Abstract: Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source.

Abstract: The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a lower layer, an interlayer and an upper layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 60 nm or less; the lower layer is made of a film containing a metal and has a first etching rate; the upper layer is made of a film containing a metal and has a third etching rate; the interlayer is made of a film containing the same metal as that contained in the lower layer or the upper layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the interlayer is 30% or less of the thickness of the entire light-shielding film.

Abstract: During a calculation technique, a modification to a reflective photo-mask is calculated. In particular, using information specifying a defect associated with a location on a top surface of the reflective photo-mask, the modification to the reflective photo-mask is calculated. For example, the calculation may involve an inverse optical calculation in which a difference between a pattern associated with the reflective photo-mask at an image plane in a photo-lithographic process and a reference pattern at the image plane in the photo-lithographic process is used to calculate the modification at an object plane in the photo-lithographic process. Note that the modification includes a material added to the top surface of the reflective photo-mask using an additive fabrication process. Moreover, the modification is proximate to the location.

Abstract: Provided are a photosensitive resin composition which is excellent in a moisture and heat resistance and provides a cured product thereof with a high elastic modulus at high temperature and which is excellent as well in a hollow structure holding property and a photosensitive film prepared by using the same, a forming method for a rib pattern, a hollow structure and a forming method for the same and an electronic component. In an electronic component having a hollow structure, a photosensitive resin composition is used as a rib material or a cover material for forming the hollow structure described above, and it is characterized by using a photosensitive resin composition containing (A) a photopolymerizable compound having at least one ethylenically unsaturated group and (B) a photopolymerization initiator and a photosensitive film obtained from the above photosensitive resin composition.

Abstract: A conductive pattern is formed using a reactive polymer comprising pendant tertiary alkyl ester groups, a compound that provides an acid upon exposure to radiation, and a crosslinking agent. A polymeric layer is patternwise exposed to form first exposed regions with a polymer comprising carboxylic acid groups that are contacted with electroless seed metal ions, and then contacted with a halide to form corresponding electroless seed metal halide. Another exposure converts electroless seed metal halide to electroless seed metal nuclei and forms second exposed regions. A reducing agent is used to develop the electroless seed metal nuclei in the second exposed regions, or to develop the electroless seed metal halide in the first exposed regions. Fixing is used to remove any remaining electroless seed metal halide. The electroless seed metal nuclei are then electrolessly plated in various exposed regions.

Abstract: Provided is an electrophotographic photoreceptor including a conductive substrate; a charge generating layer provided on the conductive substrate; a charge transporting layer provided on the charge generating layer; and an outermost surface layer provided on the charge transporting layer, wherein the charge transporting layer includes a charge transporting material and a polycarbonate copolymer having a solubility parameter as calculated by a Feders method of from 11.40 to 11.75, and the outermost surface layer includes a charge transporting material, fluorine-containing resin particles, and a fluorine-containing dispersant.

Abstract: A hydroxygallium porphyrazine derivative mixture including: a plurality of different hydroxygallium porphyrazine derivatives each represented by the following General Formula (A-2): where A1, A2, A3, A4, B1, B2, B3 and B4 each independently represent a nitrogen atom or a carbon atom bonded to hydrogen, with the proviso that both of A1 and B1 are carbon atoms each bonded to hydrogen or only one of A1 and B1 is a nitrogen atom, both of A2 and B2 are carbon atoms each bonded to hydrogen or only one of A2 and B2 is a nitrogen atom, both of A3 and B3 are carbon atoms each bonded to hydrogen or only one of A3 and B3 is a nitrogen atom, and both of A4 and B4 are carbon atoms each bonded to hydrogen or only one of A4 and B4 is a nitrogen atom.

Abstract: The present invention relates to a thermochromic color-memory toner containing: a microcapsule pigment encapsulating a thermochromic color-memory composition; and a binder resin, in which the microcapsule pigment shows a hysteresis characteristic that, in a temperature-rise process, decoloration starts when the temperature reaches t3 and the pigment completely reaches a decolored state in a temperature region of t4 or higher, and in a temperature-drop process, coloration starts when the temperature reaches t2 and the pigment completely reaches a colored state in a temperature region of ti or lower, and ti is in a range of from ?50 to 0° C. and t4 is in a range of from 50 to 150° C.

