Abstract: A vessel having an implement located in a fluid receiving space inside the vessel. The vessel includes an enclosure for enclosing a closed space around the implement. An actuator actuates the enclosure to and fro between an open position, in which the enclosure does not enclose a closed space around the implement, and a closed position, in which the enclosure forms a fluid tight or at least essentially fluid tight casing that encloses a closed space around the implement so as to prevent fluid in the fluid receiving space outside the closed space from flowing into the closed space. A method for cleaning and/or calibrating an implement located in a fluid receiving space inside such a vessel and a method for removing an implement from or inserting an implement into a fluid receiving space inside a vessel.

Abstract: The invention concerns a device for preparation and dispensing of beverages with a mechanism for initiating and carrying out a cleaning process. The device consists of at least one line, serving to transport the beverages to a beverage outlet and means for adding a cleaner for at least partial cleaning of the at least one line and means for recognizing the dose of cleaner. Furthermore, the means for recognizing the dose of cleaner contain means for measuring the pH value.

Abstract: A reversing unit includes a fixed plate, a first movable plate provided so as to face one surface of the fixed plate, a second movable plate provided so as to face the other surface of the fixed plate and a rotary actuator. The rotary actuator rotates the first movable plate, the second movable plate and the fixed plate around a horizontal axis. A distance between the first movable plate and the fixed plate and a distance between the second movable plate and the fixed plate are set to be substantially equal to a difference in height between two hands of a main robot that carry a substrate in and out.

Abstract: An apparatus for on-line cleaning and maintaining the cleanliness of a transfer line exchanger tube is provided. In one embodiment, the apparatus includes a housing having a first end, a second end and a longitudinal axis, the housing further including a first inlet for introducing a flushing fluid to the transfer line exchanger tube, the first inlet disposed proximate the first end of the housing, a second inlet for providing a product effluent comprising hydrocarbons and an outlet for placing in fluid communication with an inlet of the transfer line exchanger tube and a critical flow nozzle or flow control orifice, the critical flow nozzle or flow control orifice in fluid communication with the first inlet of the housing. Systems and processes for cleaning and maintaining the cleanliness of a transfer line exchanger are also disclosed.

Abstract: A substrate is inclined when treatment liquid is ejected onto the substrate to remove photoresist from the substrate. Uniform processing of the substrate with the treatment liquid and collection of the treatment liquid are thus facilitated. Collected treatment liquid is treated with ozone and then reused.

Abstract: The present invention provides a microbubble washing composition for washing a human body or an animal, a microbubble washing method using the microbubble washing composition, and a microbubble washing apparatus suitable for carrying out the method are provided which are capable of safely removing sebum and old keratin adhering to the surfaces of the pores in a short period of time, keeping the skin clean for a long period of time, preventing an odor. Specifically, the present invention provides a microbubble washing composition for washing a human body or an animal including a protease and a lipase, a microbubble washing method for washing a human body or an animal including washing a human body or an animal using a washing liquid containing the washing composition and microbubbles, and a microbubble washing apparatus.

Abstract: The present invention resides in a washing device constructed by a conveyer of a carrying-in side arranged in a frame, a reservoir lower portion having plural rails for holding the work and an ultrasonic generator arranged in this frame, each reservoir upper portion united with this reservoir lower portion, a raising-lowering device for raising and lowering each reservoir upper portion, an arm mechanism for work conveyance, a moving device for controlling advancing and retreating movements of the arm mechanism, a movable device for controlling a swinging return of the arm mechanism, and a conveyer of a carrying-out side for conveying a processed work. The conveyer and the rail of each reservoir lower portion are approximately arranged on the same face. The work is horizontally moved through this conveyer and the rail and is washed and dried by utilizing the union of each reservoir lower portion and each reservoir upper portion.

