Abstract: This continuous cast wire rod contains Cu: 62.0 mass % or greater and 70.0 mass % or less, Sn: 0.3 mass % or greater and 0.9 mass % or less, Zr: 0.0050 mass % or greater and 0.1000 mass % or less, and P: 0.0050 mass % or greater and 0.1000 mass % or less, with a balance being Zn and impurities, and a mass ratio Zr/P of Zr to P is 0.3 or greater.

Abstract: The present disclosure relates to a hot-dip-coated steel sheet having a Zn—Mg—Al coating which includes aluminum at between 0.1 and 8.0 wt %, magnesium at between 0.1 and 8.0 wt %, the balance being zinc and unavoidable impurities, wherein the coating comprises zinc grains and further phases of magnesium and/or aluminum and also eutectic structures including at least intermetallic zinc-magnesium phases, wherein a native oxide layer is formed on the coating. In accordance with the present disclosure, the coating beneath the native oxide layer has an area fraction of at least 35% in which there is an average nanohardness of at least 4 GPa.

Abstract: A method for manufacturing a hot-dip galvanized steel sheet having a high Si content and good plating adhesion. The method for manufacturing a hot-dip galvanized steel sheet includes the following: hot-rolling a steel raw material having a Si content of 1.0 mass % or more and coiling a steel sheet at 500° C. to 700° C.; subjecting a surface of the steel sheet after the coiling to an oxidation treatment at a heating temperature of a steel sheet temperature of 750° C. or lower, and subsequently subjecting the surface to a reduction treatment; and subjecting the steel sheet after the reduction treatment to a hot-dip galvanizing treatment to form a Zn-plated layer on a surface of the steel sheet.

Abstract: A method for manufacturing a sheet metal component including: annealing a flat steel product comprising 0.05-0.5% C, 0.5-3% Mn, 0.06-1.7% Si, ?0.06% P, ?0.01% S, ?1.0% Al, ?0.15% Ti, ?0.6% Nb, ?0.01% B, ?1.0% Cr, ?1.0% Mo, ?1.0% Cr+Mo, ?0.2% Ca, ?0.1% V, remainder iron and impurities in a continuous furnace under an atmosphere consisting of 0.1-15% hydrogen and remainder nitrogen with a specific dew point and temperature profile; applying a coating consisting of <15% Si, ?5% Fe, in total 0.1-5% of at least one alkaline earth or transition metal and a remainder Al and unavoidable impurities; heating the flat steel product to >Ac3 and ?1000° C. for a time sufficient to introduce a heat energy quantity >100,000-800,000 kJs; hot-forming the flat steel product to form the component; and cooling at least one section of the component at a cooling rate sufficient to generate hardening structures.

Abstract: This disclosure generally relates to coating compositions comprising chromium and aluminum and coatings formed using the same, and more particularly to bond coat compositions and coatings for use in various gas turbine applications. In one aspect, a material composition comprises M, Cr, and Al, wherein M is one or more of Ni, Co, and Fe. The material composition is configured to form a BCC ordered phase and a disordered metallic phase of either a BCC or FCC crystal structure.

Abstract: The disclosure relates to a method for etching a molybdenum feature, comprising the steps of: a) oxidizing a thickness portion of the molybdenum feature using a thermal oxidation process to form a thermal molybdenum oxide layer, and b) dissolving the thermal molybdenum oxide layer using a wet chemistry.

Abstract: A method for coating a substrate with a Co-Pi modified BiVO4/WO3 heterostructure film includes direct current reactive sputtering tungsten (W) onto a substrate in a gaseous mixture containing oxygen to form a tungsten trioxide (WO3) film, direct current reactive sputtering bismuth (Bi) onto the tungsten trioxide (WO3) film in a gaseous mixture containing oxygen to form a dibismuth trioxide (Bi2O3) film, drop-casting a vanadyl acetylacetonate solution onto the Bi2O3 film and heating at a temperature of at least 450° C. in ambient air to convert the Bi2O3 film to a BiVO4 film, and photoelectrochemically coating the BiVO4 film with a cobalt-phosphate (Co-Pi) to form a modified film on the surface of the substrate. A photoanode containing the Co-Pi modified BiVO4/WO3 heterostructure film prepared by the method, and its application in water splitting.

