Abstract: The present disclosure relates to surface-modified zirconia nanoparticles, methods for making and using the same, and high index of refraction films made therefrom. The provided zirconia nanoparticles are surface modified with ligands that include N-hydroxyurea functionalities. The provided ligands also can contain compatibilizing groups that allow the provided surface-modified zirconia nanoparticles to be incorporated into an organic matrix. High index of refraction films can be made using these organic matrices.

Abstract: A process of fabricating a thermal barrier coating and an article having a cold sprayed thermal barrier coating are disclosed. The process includes cold spraying ceramic particles and a binder and forming the thermal barrier coating. The binder has a melting point lower than the ceramic particles. The article includes the cold sprayed thermal barrier coating positioned on a substrate of the article and/or a reproducible feature formed by the cold sprayed thermal barrier coating, with the reproducible feature being capable of being replicated without masking.

Abstract: A transparent dielectric composition comprising tin, oxygen and one of aluminum or magnesium with preferably higher than 15% by weight of aluminum or magnesium offers improved thermal stability over tin oxide with respect to appearance and optical properties under high temperature processes. For example, upon a heat treatment at temperatures higher than 500 C, changes in color and index of refraction of the present transparent dielectric composition are noticeably less than those of tin oxide films of comparable thickness. The transparent dielectric composition can be used in high transmittance, low emissivity coated panels, providing thermal stability so that there are no significant changes in the coating optical and structural properties, such as visible transmission, IR reflectance, microscopic morphological properties, color appearance, and haze characteristics, of the as-coated and heated treated products.

Abstract: This composition for an antireflective film includes a translucent binder, wherein the translucent binder contains either one or both of a polymer type binder and a non-polymer type binder, a content of the translucent binder is in a range of 10 parts by mass to 90 parts by mass with respect to 100 parts by mass of a total amount of components other than a dispersion medium, and a refractive index of an antireflective film which is formed by curing the composition for an antireflective film is in a range of 1.70 to 1.90. This method for manufacturing an antireflective film includes: applying the above-described composition for an antireflective film onto a transparent conductive film by a wet coating method to form an antireflective coating film; and curing the antireflective coating film to form an antireflective film.

Abstract: According to a method of manufacturing a thin film transistor substrate, a composition including a metal oxalate and a solvent for manufacturing an oxide semiconductor is coated to form a thin film, the thin film is annealed, and the thin film is patterned to form a semiconductor pattern.

Abstract: A dispersion of tin-doped indium oxide fine particles has tin-doped indium oxide fine particles, a plasticizer for an interlayer film, an organic solvent containing alcohols as a main component, and a dispersion stabilizer, wherein under measuring conditions of a concentration of tin-doped indium oxide fine particles of 0.7% by weight and an optical path length of a glass cell of 1 mm, a visible light transmittance is 80% or more, a solar radiation transmittance at a wavelength within a range from 300 nm to 2100 nm is ¾ or less of the visible light transmittance, a haze value is 1.0% or less, and a reflection yellow index is ?20 or more.

Abstract: There is provided a hard film excellent in wear resistance. The hard film in accordance with the present invention includes (TiaCrbAlcLd)(BxCyNz) in terms of composition, in which the L is at least one of Si and Y, and the a, b, c, d, x, y, and z each denote the atomic ratio, and satisfy: 0.1?a<0.3; 0.3<b<0.6; 0.2?c<0.35; 0.01?d<0.1; a+b+c+d=1; x?0.1; y?0.1; 0.8?z?1; and x+y+z=1.

Abstract: Described herein are Group 4 metal-containing precursors, compositions comprising Group 4 metal-containing precursors, and deposition processes for fabricating conformal metal containing films on substrates. In one aspect, the Group 4 metal-containing precursors are represented by the following formula I: wherein M comprises a metal chosen from Ti, Zr, and Hf; R and R1 are each independently selected from an alkyl group comprising from 1 to 10 carbon atoms; R2 is an alkyl group comprising from 1 to 10 carbon atoms; R3 is chosen from hydrogen or an alkyl group comprising from 1 to 3 carbon atoms; R4 is an alkyl group comprising from 1 to 6 carbon atoms and wherein R2 and R4 are different alkyl groups. Also described herein are methods for making Group 4 metal-containing precursors and methods for depositing films using the Group 4 metal-containing precursors.

