Abstract: The present invention is directed to a method and system of processing and removing hydrocarbon sludge from a tank wherein the hydrocarbon sludges are the product of gravity settling in the bottom of the tank to form a sludge consisting of inorganic and organic materials not readily flowable or pumpable for removal in the found state and where a process is used to selectively separate, grind, disperse and suspend these materials with a mechanical classifier system, and where flow agents may be metered to effect a slurry stream directed thru a nozzle system towards the sludge in the tank and by reducing the surface tension and mechanical conditioning of the sludge, create a pumpable slurry that may be removed from the tank with minimal time, cost and environmental impact.

Abstract: A system is provided for cleaning wafers that includes specialized pressurization, process vessel, recirculation, chemical addition, depressurization, and recapture-recycle subsystems. A solvent delivery mechanism converts a liquid-state sub-critical solution to a supercritical cleaning solution and introduces it into a process vessel that contains a wafer or wafers. The supercritical cleaning solution is recirculated through the process vessel by a recirculation system. An additive delivery system introduces chemical additives to the supercritical cleaning solution via the solvent delivery mechanism, the process vessel, or the recirculation system. Addition of chemical additives to the sub-critical solution may also be performed. The recirculation system provides efficient mixing of chemical additives, efficient cleaning, and process uniformity. A depressurization system provides dilution and removal of cleaning solutions under supercritical conditions.

Abstract: A unitary or modular, pre-cast, drive-down pit system suitable for use in a heavy equipment wash installation. The completed pit collects runoff generated by the washing of heavy equipment such as construction, industrial, farming, or road-building equipment. The pre-cast concrete separation unit and separate wall sections have tongue and groove mating ends that facilitate assembling the pit and provide for sealing against leakage of water. The separation unit has up to four chambers: a primary solids collection section; a secondary solids settling chamber; a free oil separating section; and a pump water holding section.

Abstract: An apparatus for cleaning a sawn wafer block includes a cleaning basin, a fixture for holding a sawn wafer block in the cleaning basin such that, when cleaning liquid is present in the cleaning basin, at least a portion of the wafer block having sawn gaps is disposed in the cleaning liquid, at least one outlet port in a bottom region of the cleaning basin, and a closer for the outlet port, by means of which the outlet port may be opened and closed. The closer, the outlet port and the bottom region of the cleaning basin are configured such that, by opening the closer the cleaning liquid is drainable so fast from at least the area of the cleaning basin having the wafer block disposed therein that contaminants are removable from the sawn gaps due to a suction effect of the cleaning liquid.

Abstract: A method and apparatus for separating particles and dissolved matter from a fluid stream incorporated in an aircraft rinse system. The present invention includes a first pressure source which transports collected rinse fluid into a separator annulus with a filter element disposed therein. The untreated fluid is placed under appropriate pressure sufficient to produce turbulent flow, increased particle kinetics and/or cavitation physics allowing the desired fluid to penetrate and pass into and through the filter media. The filtered fluid is then transported to a collection tank. The contaminant particulate matter retained on the exterior of the filter media may be removed by the instantenous reverse pressurization of the separator annulus by a second pressure source thereby removing the contaminant particles away from contact with the filter media, and which may then be transported to a waste collection tank or a concentrator for further treatment.

Abstract: A portable food tray pre-wash and water recycling apparatus and method for pre-washing reusable food trays prior to placement in a separate cleaning and sanitizing unit that significantly reduces water wasted in kitchen and scullery areas. The apparatus includes a portable cabinet having a slot in a top end for inserting a food tray, laterally opposed spray nozzles beneath the slot that spray both sides of the tray, laterally opposed rotating brushes beneath the nozzles that scrub the tray, a tray support and brush comb member that supports the tray in a vertical position and removes particles from the brushes, a series of removable incrementally smaller gauge filters vertically spaced beneath the brushes that slide in from one side to filter the water, a water reservoir beneath the filters, a heating unit to heat and disinfect the filtered water, and a pump that recycles heated water back to the nozzles.

Abstract: The present invention provides methods for treating an aqueous system comprising contacting the aqueous system with a composition comprising a conversion agent. The methods of the present invention reduce the solubilized water hardness and/or reduce or inhibit scale formation in an aqueous system. Further, the methods of the present invention impact the chemistries needed in downstream cleaning processes employing water treated in accordance with the methods of the present invention.

