Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.

Abstract: A UV sterilization device for a container includes a housing, a base, a receiving room formed between the housing and the base, a transmission member symmetrically and rotatably mounted on the base and including a clamp for clamping the container, an extension rod symmetrically mounted on the base and inserting into the container to stretch out and draw back relative to the container along the axial direction of the extension member, a UV sterilization member mounted on the extension member to move with the extension member, and a driving member fixed with the base and including a motor therein. The motor is fixed with the transmission member and the extension member. The motor can drive the transmission member and the container to rotate, and drive the extension member to stretch out and draw back relative to the container along the axial direction of the extension member to further drive the UV sterilization member to disinfect the container.

Abstract: A dishwasher basket for securing placemats is disclosed. The basket provides multiple compartments and a planar base. Placemats of varying shapes and sizes can be secured for washing within a standard dishwashing machine. One configuration of the basket includes sinusoidal support walls such that standard placemat sizes can be secured and the basket located in a vertical orientation within the lower rack of a typical dishwasher. In addition, features on the basket side walls, base panel, and top panel are provided such that the dishwasher basket can be coupled to additional dishwasher baskets of the same configuration.

Abstract: The present invention relates to a dishwasher (1) that comprises a body (2), a door (3) allowing access into the body (2), at least two hangers (4) secured oppositely on the ceiling (T) of the body (2), at least two rails (5) each mounted to the hangers (4) and at least one drawer (6) mounted to the rails (5) from the opposite sides to be movable thereon, wherein the items to be washed are emplaced.

Abstract: A rotisserie skewer, basket and parts cleaning assembly is provided. The assembly is located within a wash tank that includes a jet nozzle to expel a stream of fluid into said wash tank. The assembly is rotatably mounted within the wash tank and is capable of holding parts for cleaning.

Abstract: In a processing block, a plurality of back surface cleaning units and a main robot are provided. The main robot is provided between the back surface cleaning units provided on one side of the processing block and the back surface cleaning units provided on the other side of the processing block. A reversing unit used to reverse a substrate and a substrate platform used to transfer and receive substrates between an indexer robot and the main robot are provided adjacent to each other in the vertical direction between the indexer robot and the processing block. The main robot transports substrates among the plurality of back surface cleaning units, the substrate platform, and the reversing unit.

Abstract: A substrate treatment apparatus is provided, which includes: a seal chamber including a chamber body having an opening, a lid member provided rotatably with respect to the chamber body and configured to close the opening, and a first liquid seal structure which liquid-seals between the lid member and the chamber body, the seal chamber having an internal space sealed from outside; a lid member rotating unit which rotates the lid member; a substrate holding/rotating unit which holds and rotates a substrate in the internal space of the seal chamber; and a treatment liquid supplying unit which supplies a treatment liquid to the substrate rotated by the substrate holding/rotating unit.

Abstract: Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.

Abstract: Inside a single apparatus main body (100), a surface treatment apparatus includes: a treatment cell (11); a vertical rotation shaft (12); an attachment/detachment device; a receiving tank (15); a cover body (16); a plurality of tanks (21); a plurality of surface treatment liquid supply devices (22); a cleaning water supply device; a drain device (3); and a first cleaning device. Upon operation of the surface treatment liquid supply device while the treatment cell (11) containing small objects is rotated by the vertical rotation shaft (12), a surface treatment is carried out on the small objects, upon operation of the cleaning water supply device, the small objects inside the treatment cell (11) are cleaned, and upon operation of the first cleaning device, the inner face of the cover body and the outer face of the treatment cell are cleaned, thus providing circulation use of surface treatment liquids in the tanks.

Abstract: A liquid processing apparatus and method capable of separately collecting first and second processing liquids from each other, and preventing a formation of a defect (such as watermarks and particles) on a target substrate are disclosed. In one embodiment, the liquid processing apparatus includes a substrate holding device, a processing liquid supply device to supply a first processing liquid and a second processing liquid, a rotating cup, an outer discharge portion and an inner discharge portion to respectively discharge the first processing liquid and the second processing liquid received from the first receiving surface of the rotating cup, and a discharge portion switch device to open/close the outer discharge portion. The lower end of the first receiving surface of the rotating cup extends to a lower position than the position of the substrate held by the substrate holding device.

