Abstract: A solid-state laser system may include: a solid-state laser unit configured to output first pulsed laser light with a first wavelength and second pulsed laser light with a second wavelength; a first solid-state amplifier configured to receive the first pulsed laser light, and output third pulsed laser light with the first wavelength; a wavelength converter configured to receive the third pulsed laser light, and output harmonic light with a third wavelength; a second solid-state amplifier configured to receive the second pulsed laser light, and output fourth pulsed laser light with the second wavelength; a Raman laser unit configured to receive the fourth pulsed laser light, and output Stokes light with a fourth wavelength; and a wavelength conversion system configured to receive the harmonic light and the Stokes light, and output fifth pulsed laser light with a fifth wavelength converted in wavelength from the third wavelength and the fourth wavelength.

Abstract: A mobile terminal includes: a terminal body; and a camera module provided at one side of the terminal body, wherein the camera module includes: a first lens assembly; a second lens assembly provided below the first lens assembly; a diaphragm disposed between the first and second lens assemblies, and having its aperture changed; and an actuator disposed close to the first lens assembly, and configured to reciprocate the first lens assembly, wherein the diaphragm includes: a first blade having a through hole therein; a second blade having a through hole therein, and configured to change an aperture of the diaphragm by a relative motion with respect to the first blade; a link member coupled to end parts of the first and second blades, and configured to move the first and second blades by being rotated; and a motor coupled to one side of the link member, and configured to rotate the link member.

Abstract: Provided in the present invention is a camera module comprising: an imaging lens on which incident light from an external environment is reflected; and an image sensor for obtaining image data related to the external environment by means of the light, and further comprising a filter portion, which is arranged on the image sensor to cut light having a predetermined wavelength, is sectioned into a center zone in which the incidence angle of the light is a first incidence angle, and a peripheral zone surrounding the center zone in which the incidence angle of the light is a second incidence angle that is bigger than the first incidence angle, wherein the filter portion having the center zone and the peripheral zone is formed so that light having wavelengths that differ from the incident light having the first and second incidence angle is cut.

Abstract: Provided are an unmanned aerial vehicle system for taking a close-up picture of a facility and a photography method using the same. The unmanned aerial vehicle system can safely bring a drone, which is an unmanned aerial vehicle, close to a facility surface, which is a subject, using supports and settling members to precisely photograph damage, deterioration, and defects on the facility surface and can safely bring the unmanned aerial vehicle close to the facility and fix the unmanned aerial vehicle on the facility in a perpendicular direction with respect to the subject surface of the facility to improve the quality of an image captured by a camera when the unmanned aerial vehicle is remotely controlled or autonomously navigates.

Abstract: An optical apparatus includes a housing including an opening for letting a light flux pass through a first window member configured to let the light flux pass through, and to cover the opening, a second window member, overlapped with and fixed to the first window member, configured to let the light flux pass through, and a sealing member that is made of a stretchable material, and that is provided along an outer edge of the first window member or the second window member so as to form a sealed space portion between the first window member and the second window member.

Abstract: A lens mount assembly is configured to support a lens assembly having a lens ring and at least one lens secured to the lens ring. The lens mount assembly includes a ring mount having an annular body with at least two retaining arms that project from the annular body, a flexure configured to be secured to the ring mount, and at least two bellows. Each bellows is configured to be secured to a respective retaining arm of the at least two retaining arms of the ring mount. The at least two bellows further are configured to engage the flexure.

Abstract: A duct 45 is tubular and has one opening 451 that is mounted in a position to face an inlet port provided in one side of an apparatus body and the other opening 452 that is mounted in a position to face an exhaust port provided in the other side of the apparatus body. In a tubular interior of the duct 45, a fan 43 and a radiating fin 42 are provided. The fan 43 causes outside air to flow in from the inlet port for discharge from the exhaust port, and heat caused inside the apparatus body is transmitted by a heat transfer unit to the radiating fin 42. The outside air is applied to the radiating fin 42 by the fan 43, whereby the heat caused inside the apparatus body can be discharged efficiently.

