Abstract: The present disclosure describes a display system including a liquid crystal display panel and a light source emitting light capable of emitting light. A nonwoven diffuser element is disposed between the light source and the liquid crystal display panel. The polymeric nonwoven diffuser is non-orientated and has a fiber diameter of less than 50 micrometers, a fiber aspect ratio of length/diameter of greater than 5 and a basis weight in a range from 10 to 80 grams/meter2.

Abstract: A display may have a liquid crystal layer sandwiched between a thin-film transistor layer and a color filter layer. An upper polarizer may be placed on top of the thin-film transistor layer. A lower polarizer may be placed under the color filter layer. Components may be bonded to bond pads on the inner surface of the thin-film transistor layer using anisotropic conductive film. Bond quality may be assessed by probing probe pads that are coupled to the bond pads or by visually inspecting the bond pads through the thin-film transistor layer. Opaque masking material in the inactive area may be provided with openings to accommodate the bond pads. Additional opaque masking material may be placed on the underside of the upper polarizer and on the upper surface of the thin-film transistor layer to block the openings from view following visual inspection.

Abstract: A liquid crystal display panel includes two base substrates disposed spaced apart from each other, a pixel, and at least one polarizer. The liquid crystal display panel includes a transmitting area and a light blocking area disposed adjacent to the transmitting area. The polarizer includes a reflection part overlapped with the light blocking area and a polarization part overlapped with the transmitting area. The polarization part includes lyotropic chromonic liquid crystal dye molecules aligned in a predetermined direction.

Abstract: The present invention discloses a glossy display substrate and a glossy display apparatus. Reflective area and transmissive area are formed on the glossy display substrate. The glossy display substrate comprises an underlayer as well as a first control unit, a reflection layer and a second control unit arranged above the underlayer. The first control unit and the reflection layer are arranged in the reflective area, and the second control unit is arranged in the transmissive area.

Abstract: A display device includes a reflective base member, a first light polarizing film disposed on the surface of the base member, a light source, a second light polarizing medium receiving light from the light source and emitting polarized light towards the first light polarizing film, a birefringence medium positioned between the second light polarizing medium and the first light polarizing film, and means for changing the direction of polarization of the second light polarizing means.

Abstract: A FIPEL device used as an illuminating part for a display.

Abstract: A method and apparatus for effectively controlling light propagation are presented. The apparatus includes a muntin having reflective walls arranged to form a plurality of openings, and a cavity sheet disposed on the muntin. The muntin is configured to assemble with an array of light sources. The cavity sheet has a plurality of pinholes and is configured to assemble with the muntin such that the reflective walls align with areas between the pinholes. The light sources, the muntin, and the cavity sheet form light mixing cavities and light sources within each light mixing cavities may be individually controlled. The light mixing cavities allow generation of localized and uniform light.

Abstract: A lighting device including a circuit substrate; a plurality of light sources disposed on the circuit substrate; a reflection layer disposed on the circuit substrate, the reflection layer comprising a plurality of openings where respective light sources are located; a plurality of absorbers disposed at an edge of the reflection layer and at an inclination with respect to the reflection layer, wherein the plurality of absorbers have a greater density at first areas aligned with the respective light sources than at second areas between the first areas; and an optical sheet disposed on the light sources.

Abstract: A condensing sheet includes a light output unit that has a plurality of lenses, and a light input unit that faces the light output unit and includes a light penetration unit and a light reflection unit. The light reflect ion unit has a structure including a recess sinking toward the light output unit and a reflector received in the recess.

Abstract: A liquid crystal display device has a liquid crystal display panel including pixels each having an active device, a pixel electrode, a common electrode and a liquid crystal layer arranged in a dot matrix array. The liquid crystal display panel has a first substrate, a second substrate, and a liquid crystal layer provided between the first substrate and the second substrate. The first substrate has the active device, the pixel electrode, the common electrode and a first alignment film. The second substrate has a second alignment film. The first alignment film and the second alignment film are respectively a photo alignment film formed by irradiating a photo decomposition type insulating film with light. The second alignment film has a thickness of at least 10 nm and no greater 50 nm and is thinner than the first alignment film.