Abstract: A substrate processing apparatus includes a rotor 45 for rotating a plurality of wafers W paralleled each other at appropriate intervals. While rotating the wafers W by the rotor 45, a chemical liquid is supplied to the wafers W for their processing. The rotor 45 has holding members 95, 96, 97, 98, 99 for holding the peripheries of the wafers W in parallel arrangement and a press member 100 for holding the wafers W while applying a pressure on their peripheries. Irrespective of rotation of the rotor 45, the press member 100 always applies a pressure on the peripheries of the wafers W so as to prevent the peripheries from sifting with respect to the holding members 95, 96, 97, 98, 99. With the action of the press member 100, it becomes possible to prevent the peripheries of the wafers W from being worn and also possible to elongate the span of life of the holding members 95, 96, 97, 98, 99 while performing a chemical processing.

Abstract: Slab gels held on trays are agitated in a staining or fixing solution by an apparatus that includes a tray carrier that holds a stack of slab gel trays, a tank that receives the tray carrier with sufficient excess room to allow the carrier to move back and forth within the tank, and a motor with a crankpin that is connected to the tray carrier in a reciprocating connection that translates the circular path of the crankpin into a linear path of movement of the tray carrier.

Abstract: A system and method for cleaning boxes used for handling flat media includes a rotor rotatably mounted within an enclosure, with spray nozzles in the enclosure for spraying fluid toward the rotor. The rotor has at least one box holder assembly for holding a box. At least one retainer bar is located on the rotor for engaging a front section of the box to retain the box in the box holder assembly during rotation of the rotor. The retainer bar is preferably moveable from a first position where the retainer bar restrains the box on the box holder assembly, to a second position where the retainer bar is moved away from the box. The box holder assembly may alternatively include a base with a plurality of grooved elements thereon that are adapted to engage a flange on the box for securing the box to the box holder assembly.

Abstract: A method of cleaning and maintenance used for a rotational etching tool, combining the physical characteristics of water (splashed off after striking the surface of a spinning wafer) and a PM (preventive maintenance) computer program, can automatically and quickly clean the interior of the etching tool. By setting the appropriate parameters of PM program, single or all of process chambers can be well cleaned. Also, the DI water dropping positions on the wafer can be altered to create more splashing angles. To clean the sidewalls of the etching chambers, the wafer supporting means is moved between the process chamber and the rotating speed thereof is preferably alter while it is moving. The PM program of the present invention can be executed whenever the cleaning job needs to be done. It not only is timesaving and easy to apply, but also keeps the wafer in a almost-no-particle environment while being etched.

Abstract: A high-speed object washer may be provided for receiving a plurality of objects at an entrance portion, engaging a retention turntable and progressing into a cover. While traveling in the cover in a rotary direction, various cleaning operations may be performed to the object in order to remove various contaminates. After traveling in the rotary direction under the cover, the object may egress from the object washer at an exit portion. The object egresses from the exit portion clean and contaminate-free.

Abstract: A method and machine for on-line treating and/or processing containers (2), whereby a container (2) is fed along a production line (45), a portion of which is defined by an endless conveyor (3) extending through a loading station (43; 55) and an unloading station (41; 55) for containers (2); the container (2), as it is fed along by the conveyor (3), being subjected to a treatment and/or processing operation inside a respective cell (17), which is movable with the conveyor (3) to receive the container (2) at the loading station (43; 55) and to release the container (2) at the unloading station (41; 55).

Abstract: A liquid processing apparatus has a substrate rotating device including a holder for holding a substrate and a motor, a chamber for applying the liquid processing to the substrate, a posture changing mechanism for changing the posture of the substrate rotating device at outside of the chamber such that a state of the substrate held by the holder changes between vertical and horizontal, and a position adjusting mechanism for relatively adjusting the positions of the chamber and the substrate rotating device together with the posture changing mechanism such that the holder is housed in the chamber. The substrate is taken out from the container and held by the holder in a horizontal state. After the posture of the holder was changed to vertical, a process liquid is supplied to the substrate of vertical state.

