Abstract: Highly durable hydrophobic, oleophobic, and anti-icing coatings and methods of their preparation and use are described herein.

Abstract: A technique may include controlling a vacuum pump to evacuate a vacuum chamber to high vacuum; controlling a plasma spray device to deposit a coating on a substrate in the vacuum chamber using plasma spray physical vapor deposition; and controlling a source of a reactive gaseous species to introduce a controlled amount of the reactive gaseous species into the vacuum chamber during the plasma spray physical vapor deposition process. The reactive gaseous species may react with at least one constituent of the coating to form a dispersed phase in at least part of the coating.

Abstract: A process for manufacturing a high nitrogen stainless steel pipe material includes keeping an outside surface and/or an inside surface of an austenite stainless steel pipe material in contact with a substance that becomes a nitrogen (N) source, heating the steel pipe together with the nitrogen source substance at a temperature of 800° C. to 1100° C. in a range of temperatures not higher than the critical temperature for crystal grain enlargement of the steel pipe material to cause nitrogen to be absorbed into the surface of the pipe and diffused into the steel solid phase, and applying to the heat-treated pipe material annealing treatment in the range of temperatures in vacuum, inert gas including argon gas or an atmosphere of a gas with a reducing substance including H2 gas added thereto, to result in a decrease of nitrogen concentration gradient.

Abstract: The purpose of the present invention is to provide a nanostructured composite thin film showing low friction properties and a method for manufacturing same, and a member with low friction properties and a method for manufacturing same, wherein the thin film shows an exceptionally low value of friction coefficient but also shows high hardness and adhesion in comparison with conventional thin films, and the member has such a nanostructured composite thin film formed on the surface thereof. Provided, according to one aspect of the present invention, is a nanostructured composite thin film having low friction properties which has a composite structure in which a nitride phase comprising Zr and Al as a nitride component and at least one metallic phase are mixed, and has the size of a crystal grain in the range of 5 nm to 30 nm. Here, the nitride phase has a crystal structure of Zr nitride, and the metallic phase can comprise one or more selected from Cu and Ni.

Abstract: A deposition apparatus includes a chamber maintaining a vacuum atmosphere, a deposition material container within the chamber, the deposition material container containing a deposition material, a substrate fixing part that faces the deposition material container to fix a substrate, a mask fixing part on a first surface of the substrate, the mask fixing part including a plurality of magnets on the first surface of the substrate, a driving cam unit that reciprocates along a first direction, a following cam unit that reciprocates in a second direction crossing the first direction in accordance with a reciprocation direction of the driving cam unit, and a driving motor to supply a predetermined power to the driving cam unit, and a mask on a second surface of the substrate attachable to the substrate by a magnetic force of the plurality of magnets.

Abstract: A method is for depositing a dielectric material on to a substrate in a chamber by pulsed DC magnetron sputtering with a pulsed DC magnetron device which produces one or more primary magnetic fields. In the method, a sputtering material is sputtered from a target, wherein the target and the substrate are separated by a gap in the range 2.5 to 10 cm and a secondary magnetic field is produced within the chamber which causes a plasma produced by the pulsed DC magnetron device to expand towards one or more walls of the chamber.

Abstract: There is provided an inexpensive electromagnetic shield that can achieve exceptional shielding and display visibility characteristics, and provide high environmental resistance as necessary. In an electromagnetic shield (1), an intermediate layer (3) is formed on a glass substrate (2) comprising soda lime glass, an electroconductive layer (4) of Al is formed thereon, and openings (5) are formed by wet etching on the intermediate layer (3) and the electroconductive layer (4) after these layers have been formed by sputtering or vacuum deposition. Furthermore, an ITO layer (6) is formed on the entire glass surface including the intermediate layer (3) and the electroconductive layer (4) after the openings (5) are formed. In this configuration, the intermediate layer (3) comprises a mixture of at least one metal selected from chromium, molybdenum, and tungsten, and at least one oxide selected from oxides of silicon, oxides of aluminum, and oxides of titanium.

Abstract: In various embodiments, evaporation sources are heated and/or cooled via a fluid-based thermal management system during deposition of thin films.

Abstract: A laminate structure having an indium target with the occurrence of defects being well controlled and excellent in adhesion between the indium target and a backing tube is provided. A laminate structure of an indium target and a backing tube wherein a defect area ratio at an indium-backing tube interface is 5.0% or less.