Abstract: An orbiting camera mount including an anti-rotation arm for connection to a spindle nose of a machine tool. A stationary pulley, having a pulley bore, is fixed to an end portion of the anti-rotation arm. The mount also includes a mounting post for connection to a spindle of the machine tool. The mounting post includes a drive shaft portion extending through the pulley bore. A drive housing is fixed to the drive shaft portion for rotation therewith and an output shaft is supported in the drive housing. A driven pulley is fixed to the output shaft and a drive belt extends between the stationary and driven pulleys, whereby rotation of the mounting post causes the output shaft to orbit around the drive shaft portion. A camera mounting stem is coupled to the output shaft and is oriented at a non-zero angle with respect to the drive shaft portion.

Abstract: A camera support apparatus includes a telescopically collapsible monopod, a clamp structure with a support clamp at one end which is adapted for securing the clamp structure to the monopod and a frame clamp at an opposite end, and a stabilizer frame loop which is frictionally engaged with the frame clamp in such a manner as to enable the loop to be set in a selected angular relation to the monopod and readjusted as needed.

Abstract: An electrooptical device of a projection display device includes a first driving element and a second driving element. The first driving element switches a position of a first mirror between a first turn-on position, in which the first mirror reflects a first light-source light beam from a first irradiation direction in an ON-direction, and a first turn-off position, in which the first mirror reflects the first light-source light beam in a first OFF-direction. The second driving element switches a position of a second mirror between a second turn-on position, in which the second mirror reflects a second light-source light beam in the ON-direction, and a second turn-off position, in which the second mirror reflects the second light-source light beam in a second OFF-direction.

Abstract: A solid-state light source device 1 includes a plurality of light source cells 10, a light combining device 20 combining light emitted from the plurality of light source cells and emitting combined light, and a light reflecting/combining unit 30 reflecting the light emitted from the light source cells and emitting the light to the light combining device. The light combining device 20 has a reflective plane on a surface thereof, has a plurality of columnar-shaped regions divided along emission directions in an interior thereof, and has wavelength selective reflective planes in interfaces between the columnar-shaped regions. The light reflecting/combining unit 30 is configured in a substantially paraboloidal shape having a reflective plane on a surface thereof. Accordingly, light use efficiency is improved, and light of a desired color can be selectively extracted.

Abstract: A light source system comprises: a light-emitting device for emitting a first light and a second light in sequence; a beam splitting system with which the first light is divided into one beam in a first range of wavelength and the other beam in a second range of wavelength, respectively emitted along a first optical path and a second optical path, and also with which at least a part of the second light is emitted along the first optical path; a first spatial light modulator for modulating the beam emitted from the beam splitting system along the first optical path; a second spatial light modulator for modulating the beam emitted from the beam splitting system along the second optical path. The light source system has the advantages of high light-emitting efficiency and low cost. A projection system comprising the aforementioned light source system is also provided.

Abstract: A projector, a light source controller, and a light source control method are provided. The projector includes a light source, a wavelength conversion device, and a light source controller. The light source is adapted to provide a light beam. The wavelength conversion device is adapted to convert a wavelength of the light beam into a plurality of converted wavelengths. The light source controller includes a controller and a selector. The controller is adapted to receive a synchronization signal, and generate an enable signal and a plurality of indication signals according to the synchronization signal. The enable signal has a plurality of pulses, and there is an interval time between adjacent two pulses. The selector is adapted to select one of the control voltages according to the enable signal and the indication signals to generate a light source control signal.

Abstract: A projection-type optical module is provided. More particularly, the projection-type optical module is configured to have a plurality of reflective mirrors and disposed inside a vehicle or a pillar of the vehicle so as to display an image projected from an image module on a wide screen. The projection-type optical module can be disposed in a confined space of the interior of the vehicle, so that the interior space of the vehicle can be efficiently used. Furthermore, the projection-type optical module is configured such that an image refracted in a confined space is prevented from blurring, thus making it possible to display a clear projection image on the screen module.

