Abstract: An improved method and apparatus for adjusting chemistry concentrations and temperatures within a substrate processing tank is provided. A first aspect may include checking the fluid level within the tank, and, if the level is higher than a predetermined upper level, bleeding an amount of fluid from the tank; if the level is lower than a predetermined lower level, flowing an amount of fluid to the tank, and if the level is between the predetermined upper and lower levels, bleeding an amount of fluid from the tank and flowing an amount of fluid to the tank. A second aspect may include flowing water into the tank at a flow rate at least equivalent to the flow rate of water required to achieve a chemistry spike of a predetermined concentration and volume prior to beginning the flow of chemicals. A third aspect may include a method and apparatus for heating or cooling chemistry to a predetermined temperature as the chemistry is recirculated.

Abstract: A wash water recirculation unit and system for use in cleaning ventilation system equipment, and components of the system, are described.

Abstract: A method for cleaning an object to be processed in which the atmosphere in a drying chamber is replaced by an inert gas prior to placing an object to be cleaned from an external environment into the chamber. The object is then transported by an elongated retaining member from the drying chamber through a lower opening in the chamber into a processing bath disposed below the chamber. The object is then cleaned in the processing bath. The object is then transported from the processing bath to the drying chamber where it is dried by filling the atmosphere of the drying chamber with organic solvent. The cleaning process in the cleaning bath is carried out while the bath is screened by a nitrogen-gas curtain. The method also includes opening a lid of the chamber prior to insertion of the object into the chamber and closing the lid after insertion of the object, as well as the opening and closing of the lower opening in the chamber.

Abstract: A flow heater for a sink heater or rethermalizing system is disclosed. The flow heater includes a flow tube in fluid communication with a fluid receptacle. The flow tube has a heating element that is in conductive communication with the flow tube and helically encircles the flow tube. Fluid flowing through the flow tube is caused by thermal siphoning affects. The flow heater system may be used for sanitizing dishware in a sink or for rethermalizing packaged foods.

Abstract: A simplified cleaning method for the removal of particulates and adherent residues resulting from the incorporation of laser identification marks onto silicon wafers is described. The cleaning method consists of first immersing the wafers in a heated ammoniacal/hydrogen peroxide RCA-SC-1 cleaning solution in the presence of megasonic agitation. This is followed by a immersion rinse in de-ionized water heated to at least 50° C. Finally the wafers are subjected to at least three quick-dump rinses in room temperature de-ionized water and dried. It is found that the hot de-ionized water rinse provides adequate removal of chemical residues remaining after the particle dislodging action of the megasonically agitated RCA SC-1 solution to eliminate the need for application of the acidic/hydrogen peroxide RCA SC-2 treatment.

Abstract: An apparatus and method for cleaning and rinsing of disk-shaped objects, such as silicon wafers, high precision lenses and the like. The cleaning and rinsing may take place in a single chamber, that is sequentially filled with cleaning solution, rinsing solution, and the like. In an important aspect of the invention, chemical cleaning solutions are dumped to containers and recycled for the use. Moreover, a cleaning solution composition may be monitored, and the concentration of solution can be adjusted automatically, or make-up chemicals may be added, as necessary. The apparatus has a relatively small footprint and maybe surrounded with an enclosure that may be kept at lower than atmosphere pressure to prevent escape of potentially hazardous contaminants into the environment. In preferred embodiments of the invention, the handling of wafers to be cleaned is carried out robotically, most preferably using a robot with at least two end-effectors, each adapted for a specific function.

Abstract: A drying apparatus comprises a drying vessel, a treatment liquid feeder-discharger for feeding pure water into the drying vessel, a vapor supplier for supplying an organic solvent vapor to the space over the pure water, inert gas suppliers for supplying an inert gas with which the organic solvent vapor is diluted, and a heated organic solvent supplier for forming a film of the organic solvent on a liquid level of the pure water. After the wafer is immersed in the pure water, the pure water is gradually discharged from the drying vessel by means of the treatment liquid feeder-discharger. Since the wafer passes through the organic solvent film as it is exposed above the liquid level, the organic solvent of the film adheres to the surface of the wafer, and the organic solvent vapor is condensed on the surface of the wafer that is exposed above the liquid level.

