Abstract: A light emitting device has a columnar portion including a light emitting layer, and: (b?a)/L1>(d?c)/L2; a<b; c<d; and a<d, where a is the columnar portion's maximum width as viewed in a laminating direction, at a first position of the columnar portion closest to the substrate in the laminating direction, b is the columnar portion's maximum width, at a second position of the light emitting layer closest to the substrate, c is the columnar portion's maximum width, at a third position of the light emitting layer farthest from the substrate, d is the columnar portion's maximum width, at a fourth position of the columnar portion farthest from the substrate, and L1 is a distance between the first and second positions and L2 is a distance between the third and fourth positions.

Abstract: Systems, apparatuses, and methods are described which provide a camera mount system. The camera mount system can include, for example, a first optical element and a second optical element. Incoming light from a scope on a weapon, for example, is partially transmitted and partially reflected by the first optical element. The partially transmitted light passes through an eyepiece to a viewer (e.g., a shooter). The partially reflected light is reflected by the second optical element and is recorded by a recording device (e.g., a camera, a video recorder, an image sensor, etc.). The viewer has direct access to the scope optics, a spotting scope, or binoculars, for example, and the camera and the viewer have access to the same view.

Abstract: A patterning device, includes: an absorber layer on a patterning device substrate; and a reflective or transmissive layer on the patterning device substrate, wherein the absorber layer and the reflective or transmissive layer together define a pattern layout having a main feature and an attenuated sub-resolution assist feature paired with the main feature, wherein: the main feature is configured to generate, upon transferring the device pattern to a layer of patterning material on a substrate, the main feature in the layer of patterning material, and upon the transferring the pattern to the layer of patterning material, the attenuated sub-resolution assist feature is configured to avoid generating a feature in the layer of patterning material and to produce a different radiation intensity than the main feature.

Abstract: An extreme ultraviolet mask includes an absorber having an index of refraction ranging from 0.87 to 1.02, an extinction coefficient ranging from 0.065 to 0.085, and a thickness ranging from 33.5 nm to 43.5 nm. Another extreme ultraviolet mask includes an absorber having an index of refraction ranging from 0.87 to 1.02, an extinction coefficient ranging from 0.085 to 0.105, and a thickness ranging from 25.5 nm to 35.5 nm. Another extreme ultraviolet mask includes an absorber having an index of refraction ranging from 0.895 to 0.950, an extinction coefficient ranging from 0.0600 to 0.0610, and a thickness ranging from 30 nm to 39 nm or 50 nm to 55 nm.

Abstract: A method of producing a substrate including a resist film includes a coating step of coating a resist film on a substrate, an exposing step of exposing selectively the resist film formed in the coating step, and a developing step of developing the resist film that is selectively exposed in the exposing step and adjusting process time for development based on transition time for shifting to the developing step after the coating step.

Abstract: A method for forming a photomask includes receiving a substrate having a first layer formed thereon, wherein a patterned second layer exposing portions of the first layer is disposed over the substrate, removing the exposed portions of the first layer through the patterned second layer to form a plurality of openings in the first layer, removing the patterned second layer, and performing a wet etching to remove portions of the first layer to widen the plurality of openings with an etchant. The etchant is in contact with a top surface of the first layer and sidewalls of the plurality of openings. Each of the plurality of openings has a first width prior to the performing of the wet etching and a second width after the performing of the wet etching. The second width is greater than the first width.

Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.

Abstract: This disclosure relates to a semiconductor resist composition including an organometallic compound represented by Formula 1 and a solvent, and to a method of forming patterns using the composition: wherein L includes at least one alkylene group in the main chain. A pattern formed by using the semiconductor resist composition may not collapse while having a high aspect ratio.

Abstract: This disclosure relates to a semiconductor resist composition including an organometallic compound represented by Chemical Formula 1 and a solvent, and to a method of forming patterns using the composition: wherein, in Chemical Formula 1, R1 is an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or an -alkyl-O-alkyl group, and R2 to R4 are each independently selected from —ORa and —OC(?O)Rb.