Abstract: A board 2 for a projector includes a movable arm 5 for moving a projector 1 to a use position in front of a projection board 3 and to a storage position above the projection board and a cam mechanism 6 for elevating the movable arm 5 while swinging it. By elevation of the movable arm 5 by the cam mechanism 6, when the projector is positioned at the storage position, a body portion of the projector is positioned above an upper edge portion of the projection board, while when the projector is positioned at the use position, the body portion is positioned below the upper edge portion of the projection board. Even a projector with a short focal distance can be moved to the storage position and to the use position.

Abstract: A display screen includes a filter layer, a fluorescent layer having parallel fluorescent stripes, and an attachment layer between an excitation side of the fluorescent layer and a first side of the filter layer to attach the excitation side of fluorescent layer to the filter layer while providing vertical separation therebetween. The attachment layer includes attachment regions that are separated from each other by lateral spacings such that excitation-side air gaps are formed between areas of the fluorescent layer and the filter layer that correspond to the lateral spacings. During display operation, excitation light received on a second side of the filter layer propagates through to the first side of the filter layer, and at least a portion of the excitation light that propagates from the second side of the filter layer travels through the excitation-side air gaps to excite the fluorescent stripes.

Abstract: The present invention provides a panoramic viewing system, which includes a panoramic reflection mirror, formed in an elliptical conical status, and the conical surface thereof is defined as a curved surface used for reflecting an ambient light source; and an image sensor, disposed at one side of the panoramic reflection mirror and used for receiving a light source from the panoramic reflection mirror so as to generate an image data; wherein the panoramic reflection mirror allows a panoramic image to be formed in a rectangular area when the panoramic image is projected by the panoramic reflection mirror to the image sensor. In addition, the present invention also discloses a method of panoramic viewing, a panoramic projecting system, a method of panoramic projecting and a panoramic image sensor.

Abstract: A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure field formed by a photolithography system that includes an EUV photolithography photomask. Parameters of a treatment to produce a change in reflectance at a working wavelength of EUV radiation in a region of a reflective multilayer of the photomask are determined, the change in reflectance being calculated to correct the mapped CD variation. A treatment beam is directed to the region. The region is treated with the beam in accordance with the determined parameters.

Abstract: In some embodiments, a patterned photomask has a plurality of shielding layers. In some embodiments, a photomask for mask patterning is described. The photomask includes a phase shift layer overlying a transparent layer. The photomask also includes a first shielding layer overlying the phase shift layer. The first shielding layer has a first thickness and a first optical density. The photomask further includes a second shielding layer overlying the first shielding layer. The second shielding layer has a second thickness and a second optical density. The second thickness is less that than the first thickness and the second optical density is less than the first optical density.

Abstract: A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough.

Abstract: A spacer manufacturing device is disclosed. The device includes a photo mask having a central light-transmitting region and a peripheral light-transmitting region disposed at a periphery of the central light-transmitting region; and an exposure device right opposite to the photo mask. Light emitted from the exposure device is irradiated to a negative photoresist material after passing through the photo mask, the light intensity passing through the peripheral light-transmitting region is less than the light intensity passing through the central light-transmitting region. A spacer is also disclosed. Only one exposure process is required to realize the spacer having a convex-shaped cross section. The process is simple and the manufacturing cost is low. At the same time, flatness of the convex shoulder of the spacer having a convex-shaped cross section is adjustable, which can satisfy the requirement for manufacturing spacers having different specifications.

Abstract: There is provided a method for manufacturing a master on which an arbitrary pattern is formed, the method including: forming a thin-film layer on an outer circumferential surface of a base material in a round cylindrical or round columnar shape; generating a control signal corresponding to an object on the basis of an input image in which the object is depicted; irradiating the thin-film layer with laser light on the basis of the control signal and thereby forming a thin-film pattern corresponding to the object on the thin-film layer; and forming a pattern corresponding to the object on the outer circumferential surface of the base material using, as a mask, the thin-film layer on which the thin-film pattern is formed.

Abstract: A nanoimprint lithography method to remove uncured pretreatment composition from an imprinted nanoimprint lithography substrate. The method includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating and disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate. A composite polymerizable coating is formed on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area, and the composite polymerizable coating is contacted with a nanoimprint lithography template. The composite polymerizable coating is polymerized to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate, and the uncured portion of the pretreatment coating is removed from the nanoimprint lithography substrate.

