With Vacuum Or Fluid Pressure Chamber Patents (Class 118/50)
  • Patent number: 10729820
    Abstract: Polymeric coatings, their applications, and the methods of their preparation are described. The coatings may be used to confer desirable properties to the consumer and/or medical products. Also described are methods of loading therapeutic agents on the polymeric coatings and the applications of the drug eluting polymeric coatings thus obtained.
    Type: Grant
    Filed: November 13, 2015
    Date of Patent: August 4, 2020
    Assignee: Ariste Medical, LLC
    Inventors: Lisa K. Jennings, Jonathan D. McCanless, Xiaoping Chen, Michael Cole
  • Patent number: 10707099
    Abstract: The wafer processing system includes a rotatable wafer support member for supporting a wafer and a plurality of collections trays disposed about a peripheral edge of the wafer support member. The collection trays are arranged in a stacked configuration, each collection tray having an inner wall portion and an outer wall portion that converge to define a trough section for collecting fluid. The system includes a chamber exhaust outlet that is formed in the housing for venting gas from the interior of the housing outside of the collection trays and a chemical exhaust outlet that is formed in the housing for venting gas that flows through the collection chamber to the chemical exhaust outlet. The chemical exhaust outlet is fluidly isolated from the chamber exhaust outlet.
    Type: Grant
    Filed: April 25, 2017
    Date of Patent: July 7, 2020
    Inventors: William Gilbert Breingan, Chris Hofmeister, John Taddei
  • Patent number: 10677963
    Abstract: A curved substrate with a film includes a substrate having a first main surface, a second main surface and an end surface, and an antiglare film provided on the first main surface. The substrate has a flat portion and a bent portion. A value obtained by dividing a reflected-image diffusibility index value R of the bent portion by the sum of the reflected-image diffusibility index value R of the bent portion and a reflected-image diffusibility index value R of the flat portion is 0.3 or higher and 0.8 or less.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: June 9, 2020
    Assignee: AGC Inc.
    Inventors: Azusa Takai, Yusuke Kobayashi, Kazunobu Maeshige, Takaaki Murakami
  • Patent number: 10672632
    Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: June 2, 2020
    Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
  • Patent number: 10649334
    Abstract: Disclosed is a liquid processing apparatus for performing a liquid processing by supplying a processing liquid from a nozzle to a substrate. The apparatus includes: a cup body provided to surround a substrate holding unit; a nozzle arm provided with a nozzle and supported by a support unit; a moving mechanism configured to move the nozzle arm via the support unit between a stand-by position and a processing position; an elevating mechanism configured to move up and down the support unit; a cover member including a top plate portion provided above a driving region and configured to partition the driving region from a region where the substrate is held within the cup body; an opening formed in a portion corresponding to a moving path of the support unit in the top plate portion; and an exhaust mechanism configured to evacuate the driving region.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: May 12, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Koki Yoshimura, Shogo Takahasi, Yasushi Takiguchi, Taro Yamamoto
  • Patent number: 10643835
    Abstract: Provided is a substrate processing apparatus that removes a film by supplying a processing liquid to the peripheral edge of a substrate. An ejection unit ejects the processing liquid to the peripheral edge of the substrate held and rotated by a substrate holding unit. An ejection position setting unit sets the ejection position of the processing liquid of the ejection unit to correspond to the removal width of the film included in a recipe, and a property information acquisition unit acquires property information of the film to be removed. A correction amount acquisition unit acquires the correction amount for correcting the ejection position of the processing liquid based on the property information of the film, and an ejection position correction unit corrects the ejection position of the processing liquid by the ejection unit based on the correction amount acquired by the correction amount acquisition unit.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: May 5, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Akira Fujita, Tsuyoshi Mizuno
  • Patent number: 10596582
    Abstract: A deposition apparatus uniformly controlling deposited quantities of a plurality of depositing sources by efficiently determining an abnormal depositing source. The deposition apparatus may reduce loss of materials by exactly determining an abnormal depositing source. The deposition apparatus includes: a plurality of depositing sources spraying a deposition material; a substrate holder fixing a substrate to face the depositing source; a depositing source shutter disposed at one side of the depositing source and opening and closing an passage of each depositing source; and a main shutter disposed between the depositing source and the substrate fixed to the substrate holder and depositing a part of the deposition material on the substrate through the main shutter.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: March 24, 2020
    Assignee: Samsung Display Co., Ltd.