Abstract: A radiation-sensitive composition includes particles and a solvent. The particles include a first component and a second component. The first component is a hydrolyzation product or a hydrolytic condensation product of a metal compound including a hydrolyzable group, or a combination thereof; and the second component is an organic acid, an anion of the organic acid, a first compound represented by formula (1), or a combination thereof. The organic acid and the first compound each have a molecular weight of no less than 120. In the formula (1), R1 represents an organic group having a valency of n; X represents an alcoholic hydroxyl group, —NCO or —NHRa, wherein Ra represents a hydrogen atom or a monovalent organic group; and n is an integer of 2 to 4.

Abstract: A lithographic printing plate precursor including an image recording layer on a hydrophilic support, in which the image recording layer includes a polymerization initiator, an infrared absorbent, a polymerizable compound, and an acid color former, and the infrared absorbent includes a compound represented by Formula 1, as well as a method of preparing a lithographic printing plate by use of the lithographic printing plate precursor. In Formula 1, at least one of Ar1 or Ar2 has a group represented by the following Formula 2. —X??Formula 2 X represents a halogen atom, —C(?O)—X2—R11, —C(?O)—NR12R13, —O—C(?O)—R14, —CN, —SO2N15R16, or a perfluoroalkyl group, X2 represents a single bond or an oxygen atom, R11 and R14 each independently represent an alkyl group or an aryl group, and R12, R13, R15 and R16 each independently represent a hydrogen atom, an alkyl group, or an aryl group.

Abstract: A photosensitive resin composition comprising the following component (a), component (b1), and component (b2). (a) a polyimide precursor having a structural unit represented by the following formula (1); (b1) one or more compounds selected from the group consisting of a compound represented by the following formula (11) and a compound represented by the following formula (12); (b2) one or more compounds selected from the group consisting of a compound represented by the following formula (21) and a compound represented by the following formula (22).

Abstract: This disclosure relates to a semiconductor resist composition including an organometallic compound including a structural unit represented by Chemical Formula 1 and a solvent, and to a method of forming patterns using the composition: wherein in Chemical Formula 1, carbon bonded with a central metal atom (M) forms a benzylic bond with a ring group having a conjugated structure, such as an aromatic ring group, a heteroaromatic ring group, or a combination thereof.

Abstract: A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R1 represents a ? ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5×10?28 m3.

Abstract: The present invention is a polymer having a polyamide structural unit, a polyamide-imide structural unit, or a polyimide structural unit, selected from a polyamide, a polyamide-imide, a polyimide, a polyimide precursor, a polybenzoxazole, and a polybenzoxazole precursor, including a reaction product of a diamine containing at least one of a diamine shown by the following general formula (1) and a diamine shown by the following general formula (2), together with at least one of a tetracarboxylic dianhydride shown by the following general formula (3) as well as a dicarboxylic acid and a dicarboxylic halide shown by the following general formula (4). This provides a polymer which is soluble in a safe organic solvent used widely, and is usable as a base resin of a positive photosensitive resin composition that is soluble in an aqueous alkaline solution and capable of forming a fine pattern to give higher resolution.

Abstract: A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.

Abstract: A resist underlayer film-forming composition capable of providing a resist underlayer film exerting a sufficient anti-reflection function particularly in a KrF process, a high solvent resistance and a high dry etching speed, and enables the formation of a photoresist pattern having a good cross-sectional shape. The composition includes a copolymer containing: structural unit (A) derived from a diepoxy compound; and structural unit (B) derived from a compound represented by formula (1) [wherein: A represents a benzene or cyclohexane ring; X represents a hydrogen atom, alkyl or alkoxy group having 1 to 10 carbon atoms and optionally substituted by a halogen atom, or an alkoxycarbonyl group having 2 to 11 carbon atoms; and Y represents —COOH or -L-NHCO—Z—COOH (wherein: Z represents an alkylene group having 3 to 10 carbon atoms and optionally substituted by an oxygen atom, sulfur atom or nitrogen atom; and L represents a single bond or a spacer)].