Abstract: Provided is a parts washer that includes a multi-tiered basin, a cleaning fluid and a biological component, living within the fluid, that breaks down organic waste. The multi-tiered basin includes a sink member with a false bottom, and a support grid and filter are interposed between the false bottom and a bottom panel of the sink member. The false bottom, support grid, and filter are readily removable from the sink member. The tank is partially filled with the cleaning fluid and a pump and conduit assembly direct a flow of the cleaning fluid to the basin. The cleaning fluid discharged into the basin flows through a drain hole in the false bottom, through the filter and support grid, and then through a drain hole in the bottom panel of the sink member back into the tank for reuse. The cleaning fluid includes, at least, a surfactant that functions to remove organic waste from the parts being washed.

Abstract: A cleaning method for a CVD apparatus which forms films on wafers by introducing film forming gas into a chamber by means of a shower head. In this method, the NF3 gas, which forms the cleaning gas including a compound containing fluorine atoms, is activated by exposure to microwaves by a microwave generating source, and then introduced into the chamber. The temperature of the lid section is raised by heating the lid section by means of a heater plate, or halting supply of cooling water to the lid section from the water supply source, whereby the temperature of the shower head during cleaning is raised above the temperature at which film formation onto the wafer is performed.

Abstract: A contaminant flushing machine for removing contaminants from a container, such as an engine transmission or transmission cooler which includes hoses for coupling to the transmission cooler and a pump for circulating fluid through the hoses and the transmission cooler and a fluid filter having a reduced tendency towards causing vaporization of the fluid. Also included in the contaminant flushing machine is an automatic aeration system for injecting air into the circulating fluid at predetermined intervals. Additionally, a reverse flow piping circuit is included to permit automatic and electric manipulation of the flow direction of fluid through said transmission cooler while at the same time not altering the direction of flow of fluid through the filter and the pump.

Abstract: Provided is a parts washer that includes a multi-tiered basin, a cleaning fluid and a biological component, living within the fluid, that breaks down organic waste. The multi-tiered basin includes a sink member with a false bottom, and a support grid and filter are interposed between the false bottom and a bottom panel of the sink member. The false bottom, support grid, and filter are readily removable from the sink member. The tank is partially filled with the cleaning fluid and a pump and conduit assembly direct a flow of the cleaning fluid to the basin. The cleaning fluid discharged into the basin flows through a drain hole in the false bottom, through the filter and support grid, and then through a drain hole in the bottom panel of the sink member back into the tank for reuse. The cleaning fluid includes, at least, a surfactant that functions to remove organic waste from the parts being washed.

Abstract: Apparatus for stripping ceramic coatings from the surfaces of articles. The apparatus includes a dedicated pressure vessel, such as an autoclave, which is maintained at an elevated temperature. Caustic solution is preheated to a first elevated temperature before injecting it into the autoclave, and the caustic solution is filtered and cooled after use in the autoclave. The articles are stripped of coating by maintaining the articles at an elevated temperature and pressure for a predetermined time. Various options include the use of analytical equipment to maintain the chemistry of the caustic solution and use of a volatile organic solution to prepressurize the autoclave and shorten cycle time. The autoclave is maintained in a nitrogen chamber to minimize the risks associated with volatile components.

Abstract: A method for etching substrates, comprising providing at least a first and a second substrate having a coating selected from the group consisting of semiconductor coatings, metallic coatings, and mixtures thereof and introducing at least the first substrate and an etchant into a first tank to etch at least a portion of the coating from the first substrate, introducing at least the second substrate into a second tank and transferring the etchant from the first tank to the second tank to provide etch of at least a portion of the coatings from the second substrate, and removing the etched first substrate from the first tank.

Abstract: Disclosed is a process of recycling and reusing an aqueous degreasing solution for further use as a component of a coolant solution which is itself recycled and reused in metal cutting machines. Also disclosed is a method of degreasing parts, and a degreasing apparatus which is controlled such that an appropriate amount of the aqueous degreasing solution is introduced into the coolant solution. Finally, disclosed herein is a method and system for preparing a coolant in which an aqueous degreasing solution is further utilized as a feeder solution for a coolant solution, with the resulting solution being able to be separated into its component parts and reused in the cutting and cleaning of metals to form metal parts.