Abstract: A work washing apparatus including a transfer unit for controlling forward and rearward movements of a work, a table moved by the transfer unit, carrying out the washing of the work from upper and lower surfaces thereof and provided with water/air pipes, an upper surface washing unit provided on an upper surface of the transfer unit and having upper surface washing nozzles which make planetary movements by utilizing rational movements of the nozzles on their own axes and an orbital movement of the washing unit, side surface washing units provided on both side surfaces of the transfer unit and having side surface nozzles which make planetary movements by utilizing rotational movements of the nozzles on their own axes and an orbital movement of the upper surface washing unit, a lower washing unit provided on a lower surface of the transfer unit and having lower surface washing nozzles which make planetary movements by utilizing rotational movements of the nozzles on their own axes and an orbital movement of the

Abstract: A food washing apparatus of the invention includes an ozonized water generator (10), a cylindrical washing tank (1) in which the food materials are put and which can rotate to wash the food materials, a drainage part (4) formed at a part of the washing tank (1) and including openings to such a degree that water passes through and the food materials do not pass through, and wash water pipings (2, 9) which are inserted and disposed in the washing tank (1) in an axial direction and in which water spray holes (2a, 2a) for spraying wash water including at least ozonized water are formed, and while at least one part of the wash water sprayed from the wash water pipings (2, 9) is draind from the washing tank (1) every rotation of the washing tank (1), washing of the food materials is performed.

Abstract: A system for treating, in liquids, a mass-production parts contained in transport baskets, comprising at least one tank which contains liquid for submerging the transport baskets, at least one transport vehicle for the transport baskets by which the transport baskets can be moved over the at least one tank, at least one basket carrier which is arranged at the transport vehicle in such a way that its height is adjustable, which is able to grip a transport basket, submerge same in the tank, rotatingly drive same around an axis and lift same out of the tank, as well as a clamp for securing the basket carrier relative to the at least one tank.

Abstract: It is possible to obtain a clean high-quality circuit board by removing affected material and foreign matter produced when a hole is formed. A manufacturing method of the circuit board includes (a) preparing a film-coated board material by bonding a film material as a mask to a board material, (b) forming a hole in the film-coated board material by applying a laser beam thereto, and (c) selectively removing the unnecessary material sticking to the film-coated board material from the film-coated board material by supersonic cleaning without peeling the film material off the board material. Unnecessary material such as foreign matter is produced when the hole is formed, and the unnecessary material sticks to the board material. After removal of such unnecessary material, a conductive material is disposed in the hole, using the film material as a mask, and the film material is later removed from the board material.

Abstract: A semiconductor processing system for wafers or other semiconductor articles. The system uses an interface section at an end of the machine accessible from the clean room. A plurality of processing stations are arranged away from the clean room interface. A transfer subsystem removes wafers from supporting carriers, and positions both the wafers and carriers onto a carrousel which is used as an inventory storage. Wafers are shuttled between the inventory and processing stations by a robotic conveyor which is oriented to move toward and away from the interface end. The system processes the wafers without wafer carriers.

Abstract: A cleaning device for a shaving head of a dry shaving apparatus includes a reservoir to store a cleaning fluid, a receptacle adapted to receive the shaving head and the cleaning fluid, the receptacle being configured to direct the cleaning fluid toward the shaving head, a return conduit extending from the receptacle to the reservoir to convey the cleaning fluid from the receptacle into reservoir; and a venting device attached to the reservoir to provide aeration and deaeration of the reservoir.

Abstract: A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that different faces of the object are simultaneously cleaned. At least two gas feeding devices, having one means each for directing a gas flow onto the surface of the object to be cleaned, open into a cleaning chamber supplying a pressurized cleaning gas. At least two extraction means are connected to the outside of the cleaning chamber for discharging the gas fed to the cleaning chamber. The object can be introduced into the cleaning chamber through at least one gap. At least two ionization means are used to ionize the gas and the particles that are present in the cleaning chamber. One ionization means each is mounted between a direction means and an extraction means.

Abstract: A device for monitoring a milk tank. The device is provided with a monitoring unit comprising a computer and a memory for at least temporarily storing data, a thermometer for measuring the temperature of a fluid present in the milk tank, and for supplying to the monitoring unit a temperature signal that is indicative of the measured temperature, and with a meter for measuring an electrical parameter, such as the conductivity, of the fluid present in the milk tank and for supplying to the monitoring unit a parameter signal that is indicative of the measured electrical parameter.

Abstract: Apparatus for pressure processing components is disclosed which includes an improved closure system that minimizes dust-generating parts and allows easy access to the chamber. Ports are provided for introducing and releasing pressurized gases and fluids to and from the processing space. The heating system of the apparatus heats both the cover and the stage inside the pressurized chamber such that cycle time to equilibrate heated, pressurized fluids such as supercritical carbon dioxide inside the chamber are decreased. The apparatus includes a mechanism that raises the stage inside the chamber, pressing it against the fixed cover and sealing the inside of the pressure vessel. In one embodiment a screw-type jack is used to move the component-loaded stage fitted with a deformable o-ring seal a short travel distance to seat against the lid and seal the pressure chamber. In a related embodiment a computer and an electronic stepper motor are used to drive the pressing means in an automated fashion.

