Patents Issued in January 28, 2014
  • Patent number: 8637392
    Abstract: A solder interconnect structure is provided with non-wettable sidewalls and methods of manufacturing the same. The method includes forming a nickel or nickel alloy pillar on an underlying surface. The method further includes modifying the sidewall of the nickel or nickel alloy pillar to prevent solder wetting on the sidewall.
    Type: Grant
    Filed: February 5, 2010
    Date of Patent: January 28, 2014
    Assignee: International Business Machines Corporation
    Inventors: Charles L. Arvin, Raschid J. Bezama, Timothy H. Daubenspeck, Jeffrey P. Gambino, Christopher D. Muzzy, David L. Questad, Wolfgang Sauter, Timothy D. Sullivan, Brian R. Sundlof
  • Patent number: 8637393
    Abstract: A surface is placed into a deposition chamber. A tin layer is formed on the surface, in which forming the tin layer includes providing a precursor into the deposition chamber for a first time period, wherein the precursor comprises one of tetrakis (dimethylamino) tin (TDMASn) or tin tetrachloride (SnCl4), providing an inert gas into the deposition chamber for a second time period, providing a hydrogen reactant into the deposition chamber for a third time period, and providing the inert gas into the deposition chamber for a fourth time period. The first, second, third, and fourth time periods form one atomic layer deposition (ALD) cycle. The surface may be an exposed surface of a lead free metal.
    Type: Grant
    Filed: October 26, 2012
    Date of Patent: January 28, 2014
    Assignee: Freescale Semiconductor, Inc.
    Inventor: Rama I. Hegde
  • Patent number: 8637394
    Abstract: An integrated circuit package system includes: forming a flex bump over an integrated circuit device structure, the flex bump having both a base portion and an offset portion over the base portion; forming a first ball bond of a first internal interconnect over the offset portion; and encapsulating the integrated circuit device structure, the flex bump, and the first internal interconnect.
    Type: Grant
    Filed: July 5, 2007
    Date of Patent: January 28, 2014
    Assignee: STATS ChipPAC Ltd.
    Inventors: Jairus Legaspi Pisigan, Henry Descalzo Bathan, Arnel Trasporto, Jeffrey D. Punzalan
  • Patent number: 8637395
    Abstract: A single damascene or dual damascene interconnect structure fabricated with a photo-patternable low-k dielectric (PPLK) which is cured after etching. This method prevents the PPLK damage and the tapering of the edges of the interconnect structure. In one embodiment, the method of the present invention includes depositing a photo-patternable low-k (PPLK) material atop a substrate. The at least one PPLK material is patterned, creating a single damascene structure. For dual damascene structures, a second PPLK layer is coated and patterned. An etch process is performed to transfer the pattern from the PPLK material into at least a portion of the substrate. A diffusion liner and a conductive material can be deposited after the etch process. The resulting structure is cured anytime after etching in order to transform the resist like PPLK into a permanent low-k material that remains within the structure.
    Type: Grant
    Filed: November 16, 2009
    Date of Patent: January 28, 2014
    Assignee: International Business Machines Corporation
    Inventors: Maxime Darnon, Qinghuang Lin
  • Patent number: 8637396
    Abstract: A method is provided for depositing a dielectric barrier film including a precursor with silicon, carbon, oxygen, and hydrogen with improved barrier dielectric properties including lower dielectric constant and superior electrical properties. This method will be important for barrier layers used in a damascene or dual damascene integration for interconnect structures or in other dielectric barrier applications. In this example, specific structural properties are noted that improve the barrier performance.
    Type: Grant
    Filed: November 23, 2009
    Date of Patent: January 28, 2014
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Laura M. Matz, Raymond Nicholas Vrtis, Mark Leonard O'Neill, Dino Sinatore
  • Patent number: 8637397
    Abstract: To provide a method of manufacturing a through hole electrode substrate which comprises forming a plurality of through holes passing through the front and back of a wafer-shaped substrate, forming an insulation film on a surface of the substrate and the though hole, forming a seed layer from a metal on at least one side of the substrate and/or the through hole, forming a metal layer having a cap shape on a bottom part of the through hole on a surface on which the seed layer is formed by an electrolytic plating method supplying direct current to the seed layer for a first time period, and filling a metal material into the plurality of through holes by an electrolytic plating method supplying a pulse current to the seed layer and the metal layer.
