Abstract: A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.

Abstract: A pin-less socket apparatus and manufacturing system for assembling a frozen confection using such socket apparatus including a socket for accepting a conical food product therein, the socket having a hook with one or more teeth located at an outer periphery of the socket, a hinge located on an outside of the socket, the hook movably attached to the socket via the hinge, a force mechanism for holding the hook in place against the socket. The force mechanism takes the form of either an annular spring or O-ring located around the socket and hook or a linear spring attached to the hook in a lever-type manner.

Abstract: A process is provided where at least one main face of an optical lens is subjected to a corona discharge or atmospheric plasma treatment. The optical lens is dipped in a curable coating composition to deposit a layer of the curable coating composition on said main face, and is then cured. During the whole process, the optical lens is carried by a same lens holder so that the lens face is freely accessible and without necessitating manual handling of the lens.

Abstract: A wafer holding mechanism for holding a wafer of the type used in the manufacture of semiconductor devices is herein described. The mechanism has a first plate having a number of offsets that define at least one lip that extends radially inward of the offsets. A second plate is positioned adjacent the first plate and generally between the first plate and the lip such that one or more fingers coupled to the second plate oppose the lip that depends from the first plate. When the second plate is moved to a closed position, the at least one lip and the one or more fingers cooperatively grasp an edge of a wafer therebetween. The wafer holding mechanism is coupled to a drive that rotates the wafer before an imaging mechanism for capturing images of the wafer as it rotates.

Abstract: A tabular holding jig has a plurality of holding holes whose side walls are made from an elastic material. When electronic parts are inserted into the holding holes of the holding jig, deflection of the holding jig is prevented by (a) disposing an intermediate plate between the holding jig and a base plate, or (b) using a base plate having a stepped portion with a raised surface that covers an area of the holding jig where the plurality of holding holes is formed.

Abstract: Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history. In one embodiment, non-orthogonal robot trajectories are used to assure reliable and high speed substrate transfer. In another embodiment, at least one buffering station is used to avoid collision and improve throughput. In another embodiment, optimal positioning of the robots are used to improve throughput.

Abstract: Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

Abstract: Provided is a spin coating apparatus having a ring-shaped or polygonal auxiliary member for use in manufacture of a coated substrate via spin coating, wherein the auxiliary member is positioned adjacent to the side of a substrate for coating, within a range of a spaced distance of 0.03 to 0.8 mm and a range of a height deviation of less than 0.1 mm, upon mounting the substrate. When a surface of a substrate for coating is spin coated with a coating agent using the apparatus of the present invention, it is possible to eliminate or effectively reduce a ski-jump phenomenon at end portions of a coated substrate occurring when spin coating is performed, thereby resulting in uniform coating of a coating solution on the substrate, and it is also possible to effectively decrease contamination of the substrate for coating due to inflow or stay of the remaining coating agent.

Abstract: A mounting assembly for a stent and a method of coating a stent using the assembly are provided.

Abstract: The invention relates to an apparatus and process for treating a cylindrically-shaped element that includes means for supporting the element by contacting an interior surface of the element, means for providing a treatment medium adjacent an exterior surface of the element opposite the interior surface, and clamping means for biasing the supporting means to a preset position at one end thereof and adapted to open and close around the supporting means, or, clamping means for biasing the providing means to a preset position at one end thereof and adapted to open and close around the supporting means.

Abstract: A semiconductor manufacturing apparatus which performs a rapid heat treatment in which metallic thin films 11 and 12 to be metallic electrodes are formed on a top surface and a bottom surface of a silicon carbide semiconductor substrate 10, and thereafter, the silicon carbide semiconductor substrate 10 is heated. The semiconductor manufacturing apparatus is configured such that the silicon carbide semiconductor substrate 10 is held by a holding structure 20 by means of a contact with an exterior of a region formed with the metallic thin films 11 and 12 on the silicon carbide semiconductor substrate 10, and the held silicon carbide semiconductor substrate 10 is placed in an interior of a heating chamber of the semiconductor manufacturing apparatus.

