Abstract: A method of production of a coated steel substrate including of the steps to have a steel substrate; performing electroplating of the steel substrate with an electroplating solution having a pH of from 2 to 6 and containing 100 g/l to 500 g/l of NiSO4 and 1 g/l to 15 g/l of MoS2, by applying a current density from 15 A/dm2 to 45 A/dm2 during 30 seconds to 300 seconds to generate a layer of Ni—MoS2 coating; thereafter, rinsing the steel substrate and drying it to obtain a coated steel substrate.

Abstract: Disclosed are a non-oriented electrical steel sheet and a method for manufacturing same, wherein the texture of the electrical steel sheet is optimized after cold rolling by controlling the temperature and atmosphere of decarburization annealing and final annealing, and thus excellent iron loss can be obtained even at low temperatures. In addition, disclosed are a non-oriented electrical steel sheet and a method for manufacturing same, wherein processes, from the processing of the electrical steel sheet into motor component to a final heat-treatment, are improved to enhance the strength of the texture aligned in the direction of easy magnetization and thereby improve the magnetic characteristics of the steel sheet.

Abstract: The present invention relates to a method for manufacturing a non-oriented electrical steel sheet, and a non-oriented electrical steel sheet manufactured thereby, and the method for manufacturing a non-oriented electrical steel sheet, according to the present invention, comprises the steps of: (a) reheating a steel slab comprising 0.05 wt % or less of C, 1.0-3.5 wt % of Si, 0.2-0.6 wt % of Al, 0.02-0.20 wt % of Mn, 0.01-0.20 wt % of P, 0.01 wt % or less of S, and the balance of Fe and inevitable impurities, and then performing hot rolling on same; (b) performing hot rolling annealing heat-treatment and pickling on a hot rolled steel sheet; (c) performing cold rolling on the pickled steel sheet; (d) performing insulation coating on the cold rolled steel sheet, and then processing same; and (e) performing final heat treatment by heating, soaking and cooling the processed steel sheet, wherein soaking process is maintained and carried out at a temperature of 850° C.

Abstract: Method for thermally treating a scrolling steel strip (5), said method comprising the following steps: heating the strip (5) in a zone for heating with a direct flame (10); temperature homogenisation of the strip (5) in a homogenisation chamber (20) comprising at least one radiant heating tube (25), so as to homogenise the strip (5) in temperature after the passing thereof into the zone for heating with a direct flame (10) of the preceding step; oxidation of the strip (5) in an oxidation chamber (30) with an oxidising atmosphere having an oxygen volume concentration greater than 1%; reduction of the strip (5) in a reduction zone (40).

Abstract: A cooling water temperature control method, includes: calculating thickness of a water film remaining on a steel sheet; calculating a change in the thickness of the water film; calculating a change in temperature of the steel sheet; calculating a steel sheet temperature on an exit side of a draining roll at which a position where the thickness of the water film on the steel sheet becomes zero coincides with an exit side position of a drying equipment, and setting the calculated temperature to a lower limit value; calculating a steel sheet temperature on the exit side of the draining roll at which the steel sheet temperature on the entrance side of coating equipment coincides with a predetermined temperature and setting the calculated temperature to an upper limit value; and controlling the temperature of cooling water within a range of the lower limit value and the upper limit value.

Abstract: According to the present invention there is provided an apparatus for the extraction of lithium from one or more lithium-containing ores, said apparatus comprising: a reactor for housing the one or more lithium-containing ores prior to and during the extraction, the one or more lithium-containing ores having been milled to a predetermined average particle size to provide a milled crude ore; a source of water to provide for a predetermined solids concentration of the milled crude ore within an aqueous medium; a source of carbon dioxide fluidly connected to the reactor, thereby to provide an acidic extraction medium for the milled crude ore defined by a predetermined partial pressure of carbon dioxide; heating means communicable with the acidic extraction medium, thereby to provide for a predetermined extraction temperature over a predetermined time, thereby to provide for an extract comprising technical grade lithium carbonate and/or lithium bicarbonate in solution; an exit port through which the extract is po

Abstract: The present invention relates to a process for producing a cathode active material precursor having a desired active material target ratio for use in a lithium-ion secondary cell or in the production of a lithium-ion secondary cell.

