Including Electromagnetic Field Patents (Class 118/623)
  • Patent number: 5531832
    Abstract: A pan oiler for spraying oil into cavities in pans moving on a conveyor including a stationary center nozzle assembly and spaced outer nozzle assemblies. The outer nozzle assemblies are mounted on opposite ends of a drive screw having right hand threads formed on one end and left hand threads formed on the other end for moving the outside nozzle assemblies in unison relative to the stationary center nozzle assembly. A pair of electrically charged electrodes are positioned adjacent the nozzle assemblies for setting up an electric field across the spray paths of the nozzle assemblies for reducing overspray.
    Type: Grant
    Filed: March 18, 1994
    Date of Patent: July 2, 1996
    Assignee: Burford Corporation
    Inventors: Timothy I. McCalip, Jimmy R. Frazier, John E. Fagan
  • Patent number: 5529627
    Abstract: The inside of a coating chamber (2) has a sputtering cathode (3) bearing a magnet set (6) and having a pot-shaped electrode (4) and a target (5). The electrode (4) is closed on the side facing away from the target (5) by a cover (11) to form a pressure equalizing chamber (12). The latter has a vacuum connection (13) for establishing a vacuum acting against the vacuum in the coating chamber (2).
    Type: Grant
    Filed: April 28, 1995
    Date of Patent: June 25, 1996
    Assignee: Leybold Aktiengesellschaft
    Inventors: Berthold Ocker, Mark Saunders
  • Patent number: 5523824
    Abstract: An electrically switchable magnetic brush for use in toner deposition or removal devices used in imaging machines of the electrostatic type. When energized by a multiphase alternating current power source or a brushless direct current power source rotatably mounted drum (9) requires no external driving force and is self-propelled.
    Type: Grant
    Filed: April 26, 1995
    Date of Patent: June 4, 1996
    Assignee: Ravi & Associates
    Inventors: Ravi B. Sahay, David H. Feather
  • Patent number: 5520738
    Abstract: A device for applying bronze or similar powder, particularly in a cigarette making machine, uses a corona discharge wire (36) or similar conductor maintained at high voltage to establish an electrostatic field which causes powder to be attracted to prepared adhesive patches on a paper web (14). Excess powder carried by the web is removed with the assistance of vibration, which may be produced by passing the web over an ultrasound device (44) or a pulsed air mover (102). Excess powder may also be removed by an air mover (152) directing a stream of air at the surface of the web carrying the powder.
    Type: Grant
    Filed: February 22, 1994
    Date of Patent: May 28, 1996
    Assignee: Molins PLC
    Inventors: Alan M. Aindow, Michael J. Cahill, John Dawson, James R. Stembridge
  • Patent number: 5478608
    Abstract: An improved vacuum arc coating apparatus is provided, having a reaction zone with a plasma channel defined within a series of aligned annular substrate holders, or between an outer wall of a chain of substrate holder blocks and the inner wall of the tube. The substrate holders thus act as a liner, confining an arc within the plasma channel. Carrier and plasma creating gases and the reaction species are introduced into the tube, and the deposition process may be carried out at a pressure between 10 Torr and 1000 Torr. Magnetic coils may be used to create a longitudinal magnetic field which focuses the plasma column created by the arc, and to create a transverse magnetic field which is used to bias the plasma column toward the substrates. Substrates can thus be placed anywhere within the reaction zone, and the transverse magnetic field can be used to direct the plasma column toward the substrate, or the tube itself can be rotated to pass the substrate through the plasma column.
    Type: Grant
    Filed: November 14, 1994
    Date of Patent: December 26, 1995
    Inventor: Vladimir I. Gorokhovsky
  • Patent number: 5476689
    Abstract: A continuous, automated method and apparatus for transporting and electrostatically powder coating articles such as fasteners. Articles in an unoriented state are oriented one behind another, transferred in succession to and magnetically retained on a face of a rotating feed wheel at a first position with respect to the feed wheel, transported to a second position by rotation of the feed wheel, transferred in succession at the second position to a respective portion of a moving conveyor, and releasably suspended magnetically and electrically grounded at the respective portion of the conveyor. Magnets used to suspend the articles from the conveyor are shielded from direct contact with the articles to avoid coating the magnets. While the articles remain suspended magnetically from the conveyor by their end portions, they are conveyed through a coating booth where they are electrostatically powder coated.
    Type: Grant
    Filed: September 20, 1994
    Date of Patent: December 19, 1995
    Assignee: Illinois Tool Works Inc.
