Abstract: According to one embodiment, a production method for a mask layout of an exposure mask includes evaluating a candidate layout by comparison between an imaged image group and a reference image group. The imaged image group is composed of a plurality of imaged images of patterns formed by performing lithography under a plurality of levels of exposure condition using the candidate layout. The reference image group is composed of a plurality of reference images produced by simulation on assumption of a plurality of levels of the exposure condition.

Abstract: According to one embodiment, a light-reflective photomask including a circuit pattern area, and an outside area positioned outside the circuit pattern area includes a substrate, a low-reflectivity layer provided in both the circuit pattern area, and the outside area, formed on the substrate, including at least a conductive layer, and comprising a first reflectivity for deep ultraviolet light, a multilayer reflection layer provided in the circuit pattern area, and formed on the low-reflectivity layer, and a light-absorber provided in the circuit pattern area, formed on the multilayer reflection layer, including a circuit pattern, and comprising a second reflectivity for deep ultraviolet light. The first reflectivity is lower than or equal to the second reflectivity.

Abstract: A process for cleaning and restoring deposition shield surfaces which results in a cleaned shield having a surface roughness of between about 200 microinches and about 500 microinches and a particle surface density of less than about 0.1 particles/mm2 of particles between about 1 micron and about 5 microns in size and no particles less than about 1 micron in size and method for use thereof is disclosed.

Abstract: A deposition chamber shield having a stainless steel coating of from about 100 microns to about 250 microns thick wherein the coated shield has a surface roughness of between about 300 microinches and about 800 microinches and a surface particle density of less than about 0.1 particles/mm2 of particles between about 1 micron and about 5 microns in size and no particles below about 1 micron in size, and process for production thereof is disclosed.

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.

Abstract: A color filter is manufactured on each of a plurality of light-receiving elements of an RGB sensor using a plurality of kinds of light-transmitting films having different transmission colors. In such a case, the light-transmitting film that is to be coated next does not uniformly spread across the entire semiconductor wafer, and coating nonuniformities readily occur when a pattern of the light-transmitting film formed earlier on a certain optical element has a right angle portion. In order to solve this problem, the pattern of the light-transmitting film formed earlier has a planar shape having corner-cut portions so that right angle portions do not occur.

Abstract: The present invention relates to a positive photosensitive resin composition and a method for forming patterns by using the same. The positive photosensitive resin composition includes a novolac resin (A), an ortho-naphthoquinone diazide sulfonic acid ester (B), a hydroxycompound (C) and a solvent (D). The novolac resin (A) further includes a hydroxy-type novolac resin (A-1) and a xylenol-type novolac resin (A-2). The hydroxy-type novolac resin (A-1) is synthesized by condensing hydroxyl benzaldehyde compound with aromatic hydroxyl compound. The xylenol-type novolac resin (A-2) is synthesized by condensing aldehyde compound with xylenol compound. The postbaked positive photosensitive resin composition can be beneficially formed to patterns with high film thickness and well cross-sectional profile.

Abstract: A pattern forming method including: (i) a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a Resin (P) including a non-acid-decomposable Repeating Unit (b1) represented by a following General Formula (b1) and a repeating unit including a group capable of being decomposed by acid and generating a polar group, and a Compound (B) capable of generating an acid through irradiation of actinic rays or irradiation; (ii) a process of exposing the film using actinic rays or radiation with a wavelength of equal to or less than 200 nm; and (iii) a process of developing the exposed film using a developer including an organic solvent containing a hetero atom and carbon atoms having 7 or more carbon atoms to forming a negative tone pattern.

Abstract: A surface layer of the electrophotographic photosensitive member has a change region in which a ratio of the number of carbon atoms with respect to the sum of the number of silicon atoms and the number of carbon atoms gradually increases toward a surface side of the electrophotographic photosensitive member from a photoconductive layer side, wherein the change region has an upper charge injection prohibiting portion containing a Group 13 atom, and a surface-side portion which is positioned closer to the surface side of the electrophotographic photosensitive member than the upper charge injection prohibiting portion and does not contain the Group 13 atom, and the distribution of the Group 13 atom in a boundary portion between the surface-side portion and the upper charge injection prohibiting portion is precipitous.

Abstract: A positively chargeable single-layer electrophotographic photosensitive member includes a single-layer photosensitive layer. The single-layer photosensitive layer contains a charge generating material, a hole transport material, an electron transport material, and a binder resin. The electron transport material contains two or more compounds selected from the group consisting of compounds represented by the chemical formulas (1) to (4) below.