Abstract: A composition for forming a resist underlayer film that mask residues after lithography can be removed only with a chemical without etching. A composition for forming a silicon-containing resist underlayer film, that includes a polysiloxane having a unit structure including a carbonyl group-containing functional group, wherein the silicon-containing resist underlayer film is used as a mask layer in a step of removing the mask layer with a hydrogen peroxide-containing chemical after transfer of a pattern to an underlayer by a lithography process. The composition for forming a silicon-containing resist underlayer film, wherein the unit structure including a carbonyl group-containing functional group may include a cyclic acid anhydride group, a cyclic diester group, or a diester group. The polysiloxane may further have a unit structure including an amide group-containing organic group. The amide group may be a sulfonamide group or a diallyl isocyanurate group.

Abstract: A maskless exposure apparatus includes a light source, an optical head including a light modulator and an optical system, and reflecting light from the light source to radiate the light to a substrate to be exposed, a stage supporting the substrate and moving the substrate in a scanning direction, where the substrate is rotated such that a reference line of the substrate is at a first angle with respect to the scanning direction, and an optical head rotating unit rotating the optical head. When patterns are formed on the substrate in a direction of a first row and an nth row that is substantially perpendicular to the reference line, the first angle is set such that illuminations accumulated, by a beam spot array, in first portions and second portions on the substrate respectively corresponding to the patterns of the first row and the patterns of the nth row vary.

Abstract: The EUV radiation source includes a rotatable EUV source vessel configured to collect fuel debris generated from the collision of fuel droplets and a laser beam. The source vessel includes an inner surface for receiving the fuel debris, an first aperture at one end of the inner surface, and a heater adjacent to the inner surface and configured to generate a heating area on the inner surface in coordination with a rotation speed of the source vessel. The fuel debris is reflowed to the heating area. A method for generating EUV radiation includes collecting fuel debris on an inner surface of a source vessel, rotating the source vessel at a rotation speed, and heating a portion of the source vessel to an elevated temperature to generate a heating area on the inner surface in coordination with the rotation speed. The fuel debris is reflowed to the heating area.

Abstract: An extreme ultraviolet light generation device includes: a chamber (2) having inside a plasma generating region (22) in which plasma is generated from a droplet of a target substance; an EUV light focusing mirror (23) having a reflection surface (23A) that reflects EUV light generated by the droplet being turned into the plasma in the plasma generating region; a magnetic field generation unit configured to generate a magnetic field ML for converging, toward a wall of the chamber, a charged particle generated by the droplet being turned into the plasma; and an etching gas supply unit (32) configured to supply etching gas along the reflection surface from an outer periphery of the EUV light focusing mirror, the etching gas supply unit being configured such that flow speed of etching gas supplied from one side of a plane S is higher than flow speed of etching gas supplied from the other side.

Abstract: A shutter blade assembly for a photolithography machine, a large-field of view (FoV) photolithography machine and an exposure method are disclosed. A scan-ning-directional shutter blade subassembly is moved once during each illuminance test and then moved above alignment marks after the test. During exposure, the scanning-directional shutter blade subassembly moves with a mask stage in the same direction and at the same speed so that it stays stationary relative to the alignment marks on a photomask (4). In case of full-FoV exposure, it is not necessary for a non-scanning-directional shutter blade subassembly to be moved, while in case of partial-FoV exposure, it is moved into the partial exposure FoV and defines there a window for obtaining a light spot with a desired shape by modulating illumination light.

Abstract: An illumination optical unit for EUV projection lithography serves for obliquely illuminating an illumination field, in which an object field of a downstream imaging catoptric optical unit and a reflective object to be imaged can be arranged. A pupil generating device of the illumination optical unit is embodied so that an illumination pupil results, which brings about a dependency of an imaging telecentricity against a structure variable of the object to be imaged. This dependency is such that a dependency of the imaging telecentricity against the structure variable of the object to be imaged on account of interaction of the oblique illumination with structures of the object to be imaged is at least partly compensated for. An optical system for EUV projection lithography also has an imaging catoptric optical unit alongside an illumination optical unit and can additionally have a wavefront manipulation device.

