Abstract: A substrate rotating apparatus comprises a main rotation mechanism, an auxiliary rotation mechanism, and a guide structure. The main rotation mechanism rotates around a first rotation shaft. The main rotation mechanism comprises the auxiliary rotation mechanism. The auxiliary rotation mechanism revolves about the first rotation shaft in accordance of rotation of the main rotation mechanism, and rotates around a second rotation shaft. The second rotation shaft is displaced in a radial direction with respect to the first rotation shaft. The guide structure has a contact surface extending in a circumferential direction with respect to the first rotation shaft. The guide structure controls displacement of the second rotation shaft in the radial direction, and causes the auxiliary rotation mechanism to perform the revolving motion in an orbit along the contact surface when the contact surface and the auxiliary rotation mechanism are in contact with each other.

Abstract: A fixture for depositing a gradient coating includes a single opening on a front side of the fixture, such that the fixture is configured to house a substrate during deposition of a coating and configured to surround the substrate on all sides of the substrate except for a single front side of the substrate, and wherein the fixture is configured to restrict egress of coating material to the substrate from all directions except through the single opening. The fixture includes a cavity such that the fixture is configured to leave an air gap between a lid surface of the fixture and the major top side of the substrate, and a cavity depth, measured from the front side of the fixture to a back of the cavity, is greater than a gap opening distance, measured from the lid surface at the opening to the major top side of the substrate.

Abstract: A composition, and method for using the composition, in the fabrication of an electronic device, and particularly for depositing a film comprising silicon and boron having low dielectric constant (<6.0) and high oxygen ash resistance. The film includes silicon and boron and may be, without limitation, a silicon borocarboxide, a silicon borocarbonitride, a silicon boroxide, or a silicon borocarboxynitride.

Abstract: Described herein is a technique capable of stabilizing a supply flow rate of a vaporized gas. According to one aspect of the technique, there is provided a vaporizer including: a vessel in which a source is stored; a first heater capable of heating the source by immersion into the source stored in the vessel; a second heater capable of heating the vessel; a first temperature sensor capable of measuring a temperature of the source by immersion into the source; a second temperature sensor capable of measuring a temperature of the vessel; and a controller capable of controlling the first heater based on the temperature measured by the first temperature sensor and controlling the second heater based on the temperature measured by the second temperature sensor.

Abstract: A substrate processing apparatus according to an aspect of the present disclosure is an apparatus that deposits a film on a substrate disposed in a processing chamber, and includes a process gas supply configured to supply, into the processing chamber, a process gas including a source gas and a carrier gas that carries the source gas, a vacuum pump configured to exhaust an interior of the processing chamber, and a purge gas supply configured to supply a purge gas into the vacuum pump. The purge gas includes a first gas that is identical to the carrier gas.

Abstract: The current disclosure relates to the manufacture of semiconductor devices, specifically to methods of forming vanadium metal on a substrate. The methods comprise providing a substrate in a reaction chamber, providing a vanadium precursor to the reaction chamber in a vapor phase and providing a reducing agent to the reaction chamber in a vapor phase to form vanadium metal on the substrate. The disclosure further relates to structures and devices formed by the methods, as well as to a deposition assembly.

Abstract: A defect-reducing coating method is disclosed, which is characterized by making the coating surface of a sample face the bottom of the coating chamber, so that the sticking particles on side walls of the coating chamber will not fall on the coating surface of the sample during the coating process, thereby a smooth coating layer can be formed on the coating surface of the sample after the coating process is finished.

Abstract: A substrate processing system for treating a substrate includes N manifolds, Y groups of injector assemblies, and a dose controller, where Y and N are integers greater than one. Each of the Y groups of injector assemblies includes N injector assemblies located in a processing chamber. Each of the N injector assemblies in each group of injector assemblies is in fluid communication with one of the N manifolds, respectively, and includes a valve including an inlet and an outlet.