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: January 28, 2014
    Assignee: Dai Nippon Printing Co., Ltd
    Inventors: Shinji Maekawa, Myuki Suzuki
  • Patent number: 8637399
    Abstract: An etching composition for a copper-containing layer includes about 0.1% to about 30% by weight of ammonium persulfate, about 0.1% to about 10% by weight of a sulfate, about 0.01% to about 5% by weight of an acetate and about 55% to about 99.79% by weight of water. The etching composition having improved stability during storage and an increased capacity for etching.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: January 28, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hong-Sick Park, Bong-Kyun Kim, Wang-Woo Lee, Ki-Beom Lee, Sam-Young Cho, Won-Guk Seo, Gyu-Po Kim
  • Patent number: 8637400
    Abstract: A method of forming a semiconductor structure includes forming a sacrificial conductive material layer. The method also includes forming a trench in the sacrificial conductive material layer. The method further includes forming a conductive feature in the trench. The method additionally includes removing the sacrificial conductive material layer selective to the conductive feature. The method also includes forming an insulating layer around the conductive feature to embed the conductive feature in the insulating layer.
    Type: Grant
    Filed: June 21, 2011
    Date of Patent: January 28, 2014
    Assignee: International Business Machines Corporation
    Inventors: David V. Horak, Charles W. Koburger, Shom Ponoth, Chih-Chao Yang
  • Patent number: 8637401
    Abstract: A method is explained that allows for a via to be filled with a dispensed material while the substrate is in continuous movement. A device is described that allows for a via to be filled while the target substrate is in continuous movement. The device consists of a material jetting system, a machine vision system that can detect the optimum trigger point, an electronic control circuit, a feedback mechanism and a web handling provision.
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: January 28, 2014
    Inventors: Anthony Nicholas Brady Garvan, III, Christoph Erben, Darren Lochun
  • Patent number: 8637402
    Abstract: The conductive line structure of a semiconductor device including a base; at least one patterned conductive layer formed over the base; a conductive line formed over the at least one patterned conductive layer; a protection layer that encompasses the top surface and sidewall of the conductive line to prevent undercut generated by etching. The structure further comprises an underlying layer under the conductive line. The underlying layer includes Ni, Cu or Pt. The conductive line includes gold or copper. The at least one patterned conductive layer includes at least Ti/Cu. The protection layer includes electro-less plating Sn, Au, Ag or Ni.
    Type: Grant
    Filed: December 5, 2011
    Date of Patent: January 28, 2014
    Assignee: ADL Engineering Inc.
    Inventors: Yu-Shan Hu, Ming-Chih Chen, Dyi-Chung Hu
  • Patent number: 8637403
    Abstract: A method of manufacturing a semiconductor structure includes varying local chemical mechanical polishing (CMP) abrading rates of an insulator film by selectively varying a carbon content of the insulator film.
    Type: Grant
    Filed: December 12, 2011
    Date of Patent: January 28, 2014
    Assignee: International Business Machines Corporation
    Inventors: Yoba Amoah, Graham M. Bates, Joseph P. Hasselbach, Thomas L. McDevitt, Eva A. Shah
  • Patent number: 8637404
    Abstract: The invention provides methods for planarizing or polishing a metal surface. The method comprises a composition comprising an abrasive, cesium ions, and a liquid carrier comprising water.
    Type: Grant
    Filed: November 23, 2010
    Date of Patent: January 28, 2014
    Assignee: Cabot Microelectronics Corporation
    Inventors: Phillip W. Carter, Shoutian Li
  • Patent number: 8637405
    Abstract: A method of texturing a surface of a crystalline silicon substrate is provided. The method includes immersing a crystalline silicon substrate into an aqueous alkaline etchant solution to form a pyramid shaped textured surface, with (111) faces exposed, on the crystalline silicon substrate. The aqueous alkaline etchant solution employed in the method of the present disclosure includes an alkaline component and a nanoparticle slurry component. Specifically, the aqueous alkaline etchant solution of the present disclosure includes 0.5 weight percent to 5 weight percent of an alkaline component and from 0.1 weight percent to 5 weight percent of a nanoparticle slurry on a dry basis.
