Patents Issued in February 15, 2018
-
Publication number: 20180044764Abstract: A method of forming a polycrystalline diamond cutting element includes assembling a diamond material, a substrate, and a source of catalyst material or infiltrant material distinct from the substrate, the source of catalyst material or infiltrant material being adjacent to the diamond material to form an assembly. The substrate includes an attachment material including a refractory metal. The assembly is subjected to a first high-pressure/high temperature condition to cause the catalyst material or infiltrant material to melt and infiltrate into the diamond material and subjected to a second high-pressure/high temperature condition to cause the attachment material to melt and infiltrate a portion of the infiltrated diamond material to bond the infiltrated diamond material to the substrate.Type: ApplicationFiled: November 20, 2015Publication date: February 15, 2018Inventors: Yahua Bao, Fulong Wang, J. Daniel Belnap, Ronald K. Eyre, Yi Fang
-
Publication number: 20180044765Abstract: In an example of a method for forming a high-strength, lightweight alloy, starting materials are provided. The starting materials include aluminum, iron, and silicon. The starting materials are ball milled to generate the high-strength, lightweight alloy of a stable AlxFeySiz phase, wherein x ranges from about 3 to about 5, y ranges from about 1.5 to about 2.2, and z is about 1.Type: ApplicationFiled: August 9, 2016Publication date: February 15, 2018Inventors: Zhongyi Liu, Frederick E. Pinkerton, Tengjiao Qi
-
Publication number: 20180044766Abstract: The invention relates to an alloy produced by powder metallurgy and having a non-amorphous matrix, the alloy consists of in weight % (wt. %): C 0-2.5 Si 0-2.5 Mn 0-15 Cr 0-25 Mo 4-35 B 0.2-2.8 optional elements, balance Fe and/or Ni apart from impurities, wherein the alloy comprises 3-35 volume % hard phase particles, the hard phase particles comprises at least one of borides, nitrides, carbides and/or combinations thereof, at least 90% of the hard phase particles have a size of less than 5 ?m and at least 50% of the hard phase particles have a size in the range of 0.3-3 ?m.Type: ApplicationFiled: December 15, 2015Publication date: February 15, 2018Applicant: Uddeholms ABInventor: Magnus TIDESTEN
-
Publication number: 20180044767Abstract: To provide a ferritic stainless steel sheet which has high scale spalling even at a high temperature around 1000° C. Provided is a ferritic stainless steel sheet having excellent Mn-containing oxide film-forming ability and scale spalling ability, containing, in terms of mass %: C: 0.001 to 0.020%, N: 0.001 to 0.020%, Si: 0.10 to 0.40%, Mn: 0.20 to 1.00%, Cr: 16.0 to 20.0%, Nb: 0.30 to 0.80%, Mo: 1.80 to 2.40%, W: 0.05 to 1.40%, Cu: 1.00 to 2.50%, and B: 0.0003 to 0.0030%, in which the above-mentioned components are contained satisfying the formula (1) below, and the balance is composed of Fe and inevitable impurities. At least one of N, Al, V, Mg, Sn, Co, Zr, Hf, and Ta may be added in a predetermined content range.Type: ApplicationFiled: October 6, 2017Publication date: February 15, 2018Applicant: NIPPON STEEL & SUMIKIN STAINLESS STEEL CORPORATIONInventors: Norihiro KANNO, Junichi HAMADA, Yoshiharu INOUE
-
Publication number: 20180044768Abstract: An FeNi alloy composition comprising an L10-type FeNi ordered phase is provided, which satisfies at least one of the conditions that the sum of the content of Fe and the content of Ni is 90 at. % or less and that the FeNi alloy composition contains Si, and preferably satisfies at least one of the conditions that the ratio of the content of Fe to the content of Ni is 0.3 or more and 5 or less and that the sum of the content of Fe and the content of Ni is 65 at. % or more.Type: ApplicationFiled: October 23, 2017Publication date: February 15, 2018Applicant: Tohoku UniversityInventor: Akihiro MAKINO
-
Publication number: 20180044769Abstract: An alloy with tailored hardenability includes carbon, silicon, manganese, nickel, molybdenum, chromium, vanadium, and cobalt. A time and temperature transformation diagram of the alloy has a bainite nose and a ferrite nose that occur at approximately the same time at approximately 4 seconds at temperatures of about 750 K and 950 K, respectively.Type: ApplicationFiled: August 12, 2016Publication date: February 15, 2018Inventors: Charles M. Enloe, Jianfeng Wang, Curt D. Horvath, Jatinder P. Singh
-
Publication number: 20180044770Abstract: The present invention relates to a (ZrM)-(CuN)—Ni—Al-RE amorphous alloy, which containing, by atom percent, 40-65% of Zr, 18-46% of Cu, 2-15% of Ni, 4-15% of Al, 0.1-3% of M, 0.05-3% of N, 0.1-2% of a rare earth element RE, wherein M is Hf and/or Ti; and N is Ag, wherein the amorphous alloy further contains a small amount of Hf, Ti, Ag and Re on the basis of a Zr—Al—Ni—Cu amorphous alloy, to maintain the mechanical properties of the Zr—Al—Ni—Cu amorphous alloy, and has a relatively strong glass froming ability, manufacturability and antimicrobial property.Type: ApplicationFiled: September 22, 2015Publication date: February 15, 2018Inventors: Haifeng ZHANG, Zhengkun LI, Dechuan YU, Huameng FU, Zhengwang ZHU, Aimin WANG, Hong LI, Hongwei ZHANG
