Patents Issued in January 28, 2014
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Patent number: 8637392Abstract: A solder interconnect structure is provided with non-wettable sidewalls and methods of manufacturing the same. The method includes forming a nickel or nickel alloy pillar on an underlying surface. The method further includes modifying the sidewall of the nickel or nickel alloy pillar to prevent solder wetting on the sidewall.Type: GrantFiled: February 5, 2010Date of Patent: January 28, 2014Assignee: International Business Machines CorporationInventors: Charles L. Arvin, Raschid J. Bezama, Timothy H. Daubenspeck, Jeffrey P. Gambino, Christopher D. Muzzy, David L. Questad, Wolfgang Sauter, Timothy D. Sullivan, Brian R. Sundlof
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Patent number: 8637393Abstract: A surface is placed into a deposition chamber. A tin layer is formed on the surface, in which forming the tin layer includes providing a precursor into the deposition chamber for a first time period, wherein the precursor comprises one of tetrakis (dimethylamino) tin (TDMASn) or tin tetrachloride (SnCl4), providing an inert gas into the deposition chamber for a second time period, providing a hydrogen reactant into the deposition chamber for a third time period, and providing the inert gas into the deposition chamber for a fourth time period. The first, second, third, and fourth time periods form one atomic layer deposition (ALD) cycle. The surface may be an exposed surface of a lead free metal.Type: GrantFiled: October 26, 2012Date of Patent: January 28, 2014Assignee: Freescale Semiconductor, Inc.Inventor: Rama I. Hegde
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Patent number: 8637394Abstract: An integrated circuit package system includes: forming a flex bump over an integrated circuit device structure, the flex bump having both a base portion and an offset portion over the base portion; forming a first ball bond of a first internal interconnect over the offset portion; and encapsulating the integrated circuit device structure, the flex bump, and the first internal interconnect.Type: GrantFiled: July 5, 2007Date of Patent: January 28, 2014Assignee: STATS ChipPAC Ltd.Inventors: Jairus Legaspi Pisigan, Henry Descalzo Bathan, Arnel Trasporto, Jeffrey D. Punzalan
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Patent number: 8637395Abstract: A single damascene or dual damascene interconnect structure fabricated with a photo-patternable low-k dielectric (PPLK) which is cured after etching. This method prevents the PPLK damage and the tapering of the edges of the interconnect structure. In one embodiment, the method of the present invention includes depositing a photo-patternable low-k (PPLK) material atop a substrate. The at least one PPLK material is patterned, creating a single damascene structure. For dual damascene structures, a second PPLK layer is coated and patterned. An etch process is performed to transfer the pattern from the PPLK material into at least a portion of the substrate. A diffusion liner and a conductive material can be deposited after the etch process. The resulting structure is cured anytime after etching in order to transform the resist like PPLK into a permanent low-k material that remains within the structure.Type: GrantFiled: November 16, 2009Date of Patent: January 28, 2014Assignee: International Business Machines CorporationInventors: Maxime Darnon, Qinghuang Lin
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Patent number: 8637396Abstract: A method is provided for depositing a dielectric barrier film including a precursor with silicon, carbon, oxygen, and hydrogen with improved barrier dielectric properties including lower dielectric constant and superior electrical properties. This method will be important for barrier layers used in a damascene or dual damascene integration for interconnect structures or in other dielectric barrier applications. In this example, specific structural properties are noted that improve the barrier performance.Type: GrantFiled: November 23, 2009Date of Patent: January 28, 2014Assignee: Air Products and Chemicals, Inc.Inventors: Laura M. Matz, Raymond Nicholas Vrtis, Mark Leonard O'Neill, Dino Sinatore
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Patent number: 8637397Abstract: To provide a method of manufacturing a through hole electrode substrate which comprises forming a plurality of through holes passing through the front and back of a wafer-shaped substrate, forming an insulation film on a surface of the substrate and the though hole, forming a seed layer from a metal on at least one side of the substrate and/or the through hole, forming a metal layer having a cap shape on a bottom part of the through hole on a surface on which the seed layer is formed by an electrolytic plating method supplying direct current to the seed layer for a first time period, and filling a metal material into the plurality of through holes by an electrolytic plating method supplying a pulse current to the seed layer and the metal layer.Type: GrantFiled: September 7, 2012Date of Patent: January 28, 2014Assignee: Dai Nippon Printing Co., LtdInventors: Shinji Maekawa, Myuki Suzuki