Abstract: A single-cell workstation for processing a tire-wheel assembly including a tire and a wheel is disclosed. The single cell workstation includes a soaping sub-station. The soaping sub-station includes a housing defined by a support surface and one or more walls extending from the support surface and a plurality of fluid dispensing portions extending from the support surface. An apparatus for lubricating one or more beads of a tire is also disclosed. The apparatus includes a head portion; a plurality of radially-adjustable clamping portions axially extending from the head portion; and a plurality of radially-adjustable lubrication applicators axially extending from the head portion.

Abstract: The present invention refers to a method for coating a substrate, a coating apparatus for carrying out the method and a handling module for coating apparatuses. The handling module comprises a moveable support for a substrate to be coated the support being movable between at least two positions. Further, a mask arranging device for at least one of attaching and detaching a mask to the substrate, and a mask alignment device for aligning the mask with respect to the substrate are provided for, wherein the mask alignment device is attached to the movable support so as to be movable together with the support. Alternatively, the handling module comprises a vacuum chamber, a moveable support for a substrate to be coated, the support being arranged in the vacuum chamber and being rotatable between at least two positions, wherein a mask arranging device for at least one of attaching and detaching a mask to the substrate is arranged within the vacuum chamber of the handling module.

Abstract: The present invention relates to an apparatus and method for grasping, retaining, inverting, coating and transporting a plurality of frangible conical confection shells. The present invention also relates to a modular and reconfigurable manufacturing system for producing frozen cone confections and the like.

Abstract: An assembly and method is described as employing a polymeric plug member. The plug member is used in the bottom portion of a photoreceptor drum to prevent leakage of the coating solution into the interior of a photoreceptor drum during dip-coating.

Abstract: To prevent particles from generating by reducing a contact-gas area and improve a purge efficiency by reducing a flow passage capacity.

Abstract: A mounting assembly for supporting a stent and a method of using the same to coat a stent is disclosed.

Abstract: An apparatus for enabling the uniform application of a layer of a coating composition to a tubular substrate includes a shaft, and upper and lower circular rim members of equal diameter that are concentrically attached to the shaft. A pneumatically inflatable tube disposed on each circular rim member has an outer diameter that is variable with changes in its internal pressure. A first flexible cylindrical sheet in contact with the inflatable tubes has parallel edges that form a first slit sufficiently wide to permit movement of the first sheet in response to pressure variation in the tubes. A second flexible cylindrical sheet surrounding the first cylindrical sheet has parallel edges that form a second slit sufficiently wide to permit movement of the second sheet also in response to pressure variation. The second slit is laterally displaced from the first slit, and the second cylindrical sheet has a diameter nearly equal to the specified diameter of the substrate.

Abstract: A module for supporting a substrate includes a frame, a substrate holding unit and a guide mask. The frame receives the substrate including a deposition surface, a rear surface corresponding to the deposition surface, and a side surface connecting the deposition surface with the rear surface. The rear surface is supported by the frame. The substrate holding unit faces the side surface and is combined with a side of the frame. The guide mask includes a guide member and a deposition prevention member. The guide member is combined with the substrate holding unit to cover a portion of the deposition surface. The guide member guides the substrate. The deposition prevention member is combined with the substrate holding unit. The deposition prevention member has greater length than the guiding member to cover the guiding member.

Abstract: Of a substrate-facing surface 24 of an atmosphere blocking member 2, a central area 241 which is faced with an approximately central portion of a substrate S is a flat surface while a periphery edge area 242 which is faced with a periphery edge of the substrate S is an angled surface which becomes closer to the substrate S with a distance toward a periphery edge of the substrate-facing surface 24. Hence, a micro-space SP between the substrate S and the atmosphere blocking member 2 becomes gradually narrower in a direction R which is toward the periphery edge of the substrate S. As an atmosphere gas is fed into the micro-space SP, the atmosphere gas is compressed in the vicinity of a periphery edge of the micro-space SP and a pressure rises. As a result, the micro-space SP becomes positively pressurized as compared with a mist-splashed atmosphere, which effectively prevents a mist from invading other major surface S2 of the substrate S.

