Patents Issued in October 24, 2017
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Patent number: 9798211Abstract: An object is to provide a display device that performs accurate display. A circuit is formed using a transistor that includes an oxide semiconductor and has a low off-state current. A precharge circuit or an inspection circuit is formed in addition to a pixel circuit. The off-state current is low because the oxide semiconductor is used. Thus, it is not likely that a signal or voltage is leaked in the precharge circuit or the inspection circuit to cause defective display. As a result, a display device that performs accurate display can be provided.Type: GrantFiled: September 12, 2016Date of Patent: October 24, 2017Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Hajime Kimura, Atsushi Umezaki
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Patent number: 9798212Abstract: A liquid crystal display device, which comprises: a backlight source (1); a first handedness cholesteric liquid crystal film layer (2), located at an upper side of the backlight source (1) as a light emitting surface; an array substrate (3), located at an upper side of the first handedness cholesteric liquid crystal film layer (2); a color filter substrate (5), located at an upper side of the array substrate (3); and a second handedness cholesteric liquid crystal layer (4), sandwiched between the array substrate (3) and the color filter substrate (5), the first handedness being opposite to the second handedness. The liquid crystal display device greatly improves light efficiency and transmittance of the display and saves the processing steps and manufacturing costs.Type: GrantFiled: November 6, 2012Date of Patent: October 24, 2017Assignee: BOE TECHNOLOGY GROUP CO., LTD.Inventor: Weili Zhao
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Patent number: 9798213Abstract: Provided is an electrochromic element, including: a first electrode and a second electrode, at least one of the first electrode and the second electrode being transparent; a third electrode; and an electrolyte, an anodic organic electrochromic material, and a cathodic organic electrochromic material that are arranged between the first electrode and the second electrode, in which the third electrode is electrically connectable to at least one of the first electrode and the second electrode via the electrolyte, and in which the third electrode has an effective area that is larger than an effective area of the first electrode and an effective area of the second electrode.Type: GrantFiled: June 1, 2016Date of Patent: October 24, 2017Assignee: CANON KABUSHIKI KAISHAInventors: Wataru Kubo, Kazuya Miyazaki
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Patent number: 9798214Abstract: Methods of charging an electrochromic device includes post assembly charging using a sacrificial redox agent, lithium diffusion into an electrode from a lithium layer or salt bridge charging, or pre assembly charging using proton photoinjection into an electrode.Type: GrantFiled: February 17, 2016Date of Patent: October 24, 2017Assignee: HELIOTROPE TECHNOLOGIES INC.Inventors: Guillermo Garcia, Jason Holt, Evelyn Rosen, Brett Helms
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Patent number: 9798215Abstract: There is provided a method of manufacturing an electrophoretic particle, in which the electrophoretic particle includes a mother particle and a block copolymer, including: a step of polymerizing a monomer M having a site contributing to dispersibility into a dispersion medium, a monomer M including a second functional group having reactivity with the first functional group, a charged monomer M by living polymerization without random copolymerizing the monomer M1 and the monomer M2 so as to obtain the block copolymer; and a step of reacting the first functional group and the second functional group to a bonding section to a mother particle so as to connect the block copolymer to the mother particle.Type: GrantFiled: November 3, 2015Date of Patent: October 24, 2017Assignee: Seiko Epson CorporationInventors: Takashi Aoki, Shinobu Yokokawa
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Patent number: 9798216Abstract: A 2D/3D switchable stereoscopic display apparatus includes a display panel, a liquid crystal lens, and a controller. The liquid crystal lens includes a first substrate having a plurality of first electrodes, a second substrate disposed opposite to the first substrate and having a second electrode, a liquid crystal layer constituting liquid crystal molecules disposed between the first substrate and the second substrate, and a plurality spacers. The controller is configured to, when the display apparatus is in a 2D display state, control a first voltage between the first electrodes and the second electrode to generate a first electric field with an equal electric field intensity, which causes the liquid crystal molecules to rotate by a predetermined degree such that a refractive index difference between the liquid crystal molecules and the spacers is within a preset range.Type: GrantFiled: September 10, 2015Date of Patent: October 24, 2017Assignee: SUPERD CO. LTD.Inventors: Honglei Wang, Fuzhong Guo, Xiaoda Gong
