Abstract: A method includes performing a reactant step of a deposition cycle of a deposition process to form a molybdenum (Mo)-based material, performing a Mo precursor step of the deposition cycle, and performing a treatment step of the deposition cycle. Performing the reactant step includes introducing a reactant, performing the Mo precursor step includes introducing a Mo precursor, and performing the treatment step includes introducing a treatment gas. The deposition process is performed at a temperature that is less than or equal to about 450° C.

Abstract: An IZO material film manufacturing method is provided. The IZO material film manufacturing method comprises the steps of: preparing a substrate; reacting a first precursor, which comprises indium (In), and a first reactant, which comprises plasma, thereby forming, on the substrate, a first material film comprising indium oxide; and reacting a second precursor, which comprises zinc (Zn), and a second reactant, which comprises plasma, thereby forming, on the first material film, a second material film comprising zinc oxide, and may comprise performing, multiple times, each of the step of forming the first material film and the step of forming the second material film, and controlling the proportion of the number of repetitions of the step of forming the second material film to the number of repetitions of the step of forming the first material film, thereby controlling the crystal growth of an IZO material film in which the first material film and the second material film are stacked.

Abstract: A semiconductor processing tool includes: a process chamber into which a semiconductor wafer is loaded; a support for securing the wafer loaded into the chamber tool; an inlet which introduces a first gas into the chamber for processing the wafer; and an exhaust system that exhausts gas from the chamber. The exhaust system includes: a first line coupled to the chamber to exhaust gas from the chamber; and a pump to draw gas through the first line from the chamber. The tool further includes a heating module having: a second line coupled to the first and a supply of a second gas, the second gas being flowed through the second line from the supply into the first line; and a heating element contained in the second line, the heating element heating the second gas in the second line before the second gas is flowed into the first line.

Abstract: A technique that includes: a processing container in which a substrate is processed; a processing gas supplier that supplies a processing gas with which the substrate is processed; a processing gas supply pipe that is connected to the processing gas supplier and the processing container and through which the processing gas is supplied to the processing container, an exhauster that is provided on the processing gas supply pipe; and a controller for controlling the exhauster to discharges a remaining gas in the processing gas supply pipe out of the processing gas supply pipe.

Abstract: Processing chambers and methods of use comprising a plurality of processing regions bounded around an outer peripheral edge by one or more vacuum channel. A first processing region has a first vacuum channel with a first outer diameter and a second processing region has a second vacuum channel with a second outer diameter, the first outer diameter being less than the second outer diameter.

Abstract: A solid source chemical vaporizer, an assembly of solid source chemical vaporizers, a substrate processing system comprising the solid source chemical vaporizer or the assembly and a method of forming a layer is disclosed. Embodiments of the presently described solid source chemical vaporizer comprise a vessel, a gas inlet, a gas outlet and a channel.

Abstract: A precursor container apparatus, comprising a first volume to house precursor material, a second volume separated from the first volume by a partition wall eliminating gas exchange between the first and second volumes. The precursor container apparatus further comprises a route for the precursor material from the first volume to the second volume and an arrangement configured to raise a surface level of the precursor material via the route into the second volume and to maintain the surface level at a pre-determined level within the second volume.

Abstract: The invention relates to a chemical vapor deposition head of a tubular substrate comprising: a first opening for receiving a first precursor, a second opening for receiving a second precursor, a third opening for receiving an inert gas stream, a first distribution duct network connecting the first opening to a first group of holes extending over an inner section of the head, a second distribution duct network connecting the second opening to a second group of holes extending over the inner section of the head, a third distribution duct network connecting the third opening to a third group of holes extending over the inner section of the opening, a hole of the first or second group of holes being adjacent on either sides to a hole of the third group of holes, the first, second, and third distribution duct networks each having at least one first, second, and third expansion prechamber, the tubular substrate performing a relative back-and-forth movement.

Abstract: Methods for depositing metal films using a metal halide and metal organic precursors are described. The substrate is exposed to a first metal precursor and a second metal precursor to form the metal film. The exposures can be sequential or simultaneous. The metal films are relatively pure with a low carbon content.