Abstract: A liquid composition is provided for forming a thin film in the form of a mixed composite metal oxide in which a composite oxide B containing copper (Cu) and a composite oxide C containing manganese (Mn) are mixed into a composite metal oxide A represented with the general formula: Ba1-xSrxTiyO3, wherein the molar ratio B/A of the composite oxide B to the composite metal oxide A is within the range of 0.002<B/A<0.05, and the molar ratio C/A of the composite oxide C to the composite metal oxide A is within the range of 0.002<C/A<0.03.

Abstract: The present invention relates to the use of low-volatility compounds in forming deposited layers and to methods for accomplishing such deposition. Particular applicability is in the field of depositing layers for semiconductor devices. A solution made up of low vapor pressure solutes (source materials) and solvents, wherein the solvents have a vapor pressure several orders of magnitude lower than that of the solute is described. The solutions are introduced to a vaporization apparatus configured to enable rapid and efficient vaporization of the solute with minimum evaporation of solvent and minimum decomposition of solute.

Abstract: A method of forming a dielectric material, comprising doping a zirconium oxide material, using a dopant precursor selected from the group consisting of Ti(NMe2)4; Ti(NMeEt)4; Ti(NEt2)4; TiCl4; tBuN?Nb(NEt2)3; tBuN?Nb(NMe2)3; t-BuN?Nb(NEtMe)3; t-AmN?Nb(NEt2)3; t-AmN?Nb(NEtMe)3; t-AmN?Nb(NMe2)3; t-AmN?Nb(OBu-t)3; Nb-13; Nb(NEt2)4; Nb(NEt2)5; Nb(N(CH3)2)5; Nb(OC2H5)5; Nb(thd)(OPr-i)4; SiH(OMe)3; SiCU; Si(NMe2)4; (Me3Si)2NH; GeRax(ORb)4.x wherein x is from 0 to 4, each Ra is independently selected from H or C1-C8 alkyl and each Rb is independently selected from C1-C8 alkyl; GeCl4; Ge(NRa2)4 wherein each Ra is independently selected from H and C1-C8 alkyl; and (Rb3Ge)2NH wherein each Rb is independently selected from C1-C8 alkyl; bis(N,N?-diisopropyl-1,3-propanediamide) titanium; and tetrakis(isopropylmethylamido) titanium; wherein Me is methyl, Et is ethyl, Pr-i is isopropyl, t-Bu is tertiary butyl, t-Am is tertiary amyl, and thd is 2,2,6,6-tetramethyl-3,5-heptanedionate.

Abstract: Room temperature electrochemical methods to deposit thin films of chalcogenide glasses.

Abstract: Disclosed is a liquid chemical for forming a water repellent protective film at least on surfaces of recessed portions of a metal-based wafer, the liquid chemical for forming a water repellent protective film being characterized by comprising a surfactant which has an HLB value of 0.001-10 according to Griffin's method and includes a hydrophobic moiety having a C6-C18 hydrocarbon group and water, and characterized in that the concentration of the surfactant in the liquid chemical is not smaller than 0.00001 mass % and not larger than the saturated concentration relative to 100 mass % of the total amount of the liquid chemical. This liquid chemical can improve a cleaning step which tends to induce a metal-based wafer to cause a pattern collapse.

Abstract: The invention relates to a method for the preparation of aqueous dispersions of TiO2 in the crystalline form anatase, as well as the dispersions obtained with said method, useful for the preparation of photocatalytic coatings for surfaces, and for the photocatalytic decontamination of gases and liquids.

Abstract: High refractive index coatings having metal oxide particles are disclosed. Dispersions of metal oxide particles in solvent are also disclosed. These find use in the protection of surface relief structures. In some disclosed embodiments, the coatings or dispersions contain UV-curable resins. The coatings and dispersions find application in the field of security devices and documents and tokens incorporating security devices.