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Patent number: 9798217Abstract: Variable liquid crystal devices for controlling the propagation of light through a liquid crystal layer use a frequency dependent material to dynamically reconfigure effective electrode structures in the device. The drive signal source uses pulse-width modulation to set a frequency and an amplitude of the drive signal.Type: GrantFiled: November 10, 2016Date of Patent: October 24, 2017Assignee: LensVector Inc.Inventors: Tigran Galstian, Vladimir Presniakov, Karen Asatryan, Amir Tork, Armen Zohrabyan, Aram Bagramyan
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Patent number: 9798218Abstract: A source of directional radiation in an IR band comprises at least a substrate and an external layer comprising controllable cells made of a metal insulator transition material that changes phase depending on its temperature relative to a temperature at which the corresponding wavelength is located in the IR band and that possesses a crystalline phase and an amorphous phase, and control means for controlling the phase change of the cells so as to form in this external layer a diffraction grating when the cells are controlled to the amorphous phase, in order thus to obtain a switchable directional source.Type: GrantFiled: November 27, 2013Date of Patent: October 24, 2017Assignees: Centre National De La Recherche Scientifique, Institut D'Optique Graduate School, Universite Paris SUDInventors: Philippe Ben-Abdallah, Anne-Lise Coutrot, Mondher Besbes, Henri Benisty
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Patent number: 9798219Abstract: A photon source to deliver single photons includes a storage ring resonator to receive pump photons and generate a signal photon and an idler photon. An idler resonator is coupled to the storage resonator to couple the idler photon out of the storage resonator and into a detector. Detection of the idler photon stops the pump photons from entering the storage resonator. A signal resonator is coupled to the storage resonator to couple out the signal photon remaining in the storage resonator and delivers the signal photon to applications. The photon source can be fabricated into a photonic integrated circuit to achieve high compactness, reliability, and controllability.Type: GrantFiled: June 3, 2016Date of Patent: October 24, 2017Assignee: MASSACHUSETTS INSTITUTE OF TECHNOLOGYInventors: Mihir Pant, Dirk Robert Englund, Mikkel Heuck
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Patent number: 9798220Abstract: A shutter for an optical system, such as a small infrared camera, for alternately blocking and exposing an optical sensor to light includes an electrically conductive coil, having a center long axis, a magnet element rotatably mounted within the coil with an axis of rotation perpendicular to the center long axis of the coil, a shutter flag element connected to the magnet element, and a shutter base element supporting the shutter flag, magnet, and coil. Energizing the coil in a first manner causes the rotatable magnet to rotate from a first position to a second position and energizing the coil in a second manner returns the magnet to the first position, causing the flag to alternately block and expose the optical sensor.Type: GrantFiled: August 4, 2015Date of Patent: October 24, 2017Assignee: Seek Thermal, Inc.Inventors: Blake Henry, Scott Dayton, William J. Parrish, David C. Lindberg
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Patent number: 9798221Abstract: An embodiment provides a motorized monopole for a camera, including: a hand-held monopole; a first motor positioned at an end of the hand-held monopole; a first connecting element attached to the first motor; a second motor positioned at an end of the first connecting element; a second connecting element attached to the second motor; a third motor positioned at an end of the second connecting element; and a camera mounting plate attached to the second connecting element by the third motor, where components of the multi-axis gimbal are positioned such that a camera viewing axis, a horizontal image axis, and a vertical image axis of a camera mounted on the camera mounting plate need not be aligned with any of a rotational axis of the first motor, a rotational axis of the second motor, or a rotational axis of the third motor. Other aspects are described and claimed.Type: GrantFiled: November 5, 2015Date of Patent: October 24, 2017Assignee: Disney Enterprises, Inc.Inventors: Gunter Niemeyer, Miquel Angel Farre Guiu, Vince Roberts, Anthony Accardo, Michael Holton