Abstract: A cleaning apparatus 11 includes a cleaning bath 30 for cleaning wafers W, a wafer guide 31 moving up and down to accommodate the wafers W in the cleaning bath 30, a motor 49 for moving the wafer guide 31 up and down, an absolute encoder 33 for detecting the position of the wafer guide 31, a driver 62 and a controller 63. The absolute encoder 33 detects a rotational angle of a rotating shaft 53 of the motor 49 and outputs a detection signal to the driver 62. Based on this detection signal, the driver 62 detects the position of the wafer guide 31 and further outputs the positional information of the wafer guide 31 to the controller 63. Thus, the invention provides a transferring apparatus and a substrate processing apparatus both of which allow of easy detection of the wafer guide and further facilitate their maintenance.

Abstract: A rinsing device having a plurality of rinse modules, each of which has at least one circular turret adapted to transport containers through the rinsing device. The turrets are arranged to rotate about a substantially horizontal axis, the axis being offset from the horizontal by an angle sufficient to ensure drainage of cleaning fluid from the containers under the influence of gravity. The containers are preferably supported around the periphery of the turret with their longitudinal axes parallel to the axis of rotation of the turret.

Abstract: A Ferris wheel-like stripping or cleaning mechanism that can be used in semiconductor fabrication, such as in photoresist or other stripping, or wafer or other cleaning, is disclosed. A stripping mechanism can include a container to hold a chemical, such as a photoresist stripping chemical, a wafer cleaning chemical, or another type of chemical. The mechanism can also include a component to move semiconductor wafers through the chemical in the container in a Ferris wheel-like motion. The component may include wafer holders for the wafers that are swivably mounted about an axis of rotation. As the one or more wafer holders rotate about the axis of rotation through the chemical in the container, the wafer holders remain in a substantially constant vertical and horizontal orientation.

Abstract: An automatic wine barrel washing apparatus is disclosed. The apparatus includes a base portion having a plurality of horizontal and vertical support members, a top portion mounted on said base portion. The top portion comprises a plurality of spaced apart roller support plates, and a plurality of sinks disposed within the top portion. Each of the sinks include a drain and drain lines. Motorized wash tubes having heads are provided, each of wash tube heads adapted for insertion into a wine barrel through the wine barrel bung hole. The wash tubes are in fluid communication with a source of pressurized water. Wash tube elevation means selectively raise and lower the wash tubes, and wash tube rotating means rotate the wash heads during a wash cycle. A barrel wash cycle is controlled by a PLC or microprocessor.

Abstract: An improved dishwashing machine is proposed which has a dish-cleaning compartment, a dish-rack rotating mechanism, a re-circulating fluid spraying system, a non re-circulating fluid spraying system, a drainage mechanism, a waste filter tank and a controlling means. The dish-cleaning compartment includes a cover and a casing, which includes a re-circulating fluid spray arm and a non re-circulating fluid spray arm. Automatic chemical dispenser, hot air dish-drying system and ultraviolet light sterilizer are included as optional features. Dish-cleaning operation starts with a flush cycle and then follows by a wash cycle and a rinse cycle. A dish-drying operation is introduced at the end of the rinse cycle, to dry as well as to sanitize dishes.

Abstract: An enclosure 23A that defines a drying chamber 23 is configured of a pair of enclosing elements 23c and 23d and a base element 23b. When wafers enter or leave the drying chamber 23, the enclosing elements 23c and 23d are lifted upward by vertical air cylinders 42 to separate them from the base element 23b. The enclosing elements 23c and 23d are then moved in directions that mutually separate them. To dry wafers within the drying chamber 23, the enclosing elements and the base element 23b are mutually engaged to form a hermetic seal, in the opposite sequence. The present invention reduces the dimensions of the drying chamber without impeding the work of moving wafers into and out of the drying chamber. This makes it possible to reduce the internal volume of the drying chamber, achieving a reduction is the consumption of drying gas, an improvement in the drying efficiency, and a reduction in overall size of the apparatus.

