Abstract: A substrate processing method includes (A) supplying to the substrate a first processing liquid containing a removing agent for deposit, a solvent having a boiling point lower than that of the removing agent and a thickener, (B), after (A), supplying to the substrate a second processing liquid containing an organic polymer to be a gas diffusion barrier film, (C), after (B), heating the substrate at a predetermined temperature equal to or higher than the boiling point of the solvent and lower than the boiling point of the removing agent to promote evaporation of the solvent and reaction between the deposit and the removing agent, and (D), after (C), supplying a rinsing liquid to the substrate to remove the deposit from the substrate. The gas diffusion barrier film prevents a gaseous reactive product generated by the reaction in (C) from diffusing around the substrate.

Abstract: A method of making a three-dimensional object (11) from a light polymerizable dual cure resin (16), includes the steps of: (a) producing a green intermediate object by light polymerization of the resin in a stereolithography process (e.g., continuous liquid interface production); (i) the object comprising a body portion and a circumferential boundary portion (12) included in at least part of the body portion i (ii) the stereolithography process including overexposing the boundary portion (as compared to the exposure of the body portion) with light; (b) cleaning the intermediate object; and then (c) baking the object to produce the three-dimensional object.

Abstract: A system and method for applying an overcoat to a printed image on a substrate generally includes a radiative source that transmits electromagnetic radiation within a predefined wavelength range to the printed image on the substrate to be absorbed by the printed image and heat the printed image to a predetermined temperature range, a depositing device that deposits an overcoating powder onto the heated printed image, the overcoating powder having a melting point within the predetermined range such that upon deposition thereof, the overcoating powder adheres and/or melts onto the heated printed image, and a residual powder removing device that removes any residual overcoating powder not adhered to the printed image or the substrate.

Abstract: Provided is a visual insulating spray lance for live working. A liquid guide tube and an air tube in a hollow operating rod are communicated with an inlet end of a spray nozzle; the operating rod is connected to a connecting rod and a display respectively through a fastener; a video optical transceiver fixedly arranged on the connecting rod is connected to the display through an optical fiber; the optical fiber is connected to an optical receiver, the optical receiver is connected to a chip for a video signal processor, the chip for a video signal processor is connected to a power divider having two output interfaces respectively connected to a display screen and a 4G communication module; a battery is connected to the optical receiver, the chip for a video signal processor, the power divider, the display screen, the 4G communication module, and a global positioning system (GPS) module.

Abstract: A laser shock peening apparatus for the surface of a workpiece, said apparatus comprising a resonant cavity. When said apparatus is used to conduct laser shock peening, because of the presence of the resonant cavity, shock waves that would typically escape outward may instead be utilized, and composite shock waves may be formed as a result of the wave reflection and convergence effects of the resonant cavity. Said waves can then be used on the surface of a workpiece twice or multiple times, thereby greatly increasing energy utilization rates. In addition, a fluid-based confinement layer is limited to the inside of the resonant cavity and has a fixed shape, thereby effectively solving the problems of the poor stability of a fluid-based confinement layer and the difficulty with controlling the thickness of such a confinement layer.

Abstract: Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.

Abstract: A printing apparatus, such as a large-scale ink jet printer, includes two removable, interchangeable dryer modules, which may be operated separately or in series. Each dryer module permits a sheet or web to pass therethrough in a process direction. Each dryer module includes a lamp mount, suitable for holding one or more heating or curing lamps, the lamp mount being slidably disposed within the module for easy access to the lamps. Each dryer module defines a top portion suitable for maintaining an airflow above the lamp mount, and a bottom portion suitable for maintaining an airflow below the lamp mount. A plate having a pattern of openings therein enables an airflow through the lamps.

Abstract: A coating system (1) is provided which includes an ultrasonic sprayer (3) capable of spraying a coating fluid onto a target surface (5). A convective or infrared heater (21) is associated with the sprayer and is operable to heat the spray (23) produced by the sprayer (3).

Abstract: The present application relates to a film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and an embossed pattern part provided on a surface of the transparent substrate, which is provided with the darkened light-shielding pattern layer, a method for manufacturing the same, a method for forming a pattern by using the same, and a pattern formed by using the same.