Abstract: A composition, a method fabricating the infrared ray transmitting filter, and an infrared ray sensor are provided. When the composition forms a film with a thickness of 1 ?m, transmittance of the film in a wavelength in a range from 400 nm to 700 nm is less than 4%, and transmittance of the film in a wavelength in a range from 900 nm to 1300 nm is more than 90%. The composition comprises an alkali-soluble resin at least containing an acrylic group, a carboxyl group, and a fluorene ring, a photoinitiator, an unsaturated monomer, a pigment mixture, and a solvent. The pigment mixture is formed by mixing a colorant dispersion and a pigment in a weight ratio from 60:40 to 70:30.

Abstract: According to one embodiment, a photosensitive composition includes a great number of photosensitive core-shell type nano-particles each including a core and a shell and having a structure that the core is metal oxide particle and covered by the shell. The shell includes a) unsaturated carboxylic acid or unsaturated carboxylate, which is a negatively ionized unsaturated carboxylic acid, and b) silylated unsaturated carboxylic acid or unsaturated carboxylate which is negatively ionized silylated unsaturated carboxylic acid.

Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.

Abstract: The present invention provides a photosensitive resin composition including: an alkali-soluble resin (A) having more than 30% by mass and less than 70% by mass of a structural unit represented by the Formula (1) below; a compound (B) having at least one ethylenically unsaturated double bond per molecule; and a photo radical polymerization initiator (C) having an oxime ester structure; wherein a content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the alkali-soluble resin (A) is 3 to 20 parts by mass. In Formula (1), R1 represents a hydrogen atom or a C1-4 alkyl group. R2 represents a single bond or a divalent organic group. R3 each independently represent a hydrogen atom, a hydroxyl group, or an optionally substituted alkyl group.

Abstract: There is provided a pattern forming method including (1) a step of forming a film with an active-light-sensitive or radiation-sensitive resin composition containing the following (A) to (C): (A) a resin having a repeating unit having a phenolic hydroxyl group, and having a group that decomposes by the action of an acid to generate a polar group, (B) a compound that generates an acid upon irradiation with active light or radiation, and (C) a compound having a cationic site and an anionic site in the same molecule, in which the cationic site and the anionic site are linked to each other via a covalent bond; (2) a step of exposing the film; and (3) a step of developing the exposed film using a developer including an organic solvent to form a negative tone pattern.

Abstract: The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

Abstract: Shrinkage and mass losses are reduced in photoresist exposure and post exposure baking by utilizing a small group which will decompose. Alternatively a bulky group which will not decompose or a combination of the small group which will decompose along with the bulky group which will not decompose can be utilized. Additionally, polar functional groups may be utilized in order to reduce the diffusion of reactants through the photoresist.

Abstract: A method and apparatus disclosed herein apply to processing a substrate, and more specifically to a method and apparatus for improving photolithography processes. The apparatus includes a chamber body, a substrate support disposed within the chamber body, and an electrode assembly. The substrate support has a top plate disposed above the substrate support, a bottom plate disposed below the substrate support, and a plurality of electrodes connecting the top plate to the bottom plate. A voltage is applied to the plurality of electrodes to generate an electric field. Methods for exposing a photoresist layer on a substrate to an electric field are also disclosed herein.

Abstract: Methods of forming edge etch protection using dual layers of positive-negative tone resists. According to a method, a wafer substrate is provided. A first type resist is deposited on a surface of the wafer substrate. The first type resist is patterned and a resist ring is created around a peripheral edge of the wafer substrate. The resist ring is cured. A second type resist is deposited on the surface of the wafer substrate and the resist ring. The second type resist is different from the first type resist.

