Abstract: Methods of semiconductor device fabrication are disclosed. An exemplary method includes processes of depositing a first pattern on a semiconductor substrate, wherein the first pattern defines wide and narrow spaces; depositing spacer material over the first pattern on the substrate; etching the spacer material such that the spacer material is removed from horizontal surfaces of the substrate and the first pattern but remains adjacent to vertical surfaces of a wide space defined by the first pattern and remains within narrow a space defined by the first pattern; and removing the first pattern from the substrate. In one embodiment, the first pattern can comprise sacrificial material, which can include, for example, polysilicon material. The deposition can comprise physical vapor deposition, chemical vapor deposition, electrochemical deposition, molecular beam epitaxy, atomic layer deposition or other deposition techniques.

Abstract: The invention defines a pillar pattern or an island pattern by forming a contact hole and filling the contact hole with a hard mask material by using a spacer formation process, so that the mask pattern formation process margin for island (e.g., pillar) pattern formation is increased. Accordingly, the yield and reliability of the formation process of a semiconductor device are improved.

Abstract: Methods for deposition of silicon carbide films on a substrate surface are provided. The methods include the use of vapor phase carbosilane precursors and may employ plasma enhanced atomic layer deposition processes. The methods may be carried out at temperatures less than 600° C., for example between about 23° C. and about 200° C. or at about 100° C. This silicon carbide layer may then be densified to remove hydrogen content. Additionally, the silicon carbide layer may be exposed to a nitrogen source to provide reactive N—H groups, which can then be used to continue film deposition using other methods. Plasma processing conditions can be used to adjust the carbon, hydrogen and/or nitrogen content of the films.

Abstract: A Si etching method includes: arranging a silicon substrate or a substrate having a silicon layer in a processing chamber; generating a plasma of an etching gas in the processing chamber; and etching the silicon substrate by the plasma. The etching gas is a gaseous mixture including a Br2 gas and one of a Cl2 gas and a chloride gas. The chloride gas has a mass that is higher than that of the Cl2 gas.

Abstract: A method is provided for processing a wafer used in fabricating semiconductor devices. The method can comprise forming high-aspect ratio features on the wafer, which is followed by wet processing and drying. During drying, pattern collapse can occur. This pattern collapse can be repaired to allow for additional processing of the wafer. In some instance, pattern collapse can be repaired via etching where the etching breaks bonds that can have formed during pattern collapse.

Abstract: A method for ashing hardened resist from a photoresist patterned chromium alloy post etch using a plasma ashing chemistry which contains no gaseous source of hydrogen and contains a gaseous source of oxygen and a gaseous source of nitrogen with an oxygen to nitrogen atomic ratio of at least 5.

Abstract: A method includes: forming an device isolation region in a substrate to divide the device isolation region into first and second diffusion regions; forming a target film on the substrate; forming a hard mask layer and a first resist layer on the film; forming a first pattern on the first resist layer; etching the hard mask layer by using the first pattern as a mask; forming a second resist layer on the hard mask layer; forming a second pattern including a first space on the second resist layer for isolating the first pattern; forming a third pattern including a second space shrunk from the first space on the hard mask layer by carrying out size conversion etching by using the second pattern formed on the second resist layer as a mask; and etching the film to be processed by using the third pattern formed on the hard mask layer.

Abstract: A method for patterning a material is provided. The method includes patterning a second material over a first material over a substrate. A surface portion of the patterned second material is converted to form a third material and a remaining patterned second material, wherein the third material is around the remaining patterned second material. One of the remaining patterned second material and the third material is removed to form a mask. The first material is patterned by using the mask.

Abstract: To provide a reliable, efficient method for reducing oxidized metals used upon manufacturing of the multilayer interconnection structure, semiconductor device, etc. With this method vapor containing at least a carboxylic acid ester is hydrolyzed by water vapor to reduce oxidized metal. The multilayer interconnection manufacturing method of the present invention includes at least film formation step, interconnection formation step, and reduction step using the metal reduction method of the present invention. The multilayer interconnection structure of the present invention is manufactured by the multilayer interconnection structure manufacturing method of the present invention. The semiconductor device manufacturing method of the present invention includes at least film formation step, patterning step, interconnection formation step, and reduction step using the metal reduction method.