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Patent number: 8637399Abstract: An etching composition for a copper-containing layer includes about 0.1% to about 30% by weight of ammonium persulfate, about 0.1% to about 10% by weight of a sulfate, about 0.01% to about 5% by weight of an acetate and about 55% to about 99.79% by weight of water. The etching composition having improved stability during storage and an increased capacity for etching.Type: GrantFiled: August 31, 2012Date of Patent: January 28, 2014Assignee: Samsung Display Co., Ltd.Inventors: Hong-Sick Park, Bong-Kyun Kim, Wang-Woo Lee, Ki-Beom Lee, Sam-Young Cho, Won-Guk Seo, Gyu-Po Kim
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Patent number: 8637400Abstract: A method of forming a semiconductor structure includes forming a sacrificial conductive material layer. The method also includes forming a trench in the sacrificial conductive material layer. The method further includes forming a conductive feature in the trench. The method additionally includes removing the sacrificial conductive material layer selective to the conductive feature. The method also includes forming an insulating layer around the conductive feature to embed the conductive feature in the insulating layer.Type: GrantFiled: June 21, 2011Date of Patent: January 28, 2014Assignee: International Business Machines CorporationInventors: David V. Horak, Charles W. Koburger, Shom Ponoth, Chih-Chao Yang
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Patent number: 8637401Abstract: A method is explained that allows for a via to be filled with a dispensed material while the substrate is in continuous movement. A device is described that allows for a via to be filled while the target substrate is in continuous movement. The device consists of a material jetting system, a machine vision system that can detect the optimum trigger point, an electronic control circuit, a feedback mechanism and a web handling provision.Type: GrantFiled: March 29, 2010Date of Patent: January 28, 2014Inventors: Anthony Nicholas Brady Garvan, III, Christoph Erben, Darren Lochun
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Patent number: 8637402Abstract: The conductive line structure of a semiconductor device including a base; at least one patterned conductive layer formed over the base; a conductive line formed over the at least one patterned conductive layer; a protection layer that encompasses the top surface and sidewall of the conductive line to prevent undercut generated by etching. The structure further comprises an underlying layer under the conductive line. The underlying layer includes Ni, Cu or Pt. The conductive line includes gold or copper. The at least one patterned conductive layer includes at least Ti/Cu. The protection layer includes electro-less plating Sn, Au, Ag or Ni.Type: GrantFiled: December 5, 2011Date of Patent: January 28, 2014Assignee: ADL Engineering Inc.Inventors: Yu-Shan Hu, Ming-Chih Chen, Dyi-Chung Hu
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Patent number: 8637403Abstract: A method of manufacturing a semiconductor structure includes varying local chemical mechanical polishing (CMP) abrading rates of an insulator film by selectively varying a carbon content of the insulator film.Type: GrantFiled: December 12, 2011Date of Patent: January 28, 2014Assignee: International Business Machines CorporationInventors: Yoba Amoah, Graham M. Bates, Joseph P. Hasselbach, Thomas L. McDevitt, Eva A. Shah
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Patent number: 8637404Abstract: The invention provides methods for planarizing or polishing a metal surface. The method comprises a composition comprising an abrasive, cesium ions, and a liquid carrier comprising water.Type: GrantFiled: November 23, 2010Date of Patent: January 28, 2014Assignee: Cabot Microelectronics CorporationInventors: Phillip W. Carter, Shoutian Li
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Patent number: 8637405Abstract: A method of texturing a surface of a crystalline silicon substrate is provided. The method includes immersing a crystalline silicon substrate into an aqueous alkaline etchant solution to form a pyramid shaped textured surface, with (111) faces exposed, on the crystalline silicon substrate. The aqueous alkaline etchant solution employed in the method of the present disclosure includes an alkaline component and a nanoparticle slurry component. Specifically, the aqueous alkaline etchant solution of the present disclosure includes 0.5 weight percent to 5 weight percent of an alkaline component and from 0.1 weight percent to 5 weight percent of a nanoparticle slurry on a dry basis.Type: GrantFiled: June 21, 2011Date of Patent: January 28, 2014Assignee: International Business Machines CorporationInventors: Mahadevaiyer Krishnan, Jun Liu, Satyavolu S. Papa Rao, George G. Totir