Abstract: The invention relates to a stable, highly concentrated, aqueous suspension of nanoparticles, particularly of titanium dioxide particles, a method for production, and use of the suspension, e.g. for coating or impregnation, or as an additive in organic or inorganic matrices. The suspension contains a first dispersant based on a polymeric alkoxylate and a second dispersant selected from the group of amino alcohols. The suspension is preferably characterized by the fact that its stability is preserved even during and after vigorous dispersion in an attrition mill and no increase in viscosity occurs. In a preferred embodiment, the viscosity declines by up to 10 to 50% as a function of the milling time. In a further embodiment, the suspension can be dried and subsequently redispersed, without the state of dispersion deteriorating.

Abstract: A method for producing coatings having anti-reflection properties uses a compound comprising at least one type of nanoparticle and at least one solvent. The compound is applied to a substrate and treated at various temperatures. Anti-reflection coatings can be obtained on temperature-sensitive materials such as PMMA or PET.

Abstract: This invention relates to organometallic precursor compounds represented by the formula (H)mM(R)n wherein M is a metal or metalloid, R is the same or different and is a substituted or unsubstituted, saturated or unsaturated, heterocyclic radical containing at least one nitrogen atom, m is from 0 to a value less than the oxidation state of M, n is from 1 to a value equal to the oxidation state of M, and m+n is a value equal to the oxidation state of M, a process for producing the organometallic precursor compounds, and a method for producing a film or coating from the organometallic precursor compounds.

Abstract: Provided herein are mixtures, emulsions and other additives for use in manufacturing gypsum wallboard. The mixtures and emulsions may be wax-based emulsions or wax-free mixtures or emulsions, with wax-based emulsions including water, at least one wax, a dispersant which may include sulfur or a sulfur-containing group, and an additive comprising an organic titanium compound or organic zirconium compound. Mixtures may also be prepared including water, a dispersant; and an additive comprising an organic titanium compound or organic zirconium compound. Gypsum slurries may be prepared using such emulsions and mixtures and/or through addition of an organic titanium compound or organic zirconium compound.

Abstract: The present invention is a siloxane-based resin composition including a siloxane-based resin and an imidosilane compound having a specific structure. Moreover, the present invention is a siloxane-based resin composition including a siloxane-based resin which is a reactive product to be obtained by hydrolyzing an alkoxysilane compound and an imidosilane compound having a specific structure and then making the resulting hydrolysate undergo a condensation reaction. According to the present invention, it is possible to form a cured film excellent in adhesion.

Abstract: A solution composition for forming an oxide thin film may include a first compound including zinc, a second compound including indium, and a third compound including magnesium or hafnium, and an electronic device may include an oxide semiconductor including zinc, indium, and magnesium. The zinc and hafnium may be included at an atomic ratio of about 1:0.01 to about 1:1.

Abstract: Methods for forming doped silane and/or semiconductor thin films, doped liquid phase silane compositions useful in such methods, and doped semiconductor thin films and structures. The composition is generally liquid at ambient temperatures and includes a Group IVA atom source and a dopant source. By irradiating a doped liquid silane during at least part of its deposition, a thin, substantially uniform doped oligomerized/polymerized silane film may be formed on a substrate. Such irradiation is believed to convert the doped silane film into a relatively high-molecular weight species with relatively high viscosity and relatively low volatility, typically by cross-linking, isomerization, oligomerization and/or polymerization. A film formed by the irradiation of doped liquid silanes can later be converted (generally by heating and annealing/recrystallization) into a doped, hydrogenated, amorphous silicon film or a doped, at least partially polycrystalline silicon film suitable for electronic devices.

Abstract: Provided is a non-hydrolytic transparent composite composition having excellent transparency and heat resistance, and a low thermal expansion coefficient. Particularly, the transparent composite composition includes a glass filler dispersed in a crosslinked transparent resin produced by a non-hydrolytic reaction. The non-hydrolytic transparent siloxane resin is a resin having Si—O (siloxane) bonds, a resin having at least one kind of heterometal bonds, including Si—O bonds, or the resin further containing other ingredients. When the transparent siloxane resin produced by a non-hydrolytic reaction forms a composite in combination with the glass filler, the composite realizes high transparency and heat resistance, as well as a low thermal expansion coefficient. Therefore, the transparent composite composition is useful as a substrate for thin film transistor (TFT) devices, display devices and optical devices.

