Abstract: An appliance supply distribution and dispensing system and method for distributing appliance supplies to a home or business and which involves a computerized system which facilitates dispensing or using one or more supplies from an appliance. The computerized system monitors the supply level(s) and, when necessary, automatically orders and delivers additional supplies. In addition, the computerized system automatically detects dispensing, use or appliance problems and orders and arranges for repair service.

Abstract: A dishwasher that fits within the conventional U.S. residential dishwasher counter space and uses the conventional U.S. residential power supply to achieve within a convenient cycle time the same standard of sanitation as set forth for commercial and residential hot water sanitizing dishwashers.

Abstract: A neutralization system for controlling the pH of the washwater used to clean and maintain polyacrylic bound glass forming equipment. The neutralization system introduces a base solution to a washwater solution when the pH of the washwater solution contained in a closed loop washwater recovery system falls below approximately 8.0, thereby substantially reducing the corrosion rate of the components of the equipment associated with acidic polyacrylic acid binder and washwater solution. A closed-loop hoodwall washwater recovery system may also be introduced in addition to the neutralization system that allows for the recovery and reuse of polyacrylic acid binder with a minimal amount of base solution, thereby minimizing degradation of insulation properties of polyacylic acid bound glass fiber products.

Abstract: The invention relates to a method and device for determining the deposits of components from a liquid on surfaces, in particular in liquid pumping machines, comprising at least one body upon the surface of which said deposits occur, which affect the properties of an electromagnetic radiation, at least one transmitter and at least one receiver which measures the electromagnetic radiation emitted by the transmitter for the determination of the deposits. According to the invention, a calibration and a descaling of the sensor body may be avoided in a simple manner and whilst guaranteeing the secure function of the method and device, whereby any deposits of components from the liquid are removed from the surface of the body, without moving the body, at the beginning of a new measuring period.

Abstract: A multi-stage type processing apparatus which can be positioned in a limited space without having a complicated driving mechanism, includes processing units which are stacked in a multi-stage state in the vertical direction. Each processing unit has a cup surrounding a substrate and a chuck for retaining and rotating a substrate, and the cup can be elevated and lowered with respect to the chuck. A cylinder unit is contracted and thereby all the cups are unitarily lowered, so that the top surface of the chuck is located in a slightly upper position with respect to the top surface of the cup. In this state, a substrate is mounted on the chuck and attracted. Next, the cylinder unit is extended and thereby all the cups are unitarily elevated so as to accommodate the substrate therein.

Abstract: A dishwasher includes a water inlet connectable to a water source. A dishwasher element is operable on water received through the inlet. A flow sensor is in fluid communication with the inlet and is operable to generate a control signal indicative of water flow through the inlet. A control apparatus is connected between the dishwasher element and the flow sensor and is operable to inhibit operation of the dishwasher element in response to the control signal.

Abstract: An apparatus allows monitoring the formation of scale. The apparatus makes it possible to determine the degree of water hardness or a tendency of the degree of water hardness to change over time and to take measures for adjusting the desired degree of water hardness accordingly. A translucent or transparent element has two end surfaces, at least one element emitting an optical signal, and at least one element receiving an optical signal. The element emitting the optical signal and the element receiving the optical signal are directly adjacent to the end surfaces of the transparent element, and the end surfaces are disposed such that they remain free of scale build-up at all times.

Abstract: A device is provided for monitoring a wash process inside a mechanical washing apparatus, comprising sensor means for measuring physical and/or mechanical parameters of the wash process and recording means for recording the measured parameters within the device. This device comprises means for conducting a washing liquor past the sensor means and means for determining a certain contact time between the washing liquor and the sensor means.

Abstract: A bracket is provided for mounting an object to a tub of a dishwasher. The bracket is mounted on the annulus edge of the pump opening in the bottom of the tub adjacent the pump seal ring. No other fasteners are used to secure the bracket to the tub. The bracket is mounted on the tub before the pump is installed. In one embodiment a thermostat is pivotally mounted on the bracket so as to maintain substantially flush engagement with the tub. In a second embodiment, a wire harness extends through a loop of the bracket for support adjacent the tub.