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Patent number: 9798223Abstract: A projection image display includes: a screen unit that has a screen; a projection unit that projects an image onto the screen from a back surface of the screen; a housing that houses the projection unit; a slide mechanism that supports the screen unit such that the screen unit moves in an anterior-posterior direction; a locking mechanism that restricts a movement of the slide mechanism; and an adjustment mechanism that is capable of adjusting a position of the screen unit with respect to the housing from the outside while the locking mechanism restricts the movement of the slide mechanism.Type: GrantFiled: November 18, 2015Date of Patent: October 24, 2017Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Yuta Imanishi, Akihiro Kitaguchi
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Patent number: 9798224Abstract: A projector includes a light source, a digital micro-mirror device (DMD), a first prism, a second prism, and a lens. The light source is used for emitting an incident light. The DMD is used for receiving and reflecting the incident light as an image light. The first prism is disposed between the light source and the DMD. The second prism is disposed between the first prism and the DMD. The first prism includes a first plane, a second plane, and an intermediate portion. The intermediate portion adjoins the first plane and includes a reflecting portion. The incident light from the second plane is reflected by the reflecting portion and then passes through the second plane. The second prism includes a fourth plane, a fifth plane, and a sixth plane. When the DMD is operated in an on-state, the image light passes through the sixth plane.Type: GrantFiled: January 18, 2016Date of Patent: October 24, 2017Assignees: Qisda Optronics (Suzhou) Co., Ltd., Qisda CorporationInventor: Chih-Shiung Chien
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Patent number: 9798225Abstract: A method of characterizing a lithographic mask type uses a mask having thereon test pattern units of linear features at different orientations. The mask is exposed, rotated by angle, exposed again, rotated by a further angle, exposed, etc. The printed features are measured to determine one or more characteristics of the mask. The method can be used to model shadowing effects of a EUV mask with a thick absorber illuminated at an angle.Type: GrantFiled: October 14, 2014Date of Patent: October 24, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Eelco Van Setten, Natalia Viktorovna Davydova, Eleni Psara, Anton Bernhard Van Oosten
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Patent number: 9798226Abstract: Aspects of the invention relate to techniques for determining pattern optical similarity in lithography. Optical kernel strength values for a first set of layout features and a second set of layout features are computed first. Based on the optical kernel strength values, optical similarity values between the first set of layout features and the second set of layout features are then determined. Subsequently, calibration weight values for the first set of layout features may be determined based on the optical similarity values, which, along with the first set of layout features, may be employed to calibrate lithography process model parameters.Type: GrantFiled: August 24, 2016Date of Patent: October 24, 2017Assignee: Mentor Graphics CorporationInventor: Edita Tejnil
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Patent number: 9798227Abstract: A photomask layout includes: a substrate region; a lower stepped region at a region of the substrate region; and a pattern region at least partially crossing the lower stepped region and including at least one notch portion at an area overlapping the lower stepped region. A method of forming a pattern is also provided.Type: GrantFiled: July 17, 2015Date of Patent: October 24, 2017Assignee: Samsung Display Co., Ltd.Inventor: Man-Jong Yu
