Abstract: An under-screen optical fingerprint recognition system, a backlight module, a display screen, and an electronic device are provided. The under-screen optical fingerprint recognition system is applied to a display screen with a backlight module, the under-screen optical fingerprint recognition system includes a fingerprint recognition chip and a first light source, the wavelength of fingerprint detecting light emitted by the first light source is within a preset wavelength range, the fingerprint recognition chip is arranged below the backlight module for receiving light carrying fingerprint information that passes through the backlight module and has a diffusivity smaller than or equal to a set threshold, and the light carrying fingerprint information is reflected by a finger from the light emitted by the first light source. The system may be applied to a display screen with a backlight module to meet the requirements of the LCD screen for under-screen fingerprint recognition.

Abstract: A display apparatus includes: a backlight assembly including a light source; and at least one functional material; wherein: the light source is configured to emit a white light; and the at least one functional material is configured to absorb light in at least one of a range of 480 nm-520 nm or a range of 575 nm-600 nm to thereby reshape the white light to have blue, red, and green peaks.

Abstract: A system comprising a display, a display cover, a plurality of sensors disposed between the display and the display cover and a lighting control system coupled to the display and the plurality of sensors, the lighting control system configured to receive one or more signals from the plurality of sensors and to reduce a backlight level of a subgroup of lighting elements associated with the one or more sensors associated with the one or more signals, wherein the subgroup of lighting elements is one of a plurality of subgroups of lighting elements of the display.

Abstract: The disclosure describes asymmetric turning films (ATFs) that may be used in conjunction with multiple light sources in a liquid crystal display assembly to provide multiple different characteristic output distributions of light. In some examples, the ATFs include a structured surface defining a plurality of microstructures having two or more faces with each face configured to reflect light in different directions. The microstructure may define a microstructure axis and an angle gradient characterizing the rotation of the microstructure axis across the structured surface of the ATF.

Abstract: The present disclosure provides a mask assembly, a mask apparatus and a mask control method, pertaining to the field of mask technology. The mask assembly includes a mask plate and a controller. The mask plate includes a plurality of mask units. The mask unit has a light transmission state and a light interruption state. The controller is used to control the mask unit to switch between the light transmission state and the light interruption state to adjust a light transmission region of the mask plate. The present disclosure solves the problem that mask efficiency is low. The present disclosure is used to mask film layers.

Abstract: A liquid crystal display device includes a plurality of gate lines and data lines that intersect each other on a substrate and define a plurality of sub-pixels, a plurality of common electrodes and pixel electrodes that are alternately disposed within the sub-pixels, a first thin film transistor comprising a first gate electrode connected to the gate line, a first source electrode connected to the data line, and a first drain electrode connected to the pixel electrode, a first common line applied with a first common voltage, and a second thin film transistor comprising a second gate electrode connected to the gate line, a second source electrode connected to the first common line, and a second drain electrode connected to the common electrode.

Abstract: A method of controlling tint of a tintable window to account for occupant comfort in a room of a building. The tintable window is between the interior and exterior of the building. The method predicts a tint level for the tintable window at a future time based on lighting received through the tintable window into the room at the future time and space type in the room. The method also provides instructions over a network to transition tint of the tintable window to the tint level.

Abstract: An electro-optic display comprising at least two separate layers of electro-optic material, with one of these layers being capable of displaying at least one optical state which cannot be displayed by the other layer. The display is driven by a single set of electrodes between which both layers are sandwiched, the two layers being controllable at least partially independently of one another. Another form of the invention uses three different types of particles within a single electrophoretic layer, with the three types of particles being arranged to shutter independently of one another.

Abstract: A writing apparatus including a first electrode, a layer of piezoelectric material; and a layer of electrophoretic material positioned between the first electrode and the layer of piezoelectric material, wherein stress on the layer of piezoelectric material results in optical changes in the layer of electrophoretic material.