Abstract: A vehicle wash system having a series of spray assemblies for use in cleaning vehicles such as a highway salt truck. As the vehicle is driven through the vehicle wash system, sensors alert the control system as to the location of the vehicle. While using a single pump, the control system then activates and deactivates valves to selectively open and close high pressure flow paths to various spray assemblies as the vehicle moves through the vehicle wash system. The nozzles in the spray assemblies receive full pressure water when the corresponding valve is opened and are oriented to clean specific portions of the vehicle in a predetermined sequence.

Abstract: Apparatus and method are provided for in-situ measurement of vibrational energy applied to a wafer in a process bath of a vibrational cleaning system. The apparatus may be made up of a test wafer comprising an array of pressure sensing elements disposed thereon for monitoring power level variation of a time-varying pressure wave. The time-varying pressure wave is indicative of vibrational energy that would be applied to a wafer in the process bath in the position of the test wafer.

Abstract: A vehicle washing apparatus includes a side track extending along a washing bay. A gantry is supported for reciprocal motion along the side track by a gantry motor. Sensors detect the front and rear ends of the vehicle to control movement of the gantry. A retractable carriage extends from the gantry across the washing bay under the control of a carriage motor and a vehicle width sensor. The carriage rotatably supports a spray bar for discharging cleaning fluid. A motor rotates the spray bar to sweep around corners of the vehicle. A cam plate and engagement roller index the spray bar orientation, while limiting spray bar rotation to a single direction. A wheel guide receives the front left vehicle wheel. Treadle switches in the wheel guide, in conjunction with an illuminated display, indicate to the user when the vehicle is properly indexed in the washing bay.

Abstract: A method and system to represent surface temperatures. The method and system represent a surface temperature experienced by a medical device during a washing cycle in a medical washing machine. A temperature strip is positioned proximate a surface of the medical device to represent the surface temperature experienced by the medical device during the washing cycle in the medical washing machine.

Abstract: An annular receptacle is described, particularly for a rotating carrier for receiving a disk-shaped object such as a semiconductor.

Abstract: A customizable car wash blending and method is provided. The method includes the steps of positioning a vehicle adjacent a set of sensors (step 10), measuring a variety of parametric data relating to macroscopic debris and surface film formed on a surface of the vehicle, calculating the quantity of presoak components to be added to a presoak solution (step 70), blending the presoak solution (step 80), and applying the presoak solution to the vehicle (step 110). Quantities of presoak enhancing agents are also calculated from the sensor readings (step 120) along with the calculation of the number and type of wash cycles required for the vehicle (step 130).

Abstract: An invention is disclosed for backside particle removal during a semiconductor manufacturing process. Cleaning sites are defined on the backside of a wafer. The cleaning sites are regions of the backside of the wafer that physically contact a chuck during a semiconductor fabrication process. Once the cleaning sites are defined, the backside of the wafer is cleaned, where the cleaning is primarily directed to the cleaning sites. Typically, the contact regions can correspond to pin positions of a chuck pin array, or wafer contact areas on a vacuum chuck. A laser or a megasonic wand can be used to provide the site-specific cleaning of the wafer backside.

Abstract: A unit for detecting an addition of a cleaning agent in a beverage dispenser, in particular in a coffee machine. In order to guarantee that a cleaning agent has been added when automatic cleaning is carried out, a measurement device is provided as well as a method of determining whether a cleaning agent has been added to the aqueous cleaning liquid. Whether a cleaning agent has been added to the aqueous cleaning liquid can be determined in dependence upon the measured conductivity and the measured electrical resistance of the cleaning liquid, respectively.

Abstract: Disclosed is an etching apparatus enabling to increase productivity of etching glass substrates. The present invention includes an etching bath having an etchant, a plurality of sensors inside the etching bath detecting a level of the etchant, and a deionized water tube spraying a deionized water to the sensors.

Abstract: Ultrasonic cleaning devices comprise a sonotrode and a power supply adapted to supply current to the sonotrode, and further include one or more features which facilitate use of the ultrasonic cleaning devices by consumers, improve the safety of the ultrasonic cleaning devices when used by consumers, and/or improve the cleaning efficiency of the ultrasonic cleaning devices when used by consumers.

Abstract: A sensor device and method of employment is provided. More specifically, a sensor device adapted to detect, identify and/or measure a chemical and/or physical characteristic upon placement of the device into an environment, especially a liquid medium for which monitoring is sought is provided.

