Abstract: The present invention prevents the shaving of an alignment film caused by a columnar spacer in a liquid crystal display device of an IPS method using photo-alignment. A plinth higher than a pixel electrode is formed at a part where a columnar spacer formed over a counter substrate touches a TFT substrate. When an alignment film of a double-layered structure is applied over the pixel electrode and the plinth, the thickness of the alignment film over the plinth reduces by a leveling effect. When photo-alignment is applied in the state, a photodegraded upper alignment film over the plinth disappears and a lower alignment film having a high mechanical strength remains. As a result, it is possible to prevent the shaving of the alignment film.

Abstract: The present invention provides a method for manufacturing a liquid crystal display device capable of suppressing display unevenness around a seal in the case of performing PS treatment on a horizontal alignment film formed from a photoactive material. The method for manufacturing a liquid crystal display device of the present invention includes the steps of: forming a horizontal alignment film containing a photoactive material on at least one substrate of a pair of substrates; dropping a liquid crystal composition containing a liquid crystal material and a monomer on one of the pair of substrates, the monomer being contained in an amount of 1.

Abstract: A display device includes a seat holding the spacer. The seat is formed in a superposition region where at least the gate line, the semiconductor layer, the data line, and the organic insulator are superposed on one another in a laminated direction, the superposition region being a region facing the spacer. A whole outer periphery of the seat and the superposition region are superposed on each other in the laminated direction.

Abstract: A TFT array substrate, a liquid crystal display panel and a liquid crystal display device. The TFT array substrate includes: a plurality of pixel units; where each of the pixel units includes a first electrode comprising a V-shaped electrode with an angle; the plurality of pixel units include a first pixel unit and a second pixel unit, and where, the first pixel unit is closer to an edge of the TFT array substrate than the second pixel unit, and an angle of the V-shaped electrode in the first pixel unit is smaller than an angle of the V-shaped electrode in the second pixel unit.

Abstract: A liquid crystal display (“LCD”) device capable of easily setting up an accurate resistance ratio between thin film transistors, the LCD device includes a first substrate including a gate line and a data line, a second substrate opposing the first substrate, a liquid crystal layer between the first substrate and the second substrate, a first sub-pixel electrode in a first sub-pixel region of the first substrate, a second sub-pixel electrode in a second sub-pixel region of the first substrate, a first transistor connected to the gate line, the data line, and the first sub-pixel electrode, a second transistor connected to the gate line, the first transistor, and the second sub-pixel electrode, and a third transistor connected to the gate line, the second sub-pixel electrode, and a storage line, wherein one of the first, second, and third transistors includes a plurality of divided channel regions.

Abstract: The present invention provides a fringe field switching (FFS) mode liquid crystal display device that makes it possible to improve transmittance when a voltage is applied.

Abstract: An optically transparent conductive layer for a display stack. In some cases, the optically transparent conductive layer is a metal nanowire layer that is disposed on or near a polarizing layer within the display stack.

Abstract: A display device includes: a display panel including a display area and a non-display area; a at least one pad in the non-display area of the display panel; a driving chip connected to the at least one pad, the driving chip including a driving circuit and at least one bump therein, wherein the at least one bump has an inclined surface facing toward a central portion of the driving chip.

Abstract: A display provides increased contrast and resolution via first LCD panel energized to generate an image and a second LCD panel configured to increase contrast of the image. The second panel is an LCD panel without color filters and is configured to increase contrast by decreasing black levels of dark portions of images (making them blacker or darker) using polarization rotation and filtration. Preferably, the second LCD panel is of higher resolution than the first LCD panel. The panels may be directly illuminated or edge lit, and may be globally or locally dimmed monochrome or multi primary lights that may also include individual control of color intensities for each image or frame displayed. The panels may be placed in any order, but preferably are arranged such that active layers in each panel are as close together as possible. Brightness is maintained by the combination of reusing polarization between the panels and by not going through more than one set of color filters.