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Patent number: 8637406Abstract: At least one mask layer formed over a substrate includes at least one of a dielectric material and a metallic material. By forming a first pattern in one of the at least one mask layer, a patterned mask layer including said first pattern is formed. An overlying structure including a second pattern that includes at least one blocking area is formed over said patterned mask layer. Portions of said patterned mask layer that do not underlie said blocking area are removed. The remaining portions of the patterned mask layer include a composite pattern that is an intersection of the first pattern and the second pattern. The patterned mask layer includes a dielectric material or a metallic material, and thus, enables high fidelity pattern transfer into an underlying material layer.Type: GrantFiled: July 19, 2012Date of Patent: January 28, 2014Assignee: International Business Machines CorporationInventors: Ryan O. Jung, Sivananda K. Kanakasabapathy, Yunpeng Yin
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Patent number: 8637407Abstract: Methods of forming a semiconductor device may include providing a feature layer having a first region and a second region. The methods may also include forming a dual mask layer on the feature layer. The methods may further include forming a variable mask layer on the dual mask layer. The methods may additionally include forming a first structure on the feature layer in the first region and a second structure on the feature layer in the second region by patterning the variable mask layer and the dual mask layer. The methods may also include forming a first spacer on a sidewall of the first structure and a second spacer on a sidewall of the second structure. The methods may further include removing the first structure while maintaining at least a portion of the second structure.Type: GrantFiled: September 23, 2011Date of Patent: January 28, 2014Assignee: Samsung Electronics Co., Ltd.Inventors: Jae-Ho Min, O-Ik Kwon, Bum-Soo Kim, Dong-chan Kim, Myeong-cheol Kim
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Patent number: 8637408Abstract: Apparatus and methods are provided for efficiently reclaiming solvents used to clean surfaces of semiconductor wafers, etc. More particularly, embodiments of the present invention provide an in-situ reclaim approach that utilizes condensing mechanisms to reclaim evaporated solvent components. In these embodiments, the condensing can occur within a proximity head itself and/or along a vacuum line running from the proximity head to a vacuum tank. Other embodiments of the present invention provide an in-situ reclaim approach that prevents the evaporation of solvents at the onset by maintaining appropriate equilibrium gas phase concentrations between the liquid chemistries and gases used to process wafer surfaces.Type: GrantFiled: October 4, 2012Date of Patent: January 28, 2014Assignee: Lam Research CorporationInventor: Robert O'Donnell
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Patent number: 8637409Abstract: An etching method includes: applying a radiation to an etching aqueous solution; and etching a material to be etched by using the etching aqueous solution irradiated with the radiation.Type: GrantFiled: February 17, 2012Date of Patent: January 28, 2014Assignee: Fujitsu LimitedInventors: Shirou Ozaki, Masayuki Takeda
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Patent number: 8637410Abstract: Methods for formation and treatment of pure metal layers using CVD and ALD techniques are provided. In one or more embodiments, the method includes forming a metal precursor layer and treating the metal precursor layer to a hydrogen plasma to reduce the metal precursor layer to form a metal layer. In one or more embodiments, treating the metal precursor layer includes exposing the metal precursor layer to a high frequency-generated hydrogen plasma. Methods of preventing a hydrogen plasma from penetrating a metal precursor layer are also provided.Type: GrantFiled: April 8, 2011Date of Patent: January 28, 2014Assignee: Applied Materials, Inc.Inventors: Anantha K. Subramani, John C. Forster, Seshadri Ganguli, Michael S. Jackson, Xinliang Lu, Wei W. Wang, Xinyu Fu, Yu Lei
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Patent number: 8637411Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.Type: GrantFiled: September 23, 2011Date of Patent: January 28, 2014Assignee: Novellus Systems, Inc.Inventors: Shankar Swaminathan, Jon Henri, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan, Kirthi K. Kattige, Bart J. van Schravendijk, Andrew J. McKerrow
