Patents Issued in June 8, 2010
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Patent number: 7732089Abstract: A fluid consuming battery (10) is provided with a fluid regulating system (50) for regulating fluid entry into the battery. The battery (10) includes a fluid consuming cell (20) having a cell housing with fluid entry ports for the passage of a fluid into the cell housing. A first fluid consuming electrode and a second electrode are disposed within the cell housing. The fluid regulating system (50) includes a valve having a moving plate (66) disposed adjacent to a fixed plate (62). The moving plate and fixed plate both have fluid entry ports (68, 64) that align in an open valve position and are misaligned in a closed valve position. The fluid regulating system (50) also includes an actuator that may include one or more shape memory alloy (SMA) components (82a, 82b) for moving the moving plate (66) relative to the fixed plate (62) to open and close the valve.Type: GrantFiled: April 11, 2007Date of Patent: June 8, 2010Assignee: Eveready Battery Company, Inc.Inventors: Oliver W. Burstall, David M. Blakey, John C. Bailey, John M. Somerville, Richard A. Langan, Michael J. Mingay
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Patent number: 7732090Abstract: A sealed rectangular battery having a reliably operative explosion-proof valve is provided. A rectangular battery case 1 whose cross-section is oblong, the battery case having a prismatic shaped case body 5 with a bottom and a lid 6. An explosion-proof valve 2 is arranged near one of two opposing short sides of a main surface wall of the lid. The explosion-proof valve a V-cut groove 15 concavely formed in V-shaped or U-shaped in which a central bent part 15a is positioned at a central location in the main surface wall 6a of the lid, and a thin wall 16 formed by the V-cut groove. Cut grooves 18 connecting each of two ends of the V-cut groove and each of two long sides of the main surface wall of the lid which are parallel to each other, respectively, are cut and formed in the main surface wall of the lid.Type: GrantFiled: September 29, 2004Date of Patent: June 8, 2010Assignee: Hitachi Maxell, Ltd.Inventor: Yoshiki Somatomo
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Patent number: 7732091Abstract: A lithium ion secondary battery in which at least one step portion is formed on an upper surface of a cap plate, and at least one step portion is formed on a lower or first surface of a battery part opposite to the upper or first surface of the cap plate so that the at least two step portions are complementary. The complementary step portions of the cap plate of the bare cell and the battery part provided at an upper part of the cap plate result in easy coupling of the battery part to the bare cell and stable maintenance of the coupling between the battery part and the bare cell. The coupling structure results in greater ease in performing subsequent manufacturing processes and protects the bare cells coupled to the battery part from dislodging.Type: GrantFiled: February 26, 2007Date of Patent: June 8, 2010Assignee: Samsung SDI Co., Ltd.Inventor: Sangseok Jung
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Patent number: 7732092Abstract: Disclosed herein is a case which protects a plurality of flexible lithium polymer unit cells, has a compact structure to reduce volume, has a simple assembly process, and minimizes heat generated during a high-power charging or discharging operation. The battery case includes a pouch support frame to support a pouch of a unit cell having the pouch and electrode terminals. A heat radiating part having the shape of a shelf is provided on a surface of the pouch support frame, and defines a space for dispersing heat generated from the pouch. A terminal support having the shape of a wall is provided on an edge of the heat radiating part, thus supporting the electrode terminals of the unit cell.Type: GrantFiled: March 22, 2006Date of Patent: June 8, 2010Assignee: SK Energy Co., Ltd.Inventor: Jeon-keun Oh
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Patent number: 7732093Abstract: This invention relates to non-aqueous electrolytes, in particular, a non-aqueous electrolyte for lithium-ion secondary batteries. The electrolyte comprises regular organic solvents and electrolyte saline. The special characteristics are: the electrolyte also comprises mixed additives, said mixed additives comprising at least one of those of compound group A, at least one of those of compound group B, and one of those of compound group C wherein: compound group A are selected from inorganic saline including Li2CO3, Li2SO4, Li2SO3, LiNO3; compound group B are selected from vinylene carbonate, propylene carbonate; and compound group C are selected from ES, PS, DMS, DES, DMSO. The weight ratio can be A:B:C=0.1%-3.0%:0.5%-4.0%:1.0%-5.0%.Type: GrantFiled: November 9, 2006Date of Patent: June 8, 2010Assignee: BYD Company LimitedInventors: Feng Xiao, Mingxia Wang, Guishu Zhou, Huaying You