Abstract: A liquid crystal device including: a first substrate, the first substrate being transparent; a second substrate disposed opposite the first substrate, the second substrate being transparent; a liquid crystal layer provided between the first substrate and the second substrate, the liquid crystal layer including liquid crystal molecules; an alignment film with alignment treatment such that the liquid crystal molecules align, the alignment film being provided on a surface of the first substrate, the surface facing the liquid crystal layer; and pillar spacers provided on the alignment film, wherein the alignment treatment is applied to the alignment film except at least a part of area in which each of the pillar spacers overlaps with the alignment film.

Abstract: Embodiments relate to a liquid crystal display and a manufacturing method thereof, and more particularly, to a liquid crystal display including an alignment layer pattern and a manufacturing method thereof. The liquid crystal display includes a lower panel including a first alignment layer and a signal line. An upper panel faces the lower panel and uncovers an end portion of the signal line of the lower panel. A sealant is positioned between the lower panel and the upper panel and couples the lower panel and the upper panel with each other. The first alignment layer includes a coated region positioned between a first removed region overlapping the end portion of the signal line and a second removed region overlapping the sealant. The first alignment layer does not exist in the first removed region and the second removed region.

Abstract: The number of photolithography steps used for manufacturing a transistor is reduced to less than the conventional one and a highly reliable semiconductor device is provided. The present invention relates to a semiconductor device including a circuit including a transistor having an oxide semiconductor layer over a first substrate and a second substrate fixed to the first substrate with a sealant. A closed space surrounded by the sealant, the first substrate, and the second substrate is in a reduced pressure state or filled with dry air. The sealant surrounds at least the transistor and has a closed pattern shape. Further, the circuit is a driver circuit including a transistor having an oxide semiconductor layer.

Abstract: The following semiconductor device provides high reliability and a narrower frame width. The semiconductor device includes a driver circuit and a pixel portion. The driver circuit has a first transistor including a first gate and a second gate electrically connected to each other with a semiconductor film sandwiched therebetween, and a second transistor electrically connected to the first transistor. The pixel portion includes a third transistor, a liquid crystal element, and a capacitor. The liquid crystal element includes a first transparent conductive film electrically connected to the third transistor, a second conductive film, and a liquid crystal layer. The capacitor includes the first conductive film, a third transparent conductive film, and a nitride insulating film. The nitride insulating film is positioned between the first transparent conductive film and the third transparent conductive film, and positioned between the semiconductor film and the second gate of the first transistor.

Abstract: A display panel comprises a first substrate, a second substrate opposite to the first substrate, and a display medium layer disposed between the first and second substrates. The first substrate comprises a conductive layer formed on the first base plate and extending along a first direction. Along the first direction, the conductive layer comprises a first plane correspondingly at a first height, a tilted plane, and a second plane correspondingly at a second height in sequential order. The first height is greater than the second height. A position of the first plane adjacent to the tilted plane of the conductive layer has a first line width along the second direction. A position of the tilted plane adjacent to the second plane of the conductive layer has a second line width along the second direction. The first line width is shorter than the second line width.

Abstract: Provided is a liquid crystal display device having excellent viewing angle characteristics and high contrast in a display mode using both a vertical electric field and a horizontal electric field. This liquid crystal display device is provided with a first substrate and a second substrate disposed facing each other, and a liquid crystal layer held between said first and second substrates. The liquid crystal layer contains liquid crystal molecules having a negative dielectric anisotropy. The first substrate is provided with a flat plate first electrode, a first insulating layer, and a second electrode provided in a layer other than that of the first electrode and provided separated from the first electrode by the first insulating layer. The second electrode has multiple comb-tooth sections and multiple slits, and the second substrate has a flat plate third electrode.

Abstract: To provide a display device with little signal delay and a display device that can operate with low power consumption, parasitic capacitance between a common wiring that applies a common potential to a plurality of pixels and signal lines that input signals for driving the pixels is avoided. Specifically, the common wiring is routed outwardly with respect to an external input terminal to which a signal is input from the, outside, to avoid intersections of the signal lines and the common wiring. Thus, parasitic capacitance between the common wiring and the signal lines is avoided, so that the display device can operate at high speed with low power consumption.

