Abstract: Disclosed herein are embodiments of aluminum-based alloys having improved intergranular corrosion resistance. Methods of making and using the disclosed alloy embodiments also are disclosed herein.

Abstract: A degradable Mg alloy containing: 3.9% by mass or more and 14.0% by mass or less of Al, from 0.1% by mass or more and 0.6% by mass or less of Mn, and 0.0% by mass or more and 1.0% by mass or less of Zn; 0.01% by mass or more and 10.0% by mass or less of Ni, Cu, or both of Ni and Cu; and the balance consisting of Mg and inevitable impurities is used to manufacture a degradable structural member made of a magnesium alloy having sufficient strength and degrading at an appropriate timing in an aqueous environment.

Abstract: A magnesium (Mg) alloy having lightweight and excellent thermal conductivity, and a heat sink including the magnesium (Mg) alloy are provided. The magnesium (Mg) alloy may include one or more alloy additive elements selected from the group consisting of silicon (Si), calcium (Ca), tin (Sn), yttrium (Y), iron (Fe), nickel (Ni), copper (Cu), cerium (Ce), cesium (Cs), antimony (Sb), cobalt (Co), thorium (Th), and silver (Ag). Some of the alloy additive elements may be dissolved in the magnesium alloy to form a solid solution. The alloy additive elements that form the solid solution at room temperature may account for 2 wt % or less, based on the total weight (100 wt %) of the magnesium alloy, and the alloy additive elements that do not form the solid solution may be in crystalline phases.

Abstract: The invention relates to a method for producing a component by hot-forming a pre-product composed of steel, wherein the pre-product is heated to a temperature above 60° C. and below the Ac3 transformation temperature and then formed in this temperature range, wherein the component has a minimum tensile strength of 700 MPa and high elongation at break, wherein the pre-product has the following alloy composition in percent by weight: C: 0.0005 to 0.9; Mn: more than 3.0 to 12; the remainder iron including unavoidable steel-accompanying elements, with the optional addition of one or more of the following elements (in percent by weight): Al: up to 10; Si: up to 6; Cr: up to 6; Nb: up to 1.5; V; up to 1.5; Ti: up to 1.5; Mo: up to 3; Cu: up to 3; Sn: up to 0.5; W up to 5; Co: up to 8; Zr: up to 0.5; Ta: up to 0.5; Te: up to 0.5; B: up to 0.15; P: at most 0.1, in particular <0.04; S: at most 0.1, in particular <0.02; N: at most 0.1, in particular <0.05; Ca: up to 0.1.

Abstract: A metal microparticle coated with metal nanoparticles is disclosed. Some variations provide a material comprising a plurality of microparticles (1 micron to 1 millimeter) containing a metal or metal alloy and coated with a plurality of nanoparticles (less than 1 micron) or nanoparticle inclusions (potentially larger than 1 micron). The invention eliminates non-uniform distribution of sintering aids by attaching them directly to the surface of the microparticles. No method is previously known to exist which can assemble nanoparticle inclusions onto the surface of a metal microparticle. Some variations provide a solid article comprising a material with a metal or metal alloy microparticles coated with metal hydride or metal alloy nanoparticles, wherein the nanoparticles form continuous or periodic inclusions at or near grain boundaries within the microparticles.

Abstract: NiTi thin films with composition gradient have the added feature of an intrinsic two-way shape memory effect. According to the invention, a method of fabrication of Ni-rich/(NiTiCu) Ti-rich bi-layer thin film is disclosed. The bi-layer thin film formed compositional gradients at the interface of the films through diffusion. The bi-layer presented a combined pseudo elastic behavior and shape memory effect with a reduced hysteresis. The combination of pseudo elastic with shape memory effect produces an intrinsic two-way shape memory effect (TWSME). This behavior achieved without needing complicated heat treatment and training process. Therefore, it is compatible with MEMS processing.