Abstract: A system may include a reactor vessel comprising an outer wall, a heat source thermally coupled to the reactor vessel, at least one reactor inlet in the outer wall, and at least one reactor outlet. The reactor vessel may be configured to house a porous preform in a radially central core region. The at least one reactor inlet may be configured to introduce a precursor gas to the reactor vessel to produce swirling flow of the precursor gas around the radially central core region of the reactor vessel. The at least one reactor outlet may be configured to remove exhaust gas from the reactor vessel and assist in maintaining a dynamic pressure of the reactor vessel greater than a pressure in the porous preform.

Abstract: A chamber lid assembly includes: a central channel having an upper portion and a lower portion and extending along a central axis; a housing at least partially defining a first and a second annular channel, each fluidly coupled to the central channel; a first plurality of apertures disposed along a horizontal plane through the housing to provide a multi-aperture inlet between the first annular channel and the central channel; a second plurality of apertures disposed along a horizontal plane through the housing to provide a multi-aperture inlet between the second annular channel and the central channel, wherein the first and the second plurality of apertures are angled differently with respect to the central axis so as to induce opposing rotational flow of gases about the central axis; and a tapered bottom surface extending from the lower portion of the central channel to a peripheral portion of the chamber lid assembly.

Abstract: Disclosed is an oxide film formation method that includes supplying an ozone gas having an ozone concentration of 20 to 100 vol %, an unsaturated hydrocarbon gas and a raw material gas to a workpiece (7) placed in a pressure-reduced treatment furnace (5), whereby an oxide film is formed on a surface of the workpiece (7) by a chemical vapor deposition process. An example of the unsaturated hydrocarbon gas is an ethylene gas. An example of the raw material gas is a TEOS gas. The flow rate of the ozone gas is preferably set equal to or more than twice the total flow rate of the unsaturated hydrocarbon gas and the raw material gas. By this oxide film formation method, the oxide film is formed on the workpiece (7) at a high deposition rate even under low-temperature conditions of 200° C. or lower.

Abstract: Methods and systems of and for using volumetric display technology including volumetric display technology to create three-dimensional objects for various industries, including, but not limited to solar, automotive and/or other technological areas that use 3D printing or additive manufacturing.

Abstract: A laser shock peening apparatus for the surface of a workpiece, said apparatus comprising a resonant cavity. When said apparatus is used to conduct laser shock peening, because of the presence of the resonant cavity, shock waves that would typically escape outward may instead be utilized, and composite shock waves may be formed as a result of the wave reflection and convergence effects of the resonant cavity. Said waves can then be used on the surface of a workpiece twice or multiple times, thereby greatly increasing energy utilization rates. In addition, a fluid-based confinement layer is limited to the inside of the resonant cavity and has a fixed shape, thereby effectively solving the problems of the poor stability of a fluid-based confinement layer and the difficulty with controlling the thickness of such a confinement layer.

Abstract: Techniques are described for improving dimensional accuracy, and more specifically z-axis or vertical dimensional accuracy in generating a 3 dimensional (3D) object comprising a plurality of formable layers. In one example, a height configuration parameter, such as a selected layer height, a print resolution, one or more tolerance values for certain layers or portions of a 3D object to be printed, etc., and a total object height, may be obtained. A first height corresponding to a subset of the plurality of formable layers may be selected based on the received height configuration parameter and the total object height. In some aspects, the first height may include a global layer height for the 3D object. The first height may be selected to optimize accuracy of the height configuration parameter or the total object height.

Abstract: A chamber of a plasma system includes a chamber wall defining a plasma processing area, a substrate supporter configured to support a substrate in the plasma processing area, and a liner located in the plasma processing area and separating the chamber wall from the plasma processing area. A liner for a plasma system and a method for installing a liner to a plasma system are also provided.

Abstract: A nail polish curing device with a light absorbing chamber is provided, including: a lower case, an upper case, a control module and a bottom plate. The lower case includes an enclosed wall and an opening on a side of the wall. A chamber is formed by the opening and the wall. The upper case is detachably mounted on the lower case. An upper opening and a recess that serves as a hidden handle are provided on the upper case. The control module is disposed on the upper case and is configured to activate UV light emitting diode module. Herein, a light absorbing layer is provided on the bottom plate and on each surface of the lower case in the chamber. The light absorbing layers are configured to completely absorb UV light emitted by the UV light emitting diode.

