Abstract: A device for wetting a bulk good, in particular for moistening power plant filter ashes, comprises a downpipe. An inlet, through which the bulk good enters the downpipe, is formed at the upper end of the downpipe. An outlet, through which the bulk good is discharged in the wetted state, is formed at the lower end of the downpipe. A water supply to the downpipe is provided. The downpipe has a flexible wall section. The water supply opens into the flexible wall section of the downpipe. Deposits of the bulk good are prevented in that the bulk good does not come in contact with water until the bulk good is in the flexible wall section.

Abstract: The invention has an object to provide a foreign substance removing device that is capable of quickly and efficiently cleaning substrate surfaces regardless of the size thereof and preventing readhesion of once removed foreign substances as well as to provide a die bonder equipped with the same. The foreign substance removing device of the invention includes: a pickup device to which a dicing film carrying dies thereon is fixed; and a collet for picking up a die separated from the dicing film and placing the die on a substrate having an adhesive applied thereon, and operates to remove foreign substances on the substrate in preparation for application of the adhesive onto the substrate. The foreign substance removing device includes a cleaning nozzle integrating an air outlet orifice and an air inlet orifice.

Abstract: A liquid processing apparatus includes: a hollow holding plate configured to hold an object to be processed; a hollow outer rotational shaft fixedly connected to the holding plate; a rotary drive part configured to rotate the outer rotational shaft; and a lift pin plate disposed in a hollow space of the holding plate, and having a lift pin configured to support the object to be processed. Inside the lift pin plate, a cleaning-liquid supply part configured to supply a cleaning liquid is extended. Connected to the lift pin plate is a lifting member configured to locate the lift pin plate on an upper position and a lower position. When located on the lower position, the lift pin plate receives a force of the rotary drive part for rotating the outer rotational shaft so that the lift pin plate is rotated.

Abstract: An apparatus (1) to process used materials for input into a manufacturing process. The apparatus includes a housing (10) having a top surface (15) and providing a plurality of chambers arranged in descending order. A series of locations (20) are positioned under said top surface and through which used materials are to pass. Each said location being provided for receipt of a predetermined used material. A descending path (25) extends from each said location and provides for the transfer of used material from the respective location successively through the chambers. The chambers include a sensing chamber (30) downstream of said locations and having sensing means (35) operable to sense the composition of used material located within said sensing chamber. The sensing means being operable to activate an alarm if the used material has been placed by a user in an opening for receipt of a different material.

Abstract: A dishwasher includes a treatment compartment, a storage container in the treatment compartment, and a drive for moving the storage container out of and/or into the treatment compartment.

Abstract: A cleaning method for a SiC semiconductor includes the step of forming an oxide film on a front surface of a SiC semiconductor, and the step of removing the oxide film, and oxygen plasma is used in the step of forming the oxide film. Hydrogen fluoride may be used in the step of removing the oxide film. Thereby, a cleaning effect on the SiC semiconductor can be exhibited.

Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.

Abstract: A substrate processing apparatus of a simplified structure, which is capable of decreasing an amount of a process liquid to be used, and of restraining change in temperature of the process liquid is provided. The substrate processing apparatus includes: a processing unit that holds one substrate and processes the substrate held by the processing unit; a processing bath capable of simultaneously accommodating a plurality of substrates, the processing bath storing a process liquid into which a substrate is immersed so as to be processed, the process liquid being circulatingly supplied to the processing bath; and a transfer unit that simultaneously transfers substrates whose number is less than the number of substrate that can be accommodated in the processing bath. The transfer unit transfers, at least, to the processing bath in which the process liquid is stored. A substrate is processed with the use of at least one of the processing unit and the processing bath.

Abstract: Provided are an apparatus for and a method of removing foreign materials from a substrate which reliably remove the foreign materials, eliminate a chance of redeposition of the foreign materials, and are applicable even to large-size substrates. The apparatus for removing foreign materials includes electrostatic chucks (2, 3) forming a substrate chucking surface (4) to which the substrate (1) is attracted; a resin sheet supplying means (9) for supplying a resin sheet (5) to the substrate chucking surface (4); resin sheet collecting means (13) for collecting the supplied resin sheet (5); and a substrate transfer means for transferring the substrate (1). The substrate (1) supplied to the electrostatic chucks (2, 3) by the substrate transfer means is attracted to the substrate chucking surface (4) through the resin sheet (5), and a foreign material (22) deposited on a side of the substrate chucking surface (4) of the substrate (1) is transferred onto the resin sheet (5) and removed.