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Patent number: 9798228Abstract: Consistent with an example embodiment, there is a semiconductor wafer substrate comprising a plurality of integrated circuits formed in arrays of rows and columns on the wafer substrate. A plurality of integrated circuits are in arrays of rows and columns on the wafer substrate; the rows and the columns have a first width. First and second saw lanes separate the integrated circuits, the first saw lanes are arranged parallel and equidistant with one another in a first direction defined by rows, and the second saw lanes are arranged parallel and equidistant with one another in a second direction defined by the columns. A plurality of process modules (PM) are on the wafer substrate, the PM modules defined in an at least one additional row/column having a second width. The at least one additional row/column is parallel to the plurality of device die in one direction.Type: GrantFiled: September 29, 2015Date of Patent: October 24, 2017Assignee: NXP B.V.Inventors: Hans Cobussen, Tonny Kamphuis, Heimo Scheucher, Laurentius de Kok
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Patent number: 9798229Abstract: A method for designing a photomask blank comprising a transparent substrate and an optical film thereon is provided. The photomask blank is processed into a transmissive photomask having a pattern of optical film such that the film pattern may be transferred when exposure light is transmitted by the photomask. The optical film is selected using a specific reflectance, which is equal to the reflectance divided by the film thickness, as an index.Type: GrantFiled: July 16, 2015Date of Patent: October 24, 2017Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Kouhei Sasamoto, Hideo Kaneko, Yukio Inazuki, Souichi Fukaya
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Patent number: 9798230Abstract: A photomask blank includes a chromium-based material film as a hard mask film containing at least one selected from the group consisting of nitrogen, oxygen, carbon and hydrogen, wherein a ratio (A/B) of etching rates per unit film thickness is in a range from 0.7 to 0.9, and the chromium-based material film has a tensile stress or compressive stress corresponding to an amount of warp of up to 70 nm. The present invention provides a photomask blank having a thin film of chromium-based material which is enhanced in etch resistance and lowered in film stress. This enables high-accuracy patterning of a chromium-based material film.Type: GrantFiled: September 11, 2015Date of Patent: October 24, 2017Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Souichi Fukaya, Kouhei Sasamoto
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Patent number: 9798231Abstract: The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.Type: GrantFiled: January 9, 2013Date of Patent: October 24, 2017Assignee: CANON KABUSHIKI KAISHAInventor: Yoshihiro Shiode
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Patent number: 9798232Abstract: Methods are generally provided for preparing a polymeric composition that includes a grafted block copolymer. Methods are also generally provided for preparing a polymeric composition that includes a star block copolymer prepared from a central core molecule that includes a plurality of attachment moieties. Methods are also generally provided for preparing a polymeric composition that includes a linear block copolymer. Block copolymers are also generally provided. Multi-segmented linear block copolymers are also generally provided.Type: GrantFiled: October 17, 2014Date of Patent: October 24, 2017Assignee: University of South CarolinaInventors: Chuanbing Tang, Christopher G. Hardy, Alper Nese, Jeffery Hayat
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Patent number: 9798233Abstract: A radiation-sensitive resin composition containing an alicyclic olefin polymer which has an acidic group (A), a sulfonium salt-based photoacid generator (B) which is represented by the following general formula (1), and a cross-linking agent (C) is provided. (In the above general formula (1), R1, R2, and R3 respectively independently are a C6 to C30 aryl group, C4 to C30 heterocyclic group, C1 to C30 alkyl group, C2 to C30 alkenyl group, or C2 to C30 alkynyl group, the groups being optionally substituted, and “a” is an integer of 1 to 5.Type: GrantFiled: September 2, 2014Date of Patent: October 24, 2017Assignee: ZEON CORPORATIONInventor: Satoshi Abe
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Patent number: 9798234Abstract: An actinic ray sensitive or radiation sensitive resin composition contains a polymer compound (A) having a phenolic hydroxyl group and satisfying the following (a) and (b), a compound (B) capable of generating an acid upon irradiation with actinic rays or radiation, and a crosslinking agent (C) for crosslinking the polymer compound (A) by the action of an acid and having a glass transition temperature (Tg) of 200° C. or higher: (a) the weight-average molecular weight is 3,000 or more and 6,500 or less, and (b) the glass transition temperature (Tg) is 140° C. or higher.Type: GrantFiled: July 18, 2016Date of Patent: October 24, 2017Assignee: FUJIFILM CorporationInventors: Tomotaka Tsuchimura, Shuhei Yamaguchi, Natsumi Yokokawa