Abstract: Methods of lowering the absorption losses of optical coatings at wavelengths shorter than 350 nm. During a deposition process of a metal oxide optical coating, dissociated hydroxide ion is added to the deposition process. The hydroxide ion source can be, for example, water vapor. By adding the hydroxide ion, a decrease in impurities and defects/dislocations in the optical coating is achieved.

Abstract: An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.

Abstract: Systems and methods are disclosed for improving optical spectrum fidelity of an integrated computational element fabricated on a substrate. The integrated computational element is configured, upon completion, to process an optical spectrum representing a chemical constituent of a production fluid from a wellbore. The systems and methods measure in situ a thickness, a complex index of refraction, or both of a film formed during fabrication to generate a predicted optical spectrum. The predicted optical spectrum is compared to a target optical spectrum. Revisions to a design of the integrated computational element are conducted in situ to improve optical spectrum fidelity relative to the target optical spectrum. Other systems and methods are presented.

Abstract: In various embodiments, evaporation sources for deposition systems are heated and/or cooled via a fluid-based thermal management system.

Abstract: A method of coating metallic powder particles includes disposing an amount of metallic powder particles in a fluidizing reactor and removing moisture adhered to the powder particles within the reactor with a working gas at an elevated temperature for a predetermined time. The method further includes coating the powder particles in the reactor with silicon present within the precursor gas at an elevated temperature for a predetermined time and purging the precursor gas from the reactor using the working gas.

Abstract: An article including a coating and a process including an article with a coating are disclosed. The article includes an aluminum-containing substrate including, by weight, at least 95% aluminum, and a coated and stabilized surface on the aluminum-containing substrate, the coated and stabilized surface being applied by thermal chemical vapor deposition at a temperature of less than 600° C. The process includes transporting fluid along a coated and stabilized surface positioned on an aluminum-containing substrate.

Abstract: Disclosed is a carbon thin-film device and method for manufacturing the same. The method includes forming a functional group on a surface of a substrate and functionalizing the substrate, and depositing a carbon thin film through ALD on the substrate in which the functional group is formed.

Abstract: The invention relates to a method for continuously manufacturing aligned nanostructures on a running support, which comprises conveying the support through a heated space and synthesising, in this space, aligned nanostructures on the support by catalytic chemical vapour deposition. The heated space is divided into n consecutive zones in the conveying direction of the support (n being an integer ?2), and the synthesis of the nanostructures results from heating and injection operations, in each of these n zones, of a flux of an aerosol containing a catalytic precursor and a source precursor of the material of the nanostructures to be formed, carried by a carrier gas. The injection operations are made by modifying, in at least two of the n zones, at least one parameter chosen among the flow rate of the carrier gas flux, the chemical composition of the carrier gas, the mass concentration of the catalytic precursor in the catalytic precursor and source precursor mixture.

Abstract: A plasma chamber includes a pedestal, an upper electrode, and an annular structure. The pedestal has a central region to support a wafer and a step region that circumscribes the central region. A sloped region circumscribes the step region, with the sloped region having a top surface that slopes downward from the step region such that a vertical distance between the inner boundary of the top surface and the central region is less than a vertical distance between the outer boundary of the top surface and the central region. The upper electrode is coupled to a radio frequency power supply. An inner perimeter of the annular structure is defined to circumscribe the central region of the pedestal when the annular structure is disposed over the pedestal, and a portion of the annular structure has a thickness that increases with a radius of the annular structure.

Abstract: A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.

Abstract: A thin film deposition device and a method of depositing thin film materials are disclosed. In one aspect, the thin film deposition device includes a deposition chamber configured to accommodate a substrate and a first chamber plate placed in the deposition chamber and configured to mount the substrate on a first surface thereof. The thin film deposition device also includes a second chamber plate placed in the deposition chamber on the opposite side of the first chamber plate with reference to the substrate. A plurality of recesses are formed on a surface of the second chamber plate facing the first surface of the first chamber plate such that gas flow is formed through the respective recesses.

Abstract: A system for depositing a layer on a substrate includes a processing chamber including a gas inlet, a plurality of gas flow controllers connected in fluid communication with a gas supply source, a gas distribution plate disposed between the plurality of gas flow controllers and the gas inlet, and a gas injection cap connected in fluid communication between the plurality of gas flow controllers and the gas distribution plate. The gas distribution plate defines a plurality of holes, and the gas injection cap defines a plurality of gas flow passages, each extending from an inlet connected to one of the gas flow controllers to an outlet connected in fluid communication with at least one of the holes in the gas distribution plate. Each of the gas flow controllers is disposed proximate to the gas injection cap.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a lower chamber having an opened upper side, an upper chamber opening or closing the upper side of the lower chamber, the upper chamber defining an inner space, in which a process is performed on a substrate, together with the lower chamber, a showerhead disposed on a lower portion of the upper chamber to supply a reaction gas toward the inner space, wherein a buffer space is defined between the showerhead and the upper chamber, a partition member disposed in the buffer space to partition the buffer space into a plurality of diffusion regions, and a plurality of gas supply ports disposed in the upper chamber to supply the reaction gas toward each of the diffusion regions.