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Patent number: 8637412Abstract: A first PECVD process incorporating a silicon oxide precursor alone and then with an organo-silicon precursor with increasing flow while the flow of the silicon oxide precursor is reduced to zero provides a graded carbon adhesion layer whereby the content of C increases with layer thickness and a second PECVD process incorporating an organo-silicon precursor including an organic porogen provides a multiphase ultra-low k dielectric. The multiphase ultra-low k PECVD process uses high frequency radio frequency power just above plasma initiation in a PECVD chamber. An energy post treatment is also provided. A porous SiCOH dielectric material having a k less than 2.7 and a modulus of elasticity greater than 7 GPa is formed.Type: GrantFiled: August 19, 2011Date of Patent: January 28, 2014Assignee: International Business Machines CorporationInventors: Alfred Grill, Thomas Jasper Haigh, Jr., Kelly Malone, Son Van Nguyen, Vishnubhai Vitthalbhai Patel, Hosadurga Shobha
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Patent number: 8637413Abstract: A nonvolatile resistive memory element has a novel variable resistance layer that is passivated with non-metallic dopant atoms, such as nitrogen, either during or after deposition of the switching layer. The presence of the non-metallic dopant atoms in the variable resistance layer enables the switching layer to operate with reduced switching current while maintaining improved data retention properties.Type: GrantFiled: December 2, 2011Date of Patent: January 28, 2014Assignees: Sandisk 3D LLC, Kabushiki Kaisha ToshibaInventors: Charlene Chen, Dipankar Pramanik
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Patent number: 8637414Abstract: A gradient density padding material includes a single layer of nonwoven material having at least one surface processed to form a portion of a thickness thereof having a density increased with respect to a remaining portion of the thickness thereof. The single layer of nonwoven material after processing has an airflow resistance within the range of 200-4000 MKS Rayls, wherein said single layer of nonwoven material has an enhanced acoustic performance. A method of making a gradient density padding material having an enhanced acoustic performance includes the steps of providing a single layer of nonwoven material and processing at least one surface of the single layer of nonwoven material to form a portion of a thickness thereof having a density increased with respect to a remaining portion of the thickness thereof. The single layer of nonwoven material after processing has an airflow resistance within the range of 200-4000 MKS Rayls.Type: GrantFiled: April 22, 2003Date of Patent: January 28, 2014Assignee: Lydall, Inc.Inventors: Durward Gomez, Steven Borchardt
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Patent number: 8637415Abstract: The present invention provides a fluorophosphate glass containing 30 to 50 cationic % of a phosphorus ingredient in terms of P5+, the glass having, in a nuclear magnetic resonance spectrum, a resonance spectrum which is generated near a reference frequency of 31P and has a shape of Gaussian function. The glass of the invention is reduced in volatility and erosiveness.Type: GrantFiled: March 27, 2009Date of Patent: January 28, 2014Assignee: Hoya CorporationInventor: Mikio Ikenishi
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Patent number: 8637416Abstract: There is provided a zeolite membrane which is thinner than a conventional membrane and which has improved permeability and a method for manufacturing the zeolite membrane. The method includes a surface layer forming step for forming a surface layer by attaching a low polar polymer on a first surface of a porous substrate to cover the surface, a filling step for filling a masking polymer into pores in the porous substrate from a surface different from the first surface of the porous substrate up to the surface layer by impregnating the porous substrate with the masking polymer and solidifying the masking polymer, and a surface layer removing step for removing the surface layer. After the surface layer removing step, a zeolite membrane is formed on the first surface of the porous substrate.Type: GrantFiled: December 13, 2010Date of Patent: January 28, 2014Assignees: NGK Insulators, Ltd., Nagaoka University of TechnologyInventors: Shuji Himeno, Teruaki Takeuchi, Shuichi Yoshida, Kiyoshi Araki, Toshihiro Tomita
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Patent number: 8637417Abstract: A method for treating a catalyst base that comprises a contact area of porous material. A fluid, such as a flue gas stream, can be conducted along the contact area. A catalytically relevant substance is introduced into pores of the catalyst base using a transport fluid and remains on pore wall areas after removal of the transport fluid. The introduction is carried out such that an amount of the catalytically relevant substance relative to the surface remains on the pore wall areas as a function of location within the pore and decreases within the pore after exceeding a specific pore depth. A blocking fluid can first be introduced into pore regions beyond the specific pore depth, thus blocking these regions when transport fluid containing the catalytically relevant substance is introduced.Type: GrantFiled: April 1, 2009Date of Patent: January 28, 2014Assignee: Steag Energy Services GmbHInventors: Hermann Brüggendick, Maik Blohm