Abstract: A wafer monitoring system including a gripper operative to fixedly hold a wafer, a bottom buffering unit comprising at least one supporting element adapted to support a wafer, a top buffering unit comprising at least two supporting elements adapted to support a wafer, a first actuator operative to effect relative movement between at least two supporting elements of the top buffering unit, monitoring apparatus operative to perform processing steps on a wafer while the wafer is held fixed to the gripper, and an actuator operative to effect relative movement between the gripper and the top and bottom buffering units, the top and bottom buffering units being operative to buffer processed and unprocessed wafers thereby to enable a robot to arrive at and leave the monitoring apparatus with at least one wafer thereon.

Abstract: The present invention relates to a loading system in a washing installation comprising a plurality of dishwashers arranged essentially in parallel. The loading system comprises a dish holder to be loaded with goods to be washed, and a traveller which is adapted to convey the dish holder to a selected dishwasher, into which loading is to take place, the traveller being displaceably arranged along the dishwashers arranged in parallel. The invention also relates to a washing installation and a method therefor. The installation comprises a plurality of essentially parallel dishwashers of a straight-way type, which are essentially built into a separating wall portion to form an inlet side and an outlet side. The installation has two mutually independent loading systems for loading of goods to be washed on the inlet side and unloading of washed goods on the outlet side.

Abstract: A motor drive with devices for translating the rotary movement of an output shaft (44) into a reciprocating linear movement, preferably for driving a reciprocating transporting device (4; 5, 6). The latter comprises catches (9; 9.1, 9.2), which engage in one direction and not in the other direction, in order to transport a receptacle (16) for items for washing. The transporting device comprises an articulated transporting frame (4), of which the transporting rails (5, 6) can be moved in opposite directions to one another.

Abstract: A produce washing method, which permits the washing of produce from both above and below in the field. The produce washing takes produce along a conveyor belt, from a loading section, to a washing section on which is located a washing unit, upward along an ascending section, and from there the produce travels along a dumping section and into a receptacle. The washing unit features spray nozzles located above and below the washing section, so as to direct spray from above and below the produce so as to more effectively wash it.

Abstract: A chip handling system for integrated circuit (IC) chips each having circuitry on a first face, has a delivery station for receiving, from a first transfer device, a row and column array of chips with the first face upward, a second transfer device enabled to move chips row-by-row across the delivery station from a first side to a second side, a delivery path aligned with a row of chips at the second side of the delivery station, a first linear transfer mechanism for moving a row of chips at the second side of the delivery station into and along the delivery path, a rotary transfer device having platforms arranged around a central axis, each platform having a groove parallel to the central axis for accepting rows of chips on each platform, and a drive rotating the device in angular increments to align the grooves with the delivery path, an elongate track and a second linear transfer mechanism located at a position relative to the rotary transfer device 180 degrees from the first delivery path, for receiving r

Abstract: A microelectronic substrate handling device comprising first and second support structures spaced from each other, the first support structure having a series of upper teeth defining a series of upper notches extending along a length of the first support structure and a series of lower teeth defining a series of lower notches extending along a length of the first support structure, each of the upper and lower notches opening toward the second support structure, wherein the upper and lower notches are offset from each other by a predetermined offset distance so that an edge of a microelectronic device will fit differently within the upper and lower notches of the first support structure when supported between the first and second support structures.

Abstract: A substrate is transferred from an environment at about vacuum into a load lock through a first door. The substrate is then sealed within the load lock. The pressure within the load lock is raised to a high pressure above vacuum. A second door coupling the load lock to a high-pressure processing chamber is then opened and the substrate moved from the load lock into the high-pressure chamber. The substrate is then sealed within the high-pressure chamber. High-pressure processing, such as high pressure cleaning or high pressure deposition, is then performed on the substrate within the high-pressure chamber. Subsequently, the second door is opened and the substrate transferred into the load lock. The substrate is then sealed within the load lock. The pressure within the load lock is lowered to about vacuum and the first door opened. The substrate is then removed from the load lock into the environment.