Abstract: An electrophotographic photoreceptor includes a cylindrical base and a photosensitive layer disposed on the cylindrical base. The photosensitive layer has a photoconductive layer disposed on the cylindrical base, a charge injection blocking layer disposed on the photoconductive layer, and a surface layer disposed on the charge injection blocking layer. The charge injection blocking layer contains at least one of nitrogen and oxygen, carbon, and a group 13 element. A content of the at least one of nitrogen and oxygen contained in the charge injection blocking layer is lower on a side of the surface layer than on a side of the photosensitive layer.

Abstract: An electrostatic latent image developing toner containing a plurality of toner particles, each including a binder resin and a release agent, is provided. The surface hardness of the toner particle, measured by a nanoindentation method, satisfies the following conditions (1) and (2): (1) The surface hardness of the toner particle attained with a displacement of 10 nm is 1 GPa or more and 3 GPa or less; and (2) the surface hardness of the toner particle attained with a displacement of 100 nm is 1 GPa or less.

Abstract: A two-component color developer containing a toner and a resin-coated carrier, the toner containing at least a polyester resin as a binding resin, an organic pigment as a colorant and inorganic fine particles as an external additive, wherein the inorganic fine particles have a negative polarity, the toner has a volume resistivity of 40×109 to 220×109 ?cm and a negative polarity, and the carrier has a coat durability of 90% or greater.

Abstract: Provided is a method for manufacturing carrier core particles for electrophotographic developer capable of stably maintaining high chargeability over a long time. The method for manufacturing carrier core particles includes a granulation step of granulating a mixture of raw materials containing manganese, iron, strontium, and calcium and a firing step of firing the mixture granulated in the granulation step. The firing step includes a heating process of heating the granular mixture with an increase in temperature to a predetermined degree and a cooling process of cooling the granular mixture, after the heating process, in an atmosphere with an oxygen concentration ranging from 5000 ppm to 20000 ppm. The molar ratio of the sum of strontium and calcium to the sum of the manganese, iron, strontium, and calcium is 0.0026 to 0.013.

Abstract: There is provided a liquid developer containing a toner that has a ratio G? (65)/G?(90) of a storage modulus G? (65) at 65° C. to a storage modulus G? (90) at 90° C. of from 1×103 to 1×105, and a carrier liquid that has a difference ?SP(tc) of SP value between the carrier liquid and the toner of from 1.5 to 7.0, and an image forming apparatus containing an electrostatic latent image holding member, a charging device, a latent image forming device, a developing device, a transfer device and a fixing device.

Abstract: There is provided a liquid developer containing a toner that has a ratio G?(65)/G?(90) of a storage modulus G?(65) at 65° C. to a storage modulus G?(90) at 90° C. of from 1×10 to 1×103, and a carrier liquid that has a difference ?SP(tc) of SP value between the carrier liquid and the toner of from 1.5 to 7.0, and an image forming apparatus containing an electrostatic latent image holding member, a charging device, a latent image forming device, a developing device, a transfer device and a fixing device.

Abstract: A particulate material production method is provided. The particulate material production method includes ejecting a particulate material composition liquid, which includes an organic solvent and a particulate material composition including at least a resin and dissolved or dispersed in the organic solvent, from at least one nozzle to form droplets of the particulate material composition liquid in a gas phase; and solidifying the droplets of the particulate material composition liquid to prepare particles of the particulate material composition. The droplet solidifying step includes contacting the droplets with a poor solvent for the particulate material composition.

Abstract: A photoresist composition including a binder resin including a novolac resin represented by Chemical Formula 1, a diazide photosensitive initiator, and a solvent including a base solvent and an auxiliary solvent, wherein the base solvent includes propylene glycol monomethyl ether acetate, and the auxiliary solvent includes dimethyl-2-methylglutarate and ethyl beta-ethoxypropionate, wherein in Chemical Formula 1, R1 to R9 are each independently a hydrogen atom or an alkyl group, “a” is an integer number from 0 through 10, “b” is an integer number from 0 through 100, and “c” is an integer number from 1 through 10.