Abstract: A toner to develop electrostatic latent images, which has surface characteristics that may simultaneously improve charge uniformity, charge stability, transferability, and cleaning ability. The toner to develop electrostatic latent images may include core particles comprising a binder resin, a colorant, and a releasing agent; and an external additive including silica particles and titanium dioxide particles, wherein the external additive is attached to external surfaces of the core particles, wherein an iron intensity [Fe], a silicon intensity [Si], and a titanium intensity [Ti] that are measured by X-ray fluorescence (XRF) satisfy both conditions, 0.004?[Si]/[Fe]?0.009 and 0.8?[Ti]/[Fe]?2.

Abstract: A colorless transparent toner containing a crystalline resin having a urethane bond and/or a urea bond.

Abstract: An electrostatic-image developing toner contains a polyester resin prepared by addition reaction of a polycondensate of a carboxylic acid component and an alcohol component with an isocyanate-containing compound. The polycondensate has an active hydrogen group. The alcohol component includes a rosin diol represented by general formula (1): (wherein R1 and R2 are each independently hydrogen or methyl; L1, L2, and L3 are each independently a divalent linking group selected from the group consisting of carbonyl, carboxyl, ether, sulfonyl, optionally substituted linear alkylenes, optionally substituted cyclic alkylenes, optionally substituted arylenes, and combinations thereof; L1 and L2 or L1 and L3 are optionally taken together to form a ring; and A1 and A2 are rosin ester groups).

Abstract: An electrostatic latent image developer contains: an electrostatic-latent-image-developing toner that has toner particles formed by aggregating and fusing particles of a polyester resin, particles of a styrene resin and particles of a coloring agent in a starting material dispersion liquid of those particles dispersed in an aqueous solvent; and a carrier having a core particle and a resin coating layer to coat the surface of the core particle, wherein the ratio of the exposed area of the core particle to the surface of the carrier is about 7% or less.

Abstract: A toner including a crystalline polyester resin (A), an amorphous resin (B), and a composite resin (C) having a condensation polymerization resin unit and an addition polymerization resin unit is provided. A molecular weight distribution of the toner based on THF-soluble contents thereof has a main peak within a molecular weight range from 1,000 to 10,000 and a half bandwidth of the main peak is 15,000 or less. The molecular weight distribution is determined by gel permeation chromatography. The toner includes chloroform-insoluble contents. A ratio C/R of the toner is within a range from 0.03 to 0.55. C and R represent heights of spectrum peaks specific to the crystalline polyester resin (A) and the amorphous resin (B), respectively, determined by a Fourier transform infrared spectroscopic attenuation total reflection method after the toner is stored in a thermostatic chamber at 45° C. for 12 hours.

Abstract: An electrostatic charge image developing toner includes toner particles having a core that includes a block copolymer of a crystalline polyester block and an amorphous polyester block, and a shell that covers the core and includes an amorphous polyester resin having an ethylenically unsaturated double bond, and of which a surface layer part includes a crosslinked product of the amorphous polyester resin having an ethylenically unsaturated double bond.

Abstract: A toner including: toner base particles; and an external additive, the toner base particles each comprising a binder resin and a colorant, wherein the external additive comprises non-spherical particles and spherical particles, wherein the non-spherical particles are each a secondary particle in which spherical primary particles are coalesced together, and wherein the non-spherical particles and the spherical particles in the external additive satisfy a relationship expressed by the following formula (1): 3Ca(%)<Cb(%)??Formula (1) where Ca is greater than 10% but smaller than 20% and Cb is greater than 40% but smaller than 70%, and Ca and Cb are values given by: Ca = ( an ? ? amount ? ? of ? ? the ? ? non ? - ? spherical ? ? particles ? ? ( % ? ? by ? ? mass ) / 100 ) × ( a ? ? projected ? ? area ? ? of ? ? the ? ? non ? - ? spherical ? ? particles ? ? ( cm 2 ? / ? g ) ) ( an ? ? amount ? ? of ? ? the

Abstract: A toner containing toner particles, each of which contains a binder resin and a colorant, and silica particles, wherein the silica particles have a volume average particle diameter (Dv) of 70 nm or more and 500 nm or less, the variation coefficient of diameters of the silica particles, based on volume distribution thereof, is 23% or less, and wherein when the silica particles are heated from 105° C. to 200° C., the ratio of mass decrease is 0.60% or less.

Abstract: Disclosed are a toner and a preparation method thereof. The toner of the invention has honeycomb-shaped core-shell structured particles. The honeycomb-shaped core-shell structured particles comprise two or more core layers. Each core layer is completely covered by a shell layer.