    Inventors: Sung-Joong Joo, You-Min Cha, Seuk-Hwan Park
  • Patent number: 10576491
    Abstract: Exemplary pressurization and coating systems, methods, and apparatuses are described herein. In certain embodiments, pressurization systems, methods, and apparatuses are used in conjunction with coating systems, methods, and apparatuses to control pressure about a substrate after a coating material is applied to a surface of the substrate. An exemplary system includes a die tool configured to apply a coating material to a substrate passing through the die tool and a pressurization apparatus attached to the die tool and forming a pressurization chamber. The pressurization apparatus is configured to receive the substrate from the die tool and control pressure about the substrate in the pressurization chamber. In certain embodiments, the die tool forms a coating chamber and is configured to apply the coating material on at least one surface of the substrate in the coating chamber.
    Type: Grant
    Filed: August 9, 2017
    Date of Patent: March 3, 2020
    Assignee: Precision Coating Innovations, LLC
    Inventors: Gordon L. King, Don A. Patterson
  • Patent number: 10557679
    Abstract: A firearm and tool oiling chamber comprised of an oil less air compressor, sealed chamber, oil atomizer and air filter. Said system introduces air through the oil atomizer breaking oil down to a fine vapor allowing the vapor to cover all surfaces of firearm or tool. As the vapor enters the chamber, being heavier than air it forces air out through the exhaust line and filter. Any escaping oil is caught in filter. The oil is able to cover all surfaces of firearm or tool and to penetrate into areas that hand oiling does not reach using much less oil than conventional methods.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: February 11, 2020
    Inventor: Timothy Lee Jones
  • Patent number: 10413934
    Abstract: Methods of machining a body to produce a chip are provided wherein the body is formed of a material and in a state such that the material exhibits sinuous flow during a machining operation. The methods include providing a layer located on a surface of the body, and machining the body by causing engagement between a cutting tool and the body in a contact region below an area of the surface having the coating layer thereon and moving the cutting tool relative to the body to produce the chip having the layer thereon. The layer reduces sinuous flow in the material of the body and the chip is formed primarily by laminar flow.
    Type: Grant
    Filed: July 18, 2016
    Date of Patent: September 17, 2019
    Assignee: Purdue Research Foundation
    Inventors: Ho Yeung, Koushik Viswanathan, Walter Dale Compton, Srinivasan Chandrasekar
  • Patent number: 10403478
    Abstract: The present invention increases uniformity of plasma processing in a surface to be processed of an object to be processed or increases uniformity of plasma processing between objects to be processed. There is provided a plasma processing apparatus including: a processing container; a gas supply system; an exhaust system; a plasma generating unit; a gas flow path installed between an outer wall of the processing container and the plasma generating unit, the gas flow path guiding a temperature controlling gas to flow along the outer wall of the processing container; a plurality of gas introduction holes disposed along a circumferential direction of the processing container and configured to introduce the temperature controlling gas into the gas flow path; and a gas exhaustion hole configured to exhaust the temperature controlling gas passed through the gas flow path.
    Type: Grant
    Filed: August 28, 2015
    Date of Patent: September 3, 2019
    Inventors: Hidehiro Yanai, Shin Hiyama, Toshiya Shimada, Yukinori Aburatani
  • Patent number: 10403530
    Abstract: A control device is configured to make a robot arm and a substrate holding device execute a blade member advancing operation for advancing a pair of blade members into a substrate placing structure, a substrate receiving operation for receiving a substrate placed on an upper stage of the substrate placing structure by the blade member in a substrate non-holding state, and a substrate placing operation for placing the substrate on the blade member in a substrate holding state onto a lower stage. A timing of receiving a substrate by the substrate receiving operation is shifted from a timing of placing a substrate by the substrate placing operation. A substrate conveying robot capable of shortening the tact time upon conveying substrates regardless of the kind of substrate fixing method in the substrate holding device can be provided.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: September 3, 2019
    Inventor: Hirohiko Goto
  • Patent number: 10388544
    Abstract: There are provided a substrate processing apparatus and a substrate processing method realizing an effective reduction of a voltage change of a substrate on an electrode to reduce the variation of incident energy of ions entering the substrate. The substrate processing apparatus includes: a first electrode holding a substrate on a main surface of the first electrode; a second electrode facing the first electrode; a RF power source applying to the first electrode a RF voltage whose frequency is equal to or higher than 40 MHz; and a pulse voltage applying unit applying to the first electrode a pulse voltage decreasing in accordance with a lapse of time, by superimposing the pulse voltage on the RF voltage.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: August 20, 2019
    Assignees: Kabushiki Kaisha Toshiba, Tokyo Electron Limited
    Inventors: Akio Ui, Hisataka Hayashi, Takeshi Kaminatsui, Shinji Himori, Norikazu Yamada, Takeshi Ohse, Jun Abe
  • Patent number: 10381250
    Abstract: A method for introducing a substrate into a measuring apparatus, in particular a lithography mask into a coordinate measuring machine, includes the following steps: a) providing a first substrate in a start station; b) transporting the first substrate to a parking station; c) transporting a second substrate from the measuring apparatus to the start station; and d) transporting the first substrate from the parking station into the measuring apparatus. Measurements are carried out on the second substrate during the process of introducing the first substrate. A device for carrying out the method is also provided.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: August 13, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Nico Wohlfarth
  • Patent number: 10345785
    Abstract: A tool for machining an object comprising: a first part including a rotatable member, the rotatable member being rotatable to cause rotation of a machine tool; a second part; a joint coupling the first part and the second part to enable relative movement between the first part and the second part; and a sensor to sense an object to be machined.