Abstract: Systems and methods are disclosed herein for enhancing lithography printability, and in particular, for enhancing image contrast. An exemplary method includes receiving an integrated circuit (IC) design layout and generating an exposure map based on the IC design layout. The IC design layout includes a target pattern to be formed on a workpiece, and the exposure map includes an exposure grid divided into dark pixels and bright pixels that combine to form the target pattern. The method further includes adjusting the exposure map to increase exposure dosage at edges of the target pattern. In some implementations, the adjusting includes locating an edge portion of the target pattern in the exposure map, where the edge portion has a corresponding bright pixel, and assigning exposure energy from at least one dark pixel to the corresponding bright pixel, thereby generating a modified exposure map.

Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Abstract: Methods and apparatus for in situ compensation for damage or misalignment of optical elements are disclosed. Also disclosed are methods and apparatus for facilitating alignment of replacement optical elements so that the amount of time in a system including the optical elements can be reduced. Also disclosed are methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system and/or misalignment of the optical elements. Information pertaining to an extent of damage to optical elements in the optical system can be used to optimally schedule maintenance events for the optical system.

Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.

Abstract: A vibration-compensated optical system for a lithography apparatus includes an optical element, a carrying element, an actuator for actuating the optical element relative to the carrying element, a first elastic element which directly couples the optical element to the carrying element, a reaction mass, and a second elastic element. The actuator couples the optical element to the reaction mass. The second elastic element directly couples the reaction mass to the carrying element. For a mass (m1) of the optical element, a stiffness (k1) of the first elastic element, a mass (m2) of the reaction mass and a stiffness (k2) of the second elastic element the following holds true: m 1 m 2 = k 1 k 2 .

Abstract: Methods and corresponding metrology modules and systems, which measure metrology parameter(s) of a previous layer of a metrology target and/or an alignment mark, prior to producing a current layer of the metrology target, derive merit figure(s) from the measured metrology parameter(s) to indicate an inaccuracy, and compensate for the inaccuracy to enhance subsequent overlay measurements of the metrology target. In an example embodiment, methods and corresponding metrology modules and systems use stand-alone metrology tool(s) and track-integrated metrology tool(s) at distinct measurement patterns to address separately different aspects of variation among wafers.

Abstract: A lithography system includes an illumination source, a pattern mask, and an optical element configured to expose a sample with an image of the pattern mask for the fabrication of one or more printed device structures and one or more metrology target structures. The pattern mask includes a device pattern mask area and a metrology target pattern mask area. The device pattern mask area includes a set of device pattern elements distributed with a device pitch. The metrology target pattern mask area includes a set of metrology target pattern elements. The one or more printed metrology target structures include a set of metrology target elements distributed with a metrology target pitch. Regions of the metrology target pattern mask area include sub-resolution features having widths smaller than the resolution of the optical element such that the sub-resolution pattern elements are not included on the one or more printed metrology target structures.

Abstract: A control system for a positioning system, for positioning a driven object, e.g. in a lithographic apparatus, in N dimensions has M sensors, where M>N. A transformation module converts the M measurements by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.

Abstract: The present invention provides a detection apparatus which detects a position of a mark on a substrate, the apparatus comprising an image capturing unit having an image sensor configured to capture an image of the mark, and a processor configured to control the image capturing unit such that second image capturing is performed after first image capturing is performed, and determine the position of the mark based on an image obtained by the second image capturing, wherein the processor controls the first image capturing such that an accumulation period of charges in the image sensor becomes shorter than that in the second image capturing, and determines an image capturing condition of the second image capturing based on an output of the image sensor in the first image capturing.

Abstract: The present invention provides a measurement apparatus for measuring a position of an object, comprising a reflecting portion provided on the object and having a surface on which reflectors configured to retroreflect light are arrayed, an optical system configured to cause first light to be incident on the surface, receive second light as reflected light of the first light, cause third light generated from the second light to be incident on the surface, and receive fourth light as reflected light of the third light, and a processor configured to determine the position of the object based on a detection result of the forth light, wherein the optical system is configured such that a displacement between optical paths of the first light and the second light is corrected by a displacement between optical paths of the third light and the fourth light.

Abstract: The present application discloses a component having a movably mounted component element of a projection exposure apparatus and in particular a movement limiting apparatus, and a method for limiting the movement of movable component elements of a component of a projection exposure apparatus.