Abstract: A continuous hot-dip plating machine includes: a sink roll provided in a plating bath and configured to upwardly change a transfer direction of the steel strip; a first support roll provided in the plating bath and located above the sink roll, the first support roll being in contact with a first surface of the steel strip in contact with the sink roll; and a second support roll provided in the plating bath and located above the first support roll, the second support roll being in contact with a second surface of the steel strip opposite the first surface. A diameter of the first support roll, a diameter of the second support roll, and a vertical distance between a rotation axis of the first support roll and a rotation axis of the second support roll satisfy specific conditions.

Abstract: A coating of an Al—Zn—Si—Mg alloy on a steel strip that is applied by a hot dip process and is subsequently heat treated to improve the ductility of the coating.

Abstract: A method of forming a coating of an Al—Zn—Si—Mg alloy on a steel strip to form an Al—Zn—Mg—Si coated steel strip is disclosed. The method includes the steps of dipping steel strip into a bath of molten Al—Zn—Si—Mg alloy and forming a coating of the alloy on exposed surfaces of the steel strip and cooling the coated strip with cooling water. The cooling step includes controlling the pH of cooling water to be in a range of p H 5-9. Particular embodiments focus on Al—Zn—Si—Mg alloys that contain the following elements in % by weight: Zn: 30 to 60, Si: 0.3 to 3, Mg: 0.3 to 10, and Balance Al and unavoidable impurities.

Abstract: An apparatus for in situ steam generation oxidation are provided. The apparatus includes a reactor chamber. The apparatus also includes a radiant source over the chamber. The radiant source includes a plurality of lamps for heating the reactor chamber. The apparatus further includes a lamphead over the radiant source for adjusting the temperature of the radiant source. In addition, the apparatus includes a gas inlet system coupled to the lamphead. The gas inlet system includes a mass flow controller for adjusting the flow rate of cooling gas into the lamphead. The apparatus includes a gas outlet system, on the opposite side of the cooling gas inlet system, coupled to the lamphead. The gas outlet system includes a pressure controller for accelerating the exhaust rate of the cooling gas.

Abstract: The disclosure relates to a hermetic sealed crucible comprising a crucible body with a cavity for placing materials, a cover plate for covering and sealing the cavity. The crucible further comprises a pneumatic driver which is connected to the cover plate and drives the cover plate to move relative to the cavity. The pneumatic device comprises a cylinder in which a spacer is arranged, the spacer being configured to move relative to the cylinder and divide the cylinder into a first air chamber provided with a first valve, and a second air chamber provided with a second valve, the spacer being provided with a drive rod connected to the cover plate at a side in the first air chamber, the drive rod being configured to drive the cover plate to move to close or open the cavity. The disclosure further relates to a vapor deposition method using the crucible.

Abstract: Provided is a sputtering target formed from copper or a copper alloy, and the sputtering target contains either argon or hydrogen, or both, each in an amount of 1 wtppm or more and 10 wtppm or less. An object of the embodiment of the present invention is to provide a copper or copper alloy sputtering target which is capable of stably maintaining discharge even under conditions such as low pressure and low gas flow rate where it is difficult to continuously maintain sputtering discharge.

Abstract: A chucking apparatus and methods for coating a glass substrate using a vacuum deposition process are disclosed. In one or more embodiments, the chucking apparatus includes an ESC (ESC), a carrier disposed on the ESC, wherein the carrier comprises a first surface adjacent to the ESC and an opposing second surface for forming a Van der Waals bond with a third surface of a glass substrate, without application of a mechanical force on a fourth surface of the glass substrate opposing the third surface. In one or more embodiments, the method includes disposing a carrier and a glass substrate on an ESC, such that the carrier is between the glass substrate and the ESC to form a chucking assembly, forming a Van der Waals bond between the carrier and the glass substrate, and vacuum depositing a coating on the glass substrate.