Abstract: A decontamination system for victims of chemical, biological, radiological, or other harmful exposure. The system effectively isolates a contaminated patient during a gross washing process and provides the highest level of protection to unit operators that may be dressed in street clothes. The system comprises an isolation apparatus, a washing chamber, an output enclosure, a method of passing a non-ambulatory patient through the system and a waste collection system. The parts of the system may function together as a single, integral unit for mass decontamination at the site of exposure. Further, the system may be used for non-ambulatory and ambulatory humans and/or animals and possibly equipment and other objects.

Abstract: A heat sterilization process for small, washed, and bagged articles such as vial stoppers includes a conditioning or air removal phase prior to sterilization. During the air removal phase, a substantial majority of the liquid moisture is removed from the bagged articles by introducing brief periods of dry, warm air to the autoclave chamber. The air is introduced in short bursts at the point of greatest vacuum while pressure pulsing the chamber during the air removal phase. The air is heated and injected into the chamber through a supply valve which is rapidly opened and closed while the chamber is maintained within a preselected vacuum range between the pressure pulses. The result is a greatly reduced time for a complete sterilization and drying process.

Abstract: A plant for the continuous washing of plastic material in scales. The plant having a washing apparatus, at least one filtering unit connected to the apparatus for purifying the washing fluid and means for varying the time the scales remain in the washing apparatus as a function of the quantity of scales contained at that same moment in the same apparatus.

Abstract: A dishwasher which move a rack up and down by a simple structure. The rack is rotatably mounted to a frame by a plurality of rotary members and upper and lower hinge shafts. The frame is provided in a cavity to be moved forward and backward. A plurality of extension pieces upwardly extend from both sides of the frame. A stopper is provided on each of the extension pieces. Each of the rotary members is stopped by the stopper so that the rotary member is not forwardly rotated beyond a predetermined distance. A damper is mounted to an outer surface of each lower hinge shaft so that the rack is slowly moved toward the frame during a downward movement of the rack. A handle is provided at an upper portion of the rack so that both ends of the handle are rotatably mounted to both sides of the rack, thus allowing the rack to be easily moved upward.

Abstract: The invention relates to a device for separating substances by means of countercurrent washing, having a container with a first end region, at which a first inlet orifice for the ingress of a substance mixture and a first outlet orifice for the egress of a substance component to be separated from the substance mixture and of a washing fluid are provided, with a second end region which is located axially opposite the first end region and at which a second inlet orifice for the ingress of the washing fluid and a second outlet orifice for the egress of a further substance component of the substance mixture and of the washing fluid are provided, and with a displacement region which is provided between the first end region and the second end region, the displacement region merging into the second end region by a transitional cross section.

Abstract: The present invention provides a substrate processing method and apparatus which can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method including: carrying out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments; and then electroless plating a metal film on the catalyst-imparted surface of the substrate, wherein the cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.

Abstract: A system for processing wafers is disclosed. In the invention, a tank contains a processing liquid. A movable submersion mechanism is positioned to move in and out of the tank. Wafer holders in the submersion mechanism have an unequal spacing within the submersion mechanism.

Abstract: A cleaning container and method for using the same for chemically cleaning elongated members including quartz thermocouple sleeves including a first body member and a second body member said first body member and second body member respectively forming a first containing space and a second containing space including a first means for reversibly compressively sealing the first body member and the second body member to a form a combined containing space for sealably holding a cleaning solution level; a cap member disposed at a distal end of the first body member said cap member including a second means for reversibly compressively sealing a first opening in communication with the first containing space; and, a second opening centrally disposed in a distal end of the second containing space said second opening including a third means for reversibly compressively sealing around at least one elongated member penetrating through said second opening.

Abstract: In a system for the surface treatment of strips passing continuously through the system, in which the strip passes through a tank filled with the treatment liquid and closed by a cover, the bottom of the tank is designed as a trough in the transverse direction with an essentially horizontal central section and slanting sections descending from the center toward both sides.

Abstract: A load sensing system for maximizing the cleaning efficiency of particulate raw materials such as sand, gravel, rock, ores, etc. in a log washer by sensing the weight of the aggregate in the log washer tank and adjusting the angle of inclination of the tank for cleaning efficiency. The system includes a log washer tank pivoted at its lower end and supported by hydraulic cylinders at its upper end. A high/low pressure sensor detects changes in the weight of the load by changes in hydraulic fluid pressure, and raises or lowers the upper end of the tank when low or high pressure limits are exceeded through solenoid activated hydraulic valves.