Abstract: A solvent extraction method for separation and recovery of nickel, cobalt, manganese, and zinc is proposed. More particularly, the present method relates to a solvent extraction method for separation and recovery of nickel, cobalt, manganese, and zinc, the method being capable of separately recovering four kinds of valuable metals as respective monotype metals from a starting material containing nickel, cobalt, manganese, and zinc by involving: a first solvent extraction step in which the starting material is separated into a first aqueous phase solution containing nickel and cobalt and a second aqueous phase solution containing nickel, cobalt, manganese, and zinc; a second solvent extraction step in which nickel (Ni) and cobalt (Co) are separated and recovered; a third solvent extraction in which zinc (Zn) is recovered; and a fourth solvent extraction step in which manganese (Mn) and cobalt (Co) are separated and recovered.

Abstract: A nonlinear oxygen-enriched injection method based on chaotic mapping and electronic device is disclosed, including: obtaining a chaotic gas injection volume corresponding to a current speed change period according to a chaotic mapping value corresponding to the current speed change period and a peak gas injection volume in an oxygen-enriched injection process; determining a rotational speed of a fan blade in a fan component corresponding to the current speed change period according to the chaotic gas injection volume; updating a rotational speed of a direct current (DC) motor in the fan component corresponding to the current speed change period according to the rotational speed of the fan blade in the fan component, and driving the fan blade to rotate according to an updated rotational speed of the DC motor, so as to update an air output of the fan component. The above operations are repeated until a last stage.

Abstract: A method of extracting lithium from a lithium-bearing material including: (i) mixing the lithium-bearing material, gypsum, a sulfur-containing material, and a calcium-containing material and forming a feed mixture having a moisture content of at least 20 wt %; (ii) drying the feed mixture to form a dried mixture having a moisture content of less than 20 wt %; (iii) roasting the dried mixture and forming a roasted mixture including a water-soluble lithium compound; and (iv) leaching lithium from the water-soluble lithium compound and forming a lithium-containing leachate by mixing the aqueous solution and the water-soluble lithium compound.

Abstract: A method for desorbing lithium from an adsorbent having lithium adsorbed thereon comprising: 1) providing an adsorbent having lithium adsorbed thereon, 2) contacting the adsorbent with an acid medium to desorb the lithium from the adsorbent, and 3) recovering the desorbed lithium, wherein the acid medium comprises an organic acid having a lowest pKa value of at least about 4 and/or a dicarboxylic acid which i) comprises 3 or more carbon atoms and/or ii) has a lowest pKa value of at least about 3.5.

Abstract: A metal matrix composite to high tolerate wear as a property has been produced by infiltration casting of a Fe Alloy and a spinel ceramic by using a material design for i) metal transport phenomena conditions, ii) predefined wetting and capillarity and iii) processing child insert/mother casting methodology to produce a final casting in shape and form to meet the needs of a mining end user.

Abstract: A non-limiting embodiment of a titanium alloy comprises, in weight percentages based on total alloy weight: 2.0 to 5.0 aluminum; 3.0 to 8.0 tin; 1.0 to 5.0 zirconium; 0 to a total of 16.0 of one or more elements selected from the group consisting of oxygen, vanadium, molybdenum, niobium, chromium, iron, copper, nitrogen, and carbon; titanium; and impurities. A non-limiting embodiment of the titanium alloy comprises an intentional addition of tin and zirconium in conjunction with certain other alloying additions such as aluminum, oxygen, vanadium, molybdenum, niobium, and iron, to stabilize the ? phase and increase the volume fraction of the ? phase without the risk of forming embrittling phases, which was observed to increase room temperature tensile strength while maintaining ductility.