Abstract: Provided is a reactive material, including a compound represented by the following general formula (1) or (2). In the formula (1), R1, R2, R3, and R4 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or an electron-withdrawing group, provided that at least one of R1, R2, R3, or R4 represents the electron-withdrawing group. In the formula (2), R5 and R6 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or an electron-withdrawing group, provided that at least one of R5 or R6 represents the electron-withdrawing group.

Abstract: A method and processing chamber for plenum driven hydroxyl combustion oxidation. A mixture is produced in a plenum. The mixture includes a first reactive gas injected from a first inlet and a second reactive gas injected from a second inlet. The mixture is injected towards a substrate of a processing chamber at a jet gas velocity greater than a flame gas velocity. A radical is produced as a function of the first gas and the second gas while heating the chamber.

Abstract: An alignment assembly includes a sensor and a lid that includes a first window. The alignment assembly also includes a rotary joint coupled to the lid. The alignment assembly also includes a jig coupled to the rotary joint and pivotable relative to the lid about the rotary joint. The jig includes an extendable arm that is moveable from a retracted position where the sensor is disposed in a first position above the first window to an extended position where the sensor is disposed at a second position above the first window. The alignment assembly also includes a lock configured to selectively pivotably lock the jig to the lid and also to selectively lock the extendable arm in the retracted position or the extended position.

Abstract: An system, method and software for controlling processes of an auto-refill system of an ampoule including one or more sensors configured to determine one or more liquid level heights within the ampoule. The auto-refill system having a state machine configured to control the auto-refill system, the state machine having one or more states for refilling the ampoule.

Abstract: The present invention addresses the problem of providing a method for manufacturing a plated composite material, the method being capable of forming a plating layer having good adhesiveness to each of a plurality of resin parts each including a different resin. The method for manufacturing a plated composite material for solving the aforementioned problem includes: a step for preparing a composite material having a heat-resistant resin part and a silicone resin part; a step for treating, with an alkaline solution, a plating region of the composite material; a step for irradiating plasma on the plating region; a step for bringing the plating region in contact with a cationic catalyst-containing liquid; and a step for performing an electroless plating treatment on the plating region. The plating region includes at least a portion of the heat-resistant resin part and at least a portion of the silicone resin part.

Abstract: Provided is a hexavalent chromium-free water-based surface treatment solution used for treating metal surfaces. The hexavalent chromium-free water-based surface treatment solution comprises trivalent chromium ion, phosphate ion, sulfate ion, and colloidal silica, wherein the molar ratio of the phosphate ion to the trivalent chromium ion is 1.9-3.2 and the molar ratio of the sulfate ion to the trivalent chromium ion is 0.10-0.30.

Abstract: A fluoride ion cleaning system includes a retort for cleaning at least one component via a working fluid supplied to the retort, a post-retort subsystem for processing a post-retort fluid stream exiting the retort at a first temperature, and a scrubber downstream from the post-retort subsystem. The post-retort subsystem includes a separator in flow communication with the retort. The separator includes an inlet for receiving the post-retort fluid stream from the retort and an outlet for the post-retort fluid stream exiting the separator. The post-retort subsystem also includes a cooling device for selectively cooling the post-retort fluid stream to a second temperature, the second temperature being lower than the first temperature. The second temperature enables particulate to be separated from the post-retort fluid stream within the separator.

Abstract: An electrolysis cell 20 includes: a cathode 31 to reduce a reducible gas; an anode 41 to oxidize an oxidizable substance in an electrolytic solution, the cathode 41 containing titanium; and a separator 50 separating the cathode 31 from the anode 41. The separator 50 includes a porous membrane. The porous membrane gives a pore size distribution defined by a graph having a horizontal axis and a vertical axis, the horizontal axis representing pore sizes of through holes of the porous membrane, the pore sizes being determined by using a porometer, the vertical axis representing a pore size flow distribution of pore volumes corresponding to the pore sizes, and the pore size distribution having a peak top in a range of not less than 0.01 ?m nor more than 0.3 ?m. The porous membrane has an ISO air permeance of not less than 0.8 ?m/Pa·s nor more than 150 ?m/Pa·s.

Abstract: A method for the continuous production of graphene. The method includes flowing a suspension of graphite particles into a conductive, open-cell porous material that is disposed within a reaction vessel, applying a cathodic potential to the conductive, open-cell porous material, wherein the cathodic potential suffices to exfoliate graphene, and flowing a suspension of the exfoliated graphene out from the conductive, open-cell porous material.