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Patent number: 9798235Abstract: A resist composition contains (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, (C) particular an alkali soluble compound, and (D) a solvent.Type: GrantFiled: May 17, 2017Date of Patent: October 24, 2017Assignee: FUJIFILM CorporationInventors: Hiromi Kobayashi, Haruki Inabe
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Patent number: 9798236Abstract: In at least one embodiment of a method for forming a pattern having a hollow structure, a light-absorbing layer capable of absorbing light is formed on a surface of a photosensitive resin film. Subsequently, a substrate having a protrusion and the photosensitive resin film are bonded together so that the protrusion and the light-absorbing layer come into contact with each other. Then, the photosensitive resin film and the light-absorbing layer are patterned at one time by photolithography.Type: GrantFiled: August 12, 2015Date of Patent: October 24, 2017Assignee: Canon Kabushiki KaishaInventors: Yohei Hamade, Shoji Shiba
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Patent number: 9798237Abstract: A method for optical transmission of a structure into a recording medium which can be transformed locally from a first undefined state into a second defined state by irradiating with photons from a photon source. The two states of the recording medium are manifested in different physical and/or chemical properties of the recording medium. At least one photon source having a photon flux of less than 104 photons per second is selected for the irradiation with the photons. It was recognized that with such a low photon flux especially fine structures can advantageously be transmitted into the recording medium without the irradiation having to be partially blocked by a mask. In this manner, for a given wavelength (energy) of the photons, structures can be transmitted that are considerably smaller than the width, defined by the diffraction limit, of the probability distribution for the locations at which the emitted photons are incident.Type: GrantFiled: July 12, 2013Date of Patent: October 24, 2017Assignee: FORSCHUNGSZENTRUM JUELICH GMBHInventors: Hilde Hardtdegen, Martin Mikulicz
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Patent number: 9798238Abstract: Methods for reducing reticle transmission differences and for optimizing layer placement for overlay in MTRs and CTRs are disclosed. Embodiments include providing a reticle having a prime area and a frame area surrounding the prime area; determining RT differences across the prime area; and providing RT adjustment structures on the reticle to decrease the RT differences. Other embodiments include grouping multiple layers of a semiconductor production flow, the layers for each group having an RT difference less than a predetermined value; and placing the layers on plural ordered reticles of a reticle set, each reticle having multiple image fields, by selecting, for each reticle, layers from a single group and optimizing placement of the layers for overlay. Other embodiments include selectively rotating image fields on a reticle having multiple image fields to improve overlay, or optimizing placement of DDLs on CTRs by placing each design orientation on a different reticle.Type: GrantFiled: February 26, 2016Date of Patent: October 24, 2017Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.Inventors: Guo Xiang Ning, Arthur Hotzel, Paul Ackmann, Soon Yoeng Tan
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Patent number: 9798239Abstract: A flow through Micro-Electromechanical Systems (MEMS) package and methods of operating a MEMS packaged using the same are provided. Generally, the package includes a cavity in which the MEMS is enclosed, an inlet through which a fluid is introduced to the cavity during operation of the MEMS and an outlet through which the fluid is removed during operation of the MEMS, wherein the package includes features that promote laminar flow of the fluid across the MEMS. The package and method are particularly useful in packaging spatial light modulators including a reflective surface and adapted to reflect and modulate a light beam incident thereon. Other embodiments are also provided.Type: GrantFiled: June 18, 2014Date of Patent: October 24, 2017Assignee: Silicon Light Machines CorporationInventors: Kenichi Sano, Lars Eng, Alexander Payne, James Hunter