Abstract: A household dishwasher, includes a dishwashing compartment, a circulating pump for delivering liquid to the dishwashing compartment, a flow heater having an inflow connection fluidically connected to the circulating pump and at least two outlet connections, spray devices disposed in the dishwashing compartment and fluidically connected to outlet connections for supplying the liquid to each of the spray devices, and a changeover device for selectively opening and closing the spray devices. The spray devices subject items disposed in the dishwashing compartment and to be cleaned to an action of a liquid delivered by the circulating pump. The changeover device is disposed in a non-restricting location at the flow heater upstream of the outlet connections with respect to a liquid flow direction and opens and/or closes one of the outlet connections or a number of outlet connections or all the outlet connections are alternately one after the other and/or on a permanent basis. A method is also provided.

Abstract: The present invention comprises methods, compositions and apparatus for cleaning the surfaces within vessels that have restricted points of entry, and in particular, the surfaces within oxygen converters and oxygen cylinders. These oxygen converters and oxygen cylinders are components of the onboard oxygen supply systems of aircraft. A surfactant and a solvent are mixed to form a cleaning composition that is boiled at reduced pressure and increased temperature within the oxygen converter or oxygen cylinder. The oxygen converter or oxygen cylinder is rinsed with pure solvent, and the rinse fluid is measured to determine the level of contaminants. Dry air is forced through the oxygen converter or oxygen cylinder to remove remaining solvent. The cleaning composition may comprise a fluorocarbon solvent and a fluorosurfactant.

Abstract: Provided is a system for parts washing that includes a fluid that performs a cleaning function and maintains the viability of microorganisms in the fluid that biodegrade the organic matter removed from the parts. “Parts” include objects such as automotive parts befouled with organic matter and particulate matter. The cleaning fluid includes a surfactant that functions to separate organic waste from the parts being washed. The cleaning fluid is both in a cleaning area and in a housing for microorganisms. A heater, thermostat, and a level control assembly function to maintain the cleaning fluid within a certain temperature range so as to maintain a proper environment for the microorganisms. The fluid recirculates from the microorganism housing to the parts cleaning area.

Abstract: A high pressure pump (14) supplies cleaning fluid from a reservoir (12) to spray nozzles (20) inside a washing chamber (10). The spray nozzles (20) spray the cleaning fluid over a load to be cleaned. Used cleaning fluid is collected in a sump (30). A sump pump (32) drains the sump. The combination of the high pressure pump and sump pump provides more efficient cleaning of the load and eliminates the requirement for a deep sump beneath the washer. A vertical traveler (22), having a pair of counterbalanced spray arms (24), raises and lowers the spray nozzles counter cyclically; a detergent injection system (50) accurately meters a correct amount of detergent is added to the cleaning fluid; and a filtration device (34) filters suspended material from the used cleaning fluid and uses a portion of the cleaning fluid to clean itself.

Abstract: Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out the cleaning method.

Abstract: A cleaning apparatus has a processing tank (21) for containing a processing liquid in which semiconductor wafers (W) are immersed, and a tubular vessel(22a) having a processing chamber (23) containing the processing tank (21). A side wall (26) of the vessel (22a), and a first partition wall (28) having an upright wall (27) standing on a bottom plate (23a) defining the bottom of the processing chamber (23) form a side ventilating duct (24). The bottom wall (30) of the vessel (22a), and a second partition wall (29) substantially horizontally extending from the lower end of the first partition wall (28) form a bottom ventilating duct (25). The side ventilating duct (24) and the bottom ventilating duct (25) can compactly arrange devices and pipes for supplying and discharging the cleaning liquid for cleaning semiconductor wafers (W), easily maintain the devices and pipes, easily arrange a ventilating system to the cleaning apparatus, and improve ventilation efficiency.

Abstract: The invention provides a treating process and system using a chemical treating liquid, which enables uniform treatments to be carried out within a reduced period of time. A heating tube is used to heat a fluid passing therethrough by irradiation of the fluid with microwaves. A pressurizer is provided upstream of the heating tube, and a throttle valve is provided downstream of the heating tube, so that the boiling of the fluid is prevented by activating the pressurizer to increase the internal pressure of the heating tube. A mixer comprising opposite nozzles is provided to jet fluids from the nozzles for collision with each other, so that the fluids are uniformly mixed. The treating process and system are suitable for semiconductor unit production.