Abstract: Systems and methods for substrate support in a millisecond anneal system are provided. In one example implementation, a millisecond anneal system includes a processing chamber having a wafer support plate. A plurality of support pins can extend from the wafer support plate. The support pins can be configured to support a substrate. At least one of the support pins can have a spherical surface profile to accommodate a varying angle of a substrate surface normal at the point of contact with the substrate. Other example aspects of the present disclosure are directed to methods for estimating, for instance, local contact stress at the point of contact with the support pin.

Abstract: A method is disclosed for performing a three dimensional (3D) printing process. The method involves generating a primary light beam having a wavelength sufficient to initiate polymerization of a photoresin, and patterning the primary light beam into a patterned primary beam. The patterned primary beam may be directed toward an ultraviolet (UV) or visible light sensitive photoresin to initiate polymerization of select areas of the photoresin. The photoresin may be illuminated with a secondary light beam having a wavelength of about 765 nm to stimulate triplet oxygen into singlet oxygen, to thus control oxygen inhibition in additional areas bordering the select areas, to control polymerization inhibition in the additional areas bordering the select areas.

Abstract: According to one example, there is provided apparatus for generating a three-dimensional object. The apparatus comprises a build material distributor movable bi-directionally in a first axis to deposit successive layers of a build material on a support, and an agent distributor movable bi-directionally in a second axis different to the first axis to deliver an agent onto selected portions of successive layers of build material.

Abstract: Methods and systems, including medium-encoded computer program products, for generating internal structures usable in additive manufacturing include: obtaining a three-dimensional (3D) model of an object to be created by a 3D printer; determining a first slice of the 3D model; and generating first slice data that represents a portion of an internal structure in the first slice of the 3D model of the object, the slice data being usable for fabricating the first slice of the object during a 3D printing process, wherein the portion of the internal structure (i) includes cell structures corresponding to a respective point of a plurality of points with corresponding locations within the interior region, wherein each of the cell structures include an empty space inside the cell structure and (ii) includes a determined quantity of the cell structures based on an analysis of the 3D model.

Abstract: PROBLEM TO BE SOLVED: To evolve a spark discharge preventing effect of an electrostatic coating device. SOLUTION: One coating robot has an arm equipped with a plurality of electrostatic coating devices 100 close to each other and the plurality of the electrostatic coating devices 100 is connected in parallel with each other to one high-voltage generator 102. A hollow rotary shaft 108 driven by an air motor 104 is disposed with nine plate-shaped resistors 120 arranged circumferentially at intervals. The nine plate-shaped resistors 120 are connected in series and a high voltage is applied via the resistors 120 to a rotary atomization head 110. The rotary atomization head 110 is made of a semiconductive resin.

Abstract: Provided are a polyamide resin composition and a molded article produced therefrom. The polyamide resin composition includes: a base resin including a polyamide resin having an intrinsic viscosity (IV) of about 0.9 dL/g or less and milled glass fibers; and carbon nanotube flakes having a size of about 1.0 mm to about 5.0 mm.

Abstract: A method is provided for maintaining resin in a system including a main feed tank and at least one vat, each of the at least one vats associated with a 3-D printing machine. The method includes the steps of: transferring resin from the main feed tank to the at least one vat; operating the associated 3-D printing machine in a build cycle; returning the resin from the at least one vat to the main feed tank; and repeating in a cycle the steps of transferring the resin, operating the 3-D printing machine, and returning the resin.

Abstract: A method for manufacturing a terminal with an electric wire includes: forming a conductor exposed portion by removing a resin coating of an electric wire; forming a wire-terminal connection portion by connecting a terminal fitting to a position of the conductor exposed portion; supplying a sealing material made of ultraviolet-curing resin from a nozzle to form a sealing portion covering the wire-terminal connection portion; and curing the sealing material by irradiation with ultraviolet rays from a UV light. During curing of the sealing material, a reflector is used to allow the ultraviolet rays to be reflected toward the sealing material supplied to the wire-terminal connection portion.

Abstract: Earth-boring tools may include a body having blades protruding therefrom and at least one hardfacing pad secured to at least one blade. The at least one hardfacing pad may be located at least partially within a recess extending at least into the at least one blade body around a circumference of a gage region of the body and may include a plate, an abrasion-resistant material secured to the plate on a side of the plate opposite the body, and at least one spacer extending from the plate toward the body, such that the plate is spaced from the body by at least a thickness of the at least one spacer. A braze material may secure the at least one hardfacing pad to the at least one blade, the braze material extending around the at least one spacer and located between the plate and the body.