    Type: Grant
    Filed: February 24, 2016
    Date of Patent: July 9, 2019
    Assignee: ROLLS-ROYCE plc
    Inventors: James Kell, Thomas Frederick Danvers, Adam Nagy, Dragos Aurelian Axinte, Mark Hugh Raffles, Amir Rabani, Salvador Cobos-Guzman
  • Patent number: 10328387
    Abstract: A method of manufacturing an exhaust gas-purifying catalyst comprising: moving a gas-flow control tool from a first position where the gas-flow control tool faces the first end face with the slurry in the reservoir interposed therebetween and is spaced apart from the slurry in the reservoir to a second position where the gas-flow control tool faces the first end face with a distance from the first end face shorter than that in the first position, in a period during which the slurry flows from the first end face's side toward the second end face's side, the gas-flow control tool being configured to generate a distribution of linear velocities of gas flows when the gas-flow control tool faces the first end face and gas is passed therethrough toward the first end face.
    Type: Grant
    Filed: May 7, 2018
    Date of Patent: June 25, 2019
    Inventors: Shoko Fukuyo, Minoru Ito
  • Patent number: 10328635
    Abstract: A method and apparatus for manufacturing of 3D objects. The apparatus includes a number of material deposition heads terminated by nozzles, of which one or two nozzles are configured to deposit a first material to form a first and second pattern layers. The pattern layers are laterally shifted from each other such that when the first and second pattern layers are deposited, a space (empty volume) with a varying cross section is formed. In some examples, two or more nozzles could be used to deposit the corresponding first and second pattern layers. The nozzles could move independent of each other.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: June 25, 2019
    Assignee: Massivit 3D Printing Technologies Ltd.
    Inventors: Ricardo Osiroff, Moshe Uzan, Igor Yakubov, Shai Garty, Cesar Manna
  • Patent number: 10307798
    Abstract: A cleaning device for removing contamination on a substrate holder used with an electroplating cell includes an arm, a cleaning agent supplier, a nozzle and a receiver. The cleaning agent supplier is coupled to the arm and configured to supply a cleaning agent. The nozzle is coupled to the cleaning agent supplier and configured to spray the cleaning agent onto the substrate holder to remove the contamination. The receiver is coupled to the arm and configured to receive the cleaning agent after the cleaning agent is sprayed onto the substrate holder.
    Type: Grant
    Filed: August 28, 2015
    Date of Patent: June 4, 2019
    Inventors: Yu-Young Wang, Chung-En Kao, Victor Y. Lu
  • Patent number: 10279368
    Abstract: A slit opening of a slit nozzle extends unidirectionally in a longitudinal direction from near the center of a circular substrate to near an outer edge of the substrate, and has a length in the longitudinal direction equal to or smaller than a radius of the substrate. When the slit nozzle discharges chemical onto the substrate, a rotary holder rotates the substrate and the slit nozzle relatively to each other about the center of the substrate. Accordingly, the chemical from the slit nozzle all adheres to a surface of the substrate to form an excellent liquid column and a chemical film on an almost entire surface of the substrate along the outer edge of the circular substrate. This yields satisfactory coating of the substrate with the chemical while waste chemical is suppressed.