Abstract: A fake nail including an electronic paper as a display member and having a simple structure, which can easily update a display, is provided. A fake nail 1 including the electronic paper as the display member is mounted on a nail of a user using a fixing member 2 such as an electrically-conductive binding material and the like. In a state wherein the fake nail 1 is mounted, a display update device 3 generates an ion wind, and the generated ion wind is blown onto the fake nail 1. By electrical charging caused by the ion wind, an electric potential is applied to the electronic paper contained in the fake nail 1, and the display of the electronic paper is updated to a color according to the electric potential.

Abstract: A photonic waveguide assembly has a photonic waveguide for transmission of light or a substrate, and an optical refractive index modulator positioned about said photonic waveguide to modulate the phase or amplitude, or combination thereof of the light traveling in the photonic waveguide, or transmitting through or reflecting of the substrate.

Abstract: In an embodiment, a phase shifter includes: a light input end; a light output end; a p-type semiconductor material, and an n-type semiconductor material contacting the p-type semiconductor material along a boundary area, wherein the boundary area is greater than a length from the light input end to the light output end multiplied by a core width of the phase shifter.

Abstract: An image display device includes a flat panel display, a lens array layer, and a microstructure dynamic optical layer. The lens array layer is located at a side of a display surface of the flat panel display, and can adjust light field. The microstructure dynamic optical layer is located at the side of the display surface of the flat panel display, and can be switched to have a microstructure function or not to have the microstructure function. When being switched to have the microstructure function, the microstructure dynamic optical layer can modulate a direction of light emitted from the flat panel display. Accordingly, the image display device can display a stereo image floating in mid-air, and enables a user to see the stereo image at an oblique viewing angle. The image display device can be used in different ways according to practical applications.

Abstract: There is provided a projection display device comprising: a light source, an SBG device comprising a multiplicity of separately SBG elements sandwich between transparent substrate to which transparent electrodes have been applied. The substrates function as a light guide. A least one transparent electrode comprises plurality of independently switchable transparent electrodes elements, each electrode element substantially overlaying a unique SBG element. Each SBG element encodes image information to be projected on an image surface. Light coupled into the light guide, undergoes total internal reflection until diffracted out to the light guide by an activated SBG element. The SBG diffracts light out of the light guide to form an image region on an image surface when subjected to an applied voltage via said transparent electrodes.

Abstract: Provided herein are methods of electrically controlling photons using an atomically thin transition metal dichalcogenide layer. Further, provided are photonic devices and tunable waveguides including a transition metal dichalcogenide layer. The methods may include applying an electrical field to the transition metal dichalcogenide layer. The photonic devices and tunable waveguides may further include a first electrode, a second electrode, and an insulation layer. The insulation layer may extend between the first electrode and the transition metal dichalcogenide layer thereby electrically isolating the first electrode from the transition metal dichalcogenide layer.

Abstract: A light field generation system includes a two dimensional emitter array for projecting light and a directionally-sensitive optical element in front of the emitter array but before a directional diffuser. Certain classes of emitters are intended to project information principally along one axis (e.g. amplitude modulated in the horizontal plane, i.e. so that each eye sees a potentially different image) and are the basis of horizontal-parallax-only (HPO) displays. Examples include surface acoustic wave (SAW) modulators, such as edge-emitting or surface-emitting modulators. They often project undesired or stray light along directions along a different axis (e.g. vertically) and the diffuser will also spread the visibility of the stray light field components. Thus, the directionally-sensitive optical element will improve contrast in this scenario.

Abstract: A nonlinear crystal comprising a first curved face and an opposing second curved face is described. The first and second curved faces are arranged to provide the nonlinear crystal with rotational symmetry about at least one axis of the nonlinear crystal. The nonlinear crystal allows for frequency tuning of a generated optical field that is generated by propagating a fundamental optical field through the nonlinear crystal by rotation of the nonlinear crystal about an axis of rotation without any significant, or minimal, deviation being introduced to the generated optical field.

Abstract: An imaging device, having a substrate for mounting an imaging portion; a lens barrel for holding a lens group; a shield plate covering the vicinity of the substrate; a case disposed so as to cover the lens barrel, the substrate, and the shield plate; and a coupling, for connecting the substrate and another member, connected electrically to the ground electropotential, and a biasing portion that contacts the coupling so as to receive a biasing force in the optical axial direction.