    Inventors: James W. Stone, Frederick A. Kish, John Wojcik, Donald L. Van Erden, David E. Frederickson, Parimal M. Vedhar
  • Patent number: 5443642
    Abstract: Apparatus for electrostatic spray painting having a painting chamber to which is connected a spray gun fed by a paint powder delivery system. A powder supply provides a high potential across the painting chamber and the spray gun to develop an electrostatic field to pull the paint powder ejected by the spray gun toward a workpiece positioned within the paint chamber. A humidity sensor is located in proximity with the paint powder delivery system for detection of an amount of moisture. A humidity signal is produced in response to the sensed humidity. A remote computer may be connected to receive a plurality of process condition signals including the humidity signal and to provide a display indicative thereof.
    Type: Grant
    Filed: October 22, 1993
    Date of Patent: August 22, 1995
    Assignee: Wagner Systems Inc.
    Inventor: Thomas J. Bienduga
  • Patent number: 5395450
    Abstract: An apparatus for enabling the agitation of carrier particles utilizing a carrier transporting member with a series of magnets attached, which magnets attract and retain the carrier particles present in a container means. The transporting member is caused to rotate by a roller.
    Type: Grant
    Filed: May 10, 1993
    Date of Patent: March 7, 1995
    Assignee: Xerox Corporation
    Inventors: John A. Creatura, Thomas J. Budny
  • Patent number: 5241245
    Abstract: An optimized helical resonator which increases the plasma density for efficient processing of semiconductor wafers is characterized by a low inductance and, hence, a low Q. A first embodiment uses either a distributed or lumped capacitance to reduce the value of .omega.L to less than about 200 Ohms. A second embodiment uses a flat spiral coil having a low value of .omega.L and resonant as a 1/4 or 1/2 wave resonator. A third embodiment combines features of the first two embodiments using both spiral and solenoid coils as the helical resonator.
    Type: Grant
    Filed: May 6, 1992
    Date of Patent: August 31, 1993
    Assignee: International Business Machines Corporation
    Inventors: Michael S. Barnes, Dennis K. Coultas, John G. Forster, John H. Keller
  • Patent number: 5226966
    Abstract: An apparatus for providing radial uniaxial anisotropy in the soft magnetic layer of a magnetic recording disk is disclosed. While the soft magnetic layer is being deposited on the recording disk, the magnetic field. The alternating perpendicular magnetic field causes eddy currents to flow in the disk, in a circumferential direction. The eddy currents, in turn cause a magnetic field in a radial direction, thereby resulting in the desired radial uniaxial anisotropy.
    Type: Grant
    Filed: March 2, 1992
    Date of Patent: July 13, 1993
    Assignee: Digital Equipment Corporation
    Inventors: Michael L. Mallary, Kazuo Ishibashi, Hiroshi Sato
  • Patent number: 5192582
    Abstract: The invention is directed to a procedure for processing joints to be soldered, preferably printed circuit boards fitted with electric components, and an arrangement for executing this procedure, wherein the joints are subjected to plasma treatment before the soldering process. The joints may be subjected to plasma treatment separately or in the relative position necessary for the soldering process.
    Type: Grant
    Filed: November 5, 1990
    Date of Patent: March 9, 1993
    Assignee: WLS Karl-Heinz Grasmann Weichlotanlagen-und Service
    Inventors: Volker Liedke, Karl H. Grasmann, Hans-Jurgen Albrecht, Harald Wittrich, Wilfred John, Wolfgang Scheel
  • Patent number: 5091049
    Abstract: The high density RF plasma generator of this invention uses special antenna configurations (15) to launch RF waves at low frequency such as 13.56 MHz along a magnetic field supplied by an external magnetic field generator (16.17) in a discharge space (14) where the working gas is introduced and which is used alone or in conjunction with a process chamber (18) where specimen substrates (20) are located to either deposit or etch films from a substrate or to sputter deposit films to a substrate. The plasma etching, deposition and/or sputtering system comprises the high density RF plasma generator, the external magnetic field, the gas injection and control system, the antenna system (15) and associated power supplies (48), the process chamber (18), and the means to couple plasma from the generator to substrates or targets, including magnetic means (36) to enhance plasma uniformity at the substrates (20) or targets (92).
    Type: Grant
    Filed: June 29, 1990
    Date of Patent: February 25, 1992
    Assignee: Plasma & Materials Technologies, Inc.
    Inventors: Gregor Campbell, Robert W. Conn, Tatsuo Shoji
  • Patent number: 5085168
    Abstract: In a coating device, a doctor blade is bent S-shaped for application of its contact force by means of a pressure bar. An additional force of a profile correction device is exerted for profile correction by means of magnets. This additional force acts preferably opposite to the main contact force. This prevents the profile correction device from causing a change of the geometry of the doctor blade in the contact area of the spreading edge of the doctor blade.