Abstract: A substrate cleaning apparatus includes a bath in the form of a vessel filled with a cleaning liquid, a substrate guide disposed on the bottom of the vessel and configured to support at least one substrate vertically, a first sensing unit for sensing the substrate(s) supported by the guide, and a second sensing unit for sensing substrates or remnants thereof disposed on the bottom of the vessel. The first sensing unit has sensor elements installed on the opposite sides of the vessel as situated across from one another. The second sensing unit has sensor elements installed on both sides and on the bottom of the vessel for detecting substrates or remnants from damaged substrates lying on the bottom of the process chamber.

Abstract: A substrate cleaning apparatus and method for a liquid crystal display panel capable of removing foreign substances attached to the lower and upper surfaces of a substrate as well as onto the side surface thereof. The apparatus includes upper and lower cleaning modules arranged in such a manner as to contact the upper and lower surfaces of the substrate. Also, a side-cleaning module is arranged at the side surfaces of the substrate.

Abstract: A combination of parallel processes to provide optimal re-mediation operations for contaminated soil. Soils with high levels of heavy petroleum hydrocarbons are directed to a thermal process for destruction in a combustion process. Carbon dioxide generated and recovered in the thermal process is employed as a solvent in a solvent process to clean other soils of petroleum hydrocarbons and certain chlorinated hydrocarbon compounds. In the solvent process, contaminated soils are run through a closed soil separator where the soils are washed with carbon dioxide. The carbon dioxide is then dried from the soil and the soil is sent for segregation. Soils with the lightest forms of hydrocarbon contamination (gasoline, etc.) are subjected to a vaporization process utilizing heat energy generated in the thermal process to heat the soil, under a partial vacuum, and the vapors generated are captured, condensed, and recovered as product.

Abstract: An apparatus for cleaning a wafer includes a plurality of holders for contacting and securing peripheral portions of a wafer, and for rotating the wafer, a first plate disposed to face a first surface of the wafer, the first plate having a plurality of first nozzles for spraying a first cleaning solution onto the first surface of the wafer, and a second plate disposed to face a second surface of the wafer that is opposite to the first surface, the second plate having a plurality of second nozzles for spraying a second cleaning solution onto the second surface of the wafer. In operation, the first and second plates and the wafer are rotated in opposite directions. The opposite rotation causes the cleaning solutions to flow abruptly thereby increasing a frictional force between the surfaces on the wafer and the cleaning solutions to improve the efficiency of the cleaning process.

Abstract: A method and apparatus for drying a disk-shaped substrate. The substrate is typically a substrate used for the manufacture of magnetic disks, and has a centrally located opening. The substrate is lowered into a liquid bath by a first holder, which also becomes immersed in the bath. The first holder lifts the substrate until the substrate extends partially out of contact with the liquid. A second, dry holder grabs a dry portion of the substrate that extends out of the bath, and continues to lift the substrate out of contact with the liquid.

Abstract: An apparatus for treating a wafer preferably includes a rotating chuck for rotating the wafer and a treating fluid supplying part for supplying the wafer with one or more treating fluids. The treating fluid(s) can be used to clean and/or dry the wafer. The treating fluid supplying part preferably includes a receiving portion for receiving a treating fluid, and a slit communicating with the receiving portion for applying the treating fluid to a surface of the wafer. An ultrasonic oscillating part can be installed in the receiving portion and can apply ultrasonic oscillation to the treating fluid. The treating fluid for applying the ultrasonic oscillation is preferably provided uniformly across the treated surface of the wafer. The effectiveness of the cleaning process can thereby be improved, and damage to patterns formed on the wafer can be reduced.

Abstract: An apparatus for forming a loop in a filament comprising a first wall having a first guide slot formed therein and a second wall having a second guide slot formed therein coplanar and parallel to the first guide slot. The first wall is opposite the second wall and each of the guide slots has opposing ends. A first gripper holds a filament at a first location. The first gripper is mounted from the first wall to the second wall at an end of each of the first guide slot and the second guide slot. The apparatus also includes a movable gripper to hold the filament at a second location. The movable gripper has a separation from the first gripper and is mounted from the first wall to the second wall adjacent to the other end of each of the first guide slot and the second guide slot for movement towards the first gripper to reduce the separation between them. This produces a loop of filament between the first gripper and the moveable gripper.