-
Publication number: 20180044771Abstract: A process of preparing a blade tip for abrasive coating comprising: forming a hydroxide layer on a surface of the blade tip; ablating the hydroxide layer from the surface with a laser; and roughening the surface with the laser after the hydroxide layer ablation.Type: ApplicationFiled: August 12, 2016Publication date: February 15, 2018Applicant: United Technologies CorporationInventor: Christopher W. Strock
-
Publication number: 20180044772Abstract: An apparatus and method for open-atmosphere flame based spraying employs a nozzle to preheat, pressurize and atomize a mechanically pumped reactive and flammable liquid solution through a small orifice or a nozzle and then a set of pilot flames to combust the spray. The liquid feedstock is preheated to a supercritical temperature before reaching the nozzle and is pressurized before spraying due to a reduced size of the outlet port of the feedstock flow channel relative to the inlet. A supplementary collimating, or sheathing, gas is supplied to the flow channel of the feedstock and both the feedstock and the supplementary gas are uniformly heated before spraying. This arrangement helps to avoid clogging of the nozzle and results in satisfactory control of the properties of the particulate products of the spraying procedure.Type: ApplicationFiled: July 13, 2016Publication date: February 15, 2018Inventors: Radenka Maric, Thomas P.K. Vanderhoek, Justin Michael Roller
-
Publication number: 20180044773Abstract: Coating (210) deposited on a surface of a substrate (201) comprising a multi-layered film (216) consisting of a plurality of A-layers and a plurality of B-layers deposited alternating one on each other forming a A/B/A/B/A . . . architecture, the A-layers comprising aluminium chromium boron nitride and the B-layers comprising aluminium chromium nitride and not comprising boron, whereas the multi-layered film (216) comprises at least a first portion (216a) and a last portion (216c), wherein the average boron content in the first coating portion (216a) is higher than the average boron content in the last coating portion (216c), and both the first coating portion (216a) and the last coating portion (216c) exhibit inherent compressive stresses and wherein the inherent compressive stress in the first coating portion (216a) is lower than it in the last coating portion (216c).Type: ApplicationFiled: December 3, 2015Publication date: February 15, 2018Inventors: Anders Olof Eriksson, Mirjam Arndt, Sebastian Stein
-
Publication number: 20180044774Abstract: A steel sheet coated with an aluminum-based coating and a second zinc coating having a thickness less than or equal to 1.1 ?m is provided. A method for preparing the coated steel sheet, a method for preparing a press-hardened part from the steel sheet, a press-hardened part, and the use of the press-hardened part are also provided.Type: ApplicationFiled: January 22, 2016Publication date: February 15, 2018Inventors: Christian Allely, Eric Jacqueson, Daniel Chaleix
-
Publication number: 20180044775Abstract: Cables including a heat-reflective layer are disclosed. The heat-reflective layer includes a polymeric layer and metal particles. The metal particles are on or near the exposed surface of the heat-reflective layer. Methods of making a heat-reflective layer and cables including a heat-reflective layer rare also disclosed.Type: ApplicationFiled: August 15, 2017Publication date: February 15, 2018Inventors: Xi Zhang, Jon Michael Malinoski, Vijay Mhetar
-
Publication number: 20180044776Abstract: The present invention provides a vacuum deposition heating device, which includes a heating device outer wall (3), a crucible (1) disposed inside the heating device outer wall (3), and a crucible cover (2) positioned on the crucible (1). A primary heating coil (11) is arranged between the crucible (1) and the heating device outer wall (3) and corresponds to outer circumferences of the crucible (1) and the crucible cover (2). The crucible cover (2) has a center in which a jet opening (20) that extends through top and bottom surfaces of the crucible cover (2) is formed. The crucible cover (2) is provided thereon with a secondary heating coil (21) corresponding to an outer circumference of the jet opening (20).Type: ApplicationFiled: February 26, 2016Publication date: February 15, 2018Inventors: Yang Liu, Yawei Liu
-