Abstract: A liquid immersion exposure apparatus includes a liquid immersion member which forms a liquid immersion space on an object disposed opposite to an emitting surface of an optical member. The liquid immersion member includes (i) a first member that has a first liquid supply port and a first opening through which the exposure light is projected, (ii) a second member that has a first liquid recovery port facing downwardly and that is movable with respect to the first member, and (iii) a gas supply port arranged radially outward of the first liquid recovery port with respect to a path of the exposure light. The first liquid recovery port has a plurality of openings disposed in a four-sided shape to surround the first opening of the first member. The second member is movable relative to the first member in a direction perpendicular to an optical axis of the optical member.

Abstract: A method of thermally conditioning a physical object, includes guiding a two-phase cooling medium through a cooling duct of the physical object, wherein the guiding includes: guiding the two-phase cooling medium in a liquid phase via a pre-heating duct of the physical object from a supply side of the physical object at least partly towards a discharging side of the physical object, the two-phase cooling medium being pre-heated in the pre-heating duct; guiding the two-phase cooling medium from the pre-heating duct to a phase transitioning duct of the physical object, the two-phase cooling medium at least partly transitioning from the liquid phase towards a gas phase in the phase transitioning duct; guiding the two-phase cooling medium from the phase transitioning duct to a discharging duct of the physical object; and discharging at the discharging side the two-phase cooling medium from the discharging duct.

Abstract: A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a substrate and a fluid confinement structure configured to confine immersion fluid in a localized region between a final element of the projection system and a surface of the substrate. The lithographic apparatus is configured to have a space bounded on one side by a surface of the projection system and/or a component of the lithographic apparatus at least partially surrounding the final element of the projection system, and on the other side by a surface of the fluid confinement structure. The apparatus is configured to increase the humidity of the gas within the space.

Abstract: An apparatus has a first component with a first surface and a second component with a second surface, wherein the first and second components can undergo relative movement. The first surface and the second surface face each other. The first surface accommodates a barrier system to provide a barrier to reduce or prevent an inflow of ambient gas into a protected volume of gas between the first and second surfaces. The barrier system includes a curtain opening adapted for a flow of curtain gas therefrom for establishing a gas curtain enclosing part of the protected volume, and an inner entrainment opening, located inward of the curtain opening with respect to the protected volume, adapted for a flow of inner entrainment gas therefrom for being entrained into the flow of curtain gas. The apparatus is configured such that the inner entrainment gas flow is less turbulent than the curtain gas flow.

Abstract: A method including determining a position of a first pattern in each of a plurality of target portions on a substrate, based on a fitted mathematical model, wherein the first pattern includes at least one alignment mark, wherein the mathematical model is fitted to a plurality of alignment mark displacements (dx, dy) for the alignment marks in the target portions, and wherein the alignment mark displacements are a difference between a respective nominal position of the alignment mark and measured position of the alignment mark; and transferring a second pattern onto each of the target portions, using the determined position of the first pattern in each of the plurality of target portions, wherein the mathematical model includes polynomials Z1 and Z2: Z1=r2 cos(2?) and Z2=r2 sin(2?) in polar coordinates (r, ?) or Z1=x2?y2 and Z2=xy in Cartesian coordinates (x, y).

Abstract: A reticle transfer apparatus includes a reticle, a reticle stage (4) and a robot (2). The robot (2) is configured to support, transport and transfer the reticle onto the reticle stage (4).

Abstract: An electrophotographic photoreceptor includes a conductive support in which (i) a recessed portion having an opening diameter of greater than 400 ?m and (ii) a recessed portion having an opening diameter of from 100 ?m to 400 ?m and a ratio of a depth to an opening diameter of greater than 0.12 are not present on an outer peripheral surface, wherein even in a case where a first recessed portion having an opening diameter of from 100 ?m to 400 ?m and a ratio of a depth to an opening diameter of 0.12 or less is present on the outer peripheral surface of the conductive support and a second recessed portion on which the first recessed portion is reflected is present on the outer peripheral surface of an outermost layer, a ratio of a depth to an opening diameter of the second recessed portion is not greater than 0.030.