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Patent number: 7732094Abstract: A mesoporous carbon composite includes mesoporous carbon having mesopores; a conductive polymer coated on only an outer surface of the mesoporous carbon; and an organic electrolyte. The mesoporous carbon composite may be prepared by impregnating an ordered mesoporous silica (OMS) with a mixture comprising a carbon precursor, an acid, and a solvent; heat-treating and carbonizing the impregnated OMS to form an OMS-carbon composite; mixing the OMS-carbon composite with a monomer that forms a conductive polymer and a solvent to provide a surface of the OMS-carbon composite with the monomer; polymerizing the monomer to obtain a conductive polymer-coated OMS-carbon composite; removing the OMS from the composite to obtain a conductive polymer-coated mesoporous carbon; and doping the conductive polymer-coated mesoporous carbon with an organic electrolyte. A supported catalyst and a fuel cell include the mesoporous carbon composite.Type: GrantFiled: May 31, 2006Date of Patent: June 8, 2010Assignee: Samsung SDI., Ltd.Inventors: Chan-ho Pak, Yeong-suk Choi, Hyuk Chang, Sang Hoon Joo
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Patent number: 7732095Abstract: An electrode composition for a lithium ion battery that includes an amorphous alloy having the formula SixMyAlz where x, y, and z represent atomic percent values and (a) x+y+z=100, (b) x?55, (c) y<22, (d) z>0, and (e) M is one or more metals selected from the group consisting of manganese, molybdenum, niobium, tungsten, tantalum, iron, copper, titanium, vanadium, chromium, nickel, cobalt, zirconium, yttrium, and combinations thereof.Type: GrantFiled: November 21, 2006Date of Patent: June 8, 2010Assignee: 3M Innovative Properties CompanyInventors: Leif Christensen, Mark N. Obrovac
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Patent number: 7732096Abstract: An uncycled preconditioned electrode for a non-aqueous lithium electrochemical cell including a lithium metal oxide having the formula xLi2?yHyO.xM?O2.(1?x)Li1?zHzMO2 in which 0<x<1, 0<y<1 and 0<z<1, M is anon-lithium metal ion with an average trivalent oxidation state selected from two or more of the first row transition metals or lighter metal elements in the periodic table, and M? is one or more ions with an average tetravalent oxidation state selected from the first and second row transition metal elements and Sn. The xLi2?yHy.xM?O2.(1?x)Li1?zHzMO2 material is prepared by preconditioning a precursor lithium metal oxide (i.e., xLi2M?O3.(1?x)LiMO2) with a proton-containing medium with a pH<7.0 containing an inorganic acid. Methods of preparing the electrodes are disclosed, as are electrochemical cells and batteries containing the electrodes.Type: GrantFiled: March 16, 2006Date of Patent: June 8, 2010Assignee: Uchicago Argonne, LLCInventors: Michael M. Thackeray, Christopher S. Johnson, Khalil Amine, Sun-Ho Kang
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Patent number: 7732097Abstract: A battery capable of improving cycle characteristics is provided. A cathode contains an oxide containing lithium and manganese such as Li4Mn5O12 as a cathode material. An anode contains a carbon material as and anode material. The weight ratio of the cathode material to the anode material is in the range from 2.03 to 2.53. The electrical capacity ratio of the cathode to the anode is in the range from 0.8 to 1.0. The open circuit voltage in full charge state per a pair of cathode and anode is from 2.9 V to 3.2 V.Type: GrantFiled: February 7, 2006Date of Patent: June 8, 2010Assignee: Sony CorporationInventor: Kenichi Suzuki
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Patent number: 7732098Abstract: A lead acid electric storage battery uses conventional lead-acid secondary battery chemistry. The battery may be a sealed battery, an unsealed battery or a conventional multi-cell battery. The battery has a set of positive battery grids (plates) which are constructed with a body portion of thin titanium expanded metal having a thickness preferably in the range 0.1 mm to 0.9 mm and most preferably 0.2 mm to 0.4 mm. Typically the battery would have over 250 grids in a 12 inch long battery case.Type: GrantFiled: November 17, 2008Date of Patent: June 8, 2010Inventor: Eliot Gerber
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Patent number: 7732099Abstract: A totally solid polymer electrolyte composition with high ionic conductivity and enhanced mechanical properties is provided. This electrolyte composition is produced by polymerizing a monomer composition comprising a molten quaternary ammonium salt having a polymerizable functional group introduced therein and a charge transfer ion source in the presence of a polymeric reinforcing material. The polymeric reinforcing material can be formed into a composite of polymer blend morphology by dissolving the monomer composition and the reinforcing material in an appropriate organic solvent and polymerizing the solution. Alternatively, the composite can be obtained by impregnating a porous sheet or film as the reinforcing material with the monomer composition and effecting polymerization.Type: GrantFiled: March 15, 2004Date of Patent: June 8, 2010Assignee: Trekion Co., Ltd.Inventors: Naoya Ogata, Hiroshi Kagawa, Makiko Sada
