is applied to a workpiece surface and patterned to form a recessed region and a field region. Then, a metal seed layer is deposited on the workpiece surface. An accelerator solution is applied so that an accelerator film forms on the metal seed layer. A portion of the accelerator film is selectively removed from the field region, leaving another portion of the accelerator film in the recessed region.Type: GrantFiled: April 13, 2004Date of Patent: July 29, 2008Assignee: Novellus Systems, Inc.Inventors: John Stephen Drewery, Steven T. Mayer
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Patent number: 7405164Abstract: In an apparatus and method for removing a photoresist structure from a substrate, a chamber for receiving the substrate includes a showerhead for uniformly distributing a mixture of water vapor and ozone gas onto the substrate. The showerhead includes a first space having walls and configured to receive the water vapor, and a second space connected to the first space so that the water vapor is supplied to and partially condensed into liquid water on one or more walls of the first space. Ozone gas and water vapor without liquid water may be supplied to the second space to form the mixture therein. The showerhead may be heated to vaporize the liquid water on a given surface of the first space.Type: GrantFiled: July 19, 2006Date of Patent: July 29, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: In-Gi Kim, In-Seak Hwang, Dae-Hyuk Chung, Kyoung-Hwan Kim
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Patent number: 7405165Abstract: A dual-tank etch method which is suitable for the stripping of a silicon nitride layer from a pad oxide layer provided on a substrate, and etching of the pad oxide layer to a desired target thickness, is disclosed. The method includes providing a first processing tank containing a silicon nitride-stripping chemical; stripping the silicon nitride layer from the pad oxide layer by placing the substrate in the first processing tank; providing a second processing tank containing an oxide-etching chemical; and etching the pad oxide layer to the desired target thickness by placing the substrate in the second processing tank. By carrying out the pad oxide-etching step and the silicon nitride-stripping step in separate processing tanks, accumulation of silicon oxide precipitates in the second processing tank is avoided.Type: GrantFiled: November 5, 2004Date of Patent: July 29, 2008Assignee: Taiwan Semiconductor Manufacturing Co, LtdInventors: Yang Kai Fan, Yong Rong Chang, Yi Song Chiu, Ping Yin Shin
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Patent number: 7405166Abstract: A method of manufacturing a charge storage device is provided. Utilizing the capacity for a precise control of the thickness and the silicon content of a deposited film in an atomic layer deposition process, a stacked gradual material layer such as a hafnium silicon oxide (HfxSiyOz) layer is formed. The silicon content is gradually changed throughout the duration of the HfxSiyOz deposition process. The etching rate for the HfxSiyOz layer in dilute hydrogen fluoride solution is dependent on the silicon content y in the HfxSiyOz layer. The sidewalls of the stacked gradual material layer are etched to form an uneven profile. The lower electrode, the capacitor dielectric layer and the upper electrode are formed on the uneven sidewalls of the stacked gradual material layers, the area between the lower electrode and the upper electrode is increased to improve the capacitance of the charge storage device.Type: GrantFiled: April 19, 2006Date of Patent: July 29, 2008Assignee: Industrial Technology Research InstituteInventors: Chieh-Shuo Liang, Pei-Jer Tzeng, Heng-Yuan Lee, Lurng-Shehng Lee
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Patent number: 7405167Abstract: A method of manufacturing a nonvolatile organic memory device including a memory layer interposed between an upper electrode layer and a lower electrode layer, which includes dispersing ions of conductive nanoparticles in an organic material disposed between the two electrode layers and then reducing the ions of conductive nanoparticles into conductive nanoparticles in the organic material to form a desired memory layer. In addition, a nonvolatile organic memory device manufactured by the method of the current invention is also provided. The method allows the memory device to be manufactured using a rapid, simple, and environmentally friendly process, without the need for an encapsulation process. As well, the memory device has a low operating voltage, and hence, is suitable for application to various portable electronic devices that must have low power consumption.Type: GrantFiled: August 31, 2005Date of Patent: July 29, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Yoon Sok Kang, Sang Kyun Lee, Won Jae Joo, Kwang Hee Lee
