Abstract: An apparatus for positioning, handling and conveying structural parts for a surface finishing of the parts comprises frames arranged successively in a conveying direction, hooks carried by the frames for hanging the structural parts, and devices for maintaining successive ones of the frames in the conveying direction so close to each other that the structural parts hanging on the hooks are locked in position by the successive frames.

Abstract: A buffer station for an article handling system, the handling system having a general path along which it moves when handling the article, the buffer station including at least two supporting assemblies including supporting elements forming a supporting plane each capable of supporting an article within the supporting plane and located so as to support the article within the general path, at least two receptacles for liquid in which the at least two supporting assemblies are disposed, and at least two drivers associated with the at least two supporting assemblies and the receptacles for shifting them in and out of the general path.

Abstract: A workpiece handling and processing system has a interface section for loading wafers from cassettes into carriers. The wafers are lifted out of cassettes by a buffer elevator and moved into a position over an open carrier by a buffer robot. A comb elevator lifts combs entirely through the open cassette, to transfer the wafers from the buffer robot into the carrier. A process robot moves loaded carriers from the interface section to one or more process chambers in a process section. The advantages of processing wafers within a carrier are achieved within a compact space and with high throughput.

Abstract: A washing device (10) includes a chamber (12) with a front door (24). The door is pivotable between a vertical closed position and a horizontal open position. An article carrying assembly (34) is moveable from inside the washing device to an upper surface (26) of the open door. A lifting system (72) moves the front door between lower and upper positions (74, 76). The lifting system includes a follower (154) to which the front door is pivotally mounted. A motor (80) transmits power to a pair of chains (110, 116), which drive the follower along a guide (156) to move the door up and down. Alternatively, the lifting system includes a cable (182) coupled to a fluid cylinder (180). When the door is in the upper position, an operator can move the rack to a transfer cart or load and unload the article carrying assembly, all while in a substantially erect position.

Abstract: A system for processing a workpiece includes an inner chamber pivotably supported within an outer chamber. The inner chamber has an opening to allow liquid to drain out. A motor pivots the inner chamber to bring the opening at or below the level of liquid in the inner chamber. As the inner chamber turns, liquid drains out. Workpieces within the inner chamber are supported on a holder or a rotor, which may be fixed or rotating. Multi processes may be performed within the inner chamber, reducing the need to move the workpieces between various apparatus and reducing risk of contamination.

Abstract: The object of this invention is to provide a semiconductor wafer cleaning apparatus designed to clean several wafers at the same time while rotating the wafers held in a horizontal, laid-down position. In an operation of this apparatus, a wafer feeding robot arm 20 feeds wafers 60 from a wafer cassette 10 to a wafer boat 50 and seats the wafers in the wafer boat while maintaining a horizontal, laid-down position of the wafers. The wafer boat 50, with the horizontally laid-down wafers 60, is vertically moved downward by a boat drive unit 40 to be immersed in a wafer cleaning liquid flowing in a wafer cleaning bath 30. Thereafter, the boat 50 is rotated within the wafer cleaning liquid, and so the wafers 60 are washed and cleaned by the wafer cleaning liquid while being maintained in the horizontal, laid-down position and being rotated horizontally.

Abstract: There is provided a cleaning device capable of preventing a metal wiring layer or the like of an object to be treated, from being oxidized. The cleaning device comprises: a cleaning container 72 having a treating space S having a slightly larger volume than that of an object W to be treated; a fluid storage tank 30 for storing a cleaning fluid 32 for treating the object; supply lines 46A through 46D for supplying the cleaning fluid from the fluid storage tank to the cleaning container; and reflux lines 47A through 47D for returning the cleaning fluid from the cleaning container to the fluid storage tank, wherein the cleaning container, the fluid storage tank, the supply lines and the reflux lines are associated with each other for forming closed cleaning fluid circulating lines 51A through 51D. Thus, it is possible to prevent the metal wiring layer or the like of the object from being oxidized.