Abstract: A low pressure hot water parts washing apparatus recirculating a heated water/detergent solution and spraying same from a perforated manifold onto oily and dirt-laden parts carried by a rotary turntable. The turntable is peripherally mounted by bearings spaced about a conical solution reservoir tank to support parts without turntable tilting. The solution is drawn from the conical reservoir tank through apertures in a radiator tube housing heating elements, the elements being cleaned by a continual flow of solution passing thereover while efficiently heating the solution.

Abstract: A process chamber assembly for use with a substrate includes a vessel and a substrate holder. The vessel defines a chamber. The substrate holder has a rotational axis and includes front and rear opposed surfaces. The front surface is adapted to support the substrate. At least one impeller vane extends rearwardly from the rear surface and radially with respect to the rotational axis. The impeller vane is operative to generate a pressure differential tending to hold the substrate to the substrate holder when the substrate holder is rotated about the rotational axis. Preferably, the process chamber assembly includes a plurality of the impeller vanes extending rearwardly from the rear surface and radially with respect to the rotational axis.

Abstract: An apparatus for cleaning dirty roller bearings having inner and outer rings finds particular applicability for on the spot washing of bearings used on sports and leisure equipment such as, for example, skateboards and inline skates, after being dismantled from the equipment. A circular head plate is receivable on a container for containing a volume of cleaning fluid. Accommodating axes are disposed circularly on the head plate for accommodating the roller bearings that arc to be cleaned, with the inner rings of the roller bearings in frictional contact therewith. A drive shaft including an external hand wheel is rotatably connected through the head plate to permit rotation of the drive shaft relative to the head plate and the accommodating axes when the hand wheel is turned.

Abstract: An integrated circuit assembly cleaning apparatus and method allow a cleaning solution to completely fill spaces within an integrated circuit assembly. Such spaces include, for example, the thin space between the die and substrate of a flip-chip integrated circuit. The cleaning solution fills the space while the air initially occupying the space escapes. These actions are accomplished by first tilting the integrated circuit assembly from horizontal. The integrated circuit assembly is then immersed in the bath at a controllable rate to allow the cleaning solution to completely fill the space while the air in the space escapes.

Abstract: A cleaning system for cleaning boxes or containers used to carry semiconductor wafers has box holder assemblies and a box door holder assembly attached to a rotor within an enclosure. Upper and lower hooks on the box holder and box door holder assemblies hold boxes and doors as the rotor spins. Boxes and their doors, such as front opening unified pods (FOUP) are both efficiently cleaned and handled.

Abstract: An apparatus is described for disinfecting and testing the electrical safety of a transesophageal echo—TEE-probe. The apparatus comprises a receptacle adapted to receive the TEE-probe, apparatus for supplying the receptacle with a disinfection fluid and with a rinsing fluid, apparatus for removing any fluid from the receptacle, and an insulation tester having a first contact within the receptacle and a second contact connectable with the TEE-probe. The disinfecting and testing of the electrical safety is executed by supplying the receptacle with a disinfection fluid, disinfecting the TEE-probe, and removing the disinfection fluid. The receptacle is then supplied with a rinsing fluid and the TEE-probe is rinsed from remaining disinfection fluid. When the TEE-probe has been rinsed and before removing the rinsing fluid from the receptacle, an electrical safety test is executed with the TEE-probe by using the rinsing fluid.

Abstract: The invention is a combination of at least one dense phase fluid and at least one dense phase fluid modifier which can be used to contact substrates for electronic parts such as semiconductor wafers or chips to remove photoresist materials which are applied to the substrates during manufacture of the electronic parts. The dense phase fluid modifier is one selected from the group of cyclic, aliphatic or alicyclic compounds having the functional group: wherein Y is a carbon, oxygen, nitrogen, phosphorus or sulfur atom or a hydrocarbon group having from 1 to 10 carbon atoms, a halogen or halogenated hydrocarbon group having from 1 to 10 carbon atoms, silicon or a fluorinated silicon group; and wherein R1 and R2 can be the same or different substituents; and wherein, as in the case where X is nitrogen, R1 or R2 may not be present.