Abstract: An exposure apparatus includes a liquid immersion member including a first member and a second member and configured to form a liquid immersion space of the liquid, a driving apparatus configured to move the second member with respect to the first member; and a controller configured to control the driving apparatus. The controller controls the driving apparatus so that a first operation of the second member in a first movement period of the substrate between exposure termination of a first shot region and exposure start of a second shot region is different from a second operation of the second member in a second movement period of the substrate between exposure termination of a third shot region and exposure start of a fourth shot region, the first and second shot regions being included in the same row, the third and fourth shot regions being arranged in different rows.

Abstract: There is provided a substrate processing apparatus including: a light radiator configured to radiate a light for processing into an irradiation area which is smaller than a processing target area of a surface of a substrate; a driver configured to move the irradiation area in two directions that cross each other in a plane along the surface of the substrate; and a controller configured to control the driver to move an irradiation position in two directions according to a movement pattern which has been set to radiate the light to an entire area of the processing target area.

Abstract: A lithography system is provided and includes a light source device configured to emit a processing light beam onto the semiconductor wafer, to generate a penetrating light beam and a reflected light beam. The lithography system further includes a detecting module having a first detector and a second detector. The first detector is configured to receive the penetrating light beam to generate first power data, and the second detector is configured to receive the reflected light beam to generate second power data. The lithography system also includes a monitoring device configured to calculate absorbed power data of the semiconductor wafer according to the first power data, the second power data and reference power data of a reference light beam and configured to compensate for a pattern formed on the semiconductor wafer resulting from the processing light beam according to the absorbed power data and reference information.

Abstract: A method of manufacturing a semiconductor device includes dividing a number of dies along an x axis in a die matrix in each exposure field in an exposure field matrix delineated on the semiconductor substrate, wherein the x axis is parallel to one edge of a smallest rectangle enclosing the exposure field matrix. A number of dies is divided along a y axis in the die matrix, wherein the y axis is perpendicular to the x axis. Sequences SNx0, SNx1, SNx, SNxr, SNy0, SNy1, SNy, and SNyr are formed. p*(Nbx+1)?2 stepping operations are performed in a third direction and first sequence exposure/stepping/exposure operations and second sequence exposure/stepping/exposure operations are performed alternately between any two adjacent stepping operations as well as before a first stepping operation and after a last stepping operation. A distance of each stepping operation in order follows the sequence SNx.

Abstract: A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alignment measurement of the substrate, applying heat to the substrate table to reduce cooling of the substrate table the substrate table provided by the cooling system, the heat being applied between a time at which the alignment measurement is performed and a time at which the lithographic exposure is performed and performing the lithographic exposure of the substrate.

Abstract: In an image forming apparatus, a cleaning member is pressed against a circumferential surface of an image bearing member and collects a toner remaining on the circumferential surface of the image bearing member. The toner has a number average roundness of 0.965 to 0.998. The toner has a D50 of 4.0 ?m to 7.0 ?m. A linear pressure of the cleaning member on the circumferential surface of the image bearing member is 10 N/m to 40 N/m. The image bearing member includes a single-layer photosensitive layer containing a charge generating material and a hole transport material. Ionization potential IpHTM of the hole transport material and ionization potential IpCGM of the charge generating material satisfy mathematical formula (1) “IpHTM?5.30 eV”, mathematical formula (2) “IpCGM?5.30 eV”, and mathematical formula (3) “0.09 eV?|IpHTM?IpCGM|?0.30 eV”.

Abstract: An electrophotographic photosensitive member includes, in sequence, a support, a conductive layer, an undercoat layer, a charge generation layer, and a charge transport layer. The conductive layer is a cured film, and the cured film contains titanium oxide particles doped with niobium. The undercoat layer contains a cured product of a composition that contains an electron transport material having a polymerizable functional group and a resin functionalized with a carboxylic acid derivative.