Abstract: A liquid crystal (LC) lens comprises a first substrate, a first electrode structure, an electrically tunable LC layer structure, a second substrate and a second electrode structure, wherein the electrically tunable LC layer structure is arranged between the first substrate and the second substrate. The electrically tunable LC layer structure includes at least two LC layers stacked on top of one another, and each LC layer further includes at least one LC unit. In the stacked structure, at least one of the LC layers includes at least one partition unit to partition the LC layer into one or more LC units. The layout of the LC units of the upper LC layer differs from that of the lower LC layer. In the present invention, the shape and layout of the LC units are designed to provide better optical performance without changing the thickness of the liquid crystal lens.

Abstract: To prevent or inhibit, a spacer section from coming close to the array substrate inside each of pixels, a liquid crystal display includes an auxiliary wiring provided to project toward the side of the opposite substrate from a surface of the array substrate, and the spacer section provided to project toward the side of the array substrate from a surface of the opposite substrate. The auxiliary wiring is arranged within a region provided with an extension portion in a liquid shielding section, and extends in an X-axis direction in a plan view, and a length in a Y-axis direction of the spacer section is larger than a width in the X-axis direction of the spacer section. The spacer section crosses the auxiliary wiring in a crossing region where the extension portion and an extension portion cross each other in a plan view.

Abstract: A liquid crystal display includes: a first substrate; a gate line and a data line disposed on the first substrate; a passivation layer disposed on the gate line and the data line; a first electrode and a second electrode disposed on the passivation layer; and a first insulating layer interposed between the first and second electrodes, where the first and second electrodes overlap each other via the first insulating layer, the second electrode includes a plurality of branch electrodes, and an end portion of the plurality of branch electrodes includes a first side portion and a second side portion extending parallel to the data line, and an oblique portion which connects the first side portion and the second side portion to each other and forms a first angle of less than 90 degrees with an extending line of the first side portion.

Abstract: Embodiments of the disclosure provide a manufacturing method of a TFT array substrate, a TFT array substrate and a display device. The method comprises steps of: S1. forming a thin film transistor on a base substrate; S2. forming a passivation layer thin film on the base substrate after the step S1; S3. forming a passivation layer via hole and a light-shielding pattern on the base substrate after the step S2; and S4. forming a color filter layer and a pixel electrode on the base substrate after the step S3. The pixel electrode is electrically connected to a drain electrode of the thin film transistor through the passivation layer via hole, and the color filter layer is in correspondence with a position of the pixel electrode.

Abstract: A liquid crystal display device includes: a first substrate including a first light blocking region where a plurality of transistors are formed and a second light blocking region where a data line is extended in a vertical direction; a first color filter and a second color filter formed on the first substrate; a second substrate facing the first substrate and having a common electrode formed thereon; and a liquid crystal layer interposed between the first and second substrates, wherein the first and second color filters are spaced apart from each other in an intersection region of the first and second light blocking regions and are overlapped with each other in the second light blocking region other than the intersection region to form a color filter overlapped part in the vertical direction.

Abstract: A process for manufacturing an electrochemically active device comprising the steps of: —providing a substrate (110) comprising an electrode receiving surface portion (111) having substantially constant wetting tension throughout said electrode receiving surface portion, —providing a plurality of first electrodes (120) directly on said electrode receiving surface portion, —leaving intermediate portions (130) of said electrode receiving surface portion (111) free from said electrodes, —providing a layer of electrolyte (140) covering said plurality of first electrodes (120) and said intermediate portions (130), and—wherein wetting tension of the surfaces of the intermediate portions (130) is arranged to act more repelling on the electrolyte compared to the wetting tension of the surfaces of the plurality of first electrodes (120), whereby, the electrolyte is concentrated to the surfaces of the plurality of first electrodes (120), and the surfaces of the intermediate portions (130) are substantially free of elec

Abstract: Provided are an electrochromic mirror and a method of manufacturing the same, the electrochromic mirror including: a first substrate and a second substrate facing each other; and an electrochromic layer interposed between the first substrate and the second substrate and containing an electrochromic material and an electrolyte, wherein at least one of the first substrate and the second substrate is a transparent film, whereby an entire thickness and weight of the electrochromic mirror can be reduced, and as a result, the degree of design freedom can be improved, and since the electrochromic layer containing the electrochromic material and the electrolyte is formed by a coating method, the efficiency of a manufacturing process can be improved, and a production cost can be reduced.

Abstract: An electrophoretic reflective color display has a color filter on an electrophoretic display layer displaying black and white. A colored portion and a non-colored portion are provided in a pixel of the color filter layer, and the colored portion has a hue defined by specified values of chromaticity coordinates (a*, b*), measured with transmitted light using a D65 light source, in a chromaticity diagram of the L*a*b* color system.