Abstract: Provided is a concentration control apparatus that, without reducing maintainability, can shorten piping to improve responsiveness. The concentration control apparatus is one adapted to introduce carrier gas into a storage tank storing a material, and control the concentration of material gas that is led out of the storage tank as mixed gas with the carrier gas and results from vaporization of the material. Also, the concentration control apparatus includes: a first unit that controls the flow rate of the carrier gas to be introduced into the storage tank; and a second unit that detects the concentration of the material gas led out of the storage tank.

Abstract: The invention relates to a method and an installation for coating a scaled hot-rolled strip (10). The method comprises at least the following steps: (i) providing a hot-rolled strip (10) in the form of a hot-rolled preliminary strip, (ii) preparing the surfaces of the hot-rolled strip (10), and (iii) coating of the hot-rolled strip (10) on at least one prepared surface thereof, wherein the coating is carried out at a temperature of ?100° C. and immediately after the descaling of the hot-rolled strip (10).

Abstract: A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

Abstract: Introduced here is a plasma polymerization apparatus. Example embodiments include a reaction chamber in a shape substantially symmetrical to a central axis. Some examples further include a rotation rack in the reaction chamber. The rotation rack may be operable to rotate relative to the reaction chamber about the central axis of the reaction chamber. Examples may further include reactive species discharge mechanisms positioned around a perimeter of the reaction chamber and configured to disperse reactive species into the reaction chamber in a substantially symmetrical manner from the outer perimeter of the reaction chamber toward the central axis of the reaction chamber, such that the reactive species form a polymeric coating on surfaces of the one or more substrates during said dispersion of the reactive species, and a collecting tube positioned along the central axis of the reaction chamber and having an air pressure lower than the reaction chamber.

Abstract: Methods and apparatuses for performing atomic layer deposition are provided. A method may include determining an amount of accumulated deposition material currently on an interior region of a deposition chamber interior, wherein the amount of accumulated deposition material changes over the course of processing a batch of substrates; applying the determined amount of accumulated deposition material to a relationship between a number of ALD cycles required to achieve a target deposition thickness, and a variable representing an amount of accumulated deposition material, wherein the applying returns a compensated number of ALD cycles for producing the target deposition thickness given the amount of accumulated deposition material currently on the interior region of the deposition chamber interior; and performing the compensated number of ALD cycles on one or more substrates in the batch.

Abstract: An apparatus for subjecting a surface of a substrate to successive surface reactions of at least a first precursor and a second precursor according to the principles of atomic layer deposition includes a reaction chamber defining a reaction space, one or more gas inlets, one or more gas outlets and a plasma discharge electrode. The apparatus further includes an grounded grid sheet having openings and arranged within the reaction space opposite the plasma discharge electrode.

Abstract: According to one embodiment, in a semiconductor manufacturing apparatus, a first gas supply pipe is disposed between a gas supply source and a processing chamber. A first valve is disposed in the first gas supply pipe. The first valve includes a first valve seat forming a first opening, a first diaphragm, and a first pressing member capable of pressing the first diaphragm against the first valve seat. A second gas supply pipe is disposed between the gas supply source and the processing chamber. The second gas supply pipe is connected to the first gas supply pipe in parallel. A second valve is disposed in the second gas supply pipe. The second valve includes a second valve seat forming a second opening, a second diaphragm, and a second pressing member capable of pressing the second diaphragm against the second valve seat.

Abstract: Described herein are compositions, silicon nitride films and methods for forming silicon nitride films using at least on cyclodisilazane precursor. In one aspect, there is provided a method of forming a silicon nitride film comprising the steps of: providing a substrate in a reactor; introducing into the reactor an at least one cyclodisilazane comprising a hydrocarbon leaving group and two Si—H groups wherein the at least one cyclodisilazane reacts on at least a portion of the surface of the substrate to provide a chemisorbed layer; purging the reactor with a purge gas; introducing a plasma comprising nitrogen and an inert gas into the reactor to react with at least a portion of the chemisorbed layer and provide at least one reactive site wherein the plasma is generated at a power density ranging from about 0.01 to about 1.5 W/cm2.