Abstract: An electrophotographic photosensitive member includes a conductive substrate and a photosensitive layer. The photosensitive layer is a single-layer photosensitive layer and contains a charge generating material, a hole transport material, an electron transport material, and a binder resin. A hole mobility ?h is at least 1.00×10?7 cm2/V/second and an electron mobility ?e is at least 4.00×10?8 cm2/V/second in the photosensitive layer as measured under conditions of a temperature of 23° C. and an electric field intensity of 1.50×105 V/cm. A ratio (?h/?e) of the hole mobility ?h to the electron mobility ?e is at least 1.0 and no greater than 50.0.

Abstract: Provided an electrophotographic member having an excellent electroconductivity and being capable of forming a high quality electrophotographic image even in long-term use. The electrophotographic member comprises an electroconductive substrate and an electroconductive layer on the substrate, the electroconductive layer containing a matrix polymer, and a specific imidazolium salt.

Abstract: Provided an electrophotographic member capable of causing less fog in an H/H environment even when used in a torque-reduced image forming apparatus. The member comprises an electro-conductive substrate, an electro-conductive layer thereon and insulating parts, the member having a surface having an electrical insulating first region and an electro-conductive second region, the first region and the second region being adjacent to each other, a total area of the second region in a square region put on an outer surface of the member is 30% to 80% of an area of the square region; two or more of the 200 straight lines drawn in the square region at an interval of 5 ?m pass the second region at least once, and, the number of line segment LS having a length of 200 ?m or more is 5% or less of the total number of the line segment LS.

Abstract: Toner, including: a toner particle that contains a binder resin and a wax, wherein the binder resin includes an amorphous resin A, and, in dynamic viscoelasticity measurement of the toner, when the temperature at which the loss elastic modulus G? measured at a frequency of 1 Hz becomes 1.00×106Pa is set as T(1 Hz), when the temperature at which the loss elastic modulus G? measured at a frequency of 20 Hz becomes 1.00×106 Pa is set as T(20 Hz), and when the maximum value of the ratio (tan ?) of the loss elastic modulus G? with respect to the storage elastic modulus G?, measured at a frequency of 20 Hz, in a range of from 60° C. to 90° C. is set as tan ?(P), the toner satisfies T(20 Hz)?T(1 Hz)?7.0° C., 0.80?tan ?(P)?1.90, 60° C.?T(1 Hz)?80° C., and 60° C.?T(20 Hz)?80° C.

Abstract: An image forming apparatus includes an image bearing member, a charger, and a cleaning member. The charger charges a circumferential surface of the image bearing member to a positive polarity. The cleaning member is pressed against the circumferential surface of the image bearing member and collects a toner remaining on the circumferential surface of the image bearing member. A linear pressure N of the cleaning member on the circumferential surface of the image bearing member is at least 14 N/m and no greater than 40 N/m. A rebound resilience R of the cleaning member at a temperature of 25° C. is at least 38%. The leaner pressure N and the rebound resilience R satisfy mathematical formula (1A). The image bearing member satisfies mathematical formula (1B) R < 13.771 × N 0.4043 ( 1 ? A ) 0.

Abstract: An optical scanner includes a multi beam light source, a scanning optical system, and a controller. The controller specifies selected beams, and changes light quantities of the respective selected beams at the same change timing based on the same profile data at respective positions in the main scanning direction which are fixedly determined as light quantity change positions. When the position of a center region in an arrangement width of the plurality of selected beams is moved in the main scanning direction in response to a selected mode of the beams, in the profile data, the controller derives a shift light quantity at a position shifted in the main scanning direction by an amount corresponding to the movement of the position of the center region, and the light quantity is modified so that the shift light quantity is used at the light quantity change position.