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Patent number: 7732100Abstract: The invention provides a novel lithium-ion battery electrolyte which is produced by adding an aluminate ester compound as a plasticizer in a solid polymer electrolyte. The lithium-ion battery solid polymer electrolyte of the present invention comprises a lithium ion source, an organic polymer compound, and one or more kinds of aluminate ester compounds represented by the general formula where R1, R2, and R3 each independently represent a straight-chain or branched-chain lower alkyl group having one to eight carbon atoms, an alkenyl group having three to six carbon atoms, acryloyl, or methacryloyl; OA1, OA2, and OA3 each independently represent an oxyalkylene group having two to four carbon atoms; l represents a number from 1 to 100; and m and n each independently represent a number from 0 to 100.Type: GrantFiled: June 2, 2006Date of Patent: June 8, 2010Assignees: Tokyo Institute of Technology, Nippon Nyukazai Co., Ltd.Inventors: Masataka Wakihara, Masayuki Seki, Hidehisa Mita
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Patent number: 7732101Abstract: In a method of producing a glass substrate for a mask blank, a surface of the glass substrate is polished by the use of an alkaline polishing liquid that contains colloidal silica abrasive grains, from which alkali metal is removed to suppress occurrence of an alkali metal gel substance protrusion adhered on the glass substrate. The polishing process may include a surface roughness control step for initially finishing the surface of the glass substrate to a predetermined surface roughness by moving a polishing member and the glass substrate relative to each other under a predetermined pressure. This may be followed by a protrusion suppressing step under a pressure lower than the predetermined pressure, to minimize polishing rate and suppress occurrence of a fine convex protrusion.Type: GrantFiled: July 30, 2008Date of Patent: June 8, 2010Assignee: Hoya CorporationInventors: Kesahiro Koike, Junji Miyagaki
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Patent number: 7732102Abstract: A photolithographic mask is adapted for use in imparting a pattern to a substrate. The pattern comprises a plurality of features. At least one of the plurality of features (201) is implemented in the mask as a phase shifting structure (205) with a unitary layer of opaque material (207) disposed thereon. The mask is utilized to impart the pattern to a layer over a semiconductor substrate.Type: GrantFiled: July 14, 2005Date of Patent: June 8, 2010Assignee: Freescale Semiconductor, Inc.Inventors: Jonathan L. Cobb, Bernard J. Roman, Wei E. Wu
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Patent number: 7732103Abstract: A test photomask includes a first mask pattern and a second mask pattern formed at a center portion of the first mask pattern thereon. The first mask pattern is a pattern with light condensing effect and a nature in which an exposure-dose amount to a transfer object varies in dependence on a focus variation, which is a two-dimensional Fresnel zone pattern here.Type: GrantFiled: November 30, 2006Date of Patent: June 8, 2010Assignee: Fujitsu Semiconductor LimitedInventor: Teruyoshi Yao
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Patent number: 7732104Abstract: The present technology relates generally to laser ablation, and more particularly pertains to a system and method for eliminating structure and edge roughness, which is produced during the laser ablation of a material. Ablation of materials using a femtosecond laser beam produces a fine scale periodic structure in the ablated region. The structure consists of residual (i.e. unablated material) and is always perpendicular to the polarization direction of the laser beam. By changing the polarization direction during the ablation process, the structure is averaged over many directions and thus eliminated. This eliminates structure and edge roughness in a material caused by the laser ablation of the material. The method is employed to the repairing of photomasks so as to cause the optical quality thereof to be improved.Type: GrantFiled: January 18, 2007Date of Patent: June 8, 2010Assignee: International Business Machines CorporationInventor: Alfred Wagner
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Patent number: 7732105Abstract: Provided are a photomask and a method of fabricating a semiconductor device. The photomask includes a photomask substrate including a chip region and a scribe lane region, with an overlay mark formed in the scribe lane region. The overlay mark includes one or more sub-overlay marks. Each of the sub-overlay marks includes a plurality of unit regions sequentially connected to each other and having different widths, where the width of a given unit region is constant.Type: GrantFiled: July 13, 2007Date of Patent: June 8, 2010Assignee: Samsung Electronics Co., Ltd.Inventors: Do-Yul Yoo, Ji-Yong You, Joong-Sung Kim, Hyung-Joo Youn