Abstract: A metal mask includes: a mask body having two opposite first side edges along a first direction and two opposite second side edges along a second direction, and each of the first side edges having a first length. The mask body includes an open slot region, two first fixing regions, and two first clamping regions, where the two first fixing regions are positioned on two opposite sides of the open slot region, respectively, and each of the first clamping regions is positioned between each of the first fixing regions and each of the first side edges. A first gap is formed in each of the first side edges, the first gap has a first opening length in the first direction, and a ratio of the first opening length to the first length being between 0.2 and 0.8. The metal mask may improve the problem of wrinkles.

Abstract: A mask assembly includes a frame opening, and a mask sheet. The mask sheet includes a first mask including a first body part having at least one first deposition opening, first coupling portions, each of which protrudes from at least one first side of the first body part, and a second mask including a second body part having at least one second deposition opening, second coupling portions, each of which protrudes from at least one first side of the second body part, The at least one first side of the first mask and the at least one first side of the second mask face each other. The first coupling portions overlap the second coupling portions, respectively.

Abstract: An evaporation material distributor and a vacuum evaporation device are provided. The evaporation material distributor includes a material distribution mechanism and a housing, where the material distribution mechanism is provided at a bottom of the housing, and the material distribution mechanism includes a plurality of through holes formed in a middle of a bottom of the material distribution mechanism at intervals along a length direction of the material distribution mechanism; and a plurality of feeding channels respectively provided between the holes and corresponding edges of the material distribution mechanism.

Abstract: A deposition apparatus includes: a vaporization portion to vaporize a first material, a second material, and a third material different from each other; and a first nozzle portion connected adjacent to the vaporization portion. The first nozzle portion includes: a first nozzle hole to discharge the first material; a second nozzle hole adjacent to the first nozzle hole and to discharge the second material; and a third nozzle hole adjacent to the first nozzle hole and the second nozzle hole and to discharge the third material.

Abstract: The invention relates to a sputtering target, a coating system, and a coating method for same. The sputtering target comprises a base plate with a target plate which is secured thereon and which is made of a first sputtering material with a surface and a plurality of recesses formed therein. A plurality of inserts are arranged in the recesses. At least some of the inserts are made of a second sputtering material, wherein the second sputtering material has a higher sputter yield than the first sputtering material. The aim of the invention is to achieve especially uniform coatings. This is achieved in that the inserts made of the second sputtering material are shaped such that the extent D1, D2 of the inserts, measured in a measuring direction parallel to the surface, increases from the surface to the base plate in a depth direction T.

Abstract: The current disclosure relates to highly homogeneous glass sputter targets with a large aspect ratio and a high relative density. The glass sputter targets have properties that are desirable for forming thin films by physical vapor deposition processes such as sputtering.

Abstract: A target for sputtering, use of the target and method of manufacture of the target is provided. The target has a single piece target material for sputter deposition, with at least 1 mm thickness of material for sputtering, having a lamellar structure and comprising a metal oxide with at least 50 wt. % or more of tungsten oxide. The atomic ratio of oxygen over tungsten results in a compound with oxygen deficiency with respect to the stoichiometric tungsten oxide. The method includes spraying metallic tungsten and/or tungsten oxide powder in amounts so as to provide a layer of material for sputtering being at least 1 mm thick and comprising non-stoichiometric tungsten oxide.

Abstract: A method of depositing a layer on a piece by sputter deposition, a coater and a processor for controlling a coater in accordance with the method are provided. The method includes providing deposition of metallic and reactive species simultaneously on a piece for forming a layer under predetermined sputtering conditions, thereby providing a deposited layer on the piece comprising a metal compound. The deposited layer is subsequently irradiated and the optical transmittance is measured. A measured parameter related to the measured radiation is compared with one stored value of that parameter. The sputtering conditions are thereby adapted as a result of the comparison.

Abstract: According to one embodiment of the present disclosure, there is provided a technique that includes (a) supplying a second-metal-containing gas to a substrate including a first metal film and an insulating film to form a first film containing a second metal on the first metal film; and (b) supplying the second-metal-containing gas to the substrate to form a second film containing the second metal on the first film and the insulating film.