Abstract: Described herein are compositions and methods of forming a dielectric film comprising silicon and carbon onto at least a surface of a substrate, the method comprising introducing into a reactor at least one silacycloalkane precursor selected from the group consisting of compounds represented by the structure of Formula IA and compounds represented by the structure of Formula IB: as defined herein.

Abstract: Embodiments of part coating reactors are provided herein. In some embodiments, a part coating reactor includes a lid assembly, comprising: a body that includes a central region and a peripheral region, wherein the body includes a central opening in the central region, a first annular heater groove disposed radially outward of the central opening, and a second annular heater groove disposed radially outward of the first annular heater groove, wherein the peripheral region includes a plurality of vertical slots that extend from an upper surface of the body, and wherein a lower surface of the body includes an annular alignment groove; and a blocker plate including a substantially flat plate having a plurality of holes disposed therethrough and an annular wall extending above and below the flat plate, wherein an upper surface of the annular wall is disposed in the annular alignment groove of the body.

Abstract: An edge ring includes a ring body having an axis parallel to a first direction; and a plurality of protrusions provided at an inner side surface of the ring body and protruding toward the axis, the plurality of protrusions being spaced apart from each other in a circumference direction of the edge ring, wherein a first distance between the axis and a first point on the inner side surface of the ring body between two adjacent protrusions of the plurality of protrusions is larger than a second distance between the axis and a second point on the inner side surface of the ring body at which a protrusion of the plurality of protrusions is provided.

Abstract: A deposition apparatus includes a chamber providing an inner space, a gate disposed on one side of the chamber and opening and closing the chamber to allow a substrate to be loaded and unloaded therethrough, and a susceptor including one surface on which the substrate is seated. The susceptor includes a susceptor body including a first region and a second region disposed in a first direction farther away from the gate than the first region, a first hot-wire arranged in a first pattern in the first region, and a second hot-wire arranged in a second pattern in the first and second regions. The first and second hot-wires is asymmetric with respect to a second direction crossing the center of the susceptor body in a plan view and orthogonal to the first direction, and the first and second hot-wires may be controlled independently.

Abstract: According to one aspect of the present disclosure, there is provided a substrate processing method including: forming a film containing a predetermined element on a substrate by performing a first cycle a first predetermined number of times, the first cycle including: forming a first layer containing the predetermined element by performing a second cycle a second predetermined number of times, wherein a surface of the first layer is halogen-terminated and wherein the second cycle includes: supplying a first gas containing the predetermined element and a halogen element to the substrate; and removing the first gas; and forming a second layer containing the predetermined element by supplying a second gas containing the predetermined element to the substrate.

Abstract: Provided is a method of supplying a liquid raw material to a gas supply device. The gas supply device includes: a storage tank that stores the liquid raw material; a heating unit that heats the liquid raw material to generate a raw material gas; a level detecting unit that detects a liquid surface level of the liquid raw material stored in the storage tank; a gas inlet and a gas outlet provided in the storage tank; and a raw material inlet provided in the storage tank. The method includes: determining whether the liquid surface level of the liquid raw material is equal to or lower than a supply target level; and repeating supply of a specified amount of liquid raw material to the storage tank a specified number of times when the liquid surface level of the liquid raw material is equal to or lower than the supply target level.

Abstract: A technique includes at least one chamber including a process chamber that is capable of processing a substrate and a shower head arranged in an upstream of the process chamber; a gas supplier that is capable of supplying a gas into the process chamber via the shower head; a first exhaust pipe communicating with the shower head; a second exhaust pipe communicating with the process chamber; a first exhaust controller installed in the first exhaust pipe; a first heater installed in the first exhaust pipe; and a controller configured to be capable of: (a) controlling the gas supplier so as to supply a processing gas as the gas to the shower head, and (b) controlling the gas supplier so as to supply a non-processing gas as the gas to the shower head.