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Patent number: 7732106Abstract: Methods for etching devices used for lithography. In one aspect, a method includes etching, in a single etch, a first region and a second region on a substrate. The first region is to attenuate an intensity of the zero diffraction order of a radiation for patterning of a microelectronic device to a first extent. The second region is to attenuate the intensity of the zero diffraction order of the radiation to a second extent. The second extent being sufficiently different from the first extent to improve a quality of the patterned microelectronic device.Type: GrantFiled: October 20, 2008Date of Patent: June 8, 2010Assignee: Intel CorporationInventors: Edita Tejnil, Yan Borodovsky
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Patent number: 7732107Abstract: In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in width, over the entire portion not only of a single shot region, but also of a single chip region, a mask pattern correction device of the present invention has a numerical aperture calculation unit calculating, for every single shot region, flare energy for a mask pattern corresponding to a transferred pattern, based on an exposure layout of a plurality of shot regions, or more specifically, while considering flare from a plurality of shot regions located around every single shot region.Type: GrantFiled: November 24, 2004Date of Patent: June 8, 2010Assignee: Fujitsu Semiconductor LimitedInventors: Teruyoshi Yao, Satoru Asai, Morimi Osawa, Hiromi Hoshino, Kouzou Ogino, Kazumasa Morishita
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Patent number: 7732108Abstract: A method for generating or refining an OPC model for use in wafer fabrication. A predetermined feature layout is used to prepare a mask for use in, for example, a photolithographic process. The mask is used to create structures corresponding to mask features on a semiconductor wafer using the mask. Measurements of the actual mask features and wafer features may then be assessed and correlated, and the results used to generate an OPC model or refine an existing one. In addition, the OPC may be used to simulate a fabrication operation by applying the OPC tool to a predetermined layout to produce a mask image and a wafer image, and then comparing the predetermined layout to the simulated wafer image to determine at least one fitness value.Type: GrantFiled: September 30, 2005Date of Patent: June 8, 2010Assignee: Infineon Technologies AGInventor: O Seo Park
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Patent number: 7732109Abstract: A method for improving critical dimension uniformity of a wafer includes exposing a plurality of mask patterns on a first plurality of substrates at predetermined locations with common splits conditions of focus and exposure dose for each of the first plurality of substrates to form a plurality of perturbed wafers; measuring a critical dimension of the plurality of mask patterns at each of the predetermined locations for each of the plurality of perturbed wafers; averaging the critical dimension measured at each of the predetermined locations over the plurality of perturbed wafers to form a perturbed critical dimension map; measuring a sidewall angle of the plurality of mask patterns; averaging the sidewall angle measured to form a perturbed sidewall angle map; and providing the perturbed critical dimension map and the perturbed sidewall angle map to an exposure tool.Type: GrantFiled: April 4, 2007Date of Patent: June 8, 2010Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Shinn-Sheng Yu, Chih-Ming Ke, Jacky Huang, Chun-Kuang Chen, Tsai-Sheng Gau
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Patent number: 7732110Abstract: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.Type: GrantFiled: February 25, 2009Date of Patent: June 8, 2010Assignee: ASML Netherlands B.V.Inventors: Jozef Maria Finders, Judocus Marie Dominicus Stoeldraijer, Johannes Wilhelmus De Klerk
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Patent number: 7732111Abstract: A photoconductor containing a supporting substrate; an undercoat layer comprised of a mixture of an aminosilane and a halogenated polymer; a photogenerating layer; and at least one charge transport layer.Type: GrantFiled: March 6, 2007Date of Patent: June 8, 2010Assignee: Xerox CorporationInventors: Jin Wu, Satchidanand Mishra, Geoffrey M T. Foley, Anthony M. Horgan, Yonn K. Rasmussen, Michael A. Morgan, Kathleen M. Carmichael, Edward F. Grabowski, Liang-Bih Lin
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Patent number: 7732112Abstract: An imaging member includes a substrate; a charge generation layer positioned on the substrate; at least one charge transport layer positioned on the charge generation layer; and an undercoat layer positioned on the substrate on a side opposite the charge generation layer, the undercoat layer comprising a binder component and a metallic component comprising metal thiocyanate and metal oxide.Type: GrantFiled: July 6, 2006Date of Patent: June 8, 2010Assignee: Xerox CorporationInventors: Jin Wu, Daniel V. Levy, Liang-bih Lin
