Abstract: A device for preventing foam or air bubbles from accumulating in a measuring zone of a turbidity sensor connected in a wash-water circuit of a dishwasher or washing machine includes a main flow conduit and a bypass conduit connected to the main flow conduit. The bypass conduit includes a first conduit section branching off from the main flow conduit, a second conduit section leading back into the main flow conduit at a junction, and an enlarged region of reduced flow velocity connected upstream of the junction. The enlarged region provides the measuring zone for the turbidity sensor, and includes a curved baffle and a downward-facing bulbous protuberance opposite the baffle so as to form a backflow region. The measuring zone is located within the backflow region in the bulbous protuberance.

Abstract: A wafer transfer robot for a wafer processing system, such as a wet bench system, and a method for utilizing the robot. The wafer transfer robot can be constructed by a robot arm that is equipped with a plurality of wafer blades each adapted for picking-up and carrying one of a plurality of wafers. The plurality of wafer blades each has a predetermined thickness, a top surface, a bottom surface and a predetermined spacing from adjacent wafer blades. A plurality of sensors, such as optical sensors, capacitance sensors or magnetic sensors, with at least one mounted on the bottom side of one of the plurality of wafer blades for sensing the presence of metal on a wafer carried on an adjacent wafer blade immediately below the one of the plurality of wafer blades.

Abstract: Reaction products produced under dry etching attach to a substrate undergoing dry etching. It is necessary to remove the reaction products for the next step. Therefore, in the case of the background art, the processing of supplying a remover for reaction products, an intermediate rinse for washing away the remover, and deionized water to a substrate in order is performed. The above processing is conventionally performed under an atmospheric atmosphere. Therefore, a thin film may be changed in quality due to atmospheric components. Therefore, a substrate processing apparatus of the present invention uses means for blowing nitrogen gas on a substrate and supplies a remover to the substrate while blowing nitrogen. Thereby, it is possible to prevent a thin film from being changed in quality due to atmospheric components.

Abstract: A control system for monitoring the filling of a washing appliance with liquid. The control system energizes a fault indicator when a no-fill and/or an overfill condition occurs. Specifically, when a no-fill condition occurs at a time when the washing appliance should have a predetermined liquid level therein, the control system energizes a fault indicator and suspends operation so that damage to the washing appliance is prevented and/or minimized. When an overfill condition (i.e., a liquid level above a predetermined level) occurs the control system energizes a fault indicator and suspends operation to prevent and/or minimize damage to the washing appliance and/or the surrounding environment.

Abstract: A bracket is provided for mounting an object to a tub of a dishwasher. The bracket is mounted on the annulus edge of the pump opening in the bottom of the tub adjacent the pump seal ring. No other fasteners are used to secure the bracket to the tub. The bracket is mounted on the tub before the pump is installed. In one embodiment a thermostat is pivotally mounted on the bracket so as to maintain substantially flush engagement with the tub. In a second embodiment, a wire harness extends through a loop of the bracket for support adjacent the tub.

Abstract: A device for preventing errors during semiconductor wafer fabrication can be configured to prevent separation of optical sensor unit components, such as a gas supply pipe and a fixing guide, that could be caused by excess N2 gas pressure. The device can also be configured to prevent excess moisture build-up that can lead to wafer sensing errors. The device includes a bath for receiving pure water or chemicals to remove particles. The bath can be further configured to discharge waste water after removal of the particles. Fixing guides are disposed at the outside of the bath to fix optical fiber sensors thereto. Optical fiber sensors are inserted into gas supply pipes, partially secured within the fixing guides. Purge output holes are formed at predetermined locations along the fixing guides to release N2 gas pressure. A method for releasing excess pressure and a method for discharging excess moisture from an optical sensor unit are also provided.

Abstract: A method for cleaning an apparatus using a clean-in-place system is disclosed. The clean-in-place system is in fluid communication with an inlet and an outlet of the apparatus. In the method, a cleaning composition having a measurable physical property (e.g., pH) is supplied from a cleaner tank into the inlet of the apparatus for a first period of time. A rinsing composition having the measurable physical property at a second measured value is then supplied from a rinse tank into the inlet of the apparatus for a second period of time. The measurable physical property is sensed versus time for fluids exiting the outlet of the apparatus, and a circulation time of the cleaning composition is determined. A closing time for a return valve of the cleaner tank is then determined for subsequent cleaning cycles such that minimal rinsing composition enters the cleaner tank during the subsequent cleaning cycle.