Abstract: A resistance annealing furnace for annealing a metal wire, strand, string, wire rod or strap having at least two electric axes, which are provided with respective pulleys for conveying the metal wire, and DC voltage generator means suppliable by an AC voltage source to generate an annealing voltage applied between the two electric axes. The DC voltage generator means has a first voltage rectifier stage connectable to the AC voltage source to generate an intermediate DC voltage, an active power filter, connected so as to compensate the current harmonics at the input of the first voltage rectifier stage, a pulse width modulator to transform the intermediate voltage into a first PWM voltage, a voltage transformer to transform the first PWM voltage into a corresponding second PWM voltage, and second voltage rectifier means to transform the second modulated PWM voltage into the annealing voltage.

Abstract: A structure for high temperature applications comprises a base structure which includes a ceramic composite material, and a coating of a metal-semimetal compound, a metal boride, a metal carbide and/or a metal nitride. Furthermore, a production method and a coating device produces structures which resist high temperature applications with higher process temperatures and difficult chemical conditions.

Abstract: Provided is a substrate processing apparatus including a tube having an inner space therein, a substrate supporting unit including a plurality of isolation plates configured to vertically stack a plurality of substrates thereon and divide a processing space, in which the plurality of substrates are processed, into a plurality of processing spaces in the tube, a gas supply unit configured to supply a processing gas to the plurality of substrates, and an exhaust unit disposed to face the gas supply unit to exhaust a gas inside the tube. A plurality of through-holes are defined in each of the isolation plates.

Abstract: An additive manufacturing apparatus includes a platform, a dispenser to dispense layers of feed material on the platform, and a fusing system to direct an energy beam to fuse at least a portion of the outermost layer of feed material. The fusing system includes an energy source to emit the energy beam, a deformable mirror to receive the energy beam and reflect the energy beam, wherein a shape of the deformable mirror defines at least in part an intensity profile of the energy beam on the outermost layer of feed material, an actuator coupled to the deformable mirror, and a controller coupled to the actuator and configured to cause the actuator to deform the shape of the deformable mirror to adjust the intensity profile of the energy beam on the outermost layer of feed material in accordance to a desired profile.

Abstract: An apparatus for corona treatment, the apparatus including a corona treatment unit with an inlet side and an outlet side, wherein the unit includes one or more sets of transverse electrodes, at least one electrode in each set being connected to a high voltage source and at least one second electrode connected electrically to ground, wherein the second electrode connected to ground includes a rotatable roller. The apparatus is a through-flow apparatus adapted for corona treatment of material in sheets, and including at least one conveying table with a transverse direction and a longitudinal direction, where the at least one conveying table includes mechanical conveyor means. By such a solution is achieved an apparatus through which sheets of material can be conveyed and corona-treated without holding the material and pulling it through the apparatus.

Abstract: A plasma processing apparatus includes a processing chamber to be depressurized in a vacuum vessel with a sidewall made of a transparent or translucent dielectric material, a stage in the processing chamber to mount a wafer thereon, a coil disposed around an outer side of the sidewall and supplied with radio-frequency power for forming plasma above the stage in the processing chamber, a lamp disposed above the coil outside the vacuum vessel which radiates light onto the wafer, and a reflector disposed the coil and reflecting light to irradiate an inside of the processing chamber.

Abstract: A device for processing a metal strip with a liquid coating material is disclosed. Above a coating tank filled with coating material, the device has a blower having an air outlet slot for blowing liquid parts of the coating off of the metal strip. Arranged above the blower is an electromagnetic stabilizer for stabilizing the metal strip by electromagnetic forces after the exiting of the coating tank and the blower. In order to design known devices for treating a metal strip to be more favorable in respect of energy and in order to increase the accessibility for an operating person, the stabilizer is arranged above the blower in such a way that the distance d between the line of action of the maximum force of the stabilizer on the metal strip and on the air outlet gap of the blower is limited to a range of 100-1200 mm.

Abstract: Embodiments disclosed herein include a method for abating compounds produced in semiconductor processes. The method includes energizing an abating agent, forming a composition by reacting the energized abating agent with gases exiting a vacuum processing chamber, and flowing the composition through a plurality of holes formed in a cooling plate. By cooling the composition with the cooling plate, damages on the downstream pump are avoided.