    Type: Grant
    Filed: June 21, 2011
    Date of Patent: January 28, 2014
    Assignee: International Business Machines Corporation
    Inventors: Mahadevaiyer Krishnan, Jun Liu, Satyavolu S. Papa Rao, George G. Totir
  • Patent number: 8637406
    Abstract: At least one mask layer formed over a substrate includes at least one of a dielectric material and a metallic material. By forming a first pattern in one of the at least one mask layer, a patterned mask layer including said first pattern is formed. An overlying structure including a second pattern that includes at least one blocking area is formed over said patterned mask layer. Portions of said patterned mask layer that do not underlie said blocking area are removed. The remaining portions of the patterned mask layer include a composite pattern that is an intersection of the first pattern and the second pattern. The patterned mask layer includes a dielectric material or a metallic material, and thus, enables high fidelity pattern transfer into an underlying material layer.
    Type: Grant
    Filed: July 19, 2012
    Date of Patent: January 28, 2014
    Assignee: International Business Machines Corporation
    Inventors: Ryan O. Jung, Sivananda K. Kanakasabapathy, Yunpeng Yin
  • Patent number: 8637407
    Abstract: Methods of forming a semiconductor device may include providing a feature layer having a first region and a second region. The methods may also include forming a dual mask layer on the feature layer. The methods may further include forming a variable mask layer on the dual mask layer. The methods may additionally include forming a first structure on the feature layer in the first region and a second structure on the feature layer in the second region by patterning the variable mask layer and the dual mask layer. The methods may also include forming a first spacer on a sidewall of the first structure and a second spacer on a sidewall of the second structure. The methods may further include removing the first structure while maintaining at least a portion of the second structure.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: January 28, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jae-Ho Min, O-Ik Kwon, Bum-Soo Kim, Dong-chan Kim, Myeong-cheol Kim
  • Patent number: 8637408
    Abstract: Apparatus and methods are provided for efficiently reclaiming solvents used to clean surfaces of semiconductor wafers, etc. More particularly, embodiments of the present invention provide an in-situ reclaim approach that utilizes condensing mechanisms to reclaim evaporated solvent components. In these embodiments, the condensing can occur within a proximity head itself and/or along a vacuum line running from the proximity head to a vacuum tank. Other embodiments of the present invention provide an in-situ reclaim approach that prevents the evaporation of solvents at the onset by maintaining appropriate equilibrium gas phase concentrations between the liquid chemistries and gases used to process wafer surfaces.
    Type: Grant
    Filed: October 4, 2012
    Date of Patent: January 28, 2014
    Assignee: Lam Research Corporation
    Inventor: Robert O'Donnell
  • Patent number: 8637409
    Abstract: An etching method includes: applying a radiation to an etching aqueous solution; and etching a material to be etched by using the etching aqueous solution irradiated with the radiation.
    Type: Grant
    Filed: February 17, 2012
    Date of Patent: January 28, 2014
    Assignee: Fujitsu Limited
    Inventors: Shirou Ozaki, Masayuki Takeda
  • Patent number: 8637410
    Abstract: Methods for formation and treatment of pure metal layers using CVD and ALD techniques are provided. In one or more embodiments, the method includes forming a metal precursor layer and treating the metal precursor layer to a hydrogen plasma to reduce the metal precursor layer to form a metal layer. In one or more embodiments, treating the metal precursor layer includes exposing the metal precursor layer to a high frequency-generated hydrogen plasma. Methods of preventing a hydrogen plasma from penetrating a metal precursor layer are also provided.
    Type: Grant
    Filed: April 8, 2011
    Date of Patent: January 28, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Anantha K. Subramani, John C. Forster, Seshadri Ganguli, Michael S. Jackson, Xinliang Lu, Wei W. Wang, Xinyu Fu, Yu Lei
  • Patent number: 8637411
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: January 28, 2014
    Assignee: Novellus Systems, Inc.