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Patent number: 7405168Abstract: A method and computer readable medium for treating a dielectric film on one or more substrates includes disposing the one or more substrates in a process chamber configured to perform plural treatment processes on a dielectric film. The dielectric film is formed on at least one of said one or more substrates, wherein the dielectric film includes an initial dielectric constant having a value less than the dielectric constant of SiO2. A thermal treatment process that includes annealing the one or more substrates is performed in order to remove volatile constituents from the dielectric film on the one or more substrates and a chemical treatment process is performed on the one or more substrates, including: introducing a treating compound to the dielectric film on the one or more substrates, and heating the one or more substrates.Type: GrantFiled: September 30, 2005Date of Patent: July 29, 2008Assignee: Tokyo Electron LimitedInventors: Eric M. Lee, Dorel I. Toma
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Patent number: 7405169Abstract: Composite materials that contain formaldehyde-free, cured binder compositions are disclosed. Also disclosed are methods of making and using composite materials containing formaldehyde-free binder compositions.Type: GrantFiled: October 4, 2006Date of Patent: July 29, 2008Assignee: Rohm and Hass CompanyInventor: Jin Lu
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Patent number: 7405170Abstract: A stretchable fabric comprising NYCO fabric with about 2 to about 4 wt. % elastic, such as an elastane as LYCRA®, is disclosed. The stretchable fabric of the invention exhibits about 20 to about 50% fabric stretch, and is suitable for application in combat uniforms where mobility and comfort are desirable. The stretchable fabric maintains or exceeds substantially all military uniform standard requirements and exhibits characteristics such as breaking strength, tear resistance, air permeability and abrasion resistance similar to that of NYCO fabric. Also disclosed is a garment manufactured from the stretchable fabric, as well as methods for manufacturing, dying and finishing the stretchable fabric.Type: GrantFiled: December 15, 2004Date of Patent: July 29, 2008Assignee: Invista North America S.A R.L.Inventors: Xiangming Kong, Sharon W. Birk, Kevin A. Frankel
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Patent number: 7405171Abstract: PROBLEM TO BE SOLVED: To provide an elastic nonwoven fabric with a good elasticity, adequate strength under elongation, good antiblocking property and favorable feeling, suitable for fiber products, at low cost, as well as fiber products using the same. SOLUTION: An elastic nonwoven fabric comprising long elastomeric fiber and nonelastomeric fiber in a weight ratio within a range from 50/50 to 95/5, which has an elongation recovery rate of the elastic nonwoven fabric after 50% elongation equal to or higher than 70%, and a resistance to peel two sheets of the nonwoven fabric apart equal to or lower than the strength of the fabric under 50% elongation; as well as fiber products using the same.Type: GrantFiled: August 5, 2003Date of Patent: July 29, 2008Assignees: Chisso Corporation, Chisso Polypro Fiber Company LimitedInventors: Yoshimi Tsujiyama, Hisanobu Minamizawa, Junji Iwata
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Patent number: 7405172Abstract: The present invention provides a non-woven fabric for an alkaline battery separator comprising semi-aromatic polyamide fibers comprising a dicarboxylic acid component, in which 60 mol % or more of the dicarboxylic acid component is an aromatic carboxylic acid component, and a diamine component, in which 60 mol % or more of the diamine component is an aliphatic alkylene diamine having 6 to 12 carbon atoms, and ethylene/vinyl alcohol copolymer fibers; wherein, the separator non-woven fabric has superior alkaline resistance in which the weight loss rate after 20 days is 5% or less in an alkaline resistance test at 90° C. in aqueous KOH solution having a specific gravity of 1.30. Consequently, since the present invention enables rapid charging and large-current discharging while also allowing thickness to be reduced for higher capacity, it can be preferably used as a non-woven fabric for an alkaline battery separator.Type: GrantFiled: May 22, 2003Date of Patent: July 29, 2008Assignees: Mitsubishi Paper Mills Limited, Kuraray Co., Ltd.Inventors: Toshihiro Shigematsu, Shigehiro Maeda, Takashi Katayama
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Patent number: 7405173Abstract: An alumina-titanium oxide-zirconia fused grain presenting, for a total of 100%, the following chemical composition: Al2O3: more than 10% and less than 50%; TiO2: more than 10% and less than 40%; ZrO2: more than 50%; and impurities: less than 2%; the percentages being percentages by weight on the basis of the oxides. The invention is applicable to slide gates for continuous casting of steel.Type: GrantFiled: January 31, 2007Date of Patent: July 29, 2008Assignee: Saint-Gobain Centre de Recherches et d'Etudes EuropeenInventors: Samuel Marlin, Jerome Latournerie