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Patent number: 9798240Abstract: Methods and apparatuses for minimizing line edge/width roughness in lines formed by photolithography are provided. The random diffusion of acid generated by a photoacid generator during a lithography process contributes to line edge/width roughness. Methods disclosed herein apply an electric field, a magnetic field, and/or a standing wave during photolithography processes. The field and/or standing wave application controls the diffusion of the acids generated by the photoacid generator along the line and spacing direction, preventing the line edge/width roughness that results from random diffusion. Apparatuses for carrying out the aforementioned methods are also disclosed herein.Type: GrantFiled: August 28, 2014Date of Patent: October 24, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Peng Xie, Ludovic Godet, Christopher Bencher
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Patent number: 9798241Abstract: A method of patterning a photoresist layer includes forming a photoresist layer on a substrate, exposing the photoresist layer to light using a first light source so as to induce a chemical change in the photoresist layer, performing a post-exposure bake process on the photoresist layer, the post-exposure bake process including irradiating the photoresist layer with at least two shots of laser light from a second light source such that the photoresist layer is heated to a first temperature, and performing a developing process on the photoresist layer after the post-exposure bake process, the development process selectively removing a portion of the photoresist layer.Type: GrantFiled: December 30, 2015Date of Patent: October 24, 2017Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Sang-Hyun Kim, Dong-Gun Lee, Byoung-Hun Park, Byung-Gook Kim, Chan-Uk Jeon
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Patent number: 9798242Abstract: In a resist pattern forming process, a rinse solution comprising (A) a heat/acid-decomposable polymer and (B) an organic solvent is effective. The pattern forming process using the rinse solution is successful in forming fine feature size patterns while minimizing the occurrence of pattern collapse.Type: GrantFiled: November 25, 2015Date of Patent: October 24, 2017Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Daisuke Kori, Tsutomu Ogihara
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Patent number: 9798243Abstract: The disclosure relates to an optical device, in particular for microlithography. The optical device includes an optical module and a support structure that supports the optical module. The optical module includes an optical element and a holding device that holds the optical element. The holding device includes a deformation device having a plurality of active deformation units which contact the optical element and which are designed so as to impose a pre-defined deformation on the optical element. The optical module is fixed to the support structure in a replaceable manner.Type: GrantFiled: December 15, 2015Date of Patent: October 24, 2017Assignee: Carl Zeiss SMT GmbHInventors: Manfred Steinbach, Armin Schoeppach
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Patent number: 9798244Abstract: Methods, apparatus, and system for minimizing defectivity in top-coat-free immersion photolithography are provided. Embodiments include forming a photomask by defining a first pattern including a main functional pattern in the photomask; and defining a second pattern including a sub-resolution fill pattern in the photomask in areas between or and/or within structures of the first pattern, the fill pattern having a pitch or range of pitches smaller than a minimum resolved pitch of the lithographic exposure and/or at least a part of the sub-resolution structures of the sub-resolution fill pattern not substantially modifying an imaging of any structure of the main functional pattern in the lithographic exposure.Type: GrantFiled: November 17, 2015Date of Patent: October 24, 2017Assignee: GLOBALFOUNDRIES INC.Inventors: Arthur Hotzel, Philipp Jaschinsky, Remi Riviere, Wolfram Grundke
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Patent number: 9798245Abstract: A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the holder PH and has lyophilic parts 3, 5 of which at least a part of each is lyophilic, that uses the lyophilic parts 3, 5 to recover a liquid 1. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.Type: GrantFiled: December 8, 2010Date of Patent: October 24, 2017Assignee: NIKON CORPORATIONInventors: Yasufumi Nishii, Kenichi Shiraishi, Hirotaka Kohno
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Patent number: 9798246Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.Type: GrantFiled: June 16, 2016Date of Patent: October 24, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
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Patent number: 9798247Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.Type: GrantFiled: April 14, 2017Date of Patent: October 24, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