Abstract: A cleaning processing system including a wafer transfer device, a wafer detecting sensor for detecting a wafer, a memory for storing the position and direction of an extra wafer present inside the cleaning processing system when the power supply is cut off, an alarm device for generating an alarm in the case where the information detected by the wafer detecting sensor when the power supply to the cleaning processing system is turned on differs from the wafer information taken out of the memory, an alarm canceling section for canceling the alarm, an apparatus control section for controlling the wafer transfer device to recover the extra wafer, and a recovery start-up section for emitting an instruction to start the wafer recovery to the apparatus control section.

Abstract: Analysis equipment for determining a concentration of an organic component and a caustic component of a reusable organic caustic solution that has been utilized for removing a ceramic coating from a metallic component at elevated temperatures and pressures, such as in an autoclave. Sensors are positioned between a filter for removing particles of the ceramic coating dispersed in the reusable organic caustic solution from the reusable organic caustic solution and a storage tank storing the reusable organic caustic solution after removal from the autoclave. The sensors measure physical properties of the reusable organic caustic solution after removal of the particles from the reusable organic caustic solution, such as electrical conductivity, opacity, refractive index, density, fluidity and the speed of sound in the solution.

Abstract: A load sensing system for maximizing the cleaning efficiency of particulate raw materials such as sand, gravel, rock, ores, etc. in a log washer by sensing the weight of the aggregate in the log washer tank and adjusting the angle of inclination of the tank for cleaning efficiency. The system includes a log washer tank pivoted at its lower end and supported by hydraulic cylinders at its upper end. A high/low pressure sensor detects changes in the weight of the load by changes in hydraulic fluid pressure, and raises or lowers the upper end of the tank when low or high pressure limits are exceeded through solenoid activated hydraulic valves.

Abstract: A dishwasher includes a water inlet connectable to a water source. A dishwasher element is operable on water received through the inlet. A flow sensor is in fluid communication with the inlet and is operable to generate a control signal indicative of water flow through the inlet. A control apparatus is connected between the dishwasher element and the flow sensor and is operable to inhibit operation of the dishwasher element in response to the control signal.

Abstract: An exemplary cleaning apparatus for cleaning a system having a first fluid and a system pump is provided, wherein the apparatus comprises a tank including a second fluid. The cleaning apparatus also comprises an apparatus pump for pumping a predetermined amount of the second fluid from the tank into the system while the system pump is off. The cleaning apparatus further comprises an output hose, a return hose, and a filter between the return hose and the output hose. After the predetermined amount of the second fluid is pumped into the system, the system pump is turned on to pump the first fluid and the second fluid out of the return line through the filter and into the output hose and back into the system.

Abstract: A method for cleaning a substrate surface using ultrasonic energy includes an array of ‘N’ transducer elements. Electrical signals, Sn, having signal parameters including a voltage, VN, and phase, ?N, are provided to drive each transducer element and generate respective ultrasonic waves. A computer sub-system is used to control the signal parameters to establish a substantially uniform cavitation energy at a plurality of locations on the substrate surface. The signal parameters can be established to focus or steer the ultrasonic energy from the array to each location. To calculate the electrical signal parameters, the computer sub-system can use some or all of the following as inputs; the arrangement and inter-element spacing of the transducer elements, characteristics of the fluid medium, and the coordinates of the locations requiring cleaning.

Abstract: The present invention provides an adaptive fill control for controlling the amount of liquid added in one or more liquid fill periods in a dishwasher cycle. The amount of liquid added in a liquid fill cycle is adjusted by activating the dishwasher drain pump while continuing to operate the dishwasher circulation pump. The accumulated time from the start of the drain pump operation until the circulation pump experiences a liquid starvation episode is compared to a predetermined optimum time period for the circulation pump to experience liquid starvation. The sign and difference between to accumulated time period and optimum time period is used to adjust the amount liquid added in the next liquid fill period. A number of sensors for detecting a circulation pump liquid starvation episode are disclosed.