Abstract: Described herein are compositions and methods for forming silicon and oxygen containing films. In one aspect, the film is deposited from at least one precursor, wherein the at least one precursor selected from the group consisting of Formulae A and B: wherein R, R1, and R2-8 are as defined herein.

Abstract: A shower head includes a face plate having an outer peripheral portion and a plurality of gas injection holes disposed inside the outer peripheral portion, a movable portion facing the face plate and having a gas introduction passage, and a seal interposed between the outer peripheral portion of the face plate and the movable portion. The movable portion is arranged to move, in the first direction, between a first position in which the movable portion is coupled to the face plate by interposing the seal between the movable portion and the face plate, and the gas introduction passage communicates with the inside of the chamber via the gas injection holes, and a second position in which the movable portion is separated from the face plate, and the gas introduction passage communicates with the inside of the chamber via a gap between the movable portion and the face plate.

Abstract: A deposition system includes a process tube aligned vertically with a substrate holder therein positioned horizontally and perpendicular to a vertical tube axis. Through a bottom or top flange a first gas line connector is for injecting a first gas and a reactant gas connector is for injecting at a reactant gas. A feed line is coupled between the reactant gas connector and a reactant gas distributor having apertures for flowing the reactant gas towards a substrate. A vapor generating showerhead includes a gas distribution plate having flow distributing apertures on a precursor boat having gas inlets fluidically coupled to precursor holder trenches that hold a vapor generating material. The gas inlets have a flow path for flowing the first gas over the vapor generating material for generating a reactant vapor that flows out of the flow distributing aperture toward the substrate.

Abstract: A substrate processing apparatus includes a heat storage part on which a substrate is mounted, a tray including the heat storage part, a substrate transfer part including a rotary shaft and a rotating plate supported by the rotary shaft and being configured such that the tray can be mounted on the rotating plate, a plurality of bases arranged circumferentially around the rotary shaft; and a heater provided for each of the bases.

Abstract: A substrate processing apparatus in accordance with an exemplary embodiments include: a first tube configured to provide a processing space in which a plurality of substrates are processed; a substrate support part configured to load the plurality of substrates in a first direction in the processing space; a plurality of gas supply parts provided with supply ports for supplying a process gas required for a process in which the substrates are processed; an exhaust part configured to communicate with the first tube and discharge process residues inside the processing space to the outside; and a plasma reaction part provided outside the first tube, and configured to decompose, with plasma, the process gas supplied from the gas supply part and provide the decomposed process gas to the processing space.

Abstract: A graphene structure forming method for forming a graphene structure is provided. The method comprises preparing a target substrate, and forming the graphene structure on a surface of the target substrate by remote microwave plasma CVD using a carbon-containing gas as a film-forming raw material gas in a state in which the surface of the target substrate has no catalytic function.

Abstract: According to one embodiment, a shower head includes a head and a magnetic field generator. The head includes a first surface, a second surface opposite to the first surface, an internal compartment, and a plurality of holes. Each of the holes is open to the first surface and to the second surface that faces the compartment, and communicates with the compartment. The magnetic field generator generates a magnetic field inside the holes between the first surface and the second surface.

Abstract: There is provided a cleaning technique that includes supplying a hydrogen fluoride gas into a process vessel, in which a process of forming an oxide film containing at least one of carbon and nitrogen on a substrate has been performed, to remove a deposit containing at least one of carbon and nitrogen adhered to an interior of the process vessel, wherein the act of supplying the hydrogen fluoride gas is performed under a condition in which an etching rate of the deposit adhered to the interior of the process vessel is higher than an etching rate of a quartz member in the process vessel.

Abstract: The present invention relates to a process for obtaining a multilayer composition, to a composition obtainable via such method and to an article comprising said composition. The process comprises at least the following: i. providing a polymeric layer (L1) comprising an aromatic polymer selected from the group consisting of poly(aryl ether sulfone) polymer (P1) and a polyarylene sulphide (P2), and having at least one surface (S1); ii. treating at least the surface (S1) of (L1) with a radio-frequency glow N discharge process in the presence of an etching gas medium comprising a nitrogen-containing gas to obtained an etched surface (52); iii. optionally, contacting the etched surface (S2) obtained in step ii. with a composition (LC3) comprising a surfactant to obtain at least a pre-treated surface (S2a); iv. contacting the etched surface (S2) obtained in step ii. or the pre-treated surface (S2a) obtained in step iii.