Abstract: A cleaning system for removing contaminants on a surface of a patterned substrate for defining integrated circuit devices is provided. The system includes a substrate carrier for supporting edges of the patterned substrate, and a cleaning head positioned over the patterned substrate. The cleaning head includes a plurality of dispensing holes to dispense a cleaning material on the surface the patterned substrate for defining integrated circuit devices, wherein the cleaning material includes polymers of a polymeric compound. The cleaning head is coupled to a storage of the cleaning material, which is coupled to the cleaning material preparation system. A support structure holds the cleaning head in proximity to the surface of the patterned substrate.

Abstract: A self-contained, mobile system for cleaning trash receptacles. The system comprises a water system and a lift system that work in conjunction with each other to provide an automated method for cleaning trash receptacles.

Abstract: The present invention relates to a method and a device for cleaning ophthalmic lenses, particularly contact lenses. The method and the device are suitable for integration into an automated production of ophthalmic lenses, particularly contact lenses.

Abstract: The invention relates to a container treatment machine, in particular a filling, closing or rinsing unit for containers, such as bottles, cans, barrels, kegs etc., comprising a container feed, a container discharge, at least one feed line for at least one product, and a cleaning device (3) for cleaning the outer surfaces by means of a cleaning fluid (13), characterized in that the cleaning device (3) comprises a robot (4) and a track (5), wherein the track (5) runs around the rotational axis thereof in at least one angular region, wherein the robot (4) is arranged on or at said track (5) and can be driven by means of a linear drive (8).

Abstract: A process chamber for processing semi-conductor wafers. The chamber includes at least one rotor within the process chamber. The rotor is adapted to receive and/or process semi-conductor wafers. The top of the process chamber also includes a tiltable rim. This rim tilts from a non-inclined position to an inclined position. The wafers may be loaded into and unloaded from the process chamber when the rim is in its inclined position.

Abstract: A wash element for washing one or more reusable fluid manipulators is provided comprising at least one nozzle for connection to a fluid pump to generate a fluid jet and at least one deflector surface positioned to deflect the fluid jet towards a washing zone for receiving at least a portion of the fluid manipulator. The deflector surface is being shaped to broaden the fluid jet. The invention further relates to a wash station having a cavity provided with one or more wash elements. The invention yet further relates to an automated system for manipulating fluids comprising at least one wash station and a controller set up to control washing the fluid manipulator. In a process for washing the reusable fluid manipulator at least a portion of the fluid manipulator is moved in a washing zone, a fluid jet of washing fluid is generated and directed onto a deflector surface shaped to broaden and deflect the fluid jet towards the washing zone.

Abstract: The surface treatment apparatus includes: a supply device for supplying an introduced workpiece to the inside of a treatment cell of a subsequent surface treatment device; a surface treatment device for supplying a surface treatment liquid to the inside of the treatment cell while rotating the treatment cell, thereby performing a surface treatment on the workpiece; a workpiece collection device for inverting the treatment cell, and squirting the inside of the treatment cell with water from below to flow out the workpiece, thereby collecting the workpiece into a collection vessel; a drying device for receiving the collection vessel from the workpiece collection device, and exposing the workpiece within the collection vessel to air, thereby drying the workpiece; and a carrying device for carrying the treatment cell between the surface treatment devices, and between the surface treatment device and the workpiece device, wherein the surface treatment apparatus includes the one or more surface treatment devices.

Abstract: A device for processing products such as fruit or vegetables includes at least one hydraulic channel (11) for transporting the products, and elements for producing a liquid flow in each hydraulic channel, at least one cleaning carriage (20) carrying guiding members (19), members (30, 32) for brushing the walls of each cleaned channel, and at least one hydraulic drive blade (34) capable of extending in the liquid flow flowing in at least one cleaned channel (11) in order to drive the cleaning carriage (20) in translation in each cleaned channel (11) under the effect of this liquid flow.

Abstract: A device for processing products such as fruit or vegetables includes a plurality of hydraulic channels (11) for transporting the products, elements for producing a liquid flow in each hydraulic channel, at least one cleaning carriage (20) guided and driven in translation along a cleaned channel (11), and a device (41, 42) for transferring the cleaning carriage (20) from one hydraulic channel to another hydraulic channel (11). It covers a cleaning method implemented in a device according to the invention.

