Abstract: High-strength, lightweight alloy components, such as automotive components, capable of high temperature performance comprising aluminum, silicon, and iron and/or nickel are provided, along with methods of making such high-strength, lightweight alloy components. A high-energy stream, such as a laser or electron beam, may be selectively directed towards a precursor material to melt a portion of the precursor material in a localized region. The molten precursor material is cooled at a rate of greater than or equal to about 1.0×105 K/second to form a solid high-strength, lightweight alloy component comprising a stable ternary cubic phase having high heat resistance and high strength. The stable ternary phase may be AlxFeySiz, where x ranges from about 4 to about 5 or about 7.2 to about 7.6, y is about 1.5 to about 2.2, and z is about 1. The stable ternary phase may also be Al6Ni3Si.

Abstract: The present invention provides an Al—Mg—Si-based hot forming aluminum alloy plate which has not only high age-hardening property but also a high m value in a high strain rate range and excellent surface properties after forming and which is suitable for hot forming. The hot forming aluminum alloy plate comprises an aluminum alloy comprising 0.3 to 1.8 mass % Mg, 0.6 to 2.0 mass % Si and 0.04 to 0.20 mass % Fe. In the aluminum alloy, Mn content is restricted to 0.030 mass % or less, and Cr content is restricted to 0.030 mass % or less, and a balance comprises Al and unavoidable impurities. The hot forming aluminum alloy plate has an electrical conductivity of 60% or less according to IACS %. A production method of the hot forming aluminum alloy plate is also provided.

Abstract: The invention concerns a method for improving aluminium alloy blank tensile yield stress and formability comprising the successive steps of: providing a 6xxx series aluminium alloy slab; optionally homogenizing said slab; hot rolling and optionally cold rolling the slab to obtain a sheet; solution heat treating and quenching said sheet; cold rolling said sheet with at least 20% cold work reduction; cutting said sheet into blanks; flash annealing a portion of the flange of said blanks at a temperature between 360° C. and 480° C. for a time sufficient to obtain recrystallization of said portion of the flange and cool to a temperature of less than 100° C. The improved blanks and the stamped product and painted stamped products obtained by the method of the invention are particularly useful for automotive applications because of their high strength.

Abstract: A nickel-base alloy is disclosed that has the following weight percent composition. C about 0.005 to about 0.06 Cr about 13 to about 17 Fe about 4 to about 20 Mo about 3 to about 9 W up to about 8 Co up to about 12 Al about 1 to about 3 Ti about 0.6 to about 3 Nb up to about 5.5 B about 0.001 to about 0.012 Mg about 0.0010 to about 0.0020 Zr about 0.01 to about 0.08 Si up to about 0.7 P up to about 0.05 and the balance is nickel, usual impurities, and minor amounts of other elements as residuals from alloying additions during melting. The alloy provides a combination of high strength, good creep resistance, and good resistance to crack growth. A method of heat treating a nickel base superalloy to improve the tensile ductility of the alloy is also disclosed. An article of manufacture made from the nickel base superalloy described herein is also disclosed.

Abstract: A titanium sheet having a sheet thickness of 0.2 mm or less and including a hardened layer on a surface, the titanium sheet including a chemical composition containing, in mass percent: Fe: 0.001 to 0.08%; and O: 0.03 to 0.08%, wherein a grain size satisfies following Formulas (1) to (3), a thickness of the hardened layer is 0.1 to 2.0 ?m. The titanium sheet has both a sufficient strength and an excellent workability. Formulas (1) to (3) are dave?2.5 (1), t/dave?3.0 (2), and t/dmax—1.5 (3), where, in Formulas (1) to (3), t denotes the sheet thickness (?m), dave denotes an average grain size (?m), and dmax denotes a maximum grain size (?m).

Abstract: Low temperature gas carburization of stainless steel using acetylene as the carburizing specie is carried out under soft vacuum conditions in the presence of hydrogen or other companion gas. Carburization is made to go faster by including HCl or other carbon-free, halogen-containing activating compound in the carburizing gas being fed to the carburization reactor.