Abstract: Provided is a display apparatus, including a substrate including: a pixel electrode; an organic insulating film; a common electrode laminated on the organic insulating film so as to be opposed to the pixel electrode via an insulating layer; a common signal line connected to the common electrode; and a transistor configured to apply, to the pixel electrode, a voltage signal input to a signal line. The pixel electrode is connected to a source electrode of the transistor via a through hole formed through the organic insulating film. The through hole includes, in at least one extending portion formed by retreating the organic insulating film toward an outer side of the through hole, a stepped portion formed by laminating a part of the common signal line.

Abstract: A pixel structure including a plurality of sub-pixels arranged in array is provided. Each of the sub-pixels includes an active device and a pixel electrode electrically connected to the active device respectively. Each of the pixel electrodes includes a plurality of stripe patterns respectively, and spacings of at least one portion of the stripe patterns of at least one of the sub-pixels are larger than spacings of the stripe patterns of the other sub-pixels.

Abstract: Disclosed are an array substrate and a display device which belong to the technical field of displays, and are intended to solve the technical problem of large width of the bezel of a liquid crystal display device. The array substrate is provided thereon with a fan-out zone which includes a plurality of conducting lines. At least one of the conducting lines includes a first metal wire and a second metal wire which are serially connected to each other. The second metal wire has a unit resistivity larger than that of the first metal wire. The conducting lines have different lengths, and the second metal wire in a shorter conducting line is longer than the second metal wire in a longer conducting line.

Abstract: A TFT device of a liquid crystal display and a manufacturing method therefor are provided. The TFT device has: a substrate; a first metal layer formed on the substrate on which a first silicon nitride protective film is deposited; a second metal layer deposited on the first silicon nitride protective film on which a second silicon nitride protective film is deposited; and a conductive film deposited on the second metal layer where the second silicon nitride protective film is etched, and connected with the first metal layer through a contact hole which passes through the first and second silicon nitride protective films, so that the first and second metal layers are connected. Thus, the connecting distance of the conductive film between the different metal layers and the contact resistance between metals are decreased, so as to enhance the product yield rate and the competitive capability of the product.

Abstract: An aim of the present invention is to reduce manufacturing costs and lower the electrical resistance of composite metal electrodes while lowering the contact resistance of the composite metal electrodes with respect to an organic semiconductor film. A TFT (semiconductor device) of the present invention includes an organic semiconductor film formed from an organic semiconductor material, and a source electrode and a drain electrode that are composite metal electrodes that contact the organic semiconductor film. The source electrode and the drain electrode are configured such that a low-resistance metal material that makes ohmic contact with the organic semiconductor film, the contact resistance thereof being lower than that of a base metal material formed of a metal material, is mixed with the base metal material, and the low-resistance metal material is disposed so as to be exposed at least at a contact surface with the organic semiconductor film.

Abstract: The invention disclose an electrochomism display device and a method of fabricating the same, relates to the field of display technology, and the electrochomism display device may effectively suppress the light-leakage phenomenon in the opening region between adjacent electrochomism pixels, thus the display effect of the electrochomism display device is improved. The electrochomism display device comprises a plurality of eletrochromism pixels, each of the eletrochromism pixels comprises a first conductive layer, an eletrochromism layer, and a second conductive layer sequentially formed on a transparent substrate, an opening region is provided between every two adjacent eletrochromism pixels, wherein a thin film transistor is provided in the opening region, and a gate, a source and a drain of the thin film transistor are made of opaque material.

Abstract: An electrochromic device may include a working electrode that includes a high temperature stable material and nanoparticles of an active core material, a counter electrode, and an electrolyte deposited between the working electrode and the counter electrode. The high temperature stable material may prevent fusing of the nanoparticles of the active core material at temperatures up to 700° C. The high temperature stable material may include tantalum oxide. The high temperature stable material may form a spherical shell or a matrix around the nanoparticles of the active core material. A method of forming an electrochromic device may include depositing a working electrode onto a first substrate, in which the working electrode comprises a high temperature stable material and nanoparticles of an active core material, and heat tempering the working electrode and the first substrate.