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Patent number: 7405174Abstract: A process for regeneration of a catalyst that comprises at least one EUO-structural-type zeolite in acid form and at least one hydro-dehydrogenating metal, used in a process for isomerization of a hydrocarbon feedstock that comprises aromatic compounds with eight carbon atoms, comprising at least a) a stage for eliminating a majority of the coke, deposited on said catalyst, by combustion in the presence of a gas that contains oxygen at a temperature that is less than or equal to 600° C., and b) a stage for oxychlorination of the product that is obtained from stage a), carried out between 200 and 550° C. in the presence of at least one gas mixture that contains at least oxygen, water and chlorine and/or at least one chlorinated compound, is described.Type: GrantFiled: September 1, 2005Date of Patent: July 29, 2008Assignee: Institut Francais du PetroleInventors: Sylvie Lacombe, Julia Magne-Drisch, Eric Sanchez
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Patent number: 7405175Abstract: A proton type ? zeolite is used as catalyst. Nitrogen oxides in the exhaust gas containing excessive oxygen is reduced/removed by making the exhaust gas contact with the catalyst under the existence of methanol and/or dimethyl ether as reducing agent. It is desirable that a SiO2/Al2O3 molar ratio of the proton type ? zeolite is within 20-70. Thereby, the present catalyst has an excellent denitration performance and durability even against the exhaust gas containing sulfur oxides, and the denitration performance does not deteriorate even when the exhaust gas is at comparatively low temperature of 300-400° C.Type: GrantFiled: June 3, 2003Date of Patent: July 29, 2008Assignee: Sumitomo Metal Mining Co., Ltd.Inventors: Masashi Sugiyama, Kengo Soda
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Patent number: 7405176Abstract: The present invention provides a high-activity solid main catalyst component for ethylene polymerization, a process for preparing the same and a catalyst containing the same. The main catalyst component consists essentially of a magnesium compound, a titanium compound, an electron donor, an alkyl aluminum compound and fumed silica, and is prepared by a process comprising the step of: reacting powdered magnesium with an alkyl halide to form a magnesium compound in the nascent state; adding the magnesium compound in the nascent state together with a titanium compound and an alkyl aluminum compound into an electron donor to form a complex; adding and well dispersing a fumed silica thereto to form a homogeneous thick mixture; molding and drying the mixture to form main catalyst component particles with good particle morphology; and optionally, dispersing the main catalyst component particles into a hydrocarbon solvent or a mineral oil to form a slurry.Type: GrantFiled: April 28, 2004Date of Patent: July 29, 2008Assignees: China Petroleum & Chemical Corporation, Shanghai Research Institute of Chemical IndustryInventors: Mingwei Xiao, Shijiong Yu, Xiaofeng Ye
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Patent number: 7405177Abstract: A catalyst and process for opening aliphatic cyclic hydrocarbons have been developed. The catalyst comprises a catalytic metal component, a molecular sieve and refractory inorganic oxide component. The molecular sieve is selected from the group consisting of MAPSOs, SAPOs, UZM-8, UZM-8HS, UZM-15, UZM-15HS, UZM-16, UZM-16HS and mixtures thereof. Preferred catalytic metals include platinum, palladium and rhodium. The catalyst may also contain a modifier such as niobium, titanium, or rare earth metals.Type: GrantFiled: November 8, 2005Date of Patent: July 29, 2008Assignee: UOP LLCInventors: Irina Galperin, legal representative, Deng-Yang Jan, Michael J. McCall, Joseph A. Kocal, Leonid B. Galperin
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Patent number: 7405178Abstract: A catalyst for manufacturing carbon substances, such as carbon nanotube that has a diameter of 1000 nm or less, the catalyst containing at least iron, cobalt or nickel of a first element group and tin or indium of a second element group. The catalyst can be formed by at least tin and indium in addition to cobalt or nickel. The former catalyst provides a 2-component type catalyst and a multi-component type catalyst that is composed on the basis of the 2-component type catalyst, and the later catalyst provides a 3-component type catalyst and a multi-component type catalyst that is composed on the basis of the 3-component type catalyst.Type: GrantFiled: December 23, 2002Date of Patent: July 29, 2008Assignees: Daiken Chemical Co., Ltd.Inventors: Xu Li, Youchang Wang, Takashi Okawa, Akio Harada, Yoshikazu Nakayama