Abstract: In one embodiment, a substrate centering apparatus for centering a substrate on a substrate support is provided. In one embodiment, the invention comprises an apparatus that is mounted to an underside of a substrate support and includes a lever that projects upward through a support surface of the substrate support. The lever may be biased toward a center of the substrate support to contact an edge of a substrate. A mechanism is coupled to the lever and moves the lever radially outward to release the substrate. In one embodiment, the mechanism is actuated as the substrate support moves downward to a position that facilitates substrate handoff.

Abstract: A system for applying a sprayed coating includes a spray mechanism operative to spray a liquefied coating material; a target system including a rotatable spray target wheel; and one or more device-holding fixtures configured to be mounted onto the spray target wheel without requiring either an unattached threaded fastener or a locking pin. Preferred embodiments of the system are configured for thermal spray application of Tamper Resistant Coatings (TRCs).

Abstract: An end effector having a first arm and a second arm extending from an end effector support body is provided. The first arm and the second arm each have support extensions for supporting a peripheral region of a substrate on opposing sides of a diameter of the substrate. The height of support contacts on opposing sides of the diameter is different relative to a horizontal datum plane. In one embodiment, the end effector includes additional arms extending from the end effector support body. A system for supporting a substrate is provided also.

Abstract: The present invention is directed towards the holding of medical devices during manufacture to enable the application of therapeutic and/or protective coatings. More specifically, the present invention provides medical device holders that securely retain stents and other medical devices during the application of a coating while minimizing compressive and tensile forces applied to the stents. The invention avoids disruptions to coating quality due to holder blockage during coating deposition. The invention discloses an improved device containing a mandrel and frame that may improve coating uniformity by eliminating shadowing from the frame of the medical device holder when applying coatings to stents and other medical devices.

Abstract: The present invention provides an electro-chemical deposition system that is designed with a flexible architecture that is expandable to accommodate future designs and gap fill requirements and provides satisfactory throughput to meet the demands of other processing systems. The electro-chemical deposition system generally comprises a mainframe having a mainframe wafer transfer robot, a loading station disposed in connection with the mainframe, one or more processing cells disposed in connection with the mainframe, and an electrolyte supply fluidly connected to the one or more electrical processing cells. Preferably, the electro-chemical deposition system includes a spin-rinse-dry (SRD) station disposed between the loading station and the mainframe, a rapid thermal anneal chamber attached to the loading station, and a system controller for controlling the electro-chemical deposition process and the components of the electro-chemical deposition system.

Abstract: A method of coating a stent using a mounting device is provided.

Abstract: An apparatus for enabling the uniform application of a layer of a coating composition to a tubular substrate includes a shaft, and upper and lower circular rim members of equal diameter that are concentrically attached to the shaft. A pneumatically inflatable tube disposed on each circular rim member has an outer diameter that is variable with changes in its internal pressure. A first flexible cylindrical sheet in contact with the inflatable tubes has parallel edges that form a first slit sufficiently wide to permit movement of the first sheet in response to pressure variation in the tubes. A second flexible cylindrical sheet surrounding the first cylindrical sheet has parallel edges that form a second slit sufficiently wide to permit movement of the second sheet also in response to pressure variation. The second slit is laterally displaced from the first slit, and the second cylindrical sheet has a diameter nearly equal to the specified diameter of the substrate.

Abstract: A method and apparatus for fabricating a semiconductor device are disclosed. The method attaches semiconductor chips (130) on a sheet-like insulating substrate (101) integral with two or more patterned layers of conductive lines and vias and with contact pads (103) in pad locations. A mold is provided, which has a top portion (210) with metal protrusions (202) at locations matching the pad locations. The protrusions are shaped as truncated cones of a height suitable to approach the pad metal surface in the closed mold cavity. The substrate and the chip are loaded onto the bottom mold portion (310); the mold is closed by clamping the top portion onto the bottom portion so that the protrusions are aligned with the contact pads, approaching the pad surface. After pressuring encapsulation compound into the cavity, the mold is opened; the encapsulated device has apertures to the pad locations. Any residual compound formed on the pads is removed by laser, plasma, or chemical to expose the metal surface.