    Inventors: Shankar Swaminathan, Jon Henri, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan, Kirthi K. Kattige, Bart J. van Schravendijk, Andrew J. McKerrow
  • Patent number: 8637412
    Abstract: A first PECVD process incorporating a silicon oxide precursor alone and then with an organo-silicon precursor with increasing flow while the flow of the silicon oxide precursor is reduced to zero provides a graded carbon adhesion layer whereby the content of C increases with layer thickness and a second PECVD process incorporating an organo-silicon precursor including an organic porogen provides a multiphase ultra-low k dielectric. The multiphase ultra-low k PECVD process uses high frequency radio frequency power just above plasma initiation in a PECVD chamber. An energy post treatment is also provided. A porous SiCOH dielectric material having a k less than 2.7 and a modulus of elasticity greater than 7 GPa is formed.
    Type: Grant
    Filed: August 19, 2011
    Date of Patent: January 28, 2014
    Assignee: International Business Machines Corporation
    Inventors: Alfred Grill, Thomas Jasper Haigh, Jr., Kelly Malone, Son Van Nguyen, Vishnubhai Vitthalbhai Patel, Hosadurga Shobha
  • Patent number: 8637413
    Abstract: A nonvolatile resistive memory element has a novel variable resistance layer that is passivated with non-metallic dopant atoms, such as nitrogen, either during or after deposition of the switching layer. The presence of the non-metallic dopant atoms in the variable resistance layer enables the switching layer to operate with reduced switching current while maintaining improved data retention properties.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: January 28, 2014
    Assignees: Sandisk 3D LLC, Kabushiki Kaisha Toshiba
    Inventors: Charlene Chen, Dipankar Pramanik
  • Patent number: 8637414
    Abstract: A gradient density padding material includes a single layer of nonwoven material having at least one surface processed to form a portion of a thickness thereof having a density increased with respect to a remaining portion of the thickness thereof. The single layer of nonwoven material after processing has an airflow resistance within the range of 200-4000 MKS Rayls, wherein said single layer of nonwoven material has an enhanced acoustic performance. A method of making a gradient density padding material having an enhanced acoustic performance includes the steps of providing a single layer of nonwoven material and processing at least one surface of the single layer of nonwoven material to form a portion of a thickness thereof having a density increased with respect to a remaining portion of the thickness thereof. The single layer of nonwoven material after processing has an airflow resistance within the range of 200-4000 MKS Rayls.
    Type: Grant
    Filed: April 22, 2003
    Date of Patent: January 28, 2014
    Assignee: Lydall, Inc.
    Inventors: Durward Gomez, Steven Borchardt
  • Patent number: 8637415
    Abstract: The present invention provides a fluorophosphate glass containing 30 to 50 cationic % of a phosphorus ingredient in terms of P5+, the glass having, in a nuclear magnetic resonance spectrum, a resonance spectrum which is generated near a reference frequency of 31P and has a shape of Gaussian function. The glass of the invention is reduced in volatility and erosiveness.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: January 28, 2014
    Assignee: Hoya Corporation
    Inventor: Mikio Ikenishi
  • Patent number: 8637416
    Abstract: There is provided a zeolite membrane which is thinner than a conventional membrane and which has improved permeability and a method for manufacturing the zeolite membrane. The method includes a surface layer forming step for forming a surface layer by attaching a low polar polymer on a first surface of a porous substrate to cover the surface, a filling step for filling a masking polymer into pores in the porous substrate from a surface different from the first surface of the porous substrate up to the surface layer by impregnating the porous substrate with the masking polymer and solidifying the masking polymer, and a surface layer removing step for removing the surface layer. After the surface layer removing step, a zeolite membrane is formed on the first surface of the porous substrate.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: January 28, 2014
    Assignees: NGK Insulators, Ltd., Nagaoka University of Technology
    Inventors: Shuji Himeno, Teruaki Takeuchi, Shuichi Yoshida, Kiyoshi Araki, Toshihiro Tomita
  • Patent number: 8637417
    Abstract: A method for treating a catalyst base that comprises a contact area of porous material. A fluid, such as a flue gas stream, can be conducted along the contact area. A catalytically relevant substance is introduced into pores of the catalyst base using a transport fluid and remains on pore wall areas after removal of the transport fluid. The introduction is carried out such that an amount of the catalytically relevant substance relative to the surface remains on the pore wall areas as a function of location within the pore and decreases within the pore after exceeding a specific pore depth. A blocking fluid can first be introduced into pore regions beyond the specific pore depth, thus blocking these regions when transport fluid containing the catalytically relevant substance is introduced.