Abstract: A composition provided to contain: an alkoxysilane condensate obtained by the condensation of alkoxysilane A represented by general formula (1): (CH3)Si(OR1)3 (In the general formula (1), R1 mutually independently represents methyl group or ethyl group.), alkoxysilane B represented by general formula (2): (Ph)Si(OR1)3 (In the general formula (2), R1 mutually independently represents methyl group or ethyl group.), and alkoxysilane C represented by general formula (3): (CH3)2Si(OR1)2 (In the general formula (3), R1 mutually independently represents methyl group or ethyl group.) at an A:B:C mole ratio within the range of 30-70:10-50:20-60; and a polyether-modified polydimethylsiloxane.

Abstract: Negative-working lithographic printing plate precursor a negative-working imageable layer and an outermost water-soluble overcoat layer that is disposed directly on the negative-working imageable layer. The outermost water-soluble overcoat layer comprises: (1) one or more film-forming water-soluble polymeric binders, (2) organic wax particles, and (3) non-wax matte particles. The outermost water-soluble overcoat layer has a dry thickness (t) that is defined by the following equation (I): t=w/r wherein w is the dry coverage of the outermost water-soluble overcoat layer in g/m2, and r is 1 g/cm3. The organic wax particles have an average largest dimension D(wax) that is less than 0.9 of t (in ?m), and the non-wax matte particles have an average largest dimension D(matte) that defined by the following equation (II): 1.5 times t?D(matte)?40 times t (in ?m).

Abstract: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units of cycloolefin having a hydroxyl group substituted with an acid labile group, an acid generator, and an organic solvent displays a high dissolution contrast and high etch resistance.

Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are a monovalent hydrocarbon group, R4 to R9 are hydrogen or a monovalent hydrocarbon group, R10 is a monovalent hydrocarbon group or fluorinated hydrocarbon group, A1 is a divalent hydrocarbon group, k1 is 0 or 1, and n1A is 0, 1 or 2. A resist composition comprising the polymer displays a high dissolution contrast during organic solvent development.

Abstract: An I-line photoresist composition, having excellent thermal stability at high temperature of 200-250° C., by which fine photoresist patterns form using an acid diffusion layer and a method for forming a fine pattern using the same, comprising: a polymer containing 1-99 mol % of repeating unit selected from a group consisting of 1-99 mol % of repeating unit represented by Formula 1, repeating unit represented by Formula 2, repeating unit represented by Formula 3 and mixture thereof; a photo active compound containing at least two diazonaphtoquinone (DNQ) groups; and an organic solvent. Formulas 1-3 are located in the specification. R* and R** are independently a hydrogen atom or a methyl group. R1 is a hydrogen atom or linear, branch or cyclic hydrocarbonyl group of 3-15 carbon atoms, containing or not containing 1-4 oxygen atoms. R2 is linear, branch or cyclic hydrocarbonyl group of 1-30 carbon atoms, containing or not containing 1-4 oxygen atoms.

Abstract: A copolymer includes the polymerized product of a comonomer and a monomer having the formula (I): wherein c is 0, 1, 2, 3, 4, or 5; Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently an unsubstituted or substituted C1-10 linear or branched alkyl group, an unsubstituted or substituted C3-10 cycloalkyl group, an unsubstituted or substituted C3-10 alkenylalkyl group, or an unsubstituted or substituted C3-10 alkynylalkyl group; wherein Rx and Ry together optionally form a ring; and Rz is a C6-20 aryl group substituted with an acetal-containing group or a ketal-containing group, or a C3-C20 heteroaryl group substituted with an acetal-containing group or a ketal-containing group, wherein the C6-20 aryl group or the C3-C20 heteroaryl group can, optionally, be further substituted. Also described are a photoresist including the copolymer, a coated substrate having a layer of the photoresist, and a method of forming an electronic device utilizing the photoresist.

Abstract: In the field of photolithography and, notably, photolithography in the extreme ultraviolet, a photolithography method is provided in which a first mask blank is produced that can have defects, an individual mapping of the positions of the defects of this mask blank is established using an inspection machine, and, for each defect, an exclusion zone is defined around the defect. Then, two complementary masks are produced, one with the first mask blank and with the desired design pattern, except in the exclusion zones, the latter being black, the other with a second mask blank and with the desired design pattern parts in the exclusion zones, all the rest of the second mask being black. The exposure of the surface to be processed by photolithography is done in two successive steps using the two complementary masks.