Publication number: 20180044777Abstract: A film forming apparatus includes a cylindrical evaporation source, an electrode, and a gas passage. The evaporation source is composed of metal and includes an internal space for accommodating a workplace. The electrode is arranged in the internal space of the evaporation source, The gas passage supplies gas to the internal space of the evaporation source from a space outside the evaporation source. The gas passage includes an end portion located in the internal space. The end portion of the gas passage includes a first section composed of a first material and a second section composed of a second material. The first material and the second material have different thermal expansion coefficients.Type: ApplicationFiled: July 19, 2017Publication date: February 15, 2018Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Shota MATSUDA, Hiromichi NAKATA, Takayasu SATO, Yoji SATO, Kazutaka TACHIBANA, Daiki TSUBOI
-
Publication number: 20180044778Abstract: Generally planar sputter targets having a reverse bow surface (i.e., convexity) facing the magnets in a magnetron assembly is provided. Methods of making Cu and Cu alloy targets are provided including an annealing step performed at temperatures of from 1100-1300 F for a period of about 1-2 hours. Targets made by the methods have increased grain sizes on the order of 30-90 microns.Type: ApplicationFiled: February 23, 2016Publication date: February 15, 2018Inventors: Robert S. Bailey, Junhai Yan, Melvin Kirk Holcomb, Alexander Leybovich
-
Publication number: 20180044779Abstract: A sintered compact sputtering target in which a composition ratio based on atomicity is represented by a formula of (Fe100?X—PtX)100?A—CA (provided A is a number which satisfies 20?A?50 and X is a number which satisfies 35?X?55), wherein C grains are finely dispersed in an alloy, and the relative density is 90% or higher. The production of a magnetic thin film with granular structure is provided without using an expensive simultaneous sputtering device, and a high-density sputtering target capable of reducing the amount of particles generated during sputtering is provided.Type: ApplicationFiled: October 11, 2017Publication date: February 15, 2018Inventors: Atsushi Sato, Shin-ichi Ogino
-
Publication number: 20180044780Abstract: A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.Type: ApplicationFiled: October 23, 2017Publication date: February 15, 2018Applicant: Zond, LLCInventors: Roman Chistyakov, Bassam Hanna Abraham
-
Publication number: 20180044781Abstract: Embodiments presented herein relate to a pulse control system for a substrate processing system. The pulse control system includes a power source, a system controller, and a pulse shape controller. The pulse shape controller is coupled to the power source and in communication with the system controller. The pulse shape controller includes a first switch assembly and a second switch assembly. The first switch assembly includes a first switch having a first end and a second end. The first switch is configurable between an open state and a closed state. The second switch assembly includes a second switch having a first end and a second end. The first switch is in the closed state and the second switch is in the open state. The first switch in the closed state is configured to allow a pulse supplied by the power source to transfer through the pulse shape controller.Type: ApplicationFiled: November 11, 2016Publication date: February 15, 2018Inventors: Michael STOWELL, Viachslav BABAYAN, Jingjing LIU, Zhong Qiang HUA
-
Publication number: 20180044782Abstract: An interconnect and a method of making an interconnect between one or more features on a substrate comprises: sputtering a noble metal-copper eutectic thin film under controlled power on an oxide grown or deposited on a substrate; and forming an amorphous alloy structure from the noble metal-copper eutectic thin film in the shape of the interconnect and the interconnect comprising no grain or grain boundaries without temperature sensitive resistivity.Type: ApplicationFiled: August 14, 2017Publication date: February 15, 2018Inventors: Sundeep Mukherjee, Santanu Das
-
Publication number: 20180044783Abstract: A process kit ring for use in a plasma processing system is disclosed herein. The process kit ring includes an annular body and one or more hollow inner cavities. The annular body is formed from a plasma resistant material. The annular body has an outer diameter greater than 200 mm. The annular body includes a top surface and a bottom surface. The top surface is configured to face a plasma processing region of a process chamber. The bottom surface is opposite the top surface. The bottom surface is substantially perpendicular to a centerline of the body. The bottom surface is supported at least partially by a pedestal assembly. The one or more hollow inner cavities are formed in the annular body about the centerline. The one or more hollow inner cavities are arranged in a circle within the annular body.Type: ApplicationFiled: August 10, 2016Publication date: February 15, 2018Inventors: Gangadhar SHEELAVANT, Cariappa Achappa BADUVAMANDA, Bopanna Ichettira VASANTHA
-