Abstract: A coated body having a substrate and a wear-resistant coating applied to the substrate by physical vapor deposition, the coating comprising a main layer applied to the substrate in a thickness of 1 to 10 pm, wherein said main layer is formed from a nitride of aluminum and at least one other metal from the group consisting of Ti, Cr, Si, Zr and combinations thereof; and a cover layer adjacent to the main layer at a thickness of 0.1 to 5 ?m, wherein the cover layer comprises at least one alternating layer consisting of an oxynitride layer and a nitride layer arranged over the oxynitride layer, wherein the oxynitride layer is formed from an oxynitride of aluminum and optionally further metals from the group consisting of chromium, hafnium, zirconium, yttrium, silicon and combinations thereof, and the nitride layer is formed from a nitride of aluminum and at least one other metal from the group consisting of Ti, Cr, Si, Zr and combinations thereof.

Abstract: In a multi-mask alignment system and method, a carrier frame is provided having a number of apertures therethrough. A number of shadow mask-frame combinations are also provided. Each shadow mask-frame combination includes a first set of alignment features and each shadow mask-frame combination is positioned on a first side of the carrier with the frame supporting the shadow mask in alignment with one of the apertures. A single alignment stage is provided and a control system including a programmed controller is also provided. Under the control of the controller, the single alignment stage translates to each shadow mask-frame combination, one-at-a time, and adjusts the position of the shadow mask-frame combination based on positions of the first set of alignment features determined by the controller.

Abstract: A coated article includes a low emissivity (low-E) coating having at least one infrared (IR) reflecting layer of a material such as silver, gold, or the like, and at least one high refractive index layer of or including titanium oxide and at least one additional metal. A doped titanium oxide layer(s) is designed and deposited in a manner so as to be amorphous or substantially amorphous (as opposed to crystalline) in the low-E coating, so as to better withstand optional heat treatment (HT) such as thermal tempering and reduce haze. The high index layer may be a transparent dielectric high index layer in preferred embodiments, which may be provided for antireflection purposes and/or color adjustment purposes, in addition to having thermal stability.

Abstract: A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.

Abstract: A substrate fixing carrier includes a supporting frame and a cooling plate. The supporting frame defines a hollow region and a supporting portion at an inner wall of the supporting frame. The cooling plate and the supporting frame are movable towards each other until the cooling plate is in the hollow region with edges of the cooling plate aligning with the supporting portion. When a rectangular to-be-evaporated substrate is placed in the hollow region with edges of the rectangular to-be-evaporated substrate between the supporting portion and the cooling plate, a distance between each edge of the cooling plate corresponding to each long side of the to-be-evaporated substrate and the supporting portion is greater than or equal to a thickness of the to-be-evaporated substrate, and a distance between each edge of the cooling plate corresponding to each short side of the to-be-evaporated substrate and the supporting portion is less than the thickness of the to-be-evaporated substrate.

Abstract: Disclosed herein is a roll-to-roll long base material surface processing device capable of performing surface processing on a long base material with little occurrence of wrinkling in the long base material at low costs. The surface processing device includes: two can rolls that cool a long resin film transferred in a roll-to-roll manner in a vacuum chamber with a cooling medium circulated therein by wrapping the long resin film around outer circumferences thereof; and surface processing units typified by magnetron sputtering cathodes provided so as to face the outer circumferences of the two can rolls, wherein a second can roll of the two can rolls other than a most upstream first can roll has a gas release mechanism that releases a gas from the outer circumference.

Abstract: A method for manufacturing a thin metal layer assembly includes forming a thin metal layer including nanopatterns on a preliminary substrate. The method includes forming a metal reducing layer by chemically reducing the thin metal layer. The method includes separating the metal reducing layer from the preliminary substrate. The method includes bonding the metal reducing layer to a target substrate.