Abstract: A substrate treating apparatus and method can recover a substrate treating liquid such as a cleaning liquid in an efficient manner and positively avoid occurrences of treatment defects such as formation of cleaning spots, water marks and the like. A fixed upper plate and a fixed lower plate are disposed in opposition to each other so as to define a space therebetween. A substrate such as a semiconductor wafer is inserted into the space between the fixed upper and lower plates, supported there by a support and adapted to be rotated through rotation of the support. A substrate treating medium such as a cleaning liquid is introduced into the space to treat the substrate while the substrate is rotating. The treating medium after having treated the substrate is discharged from the space through a discharge passage which is defined between an outer peripheral surface of the support and an inner surface of a housing which covers the outer peripheral surface of the support.

Abstract: A device for cleaning contact lenses, which device comprises a first chamber (1) provided with draining means (3,8), a second chamber (2) adapted to be fluidly communicable with the first chamber (1), a lens holder (20) adapted to be inserted in the first chamber (1) and agitating means (22-28) adapted to agitate the lens holder, wherein the device further comprises a valve (5) adapted to control fluid flow between the first chamber (1) and the draining means (3,8) and between the first (1) and second chambers (2). The valve (5) can be automatically controlled.

Abstract: A cleaning system for cleaning carriers or containers used to carry semiconductor wafers has a door cleaner adjacent to a centrifugal box cleaner. Box holder assemblies are attached to a rotor within the box cleaner. Upper and lower hooks on the box holder assemblies hold boxes as the rotor spins. The door cleaner has a base which holds doors in a vertical and upright position. An elevator lowers the base into an ultrasonic cleaning tank. The tank lid seals the tank during use. Ultrasonic cleaning fluid is filtered and cycled into and out of the tank. Boxes and their doors, such as front opening unified pods (FOUP) are both efficiently cleaned and handled.

Abstract: A contact cleaning apparatus is equipped with a cleaning gas source, selectively connectable to a gas inlet of the chamber of the apparatus, structure, to supply a gas mixture of hydrogen and argon in which the hydrogen content is between 20 percent and 80 percent by volume. A selectively operable 450 MHz MF energy source is coupled to the chamber to energize a plasma in gas. A selectively operable 13.56 MHz HF energy source, controllable independently of the MF energy source and connected between the substrate support and a chamber anode biases a wafer on the support to less than 100 volts, preferably 15 to 35 volts, negative. A heater heats the wafer to temperature about 550.degree. C. Preferably, a turbo molecular pump is used to pump the cleaning gas while maintaining a pressure of between 1 mTorr and 10 Torr and at a rate of from 3 to 12 sccm.

Abstract: Apparatus for sterilizing specula is described. The apparatus comprises a bath suitable for containing disinfectant solution; a plurality speculum supporting means located within the bath; a rotatable plate located above the speculum supporting means, the rotatable plate having an aperture disposed in such a manner that on rotation of the plate, the aperture may be moved from a position above a first speculum supporting means to a position above a second speculum supporting means; and means for rotating the rotatable plate in one direction only.

Abstract: An apparatus and method for cleaning an optical component having opposed lens surfaces and an outer peripheral area. The apparatus includes a rotatable holder for supporting and retaining the optical component via the outer peripheral area so that at least a useful optical area of at least one of the opposed surfaces is fully exposed to air when the holder and optical component are rotated. A drive device is provided coupled to the holder for rotatably driving the holder to centrifugally force a liquid from the surface. The method includes the steps of, positioning the optical component within a holder and retaining the optical component in a region of the outer peripheral edge so that at least a useful optical area of one of the surfaces is fully exposed to air, applying a liquid to the exposed surface of the optical component, and spinning the optical component at a high rate of speed to clean and dry the optical component.