Abstract: A method and an apparatus for preventing silicon hole defect formation on a silicon wafer after a wet cleaning process are disclosed. In the method, a supply tank and a cleaning tank are provided which are connected together in fluid communication by a conduit. The conduit is cooled by a wrapped around cooling tube and a cooling water flowing through the tube at a temperature of less than 20° C. The apparatus of the wet cleaning station may further include a pump for transporting an aqueous solution of ammonia from the supply tank to the cleaning tank, a safety overflow conduit for protecting the supply tank that holds the aqueous solution of ammonia, and a flow control valve in the conduit between the supply tank and the cleaning tank. The present invention novel method and apparatus effectively prevents the formation of ammonia vapor in the mini-environment that surrounds the cleaning tank and the rinse tank.

Abstract: A waste object containing oil has a first opening formed therein at an upper portion thereof and a second opening positioned below the first opening. The first and second openings are connected to a recovery tank. Hot water of a predetermined temperature is held in the recovery tank and is caused to accumulate inside the waste object via the second opening. Oil that has floated upwards is recovered in the recovery tank via the first opening.

Abstract: A parts cleaner for removing oil, grease and contaminants from parts or items. The cleaner has a sink supported on a base. A modular housing containing a reservoir is removably positioned below the sink and includes a pump and electrical components. The pump is connected to a dispensing apparatus at the sink for delivery of cleaning solution. The sink drain communicates with the reservoir via a flexible line. The modular housing may be removed for servicing and servicing may be accomplished by replacing the removed modular housing with another previously serviced unit so the removed unit may be conveniently and environmentally safely serviced at a remote central servicing location.

Abstract: A sealed aqueous self cleaning rinse sump is provided for an aqueous spray washer. The rinse sump is pressurized by a weir restriction which directs return fluid into the rinse sump while simultaneously providing a pressure seal at the inlet of the rinse sump. The pressurized sump facilitates evaporation of the rinse fluid in order to separate contaminants out of the rinse fluid. The evaporated rinse fluid is then condensed and then returned to the rinse sump, thereby providing a consistently acceptable supply of clean rinse fluid.

Abstract: The purpose of the present invention is to provide a cleaning apparatus and a cleaning method which can prevent the object to be processed being subjected to a bad influence caused by a chemical treatment, have a high degree of freedom in designing the apparatus, make the cleaning process rapid and be designed in smaller size. In this cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the drying chamber 42 can be insulated from a space of the cleaning bath 41 by a nitrogen-gas curtain 59c and a slide door 72. In the cleaning method, a cleaning process in the cleaning bath 41 is carried out while screening it by the nitrogen-gas curtain 59c. On the other hand, a drying process in the drying chamber 42 is accomplished while sealing and closing it by the slide door 72.

Abstract: A parts washer is disclosed. The parts washer includes a housing that has a washbasin defining an inner cavity and chargeable with a volume of fluid. A spray tube is rotatably positioned within the housing and has an axis of rotation. The spray tube is configured to define a volume of rotation as it rotates about its axis of rotation. A support structure configured to support parts to be washed is positioned within the housing and is substantially within the volume of rotation of the spray tube. The parts washer further includes a pump connected to the spray tube. The pump delivers fluid under pressure to the spray tube. The spray tube includes a plurality of outlets configured to direct fluid towards parts to be washed on the support structure and at least one outlet configured to direct fluid in a direction to cause fluid-propelled rotation of the spray tube about its axis of rotation.

Abstract: A drying apparatus and method of drying is provided for drying a semiconductor member mounted in a carrier that is placed in a processing tank through contact with isopropyl alcohol. An isopropyl alcohol liquid is vaporized in a bottom portion of the processing tank, and the resulting vapor is condensed in its top portion. A heater is disposed so as to heat the inside of the processing tank to keep the inside at a predetermined temperature range in a middle-layer portion, i.e., a drying portion, of the processing tank. The heater is covered with a heat insulating member.

Abstract: Method and system of rejuvenating pressurized fluid solvents used for cleaning a substrate in a pressurized vessel. A primary flow of the pressurized fluid solvent is continuously cycled from the pressurized vessel through a series of filters to remove insoluble and soluble contaminants, and then returned to the pressurized vessel. A secondary flow of the pressurized fluid solvent, preferably equivalent to less than about 40% of the primary flow, is directed either continuously or intermittently during the cleaning operation to an evaporator to evaporate the pressurized fluid solvent of the secondary flow into a vapor and to separate contaminants therefrom. The vapor from the evaporator is then either liquified by a compressor or condenser to create rejuvenated pressurized fluid solvent and redirected to the pressurized vessel for further use, or vented to atmosphere and replaced by new pressurized fluid solvent from a supply tank.