Abstract: A method of producing aluminum alloy material having a thermal bonding function in a single layer and including 2.00 mass % to 3.00 mass % Si, 0.01 mass % to 0.50 mass % Fe, and 0.80 mass % to 1.50 mass % Mn includes a casting process performing a twin roll type casting to form a plate having a thickness of 3 mm to 12 mm by rotating a roll having a diameter D (mm) at peripheral velocity v (mm/min) being satisfying a following formula of 0.057×v+0.0016×D?33.54.

Abstract: A cBN sintered compact includes a binder phase that contains a Ti—Al alloy containing at least one of the Si, Mg, and Zn elements, Ti2CN, TiB2, AlN, and Al2O3; the ratio ITi2CN/ITiAl is 2.0 or more and 30.0 or less, wherein ITi2CN represents the intensity of the Ti2CN peak appearing at 2? from 41.9° to 42.2° and ITiAl represents the intensity of the Ti—Al alloy peak appearing at 2? from 39.0° to 39.3° in XRD; and, in the mapped image of each element of Ti, Al, Si, Mg, and Zn by Auger electron spectroscopy, the ratio STiAlM/STiAl, is 0.05 or more and 0.98 or less wherein STiAlM represents the average area of the portions wherein Ti, Al and at least one selected from the group consisting of Si, Mg, and Zn overlap and STiAl represents the average area of the portions where Ti and Al overlap.

Abstract: Provided are chromium steel having excellent high-temperature oxidation resistance and high-temperature strength, and a method of manufacturing same. The present invention relates to chromium steel, having excellent high-temperature oxidation resistance and high-temperature strength, which comprises, by weight %, 0.1% or less of C (not including 0%), 0.7% or less of Si (not including 0%), 0.1% or less of Mn (not including 0%), 0.01% or less of S (not including 0%), 0.03% or less of P (not including 0%), 27-33% of Cr, 3.5% or less of Al (not including 0%), 2.5% or less of Nb (not including 0%), 6.5% or less of W (not including 0%), 0.5% or less of Mo (not including 0%), 0.3% or less of Ti (not including 0%), 0.015% or less of N (not including 0%) and the remainder being Fe and unavoidable impurities, and satisfies relational expression (1).

Abstract: The purpose of the present invention is to provide a steel plate for a pressure vessel having excellent resistance to high-temperature post-welding heat treatment, in which deterioration of strength and toughness is minimized even when a long-term post welding heat treatment (PWHT) is applied at high temperature, and a method for manufacturing same.

Abstract: A coated steel sheet and press hardened steel part having a composition including, by weight percent: C 0.26-0.40%, Mn 0.5-1.8%, Si 0.1-1.25%, Al 0.01-0.1%, Cr 0.1-1.0%, Ti 0.01-0.1%, B 0.001-0.004%, P 0.020%, S 0.010%, N 0.010% the remainder of the composition being iron and unavoidable impurities resulting from the smelting. The press hardened steel part includes a bulk having a microstructure including, in surface fraction, more than 95% of martensite and less than 5% of bainite, a coating layer at the surface of the steel part, a ferritic interdiffusion layer between the coating layer and the bulk, and a ratio between the ferritic grain width in the interdiffusion layer GWint over prior austenite grain size in the bulk PAGSbulk, satisfying following equation (GWint/PAGSbulk)?1?30%.

Abstract: A maraging steel suitable for hot-work tools. The steel consists of in weight % (wt.%): C <0.08, Si 0.1-0.9, Mn<2, Cr 4.0-6.5, Ni 2.0-5.0, Mo 3.5-6.5, Co 2.0-5.5, Cu<4.0, Nb<0.1, V<0.1, Ti<0.1, and a balance of Fe and impurities.

Abstract: The present invention relates to a steel material including: 0.25 mass %?C?0.37 mass %; 0.08 mass %?V?0.28 mass %; 6.60 mass %?Mn+Cr?7.40 mass %; Mn/Cr?0.150; Mn?0.60 mass %; Cr?6.60 mass %; Cu+Ni?0.84 mass %; 0.40 mass %?Si?0.90 mass %; 0.60 mass %?Mo?2.00 mass %; 0.001 mass %?Al?0.080 mass %; and 0.003 mass %?N?0.040 mass %, with the balance being Fe and unavoidable impurities.