Abstract: The invention utilizes harmonics of certain clamped ultrasound transducers to generate ultrasound within the liquid of an ultrasonic tank and in a frequency range of between about 100 khz to 350 khz (i.e., “microsonic” frequencies). The application of microsonic frequencies to liquid preferably occurs simultaneously with a sweeping of the microsonic frequency within the transducer's harmonic bandwidth to reduce or eliminate (a) standing waves within the liquid, (b) other resonances, (c) high energy cavitation implosion, and (d) non-uniform sound fields, each of which is undesirable for cleaning and/or processing of semiconductor wafers and other delicate parts. The invention can also drive ultrasonic transducers such that the frequency of applied energy has a sweep rate within the ultrasonic bandwidth of the transducers; and that sweep rate is also varied so that the sweep rate is substantially non-constant during operation.

Abstract: Toner xerographically adhered to a material, such as a sheet of paper, may be removed using a solvent-based or solventless approach. The application of ultrasonic tamping, scraping and brushing may aid in removing toner particles. In a solvent-based approach, a solvent may be applied generally or the solvent may be targeted specifically to the toner covered portions of the material to loosen the adhesive securement of the toner to the material. Thereafter, the toner is subjected to a mechanical abrasion using ultrasonic and physical agitation to cause flaking of the toner.

Abstract: Automatic sealing of a dishwasher door is obtained through an electric actuator that moves the door from a close position adjacent to the opening of the washing chamber to a seal position in which the washing chamber is sealed typically against a gasket or the like. The actuator eliminates the need for the user to provide the force necessary to seal the gasket and/or can be used for improved venting of the washing chamber.

Abstract: The invention relates to a device for measuring the turbidity of the rinsing liquid in a dishwasher by means of a turbidity sensor. If it is provided according to the invention that the turbidity sensor is incorporated into the inlet flow of the circulation pump into the water drain shaft of the dishwasher and continuously measures the turbidity of the rinsing liquid, that the upper and lower spraying plane can be operated alternately, that a difference value can be derived from the turbidity values associated with upper and lower spray plane, that parameters for the quantity and the type of soiling can be derived from the turbidity values and the difference value and that the further rinse program can be established and controlled with these parameters, then, with low complexity, measurement values for the degree of soiling can be obtained, from which value parameters for the further course of the program can be delivered.

Abstract: A substrate processing apparatus includes a container in which a heating plate, a discharge nozzle for discharging a vapor of organic solvent, and a discharge nozzle for supplying a process gas and a cooling gas are provided. A pump in communication with an exhaust outlet of the container exhausts an atmosphere from the container to reduce pressure in the container. Therefore, the substrate processing apparatus is capable of performing (1) the process of drying a substrate in a reduced-pressure atmosphere by the use of the vapor of organic solvent, and (2) the process of drying the substrate in the reduced-pressure atmosphere by heating, to thereby efficiently dry the substrate.

Abstract: A method for performing the edge clean operation on a semiconductor wafer. A laser beam is used to accurately clean the edge of the wafer. The wafer is clamped concentrically to a chuck and rotated at a selectable speed, preferably in the range of 10 rpm to 1,000 rpm. A laser beam of variable power is directed onto toward the edge of the wafer at an oblique angle through a nozzle through which an inert purge gas is simultaneously passed. The laser beam removes unwanted deposits at the edge of the wafer and the gas is used to blow away the residue and prevent slag buildup on other parts of the wafer. The process is preferably carried out in an exhausted chamber.

Abstract: A method for cleaning an apparatus using a clean-in-place system is disclosed. The clean-in-place system is in fluid communication with an inlet and an outlet of the apparatus. In the method, a cleaning composition having a measurable physical property (e.g., pH) is supplied from a cleaner tank into the inlet of the apparatus for a first period of time. A rinsing composition having the measurable physical property at a second measured value is then supplied from a rinse tank into the inlet of the apparatus for a second period of time. The measurable physical property is sensed versus time for fluids exiting the outlet of the apparatus, and a circulation time of the cleaning composition is determined. A closing time for a return valve of the cleaner tank is then determined for subsequent cleaning cycles such that minimal rinsing composition enters the cleaner tank during the subsequent cleaning cycle.

Abstract: A rate monitor connected to a single-wafer cleaning device to measure and control a wet cleaning process. During the wafer cleaning process the rate monitor can monitor a rate at which changes are being made to a portion of the wafer, as the wafer is covered with a liquid, and predict an endpoint in time to the wet cleaning process.