    Type: Grant
    Filed: November 20, 2015
    Date of Patent: May 7, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Hiroyuki Ogura
  • Patent number: 10281210
    Abstract: According to one embodiment, a substrate processing apparatus (1) includes a table (4) configured to support a substrate W, a solvent supply unit (8) configured to supply a volatile solvent to a surface of the substrate W on the table (4), and an irradiator (10) configured to emit light to the substrate W, which has been supplied with the volatile solvent, and function as a heater that heats the substrate W such that a gas layer is formed on the surface of the substrate W to make the volatile solvent into a liquid ball. Thus, it is possible to dry the substrate successfully as well as to suppress pattern collapse.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: May 7, 2019
    Inventors: Kunihiro Miyazaki, Konosuke Hayashi, Takashi Ootagaki, Yuji Nagashima
  • Patent number: 10247857
    Abstract: A manufacturing method of anti-fog coatings on lenses is provided. The method includes: a lens assembling step, a lens spraying step, a pre-drying step, a curing step and a lens obtaining step. In the lens assembling step, a plurality of lenses are disposed on a base of a movable carrier. In the lens spraying step, the plurality of lenses are moved to a spraying device and sprayed with a light-curable anti-fog material on a surface thereof. In the pre-drying step, any extra light-curable anti-fog materials are removed from the plurality of lenses by a suction device. In the curing step, the plurality of lenses are placed into a light curing apparatus and radiated by the ultraviolet lights to form an anti-fog coating on the surface of the plurality of lenses. In the lens obtaining step, the plurality of lenses are taken out of the light curing apparatus.
    Type: Grant
    Filed: February 3, 2017
    Date of Patent: April 2, 2019
    Inventor: Hsiu-Ying Sung
  • Patent number: 10214817
    Abstract: A deposition system can conduct ALD or CVD deposition and can switch between the deposition modes. The system is capable of depositing multi-metal films and multi-layer films of alternating ALD and CVD films. Reactant supplies can be bypassed with carrier gas flow to maintain pressure in a reactor and in reactor supply lines and purge reactants.
    Type: Grant
    Filed: October 15, 2014
    Date of Patent: February 26, 2019
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Christos G. Takoudis, Manish Singh, Sathees Kannan Selvaraj
  • Patent number: 10184177
    Abstract: A system and technique that improve the quality of substrate processing may include a plurality of processing chambers; a vacuum transfer chamber; a plurality of transfer chambers; a plurality of gate valves; a plurality of first gas supply units configured to supply an inert gas to a substrate; a transfer robot; and a control unit for controlling the plurality of first gas supply units and the transfer robot to: supply the inert gas to the substrate at a first flow rate when a distance between a gas supply port and the substrate passing through the plurality of gate valves is a first distance; and supply the inert gas to the substrate at a second flow rate greater than the first flow rate when the distance between the gas supply port and the substrate is greater than the first distance when the substrate passes through the plurality of gate valves.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: January 22, 2019
    Inventor: Takashi Yahata
  • Patent number: 10115619
    Abstract: A transfer box has a sealing structure hermetically sealable by means of tight coupling of a transfer box body and a transfer box door. The transfer box is structured in such a way that magnets on the transfer box body face magnetic bodies on the transfer box door when the transfer box door is closed on the transfer box body, with these magnets and magnetic bodies forming a magnetic closed circuit.
    Type: Grant
    Filed: February 18, 2015
    Date of Patent: October 30, 2018
    Inventors: Shiro Hara, Hitoshi Maekawa
  • Patent number: 10058885
    Abstract: A coating device for coating composite cellulose honeycomb support parts (1) each having a multiplicity of channels (5, 6) extending in an axial direction with an impregnation coating to increase fire, water-resistance and/or mechanical stability of the support parts (1). A conveyor (8) transports the support parts (1) in a conveying direction along a filling station (9) configured to pour impregnation agent (12) from above into the channels (5, 6), and damming agents (16) are configured such that the impregnation agent (12) is prevented or at least delayed from draining downwards out of the channels (5, 6) such that the impregnation agent (12) builds up in the channels (5, 6). An emptying station (19) is arranged downstream of the filling station (9) in the conveying direction, at which emptying station excess impregnation agent (12) drains out of the channels (5, 6) in the composite cellulose honeycomb support parts (1). A corresponding process is also disclosed.