Abstract: A method for preparing antibacterial stainless steel by surface alloying includes the steps of coating an infiltration promoter layer on a stainless steel surface, coating an antibacterial metal layer on a surface of the infiltration promoter layer, and performing heat treatment of the stainless steel to diffuse an antibacterial metal into the stainless steel. This method can be applied to various types of stainless steel, and the antibacterial metal can be diffused and quenched into the stainless steel, such that the finally formed surface of the stainless steel has an antibacterial alloy layer with a specific thickness to provide better corrosion resistance and antibacterial ability without changing the advantages and properties of the antibacterial metal or stainless steel substrate, and the thickness and concentration of the antibacterial metal layer, and the parameters for heat treatment can be adjusted to control the chemical composition and thickness of the antibacterial alloy layer.

Abstract: The present application provides a preparation method for a core-shell structured tungsten/gadolinium oxide functional fiber for X and ? ray protection, comprising: first preparing a core-shell structured tungsten/gadolinium oxide powder; preparing a W@Gd2O3/PP blended melt from the powder; and preparing a W@Gd2O3/PP composite fiber from the blended melt. The core-shell structured tungsten/gadolinium oxide functional fiber prepared by the method can play a role in synergistic protection in the aspect of radiation protection, eliminate a weak protection area, and effectively absorb secondary radiation generated by radiation. Secondly, the prepared functional fiber has the characteristics of no lead and light weight, and has good application prospects in the aspect of X and ? ray radiation protection.

Abstract: The invention relates to a steel substrate coated on at least one of its faces with a metallic coating based on zinc or its alloys wherein the metallic coating is itself coated with a conversion layer comprising: zincsulphate hydrate, aluminium in an amount up to 14 mg·m?2, wherein the conversion layer comprises neither zinc hydroxysulphate, nor free water molecules nor any compounds having free hydroxyl groups, the surface density of sulphur in the conversion layer being greater than or equal to 5.0 mg/m2. The invention also relates to the corresponding treatment method.

Abstract: A method of forming a protective coating on an interconnect for an electrochemical device stack includes providing a powder on the interconnect and laser sintering the powder.

Abstract: A component for an electrochemical device, the component including: a metallic substrate; and a plurality of particles bonded to a surface of the substrate by a metallurgical bond, wherein the particles include a metal, carbon, or a combination thereof, wherein the metallurgical bond is between the particles and the substrate, wherein a total projected area of the metallurgical bond is less than 90% of a total projected area of the substrate, and wherein the metallurgical bond has a composition which is a combination of a composition of the metallic substrate and a composition of the particle, a reaction product of the metallic substrate and the particle, or a combination thereof.

Abstract: The invention relates to a method for producing a coated body, with a substrate and a coating arranged on the substrate, which coating comprises at least one base layer applied to the substrate and at least one metal carbide-containing layer arranged over the base layer, which layers are applied by means of magnetron sputtering. Furthermore, the invention relates to a coated body produced according to the method.

Abstract: To treat a corner of an etched metal machined article by a method other than polishing. A method includes: forming a protective layer 200 on each of a front surface 120 and a back surface 140 of a metal plate 100 while a side surface 160 of the metal plate 100 is exposed; cutting out a precursor 300 of a component to be manufactured from the metal plate 100 on which the protective layer 200 is formed; etching the precursor 300 without removing the protective layer 200; chamfering a corner between the front surface 120 and the side surface 160 and a corner between the back surface 140 and the side surface 160 of the etched precursor 300 by an electrical or chemical treatment; and removing the protective layer 200 from the chamfered precursor 300.

Abstract: A grounding strap for a process chamber includes a core layer. The grounding strap further includes an outer layer. The outer layer includes at least 99% aluminum.