Publication number: 20180044784Abstract: A chucking apparatus and methods for coating a glass substrate using a vacuum deposition process are disclosed. In one or more embodiments, the chucking apparatus includes an ESC (ESC), a carrier disposed on the ESC, wherein the carrier comprises a first surface adjacent to the ESC and an opposing second surface for forming a Van der Waals bond with a third surface of a glass substrate, without application of a mechanical force on a fourth surface of the glass substrate opposing the third surface. In one or more embodiments, the method includes disposing a carrier and a glass substrate on an ESC, such that the carrier is between the glass substrate and the ESC to form a chucking assembly, forming a Van der Waals bond between the carrier and the glass substrate, and vacuum depositing a coating on the glass substrate.Type: ApplicationFiled: August 10, 2017Publication date: February 15, 2018Inventors: Daniel Robert Boughton, James Gerard Fagan, Sumalee Likitvanichkul Fagan
-
Publication number: 20180044785Abstract: A mobile target coating device includes: a target source; a target source carrier section configured to carry and drive the target source to move; an infrared temperature detecting section configured to detect a temperature of a surface of the target source; an infrared heating section configured to heat the target source; a control section configured to receive a detection signal of the infrared temperature detecting section and determine whether the temperature of the surface of the target source is uniform or not; the control section is further configured to control the infrared heating section to heat a portion having a lower temperature of the surface of the target source and to stop heating after the temperature of the surface of the target source becomes uniform. A coating method using a mobile target coating device is also disclosed.Type: ApplicationFiled: January 3, 2017Publication date: February 15, 2018Inventors: Guoping QIAN, Yangkun JING, Chengye WU, Bei WANG, Yu JI
-
Publication number: 20180044786Abstract: The present invention relates to a high resolution additive manufacturing method, including: creating a rigid shell of a stable material on all surfaces except for a sprue of a three dimensional (3D) polymer part using a chemical vapor deposition (CVD) process which includes: depositing the stable material at a process temperature of 100° C. or less, and operating at, or near, atmospheric pressure; and removing the 3D polymer part by accessing the inside of the rigid shell through the sprue to allow dissolution of the 3D polymer part, thereby leaving a replicated rigid shell of the stable material.Type: ApplicationFiled: August 15, 2016Publication date: February 15, 2018Inventor: VINCENT T. BLY
-
Publication number: 20180044787Abstract: A solid source material is described for forming a tungsten-containing film. The solid source material is tungsten hexacarbonyl, wherein content of molybdenum is less than 1000 ppm. Such solid source material may be formed by a process including provision of particulate tungsten hexacarbonyl raw material of particles of size less than 5 mm, wherein particles of size greater than 1.4 mm are less than 15% of the particles, and wherein content of molybdenum is less than 1000 ppm, and sintering the particulate tungsten hexacarbonyl raw material at temperature below 100° C. to produce the solid source material as a sintered solid.Type: ApplicationFiled: February 28, 2016Publication date: February 15, 2018Inventors: Thomas H. BAUM, Robert L. WRIGHT, Jr., Scott L. BATTLE, John M. CLEARY
-
Publication number: 20180044788Abstract: A deposited cobalt composition is described, including cobalt and one or more alloy component that is effective in combination with cobalt to enhance adhesion to a substrate when exposed on the substrate to variable temperature and/or delaminative force conditions, as compared to corresponding elemental cobalt, wherein the one or more alloy component is selected from the group consisting of boron, phosphorous, tin, antimony, indium, and gold. Such deposited cobalt composition may be employed for metallization in semiconductor devices and device precursor structures, flat-panel displays, and solar panels, and provides highly adherent metallization when the metallized substrate is subjected to thermal cycling and/or chemical mechanical planarization operations in the manufacturing of the semiconductor, flat-panel display, or solar panel product.Type: ApplicationFiled: August 10, 2017Publication date: February 15, 2018Inventors: Philip S.H. Chen, Bryan C. Hendrix, Thomas H. Baum
-