    Type: Grant
    Filed: April 11, 2014
    Date of Patent: August 28, 2018
    Inventor: Fredy Iseli
  • Patent number: 9997380
    Abstract: In a substrate processing apparatus, a chamber bottom has a plurality of large chamber exhaust ports arranged in a circumferential direction. A cup rotation mechanism rotates a cup part so that a cup exhaust port selectively overlaps with one of the large chamber exhaust ports. With the cup exhaust port overlapping with one large chamber exhaust port, the gas in the cup part is discharged to the outside of the chamber via a first exhaust mechanism. With the cup exhaust port overlapping with another large chamber exhaust port, the gas in cup part is discharged to the outside of the chamber via a second exhaust mechanism. By rotating the cup part in the chamber via the cup rotation mechanism, the substrate processing apparatus can easily switch the exhaust mechanism for exhausting gas from the cup part.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: June 12, 2018
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Hitoshi Nakai
  • Patent number: 9922849
    Abstract: Disclosed is a substrate liquid processing apparatus. The substrate liquid processing apparatus includes a processing unit, a nozzle, a silylation liquid supply mechanism, and a blocking fluid supply mechanism. The processing unit performs a water repellency imparting processing on a substrate by supplying a silylation liquid to the substrate. The nozzle includes an ejection port configured to supply the silylation liquid to the substrate positioned in the processing unit, and a silylation liquid flow path in which the silylation liquid flows toward the ejection port. The silylation liquid supply mechanism supplies the silylation liquid to the silylation liquid flow path in the nozzle through a silylation liquid supply line. The blocking fluid supply mechanism supplies a blocking fluid that blocks the silylation liquid within the silylation liquid flow path in the nozzle from an atmosphere outside the ejection port.
    Type: Grant
    Filed: April 17, 2015
    Date of Patent: March 20, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Yasuyuki Ido, Naoki Shindo, Takehiko Orii, Keisuke Egashira, Yosuke Hachiya, Kotaro Ooishi, Hisashi Kawano, Shinichiro Shimomura
  • Patent number: 9919302
    Abstract: This application concerns a tool for coating a monolithic shaped catalyst. The tool is part of a coating station and serves to hold and fix the monolith while coating is progressing.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: March 20, 2018
    Assignee: UMICORE AG & CO. KG
    Inventor: St├ęphane Masson
  • Patent number: 9922843
    Abstract: Embodiments of the present invention are directed to a method of manufacturing a semiconductor package with an internal routing circuit. The internal routing circuit is formed from multiple molding routing layers in a plated and etched copper terminal semiconductor package by using a laser to activate areas of each molding compound layer of the semiconductor package. Each compound filler in the molding compound layer has a metal interior and an insulating outermost shell. The activated molding compound areas in the molding compound layer become metallized in an electroless plating solution to build conductive paths on the molding compound surface, while properties of non-activated molding compound areas are not changed.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: March 20, 2018
    Inventors: Saravuth Sirinorakul, Suebphong Yenrudee
  • Patent number: 9892889
    Abstract: The present invention relates to a roll-to-roll hybrid plasma modular coating system, which comprises: at least one arc plasma processing unit, at least one magnetron sputtering plasma processing unit, a metallic film and at least one substrate feeding unit. Each of the arc plasma processing unit is formed with a first chamber and an arc plasma source. Each of the magnetron sputtering plasma processing unit is formed with a second chamber and at least one magnetron sputtering plasma source. The metallic film is disposed in the arc plasma processing unit to avoid chamber wall being deposited by the arc plasma source; There are at least one arc plasma processing unit, at least one magnetron sputtering plasma processing unit and at least one winding/unwinding unit connected in series to lay at least one thin layer by arc plasma deposition or by magnetron sputtering plasma onto substrate material.
    Type: Grant
    Filed: April 13, 2016
    Date of Patent: February 13, 2018
    Inventors: Cheng-Chang Hsieh, Deng-Lain Lin, Ching-Pei Tseng, Wen-Fa Tsai, Jiun-Shen Chen, Chi-Fong Ai
  • Patent number: 9861996
    Abstract: A deposition apparatus includes a deposition source; a rotatable dome provided with an opening which covers the source; a first lever provided outside of the dome; and a tray holder including a frame including a first rotating member and a rotating part including a second rotating member and being attached to the frame such that the rotating part rotates with the second rotating member around an axis supported by the frame. The rotating part includes work-holding trays arranged around the axis, the tray holder is installed on the dome such that a side of one of the trays covers the opening, the first rotating member is rotated by the first lever during rotation of the dome, and the second rotating member is rotated with the rotating part by the first rotating member so as to change the tray a side of which covers the opening to another one.