Abstract: In an electrophoretic material, first particles which are charged with a first polarity and second particles which are charged with a second polarity are dispersed in a solvent. A volume, which is obtained by dividing a volume of the solvent by a total number of particles, is called free volume, and a radius of a spherical space, which is occupied by sum of an average volume of the particles and the free volume, is called a free volume radius. A first particle average radius is greater than a second particle average radius. A difference between the free volume radius and the first particle average radius is greater than the second particle average radius.

Abstract: A SMD type Fresnel LED micro flash light structure, which is adapted to a camera of a mobile phone, includes a housing, an array-type light source and a micro-cylindrical Fresnel lens. The housing has a bottom wall and a plurality of side walls, and defines a longitudinal direction and a width direction. The array-type light source is disposed on the bottom wall along the longitudinal direction. The micro-cylindrical Fresnel lens covers the housing, and includes a cylindrical plano-convex lens, and two teeth-shaped lens sections respectively arranged at two sides of the cylindrical plano-convex lens. Each teeth-shaped lens section has a plurality of bar teeth-shaped lenses. The cylindrical plano-convex lens and the bar teeth-shaped lenses are parallel to each other along the width direction. A central axis of the cylindrical plano-convex lens is corresponding to a central position of the array-type light source.

Abstract: A light source and lighting system for video communication are provided. A base capable of being removably attached to a video communication device is provided. A fill light attached to the base and a key light connected to the base are also provided.

Abstract: An electronic device having a securing member for a camera module is disclosed. The securing member may include several flexible spring elements extending around the camera module to maintain the position of the camera module during an assembly process of the electronic device. The securing member and the housing may be made from an electrically conductive material or materials. In this manner, the securing member may further provide the camera module with an electrical ground to prevent excessive electric charge within the camera module. In some embodiments, an alignment member is positioned on the housing and aligns the camera module and/or securing member with an aperture of the housing.

Abstract: In at least one embodiment, a projection display device comprises an image projection section, an imaging section, a location specifying section, and a display control section. The image projection section is configured to project an image toward a projection surface. The imaging section is configured to capture an image of the projection surface. The location specifying section is configured to specify a location of a position indication light emitted from an electronic pen which is operated on the projection surface based on an image captured by the imaging section. The display control section is configured to set a projection range of the image based on the location specified by the location specifying section, and to alter the projection range of the image in accordance with the set projection range.

Abstract: An image display device includes: an external light measurement unit measuring the illuminance of an external light a plurality of times, and generating a measurement value indicating the illuminance; a storage unit storing history data which shows the measurement values, and color mode data which shows a correspondence between the illuminance and a color mode; a determination unit, based on the history data, determining whether or not it is a changed condition wherein the illuminance changes upward or downward, or the illuminance fluctuates; and an adjustment unit, in the event that it is not the changed condition, determining the color mode to be applied based on the measurement values and the color mode data, and adjusting the color or brightness of an image in accordance with the color mode, and in the event that it is the changed condition, continuing the adjustment currently being applied as the image adjustment.

Abstract: A projector includes: an external housing that includes a projection opening and an exhaust port arranged on the same side as the projection opening; an axial-flow fan that causes air to flow therein with the rotation of blades and delivers the air flowing therein; and a plurality of slats that are arranged at the exhaust port and guide the air delivered from the axial-flow fan to an outside. The plurality of slats include an elongated slat that is disposed in, among four exhaust areas arranged side by side in the exhaust port, one of the two exhaust areas on the side close to the projection opening and whose length in a direction in which the air is guided corresponding to a rotational direction of the blade is longer than that of the slats disposed in the other areas.

Abstract: A system including a rotationally static light emitting material with rotating optics is provided. The system comprises: the material on a heatsink being circularly symmetrical around an axis, and rotationally fixed; a stationary light source configured to generate excitation light, the excitation light configured to excite the material producing emitted light, an incoming path of the excitation light forming a first angle, with the axis greater than 0° and less than 90°; and, optics, configured to rotate relative to the material around the axis, comprising: a first mirror on the axis and forming a second angle with the axis greater than 0° and less than 90°, the first mirror located on the incoming path; and a second mirror parallel to the first mirror, the first mirror configured to reflect the excitation light towards the second mirror, and the second mirror configured to reflect the excitation light towards the material.