Abstract: Provided is a parts washer that includes a multi-tiered basin, a cleaning fluid and a biological component, living within the fluid, that breaks down organic waste. The multi-tiered basin includes a sink member with a false bottom, and a support grid and filter are interposed between the false bottom and a bottom panel of the sink member. The false bottom, support rid, and filter are readily removable from the sink member. The tank is partially filled with the cleaning fluid and a pump and conduit assembly direct a flow of the cleaning fluid to the basin. The cleaning fluid discharged into the basin flows through a drain hole in the false bottom, through the filter and support grid, and then through a drain hole in the bottom panel of the sink member back into the tank for reuse. The cleaning fluid includes, at least, a surfactant that functions to remove organic waste from the parts being washed.

Abstract: A parts washer is disclosed. The parts washer includes a housing that has a washbasin or wash chamber defining an inner cavity and chargeable with a volume of fluid. A spray tube is rotatably positioned within the housing and has an axis of rotation. The spray tube is configured to define a volume of rotation as it rotates about its axis of rotation. A support structure configured to support parts to be washed is positioned within the housing and is substantially within the volume of rotation of the spray tube. The parts washer further includes a pump connected to the spray tube. The pump delivers fluid under pressure to the spray tube. The spray tube includes a plurality of outlets configured to direct fluid toward parts to be washed on the support structure and at least one outlet configured to direct fluid in a direction to cause fluid-propelled rotation of the spray tube about its axis of rotation.

Abstract: Provided is a parts washer that includes a multi-tiered basin, a cleaning fluid and a biological component, living within the fluid, that breaks down organic waste. The multi-tiered basin includes a sink member with a false bottom, and a support grid and filter are interposed between the false bottom and a bottom panel of the sink member. The false bottom, support grid, and filter are readily removable from the sink member. The tank is partially filled with the cleaning fluid and a pump and conduit assembly direct a flow of the cleaning fluid to the basin. The cleaning fluid discharged into the basin flows through a drain hole in the false bottom, through the filter and support grid, and then through a drain hole in the bottom panel of the sink member back into the tank for reuse. The cleaning fluid includes, at least, a surfactant that functions to remove organic waste from the parts being washed.

Abstract: The present invention provides a low-cost and practical method for cleaning objects such as wheelchairs on a continuous basis. In one embodiment, the apparatus of the present invention is a mobile, self-contained system in which objects are cleaned and sanitized as they travel in a U-shaped path within a wash chamber. As the objects enter the first side of the wash chamber, suitably located water jets spray the objects with a mixture of detergent and water to remove associated foreign materials until shortly after the objects make a U-turn. At this point, the objects are first sprayed with a mixture containing a rinse agent and water, then with a spray containing disinfectant and water. The objects are thereafter dried by suitable drying means such as a high velocity air curtain system. The continuous washing system of the present invention preferably has a self-contained water heater to pre-heat the water prior to its being sprayed onto the objects.

Abstract: A cleaning system (1, 5) having multiple cleaning chambers (200) is provided. Each cleaning chamber (200) includes an interior region sufficient for immersing a carrier (242), which has at least one wafer disposed therein, into an ultra-clean liquid. The cleaning chamber (200) also has an inlet operably coupled to the interior region to introduce a gas into the interior region and a drain operably coupled to the interior region to remove the ultra-clean liquid from the interior region at a selected rate. A controller 14 is operably coupled to the chamber (200) for selectively controlling the selected rate. In an alternative embodiment, an installation technique (80) for the above cleaning system (1,5) is provided.

Abstract: The process concerns the cleaning of workpieces exhibiting organic residues, with the use of a fluid introduced under pressure into a pressure tank loaded with the workpieces. According to the invention, the fluid is circulated during the cleaning step, using preferably liquefied gases, e.g. carbon dioxde, as the fluid. By the use of a heat exchanger, the temperature of the fluid can be regulated during the process.

Abstract: A cleaning equipment for semiconductor substrates, which includes a cleaning tank 2 for cleaning the semiconductor substrates and a circulation filtering device, wherein the cleaning equipment has a pump 6 and a filter unit 7 disposed in a filtering line for cleaning impurities contained in a cleaning liquid, a gas mixing device 8 having a temperature-adjusting function and which is disposed downstream of the pump 6 and the filter unit 7 for adjusting a temperature of the cleaning liquid and dissolving the gas into the cleaning liquid, and a gas-separating device 9 which is disposed downstream of the gas mixing device 8 for separating an undissolved portion of the mixed gas from the cleaning liquid.