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: January 9, 2018
    Assignee: NALUX CO., LTD.
    Inventors: Toshiro Higuchi, Hiroshi Ueno, Hitoshi Kimura
  • Patent number: 9855579
    Abstract: A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.
    Type: Grant
    Filed: February 12, 2014
    Date of Patent: January 2, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Ching-Hai Yang, Yao-Hwan Kao, Shang-Sheng Li, Kuo-Pin Chen, Hsiang-Kai Tseng, Chuan-Wei Chen
  • Patent number: 9831096
    Abstract: A plasma processing method including disposing a wafer to be processed on a sample stage disposed in a processing chamber within a vacuum vessel, supplying an electric field using first high frequency power for plasma forming into the processing chamber and forming plasma, and supplying second high frequency power for bias potential forming to electrodes disposed within the sample stage and processing a film on a top surface of the wafer. At least the first or second high frequency power repeats a change of becoming a plurality of predetermined amplitudes for predetermined periods with a predetermined repetition period. In the processing of the film, supply of the high frequency power is changed by finally increasing a predetermined magnitude of amplitude among the repetition period, ratio of the period, and amplitude of the at least the first or second high frequency power, or first decreasing a predetermined magnitude of the amplitude.
    Type: Grant
    Filed: January 14, 2016
    Date of Patent: November 28, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiromitsu Terauchi, Tsutomu Iida, Yuuzou Oohirabaru
  • Patent number: 9777365
    Abstract: This disclosure describes a module web coating system and components thereof including a more uniform atmospheric control pumping mechanism and gas curtain separation system. A modular web coating system may include an unwind module, any number of process modules, and a rewind module. The process modules are interchangeable and independently operable. In addition, this disclosure describes a more uniform pumping system in which process gas is removed from multiple locations or slits spaced around a process chamber and, in an example, around a process device such as a deposition source. The gas curtain system utilizes a zone between process chambers into which separation gas is injected. Gas from the chambers is continuously removed thereby operating the chambers under negative pressure and preventing process gas from one chamber bleeding into an adjacent chamber.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: October 3, 2017
    Inventors: Michael Wayne Stowell, Jr., Garrett Scott Kato
  • Patent number: 9768041
    Abstract: The collection chamber apparatus acts to separate multiple fluids during the wafer processing cycle. Round, fluid collection trays surround the round wafer to collect each individual fluid, recycling them for later reuse. The trays move up and down by use of air cylinders and stack into each other to prevent cross contamination of the other fluids. Two opposing pistons (air cylinders) lift the trays in pairs to form fluid collection chambers. Each collection chamber has a unique drain which enters a separation manifold, flowing into separate tanks for later reuse.
    Type: Grant
    Filed: August 12, 2014
    Date of Patent: September 19, 2017
    Inventors: Ray Regan, Herman Itzkowitz, William Gilbert Breingan
  • Patent number: 9744565
    Abstract: The present invention relates to the field of semiconductor manufacturing technology, more particularly to a swing spray device of a cleaning apparatus and a cleaning method. The swing spray device comprises a spray arm, a spray head and a driving unit. The spray head is connected with the spray arm, and is controlled to swim by the driving unit. The spray head is hinged with the spray arm to form a first hinge joint. The driving unit is an air cylinder; the piston rod of the air cylinder is connected with the spray head. The piston rod is hinged with the spray head to form a second hinge joint. Therefore, the better cleaning effects can be achieved both in the center and the edge of the wafer.
    Type: Grant
    Filed: April 1, 2013
    Date of Patent: August 29, 2017
    Inventors: Yanhui Shi, Yi Wu
  • Patent number: 9714474
    Abstract: A method and system for coating the interior surfaces of microscale hole features fabricated into the substantially planar surface of a work piece. The method comprises providing a work piece with a barrier metal coating that is substantially continuous and uniform both along the planar surface of the work piece and the inner surfaces of the microscale hole features wherein said barrier metal coating is applied by a substantially surface reaction limited process. The workpiece is provided with a coating, on the planar surface of the work piece, of a thick metal layer anchored to the barrier metal coat and disposed to provide substantially uniform electrical conduction capability to the microscale features located throughout and across the workpiece. An electrical contact path is provided to the electrically conductive coating at the perimeter of the work piece.