Abstract: A CVD reactor includes a gas inlet element for introducing a process gas into a process chamber arranged between a process chamber cover and a susceptor. The gas inlet element contains at least one metal surface that comes into contact with the process gas. The metal surface has a passivation layer which prevents the metal surface from flaking due to exposure to one or more reactive gases. Cooling channels are arranged such that the passivation layer is maximally heated to 100° C. in a cleaning step in which chlorine is introduced into the process chamber and the susceptor is heated to at least 700° C. At the same time, the passivation layer is formed by chemically reacting a metal-organic compound with the metal atoms of the metal surface. The cleaning gas inlet openings are arranged such that the cleaning gas comes into contact with the metal surface that has the passivation layer.

Abstract: The present disclosure relates to methods and apparatus for treating vacuum processing system exhaust gases. In addition, methods and apparatus for maintenance of foreline plasma reactor subsystems are disclosed. In some embodiments, an apparatus for treating an exhaust gas in a foreline of a vacuum processing system includes a plasma source coupled with a foreline of a process chamber, a treatment agent source coupled with the plasma source, and a downstream trap to cool an exhaust stream and trap particles in the exhaust stream. In some embodiments, multiple foreline plasma reactor subsystems are used with a vacuum processing system, and one foreline plasma reactor subsystem can be isolated and maintained (e.g., cleaned) while exhaust gas treatment continues in another foreline plasma reactor subsystem and processing continues in the vacuum processing system.

Abstract: A deposition apparatus includes: a vacuum chamber in which a deposition process is performable; connected to the vacuum chamber: vaporizers in which are vaporizable different deposition materials; and a mixing chamber in which the vaporized different deposition materials are mixable; and within the vacuum chamber: a substrate support on which is supportable a substrate on which the mixed vaporized different deposition materials are deposited in the deposition process; and a spray nozzle which is connected to the mixing chamber and from which the mixed vaporized different deposition materials are sprayable to the substrate in the deposition process. The spray nozzle includes nozzles arranged in a plurality of lines.

Abstract: Provided is a substrate supporting apparatus including: a mounting part provided with a first body brought into contact with a substrate so that the substrate is mounted thereon and a second body configured to surround the first body; and a support part connected under the mounting part so as to support the mounting part, wherein the first body and the second body include a plurality of protrusions, and an area of upper surfaces of the protrusions provided on the first body is formed larger than an area of upper surfaces of the protrusions provided on the second body, and thus, the substrate can be stably supported.

Abstract: Described are vapor deposition methods for depositing molybdenum materials onto a substrate by the use of bis(alkyl-arene) molybdenum, also referred to herein as (alkyl-arene)2Mo, for example bis(ethyl-benzene) molybdenum ((EtBz)2Mo), as a precursor for such deposition, as well as structures that contain the deposited material.

Abstract: Embodiments herein relate to apparatus for gas distribution in a processing chamber. More specifically, aspects of the disclosure relate to a ceramic faceplate. The faceplate generally has a ceramic body. A recess is formed in an upper surface of the faceplate body. A plurality of apertures is formed in the recess through the faceplate. A heater is optionally disposed in the recess to heat the faceplate.

Abstract: Embodiments herein generally relate to gas distribution apparatuses. In one aspect, the disclosure relates to a faceplate having a plurality of apertures therethrough. Thermal chokes are disposed on the faceplate radially outward of the apertures. Seals are disposed at distal ends of the thermal chokes and are thermally separated from a body of the faceplate by the thermal chokes.

Abstract: Embodiments herein relate to an apparatus for use in a substrate processing chamber is disclosed herein. The apparatus has a faceplate, a support member, and a spacer. A plurality of apertures is formed through the faceplate. The faceplate is coupled to and supported by the support member. The spacer is further coupled to the support member.

Abstract: A nozzle for being connected to a distribution assembly for guiding evaporated material from a material source into a vacuum chamber is described. The nozzle includes: a nozzle inlet for receiving the evaporated material; a nozzle outlet for releasing the evaporated material to the vacuum chamber; and a nozzle passage extending from the nozzle inlet the nozzle outlet in a flow direction, wherein the nozzle passage comprises an outlet section having an aperture angle which continuously increases in the flow direction. Further, a material deposition arrangement having such a nozzle, a vacuum deposition system with the material source arrangement, and a method for depositing evaporated material are provided.

