Abstract: A liquid crystal display includes a plurality of pixels, a lower substrate and an upper substrate facing each other, a liquid crystal layer disposed between the lower substrate and the upper substrate, a pixel electrode disposed on the lower substrate and including a plurality of sub-regions which differently controls an inclination direction of liquid crystal molecules included in the liquid crystal layer for a pixel of the plurality of pixels, and a gate line disposed on the lower substrate and including a portion which overlaps a boundary between adjacent sub-regions of the plurality of sub-regions of the pixel electrode.

Abstract: The present invention provides a liquid crystal display device in which even in the case of using a photo-alignment technique, excellent afterimage characteristics can be stably obtained. Provided is a liquid crystal display device including a TFT substrate having an alignment film, an opposed substrate which is arranged to face the TFT substrate and on which an alignment film is formed, and a liquid crystal layer sandwiched between the alignment films, wherein the alignment films are materials that can provide a liquid crystal alignment restraining force by irradiating polarized light, and the ratio of oxygen atoms on the surface of the alignment film is higher than that in the alignment film.

Abstract: A liquid crystal display includes: a first substrate on which a display area and a non-display area disposed around the display area are defined; a second substrate disposed opposite to the first substrate; a common electrode disposed on the second substrate; a common power supply line disposed in the non-display area of the first substrate to provide a common voltage; and a spacer disposed on the common power supply line to connect the common power supply line and the common electrode, where the spacer includes a conductive ball, and the conductive ball includes a heating solution.

Abstract: An exemplary embodiment of the present invention provides a liquid crystal display including: a substrate; a thin film transistor disposed on the substrate to be connected to a gate line extending in a first direction and a data line extending in a second direction; a pixel electrode connected to the thin film transistor; a roof layer positioned over the pixel electrode; a liquid crystal layer disposed in a plurality of microcavities formed between the pixel electrode and the roof layer; an inorganic insulating layer disposed to overlap the microcavities; and an overcoat disposed on the roof layer, wherein the inorganic insulating layer includes a first portion overlapping the roof layer and a second portion that does not overlap the roof layer, and a length of the second portion in the second direction is about 20 ?m or more.

Abstract: A liquid crystal display device includes a first substrate including a first pixel electrode, a second pixel electrode, and a third pixel electrode, a second substrate including a first color filter opposed to the first pixel electrode, a second color filter opposed to the second pixel electrode, and a third color filter opposed to the third pixel electrode, and a liquid crystal layer held between the first substrate and the second substrate, a first interval along the first direction between the first pixel electrode and the second pixel electrode being smaller than a second interval along the first direction between the second pixel electrode and the third pixel electrode.

Abstract: The present invention provides a pixel electrode and a liquid crystal display panel. The pixel electrode comprises a rectangular frame (40), a plurality of first strip pixel electrode branches (41), a plurality of second strip pixel electrode branches (42), a plurality of third strip pixel electrode branches (43) and a plurality of fourth strip pixel electrode branches (44), which are inside the rectangular frame (40), and connected with the rectangular frame (40), and because the pixel electrode does not including the (cross) keel, it is capable of solving the issue that the (cross) keel part of the pixel electrode causes the penetration rate reduction of the liquid crystal display panel to promote the penetration rate of the liquid crystal display panel for reducing the demand to the backlight brightness of the liquid crystal display panel and the usage power consumption.

Abstract: A liquid crystal display is divided into a first region and a second region by a virtual central line that passes through a central point of the LCD and extends along a first direction, where the first region comprises a plurality of dots, each comprising a first pixel, a second pixel and a third pixel displaying different colors, wherein the plurality of dots are repeatedly arranged along a second direction intersecting the first direction and comprise a first dot and a second dot, wherein a first distance between the first pixel of the first dot and the central line is greater than a second distance between the first pixel of the second dot and the central line, and the area of the first pixel of the first dot is less than that of the first pixel of the second dot.