Abstract: A process includes forming a filter cake from a slurry of emulsion aggregation toner particles and washing the filter cake with an alcohol to create porous toner particles.

Abstract: The present invention relates to a process for producing a toner for electrophotography which includes the step of fusing aggregated particles containing resin particles (A) and releasing agent particles in an aqueous mixed solution containing the aggregated particles and an anionic surfactant having a polyalkylene glycol moiety with an average molar number of addition of an alkylene oxide having 2 to 3 carbon atoms of from 5 to 100 after and/or while adjusting a pH value of the aqueous mixed solution to 2.0 to 6.0 as measured at 25° C., and a toner for electrophotography obtained by the process.

Abstract: A method for producing a developing agent including preparing a dispersion liquid containing first fine particles containing a binder resin and second fine particles containing a color developable compound, a color coupler, and a color eraser, and aggregating the first and second fine particles in the dispersion liquid to form aggregated particles.

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and at least two types of repeating units B1), (B2) that when acted on by an acid, are decomposed to thereby generate an alkali-soluble group, wherein the alkali-soluble group generated by the repeating unit (B1) is different from the alkali-soluble group generated by the repeating unit (B2).

Abstract: Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).

Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure, the component (B) including a compound represented by formula (b1), and the component (C) including at least one compound represented by formulas (c1) to (c3) (wherein Z1 represents a ring skeleton-containing hydrocarbon group, Q1 represents a divalent linking group containing oxygen, Y1 represents a fluorinated alkylene group, M+ represents an organic cation, R1 represents a fluorinated alkyl group or a hydrocarbon group, L1+ and L2+ represents a sulfonium or an iodonium, Z2 represents a hydrogen atom or a hydrocarbon group, Y2 represents a single bond or a divalent linking group containing no fluorine, R2 represents an organic group, Y3 represents an alkylene group or an arylene group; and Rf represents a fluorine-containing hydrocarbon group).

Abstract: A method for producing a semiconductor device includes the steps of: applying a composition for forming a resist underlayer film for EUV lithography including a novolac resin containing a halogen atom onto a substrate having a film to be fabricated for forming a transferring pattern and baking the composition so as to form a resist underlayer film for EUV lithography; and applying a resist for EUV lithography onto the resist underlayer film for EUV lithography, irradiating, with EUV through a mask, the resist underlayer film for EUV lithography and a film of the resist for EUV lithography on the resist underlayer film, developing the film of the resist for EUV lithography, and transferring an image formed in the mask onto the substrate by dry etching so as to form an integrated circuit device.

Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic ca

Abstract: A method of fabricating a substrate including coating a first resist onto a hardmask, exposing regions of the first resist to electromagnetic radiation at a dose of 10.0 mJ/cm2 or greater and removing a portion of said the and forming guiding features. The method also includes etching the hardmask to form isolating features in the hardmask, applying a second resist within the isolating features forming regions of the second resist in the hardmask, and exposing regions of the second resist to electromagnetic radiation having a dose of less than 10.0 mJ/cm2 and forming elements.

Abstract: A method for producing a through electrode includes providing a semiconductor wafer having an integrated circuit provided on a surface of the semiconductor wafer and a hole provided in the semiconductor wafer along a thickness direction of the semiconductor wafer. At least a portion of a back surface of an electrode of the integrated circuit is exposed through the hole. A positive photosensitive resin composition is sprayed to form a coating film so that the coating film covers an inner surface of the hole. The positive photosensitive resin composition has a viscosity of 0.5 to 200 cP and includes an alkali-soluble resin, a compound which generates an acid when exposed to light, and a solvent. At least a portion of the coating film is exposed and developed to form a coating film pattern.

Abstract: A method for patterning a layered structure is provided that includes performing photolithography to provide a developed prepattern layer on a horizontal surface of an underlying substrate, modifying the prepattern layer to form spaced apart inorganic material guides, casting and annealing a layer of a self-assembling block copolymer to form laterally-spaced cylindrical features, forming a pattern by selectively removing at least a portion of one block of the self-assembling block copolymer, and transferring the pattern to the underlying substrate. The method is suitable for making sub-50 nm patterned layered structures.

Abstract: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles and used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material.

Abstract: A method for manufacturing an electrode for a display apparatus includes printing and drying a conductive paste on a substrate, and printing a glass paste on the dried conductive paste, followed by patterning.

Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sulfonamide substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.

Abstract: A lithography method of manufacturing integrated circuits is disclosed. A combination photoalignment-photoresist layer is formed on a substrate. A treatment is performed on the combination photoalignment-photoresist layer. The combination photoalignment-photoresist layer is exposed to a predetermined pattern. The combination photoalignment-photoresist layer is developed to form a pattern and expose a portion of the substrate.

Abstract: Correction of reticle defects, such as EUV reticle defects, is accomplished with a second exposure. Embodiments include obtaining a reticle with a first pattern corresponding to a design for a wafer pattern, detecting dark defects and/or design/OPC weak spots in the first pattern, exposing a resist covered wafer using the reticle, and exposing the wafer using a second reticle with a second pattern or a second image field with openings corresponding to the dark defects, with a repair pattern on the reticle or on another reticle, or with a programmed e-beam or laser writer.

Abstract: The invention provides a patterning process comprises the steps of: (1) forming a positive chemically amplifying type photoresist film on a substrate to be processed followed by photo-exposure and development thereof by using an organic solvent to obtain a negatively developed pattern, (2) forming a silicon-containing film by applying a silicon-containing film composition comprising a solvent and a silicon-containing compound capable of becoming insoluble in a solvent by a heat, an acid, or both, (3) insolubilizing in a solvent the silicon-containing film in the vicinity of surface of the negatively developed pattern, (4) removing the non-insolubilized part of the silicon-containing film to obtain an insolubilized part as a silicon-containing film pattern, (5) etching the upper part of the silicon-containing film pattern thereby exposing the negatively developed pattern, (6) removing the negatively developed pattern, and (7) transferring the silicon-containing film pattern to the substrate to be processed.

Abstract: A developer composition for a printing plate containing (a) alkali metal salt of saturated fatty acid having carbon number of 12 to 18 and (b) alkali metal salt of unsaturated fatty acid having carbon number of 12 to 18 in a weight ratio of from 20:80 to 80:20 in terms of (a):(b). The developer composition may further contain an alkali agent (c). In this case, a weight ratio of (a):(b) may be from 20:80 to 80:20, and the alkali agent (c) may be contained in amount of 0.01 to 10 part(s) by weight to 100 parts by weight in total of the components (a) and (b).

Abstract: Presented is an airway organ bioreactor apparatus, and methods of use thereof, as well as bioartificial airway organs produced using the methods, and methods of treating subjects using the bioartificial airway organs.

Abstract: The present invention discloses a method for cryopreservation of human spermatozoa: the method comprises providing spermatozoa free from seminal liquid; mixing the spermatozoa with vitrification medium, wherein the main cryoprotectant agent is 0.1-0.3 M sucrose; placing the sample inside straws and rapidly freezing them; refrigerating the straws with no need of liquid N2; and devitrifying the sample in a medium of the present invention. The present invention furthermore discloses a portable kit that makes easy to implement the method, said kit comprising vitrification and devitrification solutions in the volumes required to develop the method and the physical support to carry out the same, i.e. the straws. The use of this kit is also disclosed for the treatment of disorders related to reproductive failures.

Abstract: There is provided mechanisms for the detection of an analyte in a sample. The mechanisms utilize at least a first measurement channel comprising a detection reactant corresponding to the analyte to be detected, and at least a microstructure associated with the first measurement channel. When the mechanisms are in use, the sample is introduced into the first measurement channel and propagated by way of the first measurement channel towards the microstructure. If the analyte is present in the sample, the analyte interacts with the detection reactant to form a networked product, and the microstructure is configured to filter the networked product.

Abstract: The invention relates to compositions and methods for isolation of microvesicles produced by mammalian cells. These microvesicles, known as extracellular microvesicles or circulating microvesicles, are isolated from sample materials such as body fluids, or from cell culture media that has been used to culture and maintain mammalian cells in vitro. The isolation of microvesicles as described herein results in purification and concentration of the microvesicles. The invention also provides related methods for producing blood serum and/or blood plasma that is free of detectable microvesicles, largely depleted of microvesicles, or has reduced concentration of microvesicles compared to the blood serum or blood plasma starting material (collectively termed “microvesicle-depleted”).