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Patent number: 8637418Abstract: A method for treating a catalyst base that comprises a contact area of porous material. A fluid, such as a flue gas stream, can be conducted along the contact area. A catalytically relevant substance is introduced into pores of the catalyst base using a transport fluid and remains on pore wall areas after removal of the transport fluid. The introduction is carried out such that an amount of the catalytically relevant substance relative to the surface remains on the pore wall areas as a function of location within the pore and decreases within the pore after exceeding a specific pore depth. A blocking fluid can first be introduced into pore regions beyond the specific pore depth, thus blocking these regions when transport fluid containing the catalytically relevant substance is introduced.Type: GrantFiled: April 3, 2012Date of Patent: January 28, 2014Assignee: STEAG Energy Services GmbHInventors: Hermann Brüggendick, Maik Blohm
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Patent number: 8637419Abstract: Provided is a method for making a catalyst for hydroprocessing a carbonaceous feedstock under hyd reprocessing conditions. More particularly, the methods relate to inhibiting rapid decomposition of ammonium nitrate during calcination of the catalyst following metal impregnation, wherein ammonium nitrate is formed when a nitrate-containing composition and an ammonium-containing component is used in the deposition of metal onto the catalyst.Type: GrantFiled: December 6, 2010Date of Patent: January 28, 2014Assignee: Chevron U.S.A. Inc.Inventor: Bi-Zeng Zhan
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Patent number: 8637420Abstract: The present invention provides metal-containing sulfated activator-supports, and polymerization catalyst compositions employing these activator-supports. Methods for making these metal-containing sulfated activator-supports and for using such components in catalyst compositions for the polymerization of olefins are also provided.Type: GrantFiled: October 9, 2012Date of Patent: January 28, 2014Assignee: Chevron Philips Chemical Company LPInventors: Qing Yang, Max P. McDaniel, Tony R. Crain
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Patent number: 8637421Abstract: The present invention discloses a catalyst system based on a metallocene catalyst component and a new single site catalyst component for the production in a single reactor of improved polyolefins having a bimodal molecular weight distribution.Type: GrantFiled: April 24, 2013Date of Patent: January 28, 2014Assignee: Total Petrochemicals Research FeluyInventor: Abbas Razavi
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Patent number: 8637422Abstract: A method for supporting a catalytic metal on the surface of a carrier by bringing an aqueous catalytic metal salt solution into contact a porous carrier. The method includes the steps of: impregnating the carrier with a liquid hydrophobic organic compound before bringing the aqueous catalytic metal salt solution into contact with the carrier, and drying the impregnated carrier to volatilize the hydrophobic organic compound on the surface of the carrier, followed by bringing the carrier into contact with the aqueous catalytic metal salt solution; and then bringing a reducing agent into contact with the catalytic metal salt on the surface of the carrier to reduce the catalytic metal salt to undergo insolubilization treatment. The catalytic component is supported in a region from the surface of the carrier to a depth of 50 ?m or more and 500 ?m or less.Type: GrantFiled: March 29, 2011Date of Patent: January 28, 2014Assignee: Tanaka Kikinzoku Kogyo K.K.Inventors: Hitoshi Kubo, Yuusuke Ohshima, Tomoko Ishikawa, Junichi Taniuchi
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Patent number: 8637423Abstract: This invention relates to a catalyst and method for hydrodesulfurizing naphtha. More particularly, a Co/Mo metal hydrogenation component is loaded on a high temperature alumina support in the presence of a dispersion aid to produce a catalyst that is then used for hydrodesulrurizing naphtha. The high temperature alumina support has a defined surface area that minimizes olefin saturation.Type: GrantFiled: January 12, 2007Date of Patent: January 28, 2014Assignee: ExxonMobil Research and Engineering CompanyInventors: Jason Wu, Edward S. Ellis, Valery Sokolovskii, David Michael Lowe, Anthony F. Volpe, Jr.