Abstract: Described herein is an aging process of a solution-heat-treated and quenched 2XXX-series aluminum alloy wrought product, comprising the steps of: (1) aging the product in a first aging step at one or more temperatures within a range of 90° C. to 120° C. for a cumulative period of time of at least 10 hours; and (2) subsequently aging the product in a second aging step at one or more temperatures within a range of 150° C. to 205° C. for a cumulative period of time of at least 4 hours. The wrought aluminum alloy can be processed to various product forms, e.g., sheet, thin plate, thick plate, extruded or forged products.

Abstract: A spray coating containing a rare earth fluoride and/or a rare earth acid fluoride contains carbon at 0.01-2% by mass or titanium or molybdenum at 1-1000 ppm. When an acid fluoride is not contained, the spray coating is gray to black in which, in terms of the L*a*b* chromaticity, L* is 25-64, a* is ?3.0 to +5.0, and b* is ?4.0 to +8.0. When an acid fluoride is contained, the spray coating is white or gray to black in which, in terms of the L*a*b* chromaticity, L* is equal to or greater than 25 and less than 91, a* is ?3.0 to +5.0, and b* is ?6.0 to +8.0. By forming this coating on a plasma resistant member, a partial color change is reduced, thus, a member that is capable of reliably realizing the original longevity is obtained.

Abstract: A method for treating a workpiece made of self-passivating metal and having a Beilby layer including applying a coating to a surface of the workpiece, the coating including a reagent, treating the coating to thermally alter the reagent, wherein the thermal altering of the reagent activates and/or hardens the surface.

Abstract: Coating system deposited on a surface of a substrate including an under coating film, an interjacent coating film deposited as a multi-layered film, including a plurality of A-layers and a plurality of B-layers deposited alternating one on each other forming a A/B/A/B/A . . . architecture, the A-layers including aluminium chromium and optionally one or more dopant elements and the B-layers including aluminium chromium nitride and one or more dopant elements.

Abstract: An apparatus for manufacturing a display device includes a mask assembly, and a deposition source that supplies a deposition material toward the mask assembly. The mask assembly includes a mask frame including a first opening, a sheet portion fixed on the mask, overlapping a portion of the first opening in a plan view, and including a plurality of second openings, a plurality of first masks corresponding to the plurality of second openings and fixed on the sheet portion, each including a plurality of third openings, and a second mask arranged on another portion of the first opening defined by an edge of the sheet portion and inner surfaces of the first opening, fixed on the mask frame, and including a plurality of fourth openings.

Abstract: Provided are an apparatus for manufacturing a mask assembly, a method for calculating auto-teaching data using the same, and a method of manufacturing a mask assembly using position correction values calculated by auto-teaching data calculation. The apparatus for manufacturing a mask assembly includes a processing unit including a stage, a mask, a mask frame, and marking parts, a first gantry disposed on the processing unit and movable in a first direction, a second gantry connected to the first gantry and movable in a second direction intersecting the first direction, a photographing unit connected to the second gantry and that photographs the marking parts, and a movement control unit that controls movements of the first gantry and the second gantry.

Abstract: Examples are disclosed relate to the application of films of transparent conductors over fluorine-doped tin oxide (FTO) to form a multi-layer structure comprising a lower sheet resistance and smoother surface, while exhibiting a higher transparency, than a single thicker FTO with an equivalent thickness. Various compositions of transparent conductor may be deposited using such solutions. Examples include Sn:In2O3, Ti:In2O3, Cd2SnO4, and combinations of two or more such materials. One example provides optical device, comprising a substrate, an FTO film on the substrate, and a film of a transparent conductor on the FTO film.