Abstract: Cathodic protection of steel in a concrete column in sea water is simplified by providing a pre-assembled unit including a jacket to surround the column carrying a bulk sacrificial anode outside the jacket and optionally an inner sacrificial anode of a zinc mesh or strips on an inside surface. The jacket can also include a pre-assembled junction box and couplings to connect to the steel. The jacket is attached to the surface of the column at the water line so that the bulk anode is located below the surface of the water and supported relative to the concrete surface solely by the connection of the bulk anode to the covering layer. The bulk anode can be formed of aluminum so as to be less toxic in sea water.

Abstract: Systems and methods for making a reaction product using carbon dioxide produced at a bioprocessing facility. The bioprocessing facility involves fermenting a fermentable composition to generate at least one target biochemical and carbon dioxide. At least a portion of the carbon dioxide is reacted with at least one reactant to form at least one reaction product.

Abstract: The present water electrolyzer has a stack structure with a cell and a separator stacked alternately. The separator includes a metal plate and a flow path member. The metal plate has a distribution hole. The flow path member is located between a base layer of the cell and the metal plate in a stacking direction. The flow path member surrounds the distribution hole in a ring-like shape when viewed in the stacking direction. The flow path member includes a flow path through which a gas diffusion layer of the cell and the distribution hole communicate with each other. As a result, it becomes possible to cause gas or water to flow between the gas diffusion layer and the distribution hole through the flow path formed at the flow path member. This achieves reduction in the number of the metal plates to be used as the separator.

Abstract: A water electrolysis system including: a water electrolysis cell; a water supply device that supplies water to an oxygen electrode of the water electrolysis cell; a water supply channel that connects the water electrolysis cell and the water supply device and through which the water supplied from the water supply device to the oxygen electrode flows; a gas-liquid separator that separates the water and a gaseous component discharged from the oxygen electrode; a water discharge channel that connects the water electrolysis cell and the gas-liquid separator and through which the water and a gaseous component discharged from the oxygen electrode flow; and a recombiner disposed between the water electrolysis cell and the gas-liquid separator in the water discharge channel. The recombiner includes a recombination catalyst that reacts hydrogen and oxygen, and the water electrolysis cell and the recombiner are electrically insulated from each other.

Abstract: The present invention relates to a hydrogen-oxygen mixture gas producing and supplying device that includes: a hydrogen-oxygen mixture gas generation water tank to store a given amount of water; a top cover to supply the water to the hydrogen-oxygen mixture gas generation water tank; a bottom cover mounted on bottom of the hydrogen-oxygen mixture gas generation water tank and a bottom sealing plate for sealing the bottom of the extension cylinder to form an installation space; a hydrogen-oxygen mixture gas producer to produce hydrogen (H2) and oxygen (O2); and a water level control sensor to notify a user of the shortage of water.

Abstract: A chlorinator includes an electrode assembly and a housing. The housing includes a first water flow opening, a second water flow opening, an electrolysis chamber for accommodating the electrode assembly, a sampling chamber for selectively enabling sampling of water entering the housing in operation of the chlorinator, and a flow stream separator. The flow stream separator includes a partition wall axially extending between a first partition edge and a second partition edge. The partition wall separates the housing internal volume into a main channel and an auxiliary channel. The main channel extends axially between the first partition edge and the second partition edge, and wholly accommodates therein the electrolysis chamber on a first side of the partition wall. The auxiliary channel extends axially between the first partition edge and the second partition edge and wholly accommodates therein the sampling chamber on a second side of the partition wall.

Abstract: An alkaline electrolyte membrane (AEM) electrolytic device is designed, assembled and evaluated for water electrolysis, composed of an anode for oxygen generation, a cathode for hydrogen generation, an AEM for anion conductive, and two internal water gas separators (IWGSs) for water supplying to the anode and the cathode, respectively, as well as for automatically separation of water and gas produced from the anode or from the cathode. There is no need of pumps for water and gas circulations and no external water gas separators (EWGSs) that are used by conventional water electrolyzers. The corrosive electrolyte is confined in the water containers and will not damage other parts in the electrolytic device. Furthermore, novel multi gas diffusion layers are used to replace the conventional single gas diffusion layer. The pore size is configurable to improve the mass transfer of electrochemical reactions and promote electrochemical reactions.