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Patent number: 7405179Abstract: A multicolor thermosensitive recording medium having thermosensitive coloring layers which are formed by printing water-dispersion thermosensitive inks or water-dispersion inks on an ink receptive layer using a printing plate. The recording medium comprises an ink receptive layer formed on a surface of a substrate, thermosensitive coloring layers developing different colors, which are integrated with the ink receptive layer by impregnating the ink receptive layer with a water-dispersion thermosensitive ink that is prepared by dispersing in water a pigment component including at least an electron-accepting compound and electron-donating compound. The color density and coloring sensitivity of the thermosensitive coloring layers have been improved by providing over the thermosensitive coloring layers an auxiliary coloring layer containing at least one of an electron-accepting compound and a sensitizer.Type: GrantFiled: May 27, 2004Date of Patent: July 29, 2008Assignee: Toshiba TEC Kabushiki KaishaInventors: Takayuki Hiyoshi, Toshiyuki Tamura
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Patent number: 7405180Abstract: A wireless information recording medium including a reversible thermal recording medium, a cushioning material layer provided on the reversible thermal recording medium, an information recording section including an information recording element and an antenna circuit configured to receive and transmit information for the information recording element, and a support layer configured to support the information recording section, and provided on the cushioning material layer. The support layer is stacked on the cushioning material layer and the cushioning material is stacked on the reversible thermal recording medium in a step-wise configuration.Type: GrantFiled: September 15, 2005Date of Patent: July 29, 2008Assignee: Ricoh Company, Ltd.Inventors: Atsushi Kutami, Kazuhiro Goto
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Patent number: 7405181Abstract: Disclosed is a bio-fertilizer composition for promoting growth of orchid plants. The composition comprises a symbiotic organism, a growth substance; and a medium, which is used to mix and evenly disperse the symbiotic organisms and the growth substance. The symbiotic organism is selected from the group consisting of Rhizoctonia sp. (BCRC930076) and Rhizoctonia sp. (BCRC930077). The bio-fertilizer composition according to the invention can promote the growth of orchid plants, increase the flowering rate and flowering quality, decrease the occurrence of root disease to prevent the usage of pesticide, and increase the beneficial components toward human health of medicinal orchids.Type: GrantFiled: January 13, 2005Date of Patent: July 29, 2008Assignee: National Taiwan UniversityInventors: Doris Chi-ning Chang, Ling-chin Chou, Ming-chi Lee
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Patent number: 7405182Abstract: A method is provided for reducing lost circulation when aqueous, oil, or synthetic based drilling fluid is used. The method includes injecting two fluids into the well bore and lost circulation zone. The first fluid is an aqueous liquid containing at least one polymer capable of absorbing water in an alkaline environment. The aqueous liquid has a pH that inhibits at least one polymer from absorbing water. The second fluid contains a hardening composition in a base fluid having a pH sufficient to increase the pH in situ to allow at least one polymer to absorb water and expand with the absorbed water and substantially increase in size to close off the lost circulation zone and allow the hardening composition to create a plug in the well bore and set up.Type: GrantFiled: November 30, 2005Date of Patent: July 29, 2008Assignee: Turbo-Chem International, Inc.Inventor: Robin J. Verrett
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Patent number: 7405183Abstract: The present invention provides a method of forming a viscosified treatment fluid comprising: providing a treatment fluid that comprises water and a gelling agent; contacting the treatment fluid with a boronic acid crosslinking agent so as to form a crosslinked gelling agent, wherein the boronic acid crosslinking agent comprises a compound having the formula: The present invention also provides methods of crosslinking gelling agent molecules, methods of treating a subterranean formation, methods of reusing viscosified treatment fluids, methods of fracturing subterranean formations, and methods of placing a gravel pack in subterranean formations. The present invention also provides boronic acid crosslinking agents and viscosified treatment fluids that comprise crosslinked gelling agents, the crosslinked gelling agent being formed from a reaction comprising a gelling agent and a boronic acid crosslinking agent.Type: GrantFiled: July 2, 2004Date of Patent: July 29, 2008Assignee: Halliburton Energy Services, Inc.Inventor: Robert E. Hanes, Jr.