Abstract: Improved fabrication is provided for devices in the GaN material system that require an embedded p-type layer. The effect of Mg diffusion from the p-type layer is compensated for using an GaN interlayer that is etched to be nanoporous at its top surface. In addition to serving as a diffusion barrier, the GaN interlayer preferably has C and O impurities from the etch that tend to compensate unwanted Mg doping in layers above the GaN interlayer. Importantly, the entire structure can be grown at high temperatures, which desirably avoids low temperature growth steps that tend to reduce material quality.

Abstract: The present invention relates to a method for fabricating cobalt interconnects and an electrolyte enabling it to be implemented. The electrolyte of pH less than 4.0 comprises cobalt ions, chloride ions and organic additives, including an alpha-hydroxy carboxylic acid and an amine chosen from polyethyleneimine or benzotriazole.

Abstract: A film formation device which forms a film on a substrate through the heat treatment of a starting material solution in the form of a mist, the film formation device including a mist conversion unit that generates a mist by converting the starting material solution into mist, a carrier gas supply unit that supplies a carrier gas for transporting the mist generated by the mist conversion unit, a film formation unit that includes therein a placement part for placing the substrate and that is where the mist transported by the carrier gas is supplied onto the substrate, and an exhaust unit that exhausts exhaust gas from the film formation unit, and further including, above the placement part in the film formation unit, a nozzle for supplying the mist onto the substrate and a top plate for adjusting the flow of the mist supplied from the nozzle.

Abstract: A method and system for depositing a material on one or more substrates by atomic layer deposition. The method comprising a step of performing a pulse (1) of a precursor of said material, wherein at least one of the average flow rate (f) and the average partial pressure (r) of said precursor over a first half (2) of the pulse (1) is higher than over a second half (3) of the pulse (1).

Abstract: [Solution] A device according to the present disclosure comprises: a plasma generation chamber that is provided with a plasma generation mechanism for activating a second processing gas, when forming a film on a substrate by supplying each of a first processing gas, a substitution gas, the plasma-activated second processing gas, and the substitution gas, in order and by turns, to a processing vessel in which an interior processing space is evacuated so as to become a vacuum atmosphere; an evacuation mechanism that evacuates the plasma generation chamber; and a supply destination changing valve that is provided on an evacuation path connecting the plasma generation chamber and the evacuation mechanism, and opens and closes such that the supply destination of the plasma-activated second processing gas switches between a downstream side of the evacuation path, and the processing space.

Abstract: The current disclosure relates to methods of depositing transition metal on a substrate. The disclosure further relates to a transition metal layer, to a structure and to a device comprising a transition metal layer. In the method, transition metal is deposited on a substrate by a cyclical deposition process, and the method comprises providing a substrate in a reaction chamber, providing a transition metal precursor to the reaction chamber in a vapor phase and providing a reactant to the reaction chamber in a vapor phase to form transition metal on the substrate. The transition metal precursor comprises a transition metal from any of groups 4 to 6, and the reactant comprises a group 14 element selected from Si, Ge or Sn.

Abstract: Herein disclosed are systems and methods related to delivery systems using solid source chemical fill vessels. The delivery system can include a vapor deposition reactor, two or more fill vessels, of which one of more can be remote from the vapor deposition reactor. Each fill vessel is configured to hold solid source chemical reactant therein. An interconnect line or conduit can fluidly connect the vapor deposition reactor with one or more of the fill vessels. A line heater can heat at least a portion of the interconnect line to at least a minimum line temperature.

Abstract: A tooling assembly suitable for use in infiltrating a fibrous preform comprises an outer tooling fixture and an inner tooling fixture. The outer tooling fixture comprises a first portion removably attached to a second portion, and a first pair of oppositely disposed windows defined by the first portion and the second portion. Each of the first portion and the second portion comprise a base with a recess. The inner tooling fixture comprises a body defined by at least one portion, the body configured to at least partially surround the fibrous preform, a plurality of holes extending through a thickness of the at least one portion, each hole of the plurality of holes having a length (L) and a diameter (D), and a first neck region engageable with a recess of the first portion or the second portion.

Abstract: A substrate retaining apparatus, a load lock assembly comprising the substrate retaining apparatus, and a system including the substrate retaining apparatus are disclosed. The substrate retaining apparatus can include at least one sidewall and one or more heat shields. One or more of the at least one sidewall can include a cooling fluid conduit to facilitate cooling of substrates retained by the substrate retaining apparatus. Additionally or alternatively, one or more of the at least one sidewall can include a gas conduit to provide gas to a surface of a retained substrate.