Abstract: Proposed is a CO2-reduction membrane electrode assembly (MEA), which is a novel MEA capable of changing a reaction condition to an alkaline condition from a problematic acidic condition unfavorable to reactions on a cathode side during catalytic reactions using a cation exchange membrane (CEM) as a separator. In addition, the MEA can reduce a hydrogen evolution reaction (HER), which is a side reaction. In addition, a method of manufacturing the MEA, and a CO2-reduction assembly including the MEA are also proposed.

Abstract: The present separator is used in a stack structure in which a cell and the separator are stacked alternately. The cell has a base layer including an electrolyte membrane. The separator includes a metal plate and a ring-like seal member. The seal member is arranged on a surface of the metal plate. The metal plate includes a regulator. The regulator is provided near the seal member and contacts the base layer. As a result, it becomes possible to reduce a likelihood that the seal member will be compressed excessively in a stacking direction in the stack structure.

Abstract: The present disclosure relates to an electrode for CO2 electroreduction in an acidic electrolyte comprising cation species, the electrode comprising: a substrate, a metal-based catalyst material, and a cation-augmenting material; wherein the cation-augmenting material comprises an acidic group exchanging protons with the cation species of the acidic electrolyte so as to increase a concentration of the cation species at a surface of the electrode.

Abstract: A laminated catalyst according to an embodiment includes an oxide layer, a first catalyst layer on the oxide layer and a second catalyst layer on the first catalyst layer. The oxide layer is a layer of oxide including one or more non-noble metals as a main component. The first catalyst layer includes an oxide of noble metal including Ir and/or Ru as a main component. The second catalyst layer includes an oxide of noble metal including Ir and/or Ru as a main component. The first catalyst layer is denser than the second catalyst layer.

Abstract: A membrane electrode assembly according to an embodiment includes a first electrode, a second electrode, an electrolyte membrane provided between the first electrode and the second electrode and a first seal provided on a peripheral portion of the first electrode, having a first opening, housing the first electrode in the first opening, and being contact with the electrolyte membrane or the first seal and a second seal provided on a peripheral portion of the second electrode, having a second opening, housing the second electrode in the second opening, and being contact with the electrolyte membrane.

Abstract: To accurately prepare an operation plan that achieves efficient operation in a hydrogen system. In a hydrogen system operation planning device of an embodiment, an acquisition unit is configured to acquire performance data regarding performance of a plurality of hydrogen production devices and tentative operation plan data regarding a tentative operation plan tentatively prepared for the operation plan. A prediction unit is configured to acquire performance prediction data by predicting the performance of the plurality of hydrogen production devices during the planning target period based on the performance data and tentative operation plan data acquired by the acquisition unit. A planning unit is configured to acquire the operation plan by correcting the tentative operation plan based on the performance prediction data acquired by the prediction of the prediction unit.

Abstract: An electrolysis device includes: an electrolysis cell having a cathode flow path, an anode flow path, a cathode, an anode, and a diaphragm; an anode supply flow path; an anode discharge flow path; a cathode supply flow path; a cathode discharge flow path through which a cathode fluid flows; first to third pressure detectors; first and second pressure controllers that control pressures of the cathode and anode flow paths; a first gas/liquid separator that separates a reduction product from the cathode fluid; a gas detector that measures a concentration of the separated reduction product; and an arithmetic device that calculates pressure values of the anode and cathode flow paths based on the measured concentration and pressures, and controls the pressure controllers to adjust the pressures of the anode and cathode flow paths to the calculated pressure values.