Abstract: An apparatus for inspecting rubbing inferiority of an alignment film of a liquid crystal display device by spraying moisture particles, the apparatus including a moisture storing unit for storing moisture, and a moisture particle generating unit for pelletizing moisture ejected from the moisture storing unit and spraying on a substrate.

Abstract: A method for the reprocessing of a device having internal passageways by applying a fluid at a plurality of pressures to the internal passageways of the device to permit reuse of the device in a clean environment includes applying a fluid having a single input pressure to a pressure differentiation device having first and second pressure control fittings for providing first and second differing pressure outputs in accordance with the single input pressure and transmitting the fluid at the first and second differing pressures from the pressure differentiation device to the internal passageways. The internal passageways are reprocessed with the transmitted fluid at the first and second differing pressures, whereby the internal passageways are reprocessed at differing pressures in accordance with the single input pressure.

Abstract: An apparatus for the treatment of semi-conductor wafers is provided. The apparatus has a first valve mechanism for introducing different treatment fluids into a treatment tank from different reservoirs. At least one collection device is provided for collecting a treatment fluid after treatment of wafers therewith in the treatment tank. A second valve mechanism is provided for conveying at least a portion of the treatment fluid out of the collection device and to a respective reservoir. A rinsing mechanism is provided for rinsing the collection device.

Abstract: A device for monitoring the functioning of a rotating liquid-discharging appliance includes at least one collecting chamber with at least one inlet orifice, at least one outlet orifice, and at least one sensor. The outlet orifice of the collecting chamber has a smaller cross section than the inlet orifice, and the sensor is a level sensor that transmits signals to an evaluation apparatus, by which an entire functioning of the rotating liquid-discharging appliance can be monitored. The monitoring device is disposed approximately in a region acted upon with liquid by the appliance to be monitored.

Abstract: Apparatus for pressure processing components is disclosed which includes an improved closure system that minimizes dust-generating parts and allows easy access to the chamber. Ports are provided for introducing and releasing pressurized gases and fluids to and from the processing space. The heating system of the apparatus heats both the cover and the stage inside the pressurized chamber such that cycle time to equilibrate heated, pressurized fluids such as supercritical carbon dioxide inside the chamber are decreased. The apparatus includes a mechanism that raises the stage inside the chamber, pressing it against the fixed cover and sealing the inside of the pressure vessel. In one embodiment a screw-type jack is used to move the component-loaded stage fitted with a deformable o-ring seal a short travel distance to seat against the lid and seal the pressure chamber. In a related embodiment a computer and an electronic stepper motor are used to drive the pressing means in an automated fashion.

Abstract: A plasma etching chamber is cleaned with a supply of pressurized nitrogen or argon that is electrically heated. The cleaning cycle is performed during the idle time following an etching cycle. Electrically heated cleaning gas flows into the etching chamber for a predetermined period during which the etching chamber rises. Flow of heated cleaning gas is then stopped, and the etching chamber is evacuated by existing equipment. The cycle can be started automatically using a pressure signal from a conventional purging gas line or from a signal at a SECS/GEM port.

Abstract: A method for cleaning an apparatus using a clean-in-place system is disclosed. The clean-in-place system is in fluid communication with an inlet and an outlet of the apparatus. In the method, a cleaning composition having a measurable physical property (e.g., pH) is supplied from a cleaner tank into the inlet of the apparatus for a first period of time. A rinsing composition having the measurable physical property at a second measured value is then supplied from a rinse tank into the inlet of the apparatus for a second period of time. The measurable physical property is sensed versus time for fluids exiting the outlet of the apparatus, and a circulation time of the cleaning composition is determined. A closing time for a return valve of the cleaner tank is then determined for subsequent cleaning cycles such that minimal rinsing composition enters the cleaner tank during the subsequent cleaning cycle.

Abstract: A wet etch system including a process tank having an inner etch bath chamber and an outer overflow chamber surrounding the etch bath chamber. A frame which is removably mounted on the process tank defines a diversion channel between the upper ends of the etch bath chamber and overflow chamber. The etch bath chamber receives a wafer-containing cassette, which displaces etchant from the etch bath chamber, through the diversion channel and into the overflow chamber, where the etchant is drained from the process tank. Particulate impurities leave the etch bath chamber, enter the overflow chamber and drain from the process tank with the overflow etchant. Fresh etchant is poured into the etch bath chamber prior to a subsequent etch cycle. A water spray loop may be provided in the overflow chamber for removing etch particles from the interior wall surfaces of the overflow chamber.