Publication number: 20180044789Abstract: An apparatus and method for generating a vapor with a compact vaporizer design and exposing the gas and liquid mixture for vaporization to a reduced maximum temperature. A gas and liquid droplet flow through a metal housing configured to heat the gas and liquid droplet mixture flow for vaporization includes directing the gas and liquid droplet mixture through an inlet of the metal housing and flowing the gas through a tortious flow path defined by a plurality of tubular flow passageways arranged around a central axis for vaporization. The flow path is directed through a heat exchanger including one more changes in direction of flow path before flowing into the further tortious flow path described above. Residual liquid droplets may be further vaporized by flowing through a second metal housing configured to heat the gas and liquid droplet mixture for vaporization and having a similar construction to the first metal housing and providing a second tortious flow path.Type: ApplicationFiled: October 23, 2017Publication date: February 15, 2018Inventors: Thuc M. Dinh, Yamin Ma, Benjamin Y.H. Liu
-
Publication number: 20180044790Abstract: A method for performing atomic layer deposition (ALD) on a substrate is provided, including: exposing the substrate to a first reactant and an additive simultaneously, the first reactant and the additive being configured to adsorb on exposed surfaces of the substrate, a partial pressure of the additive being configured so that adsorption of the additive in a gap feature of the substrate decreases as depth increases in the gap feature; after exposing the substrate to the first reactant and the additive, exposing the substrate to a second reactant, the second reactant configured to react with the adsorbed first reactant to form a thin film product, the second reactant configured to react with the adsorbed additive to remove the adsorbed additive from the substrate surface.Type: ApplicationFiled: August 12, 2016Publication date: February 15, 2018Inventor: Patrick Van Cleemput
-
Publication number: 20180044791Abstract: Certain embodiments herein relate to an apparatus used for remote plasma processing. In various embodiments, the apparatus includes a reaction chamber that is conditioned by forming a low recombination material coating on interior chamber surfaces. The low recombination material helps minimize the degree of radical recombination that occurs when the reaction chamber is used to process substrates. During processing on substrates, the low recombination material may become covered by relatively higher recombination material (e.g., as a byproduct of the substrate processing), which results in a decrease in the amount of radicals available to process the substrate over time. The low recombination material coating may be reconditioned through exposure to an oxidizing plasma, which acts to reform the low recombination material coating. The reconditioning process may occur periodically as additional processing occurs on substrates.Type: ApplicationFiled: October 26, 2017Publication date: February 15, 2018Inventors: Bhadri N. Varadarajan, Bo Gong, Rachel E. Batzer, Huatan Qiu, Bart J. van Schravendijk, Geoffrey Hohn
-
Publication number: 20180044792Abstract: A gas injector is used in a film deposition apparatus for semiconductor processes. The gas injector comprises a plurality of gas inlets, a plurality of gas flow channels, and a plurality of gas outlets. The gas inlets introduce several kinds of gases into the gas flow channels. The several kinds of gases are delivered to the gas outlets by the gas flow channels. The cross-sectional area of a portion of at least one of the gas flow channels is gradually changed relative to the gas outlets.Type: ApplicationFiled: May 9, 2017Publication date: February 15, 2018Inventor: Shih-Yung SHIEH
-
Publication number: 20180044793Abstract: Disclosed is a process for treating a container with plasma, for depositing a barrier layer on an internal face of the container. This process includes: after the plasma has been extinguished, obtaining a thermal image of the container; comparing the thermal image of the container with a reference thermal image stored in memory; and, if the thermal image of the container differs from the reference thermal image, modifying at least one of the following parameters: internal pressure, external pressure, precursor gas flow rate, microwave frequency, microwave power, duration of the treatment.Type: ApplicationFiled: February 10, 2016Publication date: February 15, 2018Inventor: Thierry DEAU
-
Publication number: 20180044794Abstract: A cleaning method includes: removing deposits adhered to an inside of a processing vessel by forming a film on a substrate in the processing vessel, and thereafter, supplying a cleaning gas into the processing vessel, wherein the removing the deposits includes: a first step of supplying the cleaning gas into the processing vessel at a first flow rate when a temperature of a connection portion connecting an exhaust pipe that exhausts the interior of the processing vessel and the processing vessel is lower than a first temperature; and a second step of supplying the cleaning gas to the processing vessel while gradually decreasing the flow rate of the cleaning gas from the first flow rate to a second flow rate lower than the first flow rate when the temperature of the connection portion reaches a first temperature.Type: ApplicationFiled: August 9, 2017Publication date: February 15, 2018Applicant: HITACHI KOKUSAI ELECTRIC INC.Inventors: Takatomo YAMAGUCHI, Takafumi SASAKI, Koei KURIBAYASHI
