Including A Fully-sealed Or Vacuum-maintained Crystallization Chamber (e.g., Ampoule) Patents (Class 117/216)
  • Patent number: 5580171
    Abstract: There is disclosed a static mixer for intimate mixing of granular solids, a solids flow controller and a solids transfer tube which are useful to mix polycrystalline material with dopant solids, and to feed the resultant mixture continuously and accurately into a modified Czochralski-type furnace for growing single crystal material. The static mixer is a series of conical funnel plates interspaced by thieving divider plates that are formed by a plurality of triangular V-shaped, radial sectors. Contiguous to the static mixer is a storage hopper which has sufficient storage capacity for all the polycrystalline feed material required in a single run of the furnace. Located beneath the hopper is a solids flow controller that is a V-shaped trough which is vibrated along its longitudinal axis. At one end, the trough has a transverse baffle located with a gap between its bottom edge and the bottom of the trough that controls the rate of flow of the solids.
    Type: Grant
    Filed: July 24, 1995
    Date of Patent: December 3, 1996
    Inventors: John C. Lim, William A. Koch, Mohan Chandra
  • Patent number: 5394829
    Abstract: A device for pulling a silicon single crystal is constructed so as to preclude deposition of a SiO-derived substance on graphite parts inside the device and prevent the graphite parts from deterioration, elongate the duration of continuous use of the device in a great measure, and simplify the disassembly and reassembly of the device.This device pulls a silicon single crystal in an atmosphere of inert gas by the Czochralski method, which device is chracterized by comprising a crucible 1 for accommodating a molten silicon mass 2, a heater 3 disposed round the periphery of the crucible 1, an outer member 14 forming a pulling chamber 6 for accomodating the crucible 1, an inert gas inlet part 15 disposed in the upper part of the pulling chamber 6, and an inert gas outlet part 16 separated from the inert gas inlet part 15 in the same upper part of the pulling chamber 6.
    Type: Grant
    Filed: March 23, 1993
    Date of Patent: March 7, 1995
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Toshiharu Uesugi, Koji Mizuishi, Atsushi Iwasaki, Tadashi Niwayama, Tetsuhiro Oda
  • Patent number: 5373807
    Abstract: A method for growing multiple high-purity single crystals from a replenished melt by maintaining the purity of molten source material in the melt held in a crucible in a furnace of the type used for growing high-purity single crystals. The method includes the steps of growing at least one crystal from the source material in the crucible, extracting a portion of a volume of the melt remaining in the crucible, adding high-purity source material to the melt, and growing at least one more single crystal. Extractor apparatus used in the method includes an insulated receptacle having an inlet tube for conducting molten source material into the receptacle. A vacuum attached to the receptacle is used to draw the source material into the receptacle.
    Type: Grant
    Filed: November 8, 1993
    Date of Patent: December 20, 1994
    Assignee: MEMC Electronic Materials, Inc.
    Inventor: John D. Holder
  • Patent number: 5373808
    Abstract: An apparatus and a method are presented for preparing a single crystal ingot of a compound semiconductor material which contains a high vapor pressure component. The apparatus includes: a furnace housing 78 housing a cylindrical hermetic vessel 20 having a ceiling plate section 22A and a bottom plate section 42. External heaters 36, 38 and 40 surrounding the hermetic vessel 20, and a vapor pressure control section which communicates hermetically with the vessel 20.
    Type: Grant
    Filed: May 19, 1993
    Date of Patent: December 20, 1994
    Assignees: Mitsubishi Materials Corporation, Research Development Corporation of Japan, Zaidan Hojin Handotai Kenkyu Shinkokai
    Inventors: Koichi Sassa, Takashi Atami, Keiji Shirata
  • Patent number: 5314667
    Abstract: There is disclosed a method for growing single crystal material, particularly silicon, in modified Czochralski process furnaces and chambers. The Czochralski process equipment is modified to permit continuous addition of polycrystalline material, preferably in dry powdered form to a molten bath of the material that is maintained at a constant shallow depth. For this purpose, a circular baffle is placed within the crucible containing the molten bath of the material, dividing the crucible into an annular feed zone and a central crystal growth zone. A cylindrical boule is withdrawn from the central crystal growth zone. The surrounding walls of the crucible, and graphite cup that supports the crucible, provide a heating and annealing zone in which the boule is continuously annealed as it is withdrawn from the molten pool. Dopants are also introduced into the annular feed zone, either separately or admixed with the polycrystalline material.
    Type: Grant
    Filed: March 23, 1992
    Date of Patent: May 24, 1994
    Inventors: John C. Lim, William A. Koch