Abstract: Various techniques for patterning a substrate are disclosed. Specifically, implantation of the first species into an anti-reflective coating layer is contemplated to reduce stress in the layer that may be generated during the exposure stage or development stage. During these steps, the resist layer or the resist structure may under mechanical changes (e.g. shrinkage) while it is in contact with the anti-reflective layer. Such changes may introduce stress in the anti-reflective layer, which may contribute to excessive line edge roughness (LER) or line width roughness (LWR). By implanting the first species before, during, or after these steps, the stress in the anti-reflective layer may be avoided or compensated, and excessive LER or LWR may be avoided or reduced.

Abstract: A negative electrophoretic photoresist is applied over a plurality of protruding disposable template portions on a substrate. A silo structure is placed on planar portions of the negative electrophoretic photoresist that laterally surround the plurality of protruding disposable template portions. The negative electrophoretic photoresist is lithographically exposed employing the silo structure and a first lithographic mask, which includes a transparent substrate with isolated opaque patterns thereupon. After removal of the silo structure, the negative electrophoretic photoresist is lithographically exposed employing a second lithographic mask, which includes a pattern of transparent areas overlying the planar portions of the negative electrophoretic photoresist less the areas for bases of metal structure to be subsequently formed by electroplating. The negative electrophoretic photoresist is developed to form cavities therein, and metal structures are formed by electroplating within the cavities.

Abstract: A method of patterning a conductive polymer includes providing a conductive polymer layer coated over a first support followed by pattern-wise transferring a layer containing polyvinyl acetal from a second support onto the conductive polymer to form a mask with at least one opening. The masked conductive polymer is subjected to treatment through the opening that changes the conductivity of the conductive polymer by at least one order of magnitude in areas not covered by the mask.

Abstract: Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties.

Abstract: Embodiments of this invention relate generally to furnaces, particularly to furnaces with combustors utilizing fuel and oxidizer jets, more particularly to furnaces used for glass production, and further to glass container production. In one embodiment, a furnace comprises first and second opposing walls, the first wall including a fuel nozzle having a fuel nozzle centerline extending toward the second wall, and an oxidizer nozzle having an oxidizer nozzle centerline extending toward the second wall and an oxidizer jet boundary. The first and second opposing walls are separated by a wall separation distance L. In this embodiment, the fuel nozzle centerline intersects the oxidizer jet boundary at a crossing distance xc, whereby xc is at least L/20 and at most L/2. In further embodiments, xc is at least L/9 and at most L/6.

Abstract: A modular support system for outdoor radiant tube heaters includes a frame defined by hollow beams for receiving fuel and electrical lines and supporting electrical heaters posts for supporting the beams and saddles for interconnecting the beams and mounting them on posts.

Abstract: An attachment for a torch includes a combustion cone mounted on a fuel delivery tube. The combustion cone bounds a combustion chamber and has an inlet through which fuel from the tube enters the chamber to create a flame when the torch ignites the fuel. The cone diverges away from the inlet and to an outlet to enable the flame to diverge and spread within the chamber. The chamber substantially contains the flame therein. At least one apertured radiator, and preferably, a pair of apertured radiators, is mounted in the chamber in direct contact with the flame, and heated by the flame to a temperature sufficient to cause each radiator to radiate infrared radiation through and past the outlet. A tipping-resistant holder holds a fuel canister of the torch upright when placed on a support surface.

Abstract: Substrate heat treatment apparatus and method are provided. According to an embodiment of the present invention, there is provided a substrate heat treatment apparatus including an inner shell configured to form a substrate housing space to house at least one substrate, an outer shell configured to cover the inner shell, and having at least one gas hole, and at least one heater configured to heat the substrate, wherein the at least one gas hole is configured to allow a first gas to be injected into a space between the inner shell and the outer shell.

Abstract: A method of fabricating a reaction container according to the disclosure comprises putting graphite power in a molded member; and pressing the molded member, wherein the graphite powder comprises first graphite powder and second graphite powder having different particle sizes. A vacuum heat treatment apparatus comprises a chamber, a reaction container in the chamber, and a heat member heating the reaction container in the chamber, in which the reaction container comprises graphite, and the reaction container has a concentration in the range of 1.8 to 2.0.

Abstract: A method for orthodontic treatment includes defining a plurality of incremental tooth adjustment stages. Each tooth adjustment stage includes an incremental change in an alignment of at least one tooth. The tooth adjustment stages include a final stage. For one of the stages prior to the final stage, the method includes sequentially utilizing a plurality of orthodontic appliances, each appliance having identical tooth geometries configured to the stage, wherein a final orthodontic appliance for the stage is a rigid tray configured to immobilize the tooth for a recuperation period.