Abstract: The object of this invention is to provide a semiconductor wafer cleaning apparatus designed to clean several ten wafers at the same time while rotating the wafers held in a horizontal, laid-down position. In an operation of this apparatus, a wafer feeding robot arm 20 feeds wafers 60 from a wafer cassette 10 to a wafer boat 50 and seats the wafers in the wafer boat while maintaining a horizontal, laid-down position of the wafers. The wafer boat 50, with the horizontally laid-down wafers 60, is vertically moved downward by a boat drive unit 40 to be immersed in a wafer cleaning liquid flowing in a wafer cleaning bath 30. Thereafter, the boat 50 is rotated within the wafer cleaning liquid, and so the wafers 60 are washed and cleaned by the wafer cleaning liquid while being maintained in the horizontal, laid-down position and being rotated horizontally.

Abstract: A bowl includes a bottom wall having a generally circular shape. A sidewall extends upwardly from the bottom wall to define a cylindrical chamber. The sidewall has a projection that extends into the cylindrical chamber. The projection has a top surface that defines a step in the cylindrical chamber and a sloped surface that extends between the top surface and an inner surface of the sidewall. The top surface of the projection is sloped slightly downwardly. The sloped surface of the projection is oriented relative to the top surface such that extensions of the top surface and the sloped surface define an angle in a range from about 30 degrees to about 45 degrees. A spin, rinse, and dry module including the bowl and a method for loading a semiconductor wafer into a spin, rinse, and dry module also are described.

Abstract: A sterilization tunnel for pharmaceutical containers such as vials has an inlet zone, a sterilization zone, and a cooling zone. A conveyor belt for the vials is disposed inside the sterilization tunnel. An emptying device that can be raised and lowered is disposed in the vicinity of the cooling zone. In order to empty the sterilization tunnel, the frame-shaped emptying device is lowered onto the conveyor belt and then pushes an emptying slider, which is being moved through the sterilization tunnel together with the last vials disposed on the conveyor belt, out from the sterilization tunnel. The emptying device permits a particularly simple operation of the sterilization tunnel.

Abstract: There is provided a system in which transportation, assembly and maintenance can be easily carried out. The system comprises: a case carrying unit for carrying in/out a case accommodating therein the substrate; a liquid-processing unit and the processing liquid being supplied to process the substrate with the processing liquid; a substrate conveying unit for conveying the substrate between the case carrying unit and the liquid-processing unit; a processing liquid storing unit for storing, feeding and recovering the processing liquid which is supplied to the liquid-processing unit; and a plurality of frames each supporting one or more of the case carrying unit, the liquid-processing unit, the substrate conveying unit and the processing liquid storing unit, wherein the at least two of the plurality of frames are capable of being connected to and separated from each other.

Abstract: A grit washer is disclosed having a bearing assembly which supports a conveyor and which is removably mounted to the exterior of the grit washer tank. With the bearing assembly being mounted to the exterior of the tank, the bearing assembly is easily accessible without the need to drain the tank or lift the screw conveyor out of the tank. The bearing assembly can therefore be easily inspected, repaired and/or replaced as necessary. The external placement of the bearing assembly also isolates the bearing assembly from the abrasive grit in the tank thereby minimizing the damage to the bearing assembly caused by the grit.

Abstract: A cleaning processing apparatus, which is one embodiment of a liquid processing apparatus for performing a liquid processing by supplying a predetermined process liquid to a target object to be processed such as a semiconductor wafer while rotating the target object, comprises a rotor for holding wafers W, a slidable process section for housing the rotor, and a cleaning liquid spurting nozzle for supplying a predetermined cleaning liquid to the wafers W. A housing for housing the slidable process section is of a hermetic structure so as to be substantially shielded from the outside.

Abstract: A reticle cleaning apparatus that utilizes an ultraviolet light source in an oxygen-containing environment to cleanse organic contaminants from a reticle. The reticle cleaning apparatus of the present invention enables the storage of multiple reticles for use in a lithography tool in an environment which contains organic contaminants. A stored reticle is translated to a reticle cleaning station within the lithography tool in order to cleanse the reticle of organic contaminants. This cleaning can be performed while the projection optics of the tool exposes a wafer using another reticle previously cleaned by the reticle cleaning apparatus. Upon completion of the reticle cleaning process, the reticle is immediately translated to the exposure path of the lithography tool. The reticle cleaning process is performed during normal operation of the lithography tool at room temperature, atmospheric pressure and in an oxygen-containing environment.