Abstract: Discs roll along an inclined track through a chamber to expose opposite disc sides for cleaning. Energized fluid directed against the opposite sides removes particles from the discs, the fluid and particles exiting the chamber. Stop pins control a time period for cleaning and transporting the discs by selectively blocking or releasing the discs. The discs are stopped at many sections of a transducer, the sections being tailored to provide various cleaning characteristics. Within the chamber, the chamber is configured to minimize particles that originate other than by being adhered to the disc at a time when the disc is introduced into the chamber. Internal chamber configuration also minimizes retention of particles so that particles removed from one disc do not linger in the chamber for possible transfer to a disc that is cleaned in the same chamber at a later time.

Abstract: A resonator is used for ultrasonic machining and attached to the side or bottom of a liquid tank so as to pass through the liquid tank used in ultrasonic machining equipment for dipping a workpiece part in machining liquid given supersonic vibration. The resonator includes a working vessel formed in one end of the resonator within the liquid tank as a dent opening upward so as to enable the workpiece part to be inserted therein from above and part of the machining liquid in the liquid tank to be accommodated therein as separated from the machining liquid in the liquid tank.

Abstract: A reversing unit includes a fixed plate, a first movable plate provided so as to face one surface of the fixed plate, a second movable plate provided so as to face the other surface of the fixed plate and a rotary actuator. The rotary actuator rotates the first movable plate, the second movable plate and the fixed plate around a horizontal axis. A distance between the first movable plate and the fixed plate and a distance between the second movable plate and the fixed plate are set to be substantially equal to a difference in height between two hands of a main robot that carry a substrate in and out.

Abstract: A conveyor dishwasher (1) has at least one wash zone (6, 7, 8, 9) and at least one final-rinse zone (10), also a control arrangement (36) and a wash-ware detector (34) which can sense the type of wash ware which is to be treated. The control arrangement (36) assigns each type of wash ware sensed to a defined wash-ware group, selects automatically, for each wash-ware group, a defined treatment programme by which the type of wash ware assigned to the wash-ware group is to be treated in at least one of the treatment zones (6, 7, 8, 9, 10, 26) of the conveyor dishwasher (1), and sets the process parameters associated with the treatment programme selected.

Abstract: The invention relates to an entry region of a conveyor-type dishwasher. A conveyor belt which moves in the conveying direction is located in the entry region. The entry region comprises a trough base which is bounded by sidewalls arranged laterally. The entry region contains at least one washing container which stores a stock of fluid and, upon emptying, cleans the trough base.

Abstract: A clean device for cleaning a goldfinger includes a positioning mechanism for transmitting a circuit board and fixing the circuit board on a predetermined position, a delivering mechanism for delivering a cleaning medium to the predetermined position, and a wiping mechanism for utilizing the cleaning medium to wipe a goldfinger of the circuit board after the positioning mechanism fixes the circuit board on the predetermined position.

Abstract: The present invention resides in a washing device constructed by a conveyer of a carrying-in side arranged in a frame, a reservoir lower portion having plural rails for holding the work and an ultrasonic generator arranged in this frame, each reservoir upper portion united with this reservoir lower portion, a raising-lowering device for raising and lowering each reservoir upper portion, an arm mechanism for work conveyance, a moving device for controlling advancing and retreating movements of the arm mechanism, a movable device for controlling a swinging return of the arm mechanism, and a conveyer of a carrying-out side for conveying a processed work. The conveyer and the rail of each reservoir lower portion are approximately arranged on the same face. The work is horizontally moved through this conveyer and the rail and is washed and dried by utilizing the union of each reservoir lower portion and each reservoir upper portion.

Abstract: An interface block is constituted by a cleaning/drying processing block and a carry-in/carry-out block. The cleaning/drying processing block includes cleaning/drying processing sections and a transport section. The transport section is provided with a transport mechanism. The carry-in/carry-out block is provided with a transport mechanism. The transport mechanism carries substrates in and out of an exposure device.

Abstract: Disclosed is a substrate carrying apparatus having a simple configuration capable of inhibiting the occurrence of pattern collapse. A carrying tray of the disclosed substrate carrying apparatus includes a bottom plate for supporting the substrate and a circumferential side wall being provided around the bottom plate. An opening is formed in the bottom plate. An elevating member, to and from which the substrate is to be transferred, passes through the opening. A space is temporarily formed in a carrying tray. The elevating member within the opening passes to the outside of the carrying tray through the space. When the substrate is carried, the liquid is reservoired within the carrying tray, and the substrate is carried while the liquid remained on the upper surface of the substrate.