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Patent number: 8637424Abstract: Exemplary embodiments of the present invention relate to the processing of hydrocarbon-containing feedstreams in the presence of an interstitial metal hydride comprising a surface, with a metal oxide integrally synthesized and providing a coating on the surface of the interstitial metal hydride. The catalysts and processes of the present invention can improve overall hydrogenation, product conversion, as well as sulfur and nitrogen reduction in hydrocarbon feedstreams.Type: GrantFiled: November 9, 2010Date of Patent: January 28, 2014Assignee: ExxonMobil Research and Engineering CompanyInventor: Heather A. Elsen
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Patent number: 8637425Abstract: A process is described for preparing a catalyst comprising at least one porous support and at least one metallic phase containing nickel and tin in a proportion such that the Sn/Ni molar ratio is in the range 0.01 to 0.2, said process comprising at least the following steps in succession: a) depositing nickel on at least said support in order to obtain a supported nickel-based monometallic catalyst; b) reducing said monometallic catalyst in the presence of at least one reducing gas; c) depositing, in the gas phase and in the presence of at least one reducing gas, at least one organometallic tin compound onto said reduced monometallic catalyst; and d) activating the solid derived from said step c) in the presence of at least one reducing gas.Type: GrantFiled: August 16, 2010Date of Patent: January 28, 2014Assignee: IFP Energies nouvellesInventors: Lars Fischer, Anne-Claire Dubreuil, Cecile Thomazeau, Layane Deghedi, Jean-Pierre Candy, Jean-Marie Basset, Fabienne Le Peltier
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Patent number: 8637426Abstract: An oxidation catalyst composite, methods and systems for the treatment of exhaust gas emissions from an advanced combustion engine, such as the oxidation of unburned hydrocarbons (HC), and carbon monoxide (CO) and the reduction of nitrogen oxides (NOx) from a diesel engine and an advanced combustion diesel engine are disclosed. More particularly, washcoat compositions are disclosed comprising at least two washcoat layers, a first washcoat comprising a palladium component and a second washcoat containing platinum and at least about 50% of the total platinum is located in the rear of the catalyst.Type: GrantFiled: April 6, 2010Date of Patent: January 28, 2014Assignee: BASF CorporationInventors: Jeffrey B. Hoke, Joseph C. Dettling
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Patent number: 8637427Abstract: An adsorptive composition comprising a composition that contains at least one kind of fatty acid metal salt of any one of Ni, Cu or Co and ultrafine metal particles having a plasmon absorption over 300 to 700 nm. The adsorptive composition has an excellent effect of adsorbing both amine-type smelling components and sulfur-containing smelling components.Type: GrantFiled: February 26, 2009Date of Patent: January 28, 2014Assignee: Toyo Seikan Kaisha, Ltd.Inventors: Kazuaki Ohashi, Anzu Kasai, Daisuke Hiratsuka, Shigeru Suzuki
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Patent number: 8637428Abstract: This invention relates to a particulate extraction material for the extraction of lithium from a geothermal brine or lithium containing solution. The particulate material includes an inorganic or polymer based substrate that includes a lithium aluminum intercalate layer applied to the exterior of the substrate, wherein the lithium aluminum intercalate layer is operable to capture lithium ions from solution.Type: GrantFiled: December 20, 2010Date of Patent: January 28, 2014Assignee: Simbol Inc.Inventors: Stephen Harrison, C. V. Krishanamohan Sharma, Brian E. Viani, Diana Peykova
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Patent number: 8637429Abstract: The invention relates to a method of marking a substrate comprising treating the substrate with a boron compound and a charrable agent, and, irradiating the areas of the substrate to be marked such that those areas change colour. Marked substrates obtainable by this method are also provided.Type: GrantFiled: August 26, 2009Date of Patent: January 28, 2014Assignee: Datalase LtdInventors: Martin Walker, Anthony Jarvis, Christopher Wyres, William Green
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Patent number: 8637430Abstract: The present invention relates to a web substrate comprising an activatable colorant and at least one region comprising a topical additive. A first activated color region is produced in the web substrate upon exposure to a first external stimulus and a second activated color region is produced within the first activated color region upon exposure to a second external stimulus. The second activated color region coincides with the topical additive region.Type: GrantFiled: April 23, 2010Date of Patent: January 28, 2014Assignee: The Procter & Gamble CompanyInventors: Kelyn Anne Arora, John Lee Hammons