Abstract: A system and method for coating lenses includes loading at least one lens into a spindle assembly, which transfers the lens into a coating station. The at least one lens may include a pair of lenses, which are simultaneously loaded into the spindle assembly for transfer into the coating station. The system may further include a washing and drying station and a curing station to receive lens assemblies before and after coating and the spindle assembly may include a plurality of spindle assemblies for sequential transfer of a plurality of lenses, or lens pairs, into and out from each station of the system.

Abstract: A method and an arrangement in a coating line for a fibre-like product or fibre-like products, in which the fibre-like product is directed from output means to a press head, by means of which a tube is formed around the fibre-like product. The fibre-like product is directed from the coating line to a feed unit in a preparatory position at the side. When the coating process of a previous product has terminated, the feed unit is shifted to the coating line and the fibre-like product is fed into the press head and is accelerated to the speed of the tube by means of the feed unit. The feed unit is detached from the fibre-like product, when measurement parameters associated with the fibre-like product and/or the tube reach the predetermined values and is shifted back to the preparatory position at the side of the coating line.

Abstract: A method for hard-material coating or heat treatment of the blade airfoils of blisks for gas turbines provides for partial heat-insulation and cooling of the other blisk parts during the respective process to prevent their properties from being changed by the high temperatures. The apparatus required for this method comprises two or more cooling plates (5 to 7) which are thermally insulated on their outer surfaces and include supporting flanges (20) which heat-conductively locate the blade platforms (3) of the blisks (1). Radially extending cooling medium channels (16) are provided in the cooling plates connected to a cooling medium source to continually apply cooling medium to the inner surfaces of the supporting flanges and the blade platforms.

Abstract: The present invention discloses a lens, a coating apparatus for the lens and manufacture method. A multilayer coating film of a uniform thickness is formed on the surface of the lens, and the lens is uniformly coated with a multilayer coating film. A coating apparatus for controlling the overall rotation is installed in the coating equipment for clamping and fixing a desired coating unit of the lens. The lens is rotated synchronously with the coating apparatus, such that when the coating equipment evaporates a thin film source layer by layer onto the rotating lens, the thin film source can be evaporated to every position of the surface of the lens thoroughly and uniformly, and thus a uniform thickness of the multilayer coating film can be maintained to provide consistent visual colors and effect to every position of the lens for providing a comfortable wear of the lens.

Abstract: After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unit 10A, 10B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unit 20 by a primary transport robot 30. The supercritical drying unit 20 performs a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.

Abstract: Embodiments of the invention contemplate the formation of a low cost solar cell using a novel electroplating apparatus and method to form a metal contact structure having metal lines formed using an electrochemical plating process. The apparatus and methods described herein remove the need to perform the often costly processing steps of performing a mask preparation and formation steps, such as screen printing, lithographic steps and inkjet printing steps, to form a contact structure. The resistance of interconnects formed in a solar cell device greatly affects the efficiency of the solar cell. It is thus desirable to form a solar cell device that has a low resistance connection that is reliable and cost effective. Therefore, one or more embodiments of the invention described herein are adapted to form a low cost and reliable interconnecting layer using an electrochemical plating process containing a common metal, such as copper.

Abstract: A cluster tool for processing a substrate includes a cassette and a processing module including a first processing chamber that is configured to perform a chill process on a substrate, a second processing chamber that is configured to perform a bake process on the substrate, and an input chamber. The first processing chamber, the second processing chamber, and the input chamber are substantially adjacent to each other. The processing module also includes a robot that is configured to receive the substrate in the input chamber and transfer and position the substrate in the first processing chamber and second processing chamber. The robot includes a robot blade, an actuator, and a heat exchanging device. The heat exchanging device includes a chilled transfer arm assembly. The cluster tool also includes a 6-axis articulated robot configured to transfer the substrate between the cassette and the input chamber.