Abstract: With respect to a dielectric electrode, gas-jetting holes and gas-jetting holes formed in two rows along the X direction are provided as three or more gas-jetting holes along the X direction in a central region. By providing a difference in the X direction between the position where the gas-jetting hole is formed and the position where the gas-jetting hole is formed, the gas-jetting holes and the gas-jetting holes disposed in two rows are provided such that gas-jetting holes and gas-jetting holes are alternately disposed along the X direction.

Abstract: A method comprises: forming a first layer stack on a first substrate by means of a multiplicity of coating processes, each coating process of which forms at least one layer of the first layer stack; detecting an optical spectrum of the first layer stack; determining correction information for at least one coating process of the multiplicity of coating processes using a model, wherein the model provides a right-unique mapping function between a deviation of the spectrum from a desired spectrum and the correction information; and changing at least one control parameter for controlling the at least one coating process of the multiplicity of coating processes using the correction information; and forming a second layer stack on the first or a second substrate by means of the multiplicity of coating processes using the changed control parameter, each coating process of which forms at least one layer of the second layer stack.

Abstract: Provided are coated metal, the metal having improved properties due to a novel coating, a coating-forming treatment solution for forming the novel coating, and a method for producing the coated metal that has the novel coating. The coated metal includes metal and a coating formed on the metal. The coating includes Si, P, and O, and at least one selected from the group consisting of Mg, Ca, Ba, Sr, Zn, Al, and Mn. The coating includes a compound having a NASICON-type crystal structure represented by the general formula MIMIV2(MVO4)3.

Abstract: An additive comprising glucaric acid and/or glucaric acid salt may be added to an aqueous system in an effective amount to remove rust from a corroded metallurgy and inhibit further rust formation and/or corrosion of the metallurgy within the aqueous system, and also to passivate any metallurgy within an aqueous system, wherein the additive may not contain a phosphorous compound or an iron activating agent. The aqueous system may be an aqueous stream, a hydrocarbon stream containing water, a cooling tower, a boiler, a cooling water system, and combinations thereof.

Abstract: This modification refers to a spiral formation layout of materials, with magnesium sheets placed in parallel with a copper sheet and foamed material (4, 6, 7 and 8) in between as insulation, all placed in a plastic container(2) and solidified after inert fluid material (11) is poured in. In the center of the spiral, a magnesium anode rod (core) is connected through a wire to the surrounding spiral. This modified layout replaces the manufacturing process of the previous devices as described in the Diploma Number 1007131. The new device can generate electrical voltage of up to ?1.7 volt as before but with increased amperage of up to 500 mA. The presented layout of the materials and components allows for increased flexibility concerning the manufacturing of devices based on the requirements of industrial applications, construction sites and the various needs and demands in marine applications for ships, regardless of size.

Abstract: A system comprises a first electrode, an electrolyte membrane, and a second electrode. The first electrode is configured to reduce oxygen in a gas to an oxygen carrier ion at an intermediate temperature. The electrolyte membrane is configured to transport the oxygen carrier ion, and the second electrode is configured to oxidize the oxygen carrier ion to an oxygen molecule. Oxidation of the oxygen molecule consumes less than four electrons.

Abstract: The invention relates to a water electrolysis device including a membrane-electrode assembly that includes a proton-exchange membrane and an anode active layer that includes an electrocatalytic material. The water electrolysis device further includes a water inlet collector and an oxygen outlet collector, a straight line connecting the water inlet collector to the oxygen outlet collector extending along a general flow direction. The water electrolysis device further includes an anode facing the anode active layer. In a section along a normal to the straight line, the anode has points that each have a combined distance with the water inlet collector and with the oxygen outlet collector, the combined distance for a first point at the periphery of the anode is at least 10% greater than the combined distance of a second point positioned on the straight line.