Abstract: Provided in the present disclosure are a PECVD coating system and coating method. In the coating method, deposition is performed on a surface of a substrate by means of a PECVD coating device so as to form an organic hydrophobic membrane, and deposition and coating involve the steps of: (A) providing an inductively coupled electric field for a reaction cavity of the PECVD coating device by means of an ICP generator of the PECVD coating device, so as to form a coupled magnetic field; and (B) providing a bias electric field for the reaction cavity by means of a bias power supply of the PECVD coating device.

Abstract: A method for more easily improving adhesion of an yttrium-based thin film to an aluminum substrate in a coated aluminum member having the yttrium-based thin film formed on the aluminum substrate is provided. A method for improving adhesion of an yttrium-based thin film to an aluminum substrate in a coated aluminum member having the yttrium-based thin film formed on the aluminum substrate comprises a BHF treatment step of bringing a surface of the yttrium-based thin film into contact with a buffered hydrofluoric acid solution.

Abstract: Methods of forming a structural color metal-dielectric-metal (MDM) component via a solution-based process are provided. First, a first metal layer is formed over a treated surface of a substrate by a first electroless deposition process. A surface of the treated substrate is contacted with a first plating bath that comprises a metal selected from the group consisting of: copper, aluminum, silver, alloys, and combinations thereof. A dielectric layer, for example, comprising silicon dioxide, is then deposited over the first metal layer by a sol-gel process. Next, the method comprises forming a second metal layer over the dielectric layer by a second electroless deposition process by contacting the dielectric layer with a second plating bath having a neutral pH and comprising a metal selected from the group consisting of: copper, aluminum, silver, alloys, and combinations thereof.

Abstract: The present invention relates to a leveling agent and an electrolytic composition comprising the same. When the via hole in the substrate is filled with the electrolytic composition according to the present invention, the via hole can be filled within a relatively short time while minimizing the formation of dimples or voids.

Abstract: Methods of forming a coating system on a surface of a cobalt-based superalloy component are provided. The method includes forming a nickel-based primer layer on the surface of the cobalt-based superalloy component; forming an intermediate nickel-containing layer on the nickel-based primer layer; and heat treating the cobalt-based superalloy component to form a diffusion coating on the surface of the cobalt-based superalloy component. The intermediate nickel-containing layer includes nickel, chromium, and aluminum. Coated cobalt-based superalloy components formed from such a method are also provided.

Abstract: A coated and plated steel sheet or coated and plated steel strip including: a steel sheet or a steel strip; a plating layer provided on one surface or both surfaces of the steel sheet or steel strip and containing zinc; a chemical conversion coating provided on the plating layer provided on one surface of the steel sheet or steel strip or provided on at least one of the plating layers provided on both surfaces of the steel sheet or steel strip; and a single-layer or multilayer coating film provided on the chemical conversion coating, in which the single-layer coating film in contact with the chemical conversion coating or the coating film, of the multilayer coating film, which is in contact with the chemical conversion coating, contains a cerium compound capable of being dissolved in an amount of 0.10 g or more with respect to 100 g of water at room temperature at a concentration of from 0.01 to 10.

Abstract: Metal corrosion is a ubiquitous phenomenon costing the global economy, trillions of dollars annually. Conventional corrosion inhibitor compounds are either not so effective or require huge amount of inhibitor for adequate protection. The present disclosure addresses the problem of acid corrosion of iron and iron alloys which is relevant for a wide variety of industries such as oil and gas production and acid pickling etc. The technical solution provided in the present disclosure is a new corrosion inhibitor composition including Naphthalene-1-thiocarboxamide for iron and iron alloys in HCl media. This is specifically relevant for acid well stimulation in the oil and gas industries.

Abstract: The present invention relates to a method for providing corrosion protection to a pressurized water-steam system using N-acylsarcosines or a salt thereof in very low amounts and to a method for determining the concentration of an N-acylsarcosine in an aqueous solution or emulsion.