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Patent number: 7732113Abstract: In an electrophotographic photosensitive member having a support, a conductive layer formed on the support, an intermediate layer formed on the conductive layer, and a photosensitive layer formed on the intermediate layer, the conductive layer has been formed by using a conductive layer coating fluid which contains TiO2 particles coated with oxygen deficient SnO2 having an average particle diameter of from 0.20 ?m or more to 0.60 ?m or less, and has a volume resistivity of from more than 8.0×108 ?cm to 1.0×1011 ?cm or less. The electrophotographic photosensitive member can keep charging lines from occurring.Type: GrantFiled: March 24, 2006Date of Patent: June 8, 2010Assignee: Canon Kabushiki KaishaInventors: Kazushige Nakamura, Hidetoshi Hirano, Hirotoshi Uesugi, Hirofumi Kumoi, Shinji Takagi, Yukihiro Abe, Junpei Kuno, Daisuke Miura
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Patent number: 7732114Abstract: Modified nigrosine which has satisfactory dispersibility in resin and which reduces the residual aniline amount is offered, and its production method is also offered. Moreover, toner for developing electrostatic charge images is offered, which uses modified nigrosine colorant that resolves the aforementioned problems, which has excellent charge-imparting properties, which exhibits no fogging, which experiences no scattering of toner inside the developing apparatus, and which has little fluctuation of image density. Modified nigrosine, which is nigrosine (b) that has been modified by rosin-modified resin (a) with an acid value of 110 or less.Type: GrantFiled: September 21, 2005Date of Patent: June 8, 2010Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Shinji Amaya, Toshiro Kogawara
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Patent number: 7732115Abstract: The present invention relates to toner compositions comprising a resin and a colorant. Various embodiments of the colorant used in the toner compositions are disclosed, including a modified pigment comprising a pigment having attached at least one organic group having the formula -X-I, wherein X, which is directly attached to the pigment, represents an arylene or heteroarylene group, or an alkylene group, and I represents a non-polymeric group comprising at least one ionic group or at least one ionizable group. Processes for preparing toner compositions are also described.Type: GrantFiled: December 16, 2009Date of Patent: June 8, 2010Assignee: Cabot CorporationInventors: Eugene N. Step, Agathagelos Kyrlidis
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Patent number: 7732116Abstract: The present invention is an electrophotographic photoconductor having a photosensitive layer on a conductive substrate. The photosensitive layer contains N-arylphthalimides additives.Type: GrantFiled: September 27, 2007Date of Patent: June 8, 2010Assignee: Eastman Kodak CompanyInventors: David S. Weiss, William T. Gruenbaum, John C. Wilson
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Patent number: 7732117Abstract: The main object of the present invention is to provide a photocatalyst composition and a photocatalyst containing layer showing a high activity in a short period of time, and a pattern formed body using the photocatalyst containing layer. To attain the object, the invention provides a photocatalyst composition containing at least a photocatalyst, characterized by including a portion with the signal intensity of the electron spin resonance spectrum derived from the hydroxy radical increased to 1,000 times or more in 1 second within 600 seconds of the start of the ultraviolet ray irradiation at the time of measuring the electron spin resonance spectrum while irradiating the ultraviolet ray.Type: GrantFiled: March 27, 2006Date of Patent: June 8, 2010Assignee: Dai Nippon Printing Co., Ltd.Inventor: Kiyoshi Itoh
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Patent number: 7732118Abstract: A radiation-sensitive composition includes a radically polymerizable component, initiator composition, a radiation absorbing compound, and a polymeric binder having recurring units that are derived from various ethylenically unsaturated polymerizable monomers provided that at least 40 mol % of the recurring units have a tertiary carbon atom in the backbone and the rest of the recurring units have a secondary or quaternary carbon atom in the backbone. This composition can be used to provide negative-working imageable elements that can be imaged and developed to provide lithographic printing plates that have desired imaging speed and excellent run length without the need for a post-exposure backing step.Type: GrantFiled: May 10, 2007Date of Patent: June 8, 2010Assignee: Eastman Kodak CompanyInventors: Ting Tao, Shashikant Saraiya, Eric Clark, Frederic E. Mikell
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Patent number: 7732119Abstract: A photosensitive monolayer is self-assembled on an oxide surface. The chemical compound of the photosensitive monolayer has three components. A first end group provides covalent bonds with the oxide surface for self assembly on the oxide surface. A photosensitive group that dissociates upon exposure to ultraviolet radiation is linked to the first end group. A second end group linked to the photosensitive group provides hydrophobicity. Upon exposure to the ultraviolet radiation, the dissociated photosensitive group is cleaved and forms a hydrophilic derivative in the exposed region, rendering the exposed region hydrophilic. Carbon nanotubes or nanocrystals applied in an aqueous dispersion are selectively attracted to the hydrophilic exposed region to from electrostatic bonding with the hydrophilic surface of the cleaved photosensitive group.Type: GrantFiled: October 10, 2007Date of Patent: June 8, 2010Assignee: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Teresita O. Graham, James B. Hannon, George S. Tulevski