Abstract: A method for producing one or more hydroxide solids includes providing a catholyte comprising an electrolyte solution; contacting the catholyte with an electroactive mesh cathode to electrolytically generate hydroxide ions, thereby precipitating the one or more hydroxide solid(s); and removing the one or more hydroxide solids from the surface of the mesh where they may deposit.

Abstract: There are provided a CO production device and a CO2 electrolysis device which allow a promotion of effective use of CO2 and a reduction in emission of CO2 into the air. A CO production device and CO2 electrolysis device 1 of an embodiment includes: a CO2 electrolysis apparatus 3 including a cathode 6 which electrolyzes CO2 to produce CO and an anode 7 which oxidizes a substance to be oxidized to produce an oxide; a CO purifier 4 which purifies CO from a gas containing CO supplied from the CO2 electrolysis apparatus 3; and a H2 purifier 5 which purifies H2 from a CO-extracted residual gas discharged from the CO purifier.

Abstract: Described is a method is to improve catalytic activity and selectivity for electrochemical CO2-to-methanol and CO-to-methanol conversions by employing acidic electrolyte cations that can facilitate proton transfer during the electrocatalytic conversion reactions.

Abstract: An electrolyzer has an electrolytic cell with a membrane that surrounds an interior channel. The electrolytic cell also has a first electrode positioned in the interior channel such that the membrane surrounds the first electrode. The electrolytic cell also includes a second electrode positioned such that the membrane is located between the first electrode and the second electrode.

Abstract: A method by which an environmental energy (e.g., wave energy) is harvested, converted into electrical power, and thereafter used to electrolyze seawater into hydrogen and chlorine gases. Those gases are recombined into hydrogen chloride from which is formed hydrochloric acid solution which is diluted and deposited at a depth sufficient to ensure its neutralization and sequestration for a significant period of time (e.g., for over a millennium). By removing chloride ions from a portion of the sea adjacent to its upper surface and depositing them into a portion of the sea more adjacent to its bottom, acidity is shifted from the surface to base of the sea, and the surface ocean is given a greater ability to absorb and buffer atmospheric carbon dioxide without a corresponding increase in acidity.

Abstract: An electrode and in particular an electrode suitable for use as a cathode for hydrogen evolution in industrial electrolytic processes and a method for its preparation. The electrode comprises a metal substrate provided with a catalytic coating, the catalytic coating comprising a first protective layer in direct contact with the substrate, the first protective layer comprising platinum, in the form of metal or its oxides, and a second layer applied on top of the first protective layer, the second layer comprising platinum, palladium and an element selected from the group of rare earths, in the form of metals or their oxides, wherein the second layer comprises 15-40% by weight of platinum and 10-30% by weight of palladium and 40-75% by weight of an element selected from the group of rare earths referred to metals.

Abstract: An alkaline electrochemical cell component includes a bulk portion and a surface portion including a conductive, electrochemically and chemically stable material having one or more compounds of formula (I): La(Ni1-xCux)O3 (I), where 0<=x<=1, the electrochemical cell having a pH>7.

Abstract: A family of catalysts for oxygen evolution reaction (OER) in alkaline condition is disclosed. The catalysts utilize elements which are abundant on earth, leading to lower costs compared to IrO2 catalysts. The catalysts can be used in the anode of an anion exchange membrane-based water electrolyzer. The family of new catalysts comprises Ni, Fe, M, B, and O, where M is a metal from Group VIB, Group VIII, and elements 57-71 of the Periodic Table. The catalyst has a layered double hydroxide structure. Methods of making the catalysts are also described.

Abstract: An electrochemical cell includes a hydrogen electrode layer, an oxygen electrode layer, and an electrolyte layer disposed between the hydrogen electrode layer and the oxygen electrode layer. The hydrogen electrode layer is constituted by a perovskite type oxide, gadolinium-doped ceria and nickel. The perovskite type oxide includes gadolinium, chromium, and manganese.