    Type: Grant
    Filed: June 14, 1990
    Date of Patent: February 4, 1992
    Assignee: J. M. Voith GmbH
    Inventor: Hans-Peter Sollinger
  • Patent number: 5079033
    Abstract: An extrusion is coated with a resin by passing the extrusion continuously through a belt-shaped plasma formed by means of a stationary annular electron cyclotron resonance magnet which completely surrounds the extrusion. The resin coating is produced by plasma polymerization of a monomer using microwaves having a frequency of 2.45 GHz.
    Type: Grant
    Filed: December 19, 1989
    Date of Patent: January 7, 1992
    Assignees: Technics Plasma GmbH, Krauss Maffei AG
    Inventors: Stefan Schulz, Berthold H. Kegel, Wolfgang Mohl
  • Patent number: 5078823
    Abstract: A plasma reactor, of the type comprising an enclosure capable of receiving a gas flow, a generator of high-frequency electromagnetic waves and means for the non-resonant coupling of the generator with the enclosure, the coupling means including at least one horn with widening having an essentially rectangular cross-section, with its two walls perpendicular to the direction of the electrical field moving away angularly from each other, the two walls parallel to the direction of the electrical field remaining substantially parallel. Preferably, the reactor includes a horn with widening and a horn with narrowing parallel to the direction of the electrical field, placed essentially in succession in coupling means. The invention thus makes it possible to obtain large-sized plasmas of any shapes with high homogeneity.
    Type: Grant
    Filed: May 18, 1990
    Date of Patent: January 7, 1992
    Assignee: Defitech S.A.
    Inventors: M. Patrick Chollet, M. Serge Saada
  • Patent number: 5070811
    Abstract: In an apparatus for applying dielectric or metallic substances, such as silicon dioxide, for example, to a substrate (15) disposed in a vacuum chamber (16, 17), the apparatus having an electron emitter (9) and having solenoid coils (30, 42) disposed in the area of the vacuum chamber, the electron emitter (9) is disposed in a separate generator chamber (37) forming the anode (11) and communicating with the vacuum chamber (17), so that, after the process gas is introduced into the generator chamber (37) a large-area plasma jet (8) is produced which is guided by the action of magnets (6, 20, 30, 42) between the electron emitter (9) and a melting furnace (7) disposed in the vacuum chamber (17), while the vapor stream issuing from the melting furnace (7) is accelerated and reaches the substrate (15) as activated vapor.
    Type: Grant
    Filed: November 14, 1988
    Date of Patent: December 10, 1991
    Inventors: Albert Feuerstein, Rainer Ludwig
  • Patent number: 5024716
    Abstract: A plasma processing apparatus includes a vacuum vessel defining a discharge chamber and is provided at least with a source gas supply for supplying a processing gas into the discharge chamber, a magnetic field creating device, and a microwave introducing device. The microwave introducing device employs a microwave radiating member having the shape of a flat plate and provided with a cut. The plasma processing apparatus is capable of uniformly processing a work with a plasma and efficiently applying a microwave only to the work. The periphery of a microwave transmission window is tapered, so that the microwave transmission window can be attached, adhesively and hermetically, to a microwave launcher in a simple construction, whereby the reliability of the adhesive attachment of the microwave transmission window to the microwave launcher is enhanced.
    Type: Grant
    Filed: January 12, 1990
    Date of Patent: June 18, 1991
    Assignee: Canon Kabushiki Kaisha
    Inventor: Yasue Sato
  • Patent number: 5014420
    Abstract: Micro-miniature particles of low resistivity material are fused by applying a highly concentrated high-frequency electromagnetic field to the particles. An electrially conductive printed circuit is formed by laying out a pattern of contiguous micr-miniature particles of low resistivity material and applying a highly concentrated high-frequency electromagnetic field to the particles to fuse them together to form a low resistance electrical conductive circuit.
    Type: Grant
    Filed: July 11, 1989
    Date of Patent: May 14, 1991
    Assignee: XPC, Incorporated
    Inventors: Thomas A. Howard, Donovan E. McGee
  • Patent number: 4952273
    Abstract: Electron cyclotron resonance (ECR) is achieved in a source chamber of a size which is non-resonant with respect to propagation of the microwave power within the chamber. The microwaves are delivered into the chamber via a waveguide and window so that breakdown occurs initially only in a region in the vicinity of the window. A dielectric coupler between the waveguide and the window has a larger end and a smaller end and is filled with a dielectric material. The magnetic field generator for stimulation the electron resonance in the chamber includes a pair of conductive current carrying coils coaxial with each other and with an axis of the chamber, the coils being arranged in a Helmholtz configuration. The waveguide includes a microwave stub tuner for tuning the propagation and absorption of the microwave power in the plasma within the chamber to control the location and shape of the region in which the plasma is formed.
