Abstract: An image projector apparatus comprising a cooler (24) having a variable capability to cool a light source (18), commanding means (29) which gives a command to terminate a lightening operation of the light source, selecting means (29) responsive to the command given by the projection light processor for selecting a cooling capability of the cooler, and control means (29) for causing the cooler to cool the light source with the cooling capability selected by the selecting means.

Abstract: A pump unit includes a pump body for discharging compressed air, a communication pipe including an elastic material and having one end fitted into a discharge port, and a pump fixture for fixing part of the communication pipe except for the one end fitted into the discharge port. The pump body is fixed only by the pump fixture.

Abstract: A protector is provided which can prevent the leakage of light from a light source lamp to the outside of the projector and which can discharge air that has cooled a light source unit to the outside of the projector with a small ventilation resistance. A light source compartment storing a light source unit according to the invention includes a light source storing section which is defined by partitioning walls which surround the light source unit, an air inlet port which is provided in part of the partitioning walls to let in air discharged from a cooling fan and a rotatable light shielding member having a plurality of vane portions on a rotational shaft thereof which is provided in an air outlet port formed in part of the partitioning walls to let out air.

Abstract: The disclosure is directed to a display device. In one example, the display device includes a screen unit having a screen and a projection section that projects an image light. An arm section is attached to the screen unit so as to protrude therefrom. A reflection unit is attached to the arm section and has a reflection mirror that reflects the image light projected by the projection section toward the screen.

Abstract: An illumination system and a projection system incorporating same are disclosed. The illumination system includes a two-dimensional array of independently operable light sources. Each light source illuminates substantially the entire active area of a pixelated optical light modulator. Each light source emits light in different emission directions. Each emission direction is directed to a respective location in the active area. Each pixel in the active area is illuminated by an incident cone of light from the two-dimensional array of independently operable light sources. The cone has a cone angle and includes at least one light ray from each light source. The cone angle of at least one such cone of light can be controlled by adjusting the intensity of one or more of the independently operable light sources.

Abstract: An optical system unit having a light smoothing unit for emitting a light beam which is substantially parallel to an optical axis and a projector including the optical system unit are provided. The optical system unit includes a light source-side optical system, a display device for forming an image by reflected light and a projection-side optical system, whereby a light beam emitted from the light source unit is shone on to the display device via the light source-side optical system, an image is formed by the display device, and the image so formed is projected on to a screen via the projection-side optical system. The light smoothing unit of the light source-side optical system is such that at least one side of sides other than an incident side and an emitting side is disposed obliquely relative to a side which the at least one side confronts so that an area of the emitting side becomes larger than an area of the incident side.

Abstract: A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.

Abstract: A method and apparatus for process control in a lithographic process are described. Metrology may be performed on a substrate either before or after performing a lithographic patterning process on the substrate. One or more correctables to the lithographic patterning process may be generated based on the metrology. The lithographic patterning process performed on the substrate (or a subsequent substrate) may be adjusted with the correctables.

Abstract: An exposure apparatus includes a first driving mechanism which drives a first optical element, a second driving mechanism which drives a second optical element, and a control unit which controls the first driving mechanism and the second driving mechanism so as to adjust the astigmatism of a projection optical system. The amount of change in the first order component of the astigmatism and the amount of change in the second order component of the astigmatism upon driving the first optical element by the first driving mechanism have a first ratio, and the amount of change in the first order component of the astigmatism and the amount of change in the second order component of the astigmatism upon driving the second optical element by the second driving mechanism have a second ratio which is different from the first ratio.

Abstract: The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and components.

Abstract: An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.

Abstract: A wafer stage and a measurement stage are configured so that they are movable along an upper surface of a base plate, and water is transferred therebetween by bringing the stages proximate to one another and moving them integrally in the Y directions. An alignment system measures mutually proximate edge parts of the wafer stage and the measurement stage, and a focus leveling detection system measures a step in the Z directions in a state wherein the wafer stage and the measurement stage are proximate to one another. When both stages are brought proximate to one another, the relative position between the wafer stage and the measurement stage is adjusted based on the measurement results.

Abstract: An exposure apparatus the present invention comprises: an illumination optical system configured to illuminate an illumination area on an original with light from a light source; a projection optical system configured to project a pattern of the original onto a substrate; a first stage configured to hold the original; a second stage configured to hold the substrate; and a controller configured to control driving of at least one of the first stage, the second stage, and an optical element which forms the projection optical system so as to reduce variations in imaging characteristics of the projection optical system, based on a dependence of a transmittance of the pattern on a position in the illumination area.