Abstract: Compounds, compositions and methods for the treatment of HIV/HSP/HPV, in particular, compositions and methods for a 3 part combination therapy for HIV/HSV/HPV, comprising a viral attachment inhibitor, a viral sequence integration inhibitor, and a proviral transcription inhibitor. The therapy is advantageous for the treatment of HIV infection, and is also effective for HSV and HPV infection. Also disclosed are novel viral attachment inhibitors and methods of use.

Abstract: Metal enhanced luminescence using alloy nanoparticles offers additional degrees of freedom for tuning their optical properties by altering atomic composition and atomic arrangement when compared to pure metal nanoparticles such as gold and silver. Surface plasmon resonance wavelengths of silver-copper nanoparticles were tuned in the visible and near infrared region by changing annealing temperature. Strong emission enhancement of luminophores at the vicinity of the Ag—Cu nanoparticles was shown when the SPR spectrum was tuned to produce maximum spectral overlap. As the SPR spectrum can be easily tailored, this platform can be effectively used to enhance luminescence of different luminophores.

Abstract: The invention relates to methods of depleting RNA from a nucleic acid sample. The RNA may be any RNA, including, but not limited to, rRNA, tRNA, and mRNA. The method is useful for depleting RNA from a nucleic acid sample obtained from a fixed paraffin-embedded tissue (FPET) sample. The method may also be used to prepare cDNA, in particular, a cDNA library for further analysis or manipulation.

Abstract: The present invention relates to methods and reagents for detecting analytes, e.g. nucleic acids. The new methods and reagents allow a simple and sensitive detection even in complex biological samples.

Abstract: In one aspect, the invention relates to a method for fixing a short nucleic acid in a biological sample. In another aspect, the invention relates to a method for detecting a target short nucleic acid in a biological sample. The method includes contacting the biological sample with an aldehyde-containing fixative, and subsequently contacting the sample with a water-soluble carbodiimide. In a further aspect, the invention relates to a kit for fixing a short nucleic acid in a biological sample. The kit includes a support substrate for holding the sample; an aldehyde-containing fixative; and a water-soluble carbodiimide.

Abstract: Disclosed is a method of determining KIR genotypes for one or more individuals in parallel, the method comprising: for each individual, amplifying the polymorphic exon sequences of the KIR genes, pooling the KIR amplicons, performing emulsion PCR followed by pyrosequencing in parallel to determine all the amplicon sequences present in the individual to determine which KIR alleles are present in the individual.

Abstract: The present invention is directed to compositions, methods and kits useful for the synthesis of nucleic acid molecules. More specifically, compositions, methods and kits are provided for the amplification of nucleic acid molecules in a one-step RT-PCR procedure comprising one or more agents used to increase tolerance to PCR inhibitors.

Abstract: The present invention describes methods for amplifying a target nucleic acid wherein target nucleic acids hybridize to capture probe nucleic acids which are immobilized to a support via their 5? end. The hybridization product is further extended with a polymerase to form a double stranded nucleic acid. To this double stranded nucleic acid, a hairpin nucleic acid is ligated. This ligation product is further amplified and sequenced.

Abstract: We disclose a method comprising: (a) providing an embryonic stem (ES) cell; and (b) establishing a progenitor cell line from the embryonic stem cell; in which the progenitor cell line is selected based on its ability to self-renew. Preferably, the method selects against somatic cells based on their inability to self-renew. Preferably, the progenitor cell line is derived or established in the absence of co-culture, preferably in the absence of feeder cells, which preferably selects against embryonic stem cells. Optionally, the method comprises (d) deriving a differentiated cell from the progenitor cell line.

Abstract: The present invention provides a method for controlling hair growth, a method for selecting or evaluating a hair growth control agent, and a hair growth suppression agent. The present invention provides a method for selecting or evaluating a hair growth control agent, including the steps of administering a test substance to a cell capable of expressing DnaJC6; measuring the expression of DnaJC6 in the cell; and evaluating the controlling effect of the test substance on hair growth based on the expression. The present invention also provides a hair growth suppression agent containing funabarasou (Cynanchum atratum) or its extract as the active ingredient.

Abstract: A method of diagnosing allergic asthma in patients, including the steps of: obtaining from a subject a first sample of peripheral blood immune cells and a second sample of peripheral blood immune cells; adding chitin to the first sample; measuring the average amount of IFN-? in both the first sample and the second sample to get a first value and a second value respectively; and dividing the first value with the second value to get a ratio, wherein if the ratio is smaller than a threshold value, the subject is diagnosed as an allergic asthma patient.