Abstract: An apparatus and method for commissioning steam turbine generator power plants to advance the cleanliness of the complete steam cycle by the conditioned discharge of steam to the plant surface condenser.

Abstract: An aqueous washing system and method of operation for washing of articles such as engineering components, including curing of resin impregnated porous metal components, comprising placing the articles into a process chamber (10) and supplying from a supply tank (11) an aqueous washing fluid at a temperature at or above 100° C. A head of pressure is established above the fluid in tank (11) whereby the fluid may be transferred by a pump (P1) to the process chamber (10). After a washing cycle the articles are rinsed by clean water and then vacuum dried before removal from the process chamber (10).

Abstract: A method of clearing a pipe of contents with an air system. The method may include providing air by the air system at high pressure and low velocity until the contents begin to move within the pipe, providing air by the air system air at low pressure and high velocity until a majority of the contents are removed from the pipe, and continuing to provide air at low pressure and high velocity until substantially all remaining contents are removed from the pipe.

Abstract: A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.

Abstract: The invention aims at improving a cleaning fluid container (3) for a cleaning device (RV) for personal needs, in particular for cleaning a shaving head (SK) of a dry shaving apparatus (R), with a housing (20), with an inlet port (15) provided on the housing (20) to admit cleaning fluid (11), with an outlet port (14) equally provided on the housing (20) to discharge the cleaning fluid (11), and with a filter element (F), said filter element (F) being provided with filter pores for filtering out solid particles, particularly hair particles, and being arranged in a flow area between the inlet port (15) and the outlet port (14), in a manner enabling the pump capacity to be significantly reduced or the service life of a cartridge (K) to be substantially increased. This is accomplished in that the filter element (F) has pores of a size causing part of the particles to penetrate the filter element (F) according to their size.

Abstract: Gases are vented from a waste site such as a landfill, and the gases are separated into at least three streams comprising a hydrocarbon stream, a carbon dioxide stream, and residue stream. At least a portion of the carbon dioxide stream and hydrocarbon stream are liquefied or converted to a supercritical liquid. At least some of the carbon dioxide gas stream (as a liquid or supercritical fluid) is used in a cleaning step, preferably a polymer cleaning step, and more preferably a polymer cleaning step in a polymer recycling process, and most preferably in a polymer cleaning step in a polymer recycling system where the cleaning is performed on-site at the waste site.

Abstract: A system and apparatus for cleaning particle deposits from slurry distribution system components by injecting gas bubbles into the slurry solution having a geometry and interval such that an optimal cleaning power and cleaning rate is obtained. The method provides efficient cleaning of the buildup of abrasive particles deposited from the slurry solution without requiring the operator to disassemble or flush the slurry distribution system. The system cleaning potential is optimal when the diameter of the bubbles and the fluid slug length is approximately equal to the pipe diameter.

Abstract: There is provided a filter device that enables less frequent manual or self cleaning of the filter surface. The filter is particularly suitable for an aquiferous domestic appliance, such as a dishwashing machine, in which the cleaning effect occurring with alternating pumping is further increased, such that manual cleaning of the filter surface need take place less often, or, respectively, self-cleaning of the filter surface occurs.

Abstract: A dish washing machine in which water is supplied to a level detecting unit without sudden change of a flow rate and pressure of water from a water supplying unit to the level detecting unit such that the level detecting unit can precisely detect a level of water in the tub. The water supplying unit includes a first guide passage guiding the water to the tub, and a second guide passage guiding the water to the level detecting unit such that a portion of the water is supplied to the level detecting unit through the second guide passage. The water supplying unit includes a buffering space disposed between the second guide passage and the level detecting unit such that water flows from the water supplying unit to the level detecting unit at a predetermined flow rate.

Abstract: A concrete pump washout system which is mountable to transport vehicle(s); the system provides for the quick safe, and easy removal of all waste water and concrete used in the washout of concrete pumps and concrete truck chutes on a construction site. When applied to concrete pump washout, washout water and waste concrete are deposited into a tub, and a fluid vacuum pump is used to separate the water into a holding tank for later disposal. The waste concrete is left behind to harden in the tub, which may be disposable, for later removal to a disposal site, thereby freeing the concrete pump for the next job. When applied to concrete truck chute washout, water is removed from washout of the chute into the concrete pump hopper and pumped back into the truck hopper or into the washwater holding tank for later disposal, at which point the truck may leave and the pump is ready for the next load.