Abstract: A representative LCD system includes: liquid crystal material disposed between first and second substrates; protrusions supported by the first substrate and arranged in an array, each of the protrusions extending from a base; first pixel electrodes, with a corresponding one of the first pixel electrodes being positioned adjacent the base of a corresponding one of the protrusions; first common electrodes, with a corresponding one of the first common electrodes being positioned adjacent the base of a corresponding one of the protrusions such that each of the protrusions is positioned between one of the first pixel electrodes and one of the first common electrodes; second pixel electrodes, with a corresponding one of the second pixel electrodes being positioned on a corresponding one of the protrusions; and second common electrodes, with a corresponding one of the second common electrodes being positioned on a corresponding one of the protrusions.

Abstract: The invention provides an alternative liquid crystal and light emitting display which include at least one Transparent Conductive Oxide layers which comprises a zinc oxide doped with a group III, IV, V, or transition metal dopant, and sputtered from a sputtering target. In a further embodiment, this Transparent Conductive Oxide layer can optionally include a layer of a patternable TCO, such as ITO.

Abstract: The present disclosure provides an array substrate. The array substrate includes a plurality of thin film transistors configured in an array arrangement, a plurality of common electrodes, a plurality of mutually insulated pixel electrodes coupled to the common electrodes, and a plurality of metal pads coupled to the common electrodes and configured in a layer different from the common electrodes or the pixel electrodes. The metal pads are electrically connected to drain electrodes of the thin film transistors and pixel electrodes. An orthogonal projection of a metal pad on the array substrate overlaps with at least a portion of an orthogonal projection of a corresponding common electrode on the array substrate.

Abstract: A liquid crystal display includes: a first substrate; a reference voltage line including a storage electrode; a pixel electrode including a first subpixel electrode and a second subpixel electrode, and disposed in a pixel area; a second substrate facing the first substrate; and a liquid crystal layer provided between the first substrate and the second substrate, wherein the first subpixel electrode includes a first horizontal stem and a first vertical stem, the second subpixel electrode includes a second horizontal stem and a second vertical stem, the second subpixel electrode is provided to an external side of the pixel area to surround the first subpixel electrode, and the storage electrode includes a first storage electrode overlapping the first horizontal stem of the first subpixel electrode, and a second storage electrode overlapping the second vertical stem of the second subpixel electrodes.

Abstract: There is provided a liquid crystal display including: a first substrate including a display area displaying an image and a peripheral area surrounding the display area; a data line disposed on the first substrate in the display area and including a source electrode; a first gate insulating layer disposed at a portion except for the portion where the data line is disposed on the first substrate; a semiconductor layer disposed on the source electrode; a drain electrode disposed on the semiconductor layer; a gate line disposed on the first gate insulating layer in the display area and including a gate electrode; and a second gate insulating layer disposed between the gate electrode on the first gate insulating layer and the semiconductor layer, in which the gate line and the data line extend in the same direction to each other.

Abstract: A display panel includes a high pixel electrode including a first stem which extends substantially in a first direction, and a second stem which extends substantially in a second direction crossing the first direction, a low pixel electrode including a first stem which extends substantially in the first direction, and a second stem which extends substantially in the second direction, a data line which extends in the second direction, a high storage line which extends substantially in the second direction and overlaps the second stem of the high pixel electrode, and a low storage line which extends substantially in the second direction and overlaps the second stem of the low pixel electrode.

Abstract: A multicolored pressure sensitive liquid crystal device includes a first transparent substrate that is flexible on which pressure is applied and a second substrate spaced apart from the first substrate. Also included are electrically conductive layers, one of which is in contact with the first substrate and is transparent and another of which is in contact with the second substrate. The electrically conductive layers are separated from each other. Also included is a pressure sensitive liquid crystal layer including cholesteric liquid crystal disposed between the electrically conductive layers. The liquid crystal layer includes at least first and second color regions. The first color region reflects light of a first color and the second color region reflects light of a second color. The pressure applied to the substrate results in a change in reflectance of the liquid crystal.