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Patent number: 7405184Abstract: The present invention relates to a lubricious anti-traction material for effectively denying the mobility and access of personnel and vehicles to selected areas. The anti-traction material includes an acrylic polymer particle mixed with water.Type: GrantFiled: December 5, 2003Date of Patent: July 29, 2008Assignee: Southwest Research InstituteInventors: Ronald J. Mathis, Mary C. Marshall, Nicholle K. Reinhardt, Errol M. Brigance, Geronimo I. Elias, Jr., Kenneth R. Collins
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Patent number: 7405185Abstract: The present invention is directed to a novel process for making Group II metal overbased sulfurized alkylphenols, which process uses alkylene carbonate as both a source of carbon dioxide and alkylene glycol. In particular, under the reaction conditions using ethylene carbonate, carbonation time is reduced to about one quarter the time taught in the prior art to make Group II metal overbased sulfurized alkylphenol compositions. The present invention is also directed to a detergent-dispersant additive composition comprising a Group II metal overbased sulfurized alkylphenols, wherein the Group II metal overbased sulfurized alkylphenols have a reduced color as measured by ASTM Test No. D 6045 and an increased hydrolytic stability as measured by a modified ASTM Test No. 2619.Type: GrantFiled: September 26, 2003Date of Patent: July 29, 2008Assignee: Chevron Oronite Company LLCInventors: Robert H. Wollenberg, Steven G. Lockett
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Patent number: 7405186Abstract: Warming personal lubricant compositions, condom products including such compositions and methods of making such condom products are disclosed. The present warming lubricant compositions include at least about 50% by weight of a polyalkylene glycol component, preferably including at least two portions of different molecular weights, and an effective amount of a viscosity inducing component.Type: GrantFiled: March 25, 2005Date of Patent: July 29, 2008Assignee: Chemsil Silicones, Inc.Inventor: James Jeffries Harrison
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Patent number: 7405187Abstract: Concentrated perfume compositions are useful for incorporating perfume into fabric care compositions.Type: GrantFiled: June 1, 2006Date of Patent: July 29, 2008Assignee: The Procter & Gamble CompanyInventors: Gayle Marie Frankenbach, Timothy Clair Roetker, David Matthew Cast, Thomas Jackson Kirk, George Endel Deckner, Michael Jude Leblanc
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Patent number: 7405188Abstract: A cosmetically acceptable medium containing a component and an aqueous gel that includes water and: (a) a cationic polymer; (b) an anionic surfactant having from 8 to 22 carbon atoms, where the amount of the anionic surfactant is less than the amount of the cationic polymer; (c) an amphoteric surfactant, where the amount of the amphoteric surfactant is less than the amount of the cationic polymer; and (d) optionally a long chain amine oxide, where the amount of said long chain amine oxide is less than the amount of the cationic polymer. The component is selected from a cationic surfactant, a conditioning agent, a synthetic amphoteric polymer, a synthetic ampholytic polymer, a synthetic non-ionic polymer, an amino acid, a protein, an oxidizing agent, a hair dye, dyes, pigments, a fragrance, one or more vitamins, and mixtures thereof. The cosmetically acceptable medium can be used to treat keratin-based substrates.Type: GrantFiled: November 12, 2004Date of Patent: July 29, 2008Assignee: WSP Chemicals & Technology, LLCInventor: Shih-Ruey T. Chen