Abstract: An apparatus for assessing a silicon dioxide content of a phosphoric acid bath for etching silicon nitride and a system for etching silicon nitride bath utilize a sensor. In particular, the apparatus for assessing the silicon dioxide content of a phosphoric acid bath for etching silicon nitride of the present invention contains a sensor for measuring the NH3 concentration of the phosphoric acid bath, a storage unit for storing data which define a relationship between the silicon dioxide content and the NH3 concentration, and a device for calculating the silicon dioxide content of the basis of the measured NH3 concentration and the stored data.

Abstract: Disclosed is a dishwasher having an improved water softener. The present invention includes a housing, a tub in the housing to hold tableware, an injector assembly for injecting water on the tableware in the tub, and a water softener softening the water supplied to the injector assembly, the water softener including a first container holding an ion-exchange resin for removing heavy metal and metal ions from the water, a second container holding a predetermined amount of salt and salt water to supply the salt water to the first container to recycle the ion-exchange resin that is saturated, a float installed in the second container, and a sensor provided to the second container to sense a concentration of the salt water according to a distance from the float.

Abstract: Disclosed is a dishwasher, by which the dishwasher is simply configured as well as the door is facilitated to open/close. The present invention includes a cabinet having an open front side, a door opening/closing the front side of the cabinet, a locker at the door, a coupling member inside the cabinet to be elastically coupled to or separated from the locker in opening/closing the door, and a switch in rear of the coupling member to sense opening/closing of the door.

Abstract: The present invention comprises methods, compositions and apparatus for cleaning the surfaces within vessels that have restricted points of entry, and in particular, the surfaces within oxygen converters and oxygen cylinders. These oxygen converters and oxygen cylinders are components of the onboard oxygen supply systems of aircraft. A surfactant and a solvent are mixed to form a cleaning composition that is boiled at reduced pressure and increased temperature within the oxygen converter or oxygen cylinder. The oxygen converter or oxygen cylinder is rinsed with pure solvent, and the rinse fluid is measured to determine the level of contaminants. Dry air is forced through the oxygen converter or oxygen cylinder to remove remaining solvent. The cleaning composition may comprise a fluorocarbon solvent and a fluorosurfactant.

Abstract: The removal of ceramic material from the interior of cast metallic components is accomplished in a closed system. A vessel within the system is filled with a chemical leaching fluid that immerses the cast component having the ceramic material and/or ceramic cores therein. The leaching fluid is superheated and boiling is controlled by varying the pressure within the closed system without changing the molecules in the vessel.

Abstract: A pre-injury contact warning device for a front door of an automatic dishwasher or oven, the front door being openable to a generally horizontal very low position above the floor. In one embodiment, the device includes a housing attachable to a surface of the front door. A warning signal emitter sensorially perceptible by a person receives electric power from a miniature storage battery mounted within the housing. An angle-sensitive switch mounted in the housing is operably interconnected between the warning signal emitter and a proximity sensor. The switch is open and the proximity sensor and the warning signal emitter off when the front door is closed, while the switch is closed and the warning signal emitter is armed and on standby when the front door is open. When a person gets within a predetermined distance from the open door, the proximity sensor activates the warning signal emitter.

Abstract: A load sensing system for maximizing the cleaning efficiency of particulate raw materials such as sand, gravel, rock, ores, etc. in a log washer by sensing the weight of the aggregate in the log washer tank and adjusting the angle of inclination of the tank for cleaning efficiency. The system includes a log washer tank pivoted at its lower end and supported by hydraulic cylinders at its upper end. A high/low pressure sensor detects changes in the weight of the load by changes in hydraulic fluid pressure, and raises or lowers the upper end of the tank when low or high pressure limits are exceeded through solenoid activated hydraulic valves.

Abstract: A washer including a plurality of spray jets and nozzles is disposed within a washing chamber for spraying washing and rinsing fluids into the washing chamber. Conduits supply the washing and rinsing fluids to the jets. A sump at the bottom of the washing chamber collects the washing and rinsing fluids sprayed from the jets. A pump re-circulates the washing and rinsing fluids from the sump to the conduits and nozzles. The washer is further comprised of a fluid displacement device centrally disposed within the sump. A fluid displacement device is dimensioned to displace fluid within the sump and to define a generally annular sump chamber surrounding the fluid displacement device that communicates with the pump.