Abstract: Disclosed is a technique for reducing CO2 to oxalate utilizing a copper-free, nickel-enhanced electrocatalyst (such as a nickel-enhanced (Cr2O3)3(Ga2O3) electrocatalyst) that can be used for producing, e.g., 1-butanol, in exceedingly high yields. Disclosed herein are various synthetic methodologies for introducing nickel into the electrocatalysts, and described is the characterization, and optimization of the Ni enhanced electrocatalysts for the reduction of CO2 to 1-butanol with a maximum faradaic efficiency ?max of 64%, at an overpotential of 900 mV (?1.48 V vs Ag/AgCl), and having an onset overpotential of 320 mV. The product selectivity is potential dependent with other C2+ products such as 3-hydroxybutanal, (?max 63%) at an overpotential of 890 mV (?1.4 V vs Ag/AgCl); acetic acid with ?max 18% at an overpotential of 390 mV (?1.0 V vs Ag/AgCl); and acetone with ?max 10% at an overpotential of 620 mV (?1.2 V).

Abstract: The present disclosure provides a cathode electrode in which selectivity of hydrogen decreases and selectivity of a carbon dioxide reduction product increases in a catalytic reaction producing carbon monoxide, an olefinic hydrocarbon such as ethylene, and an alcohol such as ethanol by a reduction reaction of carbon dioxide. A cathode electrode that electrically reduces carbon dioxide, including: a first layer containing cuprous oxide, copper, and at least one additional metal element selected from the group consisting of silver, gold, zinc, cadmium, and tin; and a second layer formed on the first layer and containing a constituent element composed of at least one metal element selected from the group consisting of copper, silver, gold, zinc, cadmium, and tin.

Abstract: A method for manufacturing an electrolytic copper foil according to one embodiment of the present disclosure includes: preparing an electrolyte containing copper ion and nickel ion by dissolving copper (Cu) and nickel (Ni) in sulfuric acid; and forming a copper layer by supplying an electric current to a positive plate and a negative electrode rotating drum disposed apart from each other in the electrolyte. The concentration of the nickel ion is 50 ppm to 350 ppm.

Abstract: A plating material includes a metal base material and a silver-tin alloy plating layer being arranged on the metal base material and containing a silver-tin alloy. Further, the silver-tin alloy plating layer contains crystal grains of Ag3Sn, and a ratio of grains of Sn per observed area is equal to or greater than 2.0% and equal to or less than 11.0% when the crystal grains of Ag3Sn are arranged isotropically, and a cross-section of the silver-tin alloy plating layer is observed with an FE-SEM.

Abstract: Manufacturers, particularly manufacturers of parts for aerospace applications, may use a plating mask. Plating masks may be used to mask a metallic part during etching and plating. The present disclosure describes a temporary plating mask that may comprise a hydrocarbon resin and a styrene block copolymer. The temporary plating mask may further comprise a tackifier and other additives such as pigments, fillers, dyes, surfactants, or rheology modifiers.

Abstract: A thermal cutting element for a surgical instrument includes a substrate, a Plasma Electrolytic Oxidation (PEO) coating disposed on the substrate, and a heating element disposed on the PEO coating and including first and second end portions adapted to connect to different potentials of electrical energy to heat the heating element. A jaw member of a surgical instrument includes a structural frame including a proximal flange portion and a distal body portion, a jaw housing surrounding the distal body portion of the structural frame, a tissue-treating plate disposed atop the jaw housing and defining a longitudinal slot therethrough along at least a portion of a length thereof, and the thermal cutting element disposed within the longitudinal slot.

Abstract: The present disclosure relates to a method for forming a superhydrophilic oxide film on a pure titanium surface, and has the effect capable of realizing superhydrophilicity with a contact angle of 20° or less by optimizing time and voltage under anodization treatment conditions.

Abstract: The invention discloses a novel cathode conductive roller device for sheet-type plating or sheet-type cleaning machine wherein a cathode conductive roller device is arranged between the soaking tanks (the cathode conductive roller doesn't generate circuit will suffice, no matter being soaked or not soaked in plating solution or electrolyte); an anode plate device is arranged in the soaking tank; a matched conductive plate tank device is arranged below the cathode conductive roller; compared with the prior art, the invention has following advantages: the whole structure is simple and exquisite, the selection, connection and whole working modes of parts are reasonable and complete, and the current is concentrated and uniformly distributed on semiconductor product or circuit board when the method is used for plating or electrolytic degreasing, achieving better product plating or electrolytic degreasing effect.