Abstract: Provided is a color changeable device which includes a first substrate and a second substrate that are spaced apart from each other, a first transparent electrode disposed on the first substrate, a second transparent electrode disposed on the second substrate, an electrochromic layer disposed between the first transparent electrode and the second transparent electrode, an organic layer disposed between the first transparent electrode and the electrochromic layer. The organic layer may include a hole injection layer or an electron injection layer. The organic layer may further include a hole transport layer or an electron transport layer.

Abstract: Variable transmittance optical filters capable of transitioning from a light state to a dark state on exposure to UV radiation and from a dark state to a light state with application of an electric voltage are provided. The optical filters comprise a switching material that comprises one or more chromophores that have electrochromic and photochromic properties.

Abstract: The present invention is directed to a display fluid comprising charged composite pigment particles dispersed in a solvent. The composite pigment particles have a density which matches to the density of the solvent in which they are dispersed. A display fluid comprising the composite pigment particles provides improved display performance.

Abstract: A device for generating a modulation of an optical signal is provided which has a first electro-absorption modulator including a first P-doped semi-conductor area, a first N-doped semi-conductor area, and a first active portion, along with a second electro-absorption modulator including a second P-doped semi-conductor area in electric contact with the first N-doped semi-conductor area, a second N-doped semi-conductor area, and a second active portion, and a connector for introducing electric modulation. In the device, the connector for introducing electric modulation is in contact with the first N-doped semi-conductor area and the second P-doped semi-conductor area.

Abstract: A waveguide including a substrate, an assembly of semiconductor regions consecutively extending on the substrate along a direction corresponding to a propagation direction of an electromagnetic wave having a wavelength noted ?, the semiconductor regions being electrically alternately doped with a first conductivity type and with a second conductivity type along the propagation direction, a dielectric layer interposed between two consecutive semiconductor regions, at least one pair of consecutive elementary structures having a dimensions along the propagation direction adapted to ? to form a grating where the light propagates with no diffraction effects.

Abstract: A display device is provided and has an optical member, the optical member including: a host, a plurality of light conversion particles distributed in the host to convert a wavelength of light generated from a light source, and a protective layer surrounding the host and including plastic.

Abstract: A camera housing includes four walls configured to enclose and secure a camera: a top wall, a bottom wall, a right wall, and a left wall. The bottom wall includes a first segment and a segment coupled by a latching mechanism. The latching mechanism comprises a tongue component coupled to the second segment and a groove component coupled to the first segment. The tongue and groove components are configured such that the tongue component securely couples the second segment to the first segment when the camera frame is in the closed configuration. In the open configuration, the first and second segment can decouple and the left wall and second segment rotates upwards relative to the top wall such that a camera can be inserted or removed from the camera system. The camera housing also includes a button interface, an input/output interface, and a mounting mechanism.

Abstract: A mounting system allows an action camera system or other device to be removably attached to a SCUBA demand regulator. A flexible ring encircles an outer surface of the regulator and is cinched thereabout, the shape of the ring corresponding to the shape of the outer surface of the regulator. A riser, which may be one or more prongs, rises upwardly from the ring and has a mount plate on a distal end thereof. The mount plate adhesively receives a flat adhesive plate of a desired device such as the action camera system.

Abstract: Provided is a beam projector including: an image generation unit configured to generate an image light for an image signal; an optical unit configured to enlarge the image light to project toward a screen; a housing provided with the image generation unit; a motion sensor configured to detect movement of the housing; and a compensation driving unit configured to move at least one of the image generation unit and the optical unit so as to countervail the movement.