Abstract: A vapor generating and recovery apparatus including a housing having an open top, a closed bottom and a plurality of sidewalls therebetween defining a boiling sump with a treating solution therein. The housing is further provided with at least one heating coil and at least one condensing coil for providing and removing heat from the apparatus. The housing also includes at least one glove extending through one of the sidewalls allowing a user to manually handle and/or manually spray parts or objects needing cleaning using the vapor generating and recovery apparatus.

Abstract: The present invention improves recover percentage at which a mixed chemical solution discharged from a protective film removing device.

Abstract: The lift/immersion system for treating, particularly cleaning, workpieces, comprises a housing into which a treatment liquid, particularly a cleaning liquid, can be filled which forms an immersion bath in the housing, further comprising a lift device and a lift table connected thereto and provided with passage openings, on which the workpieces can be placed, and which during the treatment process is movable upwards and downwards through the immersion bath. The lift/immersion bath is characterized in that under the lift table a baffle plate is attached which during the treatment process is moved upwards and downwards in a section of the immersion bath with a small lateral play, so that treatment liquid is displaced during the downward movement and directed onto the workpieces with formation of turbulences in the immersion bath. This considerably intensifies the action of the immersion bath on the articles.

Abstract: A closed-loop wash system is provided for use with a washing assembly that includes a collection basin and a self-contained, bioremediation treatment apparatus. A housing assembly defines a plurality of chambers in series flow communication from an upstream collection chamber to a downstream clean wash fluid chamber. A central media chamber is included in upstream flow communication with the upstream collection chamber and in downstream flow communication with the downstream clean wash fluid chamber. An array of media housing microbes is disposed in the media chamber. The treatment apparatus includes a diffusion assembly configured to aerate the washing fluid contained in selected chambers. A first circulation system continuously circulates flow through the bioremediation system, while an independent second circulation system continuously circulates flow from the collection basin to the bioremediation treatment apparatus, and then back into the collection basin.

Abstract: In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to one end of the workpiece and connecting another flexible hose of the mobile flushing unit to a second end of the workpiece; b) flowing compressed air through each hose and the workpiece; c) pumping a cleaning fluid through each hose and the workpiece for a predetermined amount of time; d) ceasing cleaning fluid flow, followed by purging with air to remove the cleaning fluid from the workpiece; e) pumping water through each hose and the workpiece for a predetermined amount of time; f) ceasing water flow, following by another purge with air to remove the water from the workpiece; and g) disconnecting each hose from the workpiece.

Abstract: An automatic tank cleaning system includes a water recycling unit having a weir therein and a conically-shaped bottom, a cutting box having a portable weir therein, a hydrocyclonic separator, and a mud tank. Tank slop is pumped from the mud tank to the water recycling unit where solids collect at the bottom. The solids are removed and collected in the cutting box. Water in the recycling unit may be pumped through the hydrocyclonic separator. Solids removed by the separator are collected in the cutting box and the water is directed into a clean water compartment defined by the weir within the recycling unit. Water in the cutting box is collected by the portable weir therein and pumped to the clean water compartment. Water from the clean water compartment is pumped to one or more rotary jet heads within the mud tank. Overflow from the water recycling unit may be directed to the cutting box. A chemical inductor may be used to add cleaning chemicals to the water prior to being directed through the wash nozzle.

Abstract: A method of a single wafer wet/dry cleaning apparatus comprising: a transfer chamber having a wafer handler contained therein; a first single wafer wet cleaning chamber directly coupled to the transfer chamber; and a first single wafer ashing chamber directly coupled to the transfer chamber.

Abstract: A portable purifying system for improved filtering and/or separating of cleaning solutions such as solvents, particularly those used in parts washers. The purifying system utilizes a removable reservoir to provide a smaller reservoir within a larger reservoir such as a parts washer. The portable purifying system provides an apparatus and method of use to perform the following steps: using re-circulating solvent from the larger reservoir, washing oily parts in such manner that oily residue from the washed parts is deposited in the smaller reservoir; separating cleaner portions of solvent from dirtier portions of solvent within the smaller reservoir using density differences to separate by gravity action cleaner portions from dirtier portions; moving the cleaner portions of solvent into the larger reservoir; and periodically emptying and cleaning the smaller reservoir.