    Type: Grant
    Filed: September 21, 1988
    Date of Patent: August 28, 1990
    Assignee: Microscience, Inc.
    Inventor: Oleg A. Popov
  • Patent number: 4948458
    Abstract: An apparatus for producing a planar plasma in a low pressure process gas includes a chamber and an external planar coil. Radiofrequency resonant current is induced in the planar coil which in turn produces a planar magnetic field within the exclosure. The magnetic field causes circulating flux of electrons which in turn produces a planar region of ionic and radical species. The system may be used for plasma treatment of a variety of planar articles, typically semiconductor wafers which are oriented parallel to the plasma within the enclosure.
    Type: Grant
    Filed: August 14, 1989
    Date of Patent: August 14, 1990
    Assignee: LAM Research Corporation
    Inventor: John S. Ogle
  • Patent number: 4925103
    Abstract: A molten metal spray-depositing apparatus employs a magnetic field-generating nozzle for atomizing a molten metal stream into a spray of metal particles. The magnetic driving field generated by the magnetic atomizing nozzle generates eddy currents which produce an induced field in the metal stream opposing the driving field and creating a torque which causes the stream to break up upon exiting the driving field. The nozzle has one of two configurations for generating one of two generic magnetic field geometries. In one configuration the nozzle utilizes a pair of spaced magnetic poles, such as provided by Helmholtz coils, for generating a transverse magnetic field geometry across the stream. In the other configuration the nozzle employs a solenoid coil for generating a solenoidal magnetic field geometry parallel to the stream.
    Type: Grant
    Filed: March 13, 1989
    Date of Patent: May 15, 1990
    Assignee: Olin Corporation
    Inventors: George J. Muench, Brian G. Lewis, Sankaranarayanan Ashok, William G. Watson, Harvey P. Cheskis
  • Patent number: 4911784
    Abstract: An etching method whereby a sufficiently high etching rate is attained, in a uniform surface treatment that is very gentle on projecting edges of the substrates. Also the substrates are held at or brought to a sufficiently high temperature by the etching process. The method for etching substrates with a magnetic-field supported low-pressure discharge is characterized in that the magnetic field is decoupled from the substrates such that the magnetic field strength at the substrates is less than 6000 A/m. In the space between the substrates and the magnet system at least one electron emitter is disposed at a location at which a magnetic field strength is present that is greater than the field strength at the substrates but equal to or less than 12,000 A/m. On the side of the substrates facing away from the at least one electron emitter, at least one anode is disposed with an anode potential of +10 to +250 V with respect to ground.
    Type: Grant
    Filed: December 23, 1988
    Date of Patent: March 27, 1990
    Assignee: Leybold Aktiengesellschaft
    Inventors: Bernd Hensel, Dieter Hofmann
  • Patent number: 4891095
    Abstract: A mirror field which faces a surface of a specimen to be treated and which has its field axis parallel to the specimen surface is formed in an atmosphere in a reactive gas, and a plasma of the reactive gas is then generated by introducing microwave energy into a region where the mirror field is formed, the thus-formed plasma being confined by the mirror field. The specimen is then treated by activated neutral particles which are produced by the plasma to the surface of the specimen. Preferably, an electric field is formed in the direction along the field axis of the mirror field in a region where the plasma is generated.
    Type: Grant
    Filed: March 20, 1989
    Date of Patent: January 2, 1990
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Tomoaki Ishida, Kyusaku Nishioka
  • Patent number: 4877509
    Abstract: An apparatus for treating semiconductor wafers utilizing a plasma generated by electron cyclotron resonance (ECR) is disclosed in which a microwave is supplied to a plasma generating chamber via a rectangular waveguide, a rectangular-to-circular microwave converter, and a circular polarization converter. The polarization converter may comprise a phase shift plate of a dielectric material or an electrically conductive material disposed in a circular waveguide in the form of a metallic cylinder. The polarization converter transforms a circular TE.sub.11 mode microwave supplied from the rectangular-to-circular microwave converter to a circularly polarized one by rotating the direction of the electric field of the microwave in the TE.sub.11 mode one complete turn in one period of the microwave.
    Type: Grant
    Filed: November 10, 1988
    Date of Patent: October 31, 1989
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Toshiaki Ogawa, Nobuo Fujiwara, Kenji Kawai, Teruo Shibano, Hiroshi Morita, Kyusaku Nishioka
  • Patent number: 4877938
    Abstract: In the internal coating of a tube of an electrically insulating material by a second electrically insulating material by reactive deposition of the second electrically insulating material from a gas mixture which is passed through the tube, the desposition is activated by a plasma which is produced by microwaves and is reciprocated in the tube. A method with low energy consumption and a device of a simple construction are made possible in that the plasma is excited by TE 011 resonance in a cylindrical resonator.