-
Publication number: 20180044795Abstract: An underlayer is formed to cover the upper surface of a substrate and a guide pattern is formed on the underlayer. A DSA film constituted by two types of polymers is formed in a region on the underlayer where the guide pattern is not formed. Thermal processing is performed while a solvent is supplied to the DSA film on the substrate. Thus, a microphase separation of the DSA film occurs. As a result, patterns made of the one polymer and patterns made of another polymer are formed. Exposure processing and development processing are performed in this order on the DSA film after the microphase separation such that the patterns made of another polymer are removed.Type: ApplicationFiled: October 26, 2017Publication date: February 15, 2018Inventors: Masahiko HARUMOTO, Tadashi MIYAGI, Yukihiko INAGAKI, Koji KANEYAMA
-
Publication number: 20180044796Abstract: Disclosed is a system for treating a surface of a multi-metal article. The system includes first and second compositions for contacting at least a portion of the surface. The first composition includes phosphate ions and zinc ions and is substantially free of fluoride. The second composition includes a lanthanide series metal cation and an oxidizing agent. Methods of treating a multi-metal article using the system also are disclosed. Also disclosed are substrates treated with the system and method.Type: ApplicationFiled: August 14, 2017Publication date: February 15, 2018Inventors: Steven J. Lemon, Justin J. Martin, Kevin T. Sylvester, Peter L. Votruba-Drzal, Gordon L. Post
-
Publication number: 20180044797Abstract: Disclosed is a repair agent for a plated base including a plating layer which is disposed on a surface of a metal base and which includes a metal with a stronger tendency to ionization than metal comprising the metal base, the repair agent including a phosphoric acid compound and a phosphonic acid compound.Type: ApplicationFiled: August 3, 2017Publication date: February 15, 2018Applicants: HIROSHIMA UNIVERSITY, MAZDA MOTOR CORPORATIONInventors: Akihiro YABUKI, Masato WATABIKI, Takashi FUJIWARA, Takakazu YAMANE, Osamu MIMURA
-
Publication number: 20180044798Abstract: A blade for a rotor of a gas turbine has a cast substrate including: a root for connecting the blade to a rotor of a gas turbine, a platform having a lower surface from which the root extends and an upper surface opposite to the lower surface, an aerofoil extending from the upper surface of the platform, the lower surface and the root having an anti-corrosion layer of an high Cr blade alloy over the substrate. A method for manufacturing a blade where the lower surface and the root have the anti-corrosion layer.Type: ApplicationFiled: March 24, 2016Publication date: February 15, 2018Applicant: Siemens AktiengesellschaftInventor: Paul Mathew Walker
-
Publication number: 20180044799Abstract: A non-metallic coating for a steel substrate or for a coated steel substrate includes a first layer fabricated from at least one of a silicon oxide, a silicon nitride, and a silicon oxynitride, as well as a second layer fabricated from chromium nitride. The second layer has a thickness between 3 nm and 30 nm, and the first layer and the second layer together form a stacked-layer structure having a total thickness of not more than 300 nm.Type: ApplicationFiled: March 17, 2016Publication date: February 15, 2018Inventors: Mathias BELZNER, Ralph DOMNICK, Edward SCHLEICHERT, Darren WOMACK
-
Publication number: 20180044800Abstract: Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that is deleterious to the substrate article, structure, material, or equipment. The metal surface is coated with a protective coating preventing reaction of the coated surface with the reactive gas, and/or otherwise improving the electrical, chemical, thermal, or structural properties of the substrate article or equipment. Various methods of coating the metal surface are described, and for selecting the coating material that is utilized.Type: ApplicationFiled: February 13, 2016Publication date: February 15, 2018Inventors: Bryan C. Hendrix, David W. Peters, Weimin Li, Carlo Waldfried, Richard A. Cooke, Nilesh Gunda, I-Kuan Lin
-
Publication number: 20180044801Abstract: An object of the present invention is to provide: an etching liquid which is capable of etching titanium selectively in the presence of copper, and is further low in toxicity and excellent in storage stability; and an etching method using this etching liquid. The etching liquid of the present invention which is a liquid includes at least one acid selected from the group consisting of sulfuric acid, hydrochloric acid, and trichloroacetic acid, and at least one organic sulfur compound selected from the group consisting of a thioketone compound and a thioether compound, and makes it possible to etch titanium selectively in the presence of copper.Type: ApplicationFiled: January 21, 2016Publication date: February 15, 2018Inventors: Yuki Ogino, Mami Tojima, Masahiro Hayashizaki, Minoru Otani