Abstract: A plating system is provided. The plating system includes an electroplating chamber defining a plating region within which a wafer is plated. The electroplating chamber includes an inlet configured to introduce plating solution into the plating region of the electroplating chamber. The electroplating chamber includes an outlet configured to remove the plating solution from the plating region of the electroplating chamber. The plating system includes a barrier configured to inhibit removal of the plating solution from the plating region.

Abstract: An electrochemical plating apparatus for depositing a conductive material on a wafer includes a cell chamber. The plating solution is provided from a bottom of the cell chamber into the cell chamber. A plurality of openings passes through a sidewall of the cell chamber. A flow regulator is arranged with each of the plurality of openings configured to regulate an overflow amount of the plating solution flowing out through the each of the plurality of openings. The electrochemical plating apparatus further comprises a controller to control the flow regulator such that overflow amounts of the plating solution flowing out through the plurality of openings are substantially equal to each other.

Abstract: A method for regenerating an electrolytic copper plating solution containing a copper ion and at least one additive selected from the group consisting of a brightener, a carrier, and a leveler at least includes: ultraviolet-ozone treatment of oxidizing the electrolytic copper plating solution to decompose an organic impurity in the electrolytic copper plating solution; and activated carbon treatment of bringing activated carbon into contact with the electrolytic copper plating solution which has been subjected to the ultraviolet-ozone treatment to remove the organic impurity in the electrolytic copper plating solution.

Abstract: The present disclosure relates to a radiation reflector assembly for use with a semiconductor processing chamber and a substrate processing system having the radiation reflector assembly. The radiation reflector assembly includes a shell body that includes an interior cylindrical wall; and a reflector disk that includes a center hole, a bottom reflective surface, and a top surface. The reflector disk is disposed within and spaced from the interior cylindrical wall in a manner that permits fluid to flow therebetween. The radiation reflector assembly includes an actuator coupled to the reflector disk, and the actuator is operable to axially displace the reflector disk relative to the shell body. The radiation reflector assembly includes an elongated tube extending through the center hole of the reflector disk. A method of processing a substrate with the radiation reflector assembly is also described.

Abstract: An epitaxial growth processing chamber with a component having a macrocell support structure configured with interconnecting physical supports that define fluidly-connected pores is described. A component configured for use in an epitaxial growth processing chamber having a macrocell support structure configured with interconnecting physical supports that define fluidly-connected pores is also described. The component is a baseplate, an exhaust cap, an injection ring, an injection cap, a lower reflector, an upper reflector, a lower heat shield, an upper heat shield, a cone reflector, or combinations thereof. In some instances, the component may further include an inlet flow port. In some other instances, the component may further include an inlet flow port, outlet flow port and a fluid flow wall, and optionally a fluid flow baffle, and optionally a reflective surface.

Abstract: A batch mode SiC (Silicon Carbide) epitaxial reactor comprising an inlet gas manifold, an inlet heat exchanger coupled to the inlet gas manifold, a plurality of removable vertical susceptors configured to couple to the inlet heat exchanger, a plurality of exhaust heat exchangers coupled to the plurality of removable vertical susceptors, and a scrubber coupled to the plurality of exhaust heat exchangers. Each removable vertical susceptor is configured to hold at least two SiC wafers tilted in a vertical fixed position relative to a flow of heated gases output by the inlet heat exchanger. The plurality of exhaust heat exchangers are configured to heat hydrogen gas. The heated hydrogen gas is configured to couple to the inlet heat exchanger to heat gases provided through the inlet gas manifold to grow SiC on the plurality of SiC wafers in the plurality of removable vertical susceptors thereby reducing energy consumption.

Abstract: Embodiments of the present disclosure relate to gas exhaust frames including pathways having size variations, for use in a substrate processing chamber, and related apparatus and methods. In one or more embodiments, a processing chamber includes a chamber body, and a window. The processing chamber includes one or more heat sources, a substrate support, a liner, and a pre-heat ring. The processing chamber includes one or more gas inlets, and a first set of exhaust pathways positioned on a first side of a reference plane. The first set of exhaust pathways have a first cross-sectional area gradient that increases along a first direction. The processing chamber includes a second set of exhaust pathways positioned on a second side of the reference plane. The second set of exhaust pathways have a second cross-sectional area gradient that increases along a second direction that is opposite of the first direction.