    Type: Grant
    Filed: September 24, 1987
    Date of Patent: October 31, 1989
    Assignee: U.S. Philips Corporation
    Inventors: Hans Rau, Petrus F. De Jongh
  • Patent number: 4838978
    Abstract: A dry etching apparatus which includes an anode located at an upper side and a cathode located at a lower side which face each other in a vacuum vessel. A high-frequency power can be applied across the anode and the cathode. A flange section extends from the inner wall of the vacuum vessel, and is located between the anode and the cathode. A semiconductor wafer can be placed on the cathode through a tray. The cathode is moved toward the anode together with the tray and the wafer. When the edge portion of the tray abuts against the flange section, the interior of the vacuum vessel is partitioned into an etching chamber and the other chamber. A magnetic field is applied to the etching chamber from outside the vacuum vessel, and an etching gas is also introduced into the etching chamber. When the etching gas is introduced, the interior of the etching chamber is evacuated to be maintained at a predetermined pressure.
    Type: Grant
    Filed: November 20, 1987
    Date of Patent: June 13, 1989
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Makoto Sekine, Haruo Okano, Tsunetoshi Arikado, Yasuhiro Horiike
  • Patent number: 4816113
    Abstract: The inside of a reaction chamber for CVD is cleaned after deposition of a carbon film. When crystalline carbon or diamond-like carbon is formed in the chamber, undesirable deposition occurs on the inside of the reaction chamber. The sticky carbon deposition is removed by etching, making use of oxygen or oxygen compound gas rather than fluorine or chlorine compound gas which tends to damage the inside of the reaction chamber.
    Type: Grant
    Filed: February 24, 1988
    Date of Patent: March 28, 1989
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Shunpei Yamazaki
  • Patent number: 4800100
    Abstract: A method and apparatus is described for combined deposition of thin films of materials from an ion beam source and a molecular beam source in a single reactor.
    Type: Grant
    Filed: October 27, 1987
    Date of Patent: January 24, 1989
    Assignee: Massachusetts Institute of Technology
    Inventors: Nicole Herbots, Olof C. Hellman
  • Patent number: 4795529
    Abstract: This invention relates to a plasma treating method and apparatus therefor. The plasma treating method comprises rendering a gas having a critical potential plasmic under a reduced pressure and changing an acceleration voltage for accelerating ions in the plasma towards a sample interposing the critical potential. The plasma treating apparatus comprises means for rendering a gas having a critical potential plasmic under a reduced pressure and means for changing an acceleration voltage for accelerating ions in the plasma towards a sample interposing the critical potential. According to the present invention, the etching step and the film formation step can be carried out alternately and the plasma treating time can be shortened.
    Type: Grant
    Filed: October 19, 1987
    Date of Patent: January 3, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Yoshinao Kawasaki, Hironobu Kawahara, Yutaka Kakehi, Kado Hirobe, Katsuyoshi Kudo
  • Patent number: 4778561
    Abstract: An electron cyclotron resonance (ECR) plasma source for generating a plasma for etching, deposition, pre-deposition and material property modification processes. The plasma source includes two magnetic field sources. The first magnetic field source provides a magnetic field of sufficient intensity to achieve an ECR condition for a given microwave frequency input beam. The second magnetic field source enhances the uniformity of the plasma formed and the uniformity of the output by creating a uniform field region in the plasma generating chamber. The second magnetic field source also reduces the magnetic field so that the plasma near the extraction system and the output extracted are less magnetized. The magnetic field intensity, longitudinal position, radial position and pole orientation are design variables for adjusting the second magnetic field source to enhance uniformity and reduce the magnetization of the output.
    Type: Grant
    Filed: October 30, 1987
    Date of Patent: October 18, 1988
    Assignee: Veeco Instruments, Inc.
    Inventor: Ebrahim Ghanbari
  • Patent number: 4776918
    Abstract: Microwaves supplied from a magnetron through a waveguide are resonated in a cavity resonator to increase their amplitude. The resonated microwaves are emitted into a plasma production chamber through slits and a wall. Then plasma is produced in the plasma production chamber into which plasma processing gas is introduced. The plasma is employed for uniformly processing a substrate.