    Type: Grant
    Filed: April 6, 2010
    Date of Patent: July 25, 2017
    Assignee: TEL NEXX, INC.
    Inventors: Arthur Keigler, Johannes Chiu, Zhenqiu Liu, Daniel Goodman
  • Patent number: 9704714
    Abstract: A method for processing a semiconductor wafer is provided. The method includes performing a discharging process over the semiconductor wafer in a discharging chamber which is enclosed. The method further includes processing the semiconductor wafer by use of a first processing module after the discharging process. During the discharging process, charged particles applied on the semiconductor wafer are tuned based on the characteristics of the surface of the semiconductor wafer.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: July 11, 2017
    Inventors: Weibo Yu, Jui-Ping Chuang, Chen-Hsiang Lu, Shao-Yen Ku
  • Patent number: 9675949
    Abstract: The present invention provides a quantitative catalyst supply device that supplies a predetermined amount of catalyst slurry through an injection port formed through a container bottom. The quantitative catalyst supply device includes: an extendible supply pipe connected to a hopper and filled with catalyst slurry; a head connected to the supply pipe and supplying catalyst slurry to the injection port at the container bottom; a cylinder connected to a side of the supply pipe and supplying a predetermined amount of catalyst slurry through the head; and valve units disposed in an upper portion and a lower portion of the supply pipe spaced from the cylinder and opened or closed by operation of the cylinder.
    Type: Grant
    Filed: April 30, 2014
    Date of Patent: June 13, 2017
    Inventors: Sang-Yun Han, Seung Chul Na, Hyun-sik Han
  • Patent number: 9666464
    Abstract: Provided is a substrate processing apparatus including: a carry-in area where a placing table is provided to place thereon a carrying container including a take-out opening, a flange formed on an upper portion of a side formed with the take-out opening, and a recess formed on a top surface of the flange; a transfer area maintained under an atmosphere different from that of the carry-in area; a partition wall configured to partition the carry-in area and the transfer area and formed with an opening; a door configured to open/close the opening; a carrying container pressing unit configured to press the carrying container placed on the placing table against the partition wall so that the take-out opening of the carrying container faces the opening of the partition wall; and a carrying container holding unit configured to be inserted into the recess to press the carrying container against the partition wall.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: May 30, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Kikuchi, Naoto Saito
  • Patent number: 9646821
    Abstract: A method of manufacturing a semiconductor device includes processing a substrate accommodated in a process container accommodated in a housing by supplying a process gas onto the substrate; and exhausting the process container using an exhaust system comprising a first exhaust pipe connected to the process container, the first exhaust pipe having circular or oval cross-section perpendicular to an exhausting direction thereof; and a second exhaust pipe connected to the first exhaust pipe, the second exhaust pipe having square or rectangular cross-section perpendicular to the exhausting direction, wherein at least a portion of the second exhaust pipe is disposed within the housing.
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: May 9, 2017
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Tetsuo Yamamoto, Tsutomu Kato, Satoshi Okada, Yuji Takebayashi
  • Patent number: 9587312
    Abstract: A gas inlet member of a CVD reactor includes a gas inlet housing having a gas distribution volume supplied with a process gas by a feed line and a multiplicity of gas lines, each formed as a tube and engaging openings of a gas outlet plate arranged in front of an inlet housing wall, and through which the process gas enters a process chamber. A coolant chamber adjoins the gas inlet housing wall and a coolant cools the gas inlet housing wall and outlet ends of the gas lines that are in heat-conductive contact with the gas inlet housing wall. The gas outlet plate is thereby thermally decoupled from the gas inlet housing wall such that the gas outlet plate, which is acted on by radiation heat coming from the process chamber, heats up more intensely than the outlet ends which extend into the openings of the gas outlet plate.
    Type: Grant
    Filed: July 5, 2012
    Date of Patent: March 7, 2017
    Assignee: AIXTRON SE
    Inventors: Hugo Silva, Nico Jouault, Victor Saywell, Fred Crawley, Martin Dauelsberg, Johannes Lindner
  • Patent number: 9550202
    Abstract: Provided is a substrate transport roller (2a) capable of ensuring a broad temperature-control region on a substrate, without reducing substrate transport quality.