Abstract: A display apparatus and a displaying method thereof are provided. The display apparatus includes a transmissive display panel, a liquid crystal glass, a backlight module and a transparent polarizer film. The liquid crystal glass is disposed at a side of the transmissive display panel. The liquid crystal glass has a transparent state and an atomization state and is adapted to switch between the transparent state and the atomization state. The backlight module is disposed at a side of the liquid crystal glass away from the transmissive display panel. The backlight module includes a transparent light-guiding plate and at least one light bar. The liquid crystal glass is located between the transmissive display panel and the transparent light-guiding plate. The transparent polarizer film is disposed at a side of the transparent light-guiding plate away from the liquid crystal glass.

Abstract: “Smart” controllers for windows having controllable optical transitions are described. Controllers with multiple features can sense and adapt to local environmental conditions. Controllers described herein can be integrated with a building management system (BMS) to greatly enhance the BMS's effectiveness at managing local environments in a building. The controllers may have one, two, three or more functions such as powering a smart window, determining the percent transmittance, size, and/or temperature of a smart window, providing wireless communication between the controller and a separate communication node, etc.

Abstract: A terahertz modulator based on low-dimension electron plasma wave, a manufacturing method thereof, and a high speed modulation method are provided. The terahertz modulator includes a plasmon and a cavity. The present disclosure discloses the resonance absorption mechanism caused by collective oscillation of electrons (plasma wave, namely, the plasmon). In order to enhance the coupling strength between the terahertz wave and the plasmon, a GaN/AlGaN high electron mobility transistor structure having a grating gate is integrated in a terahertz Fabry-Pérot cavity, and a plasmon polariton is formed arising from strong coupling of the plasmon and a cavity mode.

Abstract: An optical device includes a substrate on which is defined at least one primary waveguide (31, 32) defining a loop reflector, that has first and second directional couplers, and a Mach-Zehnder interferometer intercalated between the first and second directional couplers and arranged for compensating a wavelength dependence of the first and second directional couplers.

Abstract: An optical interferometer device is provided including a waveguide interferometer. The waveguide interferometer includes first and second waveguide arms in a waveguide plane, each waveguide arm including a n-type region and a p-type region forming a junction. The n-type region and the p-type region of the second waveguide arm are translationally symmetric with respect to the n-type region and the p-type region, respectively, of the first waveguide arm in the waveguide plane.

Abstract: Embodiments of the present invention provide a variable optical attenuator. The variable optical attenuator includes: a collimator, a switchable polarization grating, a reflector, and a voltage controller for adjusting a voltage between electrodes at both ends of a liquid crystal layer of the switchable polarization grating, where the collimator, the switchable polarization grating, and the reflector are disposed successively; the collimator is configured to receive incident light and output the incident light to the switchable polarization grating; the switchable polarization grating is configured to diffract the incident light for one time and then perform emission onto the reflector; the switchable polarization grating is further configured to diffract, for one time, a beam reflected back by the reflector, and then emit resulting diffracted light; and the collimator is further configured to receive the diffracted light and output the diffracted light.

Abstract: A wavelength separating element is provided for separating a converted beam from a fundamental beam in an NLFC device, wherein the converted beam has a wavelength different from a wavelength of the fundamental beam. The wavelength separating element includes a first mirror surface and a second mirror surface opposite to the first mirror surface. The first and second mirror surfaces may have a high reflectivity of the converted beam relative to a reflectivity of the fundamental beam, and the first and second mirror surfaces are configured such that the fundamental and converted beams undergo multiple reflections between the first mirror surface and the second mirror surface to separate the converted beam from the fundamental beam. The fundamental and converted beams undergo at least three reflections at the first and second mirror surfaces, and/or undergo at least two reflections at one of the first mirror surface or the second mirror surface.