-
Publication number: 20180044802Abstract: A corrosion inhibiting composition includes a first plurality of carriers and a second plurality of carriers. The first plurality of carriers has a first carrier body which encapsulates a film-forming compound. The second plurality of carriers has a second carrier body encapsulates a corrosion inhibitor. Each of the first and second carrier bodies is formed of a degradable material. Coatings and methods for inhibiting corrosion on a metal substrate are also described herein.Type: ApplicationFiled: October 6, 2017Publication date: February 15, 2018Inventors: Todd Andrew FITZ, Mariko Elaine BERG
-
Publication number: 20180044803Abstract: A photochemical electrode includes a conductive oxide. Fermi energy of the conductive oxide is higher than a first energy minimum of a first band having a lowest energy and is lower than a second energy minimum of a second band having a higher energy than the first band among bands whose curvatures are positive in reciprocal space. The first energy minimum and the second energy minimum are at the same point of wave vector. A difference between the second energy minimum and the first energy minimum is not less than 1 eV nor more than 3 eV, and is smaller than a difference between the first energy minimum and an energy maximum of a band having a highest energy among bands whose curvatures are negative.Type: ApplicationFiled: August 8, 2017Publication date: February 15, 2018Applicant: FUJITSU LIMITEDInventors: John David Baniecki, Toshihisa Anazawa, Yoshihiko Imanaka
-
Publication number: 20180044804Abstract: Provided herein are processes and systems for oxidation of a hydrocarbon reactant to generate an oxidized hydrocarbon product; said process comprising: contacting a water oxidation electrocatalyst with said hydrocarbon reactant and water in the presence of a non-aqueous solvent; wherein an anodic bias is applied to said water oxidation electrocatalyst, thereby generating said oxidized hydrocarbon product; and wherein said water oxidation electrocatalyst comprises one or more transition metals other than Ru. Optionally, said water is provided in said non-aqueous solvent at a concentration less than or equal to 0.5 vol. %. Optionally, the magnitude of said anodic bias is selected to generate said oxidized hydrocarbon product characterized by selected product distribution.Type: ApplicationFiled: August 11, 2017Publication date: February 15, 2018Inventors: Bryan M. HUNTER, Harry B. GRAY
-
Publication number: 20180044805Abstract: Synthetic materials that are useful as heterogeneous catalysts or electrocatalysts. The materials can be used to catalyze oxidation and/or reduction reactions and/or oxygen/hydrogen evolution/oxydation reactions.Type: ApplicationFiled: February 16, 2016Publication date: February 15, 2018Applicant: STC.UNMInventors: Alexey Serov, Plamen Atanassov
-
Publication number: 20180044806Abstract: A method of producing a non-metallic feedstock powder suitable for reduction to metal comprises the steps of combining a liquid with solid metal oxide particles to form a mixture, subjecting the mixture to high-shear mixing to form a liquid suspension of metal oxide and the liquid, and drying the liquid suspension using a fluidised-bed spray-granulation process to grow a plurality particles to form the non-metallic feedstock powder. The method allows feedstock powders to be grown to desired particle sizes. The method allows production of feedstock powders having controlled compositions.Type: ApplicationFiled: March 10, 2016Publication date: February 15, 2018Inventor: JAMES DEANE
-
Publication number: 20180044807Abstract: Disclosed herein is an electrically conductive material including a base material made of a copper alloy sheet strip, a Cu—Sn alloy coating layer and a reflow Sn coating layer, wherein the Cu—Sn alloy coating layer and the reflow Sn coating layer are arranged on a surface of the base material in this order from a side of the base material, parts of the Cu—Sn alloy coating layer are exposed on a surface, a coefficient of friction in each of a direction perpendicular to and a direction inclined by 45° to a rolling direction of the copper alloy base material is reduced, compared to that in the rolling direction of the copper alloy base material.Type: ApplicationFiled: March 8, 2016Publication date: February 15, 2018Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)Inventor: Koya NOMURA
-