Abstract: Disclosed is a treating apparatus capable of improving the throughput during successive processing of target objects without a bad influence on the target objects. The disclosed treating apparatus includes an extendable liquid treating mechanism, and a common handling unit for handling one target object and another target object in order. The treating apparatus includes a recipe producing unit for producing a recipe having a rinsing liquid treatment and a common handling. When one common handling for handling one target object by the common handling unit and another common handling for handling another target object by the common handling unit are temporally overlapped with each other, the recipe producing unit extends the extendable liquid treatment for another target object, and shifts another common handling to an extent that the extendable liquid treatment is extended, thereby avoiding the temporal overlapping of one common handling with another common handling.

Abstract: Methods, apparatus, and kits are described, one method embodiment comprising loading a solids-laden screen into a carriage of a washing enclosure, the solids-laden screen comprising a screen mesh partially obstructed with solids from a well drilling or work-over operation, and spraying a cleaning composition onto first and second sides of the screen while vibrating the screen. Apparatus and kits for practicing the methods are also described. This abstract allows a searcher or other reader to quickly ascertain the subject matter of the disclosure. It will not be used to interpret or limit the scope or meaning of the claims.

Abstract: A template cleaning method for cleaning a template for nanoimprint, according to an embodiment of the present invention includes placing a wafer on a stage provided in a chamber, cleaning the wafer placed on the stage, inspecting the wafer for particles after the cleaning of the wafer, placing the template on the stage after the inspection of the wafer, and cleaning the template placed on the stage.

Abstract: Device for removing dust from pharmaceutical tablets or capsules, comprising a dust removal column (1) with a first ramp (2) for controlled conveying in a helical shape, said ramp comprising a first base (3) having a front face (3a) and a rear face (3b), a first peripheral edge (5) and a first internal edge (6).

Abstract: An assembly structured to clean the head portion of a stethoscope comprising a housing including a path of travel along which the head portion passes during cleaning. A supply of cleaning fluid is associated with a dispenser assembly which is cooperatively disposed relative to an activating assembly. The activating assembly is manually operated due to moveable engagement with the head portion as it travels along the path of travel. The activating assembly is thereby operatively positioned to activate the dispenser assembly when engaged by the head portion as it passes along the path of travel. The dispenser assembly delivers the cleaning fluid to an applicator assembly which distributes the cleaning fluid to the head portion and facilitates the cleaning thereof and removal of excess cleaning fluid there from.

Abstract: The invention relates to a method and an apparatus for applying a fluid (32) to items (14) to be cleaned, which items are continuously or intermittently transported in the conveying direction (12) in an automatic cleaning machine, preferably an automatic pass-through dishwasher. At least two, preferably tubular, spray bodies (26.1, 26.2, 26.3, . . . 26.n) which are spaced apart from one another are arranged in at least one spray plane (22, 24) which is oriented parallel to the conveying direction (12) of the items (14) to be cleaned.

Abstract: A dishwasher is provided that includes at least one cleaning chamber for subjecting tableware to the action of at least one cleaning liquid. The dishwasher optionally having a rack support for holding at least one dish rack that is loaded with tableware. The dishwasher also includes a pivoting apparatus, wherein the pivoting apparatus is designed to pivot the dish rack from at least a first position to at least a second position in the cleaning chamber.

Abstract: A device as well as method for removing the overcoat without developing an imagewise exposed lithographic printing plate is disclosed. The device comprises a structure for providing water or an aqueous solution and a transfer means for transporting said plate through said structure. The plate comprises a substrate, an ink and/or fountain solution developable photosensitive layer, and an overcoat. The exposed plate is transported through the structure to remove the overcoat by contacting with said water or aqueous solution, preferably under a brushing or rubbing action. The overcoat removal device is preferably connected to a laser imager so that the plate can be imaged on the laser imager and then directly transferred to the overcoat removal device to remove the overcoat. The overcoat-removed plate is further mounted on press to develop with ink and/or fountain solution to remove the non-hardened areas of the photosensitive layer.

Abstract: A washing apparatus provided with a washing liquid-holding reservoir and the component which supplies washing liquid to the washing liquid-holding reservoir. At an electroplate solution, a conductive surface of a web is caused to touch against a cathode roller, and a plating film is formed at the conductive surface. The washing apparatus is disposed at a downstream side of the electroplate solution. The washing apparatus washes a roller which conveys the web through midair toward a subsequent stage. A lower portion of the roller is dipped in the washing liquid at the washing liquid-holding reservoir.