Abstract: A projection system for illuminating a projection surface may include at least one light source formed from a plurality of light-emitting elements and an optical integrator having an entrance opening and an exit opening, into the entrance opening of which the light of each light-emitting element is coupled such that the mixed light of all the light-emitting elements emerges from its exit opening, and an imaging optical unit, which projects the light emerging from the exit opening of each integrator onto the projection surface, wherein an optical element is in each case arranged between the exit opening of each integrator and the imaging optical unit, said optical element shifting the virtual image of the entrance opening along an optical axis of the projection system such that its image generated by the imaging optical unit is not visible on the projection surface.

Abstract: Disclosed is a mask blank substrate for use in lithography, wherein the main surface on which the transfer pattern of the substrate is formed has a root mean square roughness (Rms) of not more than 0.15 nm obtained by measuring an area of 1 ?m×1 ?m with an atomic force microscope, and has a power spectrum density of not more than 10 nm4 at a spatial frequency of not less than 1 ?m?1.

Abstract: A mask blank suitable for fabricating a phase shift mask having a thin film pattern composed of a material enabling dry etching with a fluorine-based gas and a substrate-engraved pattern. The mask blank 100 is used to fabricate a phase shift mask having a thin film pattern and a substrate-engraved pattern. The mask blank 100 has a structure in which an etching stopper film 2, a thin film for pattern formation 3 and an etching mask film 4 are laminated in this order on a transparent substrate 1. The etching stopper film 2 is made of a material that contains chromium and oxygen and the oxygen content thereof is more than 50 at %. The thin film 3 is made of a material that can be dry-etched by a fluorine-based gas. The etching mask film 4 is made of a material that contains chromium, the chromium content thereof is not less than 45 at %, and the oxygen content thereof is not more than 30 at %.

Abstract: Various embodiments provide for topography aware optical proximity correction that can improve depth of focus during wafer lithography. The system can determine the topography of the wafer using real process information. The topographical variations can be based on random defects or structural details. The system can divide the wafer into regions based on the topography of the regions and determine depth of focus values for each of the regions. Optical proximity correction can then be performed on each region separately, using the separate defocus values to yield an accurate, topographically aware optical proximity correction model for the wafer. For regions with varying topography, optical proximity correction can be performed for two defocus values corresponding to the high and low extremes, such that the resulting simulated contour is satisfies a predetermined criterion associated with accuracy.

Abstract: During a calculation technique, a modification to a reflective photo-mask is calculated. In particular, using information specifying a defect associated with a recessed area on a top surface of the reflective photo-mask, the modification to the reflective photo-mask is calculated. For example, the calculation may involve an inverse optical calculation in which a difference between a pattern associated with the reflective photo-mask at an image plane in a photo-lithographic process and a reference pattern at the image plane in the photo-lithographic process is used to calculate the modification at an object plane in the photo-lithographic process. Note that the modification includes a negative feature in which one or more pairs of layers in a multilayer stack in the reflective photo-mask are removed using a subtractive fabrication process. Moreover, the modification is proximate to the recessed area.

Abstract: Some embodiments of the present disclosure relate to a method for repairing a photomask pattern, comprising receiving a photomask with a first translucent material formed on a transparent substrate, which forms an incomplete version of the photomask pattern. Missing portions of the photomask pattern are detected by comparing the incomplete version of the photomask pattern to a complete version of the photomask pattern. After detecting the missing portions, the photomask pattern is completed by using a second translucent material, which is different than the first translucent material, to form the missing portions. The second translucent exhibits the same transmissive property as the first translucent material. Consequently, both the repaired and unrepaired portions of the pattern have the same transmissive properties with respect to attenuation and phase shifting of incident radiation to enhance pattern resolution in the repaired portion of the photomask pattern.

Abstract: A method and system for inspecting defects saves scanned raw data as an original image so as to save time for repeated scanning and achieve faster defect inspection and lower false rate by reviewing suspicious defects and other regions of interest in the original image by using the same or different image-processing algorithm with the same or different parameters.