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Patent number: 8637431Abstract: A heat-sensitive recording material having a substrate that carries on its first side at least one heat-sensitive recording layer having at least one dye precursor and at least one color acceptor. The dye precursor and color acceptor react with one another in a color-forming manner under the action of heat. On its second side the substrate has a backcoat containing calcium carbonate. The backcoat is formed of at least two layers, a first layer is applied closer to the substrate and a second layer is applied farther from the substrate. The first layer contains a first calcium carbonate and the second layer contains a second calcium carbonate that differs from the first calcium carbonate.Type: GrantFiled: June 30, 2010Date of Patent: January 28, 2014Assignee: Mitsubishi HiTec Paper Europe GmbHInventors: Gerhard Stork, Karsten Lerius
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Patent number: 8637432Abstract: Alkyl ether sulfates having 1 to 9 carbon atoms in the alkyl chain and 1 to 20 alkyleneoxy units in the ether moiety are suitable for use as low-foam additives for enhancing the activity of water-soluble or partially water-soluble agrochemicals. They can be used to produce low-foam preparations for crop protection.Type: GrantFiled: June 19, 2007Date of Patent: January 28, 2014Assignee: Bayer Cropscience AGInventors: Peter Baur, Thomas Auler, Roland Deckwer, Stephanie Giessler
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Patent number: 8637433Abstract: A method for making a composite superconductor and a superconductor made using the method. Superconducting filaments are embedded in a matrix material. Oxygen-containing elements are also embedded in the matrix material, with the oxygen-containing elements preferably being dispersed evenly among the superconducting filaments. A surrounding reinforcement material contains the other elements and preferably seals the superconductor from the surrounding atmosphere.Type: GrantFiled: October 4, 2011Date of Patent: January 28, 2014Assignee: Florida State University Technology Transfer OfficeInventors: Thomas Painter, Ting Xu, Xiaotao Liu
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Patent number: 8637434Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.Type: GrantFiled: September 28, 2012Date of Patent: January 28, 2014Assignee: Affymetrix, Inc.Inventors: Martin J. Goldberg, Martin Diggelman, Earl A. Hubbell, Glenn H. McGall, Ngo Nam, MacDonald S. Morris, Melvin Yamamoto, Jennifer Tan, Richard Rava
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Patent number: 8637435Abstract: The present invention provides expression vectors and helper display vectors which can be used in various combinations as vector sets for display of polypeptides on the outer surface of eukaryotic host cells. The expression vector of the invention can be used alone for soluble expression without having to change or reengineer the display vectors. The display systems of the invention are particularly useful for displaying a genetically diverse repertoire or library of polypeptides on the surface of yeast cells, and mammalian cells.Type: GrantFiled: November 14, 2008Date of Patent: January 28, 2014Assignee: Merck Sharp & Dohme Corp.Inventors: Kevin Caili Wang, Peter Peizhi Luo, Pingyu Zhong, Jian Wang
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Patent number: 8637436Abstract: A biosensor array, system and method for affinity based assays that are able to simultaneously obtain high quality measurements of the binding characteristics of multiple analytes, and that are able to determine the amounts of those analytes in solution. The invention also provides a fully integrated bioarray for detecting real-time characteristics of affinity based assays.Type: GrantFiled: August 24, 2007Date of Patent: January 28, 2014Assignee: California Institute of TechnologyInventor: Arjang Hassibi
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Patent number: 8637437Abstract: The invention provides a lubricating composition containing an oil of lubricating viscosity, an additive containing a polymeric backbone and at least one amino group. The invention further provides for the additive to have dispersant and/or dispersant viscosity modifying properties. The lubricating composition is suitable for lubricating an internal combustion engine.Type: GrantFiled: November 10, 2008Date of Patent: January 28, 2014Assignee: The Lubrizol CorporationInventors: Matthew D. Gieselman, Christopher Friend, Adam J. Preston