Abstract: The invention concerns a sanitary device comprising:

Abstract: A cleaning water jetting device 40 formed so as to rotate a nozzle by a fluid pressure and capable of reducing the size of the drive part of a pump for feeding fluid to a chamber and an operation cost, comprising an upper side through-hole 6A recessedly formed in edge shape provided in the ceiling of the chamber 2 and a bottomed concave part 43 formed in round hole shape provided in the bottom surface thereof, wherein the nozzle 4 is installed by inserting a reduced diameter part 7 on a nozzle tip side at the nozzle tip side into the upper side through-hole 6A and the bottom portion 44 into the concave part 43, and kept in such a state in the upper side through-hole 6A as to face a cleaning fluid jetting port 5 toward the outside of the through-hole, to be rotated, and to allow the position thereof to be changed in a nozzle axis O direction, and can be revolved around the center axis thereof in the tilted attitude relative to the center axis P of the upper side through-hole 6A.

Abstract: A car wash includes a frame, a guide rail device for moving the car to be washed, and a cleaning apparatus. The cleaning apparatus includes a pair of first cleaning mechanisms and a pair of second cleaning mechanisms. Each of the first cleaning mechanism and the second cleaning mechanisms includes a pivotal frame, a cleaning unit attached to the pivotal frame, and a return unit for returning the pivotal frame to its initial position. The pivotal frames are returned to their position by gravity.

Abstract: A method for ashing a semiconductor device is provided. In the method, the semiconductor substrate, on which a metal interconnection and a photoresist pattern are formed, is processed using H2O, and then, by using a mixture of O2, N2, and H2O. The process is performed at least twice repeatedly. As a result, corrosion of the metal interconnection is inhibited and a bridge caused by conductive polymer is prevented.

Abstract: A method and apparatus for connecting an engine flushing system for flushing the lubrication system of an engine having a detachable engine lubricant filter, with the detachable lubricant filter having an engine lubricant outlet portion and an engine lubricant inlet portion contained within a casing of the detachable engine lubricant filter is disclosed, which may comprise at least one flushing system connection unit adapted to connect the flushing system to at least one of the engine lubricant inlet portion and engine lubricant outlet portion of the detachable lubricant filter through the casing of the detachable engine lubricant filter.

Abstract: In various embodiments, a leak diversion device may be coupled to a device, such as, but not limited to, a domestic or industrial device, for diverting a fluid that is released from the device. In some embodiments, a surface in the leak diversion device may be angled for diverting the diverted fluid to a predetermined location exterior to the device where a user may see the fluid. A hose may also be used to divert the fluid out of the leak diversion device. In some embodiments, the leak diversion device may have a permeable surface and/or enforced sides to provide level support for the device while allowing fluid released from the device to drop onto a slanted surface to be directed away from the device. In some embodiments, dye tabs may be used in the leak diversion device to add color to the fluid to make the fluid more visible.

Abstract: In a cleaning controller for a recording head of a recorder connected to an external device, a timer acquires a first time value indicating a current time from the external device, and performs cyclic clocking in which a first predetermined time period is repetitively clocked from a predetermined time point. A nonvolatile storage medium stores a second time value indicating a time at which a cleaning operation is lastly performed. A determinant compares the first and the second time values to obtain a third time value, and determines whether a cleaning operation is necessary to be performed based on the third time value. A cleaner performs a cleaning operation of the recording head based on the result determined by the determinant.

Abstract: A household dishwasher that includes a drain pan designed to relocate leaking fluids to an observable location. The dishwasher is a standard dishwasher with a drain pan for collecting water that unintentionally falls from the interior of the dishwasher. The drain pan is angled for diverting the collected water to a predetermined location exterior to the household dishwasher where an occupant of the household may view the water.

Abstract: A tank is set up to hold a precise volume of acid by first adjusting an overflow pipe to establish a volume that is larger than the desired volume and then adjusting the vertical position of a volume occupying element that extends above and below the surface of the acid. The apparatus includes a drain pipe for directing the acid to a tank that holds deionized water that the acid is mixed with. The bath is used for etching a silicon dioxide layer on a semiconductor wafer.

Abstract: A water lance blower for cleaning heat installations includes a water lance moveably mounted with a mouth thereof at or in a hatch. The water lance can blow a jet of water through the heating installation, through which flames and/or flue gases are guided, to wall regions accessible from the hatch, during operation. The water lance is provided with at least one sensor for detecting at least one predeterminable measurement value for monitoring the quality of the water jet. A method for operating the water lance blower includes detecting and evaluating at least one parameter characteristic of the quality of the water jet as a measurement value during operation of the water lance blower. The method permits an evaluation of the cleaning effect of the water lance blower during operation and, if required, influencing of the same.