    Type: Grant
    Filed: April 1, 2009
    Date of Patent: January 28, 2014
    Assignee: Steag Energy Services GmbH
    Inventors: Hermann Brüggendick, Maik Blohm
  • Patent number: 8637418
    Abstract: A method for treating a catalyst base that comprises a contact area of porous material. A fluid, such as a flue gas stream, can be conducted along the contact area. A catalytically relevant substance is introduced into pores of the catalyst base using a transport fluid and remains on pore wall areas after removal of the transport fluid. The introduction is carried out such that an amount of the catalytically relevant substance relative to the surface remains on the pore wall areas as a function of location within the pore and decreases within the pore after exceeding a specific pore depth. A blocking fluid can first be introduced into pore regions beyond the specific pore depth, thus blocking these regions when transport fluid containing the catalytically relevant substance is introduced.
    Type: Grant
    Filed: April 3, 2012
    Date of Patent: January 28, 2014
    Assignee: STEAG Energy Services GmbH
    Inventors: Hermann Brüggendick, Maik Blohm
  • Patent number: 8637419
    Abstract: Provided is a method for making a catalyst for hydroprocessing a carbonaceous feedstock under hyd reprocessing conditions. More particularly, the methods relate to inhibiting rapid decomposition of ammonium nitrate during calcination of the catalyst following metal impregnation, wherein ammonium nitrate is formed when a nitrate-containing composition and an ammonium-containing component is used in the deposition of metal onto the catalyst.
    Type: Grant
    Filed: December 6, 2010
    Date of Patent: January 28, 2014
    Assignee: Chevron U.S.A. Inc.
    Inventor: Bi-Zeng Zhan
  • Patent number: 8637420
    Abstract: The present invention provides metal-containing sulfated activator-supports, and polymerization catalyst compositions employing these activator-supports. Methods for making these metal-containing sulfated activator-supports and for using such components in catalyst compositions for the polymerization of olefins are also provided.
    Type: Grant
    Filed: October 9, 2012
    Date of Patent: January 28, 2014
    Assignee: Chevron Philips Chemical Company LP
    Inventors: Qing Yang, Max P. McDaniel, Tony R. Crain
  • Patent number: 8637421
    Abstract: The present invention discloses a catalyst system based on a metallocene catalyst component and a new single site catalyst component for the production in a single reactor of improved polyolefins having a bimodal molecular weight distribution.
    Type: Grant
    Filed: April 24, 2013
    Date of Patent: January 28, 2014
    Assignee: Total Petrochemicals Research Feluy
    Inventor: Abbas Razavi
  • Patent number: 8637422
    Abstract: A method for supporting a catalytic metal on the surface of a carrier by bringing an aqueous catalytic metal salt solution into contact a porous carrier. The method includes the steps of: impregnating the carrier with a liquid hydrophobic organic compound before bringing the aqueous catalytic metal salt solution into contact with the carrier, and drying the impregnated carrier to volatilize the hydrophobic organic compound on the surface of the carrier, followed by bringing the carrier into contact with the aqueous catalytic metal salt solution; and then bringing a reducing agent into contact with the catalytic metal salt on the surface of the carrier to reduce the catalytic metal salt to undergo insolubilization treatment. The catalytic component is supported in a region from the surface of the carrier to a depth of 50 ?m or more and 500 ?m or less.
    Type: Grant
    Filed: March 29, 2011
    Date of Patent: January 28, 2014
    Assignee: Tanaka Kikinzoku Kogyo K.K.
    Inventors: Hitoshi Kubo, Yuusuke Ohshima, Tomoko Ishikawa, Junichi Taniuchi
  • Patent number: 8637423
    Abstract: This invention relates to a catalyst and method for hydrodesulfurizing naphtha. More particularly, a Co/Mo metal hydrogenation component is loaded on a high temperature alumina support in the presence of a dispersion aid to produce a catalyst that is then used for hydrodesulrurizing naphtha. The high temperature alumina support has a defined surface area that minimizes olefin saturation.
    Type: Grant
    Filed: January 12, 2007
    Date of Patent: January 28, 2014
    Assignee: ExxonMobil Research and Engineering Company
    Inventors: Jason Wu, Edward S. Ellis, Valery Sokolovskii, David Michael Lowe, Anthony F. Volpe, Jr.