Abstract: An image display apparatus and an image display unit. The image display apparatus and the image display unit includes a light source configured to emit light, an illumination optical system including a luminous body forming device configured to form a secondary luminous body, the illumination optical system guiding the light emitted from the light source, an optical modulation element including a plurality of reflection planes to modulate the light guided by the illumination optical system, and a projection optical system including a projection lens system and a barrel storing the projection lens system, the projection optical system projecting the light modulated by the optical modulation element onto a projection plane. The barrel satisfies an equation ?<0.71H+8.5, where ? denotes an outside diameter of a front end of the barrel on a light entering side and H denotes distance between the reflection planes and the front end of the barrel.

Abstract: An electronic device includes a movable mirror system to selectively reflect an incident image projection beam traveling along a first path toward a second path different than a first path. The image projection beam displays a corrected image at a first location but would otherwise display an uncorrected image at a second location when the movable mirror system reflects the image projection beam toward the second path. The electronic device also includes an optical correction system having at least one corrective optic element to correct the image projection beam to display a corrected image at the second location when the movable mirror system reflects the image projection beam toward the second path.

Abstract: An image projection device includes: an image generating unit that includes an optical modulation element generating an image using light emitted from a light source; an illumination optical unit that includes one or more optical elements guiding the light emitted from the light source to the image generating unit; a projecting unit that projects the image generated by the image generating unit; a first control unit that performs control to move the image generating unit movable with respect to the illumination optical unit; and a second control unit that performs control to move an illumination area indicating an area illuminated with the light guided to the image generating unit by the illumination optical unit according to a movement amount of the image generating unit.

Abstract: An optical unit includes a plurality of paraboloid mirrors configured to reflect light fluxes from a plurality of LDs and to guide them to a concave lens. The light fluxes from the paraboloid mirrors are a plurality of convergent light fluxes, and the paraboloid mirrors reflect the light fluxes from the LDs such that as the convergent light fluxes travel farther away from the paraboloid mirrors, distances therebetween become shorter.

Abstract: A display system comprises a projector combined with a retro reflective screen and a viewer distance from the projector such that the observation angle is less than approximately 2-3 degrees. The brightness of the image on the screen for the proposed display system is increased by a factor of ˜100-500× as compared to traditional display systems with for an equivalent power/intensity light source.

Abstract: A multi-prism mechanism includes: an exposure motherboard; and a laser controlling and launching unit; wherein a multi-prism unit, a lens, an angle-switching reflecting mirror, a light detecting reflecting mirror, a light detecting device, three acousto-optical driving controllers, a laser driving control panel, a plurality of support posts and a plurality of reflecting mirrors are provided on the exposure motherboard; the laser controlling and launching unit is mounted on the support posts through nuts, in such a manner that the laser controlling and launching unit is installed on the exposure motherboard in a folded form; wherein the lens comprises a light inputting face and a light outputting face, the laser controlling and launching unit comprises three laser generator sets in parallel, the laser generator set comprises an acousto-optical regulator, a light valve, a directing lens, an optical zooming lens, a laser reflecting mirror and a spotting reflecting mirror.

Abstract: A photomask blank comprising a transparent substrate and a chromium-containing film is provided. The chromium-containing film is constructed by one or more chromium compound layers which are formed of a chromium compound containing Cr, N and optionally O, and have a composition having a Cr content ?30 at % and a total Cr+N+O content ?93 at %, and meeting the formula: 3Cr?2O+3N. A chromium compound layer meeting a first composition having an N/Cr atomic ratio ?0.95, a Cr content ?40 at %, a total Cr+N content ?80 at %, and an O content ?10 at % is included to a thickness of more than 70% to 100% of the overall thickness of the chromium-containing film.

Abstract: To provide a reflective mask blank which may inhibit a variation in reflectance with respect to EUV light due to counter diffusion between a protective film and a material of an adjacent phase-shift film pattern caused by thermal diffusion even if the power of an exposure light source of an EUV exposure machine becomes high; a reflective mask manufactured therefrom; and a method for manufacturing a semiconductor device. The reflective mask blank comprises a multilayer reflective film 13, protective film 14, and phase-shift film 16 for shifting a phase of the EUV light, which are formed in said order on a substrate 12.