Abstract: Actuators are used to move a variety of objects to desired positions. It is generally desirable that they can do this quickly without exhibiting overshoot or ringing. Some actuators are required to respond very quickly and examples of these are voice coil drivers used to move lenses in autofocus cameras provided in everyday devices such as smart phones and tablets. A rapid two step controller scheme had already been disclosed by Analog Devices Inc. While the scheme works well, it can only be used reliably if the resonant frequency of the actuator is known to within 2 or 3%. The inventors have discovered that the resonant frequency of an actuator unexpectedly changes as a function of position. This disclosure provides ways of modifying the control scheme to cope with changes in resonant frequency.

Abstract: Provided is a lens driving device which includes: a lens holder including a coil; a frame for receiving the lens holder; a driving circuit board disposed below the frame; a plurality of first conductive elastic bodies disposed in a manner to keep the lens holder moving in a Z-axis direction; and a plurality of second conductive elastic bodies disposed in a manner to keep the frame moving in a direction perpendicular to the Z-axis direction. The lens driving device further comprises a plurality of electrical contact-oriented Z-axis position sensor. The Z-axis position sensor senses the motion of the lens holder in the Z-axis direction. An electronic circuit between a portion of the plurality of electrical contacts and the coil of the lens holder comprises a Molded Interconnect Device and a portion of the first conductive elastic bodies. The Molded Interconnect Device is disposed on the frame.

Abstract: Embodiments discussed herein provide improved control of an unmanned aerial vehicle camera gimbal. In some embodiments, a linear control circuit is described that uses an operational amplifier that allows the system to retain its passive isolation of high frequency disturbances.

Abstract: An accessory shoe device capable of improving drip-proof performance while ensuring positional accuracy in a pitch direction in which terminals of a multi-polarized signal terminal connector are arranged. The accessory shoe device includes an engagement member for having an accessory attached thereto, a signal terminal connector including terminals for connection with the accessory attached to the engagement member, a top cover having the engagement member mounted thereon, and a positioning unit for positioning the signal terminal connector with respect to the engagement member. The top cover has an opening for externally exposing the terminals of the signal terminal connector. The signal terminal connector and the engagement member are fixed to each other by the positioning unit such that they sandwich a portion of the top cover surrounding the signal terminal connector.

Abstract: A projection optical system projects onto a projection surface an image ray bundle formed on an image display element, and includes a transmissive optical system positioned on a side of an emission surface of the image display element and having positive power, and a reflective optical system including at least one mirror for reflecting, toward the projection surface, light rays emitted from the transmissive optical system. The transmissive optical system includes at least one positive lens disposed closer to the image display element than an aperture stop, along with first and second positive lenses having a meniscus shape, and a negative lens disposed therebetween, which are closer to the projection surface than the aperture stop is. During focusing, spacing between the first positive lens and the negative lens and spacing between the second positive lens and the negative lens remain unchanged.

Abstract: An illumination system including an excitation light source module configured to emit an excitation beam, a wavelength conversion device, and a light-splitting unit on a transmission path of the excitation beam and between the excitation light source module and the wavelength conversion device is provided. The light-splitting unit includes a transparent substrate and a first optical film with a hole through which the excitation beam is transmitted to the wavelength conversion device. A wavelength conversion area and a diffusion area of the wavelength conversion device cut into the transmission path by turns. The wavelength conversion area converts the excitation beam into a conversion beam transmitted to the light-splitting unit. The diffusion area reflects the excitation beam to the light-splitting unit; the first optical film reflects the excitation beam coming from the diffusion area. Wavelengths of the conversion beam and excitation beam are different. A projection apparatus is also provided.

Abstract: A projection apparatus includes a spoke setting unit configured to set each change timing of changing the plurality of colors, and set spoke periods generated at the each change timing, a light source drive unit configured to drive the light source unit, based on the change timings and the spoke periods set by the spoke setting unit, a detection unit configured to obtain information indicating each light amount of the light for each of the plurality of colors, which are emitted from the projection unit during the spoke periods, and a light source controller configured to control the light source unit so as to adjust a color balance of color mixtures in the spoke periods to a predetermined balance based on the information obtained in the detection.