  • Patent number: 8637424
    Abstract: Exemplary embodiments of the present invention relate to the processing of hydrocarbon-containing feedstreams in the presence of an interstitial metal hydride comprising a surface, with a metal oxide integrally synthesized and providing a coating on the surface of the interstitial metal hydride. The catalysts and processes of the present invention can improve overall hydrogenation, product conversion, as well as sulfur and nitrogen reduction in hydrocarbon feedstreams.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: January 28, 2014
    Assignee: ExxonMobil Research and Engineering Company
    Inventor: Heather A. Elsen
  • Patent number: 8637425
    Abstract: A process is described for preparing a catalyst comprising at least one porous support and at least one metallic phase containing nickel and tin in a proportion such that the Sn/Ni molar ratio is in the range 0.01 to 0.2, said process comprising at least the following steps in succession: a) depositing nickel on at least said support in order to obtain a supported nickel-based monometallic catalyst; b) reducing said monometallic catalyst in the presence of at least one reducing gas; c) depositing, in the gas phase and in the presence of at least one reducing gas, at least one organometallic tin compound onto said reduced monometallic catalyst; and d) activating the solid derived from said step c) in the presence of at least one reducing gas.
    Type: Grant
    Filed: August 16, 2010
    Date of Patent: January 28, 2014
    Assignee: IFP Energies nouvelles
    Inventors: Lars Fischer, Anne-Claire Dubreuil, Cecile Thomazeau, Layane Deghedi, Jean-Pierre Candy, Jean-Marie Basset, Fabienne Le Peltier
  • Patent number: 8637426
    Abstract: An oxidation catalyst composite, methods and systems for the treatment of exhaust gas emissions from an advanced combustion engine, such as the oxidation of unburned hydrocarbons (HC), and carbon monoxide (CO) and the reduction of nitrogen oxides (NOx) from a diesel engine and an advanced combustion diesel engine are disclosed. More particularly, washcoat compositions are disclosed comprising at least two washcoat layers, a first washcoat comprising a palladium component and a second washcoat containing platinum and at least about 50% of the total platinum is located in the rear of the catalyst.
    Type: Grant
    Filed: April 6, 2010
    Date of Patent: January 28, 2014
    Assignee: BASF Corporation
    Inventors: Jeffrey B. Hoke, Joseph C. Dettling
  • Patent number: 8637427
    Abstract: An adsorptive composition comprising a composition that contains at least one kind of fatty acid metal salt of any one of Ni, Cu or Co and ultrafine metal particles having a plasmon absorption over 300 to 700 nm. The adsorptive composition has an excellent effect of adsorbing both amine-type smelling components and sulfur-containing smelling components.
    Type: Grant
    Filed: February 26, 2009
    Date of Patent: January 28, 2014
    Assignee: Toyo Seikan Kaisha, Ltd.
    Inventors: Kazuaki Ohashi, Anzu Kasai, Daisuke Hiratsuka, Shigeru Suzuki
  • Patent number: 8637428
    Abstract: This invention relates to a particulate extraction material for the extraction of lithium from a geothermal brine or lithium containing solution. The particulate material includes an inorganic or polymer based substrate that includes a lithium aluminum intercalate layer applied to the exterior of the substrate, wherein the lithium aluminum intercalate layer is operable to capture lithium ions from solution.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: January 28, 2014
    Assignee: Simbol Inc.
    Inventors: Stephen Harrison, C. V. Krishanamohan Sharma, Brian E. Viani, Diana Peykova
  • Patent number: 8637429
    Abstract: The invention relates to a method of marking a substrate comprising treating the substrate with a boron compound and a charrable agent, and, irradiating the areas of the substrate to be marked such that those areas change colour. Marked substrates obtainable by this method are also provided.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: January 28, 2014
    Assignee: Datalase Ltd
    Inventors: Martin Walker, Anthony Jarvis, Christopher Wyres, William Green
  • Patent number: 8637430
    Abstract: The present invention relates to a web substrate comprising an activatable colorant and at least one region comprising a topical additive. A first activated color region is produced in the web substrate upon exposure to a first external stimulus and a second activated color region is produced within the first activated color region upon exposure to a second external stimulus. The second activated color region coincides with the topical additive region.