Abstract: A substrate processing system includes a showerhead that comprises a base portion and a stem portion and that delivers precursor gas to a chamber. A collar connects the showerhead to an upper surface of the chamber. The collar includes a plurality of slots, is arranged around the stem portion of the showerhead, and directs purge gas through the plurality of slots into a region between the base portion of the showerhead and the upper surface of the chamber.

Abstract: A vertical heat treatment apparatus includes a plurality of gas supply pipes installed in one of left-right-half regions of a reaction vessel and configured to supply a process gas to division regions obtained by dividing a processing region; an exhaust opening formed in a wall of the reaction vessel in the other of the left-right-half regions; and a vacuum exhaust path in communication with the exhaust opening. The plurality of gas supply pipes are installed to extend from an inner wall portion of the reaction vessel at a position lower than the processing region. At least one of the gas supply pipes includes a bent portion formed by bending downward a leading end portion that is extended upward, and a plurality of gas discharge holes are formed at a downstream side from the bent portion.

Abstract: Provided is an apparatus for processing a substrate. The apparatus includes a chamber providing an inner space in which a process with respect to the substrate is performed, a susceptor disposed in the inner space and on which the substrate is placed, a fixing plate disposed in an exhaust port disposed in a sidewall of the chamber along a circumference of the susceptor, the fixing plate having a plurality of through-holes, and at least one sliding plate disposed on an upper or lower portion of the fixing plate to rotate with respect to a center of the susceptor, the at least one sliding plate selectively opening and closing the through-holes.

Abstract: A deposition system which is configured to enable improved temperature uniformity of a heated substrate may include a susceptor provided in a chamber to hold a substrate, a reflection housing provided outside the chamber, a heating module including light sources provided in the reflection housing, and a reflection control module provided in the reflection housing between the heat sources and the chamber. The reflection control module may be configured to reflect light, which propagates along a first trajectory from the light sources toward a center region of the substrate, to propagate along a second trajectory toward an edge region of the substrate, thereby providing improved substrate irradiance uniformity and thus improved substrate temperature uniformity. Improved substrate temperature uniformity may result in improved thickness uniformity of layers provided on the substrate in a deposition process.

Abstract: The invention relates to a device for treating a surface by moving the device over the surface in a treatment direction, which device includes a number of treatment elements arranged in at least one row. The treatment elements within a row are parallel to each other. The longitudinal axis of each treatment element has at least, in use, a directional component parallel to the treatment direction.

Abstract: A method and apparatus are provided for plasma-based processing of a substrate based on a plasma source having at least two adjacent electrodes positioned with the long dimensions parallel to define a first minimum gap between the two electrodes of from 5 millimeters to 40 millimeters. A second minimum gap is defined between the two electrodes and the substrate. AC power is provided to the two electrodes through separate electrical circuits from a common supply with a phase difference therebetween. A first gas and a second gas are injected into the plasma-containing volume between the two electrodes at different positions relative to the substrate. A lower electrode with a lower electrode width that is less than the combined width of the two electrodes is powered from a separately controllable AC power supply at an AC frequency different from that supplied to the two electrodes.

Abstract: Embodiments of the present invention provide apparatus and methods for performing UV treatment and chemical treatment and/or deposition in the same chamber. One embodiment of the present invention provides a processing chamber including a UV transparent gas distribution showerhead disposed above a substrate support located in an inner volume of the processing chamber, a UV transparent window disposed above the UV transparent gas distribution showerhead, and a UV unit disposed outside the inner volume. The UV unit is configured to direct UV lights towards the substrate support through the UV transparent window and the UV transparent gas distribution showerhead.

Abstract: An underlayer is formed to cover the upper surface of a substrate and a guide pattern is formed on the underlayer. A DSA film constituted by two types of polymers is formed in a region on the underlayer where the guide pattern is not formed. Thermal processing is performed while a solvent is supplied to the DSA film on the substrate. Thus, a microphase separation of the DSA film occurs. As a result, patterns made of the one polymer and patterns made of another polymer are formed. Exposure processing and development processing are performed in this order on the DSA film after the microphase separation such that the patterns made of another polymer are removed.