Abstract: A substrate holding and rotating apparatus includes: a spin base connected to a rotary shaft and rotatable therearound; holding members attached to the spin base and displaceable between holding positions at which the holding members come in contact with the peripheral edge of the substrate such that the holding members are capable of holding the substrate, and retreat positions at which the holding members are retreated from the holding positions; a holding members drive mechanism for driving the holding members between the holding positions and the retreat positions; and a rotation regulating mechanism arranged to be brought, in association with the operation of the holding-member drive mechanism, into a rotation allowing state where the spin base is allowed to be rotated and into a rotation regulating state where the rotation of the spin base is regulated.

Abstract: The present invention relates to an apparatus and method for grasping, retaining, inverting, coating and transporting a plurality of frangible conical confection shells. The present invention also relates to a modular and reconfigurable manufacturing system for producing frozen cone confections and the like.

Abstract: The invention relates to a plant for the treatment, in particular the cataphoretic dip coating of objects, in particular of vehicle chassis (4), whereby the objects (4) are run by means of a transport car (5) through several treatment stations and on so doing are dipped in at last one treatment container (91) and retrieved therefrom again. The transport car (5) comprises a chassis (7, 8, 9 to 12), which travels along the trajectory of the objects (4), at least one pivot arm (50, 51), connected to the chassis (7, 8, 9 to 12), a mounting (61) joined to the pivot arm (50, 51), for at least one object (4) and independently operated drives (32, 33, 56, 57, 80, 81) for the translational displacement and the pivoting displacement of the at least one pivot arm (50, 51) and the mounting (61). The transport car (5) can be used not only for transport of the objects (4) for treatment but can also have a service basket (90) fixed thereto, suitable for the accommodation of at least one operative.

Abstract: A ceramic capacitor having a ceramic body and terminal electrodes, the ceramic body being substantially a rectangular parallelopiped in shape, the terminal electrodes being provided at the two ends of the ceramic body in the length direction, each terminal electrode being provided to cover one end face of the ceramic body in the length direction, part of the two surfaces in the width direction, and part of the two surfaces in the thickness direction, wherein, when the length of the ceramic body is L1 and the maximum lengths of the terminal electrodes at the two surfaces of the ceramic body in the width direction are L3 and L4, 0?(|L4?L3|/L1)?0.0227 is satisfied. One surface among the two surfaces of the ceramic body in the width direction is the paste introduction side in the roller coating, while the other surface is the paste escape side in the roller coating.

Abstract: A device is provided for holding an appliance from an interior that may include a center support shaft, two arbors arranged on the center support shaft in a spaced apart position, a plurality of springs coupled to the two arbors, and an actuator coupled to the center support shaft and adapted to decrease the distance between the two arbors. The device may be adapted to support a hollow cylindrical object from an inside of the hollow cylindrical object. The hollow cylindrical object may include a stent. When the actuator is actuated, the plurality of springs may be compressed and each spring may buckle in at least one buckle region. Actuating the actuator may cause the plurality of springs to expand and to clamp a stent. Deactuating the actuator may cause the plurality of springs to retract and to release a stent. A system for coating a medical appliance is provided. A method for coating a medical appliance is provided.

Abstract: There is provided an apparatus for optical disc spin-coating, comprising a cap having a tapered protruding portion or a recess in its central lower portion; a turntable for rotation that has a tapered recess or protruding portion formed in an end of its central axis that is inserted into a center hole of an optical disc, wherein the tapered recess or protruding portion of the turntable is coupled with the tapered protruding portion or recess of the cap in a convexo-concave structure; and a vacuum hole formed in an optical disc support of the turntable. When the cap is eccentrically placed on the optical disc, the cap can be easily attached. In addition, the cap can be easily detached from the optical disc by using vacuum pressure. As a result, the operability and manufacturing efficiency can be increased.