Abstract: An electrolysis device of an embodiment includes: an electrolysis cell including a cathode part in which a reduction electrode is disposed, an anode part in which an oxidation electrode is disposed, and a diaphragm provided between the cathode part and the anode part; a supply power property obtaining unit that obtains a property of power that is to be supplied to the electrolysis cell; an input gas property obtaining unit that obtains a property of a gas that is to be input to the electrolysis cell; an electric property obtaining unit that obtains an electric property of the electrolysis cell; an output gas property obtaining unit that obtains a property of an output gas of the electrolysis cell; a temperature obtaining unit that obtains a temperature of the electrolysis cell; a data storage unit that stores data from the obtaining units; and a data processing unit to which the data is sent from the data storage unit and that processes the data to determine a state of the electrolysis cell.

Abstract: A device for providing a gas component having an electrolysis unit having a first chamber and a second chamber separated from the first chamber by a separating unit. The first chamber receives an electrolyte and provides a first gas component, and the second chamber provides a second gas component. A pressure inside the second chamber is greater than a pressure inside the first chamber. An electrolyte flow of the electrolyte only occurs in the first chamber and a passage of the electrolyte into the second chamber is prevented to keep the second gas component separate from the electrolyte. A phase separation unit separates the first gas component from the electrolyte to provide the first gas component. Also an aircraft or a spacecraft with such a device.

Abstract: The presently disclosed concepts relate to ultra-efficient EV battery recycling systems. Alkali metal extraction (and in particular lithium extraction) is accomplished using a solid electrolyte membrane. By using a solid electrolyte embedded in a matrix, alkali metals, in particular lithium, can be (energy-wise) efficiently separated from feed solutions. The energy used to initially extract lithium from a feed solution is stored as electrochemical energy, which electrochemical energy is reclaimed in subsequent extraction processing steps. This energy storage and energy reclamation is performed in continuous ultra-efficient ongoing cycles. Since irrecoverable energy losses incurred in each cycle are limited to negligible amounts of joule heating of the system components and feed solution, the system can be sustainably powered using locally-generated renewable energy.

Abstract: Disclosed are solutions for the recovery of elemental metals at industrial scales without smelting including, for example, the recovery of near-pure lead from recycled LABs via specialized electrolytic processing. Further disclosed are new processes, innovative electrolyzer designs, and/or novel utilization of supplemental chemicals necessary for successful electrolysis of pure metal from impure forms (e.g., pure lead from lead oxides), and especially applicable for solid-state electrolysis of mixtures comprising lead paste, electrolyte, and supplemental chemicals. With particular regard to recovering near-pure lead during LAB recycling, solid-state electrolysis of mixtures comprising impure lead (e.g., lead paste) is made possible by electrolytic processing using supplemental chemicals, and made scalable to industrial levels via utilization of an horizontal cathode in the electrolyzer.

Abstract: Provided is a method for electrowinning neodymium compound. The method includes providing a fluoride-based electrolyte through an opening defined in an electrolytic bath including a cathode and an anode. The method includes providing granules, each including a neodymium compound and having at least one cavity defined therein, through the opening defined in the electrolytic bath. The method includes dissolving at least a portion of the granule in a molten salt of the fluoride-based electrolyte. The method also includes reducing neodymium at the cathode. The cavity is defined inside or on the surface of the granule, and the apparent density of the granules is lower than the density of the molten salt. The method proposed has an improved process compared to those of the related art.

Abstract: An electroplating shield device, methods of fabricating the same, and methods of electroplating with the electroplating shield device are disclosed herein. The method of electroplating includes positioning an object in an electroplating shield device. The electroplating shield device may include a conduit configured to receive the object and a plurality of openings selectively extended between inner and outer surfaces of the conduit. The openings may be positioned between first and second ends of the conduit. The method may also include forming a layer on the object by transferring fluid through the plurality of openings to at least one of a first continuous section of the object comprising a minor of the object and a second continuous section of the object comprising a major of the object. A ratio of a thickness of the major to the minor after forming the layer may range from approximately 1:1 to approximately 1:18.