Abstract: A measurement apparatus comprises a polarization controller (2) which controls polarization of light which is incident on a detection target; a wavefront dividing unit (5) which divides a wavefront of the light from the polarization controller (2); a polarizing unit (6, 7) which polarizes the light transmitted through the target; a detector (8) which detects the light transmitted through the wavefront dividing unit and/or the polarizing unit; a processor (13) which calculates the optical characteristics of the target based on a detection result; and a first driving unit which moves the wavefront dividing unit with respect to the detector to position the wavefront dividing unit in or outside an optical path running from the target to the detector. The processor (13) calculates the optical characteristics using detection results obtained when the wavefront dividing unit is positioned in the optical path and obtained when the wavefront dividing unit is positioned outside the optical path.

Abstract: The present invention provides a highly controllable device for exposure from the back side and an exposure method, and also provides a method of manufacturing a semiconductor device using the same. The present invention involves exposure with the use of the back side exposure device of which a reflecting means is disposed on the front side of a substrate, apart from a photosensitive thin film surface by a distance X (X=0.1 ?m to 1000 ?m), and formation of a photosensitive thin film pattern in a self alignment manner, with good controllability, at a position a distance Y away from the end of a pattern. The invention fabricates a TFT using that method.

Abstract: An exposure apparatus is configured to expose a substrate to light while the substrate is scanned. The apparatus comprises a stage configured to hold the substrate and to move, a measuring device configured to measure a position of a surface of the substrate held by the stage, a controller configured to define an arrangement of measurement points with respect to each of a plurality of shot regions arranged along a straight line, and to cause the measuring device to sequentially measure positions of the surface with respect to the defined measurement points in the plurality of shot regions while causing the stage to move to scan the substrate along the straight line. The controller is configured to define the arrangement such that the plurality of shot regions have the arrangement in common with each other.

Abstract: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

Abstract: A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

Abstract: An exposure apparatus includes an optical system irradiating a first exposure light from a first pattern and a second exposure light from a second pattern onto a first exposure area and second exposure area respectively to form an image of the first pattern and an image of the second pattern on the first and exposing areas respectively; a light receiving device receiving a detecting light via at least a part of the optical system; and a detection system obtaining, in parallel to at least a part of an operation of multiple-exposing a predetermined area on a substrate with the images of first and second patterns, informations about a positional relationship between the image of the first pattern and the substrate and a positional relationship between the image of the second pattern and the substrate via at least a part of the optical system. The substrate can be efficiently well multi-exposed.

Abstract: In the case of an exposure system for substrate bodies which carry a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier which carries the substrate body and has a substrate carrier surface, and an exposure device with an optics unit, the optics unit and the machine frame being movable relative to one another in a first direction and in a second direction, so that the photosensitive coating can be exposed by this relative movement in the first direction and in the second direction, in order to improve said system in such a way that a compact configuration is possible, despite in this case a substrate body with a very large extent in the first and the second direction, it is proposed that the exposure device has a guide cross-member for at least one guide carriage of the exposure device, the guide carriage carrying the optics unit, in that the guide carriage is guided on the guide cross-member to be movable in the first direction, and in that the guide cross-member is

Abstract: The disclosure relates a projection objective of a microlithographic projection exposure apparatus. In some embodiments, the apparatus is configured to project a mask which can positioned in an object plane onto a light-sensitive layer which can be positioned in an image plane. The projection objective can include a last optical element at the image plane side having a light entrance surface and a light exit surface. The projection objective can also include an immersion liquid is arranged in a region between the light exit surface and the image plane. At a working wavelength of the projection objective, the immersion liquid can have a refractive index of at least 1.5. At least one interface between the light entrance surface of the last optical element at the image plane side and the immersion liquid can have at least region-wise a microstructuring.

Abstract: A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.

Abstract: This disclosure relates to lithography using pulsed laser illumination. In particular it relates to lithography for producing electronic devices on wafers using multi-mode excimer and molecular lasers, e.g. KrF, ArF, and F2 lasers. It may also apply to illumination systems where several single-mode sources are mixed or one single-mode laser beam is split and recombined with time delays, thereby creating an equivalent multimode source and to EUV lithography. Particular aspects of the present invention are described in the claims, specification and drawings.