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Patent number: 7732120Abstract: The present invention relates generally to the fields of semiconductor lithography. More particularly, it concerns methods, compositions, and apparatuses relating to 157 nm and 193 nm soft pellicles and the use of perfluorinated polymers in the creation of pellicles.Type: GrantFiled: October 10, 2008Date of Patent: June 8, 2010Assignee: Sematech Inc.Inventors: Paul A. Zimmerman, Chris K. Van Peski
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Patent number: 7732121Abstract: A near-field exposure method includes closely contacting an exposure mask having a light blocking film with small openings, to a photoresist layer formed on a substrate having surface unevenness, and projecting the exposure light of the exposure light source onto the exposure mask so that the photoresist is exposed based on near-field light escaping from the small openings, wherein the near-field exposure is carried out under a condition that a contact region where the light blocking film and the photoresist layer are in contact with each other and a liquid region filled with a liquid between the light blocking film and the photoresist layer coexist between the light blocking film and the photoresist layer.Type: GrantFiled: June 6, 2007Date of Patent: June 8, 2010Assignee: Canon Kabushiki KaishaInventors: Natsuhiko Mizutani, Yasuhisa Inao
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Patent number: 7732122Abstract: The invention relates to a process for producing photonic crystals by first providing an inorganic photoresist which, on illumination with energy greater than the electronic band gap of the photoresist, exhibits a phase alteration. Illumination of the photoresist with a laser beam whose energy is lower than the electronic band gap of the photoresist but whose intensity at the focal point is so high that nonlinear effects occur there nevertheless results in a phase alteration in the photoresist. Thereafter, the illuminated photoresist is exposed to an etching solution which preferentially dissolves one phase of the photoresist, and the developed photoresist is finally removed therefrom as a photonic crystal. Inorganic photonic crystals produced by the process according to the invention are suitable for completely optical systems, circuits and components for optical telecommunication or computer systems.Type: GrantFiled: August 5, 2005Date of Patent: June 8, 2010Assignees: Forschungszentrum Karlsruhe GmbH, University of TorontoInventors: Sean H. Wong, Georg Ludwig Eberhard von Freymann, Geoffrey A. Ozin, Markus Deubel, Martin Wegener
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Patent number: 7732123Abstract: A method comprises forming a photoresist on a substrate, rinsing the photoresist using a rinse liquid agitated with at least one megasonic source, exposing the photoresist to radiation while immersed in a liquid, and developing the photoresist.Type: GrantFiled: November 23, 2004Date of Patent: June 8, 2010Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventor: Ching-Yu Chang
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Patent number: 7732124Abstract: A color-image forming method in a silver halide color photographic light-sensitive material, having the steps of: performing exposure of the light-sensitive material cut into sheets; and subjecting the exposed light-sensitive material sheets to photographic processing, while conveying them with conveying rollers, with the sheet conveying speed being 40.0 to 100 mm/sec; wherein the light-sensitive material to be exposed contains any of: 1) a dye-forming coupler of formula (IA), 2) a compound of formula (I), and 3) 1.4 mg/m2 or more of a compound of formula (II); wherein R? and R? are a substituent; Z is a hydrogen atom, or a coupling split-off group; A is an alkyl group, M is a cation, and R is an atom or group having 100 or lower total molecular weight.Type: GrantFiled: November 20, 2008Date of Patent: June 8, 2010Assignee: Fujifilm CorporationInventors: Yasuaki Deguchi, Shin Soejima, Naoto Ohshima, Tatsuya Ishizaka, Katsuyuki Takada, Futoshi Yoshida, Atsushi Maruhashi, Yoshinori Morimoto, Takehisa Ohno
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Patent number: 7732125Abstract: The invention relates to a bioartificial primarily vascularized tissue matrix, a bioartificial primarily vascularized tissue, a method for the production thereof and the use of the same. Said tissue matrix and bioartificial primarily vascularized tissue are obtained by preparing the necessary natural tissue, conserving at least one vessel.Type: GrantFiled: February 13, 2002Date of Patent: June 8, 2010Assignee: corLife GbRInventors: Axel Haverich, Heike Mertsching