Abstract: The acid-induced steel corrosion inhibitor based on rotten eggs provides a corrosion inhibitor that is biodegradable, has low toxicity, is water-soluble, easily produced, and is low-cost through the use of waste material, namely, white eggs (EWs). The corrosion inhibitor is added to a corrosive medium in an aqueous medium to protect the metal surfaces and steel interfaces on metal production equipment, such as pumps, tubing, and casing. The corrosion inhibitor based on rotten white eggs is loaded with metal nanoparticles (EWMNPs). The eco-friendly less destructive corrosion inhibitors based on metal nanoparticles synthesized with rotten white eggs are efficient to protect steel from corrosion, while still dissolving in oil streams produced without or with salt water and being soluble in acidic mediums containing chlorides. The corrosion inhibitors have low toxicity to marine life when discharged into the ocean, thereby protecting the marine life, particularly near the system's drain.

Abstract: The acid-induced steel corrosion inhibitor based on rotten eggs provides a corrosion inhibitor that is biodegradable, has low toxicity, is water-soluble, easily produced, and is low-cost through the use of waste material, namely, white eggs (EWs). The corrosion inhibitor is added to a corrosive medium in an aqueous medium to protect the metal surfaces and steel interfaces on metal production equipment, such as pumps, tubing, and casing. The corrosion inhibitor based on rotten white eggs is loaded with metal nanoparticles (EWMNPs). The eco-friendly less destructive corrosion inhibitors based on metal nanoparticles synthesized with rotten white eggs are efficient to protect steel from corrosion, while still dissolving in oil streams produced without or with salt water and being soluble in acidic mediums containing chlorides. The corrosion inhibitors have low toxicity to marine life when discharged into the ocean, thereby protecting the marine life, particularly near the system's drain.

Abstract: A reducing agent composition for iron oxide and/or iron hydroxide comprising components (A) to (C) and having a pH within a range from 7 to 11, wherein when the component (A) is dissolved in an aqueous solution containing the components (B) and (C), a redox potential reaches ?600 mV or less within 20 minutes after the dissolution of the component (A) is started, and a rate of change in redox potential reaches a value of 0 mV or more per minute within 60 minutes after the dissolution of the component (A) is started; and a method for reducing iron oxide and/or iron hydroxide, comprising bringing the reducing agent composition into contact with iron oxide and/or iron hydroxide. (A): Reducing agent; (B): Water-soluble metal chelating agent; and (C): Amine compound.

Abstract: Power is provided to an electrochemical cell. The electrochemical cell includes an anode side and a cathode side. Hydrogen sulfide in a liquid state is flowed to the anode side. An operating temperature and an operating pressure are maintained within the anode side, such that the hydrogen sulfide in the anode side is at a supercritical state. Providing power to the electrochemical cell facilitates electrolysis of the hydrogen sulfide to produce sulfur and protons on the anode side. Providing power to the electrochemical cell facilitates reduction of protons to produce hydrogen on the cathode side. A membrane separating the anode side from the cathode side prevents flow of hydrogen sulfide and sulfur from passing through the membrane while allowing hydrogen cations to pass through the membrane. Sulfur is flowed out of the anode side. Hydrogen is flowed out of the cathode side.

Abstract: Power is provided to an electrochemical cell. The electrochemical cell includes an anode side and a cathode side. Hydrogen sulfide in a liquid state is flowed to the anode side. Providing power to the electrochemical cell facilitates electrolysis of the hydrogen sulfide to produce sulfur and protons on the anode side. Providing power to the electrochemical cell facilitates reduction of protons to produce hydrogen on the cathode side. A membrane separating the anode side from the cathode side prevents flow of hydrogen sulfide and sulfur from passing through the membrane while allowing hydrogen cations to pass through the membrane. Sulfur is flowed out of the anode side. Hydrogen is flowed out of the cathode side.

Abstract: Power is provided to an electrochemical cell. The electrochemical cell includes an anode side and a cathode side. A solution is flowed to the anode side. The solution includes hydrogen sulfide dissolved in water. Water is flowed to the cathode side. The water flowed to the cathode side can be in the form of steam. Providing power to the electrochemical cell facilitates production of sulfur dioxide on the anode side. Providing power to the electrochemical cell facilitates production of hydrogen on the cathode side. A membrane separating the anode side from the cathode side prevents flow of hydrogen sulfide, water, and sulfur dioxide from passing through the membrane while allowing hydrogen cations and oxygen anions to pass through the membrane. Sulfur dioxide is flowed out of the anode side. Hydrogen is flowed out of the cathode side.