Abstract: The present invention relates to the use of water soluble and air stable phosphaadamantanes as stabilizers in electrolytes for electroless metal deposition. An electrolyte, as well as a method for the electroless deposition of metals is disclosed. The plated metal layers can comprise nickel, copper, cobalt, boron, silver, palladium or gold, as well as alloys comprising at least one of the aforementioned metals as an alloying metal. The present invention further relates to an organic stabilizer for electroless plating processes, and an electrolyte for the electroless deposition of a metal layer on a substrate, comprising a metal ion source for the metal to be deposited, a reducing agent, a complexing agent, a stabilizer and preferably an accelerator. A method for the electroless deposition of a metal layer on a surface from an electrolyte according to the invention is also disclosed.

Abstract: A low sludge trivalent chromium based conversion coating bath is provided which forms corrosion resistant coatings on aluminum and aluminum alloys by contact with the bath, which is suitable for use as a rinseable or dry-in place conversion coating for metal, that comprises trivalent chromium cations, fluorometallate anions, guanidinium ions and at least one organic anti-corrosion additive, and other optional components, as well as methods of making and using same, and metals coated using the compositions, the coated aluminum serving as an effective base for paint primers.

Abstract: Described herein is a continuous coil pretreatment process used to treat the surface of an aluminum alloy sheet or coil for subsequent deposition of an acidic organophosphorus compound. The process can include applying a cleaner to a surface of an aluminum sheet or a coil; etching the surface of the aluminum sheet or the coil with an acidic solution; rinsing the surface of the aluminum sheet or the coil with deionized water; applying to the surface of the aluminum sheet or the coil a solution of an acidic organophosphorus compound; rinsing the surface of the aluminum sheet or the coil with deionized water; and drying the surface of the aluminum sheet or the coil.

Abstract: A method for preventing adhesion of aluminum onto the surface of a metallic product, which can be performed by a simple treatment, at low cost and within a short time. Tin granules having an average particle diameter of 10 to 100 ?m and each having an oxide film formed thereon are sprayed onto the surface of a metallic product under a spraying pressure of 0.5 MPa or more or at a spraying velocity of 200 m/sec or more to form a tin oxide coating film at a thickness of 1 ?m or less on a portion of the surface of the metallic product, wherein the portion of the surface of the metallic product is a portion at which the metallic product is in contact with aluminum or an aluminum alloy. By forming the tin oxide coating film, it becomes possible to prevent the adhesion of aluminum onto a metallic product.

Abstract: A multilayer composite is provided. The composite may include a plurality of metallic glass layers interleaved with a plurality of polymer layers. The composite may have a thickness of up to 100 microns. The composite may have a fatigue strength of at least 1.5 times of the fatigue strength of a monolithic metallic glass having the same thickness as the composite and the same chemical composition as the metallic glass layer.

Abstract: A method for heat-treating a component which consists of a metal alloy, in which or on which at least one surface section is coated with a glaze or enamel coating, includes heating the component to a heating temperature which at least equals a minimum quenching temperature, and quenching the component starting from a temperature which at least equals the minimum quenching temperature in order to produce a higher-strength microstructure in the component. The components can be heat-treated such that the glaze or enamel coating is reliably prevented from chipping. The glaze or enamel coating is pre-cooled to a pre-cooling temperature at least on its free surface prior to quenching, said pre-cooling temperature maximally corresponding to the temperature at which the glaze or enamel coating begins to soften, and wherein the cooling rate at which the glaze or enamel coating is cooled is lower than the cooling rate during quenching.