Publication number: 20180044808Abstract: A galvanically decorated component made of plastic has a galvanically applied chrome layer, wherein the chrome layer is processed with a laser in such a way that a mechanically applied brush structure or structure is reproduced on the surface. The component decorated in this way satisfies all requirements in accordance with the respective test specifications of the planned area of application. A method produces a plastic component having a structured surface. Components of this type made of plastic for the automotive industry are substantially decorative and operative elements.Type: ApplicationFiled: October 28, 2015Publication date: February 15, 2018Applicant: Gerhardi Kunststofftechnik GmbHInventor: Dirk KIESLICH
-
Publication number: 20180044809Abstract: [Object] To provide a zinc-based plated steel sheet excellent in coating film adhesiveness after hot pressing more conveniently. [Solution] A zinc-based plated steel sheet according to the present invention comprises: a zinc-based plated steel sheet that is a base metal; and a surface treatment layer formed on at least one surface of the zinc-based plated steel sheet, in which the surface treatment layer contains one or more oxides selected from titanium oxide, nickel oxide, and tin(IV) oxide each having a particle size of more than or equal to 2 nm and less than or equal to 500 nm, in a range of more than or equal to 0.2 g/m2 and less than or equal to 2 g/m2 per one surface.Type: ApplicationFiled: March 31, 2016Publication date: February 15, 2018Applicant: NIPPON STEEL & SUMITOMO METAL CORPORATIONInventors: Yasuaki KAWAMURA, Koji AKIOKA, Akihiro SENGOKU
-
Publication number: 20180044810Abstract: A rare earth permanent magnet is prepared by immersing a portion of a sintered magnet body of R1—Fe—B composition (wherein R1 is a rare earth element) in an electrodepositing bath of a powder dispersed in a solvent, the powder comprising an oxide, fluoride, oxyfluoride, hydride or rare earth alloy of a rare earth element, effecting electrodeposition for letting the powder deposit on a region of the surface of the magnet body, and heat treating the magnet body with the powder deposited thereon at a temperature below the sintering temperature in vacuum or in an inert gas.Type: ApplicationFiled: October 13, 2017Publication date: February 15, 2018Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Yukihiro Kuribayashi, Yoshifumi Nagasaki
-
Publication number: 20180044811Abstract: Techniques for electrodepositing selenium (Se)-containing films are provided. In one aspect, a method of preparing a Se electroplating solution is provided. The method includes the following steps. The solution is formed from a mixture of selenium oxide; an acid selected from the group consisting of alkane sulfonic acid, alkene sulfonic acid, aryl sulfonic acid, heterocyclic sulfonic acid, aromatic sulfonic acid and perchloric acid; and a solvent. A pH of the solution is then adjusted to from about 2.0 to about 3.0. The pH of the solution can be adjusted to from about 2.0 to about 3.0 by adding a base (e.g., sodium hydroxide) to the solution. A Se electroplating solution, an electroplating method and a method for fabricating a photovoltaic device are also provided.Type: ApplicationFiled: October 29, 2017Publication date: February 15, 2018Inventors: Shafaat Ahmed, Hariklia Deligianni
-
Publication number: 20180044812Abstract: Apparatus and methods for generating thermal energy from a pulsed DC electric power source utilizing pairs of electrodes disposed in a water medium. Electric pulses are provided at a frequency up to 20 MHz. Efficiencies are obtained when multiple pairs of electrodes are powered by the pulsed DC electric power source. The electrodes may be rods, plates, cylinders, or other useful shapes. The electrodes exposed to water may be a metal or alloy of nickel, platinum, palladium, or tungsten. The DC pulse generator is electrically connected to the electrodes to provide a source of pulsed direct current electric power. The input polarity to the electrodes may be periodically reversed or alternated between the anode and cathode polarity to limit erosion/electroplating of electrode material.Type: ApplicationFiled: August 14, 2017Publication date: February 15, 2018Inventors: Robert H. Burgener, II, Troy Atkin
-
Publication number: 20180044813Abstract: The invention relates to an aqueous inhibition composition for the inhibition of electrochemical metal plating on polymer surfaces, said inhibition composition comprising an inhibition agent selected from the group of compounds having at least one sulfur and at least one nitrogen atom as well as to a method for the inhibition of an insulated surface of a rack area. The inventive inhibition composition is capable to provide a solution for prohibiting unintended metallization on insulated areas of the racks when non-chromic etching is utilized for plating on plastics processes.Type: ApplicationFiled: February 23, 2016Publication date: February 15, 2018Inventors: Frank Noffke, Andreas Konigshofen, Axel Fuhrmann, Christoph Werner