Abstract: A covering for reinforcing a base layer of a nuclear fuel cladding is provided. The covering comprises a first layer configured to cover a first portion of the outer surface of the base layer of the nuclear fuel cladding, a second layer surrounding the first layer and the base layer and a third layer surrounding the second layer. The first layer comprises a fiber based material, the second layer comprises an interfacing material and the third layer comprises Chromium. A reinforced cladding for nuclear fuel and a method for producing a reinforced nuclear fuel cladding are also provided.

Abstract: The disclosure refers to a method for producing a coated plastic article, the method comprising: nnnnn. providing a plastic substrate having at least a first and second surface; ooooo. depositing on the plastic substrate a decorative coating comprising a metal or metal alloy layer, using physical vapor deposition; and ppppp. applying a protective coating to at least the first surface of the plastic article, wherein there is no plasma pre-treatment of the plastic substrate prior to deposition of the decorative coating. Further, the disclosure refers to a coated plastic article comprising; a plastic substrate having a first and second surface, a decorative coating comprising a metal or metal alloy layer deposited directly on the plastic substrate and a protective coating applied to the first surface of the plastic article, wherein the residual stress of the decorative coating is tensile, and the coated plastic article passes the SAEJ2527 accelerated UV test.

Abstract: Methods for forming a low resistivity ruthenium (Ru) thin film that include depositing ruthenium onto a substrate via ion beam deposition with assist ion beam in a process chamber having reactive and noble gas species therein. The substrate is at at least 250° C. A resulting thin ruthenium film has a thickness of no more than 30 nm, a resistivity less than 12 ?·cm and a crystalline structure comprising grains having a (0001) orientation. The resistivity will differ at different thickness; for example, less than 9 ??-cm for films of 50 nm and thicker, less than 9.5 ??-cm for films of 35 nm and thicker, less than 11 ??-cm for films of 20 nm and thicker, less than 15 ??-cm for films of 10 nm and thicker or less than 20 ??-cm for films of 2 nm and thicker. The grains have a mean grain size at least three times the film thickness.

Abstract: The present invention is related to a thermal laser evaporation system (10), the thermal laser evaporation system (10) comprising: a reaction chamber (20) with a chamber wall (30) for enclosing a reaction volume (22); a target (12) arranged in the reaction volume (22), the target comprising one or more materials (M) to be evaporated; a laser light source (40) for providing a thermal laser beam (42) for evaporating said one or more materials (M) from the target (12), the thermal laser beam having a general propagation direction (46); and a chamber window (38) in the chamber wall (30) for conducting the thermal laser beam (42) into the reaction volume (22);

Abstract: A method (480, 580) of depositing layers of a thin-film transistor on a substrate using a sputter deposition source comprising at least one first pair of electrodes and at least one second pair of electrodes, the method comprising moving (482, 582) the substrate to a first vacuum chamber; depositing (484, 584) a first layer of the layers on the substrate by supplying the at least one first pair of electrodes with bipolar pulsed DC voltage, wherein a first material of the first layer comprises a first metal oxide; moving (486, 586) the substrate from the first vacuum chamber to a second vacuum chamber without a vacuum break; and depositing (488, 588) a second layer of the layers on the first layer by supplying the at least one second pair of electrodes with bipolar pulsed DC voltage, wherein a second material of the second layer comprises a second metal oxide, the second material being different from the first material.

Abstract: Methods, system, and apparatus for substrate processing are provided for flowing a gas into a substrate processing chamber housing a substrate clamped to a chuck, wherein the gas is introduced at a location above the substrate; and while the gas is introduced, dechucking the substrate.

Abstract: A vacuum processing apparatus (110) for deposition of a material on a substrate is provided. The vacuum processing apparatus (110) includes a vacuum chamber comprising a processing area (111); a deposition apparatus (112) within the processing area (111) of the vacuum chamber; a cooling surface (113) inside the vacuum chamber; and one or more movable shields (220) between the cooling surface (113) and the processing area (111).