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Patent number: 8637438Abstract: A lubricating oil composition for internal combustion engines comprising a base oil containing at least one component selected from an ?-olefin oligomer having 16 to 40 carbon atoms obtained by oligomerizing ?-olefin(s) having 2 to 20 carbon atoms using a metallocene catalyst, and the hydrogenated derivative thereof; an ?-olefin oligomer having 16 to 40 carbon atoms derived from an ?-olefin dimer obtained using a metallocene catalyst, and the hydrogenated derivative thereof; and the like. The lubricating oil composition has an excellent low-temperature fluidity, a low evaporativity, and a good oxidation stability.Type: GrantFiled: November 14, 2006Date of Patent: January 28, 2014Assignee: Idemitsu Kosan Co., Ltd.Inventor: Ryou Yamada
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Patent number: 8637439Abstract: Compositions adapted for use as a bathing (shower or bath) gel for personal cleansing are provided, the compositions containing reduced loadings of relatively harsh anionic surfactants and of fragrance oils, but retaining a spectrum of functional properties perceived by consumers as desirable. The compositions include lower concentrations of anionic surfactants compared to standard bathing gel compositions, but the addition of quantities of a long-chain alkyl, hydroxyalkyl cellulose derivative to the composition preserves or enhances functional properties such as viscosity, skin mildness, foam generation on lathering, subjective perceived cleansing appreciation, and fragrance performance. The bathing gels provide an environmental benefit such as reduced surfactant loading, biodegradability, and aquatic toxicity of wastewater streams when used in the place of standard bathing gels.Type: GrantFiled: December 16, 2010Date of Patent: January 28, 2014Assignee: Coty Inc.Inventors: Eva Vinas Sanz, Marta Queralt Lopez Salvans
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Patent number: 8637440Abstract: A personal cleansing composition includes a surfactant, a thickener, emulsifier and at least one particulate dispersed in the thickener, the at least one particulate being formed of a substantially biodegradable substance. The at least one particulare may include a soy meal based polymer. The soy meal based polymer is both stable and biodegradable. The at least one particulate includes a group of suspended particles added to mechanically scrub the skin of a user or used as a textural ingredient to modify the feel, spreadability or slip of a product. The soy meal based polymer is useful in personal cleansing compositions as an exfoliant, a scrub, a film former or as a filler. The half-life of the composition may be modified as necessary based on the shelf-life of the product.Type: GrantFiled: November 6, 2012Date of Patent: January 28, 2014Inventor: Kim Cervino
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Patent number: 8637441Abstract: The present invention discloses a non-foaming detergent, including a sodium alginate, an amylum, a sodium silicate, a citric acid, a sodium citrate, a sea salt, a sodium peroxyborate, a TAED and a borax. Herein, the non-foaming detergent further includes a sodium bicarbonate and a soapnut saponin. The preparation method of the non-foaming detergent comprises the following steps: mixing a sodium silicate and a sodium peroxyborate under stirring, mixing a soapnut saponin, a sodium alginate, an amylum, a sodium citrate, a sea salt, a sodium bicarbonate, a TAED and a borax under stirring, mixing such two mixtures, adding a citric acid therein and further mixing to obtain the non-foaming detergent. In the present invention, the prepared detergent has good solubility, strong activity at low temperature, high washing power and thorough detergency. Besides, the detergent is non-foaming and non-flavoring and the exhaust water during washing can be bio-degraded effectively.Type: GrantFiled: December 3, 2012Date of Patent: January 28, 2014Assignee: Newer World International Company LimitedInventor: Shu Feng Chen
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Patent number: 8637442Abstract: The present invention encompasses a surface treatment composition which comprises a polyorganosiloxane fluid-silicone resin mixture and a carrier. The polyorganosiloxane fluid-silicone resin mixture comprises about 2% to about 95%, by weight of the mixture, of one or more polyorganosiloxane fluid compounds; from about 1% to about 10%, by weight of the mixture, of one or more silicone resin, a protonation agent, at least about 5%, by weight of the mixture; of water; and optionally, less than about 5%, by weight of the mixture, of an emulsifier.Type: GrantFiled: September 20, 2011Date of Patent: January 28, 2014Assignee: The Procter & Gamble CompanyInventors: Xiaoru Jenny Wang, James Lee Danziger, David S. Salloum, Stephen Thomas Murphy, Markus Merget, Franz X. Wimmer, Richard Becker