Abstract: Disclosed is a system and method for mounting video equipment to an object and providing vibration dampening.

Abstract: Provided is an image projector having satisfactory display performance. The image projector includes an optical device group including a light source, a container accommodating the optical device group, and a seal attached to the container to cover the optical device group and sealing in the optical device group.

Abstract: The PET-film-bonded type transparent anti-UV projection screen includes a PET film layer, an adhesive layer and a transparent supporting layer which are sequentially stacked from top to bottom. The PET film layer is prepared by uniformly mixing PET resin, an antioxidant, a light stabilizer and a nanoparticle dispersion in a molten state, pre-crystallizing and drying the mixture, and then extruding, stretching and molding the mixture. The production method for the PET-film-bonded type transparent anti-UV projection screen includes preparing a nanoparticle dispersion; preparing a PET film; and performing coating and bonding the film.

Abstract: A light source module of a photo printer includes a first micro light source, a second micro light source, a rod lens array and a microlens. The first micro light source emits a first light beam. The second micro light source emits a second light beam. The rod lens array is arranged between the first micro light source, the second micro light source and a film paper. The microlens is arranged between the first micro light source, the second micro light source and the rod lens array. The microlens is used for converging the projection angles of the first light beams and the second light beam. The microlens has an optical axis. The second micro light source is arranged along the optical axis. The first micro light source is arranged beside a first side of the optical axis.

Abstract: Embodiments described herein relate to apparatus and methods for removing one or more films from a photomask to create a black border and one or more pellicle anchor areas thereon. A photomask substrate is exposed by removing the one or more films in the black border and pellicle anchor areas. The black border prevents a pattern on the photomask from overlapping a pattern on a substrate being processed. To create the black border and pellicle anchor areas, a laser beam is projected through a lens and focused on a surface of the films. The films are ablated by the laser beam without damaging the photomask substrate.

Abstract: Fabricating a photomask includes forming a protection layer over a substrate. A plurality of multilayers of reflecting films are formed over the protection layer. A capping layer is formed over the plurality of multilayers. An absorption layer is formed over capping layer. A first photoresist layer is formed over portions of absorption layer. Portions of the first photoresist layer and absorption layer are patterned, forming first openings in absorption layer. The first openings expose portions of the capping layer. Remaining portions of first photoresist layer are removed and a second photoresist layer is formed over portions of absorption layer. The second photoresist layer covers at least the first openings. Portions of the absorption layer and capping layer and plurality of multilayer of reflecting films not covered by the second photoresist layer are patterned, forming second openings. The second openings expose portions of protection layer and second photoresist layer is removed.

Abstract: A method including steps as follows is provided. A primary droplet and a satellite droplet are shot toward an excitation zone. The satellite droplet is deflected away from the excitation zone. A laser beam is emitted toward the excitation zone to excite the primary droplet to generate an extreme ultraviolet (EUV) light. The EUV light is directed onto a reticle using a first optical reflector, such that the EUV light is imparted with a pattern of the reticle. The EUV light with the pattern is directed onto a wafer using a second optical reflector.

Abstract: A method includes clamping a mask on a mask stage, in which the mask includes a multilayered magnetic film; performing a first lithography process by using the mask; moving the mask away from the mask stage; and determining whether a surface condition of a surface layer of the multilayered thin film is acceptable; and peeling the surface layer of the multilayered magnetic film from the multilayered magnetic film when the surface condition of the surface layer is determined as unacceptable.

Abstract: A photomask includes a translucent substrate and at least one main feature. The translucent substrate has a recessed region recessed from a first surface of the translucent substrate. The at least one main feature is disposed on the translucent substrate, and protrudes from the first surface of the translucent substrate.

Abstract: A method for cleaning a reticle includes rotating the reticle, providing a cleaning liquid to clean the reticle, detecting a static charge value on the reticle during rotating the reticle, and reducing static charges on the reticle in response to the detected static charge value. Hence, the electrostatic discharge (ESD) occurred to the reticle can be prevented.