Abstract: A method for amorphizing a layer on a substrate is described. In one embodiment, the method includes treating the substrate with a first gas cluster ion beam (GCIB) using a first beam energy selected to yield an amorphous sub-layer within the substrate of a desired thickness, which produces a first interfacial roughness of an amorphous-crystal interface between the amorphous sub-layer and a crystalline sub-layer of the substrate. The method further includes treating the substrate with a second GCIB using a second beam energy, less than the first beam energy, to reduce the first interfacial roughness of the amorphous-crystal interface to a second interfacial roughness.

Abstract: Patterning-induced damage of sensitive low-k dielectric materials in semiconductors devices may be restored to a certain degree on the basis of a surface treatment that is performed prior to exposing the device to ambient atmosphere. To this end, the dangling silicon bonds of the silicon oxide-based low-k dielectric material may be saturated in a confined process environment, thereby providing superior surface conditions for the subsequent application of an appropriate repair chemistry.

Abstract: A method for fabricating a silicon nitride gap-filling layer is provided. A pre-multi-step formation process is performed to form a stacked layer constituting as a dense film on a substrate. Then, a post-single step deposition process is conducted to form a cap layer constituting as a sparse film on the stacked layer, wherein the cap layer has a thickness of at least 10% of the total film thickness.

Abstract: The disclosed systems and method for non-periodic pulse sequential lateral solidification relate to processing a thin film. The method for processing a thin film, while advancing a thin film in a selected direction, includes irradiating a first region of the thin film with a first laser pulse and a second laser pulse and irradiating a second region of the thin film with a third laser pulse and a fourth laser pulse, wherein the time interval between the first laser pulse and the second laser pulse is less than half the time interval between the first laser pulse and the third laser pulse. In some embodiments, each pulse provides a shaped beam and has a fluence that is sufficient to melt the thin film throughout its thickness to form molten zones that laterally crystallize upon cooling. In some embodiments, the first and second regions are adjacent to each other. In some embodiments, the first and second regions are spaced a distance apart.

Abstract: A filler cloth includes cellulosic fibers treated with a flame retardant chemistry such that the filler cloth has a char length of less than about nine inches when tested in accordance with NFPA 701, such that thermal shrinkage of the filler cloth at 400° F. is less than about 35% in any direction, and such that the filler cloth maintains flame and heat resistant integrity when impinged with a gas flame in accordance with testing protocols set forth in Technical Bulletin 603 of the State of California Department of Consumer Affairs. The filler cloth cellulosic fibers are treated with a flame retardant chemistry such that the filler cloth has a Frazier air permeability of less than about 400 cfm and a thermal resistance rating of at least about 3 when tested according to NFPA 2112.

Abstract: A blue colored, infrared and ultraviolet absorbing glass composition uses a standard soda-lime-silica glass base composition and additionally iron, cobalt, and additional colorants selected from the group of Er2O3, Cr2O3, CuO, NiO, TiO2, Nd2O3 and combinations thereof. The glass of the present invention has a luminous transmittance of up to 60 percent, a dominant wavelength in the range of 480 to 489 nanometers and an excitation purity of at least 8 percent at a thickness of 0.160 inches (4.06 millimeters). The glass composition can form transparent glass panels that have varying limited LTA from one another as panel sets for mounting in automobiles.

Abstract: Provided herein are methods and apparatus to remove unwanted elements in commercial powders, and particularly in commercial powders that include one or more of a crystalline ceramic oxide. The methods involve treating powders in reduced pressure atmosphere, such as a vacuum, with or without heating, for a period of time sufficient to remove impurities. Impurities and contaminants, including anionic species, are removed from the powders without any undesirable changes in the physical characteristics of the starting material, such as particle size and particle size distribution, surface area, and volume, for example. The resulting purified powder starting material can be consolidated without the need for any sintering aids such as LiF to produce nearly colorless, extremely transparent polycrystalline articles that approach identical properties and performance of single crystal spinels.

Abstract: A method and apparatus is provided for regenerating a sorbent that has been poisoned by components derived from flue gas. The sorbent is treated with an agent to remove the poisoning components and introduce a promoting agent into the sorbent. The method and apparatus can also be used to enhance the effectiveness of a new sorbent.