Abstract: In order to form a fine mask pattern with high accuracy, in a mask blank in which a light-semitransmissive film, a light shielding film, and a hard mask film are laminated in the stated order on a transparent substrate, the light-semitransmissive film containing silicon and additionally nitrogen, the hard mask film containing silicon or tantalum, and additionally oxygen, the light shielding film having the laminate structure of a lower layer, an intermediate layer, and an upper layer and containing chromium, conditions on the light shielding film are adjusted so that etching rates using a mixture gas of chlorine and oxygen are the lowest for the upper layer and the next lowest for the lower layer.

Abstract: A photomask blank comprising a transparent substrate and a chromium-containing film is provided. The chromium-containing film is formed of a chromium compound containing Cr, N, and optionally O, has a total Cr+N+O content?93 at %, and meets the formula: 3Cr?2O+3N. A chromium compound layer meeting a first composition having a N/Cr atomic ratio?0.95, a Cr content ?40 at %, a Cr+N content?80 at %, and an O content?10 at % accounts for 10-70% of the overall thickness of the chromium-containing film.

Abstract: A method for manufacturing a pellicle includes: providing a supporting substrate; forming an oxide layer over the supporting substrate; forming a metal layer over the oxide layer; forming a graphene layer over the metal layer; and removing at least a portion of the supporting substrate and the oxide layer. An associated method includes: providing a supporting substrate; forming a first silicon carbide (SiC) layer or a diamond layer over the supporting substrate; forming a graphene layer over the SiC layer or the diamond layer; and removing at least a portion of the supporting substrate and the first silicon carbide (SiC) layer or the diamond layer; wherein the pellicle is at least partially transparent to extreme ultraviolet (EUV) radiation. An associated pellicle is also disclosed.

Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.

Abstract: Disclosed are a photosensitive resin composition for a color filter including (A) an acrylic-based binder resin including at least one repeating unit represented by the following Chemical Formula 1, at least one repeating unit represented by the following Chemical Formula 2 and at least one repeating unit represented by the following Chemical Formula 3, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a colorant, and (E) a solvent, and a color filter using the same. In the above Chemical Formulae 1 to 3, each substituent is the same as defined in the detailed description.

Abstract: Oxime ester compounds of the formula I, II, III, IV or V, wherein Z is for example (formula A); Z1 for is NO2, unsubstituted or substituted C7-C20aroyl or unsubstituted or substituted C4-C20heteroaroyl; provided that at least one Z1 is other than NO2; Z2 is for example unsubstituted or substituted C7-C20aroyl; R1, R2, R3, R4, R5 and R6 for example are hydrogen, halogen, or unsubstituted or substituted C1-C20alkyl, unsubstituted or substituted C6-C20aryl, or unsubstituted or substituted C4-C20heteroaryl; R9, R10, R11, R12 and R13 for example are hydrogen, halogen, OR16, unsubstituted or substituted C1-C20alkyl; provided that R9 and R13 are neither hydrogen nor fluorine; R14 is for example unsubstituted or substituted C6-C20aryl or C3-C20heteroaryl Q is for example C6-C20arylene or C3-C20heteroarylene; Q1 is —C1-C20alkylene-CO—; Q2 is naphthoylene; Q3 is for example phenylene; L is for example O-alkylene-O—; R15 is for example hydrogen or C1-C20alkyl; R20 is for example hydrogen, or unsubstituted or substituted

Abstract: The invention relates to a method for forming a liquid radiation curable resin capable of curing into a solid upon irradiation comprising at least one thermally sensitive visual effect initiator. The liquid radiation curable resin is capable of curing into three-dimensional articles having selective visual effects. The resulting three-dimensional articles possess excellent color and/or transparency stability and excellent mechanical properties.