Abstract: Method for etching a substrate wherein, after placing in an etching chamber, said substrate is treated with a mixture of HF and acetic acid. Acetic acid is introduced into the chamber first, followed by the hydrogen fluoride. Hydrogen fluoride is introduced via an intermediate stage during which the hydrogen fluoride is stored in an auxiliary chamber. By this means back-flow of a corrosive mixture consisting of hydrogen fluoride and acetic acid into the piping assembly for hydrogen fluoride is prevented and, thus, the life of the piping assembly concerned is appreciably prolonged and metal contamination on substrate treated later is prevented.

Abstract: A substrate processing apparatus for supplying a treatment liquid onto the surface of a substrate to treat the same. This apparatus is provided with: a spin chuck for holding and rotating a substrate; a nozzle for supplying a treatment liquid to the substrate held by the spin chuck; a circulating passage arranged such that the treatment liquid supplied to the substrate from the nozzle and used for substrate treatment is circulated to the nozzle and reutilized for substrate treatment; a metal contamination amount measuring device for measuring the metal contamination amount in the treatment liquid passing through the circulating passage; and a judgment processing unit for judging whether or not the value measured by the metal contamination amount measuring device has exceeded a predetermined set value.

Abstract: A new method and apparatus is provided that assures constant fluid flow of the fluid that is entered into a semiconductor device processing tank or container. A flow meter is set to a particular flow rate; the fluid that comes from the POU is routed through the flow meter. The fluid passes through a flow meter into a processing tank. The fluid is allowed to fill the container up to an overflow point of the container. An overflow basin is provided into which the overflowing fluid is routed from where the fluid is drained into a fluid reclaim vessel. The overflow is detected by a sensor, the sensor activates an overflow relieve valve that is mounted in the bottom of the container. The overflow relieve valve is opened and drains fluid from the container thus counteracting the overflow of the fluid into the overflow basin. The interaction between the overflow detector and the overflow relieve valve assures a constant rate of supply of the fluid to the processing tank or container.

Abstract: A semiconductor wafer processing apparatus, more specifically, an edge contact loadcup for locating a semiconductor workpiece or wafer into a chemical mechanical retaining ring utilizing a cone, wafer chuck and flexure. The cone aligns the wafer concentrically to the retaining ring. The wafer chuck, inside the cone, is restrained from moving laterally in respect to the cone by the flexure. The wafer, which is supported by the wafer chuck, is moved into the retaining ring by the wafer chuck after the cone has become aligned with the retaining ring. An adjustment mechanism is provided to ensure the co-planar orientation of the wafer and fixture. Other embodiments include a sensor for detecting the presence of the wafer on the chuck, and in the cone, and minimizes particulate contamination to the wafer.

Abstract: The object is to avoid contaminating the washing conversely by contaminated detergent and provide a dry cleaning machine and dry cleaning method, solving hygienic issues. In a dry cleaning machine which supplies detergent from a detergent tank 11 to a washing tank 10 and washes the washing in the washing tank 10 and treats detergent used in the washing tank 10 by a filtering tank 16 and sends the treated detergent to the washing tank 10 to use detergent cyclically, wherein contaminating the washing conversely by washing can be prevented, as detecting contamination level of detergent discharged from the washing tank 10 while supplying detergent to the washing tank 10 and washing the washing, and when the detergent contamination level reached a prescribed threshold level, storing the detergent discharged from the washing tank 10 temporarily and sending the detergent to a distiller 14 and supplying fresh detergent from the detergent tank 11 to the washing tank 10.

Abstract: An automatic vehicle washing system is described. The vehicle washing system incorporates an elongated overhead cleaning platform for cleaning the front, top and rear surfaces of a vehicle. The overhead cleaning platform is attached to a single lift mechanism at a first end and is suspended from a belt at a second end, wherein the belt is also operatively connected to the first end. Accordingly, vertical movement of the lift actuator causes both ends of the platform to uniformly rise or descend. The platform further comprises a pivotal boom with fluid nozzles attached thereto, and a reciprocating pivotal actuator. The reciprocating pivotal actuator is capable of pivotal movement to any number of angular orientations within its operative range of motion. Advantageously, the pivotal and vertical positions of the nozzles can be independently varied, permitting the location of the overhead cleaning nozzles to be optimized for various vehicle profiles.