Abstract: Provided is a process for controlling the critical dimension uniformity of ordered films of block copolymers on a nanometric scale. The invention also relates to the compositions used for controlling the critical dimension uniformity of ordered films of block copolymers and to the resulting ordered films that can be used in particular as masks in the lithography field.

Abstract: Disclosed is a salt represented by formula (I): wherein, in formula (I), Q1 and Q2 each independently represent a fluorine atom or the like, R1 and R2 each independently represent a hydrogen atom or the like, Z represents an integer of 0 to 6, X1 represents *—CO—O— or the like, where * represents a bonding site to C(R1)(R2) or C(Q1)(Q2), L1 represents a single bond or a saturated hydrocarbon group, and —CH2— included in the saturated hydrocarbon group may be replaced by —O—, —S—, —SO2— or —CO—, A1 represents a divalent alicyclic hydrocarbon group which may have a substituent, Ra represents a cyclic hydrocarbon group which may have a substituent, and Z+ represents an organic cation.

Abstract: A resist composition comprising one or more tannin compounds selected from the group consisting of a tannin comprising at least one crosslinking reactive group in the structure and a derivative thereof, and a resin obtained using the tannin or the derivative as a monomer.

Abstract: A method of simulating a resist pattern according to an exemplary embodiment includes a step (A) of calculating a latent image of a concentration of an active species in a resist film that has been radiated by a radioactive ray along a target pattern with respect to a radiation position of the radioactive ray, a step (B) of calculating a change rate of the concentration with respect to the radiation position at an edge of the target pattern on the basis of the latent image, a step (C) of calculating a probabilistic variation at the edge of the target pattern, and a step (D) of calculating a variation in pattern edge roughness from the change rate of the concentration and the probabilistic variation.

Abstract: A method is provided. The method includes steps as follows. EUV light is generated. A collector is used to gather the EUV light onto a first optical reflector. The first optical reflector is used to reflect the EUV light to a reticle, so as to impart the EUV light with a pattern. A second optical reflector is used to reflect the EUV light with the pattern onto a wafer. The first optical reflector is rotated.

Abstract: A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of only three optical components disposed sequentially to transfer EUV radiation incident the first optical component onto the pattern-source. The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes a projection optic sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

Abstract: A display substrate, a method for preparing the same and a display device are provided. The method for preparing the display substrate includes: providing a base substrate, in which the base substrate includes a first region and a second region; forming a first structure in the first region using a first mask and a first photoresist; forming a functional material layer at a side, which is away from the base substrate, of the first structure; and patterning the functional material layer using a second mask and the first mask to form a functional layer in the second region.

Abstract: An extreme ultraviolet lithography (EUVL) method includes providing at least two phase-shifting mask areas having a same pattern. A resist layer is formed over a substrate. An optimum exposure dose of the resist layer is determined, and a latent image is formed on a same area of the resist layer by a multiple exposure process. The multiple exposure process includes a plurality of exposure processes and each of the plurality of exposure processes uses a different phase-shifting mask area from the at least two phase-shifting mask areas having a same pattern.

Abstract: A lithography method includes outputting, by an optical alignment sensor in a scanner system, a first signal in response to a light signal received by the optical alignment sensor; controlling, by a controller, a trajectory of a droplet in a light source system according to the first signal feedback to the controller; and irradiating the droplet by a drive laser to output a light beam from the light source system to the scanner system.

Abstract: The present disclosure provides resist rinse solutions and corresponding lithography techniques that achieve high pattern structural integrity for advanced technology nodes. An example lithography method includes forming a resist layer over a workpiece, exposing the resist layer to radiation, developing the exposed resist layer using a developer that removes an unexposed portion of the exposed resist layer, thereby forming a patterned resist layer, and rinsing the patterned resist layer using a rinse solution. The developer is an organic solution, and the rinse solution includes water.

Abstract: A method for adhering a reticle onto a top surface of a chuck is provided in accordance with some embodiments of the present disclosure. The method includes contacting a plurality of fibers on the top surface of the chuck with the reticle. The reticle is slid relative to the top surface of the chuck along a first direction to increase a contact area between the fibers and the reticle, such that the reticle is adhered to the fibers.