Abstract: A substrate treatment apparatus is provided. The substrate treatment apparatus includes a process room, a load port in which a container receiving wafers is disposed, and a wafer transfer module disposed between the load port and the process room to transfer the wafers between the load port and the process room. The wafer transfer module includes a first barrier, a second barrier extending from a first end of the first barrier or from a portion near the first end of the first barrier at a predetermined inclined angle with respect to the first barrier, and a third barrier extending from a second end of the first barrier or from a portion near the second end of the first barrier at a predetermined inclined angle. The load portion is provided along the first barrier. The process room includes a plurality of chambers arranged along the second and third barriers.

Abstract: A self-retaining O-ring having at least two radial struts connectively extending from inside surfaces to a central sphere-shaped retainer. The top surfaces of the radial struts are formed below the top surfaces of the O-ring. The central sphere-shaped retainer is connectively formed to the radial struts and extending below the bottom surfaces of the struts. A circular recess is provided for containing and supporting the O-ring, its inside surface is dovetailed. The circular recess has a spherical hole disposed on its center for insertion of the sphere-shaped retainer.

Abstract: A substrate holding apparatus is provided. The substrate holding apparatus includes a chuck yoke, a plurality of arm assemblies, and a plurality of gripper assemblies. A first end of each of the arm assemblies is connected to the chuck yoke and each of the arm assemblies has a spring. A second end of each of the arm assemblies is connected to a respective one of the plurality of grippers. The chuck yoke is capable of rotating so as to move each of the plurality of arm assemblies and respective plurality of gripper assemblies into either a closed position or an open position. A compression force from each of the springs is applied to a substrate when the grippers are moved to the closed position.

Abstract: A coating and drying apparatus for the application of a coating substance to a stent and drying the stent is provided.

Abstract: A system for applying a sprayed coating includes a spray mechanism operative to spray a liquefied coating material; a target system including a rotatable spray target wheel; and one or more device-holding fixtures configured to be mounted onto the spray target wheel without requiring either an unattached threaded fastener or a locking pin. Preferred embodiments of the system are configured for thermal spray application of Tamper Resistant Coatings (TRCs).

Abstract: A sample holder for physical vapor deposition equipment, which is disposed in a vacuum chamber for holding samples, includes a transmission mechanism and a fastening mechanism. The transmission mechanism includes a stationary shaft and a transmission element. The fastening mechanism includes a rotation shaft unparalleled with the stationary shaft of the transmission mechanism, a support arm for securely holding the rotation shaft, and a rotational disk assembly that drives the rotation shaft and the support arm to rotate about the transmission mechanism. Two ends of the rotation shaft are connected to a rotation element and an affixation base. The rotation element rotates in response to the transmission element, thereby rendering the affixation base to perform inclined rotation. In this manner, the nano-meter ions can be coated continuously and homogeneously onto the sample surface to enhance the surface hardness, the erosion resistance and the life expectancy of the sample.

Abstract: The present invention provides a method for efficiently and uniformly treating articles with two or more fluids without transferring the articles from one container to another container.

Abstract: Broadly speaking, a wafer processing chamber for performing a high pressure wafer process is provided. More specifically, the wafer processing chamber incorporates a wafer processing volume and an outer chamber volume. The wafer processing volume is configured to contain a high pressure. The outer chamber volume is configured to serve as a buffer between the high pressure of the wafer processing volume and a lower pressure of an environment outside the wafer processing chamber. Thus, the outer chamber volume can control a pressure differential between the high pressure wafer processing volume and the lower pressure outside environment. In this manner, the wafer processing chamber, incorporating the high pressure wafer processing volume, can interface with a conventional wafer transfer module operating under either atmospheric or sub-atmospheric pressure conditions.

Abstract: A replaceable shielding apparatus provides a cost effective way of shielding a portion of a workpiece during processing. The apparatus includes a replaceable shield, made of comparable weight as the workpiece for allowing replacement of the shield in the same way as the replacement of the workpiece. With this feature, the replacement of the shield is a routine process and would not interfere much with the workpiece operation. The invention further includes a shield clamp for clamping the shield onto the workpiece. In a preferred embodiment, the invention further includes a non-reactive gas inlet for creating a pressurized cavity in the vicinity of the shielded portion of the workpiece.