Abstract: A disperser of washing agents is described, for a household washing machine, in particular a dishwasher, said dispenser (10) comprising a tank (12) for containing a liquid washing agent to which a visual control device (17-18) is associated, of the level of said liquid washing agent, said control device comprising a passage (18), placed between said tank (12) and the external part of the body (11) of the dispenser (10), and an element in a substantially transparent material (17) inserted in said passage (18), a first portion (22) of said transparent element (17) being at least partially visible from the outside of said body (11) and a second portion (17B) of said transparent element (17) being inserted in said tank (12), where at the free end of said second portion (17B) a series of projections (20) is defined, being placed at different levels of height.

Abstract: According to the present invention, a pre-cleaning process is performed for removing a physical substance such as blood, mucus or tiny pieces of tissue that are attached to the exterior of the medical device and are inside a duct or a hollow portion. Then, the pre-cleaned medical device is immersed in a chlorine dioxide solution and/or a chlorine dioxide solution is passed through the duct or the hollow portion. Thereafter, the medical device is placed in a chlorine dioxide gas atmosphere and/or a chlorine dioxide gas is passed through the duct or the hollow portion. In this manner, the exterior of the medical device and the interiors of the duct and the hollow portion are deodorized, disinfected and sterilized.

Abstract: A washing agent dispenser is described, for a household washing machine, namely a dishwasher, said dispenser including a tank for containing a liquid washing agent, to which a device is associated for the visual control of the level of said liquid washing agent. According to the invention, said control device has a plurality of elements of a substantially transparent material, which are inserted in respective passages extending between said tank and the outside of the body of the dispenser. The parts of each one of said transparent elements which are visible outside said body form the steps of a scale indicating the level of said liquid washing agent contained in the tank.

Abstract: A process tank for processing a plurality of wafers having a diameter, the process tank comprising: two substantially vertical side walls being a first distance apart; wherein the first distance is substantially equal to the diameter of the wafer; two upwardly angled walls positioned between the side walls; a first transducer array coupled to a first of the upwardly angled walls, the first transducer array extending a length less than the diameter of the wafer; and a second transducer array coupled to a second of the upwardly angled walls, the second transducer array extending a length less than the diameter of the wafer. It is preferred that the process tank further comprise a fluid inlet positioned between the upwardly angled walls.

Abstract: A dishwasher includes a water inlet connectable to a water source. A dishwasher element is operable on water received through the inlet. A flow sensor is in fluid communication with the inlet and is operable to generate a control signal indicative of water flow through the inlet. A control apparatus is connected between the dishwasher element and the flow sensor and is operable to inhibit operation of the dishwasher element in response to the control signal.

Abstract: A dishwasher includes a water inlet connectable to a water source. A dishwasher element is operable on water received through the inlet. A flow sensor is in fluid communication with the inlet and is operable to generate a control signal indicative of water flow through the inlet. A control apparatus is connected between the dishwasher element and the flow sensor and is operable to inhibit operation of the dishwasher element in response to the control signal.

Abstract: Initially, process parameters for dense phase fluid cleaning are determined. Thereafter, a cleaning chamber containing a substrate is pressurized with a dense phase fluid, based on these process parameters. The substrate is then cleaned with the dense phase fluid, again based on these process parameters. Exhaust fluid is subsequently expelled from the cleaning chamber, and thereafter analyzed. The process parameters are then adjusted to adjusted process parameters based on the analysis of the exhaust fluid. Thereafter, the cleaning chamber is again pressurized and cleaning repeated. This pressurization and cleaning is based on the adjusted process parameters. Also, this pressurization and cleaning is repeated until the substrate is sufficiently clean.

Abstract: A dishwasher includes a water inlet connectable to a water source. A dishwasher element is operable on water received through the inlet. A flow sensor is in fluid communication with the inlet and is operable to generate a control signal indicative of water flow through the inlet. A control apparatus is connected between the dishwasher element and the flow sensor and is operable to inhibit operation of the dishwasher element in response to the control signal.

Abstract: Apparatus for and a method of cleaning or processing a wafer anticipates a malfunction of a pump and avoids an abrupt shutting down of the pump during the cleaning or processing of the wafer. The apparatus includes a tank vessel containing a liquid used in the cleaning or processing of the wafer, a pump that pumps the liquid chemical from the vessel, a filter that filters impurities contained in the liquid pumped by the pump, a heater that heats the filtered liquid to a predetermined temperature and supplies the heated liquid back into the tank vessel, and a pump malfunction anticipation unit that operates at the same time as the pump. The pump malfunction anticipation unit calculates the flow rate of the liquid pumped by the pump using a program, and based on the flow rate anticipates when it is time to replace the pump.