    Type: Grant
    Filed: November 25, 2013
    Date of Patent: January 24, 2017
    Assignee: Kobe Steel, Ltd.
    Inventors: Naoki Ohba, Hiroshi Tamagaki
  • Patent number: 9553002
    Abstract: Embodiments of the present disclosure provide a liner assembly including a plurality of individually separated gas passages. The liner assembly enables tenability of flow parameters, such as velocity, density, direction and spatial location, across a substrate being processed. The processing gas across the substrate being processed may be specially tailored for individual processes with a liner assembly according to embodiment of the present disclosure.
    Type: Grant
    Filed: April 23, 2014
    Date of Patent: January 24, 2017
    Inventors: Mehmet Tugrul Samir, Shu-Kwan Lau
  • Patent number: 9469894
    Abstract: An apparatus for coating moving strip material with a metallic coating material, the apparatus including a container for holding metallic coating material, the strip running through the container during use, and including a wiping device for controlling the thickness of the coating on the strip. The container is provided with an opening for the strip leaving the container. The wiping device includes foils or sheets for producing the coating. The walls of the container forming the opening for the strip are directly coupled to the foils or sheets.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: October 18, 2016
    Inventors: Willem Van Rijswijk, Hendrik Bart Van Veldhuizen, Nicolaas Noort, Theodorus Franciscus Jozef Maalman
  • Patent number: 9458749
    Abstract: A catalyst unit may include a carrier that channels may be formed from a front surface thereof to a rear surface thereof, and plugs that closes the channels that may be formed along an edge portion of the front surface except a central portion of the front surface, wherein a coating layer may be not formed in the channels that the plugs may be disposed and a coating layer may be formed along the remaining opened channels.
    Type: Grant
    Filed: August 14, 2014
    Date of Patent: October 4, 2016
    Assignee: Hyundai Motor Company
    Inventor: Sungmu Choi
  • Patent number: 9406942
    Abstract: Disclosed herein are embodiments of an apparatus for preparing rotating disk electrodes. One such apparatus comprises a base, a plurality of disk mounts attached to the base, each configured to receive a respective rotating disk, a plurality of motors each coupled to a corresponding one of the plurality of disk mounts and configured to rotate the corresponding one of the plurality of disk mounts and a controller configured to individually operate each of the plurality of motors.
    Type: Grant
    Filed: June 27, 2012
    Date of Patent: August 2, 2016
    Inventors: Chunmei Wang, Nilesh Dale, Kevork Adjemian
  • Patent number: 9396983
    Abstract: A susceptor, comprises: a base part; multiple holders distributed on the base part for accommodating wafers; an inner ring connected to the base part; and an outer ring detachably connected to the base part and separated from the inner ring; wherein the inner ring and the outer ring separate the holders from one another.
    Type: Grant
    Filed: June 2, 2014
    Date of Patent: July 19, 2016
    Inventors: Yuan-Hung Huang, Chung-Kuei Huang
  • Patent number: 9365924
    Abstract: A method for forming a dielectric film on a substrate by plasma-assisted deposition, includes: introducing a Si-containing process gas to a reaction space wherein a substrate having a surface with patterned recesses is placed; and applying RF power to the process gas in the reaction space to form a dielectric film on the surface by plasma reaction. The RF power is comprised of pulses of high-frequency RF power and pulses of low-frequency RF power, which overlap and are synchronized.
    Type: Grant
    Filed: May 23, 2013
    Date of Patent: June 14, 2016
    Assignee: ASM IP Holding B.V.
    Inventors: Yuya Nonaka, Fumitaka Shoji, Hiroki Arai
  • Patent number: 9340864
    Abstract: The present invention provides a vacuum evaporation apparatus. The apparatus comprises a vacuum chamber; an evaporation source disposed in the interior of the vacuum chamber, and having an inner heat unit and an outer heat unit located outside; a material container formed at an inner wall of the inner heat unit; a vacuum intermediate layer formed between an outer wall of the inner heat unit and the inner wall of the outer heat unit; a first branch at the inner heat unit for allowing a vapor to pass through; and a second branch at the outer heat unit for allowing the vapor to pass through. The device can overcome the influence of the color purity of light by gap forming by the deformation at the middle of the mask by the gravity, and increase the heating uniformity of the evaporation material and the stability of the evaporation rate.
    Type: Grant
    Filed: January 10, 2014
    Date of Patent: May 17, 2016
    Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
    Inventor: Youyuan Kuang