Abstract: A vapor feed supply system including a vaporizer device and a method of cleaning a vapor flow region employing such a vaporizer device enables thorough cleaning of the system, without having to degrade the overall system vacuum in the process of cleaning the vaporizer device. The method includes defining a cleaning fluid passage having a predetermined withstand pressure by isolating a cleaning region of the vapor flow region, and flowing a cleaning fluid into the cleaning fluid passage under a pressure so as to enable the cleaning fluid to remain in a liquid state at a cleaning temperature of the cleaning region.

Abstract: An improved vapor degreaser with a tank having a conventional lower portion with a solvent which is heated and cooling coils which largely combine the solvent vapor zone to a solvent vapor level. An upper tank portion rests above the conventional tank and has a second set of cooling coils. A first cover is placeable between the conventional tank and the upper tank portion. A second cover is placeable over the upper tank portion to provide a vapor degreaser with a much lower chance of any vapors escaping the degreaser.

Abstract: Method and system of rejuvenating pressurized fluid solvents used for cleaning a substrate in a pressurized vessel. A primary flow of the pressurized fluid solvent is continuously cycled from the pressurized vessel through a series of filters to remove insoluble and soluble contaminants, and then returned to the pressurized vessel. A secondary flow of the pressurized fluid solvent, preferably equivalent to less than about 40% of the primary flow, is directed either continuously or intermittently during the cleaning operation to an evaporator to evaporate the pressurized fluid solvent of the secondary flow into a vapor and to separate contaminants therefrom. The vapor from the evaporator is then either liquified by a compressor or condenser to create rejuvenated pressurized fluid solvent and redirected to the pressurized vessel for further use, or vented to atmosphere and replaced by new pressurized fluid solvent from a supply tank.

Abstract: A thermal input system is provided for a dishwasher having an interior wash chamber receiving soiled dishes and wash liquid. A heater is disposed in a sump region of the wash chamber along with a wash pump which operates to recirculate wash liquid through out the wash chamber. A soil collection chamber receives a portion of recirculating wash liquid from the wash pump wherein soils entrained in the wash liquid are captured within the soil collection chamber. A pressure sensor senses fluid pressure within the soil collection chamber. Control means are provided for energizing the heater during a thermal hold period in response to the pressure within the soil collector exceeding a predetermined limit pressure. In particular, the control means operates to sequence the dishwasher through a predetermined period of operation but bypasses the thermal hold cycle when the pressure within the soil collector does not exceed the predetermined limit pressure.

Abstract: A method of vapor degreasing workpieces using a refrigerated vapor degreasing system. The system has a tank for containing a bath of degreasing solvent, a heater for vaporizing the solvent, a primary solvent condenser, a secondary solvent condenser, and a single refrigeration unit which can be switched to operate in two different modes. Workpieces are loaded and supported within the tank. The degreasing solvent is heated and evaporated in the tank. Refrigerant is cycled in a closed-loop, single compressor refrigeration system as low-pressure/low-temperature vapor, high-pressure/high-temperature vapor, high-pressure/low-temperature liquid, low-pressure/low-temperature vapor, and low-pressure/low-temperature liquid. A degreasing zone is formed around the workpiece and a primary evaporation barrier is formed above the workpiece by circulating low-pressure/low-temperature refrigerant from the refrigeration system through the primary solvent condenser located above the workpiece.

Abstract: A system for removing protective coatings from a circuit board assembly. The system includes a tool for removing protective coatings from a circuit board assembly. The tool has a flow head, which includes a support, having an opening which is adapted to contact the circuit board assembly and flow solvent to the surface of the circuit board. The flow head may also include a solvent nozzle positioned within the support. The solvent nozzle has an opening adapted to apply solvent to the circuit board assembly. The flow head also includes a solvent recovery volume positioned beneath the support and adjacent to the nozzle. The system also includes a second solvent reservoir, a mechanism for applying heat to the reservoir, and a mechanism for circulating solvent from the reservoir to the flow head and back to the reservoir.