Abstract: A method of forming a wiring pattern includes: a) forming a metal underlayer including a first underlying wiring layer which is in contact with an electrode, a second underlying wiring layer which is not in contact with the electrode, and an underlying connection layer which connects the first underlying wiring layer to the second underlying wiring layer; b) forming a metal plating layer on the metal underlayer through electroplating; and c) removing a metal connection portion through etching. The metal connection portion is the underlying connection layer covered with the metal plating layer. The etching includes bringing a solid electrolyte material that contains a solution into which metal of the metal connection portion is dissolved, into contact with the metal connection portion and applying a voltage between the metal connection portion and the solid electrolyte material.

Abstract: A manufacturing method for steel sheets for containers produces steel sheets with excellent film adhesion qualities. This steel sheet for containers has, on a steel sheet, a chemical conversion coating with a metal Zr content of 1-100 mg/m2, a P content of 0.1-50 mg/m2, and an F content of no more than 0.1 mg/m2, upon which is formed a phenolic resin layer with a C content of 0.1-50 mg/m2. Moreover, the manufacturing method for steel sheets for containers is a method for obtaining the steel sheet for containers wherein the chemical conversion coating is formed on the steel sheet by subjecting the steel sheet to immersion in or electrolytic treatment with a treatment solution containing Zr ions, phosphoric acid ions, and F ions; and subsequently, the steel sheet upon which the chemical conversion coating has been formed is immersed in, or undergoes topical application of, an aqueous solution containing phenolic resin, then dried.

Abstract: A composition including from 35 to 85% by weight based on the weight of the composition of a high-heat amorphous polymeric material, having a glass transition temperature of at least 180 degrees Celsius, from 10 to 50% by weight based on the weight of the composition of a filler selected from glass fiber, glass flake, flat glass fiber, glass bead, and combinations thereof; and from 0 to 10% by weight of composition of at least one additive selected from a flow promoter, a thermal stabilizer, a mold release agent, and combinations thereof. Products including the composition, such as a hard disc drive enclosure.

Abstract: A surface-treated steel sheet and a process for its production. The surface-treated steel sheet has, on at least one surface of the steel sheet, a surface-treating layer that chiefly comprises zirconium and oxygen, and contains fluorine, the surface-treating layer containing an element of the Group II on the surface side thereof. The surface-treated steel sheet features excellent adhesion to the organic resin coating, excellent corrosion resistance, and can provide metal cans that feature excellent adhesion to the resin on the inner and outer surfaces of the cans and excellent resistance against the elution of fluorine.

Abstract: A component for high temperature applications includes a substrate and a layer of an aluminum-containing MAX phase material and another material applied to the substrate.

Abstract: A method for forming a hybrid structure is provided. The method includes applying a sealant to a first component fabricated from a first material, coupling an isolation sheet to the sealant, and coupling a second component to the isolation sheet. The isolation sheet and the second component are fabricated from a second material that is different than the first material to facilitate preventing formation of a galvanic cell within the hybrid structure.

Abstract: The invention relates to a method for improved corrosion inhibition of metal in a system, in which system the metal is in contact with water, and a corrosion inhibitor inhibits a corrosion of the metal, wherein a voltage is applied between the metal and an auxiliary electrode, which voltage changes time-dependently after being switched on and before being switched off within a passivation region of the metal in said corrosion inhibitor, the passivation region being a region of voltage in which the corrosion inhibitor effects an inhibition of corrosion of the metal.

Abstract: Methods and systems are provided for treating oxide scale on the surface of a metal object. In one embodiment, a system temperature control apparatus controls the temperature of metal object's surface to an application temperature below the Leidenfrost temperature point of an alkali metal hydroxide aqueous conditioning solution. An application apparatus wets the metal object's surface at the controlled temperature with a thin layer of the solution that engages the oxide scale, and a heating apparatus heats the wetted surface to a final conditioning temperature above a melting point of the alkali metal hydroxide by an additional value selected to effect conditioning of the oxide scale at a reasonable but not excessive rate by the melting alkali metal hydroxide reacting with the oxide scale. The system terminates additional conditioning to prevent creation of additional oxide scale beyond the conditioned depth.