Abstract: The present inventions relate to methods of preparing highly concentrated monoclonal antibody (mAb) formulations, including screening and selection of excipients to include in mAb formulation. Excipients include amino acids, salts and polyols.

Abstract: A thread production system has a workstation with, in each case one after another on a processing path, a melt-spinning device with multiple melt nozzles, a thread inlet section, an inlet godet roller pair located at the end of a thread inlet section, a thread drawing device with two hot godet roller pairs which are arranged on a drawing panel frame of the thread production system, and a one take-up reel. The free godet roller ends of a first hot godet roller pair of the thread drawing device on the processing path protrude into an identical first half space as free godet roller ends of the inlet godet roller pair. Here, a rotational axis of a first godet roller of the inlet godet roller pair on the processing path is oriented at an angle of from 0° to 45° with respect to the longitudinal orientation of the nozzle row.

Abstract: Disclosed herein is the production of medical textile material with nanofiber surface that has transdermal drug release properties and that is coated with azithromycin active substance by using needle electrospinning method and ultrasonic spray pyrolysis (USP) technique. Specifically disclosed is a nanofiber medical textile material production method that includes the steps of preparing polymer solutions containing PVP (polyvinylpyrrolidone) with a concentration of 12 wt % and GEL (gelatin) with a concentration of 0.

Abstract: A thermoplastic elastomer-based monofilament yarn and a method of making a thermoplastic elastomer-based monofilament yarn are disclosed. The monofilament yarn comprises a filament that contains an axial core about which two or more lobes are radially disposed. The filament comprises a thermoplastic elastomer composition comprising a thermoplastic elastomer that exhibits a flexural modulus of about 300 MPa or less as determined in accordance with ISO 178:2019 at a temperature of about 23° C. The yarn exhibits a linear density of from about 1 to about 2000 denier per filament and exhibits an elongation at break of about 300% or more as determined in accordance with ASTM D2653-07 (2018) at a temperature of about 23° C.

Abstract: A conjugate fiber bundle formed of conjugate fibers, each of which includes at least two types of polymers having different melting points, in which a coefficient of variation CV of a value of (distance between polymer gravity centers/fiber diameter) between the conjugate fibers is 5% to 30%.

Abstract: A process for preparing a carbon fiber precursor is hereby disclosed, wherein the precursor is selected from a series of solid PAN (polyacrylonitrile) fibers, wherein each member of the series contains about 0.5 mole % to about 8 mole % ammonium salt of 2-acrylamido-2-methyl propane sulfonic acid.

Abstract: A thermoplastic elastomer-based multifilament yarn and a method of making a thermoplastic elastomer-based multifilament yarn are disclosed. The multifilament yarn comprises a first filament that is at least partially adhered to a second filament. The first filament and the second filament are each formed from a thermoplastic elastomer composition comprising a thermoplastic elastomer that exhibits a flexural modulus of about 300 MPa or less as determined in accordance with ISO 178:2019 at a temperature of about 23° C. The yarn has a linear density of from about 1 to about 500 denier per filament and exhibits an elongation at break of about 300% or more as determined in accordance with ASTM D2653-07 (2018) at a temperature of about 23° C.

Abstract: A thermoplastic copolyester elastomer-based yarn and a method of making a thermoplastic copolyester elastomer-based yarn are disclosed. The yarn comprises a filament that is formed from a thermoplastic copolyester elastomer composition comprising a thermoplastic copolyester elastomer containing hard segments and soft segments. The thermoplastic copolyester elastomer exhibits a flexural modulus of about 300 MPa or less as determined in accordance with ISO 178:2019 at a temperature of about 23° C. and a melting temperature of from about 100° C. to about 230° C. as determined in accordance with ISO 11357-3:2018. The yarn has a linear density of from about 1 to about 2000 denier per filament and exhibits an elongation at break of about 300% or more as determined in accordance with ASTM D2653-07(2018) at a temperature of about 23° C.