Abstract: The disclosure of this application relates to a new and innovative method and apparatus for removing a variety of contaminants from soil, sediment, fine sand and clay. The disclosure describes an apparatus in which contaminated material that is comprised of particles having a size less than about 5 mm in diameter are injected into a zone of discharge from one or a number of nozzles. These nozzles are positioned to discharge liquid or cleaning fluid at a pressure from about 2000 psi to about 20,000 psi. The cleaned material is then collected and separated into liquid and solid phases. The solids, when cleaned by the use of this apparatus, can then be returned to the site without danger of contamination of the surrounding area and no disposal costs are incurred for disposition of contaminated soil.

Abstract: A scarf flushing apparatus for cleaning the inside of tubes. The apparatus comprises a continuous and uninterrupted fluid flow system. The system comprises a transfer mechanism communicating with a flow control mechanism to direct flow through a nozzle to clean each tube being indexed therethrough and to redirect flow through a bypass line and into a reservoir during the indexing sequence. A pressure gauge and regulating valve communicate with the continuous fluid flow system so as to maintain substantially constant pressure throughout the fluid flow system during the cycling process.

Abstract: An inverted pressure vessel system for conducting automated industrial processes requiring elevated pressure and temperatures has a vertically movable pedestal for opening and closing the underside loading port, with pedestal drive system and locking mechanism located below the pedestal top and isolated from the chamber opening. The chamber is connectible to a pressure control and process fluid supply system, and has heat exchangers connected to an external source for temperature control. Process fluids are distributed across a central process cavity through divergent inflow and convergent outflow process fluid channels.

Abstract: An apparatus and method for washing a plurality of cored lettuce heads as they are harvested in the field is disclosed. The apparatus incorporates a multi-segment hinged conveyer forming a loop, at least one support platform having an opening, at least one lettuce head guide connected to the support platform and an aqueous solution spraying system. Workers harvest lettuce heads, core the lettuce heads and then place them on the lettuce head guides which are moving along the conveyer. The lettuce heads are conveyed to an aqueous solution spraying system which washes the cored areas of the lettuce heads. The lettuce heads are then removed from the conveyer into a produce bin.

Abstract: An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay. A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically movable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.

Abstract: An apparatus for wet cleaning or etching of flat substrates comprising a tank with an inlet opening and outlet opening for said substrates. Said tank contains a cleaning liquid and is installed in a gaseous environment. At least one of the openings is a slice in a sidewall of the tank and is present below the liquid-surface. In the tank there may be a portion above the liquid filled with a gas with a pressure being lower than the pressure within said environment. The method comprises the step of transferring a substrate through the cleaning or etching liquid at a level underneath the surface of said liquid making use of said apparatus.

Abstract: A washing/drying process apparatus comprises a spin chuck for holding a substrate such that a surface thereof to be processed faces upward and for rotating the substrate, a process fluid supply mechanism for selectively supplying one or two or more of a plurality of kinds of process fluids to the surface to be processed of the substrate rotated by the spin chuck, the process fluid supply mechanism having a first nozzle with a discharge port for discharging a process fluid which is in a liquid phase under conditions of room temperature and atmospheric pressure, and a second nozzle with a discharge port for discharging fluid which is in a gas phase under conditions of room temperature and atmospheric pressure, a driving mechanism for simultaneously moving the first and second nozzles to a location above the substrate held by the spin chuck, and a controller for controlling operations of the process liquid supply mechanism and the driving mechanism.

Abstract: The present inventions provides a processing apparatus to enable a plurality of processing sections to be installed in a smaller space. The apparatus has a plurality of processing sections arranged at up-down two stages and supplies a material from a processing section situated at one end of either one of an upper or a lower stage. The material is processed at the processing section at one of the upper stage or lower stage and then processed at the other processing section. And it is processed at the processing section situated at one end of the other and collected.