    Type: Grant
    Filed: April 23, 2010
    Date of Patent: January 28, 2014
    Assignee: The Procter & Gamble Company
    Inventors: Kelyn Anne Arora, John Lee Hammons
  • Patent number: 8637431
    Abstract: A heat-sensitive recording material having a substrate that carries on its first side at least one heat-sensitive recording layer having at least one dye precursor and at least one color acceptor. The dye precursor and color acceptor react with one another in a color-forming manner under the action of heat. On its second side the substrate has a backcoat containing calcium carbonate. The backcoat is formed of at least two layers, a first layer is applied closer to the substrate and a second layer is applied farther from the substrate. The first layer contains a first calcium carbonate and the second layer contains a second calcium carbonate that differs from the first calcium carbonate.
    Type: Grant
    Filed: June 30, 2010
    Date of Patent: January 28, 2014
    Assignee: Mitsubishi HiTec Paper Europe GmbH
    Inventors: Gerhard Stork, Karsten Lerius
  • Patent number: 8637432
    Abstract: Alkyl ether sulfates having 1 to 9 carbon atoms in the alkyl chain and 1 to 20 alkyleneoxy units in the ether moiety are suitable for use as low-foam additives for enhancing the activity of water-soluble or partially water-soluble agrochemicals. They can be used to produce low-foam preparations for crop protection.
    Type: Grant
    Filed: June 19, 2007
    Date of Patent: January 28, 2014
    Assignee: Bayer Cropscience AG
    Inventors: Peter Baur, Thomas Auler, Roland Deckwer, Stephanie Giessler
  • Patent number: 8637433
    Abstract: A method for making a composite superconductor and a superconductor made using the method. Superconducting filaments are embedded in a matrix material. Oxygen-containing elements are also embedded in the matrix material, with the oxygen-containing elements preferably being dispersed evenly among the superconducting filaments. A surrounding reinforcement material contains the other elements and preferably seals the superconductor from the surrounding atmosphere.
    Type: Grant
    Filed: October 4, 2011
    Date of Patent: January 28, 2014
    Assignee: Florida State University Technology Transfer Office
    Inventors: Thomas Painter, Ting Xu, Xiaotao Liu
  • Patent number: 8637434
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: January 28, 2014
    Assignee: Affymetrix, Inc.
    Inventors: Martin J. Goldberg, Martin Diggelman, Earl A. Hubbell, Glenn H. McGall, Ngo Nam, MacDonald S. Morris, Melvin Yamamoto, Jennifer Tan, Richard Rava
  • Patent number: 8637435
    Abstract: The present invention provides expression vectors and helper display vectors which can be used in various combinations as vector sets for display of polypeptides on the outer surface of eukaryotic host cells. The expression vector of the invention can be used alone for soluble expression without having to change or reengineer the display vectors. The display systems of the invention are particularly useful for displaying a genetically diverse repertoire or library of polypeptides on the surface of yeast cells, and mammalian cells.
    Type: Grant
    Filed: November 14, 2008
    Date of Patent: January 28, 2014
    Assignee: Merck Sharp & Dohme Corp.
    Inventors: Kevin Caili Wang, Peter Peizhi Luo, Pingyu Zhong, Jian Wang
  • Patent number: 8637436
    Abstract: A biosensor array, system and method for affinity based assays that are able to simultaneously obtain high quality measurements of the binding characteristics of multiple analytes, and that are able to determine the amounts of those analytes in solution. The invention also provides a fully integrated bioarray for detecting real-time characteristics of affinity based assays.
    Type: Grant
    Filed: August 24, 2007
    Date of Patent: January 28, 2014
    Assignee: California Institute of Technology
    Inventor: Arjang Hassibi
  • Patent number: 8637437
    Abstract: The invention provides a lubricating composition containing an oil of lubricating viscosity, an additive containing a polymeric backbone and at least one amino group. The invention further provides for the additive to have dispersant and/or dispersant viscosity modifying properties. The lubricating composition is suitable for lubricating an internal combustion engine.