    Type: Grant
    Filed: October 20, 1987
    Date of Patent: October 11, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Toru Otsubo, Yasuhiro Yamaguchi, Takahiko Takeuchi, deceased
  • Patent number: 4769101
    Abstract: An apparatus for surface treatment, especially for etching and/or coating workpieces by ion bombardment is described. This apparatus comprises at least one ionization chamber having at least one hot cathode, gas atoms being introduced into this chamber for the low-voltage arc-discharge between the ionization chamber and at least one anode inside the treatment chamber connected to a vacuum pump. At least one magnet coil mounted within the treatment chamber is used to control the ion density of the low-voltage arc-discharge and is mounted inside the treament chamber. The workpieces to be treated are arranged outside these magnet coils. Homogeneous surface treatment of the workpieces is ensured by the selected arrangement of magnet coils and workpieces.
    Type: Grant
    Filed: May 5, 1987
    Date of Patent: September 6, 1988
    Inventor: Carlos A. dos Santos Pereiro Ribeiro
  • Patent number: 4686933
    Abstract: An apparatus for developing a latent magnetic image on a moving magnetic recording medium in which the image is always satisfactorily developed without excess toner particles yet using a simple mechanism. A developing magnet extends parallel to the surface of the recording medium, which is in the form of a magnetic drum. The direction of the magnetic field produced by the magnet at the point (line) of closest approach of the recording medium and magnet is the same as the direction of the magnetic field at boundaries between background regions and recorded image regions on the magnetic recording medium. A nonmagnetic rotating sleeve is positioned around the development magnet, and magnetic toner supplied to the outer surface of the sleeve.
    Type: Grant
    Filed: May 27, 1986
    Date of Patent: August 18, 1987
    Assignee: Fuji Xerox Co., Ltd
    Inventors: Yoshihiko Fujimura, Koichi Saitoh, Yuji Suemitsu
  • Patent number: 4672913
    Abstract: In a method of and apparatus for making a magnetic recording medium, a plurality of rod-like orientation magnets are positioned in spaced relation in the movement direction of a non-magnetic substrate so that the magnetic pole facing the non-magnetic substrate is different between adjacent orientation magnets and the orientation magnets are oblique with respect to the substrate movement direction and alternately point reversely. The spaces between the orientation magnets are adjusted so that the intensity of the magnetic field generated in the substrate movement direction between adjacent orientation magnets is 50 Oe or less. A magnetic coating composition is applied onto the non-magnetic substrate, and magnetic grains contained in the composition are randomly orientated by the orientation magnets.
    Type: Grant
    Filed: May 9, 1986
    Date of Patent: June 16, 1987
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Mikihiko Kato, Shinichi Kato, Kazunori Komatsu, Shigeo Komine
  • Patent number: 4667620
    Abstract: Apparatus for producing open ended plastic containers having decreased gas permeability that includes a vacuum chamber and a pump for regulating the pressure therein, an ionization source mounted in the chamber proximate the container's open end and a container holder located in the chamber. The container holder has a hole aligned with the open end and may include a shield that encompasses the exterior of the container and may include a magnet setting up a magnetic field on the exterior of the shield. In the method, a container is placed on the container holder in the chamber with the open end and hole aligned and with the shield and magnet located as described above. The coating material is vaporized and ionized so that the ionized material is deposited on the interior wall of the container.
    Type: Grant
    Filed: October 29, 1985
    Date of Patent: May 26, 1987
    Assignee: Cosden Technology, Inc.
    Inventor: Gerald W. White
  • Patent number: 4645895
    Abstract: A method of surface-treating a workpiece is described characterized in aping one or more short-duration electrical pulses to produce, for each pulse, a high amplitude short-duration electrical discharge between the workpiece, serving as an anode, and another material serving as a cathode, while the workpiece and cathode are in a vacuum ambient. The workpiece and cathode are spaced from each other by a gap which is less than the smallest dimension of the cathode in the plane therethrough parallel to the workpiece.
    Type: Grant
    Filed: April 3, 1985
    Date of Patent: February 24, 1987
    Assignee: Ramot University Authority for Applied Research & Industrial Development
    Inventors: Raymond L. Boxman, Shmuel Goldsmith, Nissan Brosh, Shaul Shalev, Hanan Yaloz
  • Patent number: 4630566
    Abstract: A method for etching or chemically treating a surface of an article utilizing a radio frequency wave ion generating apparatus which provides a thin disk shaped plasma is described. The plasma disks can have a relatively large diameter (on the order of magnitude 50 centimeters). The plasma disks can be created without using a static magnetic field. The radio frequency waves are preferably microwaves or UHF. The method is particularly useful for ion or free radical irradiation of the surface provided in the plasma or for irradiation of the surface by ions accelerated outside a cavity containing the plasma. Disk plasmas are created over a wide pressure range (10.sup.-4 Torr to 1 atmosphere) and are highly ionized at low pressures. An apparatus adapted for treating a surface of an article with ions from a plasma is also described. The method and apparatus are preferably used for treating a surface forming part of an integrated circuit.