Abstract: A method for changing test substrates in a continuous-flow vacuum system in a multiple-treatment-step process cycle for treating a substrate, a treatment method using the method for changing test substrates, and systems for treating a plurality of substrates (61) and for changing test substrates. For at least two treatment steps, at least two test substrates (66) are transferred to a vacuum treatment system at the beginning of the process cycle and are transferred back out once the process cycle is concluded. Subsequently, the first test substrate (66) concurrently treated in this step is removed from the measurement position (70) it occupied during the treatment and is deposited in an empty position (71) without a test substrate (66). Subsequently, the second test substrate (66) which has not been treated yet is deposited in the resulting free measurement position (70) for the purpose of supplying the second test substrate to the subsequent treatment step.

Abstract: Methods and systems for mixing precursors are disclosed. Systems and methods disclosed herein comprise mixing a first precursor and a second precursor in a mixing chamber. The first precursor and the second precursor can be provided to the mixing chamber in the gas phase or as liquids.

Abstract: Embodiments of the disclosure are directed to methods of depositing a molybdenum film directly on a substrate surface (e.g., a low-K dielectric material) by exposing the substrate surface to a molybdenum-containing precursor and a plasma at a temperature of less than or equal to 400° C. The molybdenum-containing precursor comprises one or more of molybdenum pentachloride (MoCl5), molybdenum dioxide dichloride (MoO2Cl2), molybdenum oxytetrachloride (MoOCl4), molybdenum hexacarbonyl, bis(tert-butylimido)-bis(dimethylamido)molybdenum, or bis(ethylbenzene) molybdenum. The plasma comprises one or more of hydrogen (H2), nitrogen (N2), or a silane (SixHy). In some embodiments, when the molybdenum-containing precursor comprises molybdenum hexafluoride (MoF6), the plasma does not include hydrogen (H2).

Abstract: An object of the present invention is to provide a novel method for forming a carbonaceous structure comprising minute carbon bodies such as CNTs. A method for forming a carbonaceous structure on the surface of a substrate, comprising a step of forming a layered structure by at least partially filling a gap between a porous membrane which can hold a dispersion medium and a substrate with a minute-carbon-body dispersion liquid comprising the minute carbon bodies and the dispersion medium, and a step of removing the dispersion medium by at least partially taking the dispersion medium out of the layered structure through the porous membrane and/or the substrate.

Abstract: A method for producing a gallium precursor, including, a step of preparing a solvent comprising an aqueous solution containing an acid and/or an alkali, a step of immersing gallium in the solvent, a step of making the gallium immersed in the solvent fine, and a step of dissolving the fined gallium. This provides a method for producing a gallium precursor with high quality and highly productive.

Abstract: A method of depositing an atomic layer is provided. The method includes a plurality of deposition cycles. Each of the plurality of deposition cycles includes rotating a valve plate included in an exhaust port by a first angle while supplying a precursor to a chamber into which a substrate is loaded, rotating the valve plate by a second angle while supplying a purge gas to the chamber, rotating the valve plate by a third angle while supplying a reactor to the chamber, and rotating the valve plate by the second angle while supplying the purge gas to the chamber, and wherein the first angle, the second angle, and the third angle are certain angles between an upper surface of the valve plate and a virtual plane vertical to an internal path of the exhaust port, and the first angle differs from the third angle.

Abstract: Methods for forming a Li-containing film, islet or cluster on a substrate comprise the steps of introducing a vapor of a silicon-free lithium precursor into a reactor and depositing at least part of the silicon-free lithium precursor onto the substrate to form the Li-containing film, islet or cluster using a vapor deposition method.

Abstract: A method includes following steps. A first precursor is pulsed over a substrate such that first precursor adsorbs on a first region and a second region of the substrate. A first plurality of the first precursor adsorbing on the first region is then removed using a plasma, while leaving a second plurality of the first precursor adsorbing on the second region. A second precursor is then pulsed to the substrate to form a monolayer of a film on the second region and a material on the first region. The material is then removed using a plasma. The substrate is biased during removing the material.