Abstract: Methods and systems for the production of chlorine and caustic employ a hydroxide-stable anion exchange membrane located against the face of the oxygen depolarized cathode (ODC). The anion exchange membrane contains a polymer including one or more of a phosphonium, a primary, secondary, tertiary or quaternary ammonium, a guanidinium, or a positively charged cyclic amine.

Abstract: An oxidizing solution generator wherein all elements that make out the oxidizing solution generator are coupled, forming a novel arrangement. The structural arrangement comprises a parallelepipedal metallic structure, preferably aluminum, having two small reservoirs attached to its back side, one for containing water and one for brine, the reservoirs connected to water and brine dispensers positioned above them. A sodium hypochlorite or oxidizing solution dispenser is also provided parallel to the dispensers, and is connected to the sodium hypochlorite or oxidizing solution reservoir, positioned on the front side of the structure on a lower board. A voltage current source is also provided on the front side of the higher portion of the structure parallel to a control switchboard, and an electrolytic reactor is provided in the intermediate region. An embodiment for generators sized to produce over 6 kg/day is also described.

Abstract: An electrolytic cell that prevents, or at least minimizes, damage to a membrane and reduces electrolytic voltage may include an elastic member attached to an electrolytic partition wall within an anode chamber and/or a cathode chamber. The elastic member comprises a spring retaining part and a bonding part that is bonded to the electrolytic partition wall, parallel first support parts extending from the bonding part away from the electrolytic partition wall, a second support part connecting the first support parts, and two parallel spring rows. Each spring row may include first flat spring-like bodies, which originate from the first support part and extend toward the opposite direction of the electrolytic partition wall, and second flat spring-like bodies, which originate from the second support part and extend toward the opposite direction of the electrolytic partition wall.

Abstract: An individual solid oxide cell (SOC) constructed of a sandwich configuration including in the following order: an oxygen electrode, a solid oxide electrolyte, a fuel electrode, a fuel manifold, and at least one layer of mesh. In one embodiment, the mesh supports a reforming catalyst resulting in a solid oxide fuel cell (SOFC) having a reformer embedded therein. The reformer-modified SOFC functions internally to steam reform or partially oxidize a gaseous hydrocarbon, e.g. methane, to a gaseous reformate of hydrogen and carbon monoxide, which is converted in the SOC to water, carbon dioxide, or a mixture thereof, and an electrical current. In another embodiment, an electrical insulator is disposed between the fuel manifold and the mesh resulting in a solid oxide electrolysis cell (SOEC), which functions to electrolyze water and/or carbon dioxide.

Abstract: Provided is a method capable of producing, in a simple and low-cost manner, an electrolysis electrode which can be used in alkaline water electrolysis and has superior durability against output variation. The method for producing an anode for alkaline water electrolysis includes: a step of dissolving lithium nitrate and a nickel carboxylate in water to prepare an aqueous solution containing lithium ions and nickel ions, a step of applying the aqueous solution to the surface of a conductive substrate having at least the surface composed of nickel or a nickel-based alloy, and a step of subjecting the conductive substrate to which the aqueous solution has been applied to a heat treatment at a temperature within a range from at least 450° C. to not more than 600° C., thereby forming a catalyst layer composed of a lithium-containing nickel oxide on the conductive substrate.

Abstract: A system preferably including a carbon dioxide reactor. A method for carbon dioxide reactor control, preferably including selecting carbon dioxide reactor aspects based on a desired output composition, running a carbon dioxide reactor under controlled process conditions to produce a desired output composition, and/or altering the process conditions to alter the output composition.

Abstract: Apparatus for producing alkali hydroxide and method for operating apparatus for producing alkali hydroxide are provided. A cooling chamber through which a coolant can pass is constructed by placing a separation wall in a cathode chamber on a side opposite to an ion-exchange membrane, and a flow rate adjuster, such as manual valves, which can adjust the supply flow rate of the coolant is placed in each unit cell. The electrolytic temperature of each unit cell is regulated at an optimum operating temperature depending on the current density by adjusting the flow rate of the coolant without individually adjusting the flow rate of salt water supplied to the unit cell or the concentration of the salt water.