Abstract: A cleaning system and method for in-process sensors wherein a scouring jet discharges process fluid as the cleaning agent to remove solids and other contaminants from the surface of the sensor.

Abstract: The present invention describes a chemical solution recycling apparatus in a spin etching and cleaning process chamber for manufacturing semiconductor devices. Modification of the exterior dimension and the main structure of the process chamber is not necessary. The recycling apparatus in accordance with the present invention may separate different chemical solutions into different vessels and recycle them thereafter. The recycling apparatus comprises a recycling ring moving up and down to collect the solution and a recycling circular tray for sorting the chemical solutions in different trenches and drains. Therefore, the chemical solutions may be collected by assigned vessels or may be recycled into the process chamber after necessary quality inspections.

Abstract: In a method for removing an organic material from semiconductor devices, at least one semiconductor device is inserted into a so-called piranha bath. Measurement data are processed to get a data curve for measuring a concentration of at least one reaction product. The measurement data is queried for at least one of a turning point, a local maximum point or a local minimum point of the curve each being significantly different from signal noise after removing the semiconductor device from the fluid. With the information it is decided whether further processing of the semiconductor device is needed. The method is suitable for detecting an incomplete removal of organic material, i.e. photoresist deposited on the processed semiconductor device.

Abstract: A liquid storage tank cleaning apparatus which utilizes the power of an existing pump in the tank to provide automatic cleaning and removal of both floating debris and sediment. The cleaning action is initiated, carried out and terminated automatically, greatly reducing the cost of monitoring and operating the system.

Abstract: Apparatus (20) for cleaning a window (24) of a vehicle (22), including a vessel (28), having an inlet (32) through which a washing fluid is received from a reservoir and an outlet (34) through which the fluid is discharged for cleaning the window. There is a heating element (50) for heating the fluid in the vessel, which element preheats the vessel before the washing fluid is received therein, whereby at least an initial quantity of the fluid is rapidly heated and discharged from the vessel.

Abstract: A cleaner cleans an implement in a controlled environment by performing a two-fold process. A preferred cleaner performs at least two treatments on the implement using one or more fluids. The fluids can include water, steam, gas, as well as detergents and sterilizing agents. A preferred cleaner includes a chamber, a boiler for generating steam, and a sprayer adapted to convey the steam from the boiler onto the implement. Another preferred cleaner includes a chamber, a fluid processor adapted to convey a fluid to the chamber, a sprayer for directing the fluid onto the implement, and a sterilizer for reducing the level of biological contaminants on the implement. The fluid processor may be an electrically driven centrifugal pump that receives a washing liquid.

Abstract: A substrate cleaning apparatus includes a bath in the form of a vessel filled with a cleaning liquid, a substrate guide disposed on the bottom of the vessel and configured to support at least one substrate vertically, a first sensing unit for sensing the substrate(s) supported by the guide, and a second sensing unit for sensing substrates or remnants thereof disposed on the bottom of the vessel. The first sensing unit has sensor elements installed on the opposite sides of the vessel as situated across from one another. The second sensing unit has sensor elements installed on both sides and on the bottom of the vessel for detecting substrates or remnants from damaged substrates lying on the bottom of the process chamber.

Abstract: An efficient residential dishwasher is disclosed. The residential dishwasher comprises a washing chamber, a rack within the washing chamber for holding dishes, a water tank for holding hot water to be used to clean dishes located on the rack, and at least one spray head within the washing chamber for cleaning dishes on the rack. After hot water has been delivered from the water tank to the washing chamber, the spray head sprays hot water to the dishes on the rack for the purpose of cleaning. The water tank will be filled with water from a fresh water line in response to a cooking apparatus being turned on.

Abstract: A pre-injury contact warning device for a front door of an automatic dishwasher or oven, the front door being openable to a generally horizontal very low position above the floor. In one embodiment, the device includes a housing attachable to a surface of the front door. A warning signal emitter sensorially perceptible by a person receives electric power from a miniature storage battery mounted within the housing. An angle-sensitive switch mounted in the housing is operably interconnected between the warning signal emitter and the storage battery. The switch is open and the warning signal emitter off when the front door is closed, while the switch is closed and the warning emitter on when the front door is open. The warning signal emitter, when on, is sufficiently sensorially perceivable to warn or alert the person nearby the dishwasher that the front door is open and to be avoided. Other embodiments are provided which are operatively dependent upon other forms of sensory perception, e.g.