Abstract: Compositions, related methods, and related systems are disclosed. The compositions can comprise a precursor and a liquid solvent. The precursor can be unstable in substantially pure form in an inert atmosphere at a temperature of at least 10° C. to at most 100° C. The solvent can have a vapor pressure of at most 1.0 mPa at a temperature of 20° C.

Abstract: A CVD reactor comprising a gas inlet element which has a cooling device and gas outlet openings which lead into a process chamber. The process chamber has a feeder zone directly adjoining the gas inlet element and a process zone with one or more substrate holders. The process zone follows the feeder zone in a flow direction of a process gas entering the process chamber from the gas outlet openings. The feeder zone has a first floor portion directly adjoining the gas inlet element and a second floor portion located between the first floor portion and the process zone. In order to prevent the formation of parasitic coatings during deposition of, for example, silicon carbide at the start of the feeder zone, the first floor portion rises in the flow direction, so that the height of the process chamber initially decreases starting from the gas inlet element.

Abstract: A technique includes a gas supplier including a first pipe into which a gas is introduced and a second pipe including an opening from which the gas is released, in which a flow path cross-sectional area of the second pipe is larger than a flow path cross-sectional area of the first pipe, and a direction in which the gas is released from the opening is inclined with respect to a direction from a center of the first pipe toward a center of the second pipe in a plan view.

Abstract: A wafer carrier includes a base including a generally planar bottom surface and a top surface that includes a plurality of platforms extending above the top surface. The wafer carrier includes a thermal cover defining a plurality of pockets. The thermal cover is configured to be coupled to the base by at least one fastener and the plurality of pockets are arranged such that each pocket of the plurality of pockets is aligned with a corresponding platform of the plurality of the platforms when the thermal cover is supported by a plurality of first pedestals that extend from the top surface of the base. A plurality of second pedestals are located along the plurality of platforms for supporting the one or more wafers, wherein each platform includes at least one second pedestal that extends from a top surface of the platform for supporting one wafer.

Abstract: A boat used in a chemical vapor deposition (CVD) furnace is configured to hold one or more complex three-dimensional (3D) structures when performing a coating. A platform wafer is placed horizontally in the boat to support the complex 3D structures and a mount is positioned to secure the complex 3D structures on the platform wafer during the CVD process. One or more “witness” wafers may also be placed in the boat for analyzing the thin-film coating. The platform wafer may be positioned between or bracketed by the vertical wafers. Parts with coatings manufactured using LPCVD are further disclosed.

Abstract: Provided are a plasma coating apparatus and a coating method. The plasma coating apparatus uses radio frequency discharge, and a discharge coil can be arranged in the lengthwise direction of a coating cavity, so as to provide a plasma environment for a base material when the base material moves within the coating cavity in the lengthwise direction of the coating cavity.

Abstract: This application relates to a method of inspection and an inspection system for the film deposition process for substrates that includes glass and wafer. The inspection system includes multiple camera modules positioned in a load lock unit of a process chamber, such as the camera modules that can capture images of the substrate in the load lock. The images are analyzed by a control unit of the inspection system to determine the accuracy of robots in handling the substrate, calibration of the robots based on the analysis, and defects in the substrate caused during the handling and deposition process.

Abstract: The present invention provides a high-crystallinity barium titanate film structure, a method of preparation and an application thereof, and relates to the field of materials and devices. The method includes the steps of depositing, on a substrate, a barium titanate layer with a (001) or (111) crystal orientation by atomic layer deposition in a high vacuum environment and at a low temperature of 450° C. or below, wherein a Ba/Ti ratio in the barium titanate layer is 0.9-1.5; and performing plasma annealing treatment on the barium titanate layer at a low temperature of 450° C. or below without breaking vacuum to form a high-crystallinity barium titanate layer having the (001) or (111) crystal orientation. The film structure may further comprise top and bottom electrodes formed above and below the barium titanate layer. The present invention solves the problem that an existing method for obtaining a crystalline BTO film is not applicable to back-end of line (BEOL) integration processes.