Abstract: In a light source unit, a high-pressure discharge lamp includes a first and a second external electrode to emit light as electric power is supplied thereto through a first and a second power supply line, a concave reflection mirror, which reflects the light, has an opening at the center thereof to pass one end of the high-pressure discharge lamp therethrough, and a base holding the one end of the high-pressure discharge lamp to allow the first power supply line to be connected to the first external electrode. Further, there are a reinforcing member covering at least a part of a rear surface of the concave reflection mirror, and a restraint member being held between the rear surface and the reinforcing member to restrain a movable range of the second power supply line. The restraint member makes contact with a part of the second power supply line.

Abstract: The illumination optical system illuminates an illumination surface. The illumination optical system includes a first optical system configured to cause a light flux from a light source to form a light source image, and a second optical system configured to introduce the light flux from the first optical system to the illumination surface. The second optical system includes in order from a first optical system side, a first lens having a positive power, a second lens having a negative power, and a third lens having a positive power. The second optical system satisfies conditions of 0.20??2/?3?0.75 and 0.4?BF/Fall<1.0 where ?2 represents an abbe number of the second lens, ?3 represents an abbe number of the third lens, Fall represents a focal length of the second optical system, and BF represents an air-equivalent distance from the third lens to the illumination surface.

Abstract: An illumination device includes an image element configured to convert light incident thereon to image light and to output the image light, a first light path extending to pass through the image element, and a second light path extending without passing through the image element. The first light path and the second light path are configured to project lights passing therethrough, respectively, on an object existing outside the illumination device.

Abstract: A projection screen, adapted to receive an image beam, includes a transparent substrate, optical pillar structures, a light-scattering layer, Fresnel structures and a light-absorption layer. The transparent substrate has first surface and second surface opposing to each other. The optical pillar structures are located at the first surface, and between the light-scattering layer and the transparent substrate. Each optical pillar structure is arranged along the first direction. The Fresnel structures are located at the second surface, and disposed between the transparent substrate and the light-absorption layer. Each Fresnel structure has a reflective surface and a transmissive surface connected to the reflective surface. The image beam sequentially passes through the light-scattering layer, the optical pillar structures, the transparent substrate and travels to the reflective surfaces, and the image beam is reflected by the reflective surfaces and outputs from the projection screen.

Abstract: The PCS may include a polarizing beam splitter, a polarization rotating element, a reflecting element, and a polarization switch. Typically, a projector outputs randomly-polarized light. This light is input to the PCS, in which the PCS separates p-polarized light and s-polarized light at the polarizing beam splitter. P-polarized light is directed toward the polarization switch on a first path. The s-polarized light is passed on a second path through the polarization rotating element (e.g., a half-wave plate), thereby transforming it to p-polarized light. A reflecting element directs the transformed polarized light (now p-polarized) along the second path toward the polarization switch. The first and second light paths are ultimately directed toward a projection screen to collectively form a brighter screen image in cinematic applications utilizing polarized light for three-dimensional viewing.

Abstract: A reflective photomask includes: a substrate; a multilayer reflection film formed on the substrate and reflecting exposure light including light with a wavelength of about 5 nm to 15 nm for lithography; an absorption film formed on the multilayer reflection film and absorbing the exposure light, and formed therein with a circuit pattern or a circuit pattern forming region where the circuit pattern is formed; a shading region formed by removing part of the multilayer reflection film and the absorption film on the substrate, on an outer peripheral side of the circuit pattern or the circuit pattern forming region to shade part of the exposure light reflected by the multilayer reflection film; and a plurality of projections formed at a pitch of about 3000 nm or less on part of a surface of the substrate exposed in the shading region, and suppressing reflection of out-of-band light with a wavelength of about 140 nm to 800 nm included in the exposure light and incident on the shading region.