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Patent number: 7405189Abstract: A surface treatment composition and method for removing Si and reduced metal salt produced during etching of an aluminum die cast material (“ALDC material”) without generation of nitrogen oxide (NOx) or hydrogen fluoride (HF). In surface treatment of an ALDC material containing Si, Fe, Cu, Mn, Mg, Zn and Ni, the surface treatment composition for removing Si and reduced metal salt from the surface of the ALDC material after etching comprises hydrogen peroxide 300 to 950 g/l, fluorine ion-containing inorganic salt 1 to 300 g/l and balance water. The surface treatment method for removing Si and reduced metal salt from the surface of an ALDC material after etching comprises the step of dipping the ALDC material into the above described surface treatment composition. The aforementioned surface treatment composition effectively removes the Si and reduces metal salt impurities from the surface of the ALDC material without any problems such as NOx or HF gas which is harmful to the human and waste water treatment.Type: GrantFiled: July 25, 2002Date of Patent: July 29, 2008Assignee: Cheon Young Chemical Co., Ltd.Inventor: Eul-Kyu Lee
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Patent number: 7405190Abstract: Mixtures comprising at least one alk(en)yl polyglycoside ether carboxylate, and one or more fatty alcohols are described along with methods for preparing the same, wherein a starting mixture comprising (i) at least one alk(en)yl polyglycoside, and (ii) one or more fatty alcohols is provided, and the starting mixture is reacted with a compound selected from the group consisting of ?-halocarboxylic acids, ?-halocarboxylic acid salts, ?-halocarboxylic acid esters, and mixtures thereof.Type: GrantFiled: March 23, 2005Date of Patent: July 29, 2008Assignee: Cognis IP Management GmbHInventors: Ansgar Behler, Karl Heinz Schmid, Michael Neuss, Rainer Eskuchen
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Patent number: 7405191Abstract: A fabric care article made of solid or semi-solid matrix of materials for repetitive or multiple use in a machine drying apparatus such as a tumble dryer. The matrix includes a structuring agent comprising a filler structuring agent and a polymeric structuring agent. The filler structuring agent comprises about 0.2 % to about 10% and the polymeric structuring agent comprises about 0.5 to about 20% by weight of the composition. The matrix further includes up to about 25% of an anionic soap surfactant, about 10% to about 60% of free fatty acid, and about 1% to about 50% of a non-ionic, but is substantially free from cationic surfactant. When the fabric care article is used up, it simply disappears, indicating to a user that the article needs to be replenished.Type: GrantFiled: May 15, 2007Date of Patent: July 29, 2008Assignee: Unilever Home & Personal Care USA Division of Conopco, Inc.Inventors: Yun Peng Zhu, Feng-Lung Gordon Hsu, Diane Wolf
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Patent number: 7405192Abstract: The present invention provides methods and kits for diagnosing and treating glaucoma.Type: GrantFiled: October 31, 2002Date of Patent: July 29, 2008Assignees: Alcon, Inc., University of North Texas Health Science CenterInventors: Abbot F. Clark, Robert J. Wordinger
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Patent number: 7405193Abstract: The present invention relates to the field of muscle research, in particular to the discovery of a compound effective for increasing muscle mass, muscle cell differentiation, and oxidation of free fatty acids in muscle, useful in methods of treating muscle-related diseases and disorders as well as for augmenting muscle mass in general. The muscle-related diseases or disorders envisaged to be treated by the methods of the invention include, but are not limited to, muscular dystrophy, and other conditions resulting in muscle atrophy or muscle wasting.Type: GrantFiled: May 22, 2001Date of Patent: July 29, 2008Assignee: Serono Genetics Institute S.A.Inventors: Harvey Lodish, Joachim Fruebis, Tsu-Shuen Tsao, Bernard Bihain
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Patent number: 7405194Abstract: The present invention provides angiogenesis inhibitor compounds comprising a MetAP-2 inhibitory core coupled to a peptide, as well as pharmaceutical compositions comprising the angiogenesis inhibitor compounds and a pharmaceutically acceptable carrier. The present invention also provides methods of treating an angiogenic disease, e.g., cancer, in a subject by administering to the subject a therapeutically effective amount of one or more of the angiogenesis inhibitor compounds of the invention.Type: GrantFiled: March 24, 2006Date of Patent: July 29, 2008Assignee: Praecis Pharmaceuticals, Inc.Inventors: Gary L. Olson, Christopher Self, Lily Lee, Charles M. Cook, Jens Birktoft, Barry Morgan, Christopher C. Arico-Muendel