Abstract: Various embodiments include a method for continuous operation of an electrolysis cell with a gaseous substrate, the method comprising: supplying an electrolyte to the electrolysis cell via an electrolyte feed; flowing the electrolyte out of the electrolysis cell into the gas space through a gas diffusion electrode; collecting the electrolyte from the electrolyte flow into the gas space in a collecting region in the gas space; and sucking the collected electrolyte out of said gas space via a connection between the gas space and electrolyte feed.

Abstract: A reduced iron production method using an electrowinning method and reduced iron is provided. The method includes, preparing a mixture by mixing, a solid electrolyte containing sodium peroxide (Na2O2) and boron oxide (B2O3), with iron oxide (Fe2O3); and putting the mixture in an electrowinning device provided with an anode and an insoluble cathode and heating to form a molten oxide and then applying a voltage to the anode and the cathode to form iron on the cathode. Therefore, by reducing iron oxide through an electrowinning method, a reduced iron in a pure iron state can be obtained. Although it is very difficult to obtain pure iron by refining an iron ore, by using the electrowinning method in which the composition of an electrolyte is controlled and electrolysis conditions are controlled, reduced iron that is pure can be obtained.

Abstract: A composition comprising: (a) cobalt ions, and (b) an additive of formula (I) wherein R1 is selected from X-Y; R2 is selected from R1 and R3; X is selected from linear or branched C1 to C10 alkanediyl, linear or branched C2 to C10 alkenediyl, linear or branched C2 to C10 alkynediyl, and (C2H3R6—O)n—H; Y is selected from OR3, NR3R4, N+R3R4R5 and NH—(C?O)—R3; R3, R4, R5 are the same or different and are selected from (i) H, (ii) C5 to C20 aryl, (iii) C1 to C10 alkyl (iv) C6 to C20 arylalkyl, (v) C6 to C20 alkylaryl, which may be substituted by OH, SO3H, COOH or a combination thereof, and (vi) (C2H3R6—O)n—H, and wherein R3 and R4 may together form a ring system, which may be interrupted by O or NR7; m, n are integers independently selected from 1 to 30; R6 is selected from II and C1 to C5 alkyl; R7 is selected from R6 and formula (II).

Abstract: A decoupled plating system is provided for producing lithium. In a general embodiment, the present disclosure provides a feed tank configured to supply a lithium-rich aqueous electrolyte stream, a plating tank that is configured to receive an organic electrolyte and plate out lithium metal from that organic electrolyte, and one or more lithium replenishment cells configured to receive both electrolytes, keep them separated, and selectively move lithium ions from the aqueous electrolyte into the spent organic electrolyte stream. The present system and process can advantageously reduce operating costs and/or improve energy efficiency in production of lithium metal and associated products.

Abstract: An electroplating solution for lithium metal, and a method for preparing a lithium metal electrode using the same, and in particular, while preparing a lithium metal electrode using electroplating, a lithium metal electrode having enhanced surface properties may be prepared by electroplating using a plating solution including a lithium nitrogen oxide and a metal nitrogen oxide, and, by using such a lithium metal electrode in a battery, lifetime properties of the battery may be enhanced.

Abstract: Porous metal coatings are produced by multi-step electrodeposition method involving application of higher current density at lower duration and lower current density for longer durations. During higher current step, the evolved hydrogen bubbles serve as the self-collapsing templates to deposit the metal ions and during lower current density at longer duration step, the coating is applied to improve the bond strength. The multi-step depositions by alternating these steps provides the development of more complex porous structures that can have desired interconnectivity between the pores and have desired morphology, and desired wettability and wickability characteristics, and have a good bond strength between the coated layers as well as coated layers and the base substrate.

Abstract: The invention generally relates to sensors, methods of manufacture thereof, methods of use thereof for sensing analytes, such as small molecules and biomolecules, and methods of immobilization. In certain embodiments, the invention provides a multi-analyte sensor. The multi-analyte sensor includes a plurality of sensing electrodes. Each sensing electrode is functionalized with a different molecule (e.g., biomolecule), at least two of the sensing electrodes are spaced apart prior to and after functionalization by 100 ?m or less, and there is no cross-talk between the plurality of sensing electrodes.