Abstract: According to test data supplied from a test data memory (80), a test pattern is formed on a substrate (F) and its line width is measured. Light source units (28a to 28j) are adjusted by a light source control unit (89) and the line width change amount between exposure heads (24a to 24j) is corrected so as to set the obtained light quantity. In a mask data setting unit (86), mask data is set so as to control a particular micro mirror of DMD constituting the exposure heads (24a to 24j) to OFF state. By using the mask data, the output data is corrected and a desired image is exposed/recorded on a substrate (F).

Abstract: The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickne

Abstract: A control system is provided for controlling a support structure in a lithographic apparatus. The control system includes a first measurement system arranged to measure the position of a substrate supported by the support structure, the position being measured in a first coordinate system. The control system further includes a second measurement system for measuring the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system.

Abstract: The present invention relates to a clamping device configured to clamp an object on a support, comprising a first device configured to exert an attracting force on said object, and a second device configured to exert a rejecting force on said object, wherein said first device and second device are configured to simultaneously exert an attracting and a rejecting force on said object to shape said object to a desired shape before clamping of said object on said support. The invention further relates to a method for loading an object on a support, comprising the steps of shaping said object in a desired shape spaced from said support, wherein said shaping comprises subjecting said object simultaneously to an attracting force pulling said object towards said support and a rejecting force pushing said object away from said support, and clamping said object on said support.

Abstract: Curved sensor array configurations and methods of processing the data gathered by the sensors. A 2 dimensional embodiment comprises singular ring of sensors that can monitor sources in a 2 dimensional plane. A sensor directly facing a target produces a maximum response. As the angle of a sensor relative to the target increases, the response decreases. Fitting the sensor response amplitudes to a 2D Gaussian curve and calculating the peak of the curve allows a very accurate calculation of the angular direction of the target. A 3D embodiment comprises sensors distributed over the surface of a sphere in order to monitor multiple targets in any spatial orientation. Again, the sensor amplitude data is fitted to a 3D curve or surface such as a Gaussian surface. The present invention can resolve more than one target using deconvoluting techniques.

Abstract: There is provided a laser radar including laser beam generating means, photo detecting means, a mirror, light deflecting means, and rotation driving means. The laser beam generating means emits a laser beam having an axis thereof. The photo detecting means detects a reflected laser beam that is reflected back by an object. The mirror includes a through-hole that passes the laser beam and a reflecting surface that reflects a reflected laser beam reflected back by the object toward the photo detecting means. The light deflecting means deflects the laser beam toward a measuring region and reflects the reflected laser beam from the object toward the mirror. The rotation driving means rotates the light deflecting means so as to direct the laser beam toward the measuring region.

Abstract: A distance measurement method for use in a laser range finding device to measure a distance between the laser range finding device and a target is disclosed. The method comprises the following steps. A laser signal is sent to the target in a first time point. A reflected laser signal reflected by the target is then received. A digital signal having a plurality of signal values ranging from 0 to N is obtained by sampling the reflected laser signal with a sampling signal, wherein N is an integer larger than two. A maximum signal value among the signal values is obtained. The distance is calculated according to the first time point and a second time point where the maximum signal value is generated.

Abstract: An apparatus for forming a solid sample from a sample solution and then analyzing the solid sample to determine the solid form of the sample is provided. The apparatus may optionally comprise a masking block with an array of openings, a film on which the solid sample can be deposited, and a sheet. The apparatus may optionally comprise a masking block with an array of openings and a sheet on which the sample can be deposited. The apparatus may comprise the formation unit of a system for forming a solid sample and analyzing the solid sample. The system may further comprise an analysis unit comprising the film and/or sheet with the solid samples and a spacer unit attached to the film after it has been removed from the formation unit. Methods for using the apparatus and/or system of the present invention are also provided.

Abstract: Innovative techniques that result in a better signal-to-noise ratio for spectrographic analysis of substances in a target than conventional techniques. In these techniques, light illuminates a target with at least some of the light penetrating the target. At least a portion of the light that penetrates the target is collected from a region on the target's surface that is not directly illuminated. Preferably, at least a majority of the collected light is light that penetrates the target. Also preferably, the light that illuminates the target is in a pattern that partially but not completely surrounds the region from which the portion of the light that penetrates the target is collected. A spectrum of at least a portion of the collected light is analyzed.