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Patent number: 7732126Abstract: The present invention is directed to a new bone marrow stromal stem cell (BMSSC) marker, CD18, for use in selecting a population of cells enriched in BMSSCs, from bone marrow cells, adipose cells, or peripheral blood. The invention is further directed to methods for selecting a population of cells enriched in BMSSCs based on the selective expression of CD18 on their surface, using techniques known in the art such as fluorescent assisted cell sorting, an immunomagnetic method, flow microfluorimetry, immunofluorescence, immunoperoxidase staining, radioimmunoassay and immunoaffinity chromatography. The invention is further directed to the BMSSCs isolated based on CD18 expression, and their use to treat various diseases. In one aspect, the HMSSCs are transformed with a vector having a normal gene for CD18, and the transformed BMSSCs are administered to treat bone degenerative diseases and diseases of bone involving abnormal expression of CD18 expression of CD18.Type: GrantFiled: September 6, 2005Date of Patent: June 8, 2010Assignee: University of Maryland, BaltimoreInventors: Li Zhang, Yasuo Miura, Songtao Shi
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Patent number: 7732127Abstract: The present invention includes devices and methods for dynamically monitoring cell adhesion and cell spreading. Cells are added to a microelectronic cell sensor array operably connected to an impedance analyzer. The device also includes a coating including biological molecule or organic compound capable of interacting with the cell. Cell adhesion and cell mobility is determined by detecting changes in impedance and comparing impedance or cell index values between samples.Type: GrantFiled: September 27, 2005Date of Patent: June 8, 2010Assignee: ACEA Biosciences, Inc.Inventors: Xiaobo Wang, Yama Abassi, Josephine Atienza, Xiao Xu
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Patent number: 7732128Abstract: Methods and kits for detecting the presence of ATP, for measuring ATP concentrations, and for detecting viable cells using a composition comprising an ATP-dependent enzyme and one or more ATPase inhibitors.Type: GrantFiled: March 3, 2008Date of Patent: June 8, 2010Assignee: Promega CorporationInventors: Keith Wood, Rita Hannah, Richard A. Moravec
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Patent number: 7732129Abstract: The present invention addresses the need to improve the yields of viral vectors when grown in cell culture systems. In particular, it has been demonstrated that for adenovirus, the use of low-medium perfusion rates in an attached cell culture system provides for improved yields. In other embodiments, the inventors have shown that there is improved Ad-p53 production with cells grown in serum-free conditions, and in particular in serum-free suspension culture. Also important to the increase of yields is the use of detergent lysis. Combination of these aspects of the invention permits purification of virus by a single chromatography step that results in purified virus of the same quality as preparations from double CsCl banding using an ultracentrifuge.Type: GrantFiled: December 1, 1998Date of Patent: June 8, 2010Assignee: Crucell Holland B.V.Inventors: Shuyuan Zhang, Capucine Thwin, Zheng Wu, Toohyon Cho, Shawn Gallagher
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Patent number: 7732130Abstract: The present invention relates to an influenza antigen, comprising a fusion product of at least the extracellular part of a conserved influenza membrane protein or a functional fragment thereof and a presenting carrier, which may be a presenting (poly)peptide or a non-peptidic structure, such as glycans, peptide mimetics, synthetic polymers. The invention further relates to a vaccine against influenza, comprising at least an antigen of the invention, optionally in the presence of one or more excipients. The invention also relates to use of the antigen, a method for preparing the antigen and acceptor cells expressing the antigen.Type: GrantFiled: March 14, 2006Date of Patent: June 8, 2010Assignee: Vlaams Interuniversitair Instituut Voor BiotechnolgoieInventors: Sabine Neirynck, Willy Min Jou, Walter Fiers
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Patent number: 7732131Abstract: The present invention relates to the identification of 4Ig-B7-H3 protein as a tumor associated molecule that imparts protection from NK cell-mediated lysis via a 4Ig-B7-H3 receptor on NK cells. The invention provides compounds that interfere with interactions between the 4Ig-B7-H3 protein and its receptor that can be used to potentiate NK cell cytotoxicity. Also provided are compounds that bind 4Ig-B7-H3-expressing cells so as to inhibit or eliminate them. The compounds are particularly useful in the treatment of tumors, inflammatory conditions, infections and transplantation. Also provided are methods for diagnosing disease by detecting a 4Ig-B7-H3 protein.Type: GrantFiled: August 2, 2005Date of Patent: June 8, 2010Assignees: Innate Pharma S.A., University of GenovaInventors: Alessandro Moretta, Roberta Castriconi, Christina Bottino, Lorenzo Moretta