Abstract: A molded oxide product of the present invention contains an oxide region and an organic cross-linked region and has at least a surface layer formed of an inorganic glassy material. The molded oxide product can combine both organic and inorganic advantages such as good workability of organic materials and high weather resistance, heat resistance and hardness of inorganic materials. The molded oxide product can be produced through the following steps: step A for preparing a precursor R2-M-O-M? having a polymerizable functional group-containing organic group R2 and a M-O-M? bond; step B for applying an application liquid containing the precursor; step C for hardening the application liquid by photocuring and/or thermosetting; and step D for performing oxidation treatment on at least a surface layer of the hardened product in such a manner as to convert at least the surface layer of the hardened product to be of inorganic glassy material.

Abstract: The instant invention relates to a method for the color stabilization of cork and specific colored woods by the combined use of a small amount of inorganic UV-absorbers and an excess of organic UV-absorbers in a protective coating. A further aspect of the invention is the use of such a UV-absorber combination for the color stabilization of cork and specific colored woods.

Abstract: Provided is a sealing material suitable for laser sealing, which enhances long-term reliability of an OLED display and the like. The sealing material comprises 80 to 99.7 mass % of an inorganic powder containing SnO-containing glass powder and 0.3 to 20 mass % of a pigment and is used for laser sealing.

Abstract: The present invention provides a sulphur cement pre-composition, comprising sulphur and at least an organotitanate, which organotitanate is of the general molecular formula (1): wherein R1 is CnH(2n)—SaR4 or CmH(2m+1) and n is an integer in the range of from 1 to 4, m is an integer in the range of from 1 to 30 and a is an integer in the range of from 2 to 8, R4 is S, H, or CpH(2p+1) and p is an integer in the range of from 1 to 8, XO is an alkoxy or neoalkoxy group, R2 and R3 are, independently, a CnH(2n)—SaR4, alkyl, neoalkyl, acyl or aryl group. The invention further provides a process for preparing such sulphur cement pre-composition, processes for the preparation of a sulphur cement product, a sulphur cement product and the use of such sulphur cement pre-composition. The invention even further relates to the use of an organotitanate stabilizing agent.

Abstract: A method to prepare a self-decontaminating surface, where that method includes disposing a first coating on a surface, where that first coating comprises an organosilane, and disposing a second coating over the first coating, where the second coating comprises TiO2.

Abstract: Methods of increasing the solubility of a base in supercritical carbon dioxide include forming a complex of a Lewis acid and the base, and dissolving the complex in supercritical carbon dioxide. The Lewis acid is soluble in supercritical carbon dioxide, and the base is substantially insoluble in supercritical carbon dioxide. Methods for increasing the solubility of water in supercritical carbon dioxide include dissolving an acid or a base in supercritical carbon dioxide to form a solution and dissolving water in the solution. The acid or the base is formulated to interact with water to solubilize the water in the supercritical carbon dioxide. Some compositions include supercritical carbon dioxide, a hydrolysable metallic compound, and at least one of an acid and a base. Some compositions include an alkoxide and at least one of an acid and a base.

Abstract: The invention relates to a dielectric protective layer in which nanoparticles are integrated to increase the dielectric constants. Said nanoparticles are surrounded by a protective shell to prevent agglomeration in order to maintain the small particle size for the depositioning of extra-thin film.

Abstract: A nanocomposite coating and a method of coating for protecting a product with the nanocomposite coating are presented. Firstly, the nanocomposite coating is prepared, wherein the nanocomposite coating is formed by mixing 22.5˜49.5% nanometer inorganic oxide gel made by a sol-gel method, 45˜74.25% organic solvent and 1˜10% nanometer powder together. Next, the nanocomposite coating is coated onto surfaces of the product evenly by way of spraying, dipping or roll-to-rolling. Lastly, the product coated with the nanocomposite coating is subjected to a room temperature or a heating environment lower than 170 degrees centigrade to make the nanocomposite coating dry for forming nanometer protective films on the surfaces of the product.

Abstract: A zirconium precursor selected from among compounds of Formulae (I), (II) and (III): wherein: M is Zr, Hf or Ti; R1 is hydrogen or C1-C5 alkyl; each of R2, R? and R? is independently selected from C1-C5 alkyl; and n has a value of 0, 1, 2, 3 or 4. Compounds of such formulae are useful in vapor deposition processes such as atomic layer deposition, to form corresponding metal-containing films, e.g., high k dielectric zirconium films in the fabrication of DRAM memory cells.