Abstract: A batch composition for making a highly porous honeycomb ceramic catalytic filter article, including base inorganic components including a mixture of a nano-zeolite powder, and an inorganic filler, in amounts defined herein; and super additives including: a mixture of at least two pore formers; a binder; and a metal salt, in amounts defined herein. Also disclosed are extruded catalyst filter articles and methods for making the articles.

Abstract: The present invention relates to a method of producing a web substrate comprising an activatable colorant and at least one region comprising a topical additive. The web substrate is exposed to a first external stimulus producing a first activated color region. The first activated color region is subsequently exposed to a second external stimulus producing a second activated color region within the first activated color region. The second external stimulus is induced by application of the topical additive such that the second activated color region coincides with the topical additive region.

Abstract: A dye resin ink application process using flexographic printing, flood coating, tinting, or other suitable technique or process to add a color layer on top of a thermal ink layer of a material. The color layer provides a background color, such that upon application of the heat source, the thermal image appears as being imaged onto the background color. The process can be used to make heat-sensitive direct thermal labels or thermal paper rolls, including cash register-type rolls, poster printer format rolls, etc. The process permits thermal-inked material to be produced in various colors in relatively small print runs using conventional equipment.

Abstract: This invention provides an azomethine compound that can realize a good coupling reaction and, at the same time, can significantly reduce the production cost of the azomethine compound, the azomethine compound comprising a pyridine ring bonded through a nitrogen atom to a 1H-pyrazolo[1,5-b][1,2,4]triazole ring. The azomethine compound is represented by formula (M-I): wherein R1 represents a phenyl group or a naphthyl group optionally substituted by an alkyl group or a halogen; and R2 and R3 each independently represent a C2-4 (number of carbon atoms) alkyl group.

Abstract: A method for controlling asian soybean rust comprising (?) applying a pesticidal composition (A) to a glyphosate tolerant soybean plant propagation material, and (?) applying a pesticidal composition (B) to the resulting soybean plant, part of plant and/or the locus thereof one or more times: i) before emergence, ii) after emergence, or iii) both (i) and (ii), provided that composition (A) comprises one or more of flutriafol, triticonazole, tebuconazole, ipconazole, epoxyconazole, orysastrobin, prothioconazole fluoxastrobin, azoxystrobin, furametpyr, cyproconazole, a compound of formula (I) and a compound of formula (B), and pesticide composition (B) comprises glyphosate; wherein compound (I) is represented by or a tautomer of such a compound, and compound (B) is represented by formula or a tautomer of such a compound.

Abstract: A composition comprising at least a compound (a) of general formula (I): and a fungicide compound (b) in a (a)/(b) weight ratio of from 1/1 to 1/1014. A method for preventively or curatively combating the pests and diseases of crops and increasing their yield by using this composition.

Abstract: The present invention is directed to the treatment of a plant at the flowering or fruiting stage with an effective amount of abscisic acid, its analogs or derivatives and salts thereof to reduce the number of fruits that the plant sets and grows to maturity.

Abstract: A high strength herbicidal composition including water; glyphosate, predominantly in the form of a combination of triethanolamine salt and potassium salt in solution in the water in an amount of about 350 grams or greater of acid equivalent per liter of the composition wherein the composition is formulated to include triethanolamine in an amount to form a salt with about 10% or greater, by weight, of total glyphosate and to include potassium in an amount to form a salt with a percentage of total glyphosate so that the combined sum of glyphosate in triethanolamine and potassium salts is more than 50% of total glyphosate; and optionally, one or more surfactants and/or one or more humectants.

Abstract: Substituted pyridines of the formula I in which the variables are defined according to the description, processes and intermediates for preparing the compounds of the formula I and their N-oxides, their agriculturally suitable salts, compositions comprising them and their use as herbicides, and also methods for controlling unwanted vegetation.

Abstract: Fungicidal compounds of the general formula (I), wherein the substituents are as defined in claim 1.

Abstract: An embodiment of the present invention comprises a method of cementing comprising: placing a settable composition into a well bore, the settable composition comprising unexpanded perlite, cement kiln dust, and water; and allowing the settable composition to set. Another embodiment of the present invention comprises a method of cementing comprising: placing a settable composition into a well bore, the settable composition comprising ground unexpanded perlite, Portland cement interground with pumicite, and water; and allowing the settable composition to set. Yet another embodiment of the present invention comprises a settable composition comprising: ground unexpanded perlite; cement kiln dust; and water.