    Type: Grant
    Filed: November 15, 1985
    Date of Patent: December 23, 1986
    Assignee: Board of Trustees operating Michigan State University
    Inventors: Jes Asmussen, Donnie K. Reinhard
  • Patent number: 4580966
    Abstract: A device for orienting magnetic particles contained in a magnetic layer on a disc-shaped magnetic recording medium along the circumference of the recording medium. The magnetic layer is provided on a substrate. The orientation is effected by a magnetic field developed by a pair of permanent magnets and which the recording medium traverses during rotation. The permanent magnets are individually shaped flat and arranged to oppose each other at their pole-faces which are common in polarity. A trailing edge of each magnet located with respect to relative movement of the rotating recording medium extends and aligns with the radius of the recording medium.
    Type: Grant
    Filed: May 29, 1984
    Date of Patent: April 8, 1986
    Assignee: Victor Company of Japan, Limited
    Inventors: Hiromasa Isono, Hiroshi Teramoto, Masanobu Shimizu
  • Patent number: 4572842
    Abstract: Method for reactive vapor deposition of compounds of metals and semi-conductors on at least one substrate by glow discharge. Into a space between a magnetron cathode (1) with a target (5) and the substrate (11) an inert gas and a reaction gas for the formation of the desired compound with the target material are separately introduced. Two solve the problem of making it possible to maintain the vapor deposition process stable over long time periods, according to the invention, a flow restriction is introduced between the target (5) and the substrate (11) by a diaphragm (20), which amounts to at least 40% of the cross-section of the space. Further, the inert gas is fed between target (5) and aperture (20) at the periphery of the target.
    Type: Grant
    Filed: August 24, 1984
    Date of Patent: February 25, 1986
    Assignee: Leybold-Heraeus GmbH
    Inventors: Anton Dietrich, Klaus Hartig, Michael Scherer
  • Patent number: 4563977
    Abstract: Inside the enclosing wall (1) of the electrostatic coating plant for applying dry or wet color coatings to electrically conductive surfaces of articles (2) set up in an insulated position is located an electrostatically chargeable curtain (9), the charge polarity of which is the same as that of the spraying gun (7) used for the coating operation. The article (2) set up in an insulated position is supplied with opposite polarity, which is necessary for the electrostatic coating, by an inductor arrangement (16) arranged above the article (2), the inductor arrangement (16) applying an electrostatic field produced by means of a peak inductor (19) to an electrically conducting layer (18), which is located on the rear of a casing piece (17) made of insulating material.
    Type: Grant
    Filed: August 28, 1984
    Date of Patent: January 14, 1986
    Inventor: Walter Spengler
  • Patent number: 4560521
    Abstract: Method and apparatus to maintain homogeneity in a mixture of a fluid carrier and a quantity of magnetically permeable particles in which the mixture within a cylindrical container is subjected to the influence of a magnetic field which rotates around the container, and which at any instant is centered about its own axis lying outside the container. The field has an axis with directional components in a circumferential sense and in the axial sense of the container. In the apparatus, the field is produced by electrical coils connected for multiphase operation, side-by-side around the container and each coil is in a circumferentially and axially inclined relationship to the container.
    Type: Grant
    Filed: April 6, 1984
    Date of Patent: December 24, 1985
    Assignee: Northern Telecom Limited
    Inventors: Jorg-Hein Walling, Gerald Arbuthnot, Michael A. Shannon
  • Patent number: 4518627
    Abstract: An apparatus and method are provided for magnetically disorienting magnetic particles in a magnetic layer of a web coated recording medium that is designed to be used in the manufacture of flexible disks. Disorientation is achieved by subjecting the particles in a fluid pigment carried on a linear web to a rotating magnetic field that projects into the plane of the fluid layer and is rotated about an axis perpendicular to the plane. The interaction of the rotating field with the magnetic particles also has a smoothing effect on the outer surface of the magnetic layer.
    Type: Grant
    Filed: September 4, 1984
    Date of Patent: May 21, 1985
    Assignee: Polaroid Corporation
    Inventors: James Foley, Fawwaz Habbal, John Leahy
  • Patent number: 4453492
    Abstract: Disclosed is a magnetic developing unit having a decorator for applying magnetic toner to a latent magnetic image in a downwardly moving magnetic imaging member. Preferably the imaging member is in the surface of a cylinder and the decorator is at the 3 o'clock or 9 o'clock position. The decorator comprises a housing containing a lower toner supply and background cleaner roll, an intermediate toner transfer roll and an upper toner decorator roll. Each of the rolls comprises a rotating non-magnetic sleeve and a plurality of elongated internal magnets which alternate in polarity adjacent the rotating sleeve and their relative positions are adjustable.