    Type: Grant
    Filed: November 10, 2008
    Date of Patent: January 28, 2014
    Assignee: The Lubrizol Corporation
    Inventors: Matthew D. Gieselman, Christopher Friend, Adam J. Preston
  • Patent number: 8637438
    Abstract: A lubricating oil composition for internal combustion engines comprising a base oil containing at least one component selected from an ?-olefin oligomer having 16 to 40 carbon atoms obtained by oligomerizing ?-olefin(s) having 2 to 20 carbon atoms using a metallocene catalyst, and the hydrogenated derivative thereof; an ?-olefin oligomer having 16 to 40 carbon atoms derived from an ?-olefin dimer obtained using a metallocene catalyst, and the hydrogenated derivative thereof; and the like. The lubricating oil composition has an excellent low-temperature fluidity, a low evaporativity, and a good oxidation stability.
    Type: Grant
    Filed: November 14, 2006
    Date of Patent: January 28, 2014
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventor: Ryou Yamada
  • Patent number: 8637439
    Abstract: Compositions adapted for use as a bathing (shower or bath) gel for personal cleansing are provided, the compositions containing reduced loadings of relatively harsh anionic surfactants and of fragrance oils, but retaining a spectrum of functional properties perceived by consumers as desirable. The compositions include lower concentrations of anionic surfactants compared to standard bathing gel compositions, but the addition of quantities of a long-chain alkyl, hydroxyalkyl cellulose derivative to the composition preserves or enhances functional properties such as viscosity, skin mildness, foam generation on lathering, subjective perceived cleansing appreciation, and fragrance performance. The bathing gels provide an environmental benefit such as reduced surfactant loading, biodegradability, and aquatic toxicity of wastewater streams when used in the place of standard bathing gels.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: January 28, 2014
    Assignee: Coty Inc.
    Inventors: Eva Vinas Sanz, Marta Queralt Lopez Salvans
  • Patent number: 8637440
    Abstract: A personal cleansing composition includes a surfactant, a thickener, emulsifier and at least one particulate dispersed in the thickener, the at least one particulate being formed of a substantially biodegradable substance. The at least one particulare may include a soy meal based polymer. The soy meal based polymer is both stable and biodegradable. The at least one particulate includes a group of suspended particles added to mechanically scrub the skin of a user or used as a textural ingredient to modify the feel, spreadability or slip of a product. The soy meal based polymer is useful in personal cleansing compositions as an exfoliant, a scrub, a film former or as a filler. The half-life of the composition may be modified as necessary based on the shelf-life of the product.
    Type: Grant
    Filed: November 6, 2012
    Date of Patent: January 28, 2014
    Inventor: Kim Cervino
  • Patent number: 8637441
    Abstract: The present invention discloses a non-foaming detergent, including a sodium alginate, an amylum, a sodium silicate, a citric acid, a sodium citrate, a sea salt, a sodium peroxyborate, a TAED and a borax. Herein, the non-foaming detergent further includes a sodium bicarbonate and a soapnut saponin. The preparation method of the non-foaming detergent comprises the following steps: mixing a sodium silicate and a sodium peroxyborate under stirring, mixing a soapnut saponin, a sodium alginate, an amylum, a sodium citrate, a sea salt, a sodium bicarbonate, a TAED and a borax under stirring, mixing such two mixtures, adding a citric acid therein and further mixing to obtain the non-foaming detergent. In the present invention, the prepared detergent has good solubility, strong activity at low temperature, high washing power and thorough detergency. Besides, the detergent is non-foaming and non-flavoring and the exhaust water during washing can be bio-degraded effectively.
    Type: Grant
    Filed: December 3, 2012
    Date of Patent: January 28, 2014
    Assignee: Newer World International Company Limited
    Inventor: Shu Feng Chen
  • Patent number: 8637442
    Abstract: The present invention encompasses a surface treatment composition which comprises a polyorganosiloxane fluid-silicone resin mixture and a carrier. The polyorganosiloxane fluid-silicone resin mixture comprises about 2% to about 95%, by weight of the mixture, of one or more polyorganosiloxane fluid compounds; from about 1% to about 10%, by weight of the mixture, of one or more silicone resin, a protonation agent, at least about 5%, by weight of the mixture; of water; and optionally, less than about 5%, by weight of the mixture, of an emulsifier.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: January 28, 2014
    Assignee: The Procter & Gamble Company
    Inventors: Xiaoru Jenny Wang, James Lee Danziger, David S. Salloum, Stephen Thomas Murphy, Markus Merget, Franz X. Wimmer, Richard Becker