Abstract: A monitoring device is described for multiple chemical reactions in multiple test containers. Each container contains chemical reagents and at least one fluorescence dye indicator capable of changing its fluorescent characteristics due to the chemical reaction. A single cylindrical ultraviolet (UV) cold cathode fluorescent (CCFL) tube is utilized. Multiple test containers (e.g., 8) are placed along the tube of the CCFL. The UV light emerging from the CCFL interacts with the dye indicator in each of the containers to yield interactive light beams that can be detected by signal photo sensors. In order to compensate for the light variations occurring along the tube, a reference photo sensor is placed for each container location along the tube to directly detect the signal from the CCFL.

Abstract: A system and method for depositing a sample of a threat agent onto a substrate. The deposition of the threat agent onto the substrate is visually observed by analyzing the elastic scattered photons produced by the threat agent using elastic scatter imaging to form an image of the threat agent on the substrate, wherein depositing of the threat agent is substantially coincident in time with visually observing of the deposition of the threat agent. A system and method for depositing a sample of a threat agent onto a substrate. A single illumination source illuminates the threat agent on the substrate with a plurality of photons to thereby produce elastic scattered photons. Deposition of the threat agent onto the substrate is visually observed by analyzing the elastic scattered photons produced by the threat agent using elastic scatter imaging to form an image of the threat agent on the substrate.

Abstract: A device for beam adjustment in an optical beam path, having at least two mutually independent light sources (1, 2), in particular in a beam path (8, 9) of a preferably high or extremely high resolution microscope, the beams of the light sources (1, 2) requiring to be superposed in a common illumination beam path (10), is characterized in that a calibration sample (22) with the aid of which the pupil position and/or focal position of the beams can be checked can be brought into and taken out of the illumination beam path (10).

Abstract: A system for checking centration of lens surfaces of an aspheric lens includes a light-emitting device, a lens holder and an image processing device. The light-emitting device emits a light. The lens holder positions the aspheric lens in a light path of the light emitted from the light-emitting device. The image processing device receives the light which is emitted from the light-emitting device and has passed through the aspheric lens, and produces an image and shows the image. A quality of the image shown by the image processing device determines a tilt degree of the aspheric lens.

Abstract: A method, system and computer program product for determining an Azimuth angle of an incident beam to a wafer are disclosed. A method comprises: using the incident beam to make a first set of measurements of calibration targets of a first set of grating angles that are different than one another; analyzing the first set of measurements to determine an reference grating angle which corresponds to a grating line to which the incident beam has a practically zero Azimuth angle; and determining the Azimuth angle of the incident beam to the wafer using the determined reference grating angle.

Abstract: An optical sensing module is adapted to be assembled to a frame of a display device. The display device comprises a display module and the frame, and the display module has a display area and the frame surrounds the display area. The optical sensing module comprises a casing and an optical sensor. The casing is pivoted to the frame and the optical sensor is configured in the casing for sensing external light projecting on a side of the casing. The optical sensor is capable of sensing a brightness of the display area when the side of the casing faces the display area and sensing a brightness of an ambient light when the side of the casing doesn't face the display area.

Abstract: A device for scanning pieces of solid wood has a pusher movable across a length of a piece of solid wood and at least one scanning unit mounted on the pusher. At least one side of the piece of solid wood is scanned by the at least one scanning unit as the at least one scanning unit moves together with the pusher. The at least one scanning unit has at least one camera with which the piece of solid wood is scanned. The at least one camera is adjustably mounted on the pusher.

Abstract: Disclosed is an optical device for illuminating a chip having a sample provided thereto with a beam in an apparatus for observing the sample. The optical device comprises a light source; and a first reflector reflecting the beam of the light source to allow the reflected beam to be incident on the chip at an inclined angle. In addition, the invention provides an apparatus for observing micro particles having the optical device. When the light of the light source is incident on the sample at an incline angle according to the optical device of the invention, it is possible to maximize a transmittancy of the light. Accordingly, the light emitted from the sample is clearer and a clear image can be thus obtained.

Abstract: An apparatus and a method for defect inspection enables a reduction in the amount of noise light from an underlying layer and a good defect inspection reliably. The apparatus includes an illumination device that irradiates, with illumination light, a substrate to be inspected including a resist layer having cyclic patterns formed on the upper layer, and an optical image forming system that forms an image of the substrate to be inspected according to light that emerges from the substrate to be inspected by the irradiation with illumination light. The wavelength of the illumination light is set so that intensity of the light from the surface of the resist layer, among the light emerged from the substrate to be inspected, is greater than that of light that has passed through the surface of the cyclic pattern layer formed below the resist layer.