Abstract: A plasma reactor for processing a workpiece includes a reactor chamber having a ceiling and a sidewall and a workpiece support facing the ceiling and defining a processing region, and a pair of concentric independently excited RF coil antennas overlying the ceiling and a side RF coil concentric with the side wall and facing the side wall below the ceiling, and being excited independently.

Abstract: An intelligent system is provided for monitoring a subsea structure and delivering appropriate cathodic protection to desired areas of the subsea structure. According to an embodiment, the technique involves monitoring a cathodic protection potential level at an important location or locations of the subsea structure. Based on the data acquired via monitoring, a controller is able to apply voltage levels to the subsea structure so as to attain and modulate a desired cathodic protection level, e.g. a cathodic protection level within a range of about ?800 mV to ?950 mV (SCE). Consequently, undesirable overprotection and under protection are avoided and the subsea structure is adequately protected from corrosion while reducing undesirable production of hydrogen.

Abstract: The present invention relates to a method of cleaning pretreatment of ferrous components that have been joined by welding, in which residues from the welding operation are removed from the surface of the component and, in this way, subsequent wet-chemical conversion treatments are enabled so as to produce defect-free coatings. For cleaning pretreatment, the component is contacted with an aqueous sulfuric acid etchant which comprises amino alcohols, ethoxylates and/or propoxylates of fatty alcohols having 6 to 12 carbon atoms in the alcohol and iron ions, and is effective without the presence of fluorides. In a further aspect, the present invention encompasses an aqueous acidic etchant for cleaning pretreatment of ferrous components that have been joined by welding.

Abstract: An electrochemical reaction device, comprises: an anode to oxidize a first substance; a first flow path facing on the anode and through which a liquid containing the first substance flows; a cathode to reduce a second substance; a second flow path facing on the cathode and through which a gas containing the second substance flows; a porous separator provided between the anode and the cathode; and a power supply connected to the anode and the cathode. A thickness of the porous separator is 1 ?m or more and 500 ?m or less. An average fine pore size of the porous separator is larger than 0.008 ?m and smaller than 0.45 ?m. A porosity of the porous separator is higher than 0.5.

Abstract: Water electrolyzers comprises an anode comprising a quantity of anode catalyst, a cathode comprising a quantity of cathode catalyst with an inlet for introducing a cathode reactant thereto, an anion-conducting polymer electrolyte membrane interposed between said anode and said cathode, and a source of electrical energy that applies a voltage between the anode and cathode. At least one of said anode catalyst or said cathode catalyst comprises a metal or metal alloy having a surface area of at least 12 m2/gm. Water electrolyzers preferably employ base metal catalysts and an anion-conducting polymeric membrane with a resistance below 0.3 ohm-cm2 and a base metal catalyst with a surface area of at least 12 m2/mg.

Abstract: A method for the controlled removal of bicarbonate from alkaline water and its replacement with a strong base that is capable of chemically absorbing CO2 from the atmosphere as a carbonate and bicarbonate solution. This bicarbonate and carbonate solution is reprocessed in the central compartment of an electrolytic cation exchange module (E-CEM) to take advantage of the removal of CO2 from the air, and as an energetic byproduct of E-CEM dihydrogen production, and to regenerate the original strong base absorbent solution. Thus, this process is cyclical in nature, and no chemicals are needed except an initial source of alkaline water.

Abstract: A reduction catalyst body for carbon dioxide of an embodiment includes a metal layer, and a projection provided on the metal layer. The projection is constituted of an aggregate of fine metal particles, and possesses a polyhedral structure having surfaces of three faces or more of a polygon. The projection has a site of reducing carbon dioxide, as at least a part of the surfaces.

Abstract: A method for manufacturing a palladium coated doped metal oxide conducting electrode including immersing a metal oxide conducting electrode into an aqueous solution having a palladium precursor salt to form the metal oxide conducting electrode having at least one surface coated with palladium precursor. To form a layer of palladium nanoparticles on the metal oxide conducting electrode the palladium precursor on the metal oxide conducting is reduced with a borohydride compound. The palladium nanoparticles on the metal oxide conducting electrode have an average diameter of 8 nm to 22 nm and are present on the surface of the metal oxide conducting electrode at a density from 1.5×10?3 Pd·nm?2 to 3.5×10?3 Pd·nm?2.