Abstract: A reflective mask blank, which includes a substrate, a reflective multilayer film for reflecting exposure light, and an absorber layer for absorbing the exposure light in this order; the reflective multilayer film having at least three fiducial marks formed in a concave shape in an area outside an exposure area for patterning the reflective multilayer film on a front side thereof, each of the fiducial marks including a concave portion having an inclination angle ?, the absorber layer having a film thickness of from 40 to 90 nm; the absorber layer having transferred marks formed in a concave shape on a front side thereof, the transferred marks being transferred from the at least three fiducial marks, each of the transferred marks including a concave portion having an inclination angle of from 35 to 80°; and a difference between the inclination angle ? and the inclination angle ? (inclination angle ??inclination angle ?) being at least 10°.

Abstract: A pattern data generation method includes setting drawing pattern data based on design pattern data including first and second pattern regions. The drawing pattern data includes third and fourth pattern regions. The method includes setting the width of the third pattern region to a third width. The method includes setting first and second irradiation amount data based on the drawing pattern data. The method includes calculating a first thickness of the first pattern region and a second thickness of the second pattern region based on the first irradiation amount data, and calculating a third thickness of the third pattern region based on the second irradiation amount data. The method includes calculating, based on the first to third widths and the first to third thicknesses, a range of a first exposed region exposed onto a patterning substrate.

Abstract: In a halftone phase shift mask blank comprising a transparent substrate and a halftone phase shift film thereon, the halftone phase shift film is composed of a silicon base material consisting of silicon, nitrogen and 0-6 at % of oxygen, has a refractive index n of at least 2.4, an extinction coefficient k of 0.4-0.7, and a thickness of 40-67 nm. The halftone phase shift film is thin enough to be advantageous for photomask pattern formation, has chemical resistance against chemical cleaning, and maintains a necessary phase shift for phase shift function and a necessary transmittance for halftone function.

Abstract: Embodiments disclosed herein relate to an exposure pattern alteration software application which manipulates exposure polygons having lines with angles substantially close to angles of symmetry of a hex close pack arrangement, which suffer from long jogs. Long jogs present themselves as high edge placement error regions. As such, the exposure pattern alteration software application provides for line wave reduction by serrating polygon edges at affected angles to reduce edge placement errors during maskless lithography patterning in a manufacturing process.

Abstract: Provided is a mask blank, including: a resist layer formed by a chemically amplified resist; a protective layer formed to coat the resist layer; and a buffer layer provided between the resist layer and the protective layer, wherein the protective layer contains an acidic substance, a basic substance, and a salt generated by a reaction between the acidic substance and the basic substance, and the buffer layer has a portion which is a surface layer portion of a pre-coated resist layer before being coated by the protective layer, and in which the pre-coated resist layer and the protective layer 4 are in contact with each other, and this portion is formed by receiving the acidic substance, the basic substance, and the salt moved from the protective layer 4.

Abstract: A method and system for: forming a first rectangular shape with photomask writing equipment, using a first sub-threshold dosage on a photoresist layer of a photomask substrate; forming an overlapping second rectangular shape with the photomask writing equipment using a second sub-threshold dosage on the photoresist layer, the second rectangular shape being rotated relative to the first rectangular shape to form one of: a hexagonal overlap area and an octagonal overlap area, that exposes the photoresist layer to at least a threshold dosage; and forming a photomask, based on developing the exposed photoresist layer, to provide optical transmission corresponding to the one of: the hexagonal overlap area of at least the threshold dosage and the octagonal overlap area of at least the threshold dosage, for use by a photolithography system to write any of a contact, a via, or a curvilinear shape on an integrated circuit substrate.

Abstract: An imprint lithography apparatus is disclosed which includes a pattern fixing system configured to use actinic radiation to fix a pattern provided in a layer of imprintable medium by an imprint lithography template, and an inspection system configured to use inspection radiation to inspect an element constituting or, in use, being located within, the imprint lithography apparatus. The imprint lithography apparatus is configured such that the pattern fixing system and the inspection system are provided, in use, with, respectively, actinic radiation and inspection radiation from a single source of radiation.