Abstract: A method for washing cored heads of lettuce includes placing such heads in a position with their cored holes facing downwardly toward an upwardly-directed spray of an aqueous solution, directing such a spray into, and washing the holes, then pushing the heads from that position onto a conveyor.

Abstract: According to the present invention, there is provided a substrate conveying device and method for loading/unloading a substrate to/from a processing section, including an arm for holding the substrate, an arm drive mechanism for driving the arm such as to load/unload the substrate to/from the processing section, a first suction pad provided on the arm, for suctioning the substrate, a second suction pad provided on the arm at a position adjacent to that of the first suction pad, for suctioning the substrate, and a projecting member provided between the first and second suction pads of the arm, so as to control a posture of the substrate to be suctioned one of the first and second suction pads as the projecting member abuts the lower surface of the substrate.

Abstract: A drying unit is disposed above a cleaning tank containing a cleaning liquid for cleaning semiconductor wafers W. A wafer boat holding semiconductor wafers moves between the cleaning tank and the drying unit. The drying unit has a fixed base surrounding an opening formed in the cleaning tank, a liftable top cover placed on the fixed base, and an O ring interposed between the fixed base and the liftable top cover. The liftable top cover can be moved vertically by a first lifting means.

Abstract: A cleaning mechanism for mold devices includes one or more rails for slidably supporting a slide. An actuator is coupled to the slide for moving the slide along the rails. The slide may be releasably coupled to the actuator by a latch. A heating device is disposed on the slide for supporting and for heating the mold devices. One or more nozzles are disposed in the housing for supplying water or cleaning agent or pressurized air into the housing and for cleaning the mold devices. A rotating device may further be used for rotating the nozzles.

Abstract: A sink side dishwasher is designed to use the same faucet of the water sink as its water source. It comprises an oscillating spray arm equipped with improved nozzles, an improved soap dispenser, a specially designed dish rack, and a specially designed washing house to cooperate with the unique structure of the dishwasher and other components to achieve of manufacturing an useful and operative dishwasher.

Abstract: An industrial part washer is disclosed having a washer housing with an upper chamber, a lower chamber, and a fluid passageway connecting the chambers together. A fluid drain is connected to a lower chamber for draining fluid from it while a pump pumps a cleaning fluid into the upper chamber. A flood valve is positioned in the fluid passageway between the upper and lower chambers and this valve is movable between an open and a closed position. Parts are sequentially moved into a position adjacent the washer housing and are selectively loaded into the lower chamber, washed and, following completion of a wash cycle, subsequently unloaded from the lower chamber. A valve control closes the flood valve during the loading and unloading operations of the part into the lower chamber so that, during the loading and unloading portions of the wash cycle, the upper chamber at least partially and preferably completely fills with the cleaning fluid.

Abstract: A drying unit is disposed above a cleaning tank containing a cleaning liquid for cleaning semiconductor wafers W. A wafer boat holding semiconductor wafers moves between the cleaning tank and the drying unit. The drying unit has a fixed base surrounding an opening formed in the cleaning tank, a liftable top cover placed on the fixed base, and an O-ring interposed between the fixed base and the liftable top cover. The liftable top cover can be moved vertically by a first lifting means.

Abstract: A compact chain belt-type conveyor for conveying articles along a non-linear path through an industrial washer and drier. The chain belt-type conveyor provides an article sensing means wherein the sensing means is responsive to the presence of an article at a predetermined station along a predetermined non-linear path. A signalling means, responsive to the sensing means, signals a driving means to stop the conveyor when an article is present at the predetermined station for a predetermined amount of time and starts when an article is absent from the predetermined station. The signalling means ensures that each article will only be placed through one washing and drying cycle. An article holding means may be provided to secure the articles along the conveyor and provide proper orientation of the articles through the washing and drying process. A chain mesh construction conveyor may also be utilized to support and carry articles without the use of the article holding means.

