Abstract: A cleaning system can include a noble gas, and one or more vessels configured to convert the noble gas into a supercritical fluid, and/or receive and clean an article of manufacture with the noble gas in the supercritical fluid state. A cleaning process can include converting a noble gas into a supercritical fluid state; and cleaning an article of manufacture with the noble gas in the supercritical fluid state so as to remove one or more contaminates from the article of manufacture. A cleaning composition can include a noble gas in a supercritical fluid state, and a textile article of manufacture having one or more contaminates located in the supercritical noble gas.

Abstract: A distillation assembly that reduces malodors resulting from a process of recycling a solvent from a contaminated solvent solution that includes a distillation chamber defined by a top wall, a side wall and a bottom wall, a heating element disposed in the distillation chamber including an active portion and an inactive portion. The contaminated solvent solution disposed at a level within the distillation chamber such that the active portion always disposed below the level.

Abstract: A dishwashing machine is provided. The dishwashing machine includes a washing container, at least one device for washing crockery using a washing solution, a heating device, and a sorption drying device communicated with the washing container for the passage of air between the sorption drying device and the washing container. The sorption drying device contains reversibly dehydratable material that operates to withdraw moisture from air during the passage of the air through the sorption drying device. The sorption drying device is housed in a housing and has air passing from the washing container into the sorption drying device via an air inlet and thereafter flowing along a flow path through the sorption drying device and eventually exiting the sorption drying device via an air outlet. The heating device is located upstream of the air inlet relative to the flow of air through the sorption drying device.

Abstract: A teat cup cleaning device having a heating chamber (2), provided with a discharge (3) which is closable by a valve (4), and arranged for connection to a teat cup. A filling device (20) is provided for filling the heating chamber (2) with an amount of cleaning liquid (11), and a heating arrangement is arranged to heat the contents of the heating chamber (2) to a temperature T higher than the boiling point Tk of the cleaning liquid at ambient pressure. The valve (4) opens in this situation to deliver the heated cleaning liquid to the teat cup. The teat cup cleaning device also comprising a connecting line (17) between a liquid supply and the discharge.

Abstract: A cleaning appliance is provided for cleaning washware, which cleaning appliance is designed to subject the washware to the action of at least one cleaning fluid in at least one cleaning chamber. The cleaning appliance has a suction-removal apparatus for removing damp air from the cleaning chamber by suction, and at least one heat recovery device. The heat recovery device is designed to draw heat from the damp air and to feed it back to the cleaning appliance by means of a first cooling fluid. The cleaning appliance has a cooling-fluid line with at least one recirculation path and at least one heat accumulator path with at least one latent heat accumulator. The cleaning appliance is designed to conduct the first cooling fluid to the cleaning chamber and/or into a fluid tank via the recirculation path in at least one operating state after said cooling fluid has flowed through the heat recovery device.

Abstract: A washing machine suitable to effect a washing treatment, thermo-disinfection and possible drying of objects, including a washing chamber in which the objects to be treated are disposed, and a washing circuit including a plurality of exit paths for a washing liquid to be distributed toward the objects to be treated. On the bottom of the washing chamber, in association with a corresponding discharge aperture, valve means to discharge the washing liquid are disposed, which are directly connected to a pipe that discharges directly into the sewerage system.

Abstract: Dish-washing machine comprising a chamber (2) for washing articles (3), an air inlet line and an air outlet line both communicating with the chamber, air circulating means for forcing an inlet airflow sucked from the atmosphere into the chamber (2) via said air inlet line and exhausting an outlet airflow saturated with moisture after passing over said articles (3) to the atmosphere via said air outlet line; heating means are provided for heating said outlet airflow before exhausting to the atmosphere in order to reduce the relative humidity of the discharged air.

Abstract: A warewasher for washing wares includes a housing defining an internal space with at least one spray zone for washing wares. A liquid delivery system provides a spray of liquid within the spray zone. A tank includes an inlet that is connected to a hot water source for filling the tank with hot water. The liquid delivery system receives water from the tank. An exhaust vents heated air from the housing. A final rinse system is connected to a cold water source. A heat recovery system is located between the final rinse system and the cold water source. The heat recovery system transfers heat from the exhaust air to the cold water provided from the cold water source. A valve associated with the hot water source selectively supplements the water exiting the heat recovery system with hot water from the hot water source.

Abstract: A warewash machine sump collects hot cleaning water that is recirculated in the chamber during cleaning. A drain line is for draining cleaning water from the sump. A fresh water input system includes at least a hot water input and a cold water input. The fresh water input system has a common input line in communication with the hot water input and the cold water input. A cold water input valve and hot water input valve are provided. The drain line and the common input line are arranged in a heat exchange relationship. A temperature sensor arrangement is associated with the drain line for determining temperature of the cleaning water traveling through the drain line. A controller controls the hot water input valve and cold water input valve based upon the temperature sensor arrangement output.

Abstract: A drying duct and a household appliance having the same. The household appliance includes a main body, a drying space placed in the main body and including an air suction hole and an air drain hole, a drying duct including at least one inside-air suction hole communicating with the air drain hole, an inside-air discharge hole communicating with the air suction hole, and an outside-air suction hole and an outside-air discharge hole communicating with the outside of the drying space, and at least one dehumidifying agent placed in the drying duct. The drying duct includes an inside-air suction path into which air inside of the drying space is suctioned, an outside-air suction path into which air outside of the drying space is suctioned, and an inside/outside air movement path communicating with the inside-air suction path and the outside-air suction path.

Abstract: A distillation assembly that reduces malodors resulting from a process of recycling a solvent from a contaminated solvent solution that includes a distillation chamber defined by a top wall, a side wall and a bottom wall, a heating element disposed in the distillation chamber including an active portion and an inactive portion. The contaminated solvent solution disposed at a level within the distillation chamber such that the active portion always disposed below the level.

Abstract: Dish washing machine that includes a steam generator, which supplies steam during a washing operation, to aid in the washing of dishes and other items in the dish washing machine. The dish washing machine further including one or more dish washing racks that effectively orient the dishes, and other items to be washed, in such a way so as to avoid inhibiting the steam from being evenly distributed around each of the dishes and other items to be washed. The dish washing machine also including a steam zone indicator to aid in effectively positioning the dishes and other items to be washed by visually distinguishing the region or zone within the dish washing machine that corresponds with high-intensity steam.

Abstract: In one embodiment, a method for cleaning a substrate in a cleaning module is disclosed. The method includes an operation that receives the substrate into a first level of the cleaning module. In another operation, the substrate is spun while contemporaneously applying a cleaning fluid to top and bottom surfaces of the substrate. In yet another operation, the substrate is spun at a second level of the cleaning module. The method also includes an operation to dry the substrate in an enclosed cavity at a third level of the cleaning module.

Abstract: A condensing apparatus of a dish washer is provided. The condensing apparatus includes a blower and an air duct. The blower suctions vapor from inside a tub of the dish washer. The air duct is connected to the blower, and has a vapor passage formed therein through which the vapor flows and in which condensed water is formed. The vapor passage has a ridge formed thereon to stop the condensed water.

Abstract: A cleaning device comprises a frame and a tank carried by the frame that contains a cleaning fluid. A first motor is capable of generating a first motor heat. A passageway is in fluid communication with the tank and is in thermal communication with the first motor to transfer at least a portion of the first motor heat to the cleaning fluid when the cleaning fluid is directed downstream from the tank through the passageway. An outlet is in fluid communication with the passageway and downstream of the first motor to direct the cleaning fluid onto a surface to be cleaned.

Abstract: A warewash machine includes a housing at least in part defining a chamber for cleaning wares. A sump collects hot cleaning water that is recirculated in the chamber during cleaning. A drain line is for draining cleaning water from the sump. A fresh water input system includes at least a hot water input that receives hot water from a hot water source and a cold water input that receives cold water from a cold water source. The fresh water input system has a common input line in communication with the hot water input and the cold water input. A cold water input valve is for controlling input of cold water into the common input line. A hot water input valve is for controlling input of hot water into the common input line. The drain line and the common input line are arranged in a heat exchange relationship to enable heat from cleaning water traveling through the drain line to enable transfer of heat to water traveling through the common input line.

Abstract: An apparatus and method are provided for generating an electrochemically-activated vapor.

Abstract: A cleaning machine, in particular a batch dishwasher, comprising an individual cleaning chamber in which the items to be cleaned are accommodated, a pump which circulates washing liquid within the cleaning chamber, and a further pump which delivers fresh water, and also a boiler which stores and heats fresh water, wherein the boiler has an associated heat exchanger by means of which heat is indirectly or directly transferred from waste water which is stored in a reservoir to the fresh water which is stored in the boiler.

Abstract: A treatment liquid supply apparatus supplies a treatment liquid to a predetermined object for treatment of a substrate, and recovers the supplied treatment liquid for reuse. The apparatus includes: a first tank in which the treatment liquid to be supplied to the object is stored; a second tank in which the treatment liquid recovered from the object is stored; a transfer unit which transfers the treatment liquid from the second tank to the first tank; a first temperature regulating unit which regulates the temperature of the treatment liquid to be supplied from the first tank to the object; and a second temperature regulating unit which regulates the temperature of the treatment liquid to be transferred from the second tank to the first tank by the transfer unit.

Abstract: A method and apparatus to remove vapor from a storage tank comprising introducing a stream of gas into the storage tank to cause mixing of the vapor within the tank. The stream of gas is preferably introduced into the storage tank through a gas nozzle that increases the velocity of the gas. Furthermore, the gas nozzle may have a fixed or variable orientation that introduces the stream of gas to flow into a region of the storage tank to prevent retention of the vapor in that region. A mixture of the vapor and the gas is withdrawn from the storage tank through an outlet port and provided to an abatement unit, such as a condenser or burner. Where the abatement device is a condenser, the gas and any uncondensed vapor may be returned to the storage tank through the gas nozzle, or through a second gas nozzle.

Abstract: A steam generator is disclosed. The steam generator includes a housing for containing water and a heater installed such that at least one portion of the heater is buried in a bottom of the housing to indirectly heat the water in the housing.

Abstract: A cleaning appliance for cleaning of cleaning stock is provided, which is set up in order to act with at least one cleaning fluid upon the cleaning stock in at least one cleaning chamber. The cleaning appliance has at least one fluid tank for storing the cleaning fluid. Furthermore, the cleaning appliance has a suction-extraction device for the suction-extraction of moist air from the cleaning chamber and also has at least one heat recovery device. The heat recovery device is set up in order to extract heat from the moist air. The heat recovery device has at least one Peltier element, which has a heat-absorption side and a waste-heat side. The waste-heat side is in thermal contact with a fluid heating device. The fluid heating device is, in turn, in contact with a first cooling fluid and is set up in order to heat this first cooling fluid. The cleaning appliance is set up, furthermore, in order to use the first cooling fluid for a cleaning process.

Abstract: A system for measuring fume generation rates and total fume emissions of welding and allied processes includes a fume collection chamber and an automated welding assembly. The fume collection chamber includes a fume chamber housing, a door attached to the housing, a filter support connected to the housing, a hood connected to the housing and a connector attached to the housing and/or the hood. The automated welding assembly includes a rail, a carriage moveably mounted on the rail, a gun arm connected to the carriage and a welding gun mounted to the gun arm.

Abstract: An integrated wash unit includes a framework. In one example, the framework includes a skid supporting an internal frame. A wash unit that includes a pump is supported on the framework for pumping a fluid, such as water. A water treatment assembly is supported on the framework and is fluidly connected to the pump. A water storage tank and water heater are arranged between the water treatment assembly and pump. The water treatment assembly supplies clean water that was been recycled from the collected, unclean water from the turbine engine. The water treatment assembly is fixed relative to the wash unit for transport together with the wash unit as an integrated assembly. An enclosure that includes access panels is supported on the framework about the wash unit and water treatment assembly. The framework supports a power plant that drives the pump through a generator and motor or through a transmission device, as well as a generator and an air compressor.

Abstract: A dishwashing machine for commercial use is provided, which has a dishwashing chamber with a front door which can be opened for loading and unloading the dishwashing chamber with items to be cleaned. Furthermore, the dishwashing machine has at least one condensation precipitation device, which is connected to the dishwashing chamber and is equipped with at least one fan for sucking and/or blowing vapor and/or air out of the closed dishwashing chamber. The condensation precipitation device also has at least one condensation surface for condensation of vapor. The dishwashing machine additionally has an inlet-air channel for supplying ambient air into the dishwashing chamber. The inlet-air channel is provided with an inlet-air fan.

Abstract: A condensing apparatus of a dish washer is provided. The condensing apparatus includes a blower and an air duct. The blower suctions vapor from inside a tub of the dish washer. The air duct is connected to the blower, and has a vapor passage formed therein through which the vapor flows and in which condensed water is formed. The vapor passage has a ridge formed thereon to stop the condensed water.

Abstract: Dish washing machine that includes a steam generator, which supplies steam during a washing operation, to aid in the washing of dishes and other items in the dish washing machine. The dish washing machine further including one or more dish washing racks that effectively orient the dishes, and other items to be washed, in such a way so as to avoid inhibiting the steam from being evenly distributed around each of the dishes and other items to be washed. The dish washing machine also including a steam zone indicator to aid in effectively positioning the dishes and other items to be washed by visually distinguishing the region or zone within the dish washing machine that corresponds with high-intensity steam.

Abstract: In a steam dishwashing machine a steam nozzle that sprays steam, supplied by a steam generator, into the dish washing space or compartment. The steam nozzle is fixed to the tub so that the dish washing space itself is not limited, nor are the shape and size of the dishwashing machine racks. Moreover, the steam nozzle is fixed such that any warping or deformation of the steam nozzle, due to prolonged exposure to high-temperature wash water or high-temperature steam, is prevented.

Abstract: A teat cup cleaning device having a heating chamber (2), provided with a discharge (3) which is closable by a valve (4), and arranged for connection to a teat cup. A filling device (20) is provided for filling the heating chamber (2) with an amount of cleaning liquid (11), and a heating arrangement is arranged to heat the contents of the heating chamber (2) to a temperature T higher than the boiling point Tk of the cleaning liquid at ambient pressure. The valve (4) opens in this situation to deliver the heated cleaning liquid to the teat cup. The teat cup cleaning device also comprising a connecting line (17) between a liquid supply and the discharge.

Abstract: The invention relates to a system for cleaning articles with liquid or supercritical carbon dioxide consisting of a cleaning chamber, a storage tank, a still with a vaporizer and a tube connecting said still with said storage tank, wherein said tube comprises a condenser. Heat is transferred between vaporizer and condenser by means of an external refrigeration cycle.

Abstract: The method and apparatus are for safely cleaning live equipment. The method comprises the steps of heating a water-based solution by means of an apparatus to produce superheated steam; grounding this apparatus; conducting the superheated steam through an insulated conduit; and concentrating this superheated steam into a pressurized jet at an output of the insulated conduit. After the step of grounding the apparatus, the method further comprises the step of applying the pressurized jet through the insulated conduit output, onto the live equipment to be cleaned.

Abstract: Unwanted films can be eliminated by directing a stream of reactive gas(es) at reactive zone in an edge region of the wafer. The action of the reactive gas can be enhanced by heating the gas in a nozzle, immediately prior to the gas impinging on the wafer. The action of the reactive gas can also be enhanced by ultraviolet (UV) or infrared (IR) radiation directed at the reactive zone. The wafer is rotates so that the reactive zone traverses the entire edge region. Multiple gas/light delivery systems can cause gas and light to impinge on multiple reactive zones, both on the front side and on the back side of the wafer.

Abstract: A system (10) for delivery of reagent from a solid source thereof, comprising a structure (16, 22, 24) arranged to retain a solid source material (30) in confinement by at least a portion of the structure, for heating and generation of vapor from the solid source material by volatilization thereof, a heat source (82) arranged to heat the solid source material for such volatilization, and a vapor dispensing assembly (52, 54) arranged to discharge the vapor from the system. A high conductance valve (1510) is also described, suitable for use as a dispensing control valve for a reagent storage and dispensing vessel, e.g., a vessel containing a semiconductor manufacturing reagent that is dispensed at low pressure.

Abstract: A method for cleaning, method and device for the application of a protective medium to a turbine blade, and a method for placing cooling bores in a turbine blade is disclosed. For this purpose, hot supercritical carbon dioxide is used as a tempering and/or cleaning medium and compressed and decompressed one or more successive times. The cleaning medium is decompressed to a pressure at which the gas assumes a volume that is a multiple of the volume of the compressed cleaning medium in the pressure tank. In so doing, it is possible to remove particulate and other impurities, even from recesses, blind holes, or open hollow spaces.

Abstract: Compositions, apparatus and methods for removal of unwanted deposited materials, e.g., nitrides such as silicon nitrides, from substrates. In one implementation, such removal is carried out with a composition including (i) a halide, e.g., NF3, ClF3, F2, XeF2, CF4, or other fluorocarbon species of the formula CxFy, wherein x and y have stoichiometrically compatible values, and (ii) a nitrogen source, optionally wherein at least the halide cleaning agent in the cleaning composition has been subjected to plasma generation to form a plasma. The use of relatively inexpensive nitrogen sources enables the amount of costly halide to be reduced in applications such as cleaning of internal surfaces and components of microelectronic product manufacturing process tool chambers.

Abstract: The invention provides a process for stabilizing plaster and an apparatus for implementing the moistening part of the process. The process comprises the following steps: a) providing a heated HH-plaster preferably at temperatures over 100° C.; b) feeding the hot plaster in a moistening device having walls heated to at least 100° C.; c) injecting water and/or steam into the moistening device in conditions that such not yet moistened surfaces of the plaster are exposed to the injected water and/or steam; d) maintaining an atmosphere in the moistening device at a level of the dew point in the range of 75 to 99° C.; e) feeding the moistened blend into a curing device; f) maintaining an atmosphere in the curing device above 75° C. for at least 3 minutes; g) feeding the moistened and cured blend into a drying device; and h) drying said moistened and cured blend.

Abstract: In a cleaning apparatus and a method of cleaning a chamber used in manufacturing a semiconductor device, a first plasma may be provided into a chamber to remove a first residue from an inner wall of the chamber where the first residue is attached. A second plasma may then be provided into the chamber to remove a second residue formed by the first plasma from an inside of the chamber where the second residue remains. The second residue formed by the first plasma used to clean the chamber may not pollute a semiconductor substrate located in the chamber.

Abstract: In a dishwasher having a dishwashing compartment and a pump fluidically connected to the dishwashing compartment for channeling liquid to the dishwashing compartment, the pump disposed outside the dishwashing compartment and including a pump housing defining an interior and housing a motor and an impeller, a heater for heating dishwashing liquid includes a heating device disposed on the pump housing in heat-conducting contact with the interior of the pump housing.

Abstract: A bracket is provided for mounting an object to a tub of a dishwasher. The bracket is mounted on the annulus edge of the pump opening in the bottom of the tub adjacent the pump seal ring. No other fasteners are used to secure the bracket to the tub. The bracket is mounted on the tub before the pump is installed. In one embodiment a thermostat is pivotally mounted on the bracket so as to maintain substantially flush engagement with the tub. In a second embodiment, a wire harness extends through a loop of the bracket for support adjacent the tub.

Abstract: An apparatus for washing parts includes a cleaning chamber including a spray portion and a reservoir portion. The spray portion includes a support for the parts and a spray bar having at least one orifice for distributing a cleaning solution. The reservoir portion stores and collects the cleaning fluid. A thermal energy source adjusts and maintains the operating temperature of the cleaning solution in the reservoir portion. The thermal energy source retains a transfer fluid and includes a heater for adjusting a temperature of the transfer fluid. A conduit extends through the thermal energy source and defines a passageway for the cleaning fluid. A pump draws the cleaning fluid through the passageway and discharges the cleaning solution through the spray bar, such that the operating temperature of the cleaning solution is increased.

Abstract: A system for equalizing pressure in a washing chamber in response to changes in pressure inside washing chamber. Gate elements are operable between open and closed positions to regulate pressure conditions inside the washing chamber.

Abstract: Apparatus for pressure processing components is disclosed which includes an improved closure system that minimizes dust-generating parts and allows easy access to the chamber. Ports are provided for introducing and releasing pressurized gases and fluids to and from the processing space. The heating system of the apparatus heats both the cover and the stage inside the pressurized chamber such that cycle time to equilibrate heated, pressurized fluids such as supercritical carbon dioxide inside the chamber are decreased. The apparatus includes a mechanism that raises the stage inside the chamber, pressing it against the fixed cover and sealing the inside of the pressure vessel. In one embodiment a screw-type jack is used to move the component-loaded stage fitted with a deformable o-ring seal a short travel distance to seat against the lid and seal the pressure chamber. In a related embodiment a computer and an electronic stepper motor are used to drive the pressing means in an automated fashion.

Abstract: Thermal cleaning and separation of metal parts is performed by a stator from an electric motor. Windings embedded in an organic, insulating material are placed and heated to 250°–500° C. under controlled conditions in a heating chamber, evaporating organic material and loosened windings. Flue gas is evaporated organic substances conducted through a closed pipe system to a condensator, where organic gases condense. The pipe system is designed so that condensate is conducted-on in the closed pipe system to a partly liquid filled vessel. Contents of this vessel are air and water that flow concurrently with the condensed flue gas as condensate, increasing content of organic material in the vessel and separating condensate from air. Air may be conducted to the oven for renewed absorption of organic material. All organic material evaporated from the heating chamber is collected in the vessel for later disposal in an environmentally correct and secure way.

Abstract: An apparatus for measuring the water content of a water-containing liquid mixture contained in a tight chemistry tank includes a heating device for controlling the temperature of the liquid mixture to a temperature near the boiling point of the liquid mixture, a cooling medium system disposed at the top of the tight chemistry tank having a cooling medium inlet and a cooling medium outlet, a temperature measurement system for determining the temperature difference between the cooling medium inlet and outlet, and a computing device for calculating the water content of the liquid mixture from the temperature difference. Also provided is a tank for supplying water to the liquid mixture, and a control system for adjusting the amount of water supplied from the tank based upon the water content measured by the measuring apparatus. Also provided is a method for measure the water content.

Abstract: A liquid processing system of the present invention controls a temperature of a processing liquid being in a stand-by circulation line by control means for controlling the heaters to heat the processing liquid stored in the tank, while controlling the opening/closing means to pass the cooling medium into the tank with the stored processing liquid.

Abstract: A gas-heated dishwasher includes a gas burner for heating the rinsing liquid and drying dishes, which is suitable for drying dishes and heating the rinsing liquid in an efficient way, while, at the same time, making it possible for a worktop to be placed on top of the dishwasher, the gas burner is embodied and disposed in the motor chamber so that it heats at least one closed tubular heating body filled with a fluid during a sub-program dry section and heats the rinsing fluid during the sub-program sections when the rinsing fluid is used.

Abstract: A substrate treatment apparatus includes a substrate heating device for maintaining a substrate at a temperature higher than room temperature, a wetting device for producing a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution, and a supply device for supplying the wet ozone-containing gas from the wetting device to a work object on a surface of the substrate. The supply device includes a gas disperser including apertures aligned in rows in a width direction of the work object. The apertures in adjacent rows are not aligned with each other in a direction perpendicular to the rows. At least one of the gas disperser and the substrate is movable in a direction perpendicular to the rows. A gas conduit connects the wetting device to the supply device. A wet ozone-containing gas heating device heats the wet ozone-containing gas to a temperature at least equal to the temperature of the substrate.

Abstract: A system and method of selectively extending a wash cycle duration of a warewasher beyond a set minimum duration provides suitable cleaning of wares while at the same time seeking to increase the number of wash cycles per unit time. A system and method for detecting water level in a wash chamber or other tank provides the ability to identify a progressively fouling electrode. A system and method of automatically priming one or more chemical feed lines of a warewasher is also described.

Abstract: The present invention can remove particles such as dust by flowing solvent gas such as CO2 through a line filter and eject it from a nozzle so as to be converted to solid particles or liquid droplets and eject to a workpiece to be cleaned so as to clean particles or organic materials. It is possible to make the solvent to a solid particle or liquid droplet by adjusting a gap between the nozzle and the workpiece to be cleaned; thus, it is possible to select the most preferable state according to the extent of the adhesion of organic material to the workpiece to be cleaned. Also, it is possible to remove particles such dust in the solvent by a line filter; thus, it is not necessary to use highly pure expensive solvent, and it is possible to reduce the running cost of the apparatus.

Abstract: Initially, process parameters for dense phase fluid cleaning are determined. Thereafter, a cleaning chamber containing a substrate is pressurized with a dense phase fluid, based on these process parameters. The substrate is then cleaned with the dense phase fluid, again based on these process parameters. Exhaust fluid is subsequently expelled from the cleaning chamber, and thereafter analyzed. The process parameters are then adjusted to adjusted process parameters based on the analysis of the exhaust fluid. Thereafter, the cleaning chamber is again pressurized and cleaning repeated. This pressurization and cleaning is based on the adjusted process parameters. Also, this pressurization and cleaning is repeated until the substrate is sufficiently clean.