Abstract: A device having a water vapor microelectrolyzer cell including microstructured parallel electrodes where the water splitting reactions can take place, the microstructured electrodes being covered by a thin layer of solid-state ion conducting material to allow for the conduction of protons during the device operation, while permitting the diffusion of water from the vapor phase into the electrodes, as well as the diffusion of evolved oxygen and hydrogen gases from the electrodes into the vapor phase environment above the ion-conductor film.

Abstract: A catalyst, including a conductive substrate coated with a metal-phosphorus-derived film, where the metal is Manganese, Iron, Cobalt, Nickel, or Copper. In some embodiments, the conductive substrate includes copper, titanium, glassy carbon, fluorine-doped tin oxide, indium-doped tin oxide, tin, nickel, or stainless steel. Methods for producing the catalysts and for hydrogen evolution reactions and oxygen evolution reactions employing the catalysts are also described herein.

Abstract: An assembly of a porous gas-evolving electrode and a porous separator diaphragm, suitable for use in a water electrolyser operating with an alkaline electrolyte is disclosed. A water electrolyser having the gas-evolving electrode component of the assembly arranged as the cathode allows manufacturing hydrogen with a purity exceeding 99.8%.

Abstract: Selective electropolymerization of conducting polymers using a hydrogel stamp is disclosed. The ability of this simple method to generate patterned films of conducting polymers with multiple surface chemistries in a single-step process and to incorporate biomolecules in these films is further described.

Abstract: Described here is a method for improving the catalytic activity of an electrocatalyst, comprising subjecting the electrocatalyst to 1-10 galvanostatic lithiation/delithiation cycles, wherein the electrocatalyst comprises at least one transition metal oxide (TMO) or transition metal chalcogenide (TMC). Also described here is an electrocatalyst and a water-splitting device comprising the electrocatalyst.

Abstract: Provided is high purity Indium having a purity of 7N (99.99999%) or higher, and containing 0.05 ppm or less of Pb, 0.005 ppm or less of Zn, and 0.02 ppm or less of S. A method of producing high purity In, wherein SrCO3 is added to an electrolyte upon performing electrolytic refining using 5N (99.999%) In to reduce Pb, Zn and S to attain a purity of 7N (99.99999%) or higher. Under circumstances where In demands for LED, such as InGaN and AlInGaP, are anticipated, it is necessary to produce indium in mass quantities and inexpensively, and the present invention provides technology capable of achieving the same.

Abstract: A mask manufacturing method, including manufacturing a first mold, including forming first patterns having inclined surfaces by patterning a silicon substrate; manufacturing a second mold, including forming second patterns that correspond to the first patterns by coating and curing a hardener on a surface of the first mold in which the first patterns are formed; separating the second mold from the first mold; forming a mask pattern by coating a metal layer on the second mold; and separating the metal layer from the second mold.

Abstract: A coated article (22) comprises a substrate (100) and a coating system (102) atop the substrate. The coating system has a nickel-based first layer (104) and a chromium-based second layer (108) atop the first layer.

Abstract: A method is proposed for producing a cylinder working surface of an internal combustion engine that is optimized in terms of friction and wear.

Abstract: A plated fiber that is obtained by applying a metal plating onto a fiber having an elongation percentage which is more than or equal to 1% and less than or equal to 10%. An elongation percentage of the metal plating is higher than the elongation percentage of the fiber. A carbon fiber wherein the surface oxygen amount as a value obtained by dividing an O1S peak intensity measured by X-ray photoelectron spectroscopy by a C1S peak intensity measured by the spectroscopy is more than or equal to 0.097 and less than or equal to 0.138.

Abstract: Anodizing processes for providing durable and defect-free anodic oxide films, well suited for anodizing highly reflective surfaces, are described. In some embodiments, the anodizing electrolyte has a sulfuric acid concentration substantially less than conventional type II anodizing. In some embodiments, the electrolyte includes a mixture of sulfuric acid and one or more organic acids. In further embodiments, sulfuric acid is a relatively minor additive to an organic acid, primarily serving to minimize discoloration. The processes enables porous, optically clear, and colorless anodic films to be grown in a manner similar to conventional Type II sulfuric acid anodizing, but at lower current densities and/or higher temperatures, without compromising film surface hardness. The thickness uniformity of the resulting anodic oxide films can be within 5% between grains of {111}, {110} and {100} surface orientations.

Abstract: The present invention is related to a method for the production of single crystalline TiO2 flakes in the rutile crystal structure, to single crystalline TiO2 flakes obtained by this method as well as to the use thereof, especially as pigments in several application media.