Abstract: A stator for an electric rotating machine includes an annular stator core, an outer cylinder fitted on a radially outer surface of the stator core, and a stator coil mounted on the stator core. The stator core is comprised of a plurality of stator core segments that are arranged in a circumferential direction of the stator core so as to adjoin one another in the circumferential direction. The stator coil is fixed to the stator core by a thermosetting resin that is set by induction-heating the stator core. Each of the stator core segments is formed by laminating a plurality of steel sheets in an axial direction of the stator core and fixing at least some of the steel sheets by staking. The number of staking portions formed in one of the steel sheets is different from the number of staking portions formed in another one of the steel sheets.

Abstract: A method of manufacturing an electrical component includes providing an electrically insulating substrate having an outer surface, applying a coated structure on the outer surface and irradiating the coated structure with an electron beam to form an electrical conductor on the substrate. The irradiating may include heating the coating layer to melt the coating layer to form the electrical conductor. The coating layer may have a low binder concentration and a high metal concentration. The irradiating may include vaporizing substantially all the binder leaving a substantially pure metallic layer to form the electrical conductor. The coating layer may be irradiated until non-metallic material of the coating layer is completely removed.

Abstract: Embodiments of the invention generally relate to pyrometry during thermal processing of semiconductor substrates. More specifically, embodiments of the invention relate to a pyrometry filter for a thermal process chamber. In certain embodiments, the pyrometry filter selectively filters selected wavelengths of energy to improve a pyrometer measurement. The pyrometry filter may have various geometries which may affect the functionality of the pyrometry filter.

Abstract: A manufacturing assembly has at least a sterilizable chamber containing at least one of a three-dimensional printing device (additive manufacturing), a Computer Numerical Controlled (CNC) finishing head (subtractive manufacturing), a vacuum-forming unit, an injection-molding unit, a laser-cutting unit, a ultrasonic-welding unit, a robotic arman analysis device, a sampling device or a combination thereof. A plurality of individual sterilizable chambers may be aseptically connected into a network of sterilizable chambers that provides additional functionality for the manufacturing assembly. A sterilizable printer assembly may include at least one printing head, a printing platform, and a driving mechanism adapted to perform a movement of the at least one printing head relative to the printing platform along three degrees of freedom; a printer housing enclosing the printer assembly in a sterile manner, at least one aseptic connector fluidly connected to a corresponding one of the at least one printing head.

Abstract: An electrostatic chuck is described with external flow adjustments for improved temperature distribution. In one example, a method for adjusting coolant flow in an electrostatic chuck includes heating a dielectric puck, the dielectric puck being for electrostatically gripping a silicon wafer. Heat is detected at a plurality of locations on a top surface of the dielectric puck, the locations each being thermally coupled to at least one of a plurality of coolant chambers of the electrostatic chuck. A plurality of valves are adjusted to control coolant flow into the coolant chambers based on the detected heat.

Abstract: Apparatus for treating products with plasma generated from a source gas. The apparatus includes a vacuum chamber, a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber, and a plasma excitation source electrically coupled with the electrodes. The apparatus may include conductive members extending into the interior of each electrode to establish a respective electrical connection with the plasma excitation source. The apparatus may include a gas distribution manifold and multiple gas delivery tubes coupled with the gas distribution manifold. Each gas delivery tube has an injection port configured to inject the source gas between each adjacent pair of electrodes. The apparatus may further include flow restricting members that operate to partially obstruct a peripheral gap between each adjacent pair of electrodes, which restricts the escape of the source gas from the process chamber between each adjacent pair of electrodes.

Abstract: A lower electrode assembly useful for supporting a semiconductor substrate in a plasma processing chamber includes a temperature controlled base plate, an upper plate above the base plate, and an annular mounting groove surrounding a bond layer located between the base plate and the upper plate. The mounting groove includes an inner wall, an opening of the mounting groove faces radially outward relative to the inner wall, and the mounting groove includes a step extending downward from the upper plate on an upper wall of the groove or extending upward from the base plate on a lower wall of the groove. An edge seal including a compressible ring is mounted in the groove such that the compressible ring is compressed between the upper plate and the base plate to cause an outer surface of the compressible ring to be biased radially outward relative to the inner wall toward the step.

Abstract: One embodiment of the invention is a slicing engine that generates two or more slices of a virtual 3D model given a slice plane. The slicing engine then determines connection points on each of the slices that indicate how the 3D model is to be reconnected by the user when the 3D model is fabricated. The slicing engine also determines an optimized layout for the various slices of the 3D model on fabrication material for minimal use of the material. The user is then able to “print” the layout on the fabrication material via 3D printers, and connect the various printed slices according to the connection points to build a physical representation of the 3D model.