Abstract: A system for the optical inspection of glass panels (2) is described, with a conveying device (3) for moving a glass panel (2), and with a first inspection module (5, 6, 7), which includes an illumination device and a camera for illuminating and photographing the glass panel (2), and with a first evaluation module (8, 9, 10, 11) for evaluating the photographs of the glass panel (2). In addition, a second inspection module (5, 6, 7) is provided, which includes an illumination device or a camera for illuminating the photograph of the glass panel (2), and it is connected with a second evaluation module (8, 9, 10, 11) for evaluating the photographs taken of the glass panel, the illumination systems and/or the cameras of the first inspection module (5, 6, 7) and the second inspection module (5, 6, 7) having different designs and/or being located in different places relative to the glass panel (2), which is moved past the inspection modules (5, 6, 7) via the conveying device.

Abstract: A stirrer includes a vessel for holding a liquid to be stirred; and a sound wave generator that irradiates the liquid with a sound wave to stir the liquid by the sound wave. The sound wave generator includes a piezoelectric substrate, and a sound generating element provided on the piezoelectric substrate and arranged outside the vessel so as to be adjacent to the liquid across the vessel and the piezoelectric substrate to generate a sound wave for stirring the liquid.

Abstract: Methods and apparatus for enhancing reference spectra are presented. Movement of a reference material relative to a spectrometer optical path is used to enhance reference spectra precision. Alternatively, changing an optically sampled area and/or volume of a reference material during collection of a reference spectrum is used to enhance reference spectra precision. Two separate cases are treated, where the observed variation removed is dependent upon hardware configuration of an analyzer and position of the analyzer relative to the reference. The first case is reduction or removal of radiance variation. The second case is reduction or removal of spectral variation due to observed diffraction. Enhanced reference spectra precision results in enhanced precision and/or accuracy of associated analyte property determinations.

Abstract: According to an aspect of the embodiment, an optical device has a mirror device having a plurality of mirrors which are able to move, and a mirror interface for adjusting light axis of the each input light in accordance with each position of the mirrors.

Abstract: The present invention is directed to an aggregate composed of a plurality of nanoparticles of a transition metal and a plurality of cyanine dye molecules that are interacting non-covalently. The nanoparticles are capped with a capping molecule, while the cyanine dye molecule can be cationic, anionic, or neutral cyanine dye. Methods of making such aggregates and for using them in detection of an analyte are also disclosed.

Abstract: The invention provides an apparatus including (a) a frame having a boundary plane; (b) a flow chamber supported by the frame, the flow chamber placed a distance from the boundary plane; (c) a radiation source, the radiation source directed away from the flow chamber and away from the exterior side of the boundary plane, and (d) a first reflective surface placed to direct a radiation beam in a path crossing the boundary plane to the flow chamber; (e) one or more reflective surfaces placed to direct a radiation beam from the radiation source to the first reflective surface, the path from the radiation source to the flow chamber being at least 1.5 times the distance from the flow chamber to the boundary plane.

Abstract: Methods and optical systems for scanning of a target sample, including methods and systems using a low mass scan head. The present invention also relates to methods and systems for performing sample assays, and for producing and measuring optical responses and signatures.

Abstract: A mixture identification system for detecting foreign matter admixed in a tobacco material (T) includes a conveyor (2) for conveying the material (T), an irradiation device (6) for irradiating infrared light toward an inspection line (IL) extending across the conveyor (2), an infrared camera device (10) for receiving the infrared light reflected from the tobacco material (T) passing across the inspection line (IL) and outputting image data of the material (T) based on the received infrared light, and a discrimination circuit (96) for detecting foreign matter in the material (T) based on the output from the camera device (10). The infrared camera device (10) has infrared filters (70, 76, 82) for receiving the infrared light reflected from the tobacco material (T) and allowing only respective specific wavelengths to pass therethrough, and optical line sensors (72, 78, 84) for receiving the infrared light passed through the respective filters (70, 76, 82).

Abstract: A spectroscope designed to utilize an adaptive optical element such as a micro mirror array (MMA) and two distinct light channels and detectors. The devices can provide for real-time and near real-time scaling and normalization of signals.