Abstract: This invention relates to a cleaning and sterilizing machine for small articles such as closure elements for pharmaceutical containers consisting of a treatment tank (1) which is supported by a horizontal shaft (3) in a carrier (2) and is mounted so it can rotate about the axis of the shaft (3) and has a funnel-shaped upper part (6) with a loading and unloading opening (8) arranged in it, said treatment tank being closeable by a valve (7) and having inlet and outlet lines (13, 14) for at least one treatment medium such as water, steam or compressed air connected to it and supported by the shaft (3).

Abstract: The system for cleaning items by using washing baskets (7) comprises a stripping station (A), a tunnel washer (2) and, on the clean side, a station (B) for storing and unpacking items from the washing baskets, as well as a washing basket return equipment comprising two separate return conveyors (8, 9), one (9) arranged above and the other (8) arranged underneath a table (10) in station (B) and leading back to the top of the stripping station (A). The clean baskets (7) are manually put onto the conveyors (8, 9) in station (B) and manually discharged from the conveyors (8, 9) in station (A) for reuse.

Abstract: A produce washing method, which permits the washing of produce from both above and below in the field. Produce is transported along a conveyor belt, from a loading section, to a washing section on which is located a washing unit, upward along an ascending section, and from there the produce travels along a dumping section and into a receptacle. The washing unit features spray nozzles located above and below the washing section, so as to direct spray from above and below the produce so as to more effectively wash it.

Abstract: An apparatus and a method for drying washed objects being capable of drying the objects in a reduced period of time, effectively preventing contamination of the objects, and preventing energy loss are provided. The apparatus for drying washed objects includes a drying tank having an opening on the upper portion thereof so that the washed objects can be placed or taken out from above, and a rinsing tank formed integrally with the drying tank, and is capable of being sealed hermetically by closing the openable and closable lid. The drying tank includes a mist-straightening vane for supplying organic solvent mist at normal temperatures to the washed objects, so that the washed objects are dried by organic solvent mist emitted from the mist-straightening vane.

Abstract: A cleaning apparatus 1 includes a foup loading/unloading part 2 for mounting foups F each accommodating a plurality of wafers W at intervals of a constant pitch (normal pitch), a rotor 34 capable of holding the wafers W at half the normal pitch (half pitch), a wafer transporting device 11 for transporting the wafer E between the foup F and the rotor 34, wafer posture changing devices 20a, 20b, a wafer elevating mechanism 40, a motor 31 for rotating the rotor 34, an outer chamber 71a and an inner chamber 71b both accommodating the rotor 34, and cleaning liquid nozzles 53, 55 for supplying a cleaning liquid to the wafers W. The rotor 34 holds the wafers W at intervals of an optional pitch (every one holding pitch or every plural holding pitches) to carry out a cleaning operation. Consequently, it is possible to process substrates accommodated in two containers at one batch processing.

Abstract: A system for treating, in liquids, a mass-production parts contained in transport baskets, comprising at least one tank which contains liquid for submerging the transport baskets, at least one transport vehicle for the transport baskets, by means of which transport vehicle the transport baskets can be moved over the at least one tank, at least one basket carrier which is arranged at the transport vehicle in such a way that its height is adjustable, which is able to grip a transport basket, submerge same in the tank, rotatingly drive same around an axis and lift same out of the tank, as well as a clamp for securing the basket carrier relative to the at least one tank.

Abstract: In a post chemical-mechanical polishing (CMP) procedure for cleaning a workpiece, a cleaning solution is delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the workpiece. The cleaning solution is uniformly applied to the workpiece. The volumes of solutions used in the scrubbing process is reduced. A thin oxide layer is etched. A hydrophilic surface state is maintained. The workpiece is then rinsed and dried in a centrifugal processing between upper and lower rotors. A high level clean is achieved while consumption of rinsing and drying fluids is reduced.

Abstract: An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Abstract: An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Abstract: A microelectronic substrate handling device comprising first and second support structures spaced from each other, the first support structure having a series of upper teeth defining a series of upper notches extending along a length of the first support structure and a series of lower teeth defining a series of lower notches extending along a length of the first support structure, each of the upper and lower notches opening toward the second support structure, wherein the upper and lower notches are offset from each other by a predetermined offset distance so that an edge of a microelectronic device will fit differently within the upper and lower notches of the first support structure when supported between the first and second support structures.