Abstract: The present invention relates to a lithographic apparatus, comprising: a primary frame (10) which is provided with a functional unit (11, 12, 14), a secondary frame (20), a primary frame support (30), which is adapted to support the primary frame onto the secondary frame, a flexible utility connection (40), adapted to connect the functional unit to an auxiliary system (51, 52, 53), a vibration isolation body (60) having a body mass, which is moveably connected to the secondary frame by a flexible passive body support (61) having a body support stiffness, wherein the flexible utility connection is fixed to the vibration isolation body at a distance from the primary frame.

Abstract: Systems and methods are provided that combine an amplitude modulation SLM with a phase modulating SLM in the same optical illumination system. The combination of the amplitude modulation SLM and the phase modulation SLM allows the optical illumination to compensate for the limitations of amplitude modulation SLM by using phase modulating SLM and conversely to compensate for the limitations of phase modulation SLM by using amplitude modulating SLM.

Abstract: A device is disclosed that includes a master controller, a process chamber, a local controller, a switch, and a data storage. The process chamber is configured to generate a data according to a EUV light generation process. The local controller is coupled to the master controller and configured to control the process chamber. The switch is coupled between the master controller and the local controller, wherein the switch is configured to provide paths for the local controller to communicate with the master controller. The data storage directly connected to the local controller and configured to store the data. The local controller communicates directly with the data storage.

Abstract: An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. An energy detector is configured to measure a variation in EUV energy generated when the target droplets are converted to plasma. A feedback controller is configured to adjust parameters of the droplet generator and/or the excitation laser based on the variation in EUV energy.

Abstract: An extreme ultraviolet (EUV) lithography system includes an extreme ultraviolet (EUV) radiation source to emit EUV radiation, a collector for collecting the EUV radiation and focusing the EUV radiation, a reticle stage for supporting a reticle including a pellicle for exposure to the EUV radiation, and at least one sensor configured to detect particles generated due to breakage of the pellicle.

Abstract: A method includes operation below. A first task is performed by a control circuit according to a first request from a processor. A second request, for triggering a second task to be performed by the control circuit, is received by an interface circuit. A first data rate, for transmitting first data generated in the first task, is calculated by the interface circuit. A second data rate, for transmitting second data to be generated in the second task, is estimated by the interface circuit. The second task other than the first task is performed by the control circuit. The first data and the second data are transmitted from the control circuit to the processor in a condition that a sum of the first data rate and the second data rate complies with a bandwidth of a data switch coupled between the control circuit and the processor.

Abstract: A method for handling a mask is provided in accordance with some embodiments of the present disclosure. The method includes determining whether a particle is present on a contact surface of a mask. The mask is cleaned to remove the particle from the contact surface of the mask if the particle is present on the contact surface. The mask is disposed on a chuck after cleaning the mask, wherein the contact surface of the mask contacts the chuck when the mask is disposed on the chuck. A lithography process is performed using the mask disposed on the chuck.

Abstract: A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength-dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence R(?,?,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths ?; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.

Abstract: A metrology apparatus for determining a parameter of interest of a structure formed by a lithographic process on a substrate, the metrology apparatus comprising: an illuminator for illuminating the structure; a lens for collecting at least a portion of radiation diffracted from the structure; and an image sensor for receiving and obtaining a recording of the collected diffracted radiation; wherein the illuminator comprises at least one optical fiber for illuminating the structure directly.

Abstract: A method includes forming a first overlay feature in a first dielectric layer over a first wafer; forming a second dielectric layer over the first overlay feature and the first dielectric layer; forming an opening in the second dielectric layer by at least using an exposure tool; forming a second overlay feature in the opening of the second dielectric layer, such that a first edge of the first overlay feature is covered by the second dielectric layer; directing an electron beam to the first and second overlay features and the second dielectric layer; detecting the electron beam reflected from the first overlay feature through the second dielectric layer and from the second overlay feature by a detector; obtaining, by a controller, an overlay error between the first overlay feature and the second overlay feature according to the reflected electron beam electrically connected to the detector.

Abstract: A droplet catcher includes a tube main body and baffles arranged along a length direction of the tube main body.