Abstract: A method for removing contaminants from a material (39), such as resin particles, includes the steps of providing a vessel (50), directing a cleaning fluid (41) into the vessel (50), transferring the material into the vessel (50), moving the material within the vessel (50), and removing contaminants from the material as cleaning fluid (41) flows in the vessel (50). The vessel (50) has a vessel inlet (52) and a spaced apart vessel outlet (54). The cleaning fluid (41) is directed into the vessel (50) so that the cleaning fluid (41) flows in the vessel (50). The material (39) is transferred into the vessel (50) through the vessel inlet (52), and the material (39) is then moved within the vessel (50) from the vessel inlet (52) towards the vessel outlet (54). The cleaning fluid (41) flowing in the vessel (50) contacts the material (39) while the material is moving from the vessel inlet (52) toward the vessel outlet (54) and removes contaminants (39) from material (39).

Abstract: The embodiments of the present invention provide apparatus for cleaning patterned substrates with fine features with cleaning materials. The apparatus using the cleaning materials has advantages in cleaning patterned substrates with fine features without substantially damaging the features. The cleaning materials are fluid, either in liquid phase, or in liquid/gas phase, and deform around device features; therefore, the cleaning materials do not substantially damage the device features or reduce damage all together. The cleaning materials containing polymers of a polymeric compound with large molecular weight capture the contaminants on the substrate. In addition, the cleaning materials entrap the contaminants and do not return the contaminants to the substrate surface. The polymers of one or more polymeric compounds with large molecular weight form long polymer chains, which can also be cross-linked to form a network (or polymeric network).

Abstract: An apparatus for removing soil from a shoe, boot or other article of footwear. The apparatus employs a jet of water or other fluid to dislodge and break up the soil. The spray nozzle is housed within a tubular plunger having a discharge opening in its upper end. The plunger is operatively connected to the nozzle, so that stepping on the plunger actuates a flow of water therethrough. The nozzle includes a return spring that biases the valve back to the closed position when the plunger is released. The stream of water is directed through the opening against the surface of the shoe or other article of footwear. The upper end of the plunger is surrounded by a layer of flow-disbursing material that prevents the escape of spray from beneath the article of footwear. The layer of flow-disbursing material may be formed by a layer of coarse, open-cell foam material or by a multiplicity of small, resiliently flexible fingers.

Abstract: A liquid processing apparatus comprises a liquid processing section for applying a liquid processing to wafers W, a carrier delivery section for delivering the carrier housing the wafers W, a carrier stock section capable of storing a plurality of carriers, an interface section for transferring the wafers W between the carrier stock section and the liquid processing section, a carrier transfer device for transferring the carrier, a wafer inspecting device for inspecting the wafers W within the carrier, and a carrier transfer device control section for controlling the carrier transfer device. The carrier transfer device control section controls the carrier transfer device such that the carrier, which has been judged to be capable of a liquid processing on the basis of the result of the inspection of the wafers W, is stored in the carrier stock section, and the liquid processing is started after completion of the inspection of a predetermined number of carriers.

Abstract: An ultrasonic cleaning apparatus which performs ultrasonic cleaning of a contamination attached to a surface of an object to be cleaned, by using a cleaning liquid to which ultrasonic waves are applied has a cleaning bath pooling the cleaning liquid, a support base on which the object to be cleaned is supported in the cleaning liquid, ultrasonic wave generation device for alternately focusing first ultrasonic waves having a frequency of 1 to 10 MHz and second ultrasonic waves having a frequency equal to or lower than ½ of that of the first ultrasonic waves toward the object to be cleaned, a focus position adjustment device of adjusting the distance between a focus position for the focus and the surface of the object to be cleaned, and moving device of moving at least any one of the ultrasonic wave generation device and the support base so that the effect on the surface of the object to be cleaned of the ultrasonic waves generated by the ultrasonic wave generation device is uniform.

Abstract: A detection/cleaning device for reticles employed in the production of electronic components, wherein the detection/cleaning device has a cleaning unit, in which a cleaning chamber is constructed. At least one gas feed for introducing a pressurized fluid cleaning medium opens into the cleaning chamber, and at least one suction means, by means of which the gas can be discharged from the cleaning chamber, leads from the cleaning chamber. The cleaning chamber has at least one first opening for introducing and removing a reticle. A detection unit for detecting contaminants on articles used in semiconductor production is provided. The detection unit has a detection means, into which a reticle can be introduced from one feed side of the detection unit. The first opening of the cleaning chamber and the feed side lie opposite each other. A feeding device is provided for exchanging a reticle between the cleaning unit and the detection unit.