Abstract: An example shutter unit includes a motor including a driving shaft to rotate in a first rotation direction and to rotate in a second rotation direction opposed to the first rotation direction, a first shutter part to selectively expose a light window by receiving a driving force transferred from the driving shaft when the driving shaft rotates in the first rotation direction or the second rotation direction, and a second shutter part to selectively expose a sensor by receiving the driving force transferred from the driving shaft when the driving shaft rotates in the second rotation direction.

Abstract: Provided is an electrophotographic member in which density unevenness of an image is less likely to occur even in the case of outputting an image after standing in a high-temperature and high-humidity environment for a long period of time. The electrophotographic member includes: an electroconductive substrate; an electroconductive elastic layer on or above the substrate; and an insulating portion on the elastic layer, an outer surface of the electrophotographic member being composed of an outer surface of the insulating portion and an outer surface of the elastic layer that is not covered with the insulating portion, wherein the elastic layer contains a urethane resin as a first resin, and the elastic layer has a region from the outer surface of the elastic layer constituting the outer surface of the electrophotographic member to a depth of 1 ?m, the region further containing a second resin.

Abstract: The electrophotographic member comprises: an electroconductive substrate; and an electroconductive layer on or above the substrate, an outer surface of the electrophotographic member having electrically insulating first regions and an electroconductive second region, each of the first regions being adjacent to the second region, wherein assuming that a square region having a side length of 300 ?m is put on an outer surface of the electrophotographic member, in the square regions, the first regions are included, and assuming that Voronoi tessellation is conducted with respect to the first regions in the square region to create Voronoi polygons, a coefficient of variation of S1/SV is from 0.10 to 1.00, where SV denotes a plane area of each of the Voronoi polygons, and S1 denotes a plane area of one of the first regions included in each of the Voronoi polygons.

Abstract: To provide an electrophotographic member causing less change in toner conveyance even used in a high-temperature and high-humidity environment. The electrophotographic member has an electro-conductive substrate, an elastic layer on the substrate and a coating layer on the elastic layer. The elastic layer has a first protrusion on a surface thereof on a side opposite to a side facing the substrate. The electrophotographic member has, on an outer surface thereof, a second protrusion derived from the first protrusion. The outer surface of the electrophotographic member has one or more of electrical insulating first region(s) and an electro-conductive second region. The elastic layer has an elastic modulus of 0.5 MPa or more to 3.0 MPa or less and the coating layer has an elastic modulus of 5.0 MPa or more to 100.0 MPa or less as measured in an environment of a temperature of 30° C. and a relative humidity of 80%.

Abstract: First correction data for use in a first printing mode is generated by image density measurement in the first printing mode, and second correction data for use in a second printing mode, which is different from the first printing mode in peripheral speed ratio of a developing roller to a photosensitive drum, is generated by image density measurement in the second printing mode. First processing for generating first and second correction data for the first and second printing modes, respectively, by density measurement, or second processing for generating the first correction data by density measurement and generating the second correction data using the generated first correction data and a difference in image density between the first printing mode and the second printing mode is executed. The first processing is executed when a predetermined condition is satisfied.

Abstract: A developer container unit to be mounted in an image forming apparatus that performs an image forming operation comprises a frame and a sealing unit. The frame is provided with a developer containing chamber containing developer and an opening for discharging the developer from the developer containing chamber. The sealing unit includes a shaft member rotatable about a rotational axis and a sealing portion attached to the shaft member and compressed by the shaft member and the frame to seal the opening. The sealing unit is rotatable to a close position at which the sealing portion seals the opening, a first open position at which the opening is open, and a second open position at which the opening is open. The sealing unit agitates the developer by executing a reciprocating motion between the first and second open positions during the image forming operation.

Abstract: A developer accommodating unit includes a frame that has an opening for discharging a developer, and a sealing unit that has a sealing portion for sealing the opening, in which a state of the sealing unit is capable of changing from a first state in which the sealing portion seals the opening to a second state in which the opening is opened. A tip of a first part is positioned on a downstream side of the base of the first part in a first direction if the sealing unit is in the first state, and the first part is deformed such that the tip of the first part is positioned on an upstream side of the base of the first part in the first direction if the state of the sealing unit changes from the first state to the second state.