Abstract: A dispersion of tin-doped indium oxide fine particles has tin-doped indium oxide fine particles, a plasticizer for an interlayer film, an organic solvent containing alcohols as a main component, and a dispersion stabilizer, wherein under measuring conditions of a concentration of tin-doped indium oxide fine particles of 0.7% by weight and an optical path length of a glass cell of 1 mm, a visible light transmittance is 80% or more, a solar radiation transmittance at a wavelength within a range from 300 nm to 2100 nm is ¾ or less of the visible light transmittance, a haze value is 1.0% or less, and a reflection yellow index is ?20 or more.

Abstract: Disclosed herein are a hard coating film, a material coated with the hard coating film, and a die for cold plastic working, the coating film excelling conventional surface coating layers in wear resistance as well as slidability with a low frictional coefficient. The hard coating film is characterized by a chemical composition of (VxM1-x) (BaCbN1-a-b), where 0.4?x?0.95??(1A) 0?a?0.2??(2A) 0?1-a-b?0.35??(3A) 0.6?b?1??(4A) M denotes at least one species of elements belonging to Groups 4a, 5a, and 6a and Si and Al; and x, 1-x, a, b, and 1-a-b represent respectively the atomic ratio of V, M, B, C, and N.

Abstract: Disclosed are aluminum paste compositions, processes to form solar cells using the aluminum paste compositions, and the solar cells so-produced. The aluminum paste compositions have 0.005-7%, by weight of a metal phosphate; 46-84.9%, by weight of an aluminum powder; and 15-50%, by weight of an organic vehicle, wherein the amounts in % by weight are based on the total weight of the aluminum paste composition.

Abstract: A photoreceptive layer including heterogeneous dyes is provided. The dye fill density is enhanced and light absorption is achieved at a broad wavelength range, which enables the beneficial utilization of the photoreceptive layer in a dye-sensitized solar cell.

Abstract: An object of the present invention is to provide a clay dispersion liquid which is capable of obtaining a clay film which realizes compatibility between heat resistance and water resistance, and a method for producing the same; a clay film and a transparent material, produced from the lay dispersion. The clay dispersion liquid of the present invention contains a liquid containing water as a main component, and a tetraphenylphosphonium-modified clay. The clay film and the transparent material of the present invention are obtained by applying the clay dispersion liquid on a surface of a supporting body to form a film.

Abstract: Disclosed are replenisher compositions and methods of replenishing pretreatment compositions. The methods include adding a replenisher composition to a pretreatment composition wherein the replenisher composition includes (a) a zirconium complex and also optionally includes: (b) a dissolved complex metal fluoride ion wherein the metal ion comprises a Group IIIA metal, Group IVA metal, Group IVB metal, or combinations thereof; (c) a component comprising an oxide, hydroxide, or carbonate of Group IIIA, Group IVA, Group IVB metals; or combinations thereof; and/or (d) a dissolved metal ion comprising a Group IB metal, Group IIB metal, Group VIIB metal, Group VIII metal, Lanthanide Series metal, or combinations thereof.

Abstract: A method for producing coatings having anti-reflection properties uses a compound comprising at least one type of nanoparticle and at least one solvent. The compound is applied to a substrate and treated at various temperatures. Anti-reflection coatings can be obtained on temperature-sensitive materials such as PMMA or PET.

Abstract: An anode provided with an electrocatalytic coating comprising tin, preferably tetravalent and in form of mixed oxide, prepared by the method for the manufacturing of an electrode, comprising applying a solution of a precursor for the pyrolytic formation of a tin-containing coating to a substrate of a valve metal, followed by the execution of thermal treatment, wherein the precursor solution comprises stannic hydroxychloride and a method of preparing the same.