Abstract: The present invention concerns a high-temperature lubricant for the hot shaping of high-grade and carbon steels, which has a content of graphite, organic blowing agent and inorganic separation agent, and the use thereof.

Abstract: An environmentally-friendly cleaning composition for industrial and consumer applications comprising (a) a blend of dibasic esters, (b) one or more surfactants (c) and, optionally, (d) water or a solvent. The dibasic esters are be derived from a blend of adipic, glutaric, and succinic diacids, and, in one particular embodiment, the blend comprises dialkyl adipate, dialkyl methylglutarate and dialkyl ethylsuccinate, wherein the alkyl groups individually comprise a C1-C12 hydrocarbon group. The one or more surfactants are typically chosen from alcohol alkoxylate, an alkyl phenol ethoxylate, a terpene, a terpene alkoxylate or any derivates thereof. Optionally, additional components or additives including delaminates such as pinene and d-limonene, fragrances, whiteners, stabilizers, thickeners and the like can be added to the composition.

Abstract: A composition comprising one or more water soluble organic solvents comprising a glycol ether; water; a fluoride containing compound provided that if the fluoride containing compound is ammonium fluoride than no additional fluoride containing compound is added to the composition; optionally a quaternary ammonium compound; and optionally a corrosion inhibitor is disclosed herein that is capable of removing residues from an article such as photoresist and/or etching residue. Also disclosed herein is a method for removing residues from an article using the composition disclosed herein.

Abstract: An array of self-adhesive cleaning products, the array having a first self-adhesive cleaning product, the product being a gel, and a second self-adhesive cleaning product, the second product being a solid.

Abstract: A mixed powder or mixed granule for use in detergent formulations for machine dishwashing contains the following components: a) from 10 to 95% by weight of a copolymer of a1) from 50 to 93 mol % of acrylic acid and/or of a water-soluble salt of acrylic acid, a2) from 5 to 30 mol % of methacrylic acid and/or of a water-soluble salt of methacrylic acid, and a3) from 2 to 20 mol % of at least one nonionic monomer, wherein monomers a1) to a3) are copolymerized in a random or block manner, b) from 5 to 80% by weight of a complexing agent selected from the group consisting of a glycine-N,N-diacetic acid derivative and glutamic acid N,N-diacetic acid and salts thereof, c) from 0 to 20% by weight of a polyethylene glycol, of a nonionic surfactant or of a mixture thereof.

Abstract: The present invention relates to a liquid, cleaning and/or cleansing composition comprising abrasive cleaning particles, wherein said abrasive cleaning particles comprise a divinyl benzene cross-linked styrene polymer, wherein said abrasive cleaning particles are non-spherical and have a mean particles size D(v,0.9) of at least about 10 ?m and wherein said liquid, cleaning and/or cleansing composition comprises from about 0% to about 30% by weight of the composition of an organic solvent.

Abstract: The present invention relates to a liquid, cleaning and/or cleansing composition comprising biodegradable abrasive cleaning particles.

Abstract: A liquid hard surface cleaning composition comprising melamine foam fibers and a formaldehyde scavenger. The liquid hard surface cleaning composition comprises melamine foam fibers that comprise less than about 100 ppm of formaldehyde in solution after 7 days of storage at 50° C. A process of cleaning a hard surface using a liquid hard surface cleaning composition that comprises melamine foam fibers and a formaldehyde scavenger. The use of a formaldehyde scavenger in a liquid hard surface cleaning composition comprising melamine foam fibers, to provide a liquid hard surface cleaning composition showing no or low levels of formaldehyde generation upon storage of the composition over prolonged periods of time.

Abstract: The proposed process of the present application passes a concentrated surfactant in a lamellar phase though a high-shear device diluting the concentrated surfactant in a lamellar phase to an isotropic phase without encountering the highly viscous middle phase.

Abstract: A cleansing product suitable for making the cleaning of both inanimate and animate surfaces more fun and effective for children is disclosed. Specifically, the cleansing product is capable of expanding in volume under certain temperature conditions, and in some embodiments, can additionally include a coloring agent, providing a color change to indicate when sufficient cleansing has been performed.