Abstract: A conveyance screw includes a shaft member, a first blade and a second blade each formed helically on a circumference of the shaft member. The first blade includes a first wide portion and a first narrow portion both located within an area in the axial direction where both of the first blade and the second blade are provided. The first wide portion is protruded radially outward from the shaft member to a first outer diameter. The first narrow portion is formed continuously with the first wide portion in a winding direction of the first blade around the shaft member, and is protruded radially outward from the shaft member to a second outer diameter that is smaller than the first outer diameter.

Abstract: A binary ink developer (BID) assembly for a liquid electrophotography (LEP) printing device can include a developer roller having an electrically insulating exterior coating that receives ink from an ink supply and transfers the received ink to a photoconductive imaging cylinder in accordance with an electrostatic image on the imaging cylinder. A charge-specified boundary condition can exist at the boundary between the exterior coating and the ink. Electrically conductive ink may not be transferred to the imaging cylinder at background portions of the electrostatic image.

Abstract: Measures for controlling an engagement force between a photo imaging plate and a developer roller in a printing device are described. A motor is operated to generate rotational motion. The rotational motion is translated into linear motion. The linear motion causes an adjustment to the engagement force between the developer roller and the photo imaging plate. A characteristic of the motor is monitored. The motor is controlled on the basis of the monitored characteristic in order to maintain a desired engagement force between the developer roller and the photo imaging plate.

Abstract: In an example, a method includes providing a print agent comprising chargeable particles in a carrier fluid to a print agent concentration apparatus (600). The print agent may be passed between a conveyor (604) and an electrode (602), and a potential applied to cause the chargeable particles to be attracted to the conveyor and to form a concentrated layer of particles on the conveyor. A proportion of the carrier fluid may be separated from the concentrated layer of particles and a thickness of a remaining layer on the conveyor may be measured. It may be determined if the measured thickness of the layer meets predetermined criteria and, if not, an operational parameter of the print agent concentration apparatus may be adjusted.

Abstract: A constitution in which a transfer unit 102 is inclined and in which leakage of a liquid developer can be suppressed is provided. The transfer unit 102 includes an intermediary transfer belt 10 onto which the liquid developer is transferred and which rotates. A supporting unit 104 is capable of holding the transfer unit 102 at a first position. A rotation holding portion is capable of holding the transfer unit 102 at a second position inclined from the first position relative to said supporting unit 104. A cleaning roller 15 is capable of removing the liquid developer on the intermediary transfer belt 10. A cleaning container 16 is supported by the supporting unit 104 irrespective of rotation of the transfer unit 102 and is capable of collecting the liquid developer removed by the cleaning roller 15.

Abstract: An image forming apparatus includes a motor, a unit including first and second rotatable members, an input gear, a first transmission path, a second transmission path, a rotation detecting portion, and a controller. The a controller executes an operation in an abnormality output mode for outputting abnormality information, wherein if the first rotatable member is not rotated despite rotation of the motor in the first direction, the controller inputting a signal for rotating the motor in the second direction, and (1) if the second rotatable member is not rotated, the controller outputs abnormality information on the motor or a drive transmission path for transmitting the driving force from the motor to the input gear, and (2) if the second rotatable member is rotated, the controller outputs abnormality information on the unit.

Abstract: A position of a stretch roller, where the stretch roller stretches an intermediate transfer belt upstream of and adjacently to a most upstream primary transfer roller in a rotational direction of the intermediate transfer belt, is apart from a photosensitive drum with respect to a primary transfer surface. Further, the most upstream primary transfer roller is larger in outside diameter than other primary transfer rollers, and the most upstream primary transfer roller has a transfer pressure larger than the transfer pressure of the other primary transfer rollers. This arrangement inhibits the most upstream primary transfer roller from deforming and a defective transfer due to waving of the intermediate transfer belt, while inhibiting an increase in size of an apparatus.