Abstract: An improved resist material and a technique for patterning a workpiece such as an integrated circuit workpiece that offers improved resistance to environmental contaminants is provided. In an exemplary embodiment, the method includes receiving a workpiece and applying to the workpiece a resist material containing a protectant disbursed throughout. A thermal process is performed on the workpiece that causes the protectant to become concentrated in an upper region of the resist material. The resist material is exposed in a lithographic process and the exposed resist material is developed to define a pattern within the resist material. In some such examples, the protectant is selected to reduce an effect of an environmental contaminant without affecting an acid/base ratio of the resist material. In some such embodiments, the protectant includes a hydrophobic functional group.

Abstract: A method and apparatus for exposing a photoresist in the presence of an electric field using a high power continuous wave source as a radiation source is disclosed herein. In one embodiment, a processing region includes a stage, a translation mechanism, a continuous wave electromagnetic module, and plurality of electrode assemblies. The continuous wave electromagnetic module includes a continuous wave electromagnetic radiation source in the form of a high power continuous wave electromagnetic laser. An electric field is applied to the surface of the substrate using the plurality of electrode assemblies while the continuous wave electromagnetic radiation source selectively irradiates the surface of the substrate.

Abstract: The invention relates to a method for regulating a light source of a photolithography exposure system which comprises a plurality of LEDs, by means of the following steps: the light output of the individual LEDs in specific wavelength ranges is detected, and the detected light output is compared with a desired light output distribution over the entire spectrum. The LEDs are operated such that the desired spectral light output distribution is achieved in the most precise manner possible. The invention also relates to an exposure assembly for a photolithography device, having a light source which comprises a plurality of LEDs, a control means which controls the electrical power supplied to the individual LEDs, and a sensor which can detect the light output of the LEDs in the respective ranges of the wavelengths.

Abstract: A reflective mirror is provided with a base and a multilayer film including a first layer and a second layer laminated alternately on the base and capable of reflecting at least a portion of incident light. The multilayer film is provided with a first portion having a first thickness, and with a second portion having a second thickness that is different from the first thickness, and which is provided at a position rotationally symmetric to that of the first portion about an optical axis of the reflective mirror.

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: A calibration curve for a wafer comprising a layer on a substrate is determined. The calibration curve represents a local parameter change as a function of a treatment parameter associated with a wafer exposure to a light. The local parameter of the wafer is measured. An overlay error is determined based on the local parameter of the wafer. A treatment map is computed based on the calibration curve to correct the overlay error for the wafer. The treatment map represents the treatment parameter as a function of a location on the wafer.

Abstract: A movable pressing and light-shielding mechanism for digital stereo image printing comprises a base (1), multiple gantries (2), a photosensitive platform (3) and an exposure system device (4); wherein the base (1) has a groove inside which the photosensitive platform (3) is provided. The number of the gantries (2) is two. The two gantries (2) are provided in parallel and fixed on the base (1) and a slideway (22) is provided between the two gantries (2). A screw is provided in the slideway (22). One end of the screw is connected with a second motor (12). The motor (12) is connected with the exposure system device (4). A top end face of the exposure system device (4) is connected with the screw. A laser scan line opening is provided on a bottom surface of the exposure system equipment (4).

Abstract: A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.

Abstract: Apparatus for cleaning a photo mask includes a rotor in a head, with the rotor having a seal plate having a central opening, a resilient mask seal in the central opening, and retractors attached to the resilient mask seal and adapted to move the resilient mask seal into open and closed positions. A motor in the head rotates the rotor. A push plate in the head moves to operate the retractors. In the closed position the resilient mask seal seals against the sides of the photo mask. The back side of the photo mask can then be cleaned without affecting the patterned front side of the photo mask.

Abstract: An electrophotographic photosensitive member has a support, a charge generation layer, and a charge transport layer in this order, the charge transport layer containing a charge transport material. The charge transport layer is a surface layer of the electrophotographic photosensitive member and contains a polycarbonate resin having a structural unit selected from group A and a structural unit selected from group B.