Abstract: A method of manufacturing a multilayer metal plate by electroplating includes a first forming operation of forming one of a first metal layer and a second metal layer on a substrate by electroplating, wherein the second metal layer is less recrystallized than the first metal layer, the second metal layer is comprised of nanometer-size grains, and the second metal layer has a higher level of tensile strength than the first metal layer; and a second forming operation of forming, by electroplating, a third metal layer not formed in the first forming operation on a surface of one of the first metal layer and the second metal layer formed in the first forming operation.

Abstract: A semi-insulating gallium arsenide single crystal preparation method includes: adding crystal material to a PBN crucible; adding graphite in a quartz cap; loading the hermetically connected quartz cap and quartz crucible into a VGF single crystal furnace in different temperature zones; controlling the temperature zone in which the quartz crucible is located at a temperature of material melting, while controlling the temperature zone is which the quartz cap is located at 1000±50° C.; preserving the temperature of material melting when the temperature zone in which the quartz crucible is located reaches the temperature of material melting, and controlling the temperature zone in which the quartz cap is located at 1200±50° C. and preserving the temperature for 4 to 50 h; lowering a temperature in the temperature zone to 1000±50° C.; and cooling and discharging.

Abstract: There is described a method of manufacturing an optoelectronic device. The method generally has: etching a wafer of monocrystalline germanium, said etching forming a given density of pores contained within said monocrystalline germanium, with at least some of said pores being exposed at a surface of said wafer; depositing a substrate layer of a given crystalline material onto said surface, said substrate layer closing exposed ones of said pores; heating said wafer and said substrate layer, said heating transforming said pores into cavity-interspersed pillars interconnected to one another within said wafer; making a semiconductor component integral to said substrate layer, including collectively forming said optoelectronic device; and breaking said cavity-interspersed pillars of said wafer thereby freeing said optoelectronic device from a remaining wafer portion of said wafer.

Abstract: A computer-implemented method of determining the number of photons contributing to an output of a photonic sensor, including receiving an electrical signal from the photonic sensor proportional to a number of photons the photonic sensor detects at its input as a function of time, wherein the photonic sensor is calibrated such that a response of the photonic sensor to a single photon detected is in a waveform comprising an amplitude and time, wherein the product amplitude X time is statistically bounded, determining a probabilistic boundary between one or more of electrical, optical, and thermal sources of noise of the sensor, acquiring each response wave form from the sensor through analog-to-digital conversion with a resolution in amplitude and time corresponding to accuracy required in quantifying the response, storing each acquired response, individually, in real-time, or in buffered packets in digital form, determining the number of photons for a specific time resolved acquisition, and effecting a summati

Abstract: A SiC epitaxial wafer according to the present embodiment includes: a SiC substrate; and a SiC epitaxial layer laminated on the SiC substrate, in which a carrier concentration uniformity of the SiC epitaxial layer is less than 3.8%, and the carrier concentration uniformity is a value obtained by dividing, by an average value, a difference between a maximum value and a minimum value of carrier concentrations of the SiC epitaxial layer measured along a straight line passing through a center of the SiC epitaxial layer when seen in a plan view.

Abstract: A SiC epitaxial wafer including: a SiC substrate; and a SiC epitaxial layer stacked on one surface of the SiC substrate, wherein a diameter of the SiC substrate is 195 mm or more, and a warp is 50 ?m or less.

Abstract: Systems and methods for generating one or more single crystal monolayers from two-dimensional van der Waals crystals are disclosed herein. Example methods include providing a bulk material including a plurality of van der Waals crystal layers, and exfoliating one or more single crystal monolayers of van der Waals crystal from the bulk material by applying a flexible and flat metal tape to a surface of the bulk material. In certain embodiments, the one or more single crystal monolayers can be assembled into an artificial lattice. The present disclosure also provides techniques for manufacturing flexible and flat metal tape for generating one or more single crystal monolayers from two-dimensional van der Waals crystals. The present disclosure also provides compositions for creating a macroscopic artificial lattice.