Abstract: An orthodontic bracket for coupling an archwire with a tooth includes a bracket body that has an archwire slot adapted to receive the archwire. A movable member is engaged with the bracket body and is movable between an opened position and a closed position. The bracket body and movable member are made from a transparent or translucent ceramic for improved aesthetics. The bracket body may include one or more stop surfaces that limit movement of the moveable member in the gingival direction. The bracket body may include a support surface that is positioned lingually of a labial edge of the archwire slot. The moveable member may include a bracket-engaging portion having a first surface confronting the bracket body and a slot-covering portion having a second surface confronting the archwire slot, the first and second surfaces being offset from one another.

Abstract: Mandibular attachment structure for use in an orthodontic assembly having a force member connecting the mandibular and maxillar portions of the assembly and method of using the same. The structure includes bands dimensioned to encircle corresponding lower molars on opposite sides of the tongue, and threadless couplers each of which is removably or releasably affixed to a buccal side of a corresponding band. Neither the structure nor the method requires the use of an orthodontic brace to maintain a pressing connection between the structure and the rest of an orthodontic assembly, but the use of orthodontic braces is accommodated. The pressing connection is maintained by cooperating a hook at the end of the force member and a hook at the end of a threadless coupler.

Abstract: The present disclosure relates to biteplates for use with various orthodontic remodeling devices, wherein the bite plate releases fluoride during use, thus encouraging remineralization on enamel. Additionally, bite plates with a colorant or color-changing matrix that serve as indicators for fluoride concentration are also described.

Abstract: Mandibular attachment structure, devoid of elastomeric member, for use in an orthodontic assembly having a force member connecting the mandibular and maxillar portions of the assembly and method of using the same. The structure includes bands dimensioned to encircle corresponding lower molars on opposite sides of the tongue, a single arched member connecting the bands and extending along a lingual side of the lower teeth, and threadless couplers each of which is affixed to a labial side of a corresponding band. Neither the structure nor the method require the use of an orthodontic brace to maintain a pressing connection between the structure and the rest of an orthodontic assembly. The pressing connection is maintained by cooperating a hook at the end of the force member and a hook at the end of a threadless coupler.

Abstract: A dental treatment apparatus is disclosed that may include a PTFE strip and at least one applicator tab attached to the PTFE strip wherein the applicator tab can be pulled away from the PTFE strip under the discretion of an operator. The applicator tab may comprise at least one adhesive surface limited to an area of the application tab which is used for attaching the application tab to the PTFE strip. The PTFE strip and the applicator tab may comprise varying shapes, widths, and lengths based on its desired application.

Abstract: The invention relates to a radiation source, in particular a light curing device, for the polymerization of dental materials, comprising a light conductor and a light generation device which has at least two light sources, preferably semiconductor light sources, in particular light diodes, and the radiation of which is bundled by a reflector and fed into the light conductor. The light sources differ from one another with respect to their light color and/or their emission spectrum and are controllable separately for changing the light color and/or the emission spectrum and/or the spectral radiant power of the radiation emitted. The light conductor has at least one monocore section and one multicore section wherein the radiation emitted by the light sources is fed into a monocore section of the light conductor. Further, the invention relates to a light-conducting device for a radiation source or a light curing device of this kind.

Abstract: Disclosed is a method for virtually designing the attachment of a manufactured dental model of a patient's set of teeth in a physical dental articulator by means of one or more kinds of spacer elements, where the method comprises: obtaining a virtual 3D dental model of the patient's set of teeth, where the virtual 3D dental model is provided by means of 3D scanning; providing a virtual dental articulator type corresponding to a physical dental articulator, where the dental articulator comprises an upper arm and a lower arm and has a known articulator height, which is the distance between the upper arm and the lower arm in the static position of the dental articulator; providing a minimum height of the dental model, where the height of the dental model is the height of an upper part and the height of a lower part of the dental model; providing one or more kinds of virtual spacer elements with predetermined heights, where each kind of virtual spacer element corresponds to a physical spacer element; determini

Abstract: Methods of making an impression of dental tissue and dental articles (e.g. suitable for dental impression) are described. In one embodiment, the method comprises providing a hardenable composition, comprising a resin system, a filler system, and an initiator system wherein the hardenable composition is a hardenable self-supporting material having sufficient malleability to be formed into a shape. The method further comprises placing said hardenable composition in contact with dental tissue such that an impression of at least a portion of the dental tissue is formed in the hardenable composition. The method further comprises curing the hardenable composition comprising the impression.