Abstract: A portable apparatus and method for chemically cleaning a single pass plate and frame heat exchanger allows the cleaning solution to be uniformly distributed across the plate pack. This portable system of one pump of preferably 10-horsepower, capable of 300 gallons per minute flow through a discharge port; at least two distribution/collection tubes with apertures of predetermined diameter and predetermined placement; one reversing manifold; two bag filters; and one circulation tank with a capacity at least on the order of 150 to 200 gallons; attaches to a single pass plate and frame heat exchanger. The single pass plate and frame heat exchanger is configured with at least two removable flanges that, once removed, allow for the installation of the distribution/collection tubes. The apertures in the distribution/collection tubes are placed facing downwards depending upon the direction of the operational fluid to enhance a vacuuming effect for particle and debris removal during cleaning.

Abstract: A cleaning tool for cleaning substrates, comprising a circulation conduit through which is circulated a cleaning liquid or gas. The circulation conduit is disposed in fluid communication with an upstream flow chamber and a downstream cleaning chamber, the cross-sectional area of which cleaning chamber is less than the cross-sectional area of the flow chamber. In use, the cleaning chamber receives a wafer substrate for cleaning of particles or removal of polymer films from the substrate. The smaller cross-sectional area of the cleaning chamber accelerates the flow of a cleaning fluid flowing through the cleaning chamber from the flow chamber. The rapidly-flowing cleaning fluid removes the particles and/or films from the substrate while preventing dropping of the removed particles or re-deposition of the film back onto the substrate. A particle filter may be provided in the circulation conduit downstream of the cleaning chamber for removing the particles.

Abstract: A unitary or modular, pre-cast, drive-down pit system suitable for use in a heavy equipment wash installation. The completed pit collects runoff generated by the washing of heavy equipment such as construction, industrial, farming, or road-building equipment. The pre-cast concrete separation unit and separate wall sections have tongue and groove mating ends that facilitate assembling the pit and provide for sealing against leakage of water. The wall sections have built-in rebar attachment and water block elements at an angle so as to provide for a strong and waterproof bond with the ramp floor. The ramp floor is concrete, poured after installation of the separation unit and the wall sections to complete the finished drive-down pit. The separation unit has up to four chambers: a primary solids collection section; a secondary solids settling chamber; a free oil separating section; and a pump water holding section.

Abstract: A pretreatment apparatus for performing pretreatment before a painting process includes a treatment tank to be filled with a treatment liquid for degreasing and chemical conversion. A circuit section forms a circulation path for circulating the treatment liquid from the treatment tank to the treatment tank. A purifying section removes dust, chemical sludge and oil from the treatment liquid circulated to the treatment tank through the circulation path.

Abstract: A substrate processing apparatus for supplying a treatment liquid onto the surface of a substrate to treat the same. This apparatus is provided with: a spin chuck for holding and rotating a substrate; a nozzle for supplying a treatment liquid to the substrate held by the spin chuck; a circulating passage arranged such that the treatment liquid supplied to the substrate from the nozzle and used for substrate treatment is circulated to the nozzle and reutilized for substrate treatment; a metal contamination amount measuring device for measuring the metal contamination amount in the treatment liquid passing through the circulating passage; and a judgment processing unit for judging whether or not the value measured by the metal contamination amount measuring device has exceeded a predetermined set value.

Abstract: Ozone gas having a high ozone concentration is generated by a solid electrolyte electrolytic process. An ozone solution is prepared by injecting the ozone gas into an acidic solution of pH 6 or below. The ozone solution heated at a temperature in the range of 50° to 90° C. is supplied to a contaminated object to oxidize and dissolve a chromium oxide film by an oxidizing dissolving process. The ozone solution used in the oxidizing dissolving process is irradiated with ultraviolet rays to decompose ozone contained in the ozone solution, the ozone solution is passed through an ion-exchange resin to remove ions contained in the ozone solution. An oxalic acid solution is supplied to the contaminated object to dissolve an iron oxide film by a reductive dissolving process.

Abstract: A cleaning liquid container for a cleaning device for cleaning objects for personal use, such as, the cutter head of a shaving apparatus. The cleaning liquid container includes an inlet, an outlet, and a filter element. In an interior of the cleaning liquid container, provision is made for a sedimentation line or flow path leading from the inlet to the outlet to allow solid particles to settle from the cleaning liquid.

Abstract: A washing, cleaning and sterilizing solution is produced by electrolyzing an electrolyte solution composed of mixed caustic soda and salt in an electrolyzer. The solution is used as it is or diluted with tap water or non-potable water. The solution is applicable to washing, cleaning and sterilizing metal goods, medical instruments, nursing products, foodstuff, farm products, marine products, dishes, cooking utensils, plastic goods, surrounding, facilities, fiber products, machine parts, machine goods, various containers, electrical communication components, vehicles, or the like.