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Patent number: 9798248Abstract: The invention relates to a method for producing a structure in a lithographic material, wherein the structure in the lithographic material is defined by means of a writing beam of an exposure device, in that a plurality of partial structures are written sequentially, wherein for writing the partial structures a write field of the exposure device is displaced and positioned sequentially and that a partial structure is written in the write field in each case, and wherein for positioning of the write field a reference structure is detected by means of an imaging measuring device.Type: GrantFiled: July 16, 2015Date of Patent: October 24, 2017Assignee: Nanoscribe GmbHInventors: Joerg Hoffmann, Philipp Simon, Michael Thiel, Martin Hermatschweiler, Holger Fischer
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Patent number: 9798249Abstract: The invention relates to a method for compensating at least one defect of an optical system which includes introducing an arrangement of local persistent modifications in at least one optical element of the optical system, which does not have pattern elements on one of its optical surfaces, so that the at least one defect is at least partially compensated.Type: GrantFiled: August 12, 2014Date of Patent: October 24, 2017Assignees: Carl Zeiss SMT GmbH, Carl Zeiss SMS Ltd.Inventors: Vladimir Dmitriev, Ingo Saenger, Frank Schlesener, Markus Mengel, Johannes Ruoff
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Patent number: 9798250Abstract: A lithographic apparatus including an inspection apparatus can measure the overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined.Type: GrantFiled: September 13, 2016Date of Patent: October 24, 2017Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Leonardus Henricus Marie Verstappen
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Patent number: 9798251Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.Type: GrantFiled: February 26, 2014Date of Patent: October 24, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis LaFarre, Satish Achanta, Matteo Filippi, Yogesh Karade, Antonius Johannes Maria Nellissen, Ronald Van Der Wilk, Hendrikus Christoffel Maria Van Doremalen, Wilhelmus Jacobus Johannes Welters
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Patent number: 9798252Abstract: According to measurement results of an encoder system, a stage driving system that is a magnetic levitation type planar motor is controlled to drive and control a wafer stage, and in the case where an abnormality of the driving and control of the wafer stage has been detected, the stage driving system is controlled to apply a thrust in a vertical direction to the wafer stage. With this operation, the pitching of the wafer stage can be avoided, which makes it possible to prevent damage of the wafer stage and structures placed immediately above the stage upper surface.Type: GrantFiled: November 20, 2013Date of Patent: October 24, 2017Assignee: NIKON CORPORATIONInventor: Tomoki Miyakawa
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Patent number: 9798253Abstract: A support table having: a base surface configured to be substantially parallel to a lower surface of a substrate, a plurality of burls each having a respective distal end and a first height above the base surface, the burls arranged to support the substrate by the respective distal ends, and a plurality of elongate raised protrusions protruding above the base surface, each elongate raised protrusion having a second height above the base surface that is less than the first height. The base surface has a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.Type: GrantFiled: March 25, 2015Date of Patent: October 24, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Daan Daniel Johannes Antonius Van Sommeren, Thomas Poiesz
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Patent number: 9798254Abstract: The disclosure provides an arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus, as well as related methods and systems.Type: GrantFiled: September 9, 2015Date of Patent: October 24, 2017Assignee: Carl Zeiss SMT GmbHInventor: Markus Hauf
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Patent number: 9798255Abstract: A process is provided comprising forming a phase inversed resin emulsion comprising a resin, water, and an organic solvent, wherein the process excludes subjecting the phase inversed resin emulsion to an organic solvent removal technique, thereby retaining the organic solvent in the phase inversed resin emulsion. The phase inversed resin emulsion may be formed by dissolving a resin in an organic solvent to form a resin mixture; optionally, adding a neutralizing agent to the resin mixture to neutralize acid groups on the resin; and adding a sufficient amount of water to the resin mixture to emulsify and induce phase inversion in the resin mixture. Also provided are processes for preparing particles and processes for preparing toners utilizing the phase inversed resin emulsions.Type: GrantFiled: June 9, 2016Date of Patent: October 24, 2017Assignee: Xerox CorporationInventors: Yulin Wang, Shigang S. Qiu, Chieh-Min Cheng, Kathryne S. Brockman