Abstract: According to the present invention, there is provided a substrate conveying device for loading/unloading a substrate to/from a processing section, including an arm for holding the substrate, an arm drive mechanism for driving the arm such as to load/unload the substrate to/from the processing section, a first suction pad provided on the arm, for suctioning the substrate, a second suction pad provided on the arm at a position adjacent to that of the first suction pad, for suctioning the substrate, and a projecting member provided between the first and second suction pads of the arm, so as to control a posture of the substrate to be suctioned one of the first and second suction pads as the projecting member abuts the lower surface of the substrate.

Abstract: In order to reuse dishes, cutlery, glassware and other food service utensils onboard an aircraft, a washing apparatus is provided as a part of the food service system onboard the aircraft. The apparatus includes a service trolley and a washing unit that may be coupled together to form a washing chamber within the trolley. The washing unit is installed within a trolley parking bay in a galley of the aircraft and is connected to a water supply and a power supply. The trolley is equipped with racks for receiving the dirty utensils, and the washing unit is equipped with water spray arms that reach into the trolley into clearance spaces between the racks. The dirty utensils are collected from passengers directly into the service trolley, which is then wheeled into position in the trolley parking bay, and coupled to the washing unit. Thereby, the utensils may be collected, cleaned, stored, and reused, with only minimal handling, cost, and space requirements.

Abstract: A substrate transporting and processing system generally comprises: a supply section of a carrier 1 for housing therein wafers W to be processed, in a horizontal state; a discharge section of the carrier 1; a wafer unloading arm 14 for unloading the wafers W from said carrier 1; a wafer loading arm 16 for loading the wafers W into the carrier 1; an attitude changing unit 40 for changing the attitude of the wafers W between a horizontal state and a vertical state; a processing section 3 for suitably processing the wafers W; and a wafer transport arm 56 for delivering the wafers W between the attitude changing unit 40 and the processing section 3 and for transporting the wafers W into and from the processing section.

Abstract: A method for washing a cored head of lettuce includes placing the head in a position such that the cored hole faces downwardly, spraying an aqueous solution upwardly into the cored hole for a time and at a pressure sufficient to wash the hole, and then propelling the cored washed lettuce head upwardly from the washing position onto a conveyor for the lettuce head with minimal damage to that head.

Abstract: The present invention provides an improved method for scouring wool. The method comprises differential heating of grease contaminants in the unscoured wool to at least partially liquefy the grease, absorbing the grease by the addition of a grease-absorbing material, and separating the grease-absorbing material from the wool. The method of the invention involves substantially less water consumption than current methods and is a more efficient means of producing wool.

Abstract: Apparatus and method are provided for improved washing and drying of semiconductor wafers utilizing an enhanced "Marangoni effect" flow of liquid off of the wafers for superior prevention of watermarks (water spots) on integrated circuits (ICs) on the wafers. The apparatus includes a housing 12 which may be hermetically sealed, an open-top wash tank 60 within a lower part of the housing, a moveable rack 16 for holding the wafers either in the tank for washing or in an upper part of the housing for drying, apparatus 34 for supplying chilled (near freezing) de-ionized water (DIW) to a lower part of the tank, the DIW flowing within the tank and overflowing the top thereof, a pump 20 for draining overflowing DIW from the housing, and apparatus 40 for supplying to the housing organic vapor such as isopropyl alcohol (IPA) in a dry gas such as nitrogen. During wafer drying operation of the apparatus the pressure within the housing is kept at about one Torr or less.

Abstract: Apparatus for removing a ceramic core from a casting in a relatively rapid manner wherein the casting and a fluid spray nozzle are disposed in a manner to expose a region of the core to a core dissolving fluid discharge of the nozzle and a core dissolving fluid is discharged from the nozzle toward the core region to contact the core region and dissolve core material therefrom and progressively from further regions of the core within the casting as they become exposed as core material is progressively removed. The discharge of fluid from the nozzle can be interrupted periodically to allow dissolved core material and fluid to drain from inside the casting or, alternately, the casting and nozzle can be relatively moved so that the casting can drain and/or forced air can be directed at the casting to this same end at a location spaced apart form the nozzle.

Abstract: Disclosed is a warewashing assembly comprising a batch-loading warewashing machine and a movable tray or cart capable of holding a rack in a position that departs form the horizontal outside of the warewashing machine for convenient operations; said tray or cart comprising a flat tray of a size complementary to said rack, wherein the flat tray comprises side and rear fences capable of holding the ware rack against horizontal motion and wherein the tray is attached to a support structure in such a way that it is supported at the desired angle .alpha. and can be inserted into the machine when quiescent; wherein the support structure is of a height approximately equal to that of the warewashing machine and comprises means to move horizontally in relation to the warewashing machine.

Abstract: An agitator of washing machine has a washing shaft installed on a lower portion of a washing tub and extending upward to a bottom of the washing tub to be installed rotatively. A driving cam is installed on the washing shaft to rotate integrally with the washing shaft. A driven cam is installed around the washing shaft and contacts a surface of the driving cam to be driven by rotation of the driving cam. A moving bar of which one end contacts an outer surface of the driven cam and the other end extends upward into the washing tub through a hole formed on the bottom of the washing tub is provided such that the other end of the moving bar moves rotatively in the washing tub by rotation of the driven cam. A plate for forming rotating water flows which is formed in the other end of the moving bar moves rotatively integrally with the moving bar, thereby forming the rotating water flow flows in the washing tub. And, an elastic means tightly pushes the one end of the moving bar onto the surface of the driven cam.

Abstract: Two vats are arranged vertically within an occupied area for a single vat, and any of the upper and lower vats can implement washing works at the same time. The upper and lower vats are used simultaneously according to the object of washing, enabling the apparatus to implement quick washing works of articles to be washed within the compact space. An upper vat (15) capable of containing the articles (12) is formed above the lower vat (10) capable of containing the articles (12). A loading and unloading space (14) for articles (12) is formed between the upper and lower vats (15), (10). This apparatus is formed with a lower vertical mover (19) for loading and unloading the articles (12) in and out of the lower vat (10) and an upper vertical mover (18) for loading and unloading the articles (12) in and out of the upper vat (15). The articles (12) are contained in the upper and lower vats (15), (10) at the same time, thereby enabling the apparatus to implement washing related works at the same time.

Abstract: A device for cleaning surfaces which are soiled in the food industry with grease, starch or protein residues including: a housing body having a first inlet for feeding pressurized water; a propulsion jet positioned behind the inlet and in a direction of flow; a collection jet positioned behind the propulsion jet which is flow connected with a second inlet for feeding a chlorine-free alkaline foam cleaning agent and a third inlet for feeding a hydrogen peroxide solution; and a turbulence chamber into which an elongated jet body of the collection jet extends, the turbulence chamber fitted with a chamber inlet for feeding compressed air into the chamber such that a hydrogen peroxide foam is formed from a solution formed upon dosing an effective amount of the hydrogen peroxide solution into the chlorine-free alkaline foam cleaner at a maximum of 60 seconds prior to contact of the hydrogen peroxide foam with a surface to be cleaned, the turbulence chamber further having a chamber outlet through which the hydrogen

Abstract: Apparatus for cleaning disks during processing. The apparatus is used with a disk processing system having a conveyor belt for transporting a disk carrier containing disks. The conveyor belt and the disk carrier have openings therein. A cleaning station is disposed above the conveyor belt and has an opening therein that isolates the cleaning station from the processing system. The cleaning station has a recirculating blower system, a laminar flow screen, a HEPA filter, and a ducting system for recirculating purified air or inert gas. A carbon dioxide jet spray cleaning system is provided that has a plurality of sets of jet spray nozzles disposed in the cleaning station that are coupled by way of manifolds to a liquid carbon dioxide tank that supplies liquid carbon dioxide to the nozzles.