Abstract: A dental cutting system and method for cutting a patient's tooth includes a hand piece to be held and carrying a cutting burr to cut the patient's tooth. A plurality of guide pins is attached to and extends from the hand piece of the cutting tool remote from the cutting bur. One or more cutting guides each have a cavity coinciding with at least a portion of teeth inside a patient's mouth that are adjacent to or remote from the patient's tooth to be cut. The guide pins of the handpiece slide in slots in the cutting guide to guide the cutting burr to cut the patient's tooth.

Abstract: A dental handpiece and general implement rack is provided, along with a method of tracking implement use in a patient environment. The rack comprises a housing having a plurality of removable trays therein, the trays being adapted to support a dental implement thereon. Each tray includes a visual indicator that matches a marker placed on an implement being stored in that tray. The tray indicators are utilized to determine which implement has been utilized during the course of the day in order to implement sterilization procedures for only those implements that have been used on patients and are now unsterile. The device and associated method prevent sterilization by autoclave for implements that do not require cleaning, thereby extending their useful life and preventing over-cleaning thereof. The housing is preferably a wall-mountable structure having a hinged lid closure and a ventilated design to prevent moisture capture therein.

Abstract: A fatigue-resistant Nitinol instrument has a working portion in the deformed monoclinic martensitic state and an austenite finish temperature in the range of 40° to 60° C. Because the operating environment of the instrument is about 37° C., the working portion remains in the monoclinic martensitic state during its use. The relatively high austenite finish temperature and fatigue resistance is achieved by subjecting the nickel-titanium alloy to a final thermal heat treat in a temperature range of about 410° to 440° C. while the nickel-titanium alloy is under constant strain of about 3 to 15 kg. Further, the high austenite finish temperature is achieved without subjecting the alloy to thermal cycling to produce shape memory. Additionally, there are no intermediate processing steps occurring between obtaining a finished diameter of the wire or blank through cold working and the final thermal heat treat under constant strain.

Abstract: A matrix ring comprising includes a biasing ring and a pair of opposing tines. The biasing ring includes a substantially hoop-like configuration terminating at two opposing ends. The pair of opposing tines extend inwardly from each of the two ends of the biasing ring toward each other. Each of the pair of opposing tines is coupled to the respective opposing end about a central region thereof and extends radially outwardly therefrom. Each tine includes a frame body having a central ridge and opposing lower extensions, the lower extensions terminating at an exposed face. The portion of the lower extensions proximate the exposed face being able to move relative to the rest of the frame body so as to better position on the teeth of a patient. A superimposed pad over portions of the frame body provides a deformable surface for engagement with the surface of the tooth of a patient. In the Specification The opposing tines 14a, 14b are shown in FIG. 1.

Abstract: The present application relates to a fitting for insertion into a dental implant in an insertion orientation defining a central insertion axis (X) and an insertion direction (D) of the fitting. The fitting comprises at least one resilient spring member being expandable perpendicularly to the insertion axis (X) of the fitting for impeding a movement of the fitting relative to the dental implant along the insertion axis (X) when inserted into the dental implant. It further comprises an alignment feature for rotationally aligning the fitting relative to the dental implant about the insertion axis (X). The fitting is characterized in that the alignment feature extends further in the insertion direction (D) than the spring member.

Abstract: Endosseous dental implants and abutments for deterring tissue loss, such as loss of buccal bone, at the site of the implant/abutment. An exemplary implant may include longitudinally extending externally threaded and unthreaded regions each extending over only a circumferential portion of the external circumference of the implant. The implant may include an internal passage extending along the shaft having a frusto-conical region extending over only a circumferential portion of the internal passage. An exemplary abutment may include a distal connection end comprising a frusto-conical region thereat extending over only a circumferential portion of the external circumference of the connection end to provide a frusto-conical connection region and non-frusto-conical connection region.

Abstract: A system for attaching a natural tooth to a dental implant. The system comprises a dental prosthesis and an elastomeric cushion. The dental prosthesis has a first end and a second end. The first end is fixed to a natural tooth and the second end is engaged with a dental implant. The elastomeric cushion is positioned in contact, either directly or indirectly, with at least a portion of the dental implant and at least a portion of the dental prosthesis such that the elastomeric cushion permits movement of the second end relative to the dental implant in response to movement of the natural tooth transferred through the dental prosthesis to the second end.