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Patent number: 9798256Abstract: A method of producing a toner includes preparing a resin solution containing a binder resin, a colorant and an organic solvent; forming a droplet, a surface of the droplet being covered with a resin fine particle L1; introducing a resin fine particle L2; pressuring by introducing carbon dioxide, and extracting the organic solvent in the droplet; and obtaining the toner particle by removing the carbon dioxide together with the extracted organic solvent, wherein the SP value of the resin R1 constituting the resin fine particle L1 and the SP value of the resin R2 constituting the resin fine particle L2 are each within a specific range.Type: GrantFiled: June 9, 2016Date of Patent: October 24, 2017Assignee: CANON KABUSHIKI KAISHAInventors: Yusuke Kosaki, Noritaka Toyoizumi, Tetsuya Kinumatsu, Kenji Aoki, Shuntaro Watanabe, Takaaki Kaya, Atsushi Tani, Takashige Kasuya
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Patent number: 9798257Abstract: A method for removing volatile organic compounds (VOC's) from toner slurries is described, including the isolated toner particles generated by that method.Type: GrantFiled: December 3, 2015Date of Patent: October 24, 2017Assignee: Xerox CorporationInventors: Matthew W Croteau, Mark A Jackson, Roger B B Keeble, Harold R Judd, Munir Salman, Vincenzo G Marcello, Chieh-Min Cheng, Steven M Malachowski, Grazyna Kmiecik-Lawrynowicz, Linda S Schriever
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Patent number: 9798258Abstract: There is provided an electrostatic charge image developing toner containing: a toner particle containing an amorphous resin having a polyester resin segment and a styrene acrylic resin segment, and a crystalline polyester resin dispersed in the amorphous resin, wherein a loss modulus G? of the toner particles satisfies the following (1) and (2): (1) the loss modulus G? at 40° C. is from 1.0×107 Pa to 1.0×108 Pa; and (2) the loss modulus G? at the time when 60 minutes has passed from start of keeping the toner particles at 55° C. is from 1.0×108 Pa to 1.0×109 Pa.Type: GrantFiled: December 28, 2015Date of Patent: October 24, 2017Assignee: FUJI XEROX CO., LTD.Inventors: Hirofumi Shiozaki, Naomi Miyamoto, Kazusei Yoshida
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Patent number: 9798259Abstract: Described herein is an electrostatic ink composition comprising a liquid carrier; and chargeable particles comprising a co-polymer of an alkylene monomer and an acrylic acid monomer, and a pearlescent, non-metallic pigment, wherein the chargeable particles are dispersed in the liquid carrier. Also described herein are a method of electrophotographic printing and a print substrate.Type: GrantFiled: January 29, 2013Date of Patent: October 24, 2017Assignee: Hewlett-Packard Development Company, L.P.Inventors: Alexey S. Kabalnov, Guang Jin Li, Brian E. Curcio, Yaron Grinwald, Reut Avigdor
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Patent number: 9798260Abstract: Provided is a decolorizable toner including a binder resin and colorant particles which contain a color developable compound, a color developing agent, and a decolorizing agent, and have a capsule structure coated with an outer shell, wherein the binder resin is contained in an amount of 60 to 80% by mass with respect to the total amount of the toner components.Type: GrantFiled: April 19, 2016Date of Patent: October 24, 2017Assignee: TOSHIBA TEC KABUSHIKI KAISHAInventors: Takafumi Hara, Masahiro Ikuta, Tsuyoshi Itou, Motonari Udo, Kazuhisa Takeda
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Patent number: 9798261Abstract: The present disclosure relates to a chemically prepared toner composition including a toner particle having a core including a first polymer binder, an styrene acrylate encapsulated wax latex, a pigment, and a shell formed around the core including a second polymer binder and method to make the same. The disclosed method of preparing the toner results in a change in the distribution of the components of the toner particle wherein the lower molecular weight resins, the pigment, and the wax are located away from the surface of the toner particle and the pigment is clinging to the edge of the wax domain.Type: GrantFiled: November 10, 2015Date of Patent: October 24, 2017Assignee: LEXMARK INTERNATIONAL, INC.Inventors: Jing X Sun, Cory Nathan Hammond