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Patent number: 7732132Abstract: The invention is an assay for detection of Watermelon silver mottle virus (WSMoV)-serogroup tospoviruses using a monoclonal antibody and a method for preparing the monoclonal antibody. A hybridoma cell line that produces a monoclonal antibody against the NSs proteins of WSMoV-serogroup tospoviruses was produced. The hybridoma cell line produces a monoclonal antibody binding with peptide SEQ ID No. 19.Type: GrantFiled: April 24, 2007Date of Patent: June 8, 2010Assignee: National Chung Hsing UniversityInventors: Ching-Wen Huang, Hei-Tu Hsu, Yan-Wen Kuo, Fang-Lin Liu, Chao-Hsiu Hsuan Yuan, Shyi-Dong Yeh, Tsung-Chi Chen
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Patent number: 7732133Abstract: In the case when there are two objective biological activities, and the aim is to isolate a compound having at least one biological activity, the present inventors developed an assay method wherein a common detection marker is utilized for separately detecting the presence or absence of each of the biological activities. The present inventors discovered that a compound having at least one of two or more distinct biological activities can be efficiently and conveniently detected by simultaneously assaying at least one test sample or more by the above-mentioned method. Furthermore, for a test sample that proved to be positive by the detection method, they found that it is possible to efficiently and conveniently screen for a test sample having an objective specific biological activity by combining with a method wherein an individual activity of a test sample can be detected to specify the biological activity.Type: GrantFiled: July 17, 2001Date of Patent: June 8, 2010Assignee: Chugai Seiyaku Kabushiki KaishaInventors: Naohiro Yabuta, Hideki Adachi, Yasushi Shimonaka, Kunihiro Hattori
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Patent number: 7732134Abstract: This invention provides methods to predict the degree of elevation of serum cholesterol levels in patients treated with immunosuppressive medication. This invention also provides treatment strategies based on these predictions and kits to carry out these methods.Type: GrantFiled: September 29, 2003Date of Patent: June 8, 2010Assignee: Novartis AGInventors: Sridhar Kudaravalli, Mihael Hristos Polymeropoulos, Rosarelis Torres, Curt Douglas Wolfgang
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Patent number: 7732135Abstract: A genetic marker of food allergy is disclosed. The marker comprises variants of IL-4 receptor alpha, IL13 and CD14.Type: GrantFiled: August 5, 2004Date of Patent: June 8, 2010Inventors: Gurjit K. Khurana Hershey, Amal Assa'ad, Ranajit Chakraborty
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Patent number: 7732136Abstract: The present invention concerns a device for amplifying target nucleic acids, reaction cartridges for use in the device, and modes of use of the device.Type: GrantFiled: August 25, 2004Date of Patent: June 8, 2010Assignee: Pall GenesystemsInventor: Gabriel Festoc
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Patent number: 7732137Abstract: The invention relates to methods to select animals, such as mammals, particularly domestic animals, such as breeding animals or animals destined for slaughter, for having desired genotypic or potential phenotypic properties, in particular, related to muscle mass and/or fat deposition lean meat, lean back fat, sow prolificacy and/or sow longevity. Provided is a method for selecting an animal for having desired genotypic or potential phenotypic properties comprising testing the animal, a parent of the animal or its progeny for the presence of a nucleic acid modification affecting the activity of an evolutionary conserved CpG island, located in intron 3 of an IGF2 gene and/or for the presence of a nucleic acid modification affecting binding of a nuclear factor to an IGF2 gene.Type: GrantFiled: February 17, 2006Date of Patent: June 8, 2010Assignees: University of Liege, Melica HB, Gentec N.V.Inventors: Leif Andersson, Goran Andersson, Michel Georges, Nadine Buys
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Patent number: 7732138Abstract: The present invention discloses the use of Allele-Specific-Oligonucleotide (ASO) as a detection assay for human HLA classification. Using Reversed-Dot-Blotting format and flow through hybridization process, more efficient, faster and less expensive HLA classification can be achieved. A simplified procedure for HLA genotyping is also described. This invention further provides a Single Nucleotide Polymorphism (SNP)-based DNA fingerprining method for rapid and accurate genotyping, identification as well as DNA analyses of genetic data from human beings and different organisms. In addition this invention also discloses a new device for rapid and sensitive analyses of nucleic acids, proteins and other analysts for diagnosis.Type: GrantFiled: April 4, 2006Date of Patent: June 8, 2010Assignee: DiagCor Bioscience Incorporation LimitedInventor: Joseph Wing On Tam