Abstract: [Problem] To provide detergent compositions with superior surfactant deposition-inhibiting ability and anti-gelling properties that exhibit good cleaning effectiveness even when laundering under harsh conditions such as laundering in residual bath water. [Solution] A laundry detergent or cleaning composition which comprises a copolymer containing sulfonate groups containing from 1 to 50 mass percent of structural units (a) derived from 1 or more kinds of monomers (A) selected from ether bond-containing monomers represented by Formulas (1) and (2), 50 mass % or more and less than 98 mass % of structural units (b) derived from a carboxyl group-containing monomer (B), and 1 mass % or more and less than 50 mass % of structural units (c) de-rived from a sulfonate group-containing monomer (C).

Abstract: The invention relates, in particular to a tetrahydropyran(on) compound which is substituted in position beta with respect to a cycle oxygen of formula (I), wherein a substituent R is a linear alkyl radical in C2:C10 including, (CH3)2CH— or C6H5—(CH2)m—, with m=0 or 1, or formula (II), wherein A is —CH2— or —CO—, in the form of an odorant and to a method for the synthesis thereof by reducing oxo-ester. The use of the inventive compound in composition such as perfumery compositions in the ordinary sense of the term i.e. topic, in particular cosmetic compositions and care products.

Abstract: The invention relates to nucleic acid molecules encoding peptides which are directed against autoantibodies associated with cold allergy, to the peptides themselves, to a pharmaceutical composition comprising said nucleic acid molecules and peptides, and to the use of said nucleic acid molecules and peptides for the treatment of circulatory disorders associated with exposure to cold or intolerance to cold, especially cold allergies.

Abstract: The present invention relates to compounds and pharmaceutical compositions for treating cellular proliferative disorders, e.g., in patients having one or more p53-deficient cells, screening assays for identifying such compounds, and methods for treating such disorders.

Abstract: The present invention relates to novel analogues of neuropeptide Y, pharmaceutical compositions containing the same, pharmaceutical formulations containing the same, and method of treating diseases or conditions mediated by neuropeptide Y-receptor binding. More particularly, the present invention relates to novel analogues of neuropeptide Y having at least one unnatural amino acid substitution, such as 4Hyp at position 34 , that selectively bind to the neuropeptide Y1 receptor subtype compared to the neuropeptide Y2 receptor subtype.

Abstract: The present invention relates to the use of nifurtimox for the treatment of giardiosis, in particular in dogs and cats.

Abstract: The present invention relates to the use of nifurtimox for the treatment of diseases caused by trichomonads, such as, for example, histomoniasis, in particular in turkeys.

Abstract: This invention is an improved process to formulate polymeric microspheres/nanospheres and encapsulate therapeutic proteins or other useful substances, and a polymer sphere apparatus. The invention is also methods of purifying protein-containing-polymeric-microspheres from unused polymer, and an apparatus therefore.

Abstract: A cosmetic or pharmaceutical composition, and in particular a dermatological one, including, in a physiologically adapted medium, active principles capable of activating aconitase, and methods of using the composition for protection of mitochondria, the skin and the appendages from external aggressions and to combat cutaneous aging. These active principles may be composed of polypeptides or of peptides, used alone or in association with at least one other active principle.

Abstract: The present invention provides a method comprising administering to a patient suffering from an endocrine disorder characterized by partial endogenous growth hormone activity or signaling an amount of insulin-like growth factor-1 (IGF-1) and an amount of growth hormone (GH) that in combination are effective to improve growth or metabolism in the patient, where the patient receives IGF-1 in a single daily administration and receives GH in a single daily administration, and where the single administrations are administered to the patient substantially contemporaneously each day.

Abstract: This invention relates to methods for treating chronic dermal ulcers using hyperbaric treatment in combination with progenitor cells and chemokine homing factors. Specifically, the invention relates to treatment of chronic wounds resulting from diabetes mellitus using compositions comprising EPC and SDF-1A, under hyperbaric condition to accelerate wound healing.

Abstract: The present invention relates to a novel composition comprising an implant, scaffold or construct bound to a biological or chemical moiety. The bound moiety has the ability to bind to a component of the extracellular matrix of biological tissue, allowing the implant to be bound to the biological tissue in a short period of time after implantation. The invention also relates to the use and manufacture of this novel composition, as well as a novel use for the protein CNA.