Abstract: A method for manufacturing a palladium coated doped metal oxide conducting electrode including immersing a metal oxide conducting electrode into an aqueous solution having a palladium precursor salt to form the metal oxide conducting electrode having at least one surface coated with palladium precursor. To form a layer of palladium nanoparticles on the metal oxide conducting electrode the palladium precursor on the metal oxide conducting is reduced with a borohydride compound. The palladium nanoparticles on the metal oxide conducting electrode have an average diameter of 8 nm to 22 nm and are present on the surface of the metal oxide conducting electrode at a density from 1.5×10?3 Pd·nm?2 to 3.5×10?3 Pd·nm?2.

Abstract: A hydrogen generation system comprises a signal generation system configured to generate a driver signal, wherein the driver signal is a pulsed DC signal; a signal processing system configured to process the driver signal and generate a chamber excitation signal; and a hydrogen generation chamber configured to receive the chamber excitation signal and generate hydrogen from a feedstock contained within the hydrogen generation chamber. The hydrogen generation chamber comprises at least one ring reflector configured to contain the feedstock and at least one emitter positioned within the at least one ring reflector.

Abstract: A carbon dioxide electrolytic device comprises: an electrolysis cell including a cathode, an anode, a carbon dioxide source to supply carbon dioxide to the cathode, a solution source to supply an electrolytic solution, and a separator separating the anode and the cathode; a power controller connected to the anode and the cathode; a refresh material source including a gas source to supply a gaseous substance, and a solution source to supply a rinse solution; and a controller to control the carbon dioxide source, the solution source, the power controller, and the refresh material source in accordance with request criteria of a performance of the cell and thus stop the supply of the carbon dioxide and the electrolytic solution, and apply the voltage therebetween while supplying the rinse solution thereto.

Abstract: Ultralow density ionic material foams, with density approaching 0.1% of the bulk density, and synthesis methods using interconnected metallic nanowires are provided. Nanowires of various sizes and metals are dispersed into a freezable liquid through a suitable fluid exchange. Surface treatments ensure that nanowires remain sufficiently metallic and physically separated. Wire-liquid solutions can be dropped directly into liquid nitrogen in the form of droplets or placed into molds of various shapes. A freeze drying technique is employed to turn the resulting ice-wire mixture into a freestanding, low-density foam composed of interlocked nanowires. Sintering or oxidation and reduction treatment of the foam material at elevated temperatures is used to connect the nanowires into an interconnected metallic foam. Metals of the metal foams are then processed into ionic materials including oxides, nitrides, chlorides, hydrides, fluorides, iodides and carbides.

Abstract: Various embodiments herein relate to methods and apparatus for electroplating material onto a semiconductor substrate. The apparatus includes an ionically resistive element that separates the plating chamber into a cross flow manifold (above the ionically resistive element) and an ionically resistive element manifold (below the ionically resistive element). Electrolyte is delivered to the cross flow manifold, where it shears over the surface of the substrate, and to the ionically resistive element manifold, where it passes through through-holes in the ionically resistive element to impinge upon the substrate as it enters the cross flow manifold. In certain embodiments, the flow of electrolyte into the cross flow manifold (e.g., through a side inlet) and the flow of electrolyte into the ionically resistive element manifold are actively controlled, e.g., using a three-way valve. In these or other cases, the ionically resistive element may include electrolyte jets.

Abstract: Crystal pulling apparatus for continuous pulling of silicon ingots in which an oxygen-containing crucible may be eliminated are disclosed. A solid silicon support having three indentations is used to hold pools of molten silicon. Silicon is added to a melting pool and weirs over into a stabilization pool and further weirs over into a growth pool from which a silicon ingot is grown.