Abstract: A tumbling-type parts washer includes an apparatus for automatically securing a basket in a rotor assembly of the parts washer and for securing a lid onto the basket during parts cleaning. The apparatus includes a cam plate mounted to a wall of the housing of the parts washer and one or more torsion bar assemblies mounted for rotation with the rotor assembly. Each torsion bar assembly is operable between an open position that permits removal of the basket from the rotor assembly and a closed position that prevents removal of the basket from the rotor assembly. The cam plate defines a substantially circular cam surface with an open portion. The torsion bar assembly includes a torsion bar pivotally mounted on the rotor assembly, one or more basket retainers mounted on the torsion bar, and a cam follower mounted on a crank arm portion of the torsion bar.

Abstract: A method and apparatus for a wafer processing apparatus using a rotation mechanism. Wafers 13 are placed into a carrier 1 which has a central axis. The carrier 1 and wafers 13 are placed into a megasonic tank 15 with a megasonic transducer 23. A rotational driving system 25 is used to rotate the wafer carrier 1 and the wafers 13 about the central axis while the wafers are in the tank 1. Other embodiments are provided.

Abstract: An apparatus for automatically cleaning baby bottles inside and out comprising a base in a generally rectangular configuration having a floor, a drain thereabove and offset from parallel therewith for water run off and parallel side walls therebetween; a centrally-located cylindrical manifold extending upwardly through the drain to a location thereabove; a plurality of baby bottle holders rotatably mounted for rotation above the drain, the bottle holders being annular in configuration with an upstanding cylindrical side wall and internal threads for receiving the upper extent of inverted baby bottles to be washed, the holders having apertures in the lower extents of their walls for the draining of water therefrom; a peripheral tube extending upwardly for rotation and with apertures therein for spraying the insides of bottles; and a drive gear beneath the drain, the drive gear including a central gear for acting through a motion imparting assembly for rotating the manifold and a plurality of upper peripheral g

Abstract: A system for washing parts utilizing a circulated, heated liquid includes a master unit and at least one auxiliary unit. The master unit has a tank for heating the washing liquid, and has a pump for circulating the liquid through the chamber of the enclosure. The auxiliary unit is devoid of such a tank, but has means for making connections necessary to enable circulation of the liquid heated in the tank of the master unit through the chamber of the auxiliary unit enclosure.

Abstract: The present invention relates to central reactor apparatus for applying cleaning treatments to plates such as regularly-shaped flat parts e.g. semiconductor media as used for making integrated circuits, or optical disks, etc. . . . The apparatus comprises a chamber including side walls, an end wall, an opening through a front plate facing said end wall, support means enabling a plurality of parts to be supported, means for injecting treatment fluids, closure means for closing said chamber, and discharge means for discharging said fluids, thereby enabling said parts to be treated by means of said fluids and subsequently enabling the chamber to be emptied. Said means for supporting the parts is secured to the closure means and is constituted by two side combs which are articulated on links enabling the combs to be tilted apart from each other to enable said parts to pass between them, and then to be tilted towards each other so that they engage beneath the parts and support them inside said chamber.

Abstract: A contact lens cleaning apparatus having a clockwork controlled by a rotary knob to turn a ratchet wheel against a pawl, causing the lens cage to oscillate in the cleaning solution in the container, wherein the lens cage consists of two symmetrical semispherical gratings hinged together and retained in the closed position by a fastener for carrying the left eye contact lens and the right eye contact lens respectively.

Abstract: A centrifugal type, enclosed cleaning apparatus including a housing to hold the parts thereof, a washing container fastened in a hole on the housing, a lifting unit on the housing at the top, a stirrer unit having a base coupled to the lifting arm of the lifting unit and a material carrier with a shaft received inside the washing container and coupled to the transmission shaft of a power device and driven to turn within the washing container in causing a centrifugal effect, a cleaning unit consisted of a chemical pre-wash trough, a chemical trough, an inert air supply pipe assembly, an air compressing pipe assembly, a water trough, a water spray pipe assembly, and a separating trough, a drying unit, and a programmable control unit to control the operation of the lifting unit, the stirrer unit, the cleaning unit, and the drying unit in cleaning the products placed in the material carrier.