Abstract: Precursors useful for vapor phase deposition processes, e.g., CVD/ALD, to form metal-containing films on substrates. The precursors include, in one class, a central metal atom M to which is coordinated at least one ligand of formula (I): wherein: R1, R2 and R3 are each independently H or ogano moieties; and G1 is an electron donor arm substituent that increases the coordination of the ligand to the central metal atom M; wherein when G1 is aminoalkyl, the substituents on the amino nitrogen are not alkyl, fluoroalkyl, cycloaliphatic, or aryl, and are not connected to form a ring structure containing carbon, oxygen or nitrogen atoms. Also disclosed are ketoester, malonate and other precursors adapted for forming metal-containing films on substrates, suitable for use in the manufacture of microelectronic device products such as semiconductor devices and flat panel displays.

Abstract: This invention pertains to a mesoporous amorphous oxide of titanium and processes of making a mesoporous amorphous oxide of titanium.

Abstract: Under the presence of at least one out of copper, manganese, nickel, cobalt, iron, zinc, and compounds thereof, a tetravalent titanium salt solution and a basic solution are reacted together to form a hydroxide of titanium and the above metal, and then the titanium hydroxide is peroxidated with an oxidizing agent to manufacture an aqueous liquid or dispersion having therein titanium oxide fine particles having peroxy groups; by using this alone to form a coating film adjacent to a coating film of an organic dye or pigment, or using this to form a coating film together with an organic dye or pigment, a drop in decorativeness of color due to fading or discoloration of a coating material, a printed article, a building material, a fiber, an organic polymer resin product or the like can be prevented, and moreover surface anti-soiling and hydrophilic properties can be realized.

Abstract: Compositions including an amido-group-containing vapor deposition precursor and a stabilizing additive are provided. Such compositions have improved thermal stability and increased volatility as compared to the amido-group-containing vapor deposition precursor itself. These compositions are useful in the deposition of thin films, such as by atomic layer deposition.

Abstract: A dielectric-thin-film forming composition for forming a BST dielectric thin film, includes a liquid composition for forming a thin film which takes a form of a mixed composite metal oxide in which a composite oxide B including Cu (copper) is mixed into a composite metal oxide A expressed by a formula: Ba1-xSrxTiyO3 (wherein 0.2<x<0.6 and 0.9<y<1.1), the liquid composition is an organic metal compound solution in which a raw material for composing the composite metal oxide A and a raw material for composing the composite oxide B are dissolved in an organic solvent at a proportion having a metal atom ratio expressed by the formula shown above and a molar ratio between A and B in the range of 0.001?B/A<0.15.

Abstract: A composition with non-Newtonian behaviour which comprises a matrix former and nanoscale solid particles whose surface charge has been increased by reaction with an acid or base, and a process for the preparation thereof. The process is suitable for adjusting the rheology of materials.

Abstract: A film-forming material that is capable of forming, at a low temperature, a film having a high degree of etching resistance and a high etching selectivity ratio relative to an organic film, as well as a method of forming a pattern that uses the film-forming material. The film-forming material includes a metal compound (W) capable of generating a hydroxyl group upon hydrolysis, and a solvent (S) in which the metal compound is dissolved, wherein the solvent (S) includes a solvent (S1) with a boiling point of at least 155° C. that contains no functional groups that react with the metal compound (W). The method of forming a pattern includes the steps of: coating a pattern, which has been formed on top of an organic film of a laminate that includes a substrate and the organic film, using the above film-forming material, and then conducting etching of the organic film using the pattern as a mask.

Abstract: Provided is a method of synthesizing an ITO electron beam resist and a method of forming an ITO pattern. The ITO electron beam resist is synthesized by dissolving indium chloride tetrahydrate and tin chloride dihydrate in 2-ethoxy ethanol. The method of forming an ITO pattern includes: forming an ITO electron beam resist film on a substrate, forming an ITO electron beam resist pattern by patterning the ITO electron beam resist film, and forming an ITO pattern by annealing the ITO electron beam resist pattern.

Abstract: The present invention relates to effect pigments based on thin glass flakes and to a method for the production of such pigments. The resulting pigment can be used in any application for which pearlescent pigments have been heretofore used such as, for example, in plastics, paints, inks, cosmetic formulations, coatings including solvent or waterborne automotive paint systems, powder coatings, inks and agriculture foils.

Abstract: A dielectric coating material system for use in a single-sided back contact solar cell is disclosed. The material system serves to electrically isolate electrodes of opposite polarity types on the same side of a silicon-based solar cell, and includes titanium and phosphorus.