Abstract: A washing machine with sub-pulsators is disclosed. A pulsator for generating vortical water flow is installed at a bottom of a washing tub, and many sub-pulsators are mounted on an inner side wall of the washing tub. Many ducts for forming passages in a vertical direction are provided in the side wall of the washing tub. When the pulsator is rotated, washing water flows in the ducts by the centrifugal force thereof and moves up along the ducts. The sub-pulsator is rotated by the washing water flowing in the ducts. Thus, a complex water flow is generated by the pulsator and the sub-pulsator, so the washing effect is improved and the twisting and tangling of the laundry is diminished.

Abstract: An automated golf ball washer is provided with an integral agitation ball delivery means that is driven from the same power source that performs the golf ball cleaning function. The shaft that drives the washing mechanism has a cam thereon, that drives a reciprocating rod into the box holding the golf balls to be washed. The reciprocating action of the rod forces any balls jammed in the box to become dislodged, thereby encouraging a continuous feed of golf balls to the washing device.

Abstract: Method and apparatus for removing ceramic shell mold material from one or more castings in a relatively rapid manner wherein the casting and hot caustic solution spray nozzles are relatively moved to direct hot caustic solution under pressure at the castings to remove post-knock-out ceramic shell material thereon prior to further processing of the castings.

Abstract: An ultrasonic immersion cleaning tank is constructed to serve as a pass-through between a processing environment and a clean room. The tank is sited as the entryway into a bounded clean room. Particle barriers and positive pressure are utilized to reduce entry of contaminants into the clean room. The components after cleaning are withdrawn from the tank directly into the clean room environment thereby greatly reducing surface contamination thereof.

Abstract: A prewasher for sorting and soaking golf balls prior to entry into a ball washer has a tub for receiving the balls, a standpipe in the tub through which a stream of water moves the balls up out of the tub to deposit them in a track that carries only round balls to the ball washer. Broken balls and/or stones drop through openings in the track and are not delivered to the ball washer.

Abstract: A system for cleaning totes is disclosed in which each tote has a fill opening at its top and a dispensing valve, both of which are open to an interior chamber of the tote. The system includes a conveyor line having a receiving end and a discharge end and which is adapted to transport the totes from the receiving and to the discharge end. At a first station along the conveyor, the tote is initially drained of any remaining fluid within its interior and the tote is then moved to a second station. At the second station, a wash solution is cycled through the tote in order to clean the interior of the tote. The wash solution is recycled and appropriate fillers are used to remove the impurities from the wash solution. The tote then progressively moves through three rinse stations along the conveyor line in which each rinse station includes a lid attachable to the fill opening of the tote and which progressively rinses the interior of the tote.

Abstract: In an apparatus for the surface treatment of material to be treated by means of a treatment liquid, in particular a band pickling plant, with a vessel (1) receiving the treatment liquid (F), through which the material (S) to be treated can be conveyed, with a lid (2) with which the vessel (1) can be tightly sealed, with an inlet and outlet opening (4, 5) through which the material (S) to be treated enters into and exits from the vessel (1), and with suction openings (9a, 11a) through which the evaporated treatment liquid (F) can be sucked off from the vessel (1), the quantity of the gas to be discharged is reduced in accordance with the invention and, simultaneously, the danger of damaging the material (S) to be treated is reduced without impairing the performance of the apparatus in such a way that in the zone of the inlet and outlet opening (4, 5) of the vessel (1) one inlet chamber and one outlet chamber (9, 11) are separated from the inner space (8) of the vessel (1) by at least one shut-off partition (7,

Abstract: An apparatus for washing balls in a cleaning fluid includes a container for storing soiled balls, a cleaning unit for washing and rinsing the balls, and a clean ball hopper for storing washed balls. A soiled ball conveyor conveys the balls from the soiled ball hopper to the cleaning unit, while a pneumatic conveyor conveys clean balls from the cleaning unit to the clean ball hopper. A fluid supply system provides recirculated cleaning and rinsing fluids to the cleaning unit, and helps prevent the balls from becoming clogged in foam. The cleaning unit includes three vertical substantially transparent cylindrical housings. Upper and lower enclosures are opaque and remove from sight the top and bottom longitudinal axial ends of the cylindrical housings to provide an exciting visual effect as the balls are conveyed through the transparent elongated housings.