Abstract: A method for producing a product having an uneven microstructure on a surface thereof includes: a step (I) which treats a surface of a roll mold (20) having an uneven microstructure thereon with an external release agent containing a fluorine and not containing a functional group (B) which reacts with a functional group (A) existing on the surface of the product; and a step (II) which obtains the product having the uneven microstructure on the surface thereof (40) by inserting an active energy ray curable resin composition (38) including an internal release agent between the roll mold (20) and a film (substrate) (42) after the step (I). Then, the composition is hardened by being irradiated with an active energy ray and a cured resin layer (44) having a surface, onto which the uneven microstructure is transferred, is formed on the surface of the film (42).

Abstract: A template for imprinting in which a pattern is transferred onto a first substrate applied curable resin thereon, including a second substrate having a surface to be contacted with the curable resin, a concave portion provided on the surface and corresponding to a pattern to be transferred onto the first substrate, and at least one convex portion arranged in the concave portion to decrease volume of the concave portion.

Abstract: A photosensitive resin composition includes (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent. The binder resin includes a first binder resin including structural units represented by Chemical Formulae 1 to 4, wherein the substituents are as defined in the specification, and the first binder resin is present in an amount of about 20 wt % to about 90 wt % based on the total amount of the binder resin. A color filter using the photosensitive resin composition is provided.

Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, an acid generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound component (D), wherein the acid generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below, and the nitrogen-containing organic compound component (D) includes a compound (D1) represented by general formula (d1) shown below. In the formula, Y0 represents an alkylene group of 1 to 4 carbon atoms which may have a substituent, R0 represents an alkyl group, alkoxy group, halogen atom, halogenated alkyl group, hydroxyl group or oxygen atom (?O), p represents 0 or 1, and Z+ represents an organic cation.

Abstract: The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator.

Abstract: A resist underlayer film forming composition for lithography, including: as a silane, at least one among a hydrolyzable organosilane, a hydrolysis product thereof, and a hydrolysis-condensation product thereof, wherein the silane includes the silane compound of Formula (1-a) or Formula (1-b): A method for producing a semiconductor device, including: applying the resist underlayer film forming composition onto a semiconductor substrate and baking the composition to form a resist underlayer film; applying a composition for a resist onto the film to form a resist film; exposing the resist film to light; developing the resist film after exposure to obtain a patterned resist film; etching the resist underlayer film according to a pattern of the patterned resist film; and processing the semiconductor substrate according to a pattern of the resist film and the resist underlayer film.

Abstract: A chemically amplified negative resist composition comprising a silicone structure-bearing polymer forms a film which can be readily patterned. The patterned film is tightly adherent to various substrates and suited as protective film on electric/electronic parts because of improved alkali resistance and reliability.

Abstract: A resist overlayer film forming composition that is used for a lithography process for manufacturing semiconductor devices, and selectively transmits EUV only, in particular, by blocking exposure light undesirable for EUV exposure, such as UV and DUV, without intermixing with a resist, and that can be developed with a developing solution after exposure. A resist overlayer film forming composition including: a hydroxyl group-containing novolac-based polymer containing a structure of (Formula 1-1): (in (Formula 1-1), Ar1 is a divalent organic group that contains 1 to 3 benzene ring(s) and optionally contains a hydroxy group; Ar2 is a benzene ring group, a naphthalene ring group, or an anthracene ring group; each of the hydroxy group and R1 is a substituent for a hydrogen atom on a ring of Ar2); and a solvent.

Abstract: Novel polymer monolith structures and methods for fabrication of the same are disclosed in a variety of embodiments. In an illustrative embodiment, a method includes forming a pattern of features on a wafer, thereby forming a patterned wafer; forming a polymer layer on the patterned wafer; using a first plasma to remove at least a portion of the polymer layer; and using a second plasma to etch off at least a portion of the pattern of features, thereby providing a structured polymer monolith. The pattern of features may include an array of pillars. Providing the structured polymer monolith may include providing a structured polymer monolith filter having an array of channels formed by the pillars. The structured polymer monolith may be composed of polypropylene.

Abstract: A method of forming a resist pattern, including forming a resist film by coating a resist composition including a base component (A) that exhibits increased solubility in an alkali developing solution, a photo-base generator component (C) that generates a base upon exposure, an acid supply component (Z) and a compound (F) containing at least one selected from the group consisting of a fluorine atom and a silicon atom and containing no acid decomposable group which exhibits increased polarity by the action of acid on a substrate; subjecting the resist film to exposure baking the exposed resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern.