Abstract: The present invention pertains to a system for cleaning wafers that includes specialized pressurization, process vessel, recirculation, chemical addition, depressurization, and recapture-recycle subsystems, as well as methods for implementing wafer cleaning using such a system. A solvent delivery mechanism converts a liquid-state sub-critical solution to a supercritical cleaning solution and introduces it into a process vessel that contains a wafer or wafers. The supercritical cleaning solution is recirculated through the process vessel by a recirculation system. An additive delivery system introduces chemical additives to the supercritical cleaning solution via the solvent delivery mechanism, the process vessel, or the recirculation system. Addition of chemical additives to the sub-critical solution may also be performed. The recirculation system provides efficient mixing of chemical additives, efficient cleaning, and process uniformity.

Abstract: The washing chamber includes a housing, a washing chamber interior for spray application of wash water and rinse water, and a water vapor vent for removal of water vapor from the washing chamber interior. The water holding tank is provided for holding wash water and rinse water from the washing chamber. The water vapor recovery line extends from the water vapor vent to an air and liquid water discharge. The water vapor recovery line comprises a condensing region for condensing water vapor present in the condensing region. A method for operating a dishwashing machine is provided.

Abstract: The invention relates to a cleaning apparatus with a filter device. The filter device contains a ceramic filter equipped with a heating device. The heating device serves for thermal sterilisation of the ceramic filter, by which allergenic substances are destroyed.

Abstract: The inventive device for cleaning substrates, especially semiconductor wafers, comprises a treatment basin for receiving at least one substrate, a cover for sealing said treatment basin, a first feeding device for controllably feeding in a reactive gas, a second feeding device for controllably feeding in at least one moist fluid for promoting a reaction between the reactive gas and a deposit to be removed from the substrate and a control device for controlling the concentration of moisture in the treatment basin.

Abstract: A sulfuric acid recycle apparatus capable of concentrating sulfuric acid, which is lowered in concentration upon completion of a wafer cleaning process, to a level to be recycled is provided. The sulfuric acid recycle apparatus for recycling sulfuric acid in a wafer cleaning fluid prepared by mixing sulfuric acid and hydrogen peroxide solution comprises a reaction bath having two openings formed of at least an introduction port and a discharge port for obtaining concentrated sulfuric acid by concentrating sulfuric acid in the wafer cleaning waste fluid introduced from the introduction port upon completion of a wafer cleaning process, then discharging the concentrated sulfuric acid from the discharge port, a wafer processing bath for processing wafers, and a supply unit for supplying the concentrated sulfuric acid to the wafer processing bath.

Abstract: A plasma etching chamber is cleaned with a supply of pressurized nitrogen or argon that is electrically heated. The cleaning cycle is performed during the idle time following an etching cycle. Electrically heated cleaning gas flows into the etching chamber for a predetermined period during which the etching chamber rises. Flow of heated cleaning gas is then stopped, and the etching chamber is evacuated by existing equipment. The cycle can be started automatically using a pressure signal from a conventional purging gas line or from a signal at a SECS/GEM port.

Abstract: A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the drying chamber 42 can be insulated from a space of the cleaning bath 41 through rotary doors 59a and a slide door 72. In the cleaning method, a cleaning process in the cleaning bath 41 is carried out while sealing it by the rotary doors 59a. On the other hand, a drying process in the drying chamber 42 is accomplished while sealing and closing it by the slide door 72. Consequently, there is no possibility that, during the drying process, the object is subjected to a bad influence from a chemical treatment.

Abstract: A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.

Abstract: A cleaning apparatus for removing contaminants from the surface of a substrate includes two parts: one which produces an aerosol including frozen particles and directs the aerosol onto the surface of the substrate to remove contaminants from the surface by physical force, and another part in which a fluid including a gaseous reactant is directed onto the surface of the substrate while the surface is irradiated to cause a chemical reaction between the reactant and organic contaminants on the surface, to chemically removing the organic contaminants. In the method of cleaning the substrate, the physical and chemical cleaning processes are carried out in a separate manner from one another so that the frozen particles of the aerosol are not exposed to the effects of the light used in irradiating the surface of the substrate. Therefore, the effectiveness of the aerosol in cleaning the substrate is maximized.

Abstract: A combination of parallel processes to provide optimal re-mediation operations for contaminated soil. Soils with high levels of heavy petroleum hydrocarbons are directed to a thermal process for destruction in a combustion process. Carbon dioxide generated and recovered in the thermal process is employed as a solvent in a solvent process to clean other soils of petroleum hydrocarbons and certain chlorinated hydrocarbon compounds. In the solvent process, contaminated soils are run through a closed soil separator where the soils are washed with carbon dioxide. The carbon dioxide is then dried from the soil and the soil is sent for segregation. Soils with the lightest forms of hydrocarbon contamination (gasoline, etc.) are subjected to a vaporization process utilizing heat energy generated in the thermal process to heat the soil, under a partial vacuum, and the vapors generated are captured, condensed, and recovered as product.

Abstract: A unit for sterilizing strip packaging material for a pourable food product packaging machine, and having a sterilizing chamber for containing a liquid sterilizing agent and along which the packaging material is fed; a control circuit for controlling the sterilizing agent, and in turn having a collecting tank, input means for feeding the sterilizing agent from the tank to the chamber, and a drain assembly for draining the sterilizing agent from the chamber into the tank; a control system for controlling the temperature in the chamber; and preheating system for preheating the sterilizing agent in the tank, and which may be activated prior to feeding the sterilizing agent from the tank into the chamber; the preheating system for preheating the sterilizing agent may be activated independently of the control system for controlling the temperature in the chamber to bring the sterilizing agent to a temperature at least equal to that of the chamber before the sterilizing agent is fed into the chamber.

Abstract: A continuous flow, steady state fluid delivery and recovery system for a process chamber and processes requiring supercritical fluid and desired additives including co-solvents, for conducting repetitive batch processing operations in an automated environment, for such processes as supercritical carbon dioxide cleaning and processing of semiconductor wafers. The system provides for steady-state operation of fluid flow and byproducts recovery while the process chamber is brought rapidly and repeatedly on and off line as in batch operations and for various process steps.

Abstract: The present invention relates to a dishwasher with enhanced drying performance without using a fan. Water contained in the dishwasher is circulated preferably by means of one of the pumps in the machine (circulation or discharge pump) and through a jet pump placed in the dishwasher in such a manner that the air intake opening is in communication with one of the wash tub surfaces. Water within the dishwasher accelerates due to the kinetic energy acquired during this circulation and its pressure drops locally to a value below the atmospheric pressure. Due to this reduced pressure, water vapour and air from the washtub is suctioned from the tub.

Abstract: A system having a fluid source and a pasteurizer coupled with a disinfectant unit in flow communication with the fluid source for use in disinfecting dental or other water lines. The combination of pasteurizer and disinfectant unit is adapted to receive water from the fluid source. A fluid delivery unit is provided in flow communication with the pasteurizer and disinfectant unit combination. The disinfectant unit has a means for supplying hydrogen and oxygen and a means for generating hydrogen peroxide in flow communication with the means for supplying hydrogen and oxygen.

Abstract: A washing and recycling unit for on-site washing of heavy machinery. The unit has a supporting frame onto which is mounted a washing liquid storage link. A washing hose arrangement connected to the tank injects washing liquid over the heavy machinery. A drainage receptacle positioned under the heavy machinery collects used liquid mixture falling from the heavy machinery. The used liquid mixture is sucked up with a suction hose connected to a cyclone which separates rough solids from liquids. A pump filtering arrangement recycles liquid from a settling tank under the cyclone by pumping it out, filtering it and transferring it into the washing liquid storage tank. A hoisting system mounted onto the supporting frame is used to movably support an operator directing the washing liquid around the heavy machinery.

Abstract: A solvent separator apparatus having a vertical accumulator tank with a top end and a bottom end, the accumulator tank being serially connected to a vertical reservoir tank having a top end and a bottom end; a down tube vertically positioned in the accumulator tank having a top end nearest the top end of the accumulator tank and a bottom end nearest the bottom end of the accumulator tank, with an inlet at the top end of the down tube and an outlet at the bottom end of the down tube; an inlet conduit connected to the inlet of the down tube, the inlet conduit entering the bottom end of the accumulator tank and defining an upward flow path within the accumulator tank to the inlet at the top end of the down tube; a heat exchanger in communication with the down tube for withdrawing heat therefrom; and a transfer conduit defining a downward flow path from the top end of the accumulator tank to the bottom end of the reservoir tank.

Abstract: A fluid delivery system for delivering a process fluid to a vacuum processing system includes a secondary containment line surrounding a process fluid line. A purge gas flows through the secondary containment line and around the process fluid line in order to flow away any leaked process fluid. Alternatively, a heated fluid flows through the secondary containment line forming a heat trace around the process fluid line to heat the process fluid line and the process fluid by means of convection, which provides for precise uniformity of temperature throughout the length of the secondary containment line. The heated fluid loses heat to the ambient environment creating a temperature gradient through which the process fluid flows. The secondary containment line may have a heating element along its length for adding heat to the heated fluid to change the temperature gradient.

Abstract: A kitchenware washing apparatus has a wash tank and a heated tank connected in a manner that they have a common wall for maximum water heating efficiency. In a preferred manner, the common wall has a tiered configuration. A particle accumulator is positioned inside a cabinet of the apparatus and in a flow path of the overflow drain water from the wash tank.

Abstract: A wash water recirculation unit and system for use in cleaning ventilation system equipment, and components of the system, are described.

Abstract: Process and apparatus for recovering clean fiberglass and urea formaldehyde from urea formaldehyde treated waste fiberglass, which involves the use of a continuous batch tunnel machine comprising end to end modules in each of which a perforated basket is rotatable and of such construction as to transfer goods within each basket to subsequent baskets and out the end of the basket at the exit of the machine. The waste fiberglass is introduced into the basket at the entrance to the machine to pass the fiberglass out the end of the machine, during which it passes through acid and wash loops in which the recovery takes place.

Abstract: A carbon dioxide dry cleaning system features a pair of liquid carbon dioxide storage tanks in communication with a compressor. A sealed cleaning chamber contains the objects to be cleaned. By selectively pressurizing the storage tanks with the compressor, liquid carbon dioxide is made to flow to the cleaning chamber through cleaning nozzles so as to provide agitation of the objects being dry cleaned. Liquid carbon dioxide displaced from the cleaning chamber returns to the storage tanks. In an alternative embodiment, a single storage tank is pressurized via a compressor with gas from the cleaning chamber so that liquid solvent from the storage tank travels to the cleaning chamber through nozzles. The objects in the cleaning chamber are agitated by a rotating basket. After a prewash cycle, liquid solvent from the cleaning chamber is directed to a still. The liquid solvent in the still is boiled through a connection with the head space of the cleaning chamber.

Abstract: A sulfuric acid recycle apparatus capable of concentrating sulfuric acid, which is lowered in concentration upon completion of a wafer cleaning process, to a level to be recycled is provided. The sulfuric acid recycle apparatus for recycling sulfuric acid in a wafer cleaning fluid prepared by mixing sulfuric acid and hydrogen peroxide solution comprises a reaction bath having two openings formed of at least an introduction port and a discharge port for obtaining concentrated sulfuric acid by concentrating sulfuric acid in the wafer cleaning waste fluid introduced from the introduction port upon completion of a wafer cleaning process, then discharging the concentrated sulfuric acid from the discharge port, a wafer processing bath for processing wafers, and a supply unit for supplying the concentrated sulfuric acid to the wafer processing bath.

Abstract: A simplified cleaning method for the removal of particulates and adherent residues resulting from the incorporation of laser identification marks onto silicon wafers is described. The cleaning method consists of first immersing the wafers in a heated ammoniacal/hydrogen peroxide RCA-SC-1 cleaning solution in the presence of megasonic agitation. This is followed by a immersion rinse in de-ionized water heated to at least 50° C. Finally the wafers are subjected to at least three quick-dump rinses in room temperature de-ionized water and dried. It is found that the hot de-ionized water rinse provides adequate removal of chemical residues remaining after the particle dislodging action of the megasonically agitated RCA SC-1 solution to eliminate the need for application of the acidic/hydrogen peroxide RCA SC-2 treatment.

Abstract: A flow heater for a sink heater or rethermalizing system is disclosed. The flow heater includes a flow tube in fluid communication with a fluid receptacle. The flow tube has a heating element that is in conductive communication with the flow tube and helically encircles the flow tube. Fluid flowing through the flow tube is caused by thermal siphoning affects. The flow heater system may be used for sanitizing dishware in a sink or for rethermalizing packaged foods.

Abstract: A device for cleaning at least a part of one or more milking machines for milking animals. Said device is provided with a reservoir for containing cleaning fluid, with a supply line connected to the reservoir for supplying cleaning fluid to the part to be cleaned, and with a heating member for heating the cleaning fluid. The device is further provided with a heating start member for activating the heating member immediately after a fixed, predetermined period counted from the preceding heating start activation has elapsed. A milking machine for milking an animal. Said milking machine is provided with a reservoir for containing cleaning fluid, with a supply line connected to the reservoir for supplying cleaning fluid to the part to be cleaned, and with a heating member for heating the cleaning fluid. The milking machine is provided with a heating start member for activating the heating member immediately after a fixed, predetermined period counted from the preceding heating start activation has elapsed.

Abstract: A system and related method for cleaning structures including structures with interior surfaces. The system includes a mixing chamber for selectively combining a cleaning gas and liquid droplets together so that the droplets are entrained in the gas. The combination is directed to the structure to be cleaned. The velocity of the gas combined with the density of the liquid droplets provides a washing momentum to effect removal of particulate matter from the structure. The system also includes a condenser and a separator for separating the liquid from the gas after cleaning. A filter is employed to isolate and measure the quantity of particulate removed from the cooling circuit. A rotameter forms part of the system and is used to measure the accumulated quantity of liquid suitable for effecting a satisfactory cleaning. The system and related cleaning method may be used to clean the cooling system of a rotor bucket.

Abstract: An efficient residential dishwasher is disclosed. The residential dishwasher comprises a washing chamber, a rack within the washing chamber for holding dishes, a water tank for holding hot water to be used to clean dishes located on the rack, and at least one spray head within the washing chamber for cleaning dishes on the rack. After hot water has been delivered from the water tank to the washing chamber, the spray head sprays hot water to the dishes on the rack for the purpose of cleaning. The water tank will be filled with water from a fresh water line in response to a cooking apparatus being turned on.

Abstract: An apparatus for processing a semi-conductor wafer or similar workpiece has one or more liquid outlets for applying a heated process liquid to the wafer within a process chamber. Ozone gas is provided into the chamber directly, or via the processed liquid. Sonic energy is introduced to the workpiece through a layer of liquid. In an alternative design, the wafers are immersed in heated process liquid, and an ozone atmosphere is provided above the liquid. The wafers are then lifted out of the liquid, or the liquid is alternatively drained off. The ozone gas/liquid interface passes down across the surfaces of the wafers.

Abstract: Apparatus for stripping ceramic coatings from the surfaces of articles. The apparatus includes a dedicated pressure vessel, such as an autoclave, which is maintained at an elevated temperature. Caustic solution is preheated to a first elevated temperature before injecting it into the autoclave, and the caustic solution is filtered and cooled after use in the autoclave. The articles are stripped of coating by maintaining the articles at an elevated temperature and pressure for a predetermined time. Various options include the use of analytical equipment to maintain the chemistry of the caustic solution and use of a volatile organic solution to prepressurize the autoclave and shorten cycle time. The autoclave is maintained in a nitrogen chamber to minimize the risks associated with volatile components.

Abstract: A denture wash for more thoroughly and easily cleaning dentures. The denture wash includes a lower assembly comprising a bottom wall, four walls, a plurality of nozzles, a first central nozzle, and a pump, a upper unit assembly comprising a lid, four walls, a plurality of nozzles, and a second central nozzle, and a denture holding assembly.

Abstract: Apparatus for stripping ceramic coatings from the surfaces of articles. The apparatus includes a dedicated pressure vessel, such as an autoclave, which is maintained at an elevated temperature. Caustic solution is preheated to a first elevated temperature before injecting it into the autoclave, and the caustic solution is filtered and cooled after use in the autoclave. The articles are stripped of coating by maintaining the articles at an elevated temperature and pressure for a predetermined time. Various options include the use of analytical equipment to maintain the chemistry of the caustic solution and use of a volatile organic solution to prepressurize the autoclave and shorten cycle time. The autoclave is maintained in a nitrogen chamber to minimize the risks associated with volatile components.

Abstract: A cleaning apparatus and a cleaning method for cleaning an object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the drying chamber 42 can be insulated from a space of the cleaning bath 41 through rotary doors 59a and a slide door 72. In the cleaning method, a cleaning process in the cleaning bath 41 is carried out while sealing it by the rotary doors 59a. On the other hand, a drying process in the drying chamber 42 is accomplished while sealing and closing it by the slide door 72. Consequently, there is no possibility that, during the drying process, the object is subjected to a bad influence from a chemical treatment.

Abstract: A carbon dioxide dry cleaning system features a pair of liquid carbon dioxide storage tanks in communication with a compressor. A sealed cleaning chamber contains the objects to be cleaned. By selectively pressurizing the storage tanks with the compressor, liquid carbon dioxide is made to flow to the cleaning chamber through cleaning nozzles so as to provide agitation of the objects being dry cleaned. Liquid carbon dioxide displaced from the cleaning chamber returns to the storage tanks. In an alternative embodiment, a single storage tank is pressurized via a compressor with gas from the cleaning chamber so that liquid solvent from the storage tank travels to the cleaning chamber through nozzles. The objects in the cleaning chamber are agitated by a rotating basket. After a prewash cycle, liquid solvent from the cleaning chamber is directed to a still. The liquid solvent in the still is boiled through a connection with the head space of the cleaning chamber.

Abstract: A method is provided for final rinsing in a dish washing machine with clean hot water from a water heater having an elongated standing flow tank which has a cold water inlet with a shut-off valve at the bottom and a hot water outlet at the top and a heating element in the lower part. The temperature of the water is sensed at a location above the lower end of the tank. The shut-off valve is opened for supply of cold water under pressure to the lower end of the tank. Hot water is delivered from the upper end of the tank. The period from opening of the shut-off valve to the time of sensing a temperature decrease in a boundary layer between hot and cold water at the above-mentioned location is measured and on the basis thereof the flow and the period for movement of the boundary layer from this location to a desired position in the tank is calculated.

Abstract: A washing and recycling unit for on-site washing of heavy machinery. The unit has a supporting frame onto which is mounted a washing liquid storage tank. A washing hose arrangement connected to the tank injects washing liquid over the heavy machinery. A drainage receptacle positioned under the heavy machinery collects used liquid mixture falling from the heavy machinery. The used liquid mixture is sucked up with a suction hose connected to a cyclone which separates rough solids from liquids. A pump and filtering arrangement recycles liquid from a settling tank under the cyclone by pumping it out, filtering it and transferring it into the washing liquid storage tank. A hoisting system mounted onto the supporting frame is used to movably support an operator directing the washing liquid around the heavy machinery.

Abstract: A continuous flow, steady state fluid delivery and recovery system for a process chamber and processes requiring supercritical fluid and desired additives including co-solvents, for conducting repetitive batch processing operations in an automated environment, for such processes as supercritical carbon dioxide cleaning and processing of semiconductor wafers. The system provides for steady-state operation of fluid flow and byproducts recovery while the process chamber is brought rapidly and repeatedly on and off line as in batch operations and for various process steps.

Abstract: The present invention comprises methods, compositions and apparatus for cleaning the surfaces within vessels that have restricted points of entry, and in particular, the surfaces within oxygen converters and oxygen cylinders. These oxygen converters and oxygen cylinders are components of the onboard oxygen supply systems of aircraft. A surfactant and a solvent are mixed to form a cleaning composition that is boiled at reduced pressure and increased temperature within the oxygen converter or oxygen cylinder. The oxygen converter or oxygen cylinder is rinsed with pure solvent, and the rinse fluid is measured to determine the level of contaminants. Dry air is forced through the oxygen converter or oxygen cylinder to remove remaining solvent. The cleaning composition may comprise a fluorocarbon solvent and a fluorosurfactant.

Abstract: In a dishwasher having a dishwashing compartment and a pump fluidically connected to the dishwashing compartment for channeling liquid to the dishwashing compartment, the pump disposed outside the dishwashing compartment and including a pump housing defining an interior and housing a motor and an impeller, a heater for heating dishwashing liquid includes a heating device disposed on the pump housing in heat-conducting contact with the interior of the pump housing.

Abstract: A heated high pressure air and/or a high pressure water are spouted through nozzles. Therefore, the coated layer is removed without crushing the bumper unlike in the conventional method, and therefore, a plurality of process steps can be skipped. Thus the bulk of the apparatus can be reduced, the operating cost can be lowered, and the environment can be protected. The method for removing a coated layer includes the step of installing a bumper to be subjected to a removal of the coated layer. Then the coated layer is removed from the bumper by spouting water and/or a pre-heated air to the bumper. Then the bumper is carried to a predetermined psition after removing the coated layer, and then the bumper is detached. The apparatus includes an installing/detaching means for installing/detaching the bumper to be subjected to a removal of the coated layer.

Abstract: A fluid delivery system For delivering a process fluid to a vacuum processing system includes a secondary containment line surrounding a process fluid line. A purge gas flows through the secondary containment line and around the process fluid line in order to flow away any leaked process fluid. Alternatively, a heated fluid flows through the secondary containment line forming a heat trace around the process fluid line to heat the process fluid line and the process fluid by means of convection, which provides for precise uniformity of temperature throughout the length of the secondary containment line. The heated fluid loses heat to the ambient environment creating a temperature gradient through which the process fluid flows. The secondary containment line may have a heating element along its length for adding heat to the heated fluid to change the temperature gradient.

Abstract: A method for cleaning or sterilizing objects in a liquid fluid cleaning system comprising a high-pressure storing/working vessel, a cleaning chamber, and a low-pressure supply vessel, the method comprising the steps of loading the cleaning chamber with objects to be cleaned or sterilized; supplying cleaning fluid to the cleaning chamber from the low-pressure supply vessel by means of pressure difference; supplying cleaning fluid to the cleaning chamber from the high-pressure storing/working vessel; cleaning the objects in the cleaning chamber with the cleaning fluid; transferring cleaning fluid from the cleaning chamber to the high-pressure storing/working vessel; and unloading the cleaned objects from the cleaning chamber.

Abstract: A system and method for containment and recovery of vapors in a general parts washer apparatus, wherein a solvent is delivered to a wash area for washing articles therein; the system including a unit supported in air flow communication with the wash area and having a fan for drawing solvent vapors in a flow of air from within the wash area and through the unit. Activated carbon filters within the unit separate moisture from the air flow to trap solvent within a separation chamber. During a distillation cycle, a vacuum activated valve assembly closes the separation chamber and a heater raises the temperature within the separation chamber, under negative pressure, causing liquid solvent in the chamber to vaporize. The solvent vapors are removed from the separation chamber and converted to pure liquid solvent in a condenser. The pure liquid solvent is thereafter directed to a clean solvent holding tank in the parts washer apparatus.

Abstract: A molding die for a cold box process is opened after usage. Washing water is heated at a temperature of 70° C. or more, and is blown to a molding surface of the molding die at a high pressure of 10 MPa or more. The cold-box-process molding die can be washed by this process easily and fully.

Abstract: The invention provides a treating process and system using a chemical treating liquid, which enables uniform treatments to be carried out within a reduced period of time. A heating tube is used to heat a fluid passing therethrough by irradiation of the fluid with microwaves. A pressurizer is provided upstream of the heating tube, and a throttle valve is provided downstream of the heating tube, so that the boiling of the fluid is prevented by activating the pressurizer to increase the internal pressure of the heating tube. A mixer comprising opposite nozzles is provided to jet fluids from the nozzles for collision with each other, so that the fluids are uniformly mixed. The treating process and system are suitable for semiconductor unit production.

Abstract: A carbon dioxide dry cleaning system features a pair of liquid carbon dioxide storage tanks in communication with a compressor. A sealed cleaning chamber contains the objects being dry cleaned. By selectively pressurizing the storage tanks with the compressor, liquid carbon dioxide is made to flow to the cleaning chamber through cleaning nozzles so as to provide agitation of the objects being dry cleaned. Liquid carbon dioxide displaced from the cleaning chamber returns to the storage tanks. A still is disposed within one of the storage tanks and receives soiled liquid carbon dioxide as it is returned from the chamber. The pressure in the storage tank causes the soiled liquid carbon dioxide in the still to boil off. The gas is communicated to a third tank. The third tank may be used to initially pressurize the cleaning chamber. The system also includes a dispenser for the injecting solvent additives into the liquid carbon dioxide.

Abstract: A fluid delivery system for delivering a process fluid to a vacuum processing system includes a secondary containment line surrounding a process fluid line. A purge gas flows through the secondary containment line and around the process fluid line in order to flow away any leaked process fluid. Alternatively, a heated fluid flows through the secondary containment line forming a heat trace around the process fluid line to heat the process fluid line and the process fluid by means of convection, which provides for precise uniformity of temperature throughout the length of the secondary containment line. The heated fluid loses heat to the ambient environment creating a temperature gradient through which the process fluid flows. The secondary containment line may have a heating element along its length for adding heat to the heated fluid to change the temperature gradient.

Abstract: A heated high pressure air and/or a high pressure water are spouted through nozzles. Therefore, the coated layer is removed without crushing the bumper unlike in the conventional method, and therefore, a plurality of process steps can be skipped. Thus the bulk of the apparatus can be reduced, the operating cost can be lowered, and the environment can be protected. The method for removing a coated layer includes the step of installing a bumper to be subjected to a removal of the coated layer. Then the coated layer is removed from the bumper by spouting water and/or a pre-heated air to the bumper. Then the bumper is carried to a predetermined psition after removing the coated layer, and then the bumper is detached. The apparatus includes an installing/detaching means for installing/detaching the bumper to be subjected to a removal of the coated layer.

Abstract: A separator for separating curable material including liquid, especially residual concrete, residual mortar and the like, having a conveying screw which is disposed in a receiving trough. The rotary axle of the conveying screw extends transversely to the horizontal. The conveying screw increases in diameter, starting from its lower upstream end, and the section of the floor of the receiving trough, which is assigned to the enlarged region of the conveying screw, extends essentially horizontally. The screw has a second following section of decreasing diameter. The floor section at that the second screw section is inclined transversely to the horizontal. An additional screw conveyor may be attached beyond the second section. In an alternate embodiment, the screw has two cylindrical sections of different diameter. A transfer bucket wheel moves material between come of the screw sections.

Abstract: A portable system for recovering oil-based fluids from sorbent articles containing oil-based fluids, the system including a motor vehicle and a self-balancing centrifuge having a housing and a foraminous rotatable basket removably attached to a spindle in the housing, the centrifuge being attached to the vehicle for transport to a remote site, the basket having a solid base having a mass sufficient to provide self-balancing rotation of the basket and the basket being configured for receiving a plurality of the sorbent articles therein, wherein rotation of the centrifuge basket applies sufficient centrifugal force to the sorbent articles to cause removal of oil-based fluids therefrom such that the fluids travel from the basket into an annular area between the basket and the housing and from the housing to a fluid recovery tank and the sorbent articles are essentially fluid free.

Abstract: An apparatus for washing and recovering a contaminant from an object. A washing agent flows over the object, and the washing agent and contaminant are received in a basin. A slurry of the washing agent and contaminant are circulated through at least one separator and one filter to produce a cleaned slurry flow. The cleaned slurry flow is recirculated into the basin. A first pump which is used to flow the washing agent over the object has a supply port and a pressurized output port. A pressurized fluid supply is coupled to a variable regulator with a variable pressure output. A second pump driven by the variable pressure output impels the washing agent into the supply port of the first pump.