Abstract: A substrate processing apparatus does not allow sudden boiling of supplementary liquid but rather sufficiently diffuses the supplementary liquid into processing liquid so that the temperature of the processing liquid does not decrease largely. De-ionized water (PW) is ejected through a plurality of de-ionized water blow-off openings (Ha) which are formed in a de-ionized water injection nozzle (10a). Inside an internal bath (1), which is located immediately below the de-ionized water blow-off openings, and close to a overflow part (20a) which is a top edge of a side surface (1a) of the internal bath (1), the de-ionized water reaches the surface of a phosphoric acid solution (PA). The de-ionized water thereafter reaches a gutter part (30a) of an external bath (2), as it is mixed with the phosphoric acid solution (PA), and flows into a reservoir part (30d) of the external bath (2).

Abstract: Dishwashing machine including a washing tank (1) provided with an upper aperture (6) and a lower aperture (7) that are interconnected through a conduit (8) extending outside the tank. During drying, the vapor in the tank is caused to circulate along a closed-loop flow-path defined by the tank and the conduit (8), thereby reducing to a minimum the effect of thermal stratification of the vapor in the tank and, as a result, favoring a homogeneous drying effect of the washload items.

Abstract: A refrigerated vapor degreasing system for cleaning workpieces. The system has a tank for containing a bath of degreasing solvent, a heater for vaporizing the solvent, a primary solvent condenser, a secondary solvent condenser, and a single refrigeration unit which can be switched to operate in two different modes. The primary solvent condenser creates a degreasing zone above the solvent bath around work pieces supported therein and creates a primary barrier preventing the vaporized solvent from escaping the tank. The secondary solvent condenser creates a cold air blanket above the degreasing zone which acts as a secondary barrier preventing the vaporized solvent from escaping the tank. The single refrigeration unit simultaneously provides low-temperature refrigerant to the secondary solvent condenser and the primary solvent condenser in a first mode.

Abstract: The present invention provides a method of and an apparatus for efficiently and economically discharging solid particles, which have sedimented on the bottom of a tank, out from the tank. A liquid is ejected from an ejector installed in the tank to move the sedimented solid particles to a predetermined place from which the sedimented solid particles are discharged out from the tank. Further, a solution which contains sedimentary solid particles is cooled and the solid particles are efficiently separated by a solid-liquid separator.

Abstract: A part subjected to cleaning is cleaned or rinsed with a cleaning agent or rinsing agent having a nonaqueous type solvent or a hydrophilic solvent as a main component thereof. Then the cleaning agent or rinsing agent adhering to the cleaned or rinsed part subjected to cleaning is removed with a cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent. The part is subsequently dried. Otherwise, after the part subjected to cleaning has been cleaned with an aqueous type solvent or wash with water, the part is cleaned and dried with a cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent. The cleaning agent having perfluorocarbon as a main component thereof or the vapor of the cleaning agent can be used for cleaning or rinsing the part subjected to cleaning.

Abstract: A method of replenishing liquid carbon dioxide solvent in a liquid carbon dioxide dry cleaning system or other dense phase carbon dioxide cleaning system. The method uses dry-ice or solid carbon dioxide, as a replenishing stock, thus reducing transportation, storage and handling costs. The method disposes solid carbon dioxide blocks in a cleaning chamber after a cleaning cycle. Liquid carbon dioxide solvent is boiled and is used to melt the solid carbon dioxide blocks. Liquid carbon dioxide solvent produced by melting the solid carbon dioxide blocks is pumped from the cleaning chamber into a storage tank to replenish the liquid carbon dioxide solvent.

Abstract: A wet chemical treatment system for processing semiconductor wafers that does not have the problem of cracking or other damages occurring in the system during a cleaning process where a strong acid and water are mixed and pressure and heat are generated. The system includes an additional filing system such that only an outer tank for the processing liquid is filled after the system is cleaned so that pressure and heat generated by the reaction between acid and water can be released into an empty inner tank and thus avoiding damages caused by the heat and pressure. A method for cleaning such system is further disclosed.

Abstract: An apparatus for washing and recovering a contaminant from an object. A washing agent flows over the object, and the washing agent and contaminant are received in a basin. A slurry of the washing agent and contaminant are circulated through at least one separator and one filter to produce a cleaned slurry flow. The cleaned slurry flow is recirculated into the basin. A first pump which is used to flow the washing agent over the object has a supply port and a pressurized output port. A pressurized fluid supply is coupled to a variable regulator with a variable pressure output. A second pump driven by the variable pressure output impels the washing agent into the supply port of the first pump.