Abstract: Apparatus is provided for cleaning industrial apparel such as wire mesh safety gloves used in processing meats such as chickens. The apparatus employs a containment chamber within which a conveyor carries the gloves which are mounted upon substantially elevated glove mounts. Within the chamber, high pressure nozzles are rotated to express hot chlorinated water upon the gloves over a residence interval of about one minute. The apparatus employs parallel inputs of hot and cold water, the latter being chlorinated within a range of about 150 to 200 ppm. Cleanability is enhanced through the utilization of facilely removed light weight flat front and side doors and a pivoting forward deck assembly. Bacteria-promoting pockets and the like are minimized through the utilization of sanitary welds and O-ring mounted polymeric bearing blocks.

Abstract: A container is held between a conveyor and guide means provided around the conveyor and the guide means come in frictional contact with the container to rotate the container around its own axis as the conveyor runs in its circumferential path. The conveyor is partially water-immersed within a water tank and the container being rotated by cooperation of the conveyor and the guide means within the water tank is applied on its side wall with ultrasonic waves from ultrasonic vibrators serving to flush the container.The conveyor is provided on its outer peripheral surface with fin-like projections vertically extending and circumferentially spaced from one another at regular intervals and there are provided around the conveyor upper rails, sloped rails and lower rails serving to support the bottom of the container. There may be provided guide means associated with the respective rails. Only the lower rails are immersed in water.

Abstract: A method and apparatus for cleaning and lubricating bearings includes the steps of placing the bearings on posts on a rotating member, and rotating the member within a container containing a cleaning solvent. The rotating member is then removed from the cleaning solvent, and a lubricant is placed within the container. The rotating member is then reinserted into the container and the bearings are rotated within the lubricant.

Abstract: A device for cleaning extended wear soft contact lenses using liquid cleaning media is provided having a closed vessel for containing the liquid at a suitable level to wash the lenses which are rotated about a vertical axis in an upright position across the path of rotation with a swirling action imparted to the liquid with limited turbulence resulting in a gentle effective cleaning action.

Abstract: A soft contact lens cleaner for cleaning soft contact lenses by stirring a soft contact lens cleaning solution. The cleaner includes a container which contains a soft contact lens cleaning solution, a container cap covered on the container, a rotary cap covered on the container cap to rotate a rotary plug cap, a lens holder assembly suspended from the rotary plug cap by a suspension frame inside the container. Soft cushions and gloves with raised grains are received in chambers inside the lens holder assembly and rotated by the rotary plug cap to stir the soft contact lens cleaning solution in washing and sterilizing the soft contact lenses in the lens holder assembly.

Abstract: A cleaning device for a soft type contact lens includes a housing having a cleaning chamber fed with a cleaning liquid, a lens receiving container within the cleaning chamber and a stirring device for generating a liquid flow within the cleaning chamber and for cleaning said contact lens with the liquid flow. In order to clean the contact lens, a high speed liquid flow is generated, so that four kinds of processes of cleaning, rinsing, sterilizing, and preserving are carried out automatically within only one cleaning chamber without moving the contact lens. Therefore the lenses are not stained with dirt when moving them by finger from one process or place to another.

Abstract: A cleaning apparatus for contact lenses including a housing, an enclosure in which a transmission means is installed, a knob and two containers. The transmission means has a main gear which is centrally disposed on a plate within an upper portion of the enclosure and loaded with a coil spring, a compound gear and a single gear. The main gear and the single gear are engageable with the compound gear. The main gear is activated by an upper gear of the compound gear and the single gear is activated by a bottom gear of the compound gear. A second spindle of the single gear is centrally disposed on the base of the enclosure and its lower portion is connected with an acceptor to which the containers are attached. The knob has a circumferential toothed portion on its inner circumference. The circumferential toothed portion is engageable with the upper gear.