    Type: Grant
    Filed: August 12, 1982
    Date of Patent: June 12, 1984
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Emery J. Gorondy
  • Patent number: 4440106
    Abstract: A two-part arrangement of permanent magnets with low retentivity conducting elements for the flow of magnetic force is used in order to orientate magnetically anisotropic pigments in a suspension in the direction of tape travel during the production of a magnetic tape by means of magnetic fields. The first part of the arrangement acts on the suspension with an inhomogeneous strong magnetic field of about 5000 A/cm which is narrowly restricted physically, without anticipating the orientation in the direction of tape travel. Orientation in the direction of tape travel takes place in the second part of the arrangement which has a physically extended but weaker field.
    Type: Grant
    Filed: June 8, 1982
    Date of Patent: April 3, 1984
    Assignee: Agfa-Gevaert Aktiengesellschaft
    Inventors: Joachim Greiner, Eberhard Gartner
  • Patent number: 4420360
    Abstract: This invention concerns an apparatus for the industrial production of electrical conducting wires treated by flocking and coated with adhesive.
    Type: Grant
    Filed: July 1, 1981
    Date of Patent: December 13, 1983
    Assignee: Flocord S.A.
    Inventor: Claude Batisse
  • Patent number: 4412507
    Abstract: A magnetic recording medium manufacturing device in which a flexible belt-shaped support is conveyed above a molten metal vaporizing source substantially at a constant speed while a magnetic film is formed on a surface of the support by vacuum deposition. The support is guided by transporting means such that the support is curved above the molten metal vaporizing source along a path wherein metal vapor flow lines connecting the center of the molten metal vaporizing source to points on the surface of the support form a constant angle of incidence with the longitudinal direction of the support. An adjusting mechanism is provided to change the angle of incidence by moving the transporting means along lines parallel to the metal vapor flow lines.
    Type: Grant
    Filed: July 20, 1981
    Date of Patent: November 1, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tatsuji Kitamoto, Ryuji Shirahata
  • Patent number: 4407226
    Abstract: A video disc includes a magnetic material applied thereon in such a manner that the orientation of said magnetic material is gradually intensified from the outermost track of the video disc to the innermost track thereof, starting from zero orientation at the outermost track.
    Type: Grant
    Filed: February 25, 1982
    Date of Patent: October 4, 1983
    Inventor: Yoshiro Nakamatsu
  • Patent number: 4368669
    Abstract: An improved method and apparatus for non-impact printing on a substrate is disclosed. The substrate is dried and one surface thereof is coated with a barrier material, after which a marking material immiscible with the barrier material is applied to that surface. An electric field generator which may be in the form of an array of electrical styli is positioned adjacent a second surface of the substrate, opposite the point of application of the marking material. Vacuum means may be used to promote contact between the substrate and the styli. Voltage selectively applied to the styli allows the marking material to displace the barrier material and wet the previously coated substrate surface, thereby forming a printed image.
    Type: Grant
    Filed: January 2, 1981
    Date of Patent: January 18, 1983
    Assignee: Milliken Research Corporation
    Inventor: Franklin S. Love, III
  • Patent number: 4369205
    Abstract: A method and device for manufacturing semiconductor elements of amorphous licon which convert light into electrical energy comprising, supplying a silicon compound to a vessel, passing an electric field through the vessel sufficient to produce a glow discharge having free electrons in the vessel to precipitate amorphous silicon from the silicon compound onto a substrate in the vessel, and providing a magnetic field in the vessel which is directed substantially transversely to the electric field and is of a magnitude sufficient to conduct the free electrons along closed paths over the surface of the substrate.
    Type: Grant
    Filed: October 10, 1980
    Date of Patent: January 18, 1983
    Assignee: Messerschmitt-Bolkow-Blohm Gesellschaft mit beschrankter Haftung
    Inventors: Gerhard Winterling, Max Koniger
  • Patent number: 4333418
    Abstract: Magnetic recording media in which, following application of the magnetic dispersion to a web of tape base material, the magnetic particles are oriented in a preferred direction and the magnetic dispersion is dried to fix the magnetic particles in their oriented position. To assist the orienting action of the orientation magnet, a blanket is located between the latter and the coating device, which blanket is caused to make sliding contact with the applied magnetic layer.
    Type: Grant
    Filed: March 28, 1980
    Date of Patent: June 8, 1982
    Assignee: BASF Aktiengesellschaft
    Inventors: Peter Nagel, Klaus Schoettle, Reinrich Wittkamp, Karl Hauck