Abstract: Provided is a chemical treatment steel sheet including a steel sheet; a composite coated layer which is formed on at least one surface of the steel sheet, and contains 2 to 200 mg/m2 of Ni in terms of an amount of metal Ni and 0.1 to 10 g/m2 of Sn in terms of an amount of metal Sn, and in which an island-shaped Sn coated layer is formed on an Fe—Ni—Sn alloy layer; and a chemical treatment layer that is formed on the composite coated layer, and contains a 0.01 to 0.1 mg/m2 of Zr compounds in terms of an amount of metal Zr and 0.01 to 5 mg/m2 of phosphate compounds in terms of an amount of P.

Abstract: The invention relates to a method of processing of materials using a moving interface, the method comprising: providing a working material, the working material comprising a substrate with a metallic film on at least one side of the substrate; providing an energy source adjacent to the working material, where the energy source is electrical current between a cathode and the working material as an anode; providing for relative controlled movement between the working material and the energy source, where the relative controlled movement is a motor attached to the working material via a linkage; activating the energy source such that the energy processes the working material; moving the energy source and/or the working material relative to the other to control the amount of processing of the working material achieved by the energy, where the processing of the working material is anodization; immersing the working material at a controlled speed into an anodizing bath equipped with a cathode; starting anodization

Abstract: A plating apparatus according to the present disclosure includes an anode holder configured to hold an anode; a substrate holder placed opposite the anode holder and configured to hold a substrate; and an anode mask installed on a front face of the anode holder and provided with a first opening adapted to allow passage of an electric current flowing between an anode and the substrate. The diameter of the first opening in the anode mask is configured to be adjustable. When a first substrate is plated, a diameter of the first opening is adjusted to a first diameter. When a second substrate is plated, the diameter of the first opening is adjusted to a second diameter smaller than the first diameter.

Abstract: A method for preparation of high-quality graphene on the surface (0001) of silicon carbide by superficial graphitisation of the compound in a stream of silicon atoms from an external sublimation source is disclosed.

Abstract: Provided is a method for producing a single crystal, wherein compositional variations and defects in the single crystal can be prevented and a single crystal having uniform characteristics in the growth direction can be produced at high yield. In this method for producing a single crystal, a PbTiO3-containing single crystal is produced by the vertical Bridgman technique, wherein the thickness of a melt layer containing the melt in a crucible is at least 30 mm.

Abstract: The invention relates to a device (1) and method for applying a carbon layer, in particular a diamond layer, to a substrate (2, 2a) by means of chemical vapour deposition, comprising a deposition chamber (3) into which a process gas, in particular molecular hydrogen and/or a mixture of molecular hydrogen and a carbon-containing gas, such as methane can be supplied, wherein a gas inlet and gas activation element (7) is provided in the form of a hollow body with a flow channel (7b) for the process gas, a wall (7a) surrounding the flow channel (7b), and an outlet opening (16) feeding from the flow channel (7b) into the deposition chamber (3), and a heating device (8) is provided for heating the wall (7a) of the gas inlet and gas activation element (7).

Abstract: A silicon carbide epitaxial substrate includes a silicon carbide single-crystal substrate of one conductivity type, a first silicon carbide layer of the above-mentioned one conductivity type, a second silicon carbide layer of the above-mentioned one conductivity type, and a third silicon carbide layer of the above-mentioned one conductivity type. The silicon carbide single-crystal substrate has first impurity concentration. The first silicon carbide layer is provided on the silicon carbide single-crystal substrate, and has second impurity concentration that is lower than the first impurity concentration. The second silicon carbide layer is provided on the first silicon carbide layer, and has third impurity concentration that is higher than the first impurity concentration. The third silicon carbide layer is provided on the second silicon carbide layer, and has fourth impurity concentration that is lower than the second impurity concentration.