Abstract: A system and method for re-circulating processing fluids in a substrate processing system is provided. A fluid re-circulation system for a brush box processing tool includes a supply tank into which processing chemicals, DI water, or other processing fluids are introduced into the system from an external source. Processing chemicals are provided to the brush box and dispensed to process a substrate. Dispensed fluids drain from the brush box into a diverter through which fluids either flow to waste, or into a collection tank. Fluids from the collection tank flow into the supply tank to re-circulate for wafer processing. The re-circulation system includes filters for maintaining chemical purity, and chemical concentration is monitored and adjusted as necessary.

Abstract: The present invention pertains to a system for cleaning wafers that includes specialized pressurization, process vessel, recirculation, chemical addition, depressurization, and recapture-recycle subsystems, as well as methods for implementing wafer cleaning using such a system. A solvent delivery mechanism converts a liquid-state sub-critical solution to a supercritical cleaning solution and introduces it into a process vessel that contains a wafer or wafers. The supercritical cleaning solution is recirculated through the process vessel by a recirculation system. An additive delivery system introduces chemical additives to the supercritical cleaning solution via the solvent delivery mechanism, the process vessel, or the recirculation system. Addition of chemical additives to the sub-critical solution may also be performed. The recirculation system provides efficient mixing of chemical additives, efficient cleaning, and process uniformity.

Abstract: A system is provided which is capable of cleaning a drainage pipe in a short time for removal of scale without detaching the drainage pipe from movable equipment. The system comprises: a reservoir tank containing a cleaning liquid; a feed pipe connecting the reservoir tank and a downstream side of the drainage pipe of the movable equipment and including feed pump means for feeding the cleaning liquid to the downstream side of the drainage pipe from the reservoir tank; a suction pipe connecting an upstream side of the drainage pipe and the reservoir tank; and vacuum pump means for sucking gas from the reservoir tank; wherein the suction pipe is provided with gas separation means for separating gas from gas, liquid and solid sucked from the drainage pipe; wherein a gas suction pipe for feeding the separated gas back into the reservoir tank is connected parallel to the suction pipe between the gas separation means and the reservoir tank.

Abstract: A household appliance using water is described, in particular a washing machine, comprising a supply system of water from an external source (8,9), a softening system for at least a portion of the supplied water (10,17), and a control system of the appliance, characterized in that permanent water softening means (10,17,H,21) are provided, which are controlled by said control system and which do not periodic interventions by the user to the appliance, for adding regeneration media and/or replacing components.

Abstract: Provided is a wafer rotary holding apparatus by which a reduced pressure is created on an upper surface of a rotary disk by a simple and easy-to-make mechanism with no need of any of a vacuum source apparatus, a compressed air supply apparatus, a compressed gas supply apparatus and other apparatuses in use; a wafer can be held while rotating with no contact to a rear surface thereof; a degree of pressure reduction can be adjusted with ease and even a thin wafer (of 0.1 mm or less in thickness) can be held while rotating with no deformation; and the wafer with a bowing can be held while rotating with no correction of the bowing. A wafer rotary holding apparatus includes: a rotary disk on which a fluid flow path is formed; a through hole formed in a central section of the rotary disk; and a plurality of wafer rests provided on an upper surface of the rotary disk.

Abstract: The present invention provides a process for the removal of hydrogen peroxide from spent pickle liquor used in a steel strip pickling process. The process utilizes an enclosed decomposition tank which includes a pickle liquor inlet pipe, an outlet pipe, at least one vent pipe, an internal baffle, and a heat source.

Abstract: The invention relates to a method of in place cleaning of an automated food product dispenser comprising an interface connection configured to establish a supply of a milk-based fluid from a reservoir (for example, a container or a bag), a mixing device configured to receive the milk-based fluid and prepare a milk based product, a nozzle in fluid association with the mixing device for dispensing the milk based product, a product flowpath configured for directing the milk based product to flow from the interface connection through the mixing device to the nozzle, and a clean-in-place flowpath assembly located in the dispenser and comprising a supply of cleaning or sanitizing fluid and a flowpath which is configured to deliver the cleaning or sanitizing fluid to or through the product flowpath. The invention also relates to a machine readable program for controlling the automated food product dispenser of the invention and for cleaning the same in place.