Abstract: The present invention provides an imprint apparatus for molding an imprint material on a target region on a substrate using a mold to form a pattern on the target region, the apparatus comprising a heater configured to deform the target region by heating the substrate, a measurement device configured to measure an overlay state between the target region and the mold, and a controller configured to control the heater such that the overlay state falls within a tolerance.

Abstract: The present invention provides a detection apparatus for detecting a plurality of marks, comprising a plurality of detection units each including a mirror and a scope configured to detect light from the marks via the mirror, wherein the plurality of detection units include a first detection unit, a second detection unit, and a third detection unit, and in a surface direction parallel to a surface on which the plurality of marks are arranged, a direction of an optical axis between the mirror and the scope in the third detection unit is different from at least one of a direction of an optical axis between the mirror and the scope in the first detection unit and a direction of an optical axis between the mirror and the scope in the second detection unit.

Abstract: A semi-submersible microscope objective (100) includes a microscope objective having a protective barrel (120) with an optical inlet (122) and optical outlet (124), and a protective element (130) affixed to the microscope objective, sealing the optical outlet (124) but not the optical inlet (122). A transparent portion (132) of the protective element is aligned with the optical exit (124). The protective element is separable from the microscope objective without damaging the microscope objective. Use of the semi-submersible microscope objective in a multiphoton imaging method is also disclosed.

Abstract: An optical assembly includes an optical device having an optical surface. The optical assembly further includes an encapsulant that substantially covers the optical surface. The encapsulant has a first layer (106) and a second layer (108). The first layer (106) has a first silicone-containing hot melt composition and a major surface (112). The second layer (108) has a second silicone-containing hot melt composition, the second layer (108) having a second major surface (110) in contact with the first major surface (112).

Abstract: The invention relates to a method for forming a liquid radiation curable resin capable of curing into a solid upon irradiation comprising at least one thermally sensitive visual effect initiator. The liquid radiation curable resin is capable of curing into three-dimensional articles having selective visual effects. The resulting three-dimensional articles possess excellent color and/or transparency stability and excellent mechanical properties.

Abstract: An additive for a resist underlayer film-forming composition that modifies a surface state of a resist underlayer film into a hydrophobic state to enhance adhesion between the resist underlayer film and a resist pattern formed on the resist underlayer film, and a resist underlayer film-forming composition containing the additive. An additive for a resist underlayer film-forming composition including a polymer having a structural unit of Formula (1): (wherein R1 is a hydrogen atom or methyl group, L is a single bond or a divalent linking group, and X is an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, or a heterocyclic group having an oxygen atom as a heteroatom that does not have a hydroxy group). A resist underlayer film-forming composition for lithography including a resin binder, an organic solvent, and the additive.

Abstract: Provided herein are methods of directed self-assembly (DSA) on atomic layer chemical patterns and related compositions. The atomic layer chemical patterns may be formed from two-dimensional materials such as graphene. The atomic layer chemical patterns provide high resolution, low defect directed self-assembly. For example, DSA on a graphene pattern can be used achieve ten times the resolution of DSA that is achievable on a three-dimensional pattern such as a polymer brush. Assembly of block copolymers on the atomic layer chemical patterns may also facilitate subsequent etch, as the atomic layer chemical patterns are easier to etch than conventional pattern materials.

Abstract: A method for lithography patterning includes forming a material layer over a substrate; exposing a portion of the material layer to a radiation; and removing the exposed portion of the material layer in a developer, resulting in a patterned material layer. The developer comprises water, an organic solvent, and a basic solute. In an embodiment, the basic solute is less than 30% of the developer by weight.

Abstract: A negative pattern is formed by applying a resist composition onto a substrate, exposing the resist film, and developing the exposed resist film in an organic solvent developer. The process further involves coating the negative pattern with a shrink agent solution of a first polymer comprising recurring units capable of forming carboxyl, hydroxyl or lactone ring and a second polymer comprising recurring units capable of forming amino and fluorinated recurring units in an ester and/or ketone solvent, baking the coating, and removing the excessive shrink agent for thereby shrinking the size of spaces in the pattern.