Abstract: A household appliance, such as a dishwasher, a washing machine, or similar apparatus, is proposed with an addition unit (9) to add cleansing agent to a cleaning liquid, which ensures reliable rinsing out of the cleansing agent chamber(s). This is accomplished according to the invention by the fact that the addition unit (9) is connected with a pressure line (7) of a rinsing pump (2) to deliver wash liquid to the addition unit (9) in order to rinse out cleansing agent located in it.

Abstract: An edge remover is provided in the vicinity of an edge portion of a wafer subjected to copper plating. An aqueous hydrogen peroxide is supplied to the edge portion of the wafer from a first nozzle provided at an inner side for a radial direction of the wafer. Next, diluted hydrofluoric acid is supplied to the edge portion of the wafer from a second nozzle provided at an outer side for the radial direction thereof.

Abstract: A method for the reprocessing of a device having internal passageways by applying a fluid at a plurality of pressures to the internal passageways of the device to permit reuse of the device in a clean environment includes applying a fluid having a single input pressure to a pressure differentiation device having first and second pressure control fittings for providing first and second differing pressure outputs in accordance with the single input pressure and transmitting the fluid at the first and second differing pressures from the pressure differentiation device to the internal passageways. The internal passageways are reprocessed with the transmitted fluid at the first and second differing pressures, whereby the internal passageways are reprocessed at differing pressures in accordance with the single input pressure.

Abstract: A household appliance using water is described, in particular a washing machine, comprising a supply system of water from an external source (8,9), a softening system for at least a portion of the supplied water (10,17), and a control system of the appliance, characterized in that permanent water softening means (10,17,H,21) are provided, which are controlled by said control system and which do not periodic interventions by the user to the appliance, for adding regeneration media and/or replacing components.

Abstract: An efficient residential dishwasher is disclosed. The residential dishwasher comprises a washing chamber, a rack within the washing chamber for holding dishes, a water tank for holding hot water to be used to clean dishes located on the rack, and at least one spray head within the washing chamber for cleaning dishes on the rack. After hot water has been delivered from the water tank to the washing chamber, the spray head sprays hot water to the dishes on the rack for the purpose of cleaning. The water tank will be filled with water from a fresh water line in response to a cooking apparatus being turned on.

Abstract: A cleaning system that includes a cleaning device, a pipeline having a first end, a valve connected between the cleaning device and a second end of the pipeline to enable water flow from the pipeline to the cleaning device when the valve is held at an open position, a limit switch connected to the valve for providing a signal in response to a position of the valve, a controller electrically coupled to the limit switch to receive the signal, and a monitor electrically connected to the controller and operating in response to the signal.

Abstract: A vehicle washing apparatus includes a side track extending along a washing bay. A gantry is supported for reciprocal motion along the side track by a gantry motor. Sensors detect the front and rear ends of the vehicle to control movement of the gantry. A retractable carriage extends from the gantry across the washing bay under the control of a carriage motor and a vehicle width sensor. The carriage rotatably supports a spray bar for discharging cleaning fluid. A motor rotates the spray bar to sweep around corners of the vehicle. A cam plate and engagement roller index the spray bar orientation, while limiting spray bar rotation to a single direction. A wheel guide receives the front left vehicle wheel. Treadle switches in the wheel guide, in conjunction with an illuminated display, indicate to the user when the vehicle is properly indexed in the washing bay.

Abstract: A device for preventing foam or air bubbles from accumulating in a measuring zone of a turbidity sensor connected in a wash-water circuit of a dishwasher or washing machine includes a main flow conduit and a bypass conduit connected to the main flow conduit. The bypass conduit includes a first conduit section branching off from the main flow conduit, a second conduit section leading back into the main flow conduit at a junction, and an enlarged region of reduced flow velocity connected upstream of the junction. The enlarged region provides the measuring zone for the turbidity sensor, and includes a curved baffle and a downward-facing bulbous protuberance opposite the baffle so as to form a backflow region. The measuring zone is located within the backflow region in the bulbous protuberance.