Abstract: A method for cleaning an apparatus using a clean-in-place system is disclosed. The clean-in-place system is in fluid communication with an inlet and an outlet of the apparatus. In the method, a cleaning composition having a measurable physical property (e.g., pH) is supplied from a cleaner tank into the inlet of the apparatus for a first period of time. A rinsing composition having the measurable physical property at a second measured value is then supplied from a rinse tank into the inlet of the apparatus for a second period of time. The measurable physical property is sensed versus time for fluids exiting the outlet of the apparatus, and a circulation time of the cleaning composition is determined. A closing time for a return valve of the cleaner tank is then determined for subsequent cleaning cycles such that minimal rinsing composition enters the cleaner tank during the subsequent cleaning cycle.

Abstract: The present invention relates to a device (1) for cleaning a liquid-containing vessel. More particularly, the present invention relates to a device (1), suitable for cleaning liquid-containing vessels (such as bathtubs or swimming pools), equipped with an energy storage means and a self-tracking means and/or a filter, wherein said device (1) is capable of floating and actively moving in said vessel.

Abstract: An apparatus for cleaning a microelectronic substrate includes a pressure chamber, a supply of a process liquid including dense phase CO2 fluidly connected to the chamber and a distilling system. Distilling system includes a still fluidly connected to the chamber and operative to separate CO2 from the process fluid. The distilling system is operative to re-introduce the separated CO2 into the chamber or a further chamber.

Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.

Abstract: A household appliance using water is described, namely a washing machine, comprising a control system, a water supply system from an external source (108, 109), a softening system of at least a portion of the supplied water (110; 110′, 117; 117′), an electrochemical cell (110; 117; 117′), for treating at least a portion of the supplied water. According to the invention, said electrochemical cell (110; 117; 117′) is active part of said water softening system (110; 110′, 117; 117′).

Abstract: Apparatus for the treatment of a wiping solution, which includes ink flocculation apparatus for flocculating ink contained in a used wiping solution by the addition of a flocculant to the used wiping solution; solid-liquid separation apparatus for separating, into sludge and a filtrate, the used wiping solution containing the ink which is flocculated by the ink flocculation apparatus through filtration of the used wiping solution; distilled water production apparatus for producing distilled water and a concentrated solution through heating of the filtrate which is separated by the solid-liquid separation apparatus; water recycling apparatus for recycling the distilled water which is produced by the distilled water production apparatus as a raw material of a wiping solution; and post treatment apparatus for separating the concentrated solution into steam and a solid residue through heating of the concentrated solution which is produced by the distilled water production apparatus.

Abstract: Methods for cleaning a microelectronic substrate in a cluster tool are described that include placing the substrate in a pressure chamber of a module in a cluster tool; pressurizing the pressure chamber; introducing liquid CO2 into the pressure chamber; cleaning the substrate in the pressure chamber; removing the liquid CO2 from the pressure chamber, depressurizing the pressure chamber, and removing the substrate from the pressure chamber. Apparatus for processing a microelectronic substrate are also disclosed that that include a transfer module, a first processing module that employs liquid carbon dioxide as a cleaning fluid coupled to the transfer module, a second processing module coupled to the transfer module, and a transfer mechanism coupled to the transfer module. The transfer mechanism is configured to move the substrate between the first processing module and the second processing module.

Abstract: The present invention relates to anaerobic curing impregnation sealant compositions which are readily separable from water upon mixing.

Abstract: A rinsing liquid treatment device (2), an expansion module (12) and an adapter module (9) for a rinsing liquid circuit closed in the flow circuit of a rinsing liquid comprising a rock working tool (1) and having a feed line (3), a catch trough (4), a transport means (5) and an outflow (6), wherein the catch trough (4) is inside a wet suction device (7).

Abstract: A method for cleaning an apparatus using a clean-in-place system is disclosed. The clean-in-place system is in fluid communication with an inlet and an outlet of the apparatus. In the method, a cleaning composition having a measurable physical property (e.g., pH) is supplied from a cleaner tank into the inlet of the apparatus for a first period of time. A rinsing composition having the measurable physical property at a second measured value is then supplied from a rinse tank into the inlet of the apparatus for a second period of time. The measurable physical property is sensed versus time for fluids exiting the outlet of the apparatus, and a circulation time of the cleaning composition is determined. A closing time for a return valve of the cleaner tank is then determined for subsequent cleaning cycles such that minimal rinsing composition enters the cleaner tank during the subsequent cleaning cycle.