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Patent number: 7405195Abstract: A topical composition having (i) an isolated polypeptide having the sequence of SEQ ID NO: 1 or a functional equivalent thereof, and (ii) a cosmetically acceptable carrier; and use thereof.Type: GrantFiled: March 27, 2006Date of Patent: July 29, 2008Assignee: Natural Beauty Bio-Technology LimitedInventors: Jidai Chen, Yanping Cong
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Patent number: 7405196Abstract: This invention relates to a method of reducing cardiovascular morbidity and mortality in a prediabetic or Type 2 Diabetes patient population. The method comprises administering an effective dosage of a long acting insulin, preferably insulin glargine, to a prediabetic or Type 2 Diabetes patient.Type: GrantFiled: January 14, 2004Date of Patent: July 29, 2008Assignee: Aventis Pharmaceuticals Inc.Inventors: Ralf Rosskamp, Hertzel Gerstein
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Patent number: 7405197Abstract: The invention provides a protocol leading to improved embryo implantation rates and/or decreased miscarriage rates in which hCG, or a bio-analogue, is administered during the follicular phase.Type: GrantFiled: September 12, 2002Date of Patent: July 29, 2008Assignee: Laboratories Serono SAInventor: Yves Menezo
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Patent number: 7405198Abstract: The present invention provides conjugates between erythropoietin and PEG moieties. The conjugates are linked via an intact glycosyl linking group interposed between and covalently attached to the peptide and the modifying group. The conjugates are formed from glycosylated peptides by the action of a glycosyltransferase. The glycosyltransferase ligates a modified sugar moiety onto a glycosyl residue on the peptide. Also provided are methods for preparing the conjugates, methods for treating various disease conditions with the conjugates, and pharmaceutical formulations including the conjugates.Type: GrantFiled: November 24, 2004Date of Patent: July 29, 2008Assignee: Neose Technologies, Inc.Inventors: Shawn DeFrees, Robert J. Bayer, David A. Zopf
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Patent number: 7405199Abstract: This invention provides cross-linked glycopeptide-cephalosporin compounds and pharmaceutically acceptable salts thereof which are useful as antibiotics. This invention also provides pharmaceutical compositions containing such compounds; methods for treating bacterial infections in a mammal using such compounds; and processes and intermediates useful for preparing such compounds.Type: GrantFiled: September 22, 2005Date of Patent: July 29, 2008Assignee: Theravance, Inc.Inventors: Daniel Marquess, Martin S. Linsell, Paul Fatheree, Michael R. Leadbetter
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Patent number: 7405200Abstract: A method of treating cancer in situ and cervicitis is disclosed. A pharmaceutical composition comprising at least one substance with oxytocin activity against cancer in situ and cervicitis and compound of the formula SEQ ID NO:2 is also disclosed.Type: GrantFiled: February 28, 2002Date of Patent: July 29, 2008Inventors: Kerstin Uvnäs-Moberg, Thomas Lundeberg
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Patent number: 7405201Abstract: The present invention relates to compounds of the general formula (I), processes for their preparation, pharmaceutical compositions comprising them, and their use in the treatment of diseases in humans or animals.Type: GrantFiled: September 6, 2002Date of Patent: July 29, 2008Assignee: Bayer Healthcare AGInventors: Berthold Hinzen, Heike Brötz-Oesterhelt, Rainer Endermann, Kerstin Henninger, Holger Paulsen, Siegfried Raddatz, Thomas Lampe, Veronika Hellwig, Andreas Schumacher