Abstract: One embodiment of the present invention includes an apparatus for washing a product with a fluid. The tank may receive a plurality of product, such as fruits and vegetables, into the fluid and be configured to receive a moving conveyor, having a first end, a second end, a first section, and a second section. The conveyor may have a plurality of protruding panels being structured and arranged on the conveyor to push the product through the fluid in the tank and to lift the product from the fluid in the tank to the second end of the conveyor. At least one first nozzle may be positioned substantially above the conveyor and configured to deliver the fluid onto the product as the product is pushed by the plurality of panels. The fluid delivered from the at least one first nozzle may rotate the product in the fluid in the tank.

Abstract: A wet processing apparatus includes a processing vessel for containing a processing liquid and holding at least one wafer which is immersed in the processing liquid, wherein the processing vessel has an opening, provided on an upper side thereof, for loading and removing each wafer; and a processing-liquid supply mechanism which has outlets at a first side wall of the processing vessel. A discharge hole for discharging the processing liquid jetted from the outlets is provided at a second side wall of the processing vessel, where the second side wall faces the first side wall, and the outlets face the discharge hole. An outside vessel for containing the processing liquid, which overflows from the opening of the processing vessel, may be provided so as to surround the peripheral edge of the opening. A pump for circulating the processing liquid and a filter for filtering the processing liquid may be provided.

Abstract: The present invention relates to a method and a device for cleaning ophthalmic lenses, particularly contact lenses. The method and the device are suitable for integration into an automated production of ophthalmic lenses, particularly contact lenses.

Abstract: A substrate processing apparatus of a simplified structure, which is capable of decreasing an amount of a process liquid to be used, and of restraining change in temperature of the process liquid is provided. The substrate processing apparatus includes: a processing unit that holds one substrate and processes the substrate held by the processing unit; a processing bath capable of simultaneously accommodating a plurality of substrates, the processing bath storing a process liquid into which a substrate is immersed so as to be processed, the process liquid being circulatingly supplied to the processing bath; and a transfer unit that simultaneously transfers substrates whose number is less than the number of substrate that can be accommodated in the processing bath. The transfer unit transfers, at least, to the processing bath in which the process liquid is stored. A substrate is processed with the use of at least one of the processing unit and the processing bath.

Abstract: A substrate treatment apparatus includes a container holder which holds a container for containing multiple substrates vertically stacked in horizontal postures, a substrate treatment section which collectively applies treatment to multiple substrates horizontally stacked in vertical postures, a main conveyance mechanism which conveys multiple substrates horizontally stacked in vertical postures between a substrate delivery position and the substrate treatment section, a carrying in/out mechanism which carries in/out the multiple substrates with respect to the container and changes postures of the multiple substrates between the horizontal postures and the vertical postures, and a sub conveyance mechanism which receives and delivers multiple substrates in vertical postures from and to the carrying in/out mechanism at a transfer position, receives and delivers multiple substrates in vertical postures from and to the main conveyance mechanism at the substrate delivery position, and conveys multiple substrates i

Abstract: A dishwasher includes a treatment compartment, a storage container in the treatment compartment, and a drive for moving the storage container out of and/or into the treatment compartment.

Abstract: Photoresist stripping is provided that employs batch processing to maximize throughput and an upstream plasma activation source using vapor or gas processing to efficiently create reactive species and minimize chemical consumption. An upstream plasma activation source efficiently creates reactive species remote from the photoresist on the substrate surfaces. Either a remote plasma generator upstream of the processing chamber or an integrated plasma unit within the processing chamber upstream of the processing volume may be used. Plasma processing gas is introduced from a side of a stack of wafers and flows across the wafers. Processing gas may be forced across the surfaces of the wafers in the column to an exhaust on the opposite side of the column, and the column may be rotated. An upstream plasma activation source enables a strip process to occur at low temperatures, for example below 600 degrees C., which are particularly advantageous in BEOL process flow.

Abstract: Described herein is a dish-washing machine, in which there is provided: at least one supporting structure; a washing station, defined by one or more washing arms; a rinsing station, defined by one or more rinsing arms and by at least two attachment assemblies for attachment of the rinsing arms, which are positioned on opposite sides of the washing arms; and reversible movement means for displacing a dish rack from the washing station to the rinsing station.