Abstract: A water electrolysis cell includes an electrolyte membrane that is sandwiched between two catalyst layers, the two catalyst layers, two microporous layers each of which is disposed adjacent to a surface of each of the catalyst layers opposite to the electrolyte membrane side, two gas diffusion layers each of which is disposed adjacent to a surface of each of the microporous layers opposite to the catalyst layer side, and two separators each of which is disposed adjacent to a surface of each of the gas diffusion layers opposite to the microporous layer side. In the water electrolysis cell, an area of one of an oxygen electrode and a hydrogen electrode is smaller than an area of the other, and adhesion strength between each of the microporous layers and each of the catalyst layers is higher than that between each of the gas diffusion layers and each of the microporous layers.

Abstract: Systems and methods for electrochemical hydrogen looping cells are described. Generating a pH swing can expedite carbon dioxide capture from oceanwater. Many embodiments implement electrochemical hydrogen looping cells that simultaneously produce acid via anodic hydrogen oxidation and base via cathodic hydrogen evolution to generate a pH change.

Abstract: Herein discussed is a method of producing hydrogen comprising: providing a tubular reactor having an open end and a closed end, wherein the reactor comprises an anode on the inside and a cathode on the outside separated by and in contact with a mixed conducting electrolyte, wherein the electrolyte comprises an electronically conducting phase and an ionically conducting phase, wherein the reactor comprises no current collector or interconnect; introducing a hydrocarbon and an oxidant into a feed tube, wherein the feed tube contains a catalyst that promotes catalytic partial oxidation (CPOX) reactions, wherein the feed tube extends into the open end of the reactor and toward the closed end of the reactor; introducing steam to the outside of the tubular reactor; and converting steam to hydrogen electrochemically without electricity input.

Abstract: A method of operating an electrochemical device includes the steps of: applying a first adsorption voltage to a function electrode while supplying a predetermined gas to the function electrode; and switching the first adsorption voltage to a second adsorption voltage higher than the first adsorption voltage while maintaining the supply of the predetermined gas to the function electrode.

Abstract: Chemical reaction devices involving acid and/or base, and related systems and methods, are generally described.

Abstract: An electrolysis cell for chlor-alkali electrolysis, including an anode chamber for accommodating an anode and for accommodating an electrolytic solution, wherein the anode chamber includes a circulation structure for improving circulation of the electrolytic solution and at least one baffle plate for improving horizontal homogeneity of the electrolytic solution.

Abstract: A control unit is configured to communicate with a terminal owned by a power company. When a hydrogen generation request is received from the terminal, the control unit determines whether hydrogen is to be generated based on a state of a hydrogen generation device, and transmits a determination result to the terminal. When a power sale request is received from the terminal, the control unit determines whether power is to be sold based on a state of the hydrogen generation device, and transmits a determination result to the terminal.

Abstract: An electrolyser for carbon dioxide reduction, having an electrolytic cell, with a cathode gas diffusion electrode and an anode gas diffusion electrode, in which a first side of the cathode gas diffusion electrode adjoins a cathode gas chamber in a planar manner and likewise a first side of the anode gas diffusion electrode adjoins an anode gas chamber, and an electrolyte chamber common to both gas diffusion electrodes is provided, which extends from the cathode gas diffusion electrode to the anode gas diffusion electrode and is at least partially delimited by the two gas diffusion electrodes with their second sides facing away from the respectively associated gas chambers.

Abstract: Provided herein are membrane electrode assemblies (MEAs) for COx reduction. According to various embodiments, the MEAs are configured to address challenges particular to COx including managing water in the MEA. Bipolar and anion-exchange membrane (AEM)-only MEAs are described along with components thereof and related methods of fabrication.

Abstract: In this electrochemical reduction method, CO2 is electrochemically reduced in a state where a solution having a pH of 5 to 15 and the CO2 have been brought into contact with a catalyst containing an oxide containing Ti.

Abstract: An electrode of an embodiment includes: a power feeder layer including an electric conductive material, the power feeder layer including a porous structure including porosity of 40% or more and 60% or less; and a catalyst layer provided on the power feeder layer, the catalyst layer including a porous catalyst layer including a porous precious metal or sheet-like precious metal.