Abstract: A sterilizable container for accommodating at least one of at least one biologically active fluid and at least one preparatory fluid has an area within the container configured to accommodate at least one sterilizable three-dimensional printer assembly. The sterilizable three-dimensional printer assembly includes at least one printing platform; at least one printer head for dispensing structural material onto the at least one printing platform to form thereon a three-dimensional structure; and a moving mechanism for providing a relative displacement between the at least one printer head and the at least one printing platform. The area is configured so that the fluid can reach the printer assembly.

Abstract: A beauty gel curing device includes a bottom seat and a main body detachably mounted on the bottom seat. The bottom seat includes a base frame having walls and an opening; a UV LED module having UV LED lamps; a top cover fixed on the base frame to form the main body. A control module is provided on the main body. A grip portion is disposed at a side of the main body. A battery unit is disposed in the main body. A charging port is disposed at a side of the bottom seat. The bottom seat and the main body are electrically connected and the battery unit in the main body is charged through the charging port.

Abstract: A method for producing at least one cutting strand segment of a cutting strand comprises punching at least one cutting strand segment out of a band material. The at least one cutting strand segment includes at least one cutting element and at least one cutter carrier element having at least one connecting element.

Abstract: A system may produce a desired three dimensional object that includes a tank that holds a liquid that solidifies upon exposure to light; a controllable stage that controllably moves within the tank; a controllable light source that emits a light image in a controllable pattern; and a controller that controls the controllable stage and the controllable light source so as to cause at least three cascaded layers to be sequentially solidified in the liquid that collectively approximate at least a section of the desired three dimensional object and that collectively form at least one up-facing step at their outer edges; and, following the solidification of the at least three cascaded layers, cause a meniscus of the liquid to form and solidify in the at least one up-facing step. The controller may control the number and/or width of the sequentially solidified cascaded layers.

Abstract: The present invention relates to a micro-lattice and, more particularly, to an ultra-light micro-lattice and a method for forming the same. The micro-lattice is a cellular material formed of interconnected hollow tubes. The cellular material has a relative density in a range of 0.001% to 0.3%, and a density of 0.9 mg/cc has been demonstrated. The cellular material also has the ability to recover from a deformation exceeding 50% strain.

Abstract: This invention discloses a laser induced breakdown spectroscopy (LIBS) apparatus based on a high repetition rate pulsed laser. The laser produces a train of laser pulses at a high repetition rate in the kHz or even higher range. When the laser beam hits the sample, it generates several thousands of micro-plasmas per second. Synchronized miniature CCD array optical spectrometer modules collect the LIBS signal from these micro-plasmas. By adjusting the integration time of the spectrometer to cover a plurality of periods of the laser pulse train, the spectrometer integrates the LIBS signal produced by this plurality of laser pulses. Hence the intensity of the obtained LIBS spectrum can be greatly improved to increase the signal-to-noise ratio (SNR) and lower the limit of detection (LOD). In addition, the influence of pulse to pulse variation of the laser is minimized since the obtained LIBS spectrum is the spectrum of a plurality of micro-plasmas produced by a plurality of laser pulses.

Abstract: Errors caused by shrinkage during 3D printing may be minimized. A shape that most closely corresponds to the shape of a layer to be printed may be selected from a library of shapes. Each shape in the library may have shrinkage information associated with it that includes, for each of multiple points that define a perimeter of the library shape, a radial distance to the point from an origin of a coordinate system, an angle the radial distance makes with respect to an axis of the coordinate system, and information indicative of an anticipated amount by which the point will deviate from its specified location when the shape is printed due to shrinkage. Compensation for anticipated shrinkage may be calculated based on the shrinkage information that is associated with the selected shape from the library. The information indicative of the shape of the layer to be printed may be modified to minimize errors cause by shrinkage based on the calculated compensation.

Abstract: The embodiments disclosed herein pertain to methods and apparatus for depositing stress compensating layers and sacrificial layers on either the front side or back side of a substrate. In various implementations, back side deposition occurs while the wafer is in a normal front side up orientation. The front/back side deposition may be performed to reduce stress introduced through deposition on the front side of the wafer. The back side deposition may also be performed to minimize back side particle-related problems that occur during post-deposition processing such as photolithography.