Rotary, Revolving, Swinging Or Oscillating Motion Work Holder Or Carrier Patents (Class 134/157)
  • Patent number: 10189521
    Abstract: A flow production system, in particular an assembly and/or production line includes a conveyor for conveying a workpiece along a conveying direction of the flow production system. A platform for use in flow production includes a guiding device and a processing device, wherein the platform is designed to be moved into and out of the flow production substantially as a whole. A method for operating a flow production system or a platform includes guiding a workpiece along the platform with the guiding device and processing the workpiece with the processing device during guiding.
    Type: Grant
    Filed: April 14, 2016
    Date of Patent: January 29, 2019
    Assignee: KUKA Systems GmbH
    Inventor: Stefan Mayr
  • Patent number: 10006656
    Abstract: A dispenser and procedure for disinfecting and cleaning air conditioner condensation drainage lines and other condensation drainage lines. The dispenser can be installed at any convenient location on any floor of a home or other building, regardless of whether the location is below, above, or at the same elevation as the inlet of the condensation drainage line. The dispenser includes a liquid pump for delivering an amount of treatment fluid into a treatment delivery line and an air pump for pushing the dose of treatment fluid through the treatment delivery line and into the condensation drainage line.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: June 26, 2018
    Inventor: Steve A. Parks
  • Patent number: 9991137
    Abstract: This substrate processing method includes: a substrate rotating step of rotating a substrate around a predetermined vertical axis line at a first rotation speed; a liquid-tight step performed along with the substrate rotating step, and where a first opposed surface is opposed at a first distance to a rotated lower surface of the substrate, and at the same time, a processing liquid is discharged from a processing liquid dispense port of a lower surface nozzle opposed to the lower surface of the substrate to cause a space between the lower surface and the first opposed surface to be in a liquid-tight state by the processing liquid; and a liquid-tight state releasing step of releasing the liquid-tight state in the space between the lower surface and the first opposed surface by separating the lower surface and the first opposed surface after the liquid-tight step.
    Type: Grant
    Filed: August 20, 2014
    Date of Patent: June 5, 2018
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Tatsuya Fujii
  • Patent number: 9892955
    Abstract: This substrate holding/rotating device includes an opening magnet forming a predetermined magnetic field generation region through which each movable pin rotating in response to rotation of the rotary table is capable of passing, the magnetic field generation region disposed so as to be eccentric with respect to a rotation direction of the rotary table and so as to allow only driving magnets corresponding to part of the plurality of movable pins to pass through the magnetic field generation region, the opening magnet giving a repulsive force or an attractive force to the driving magnet of the movable pin passing through the magnetic field generation region, the opening magnet generating a force that enables the support portion of the movable pin urged to the hold position by the urging unit to move toward the open position against an urging force of the urging unit.
    Type: Grant
    Filed: September 21, 2016
    Date of Patent: February 13, 2018
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Hiromichi Kaba, Akihiko Taki
  • Patent number: 9643207
    Abstract: The paint roller drill attachment is a device that enables a paint roller to be secured thereon. Moreover, the paint roller drill attachment includes a hexagonal drill bit that is adapted to be secured to a drill chuck of a drill in order to rotate both the paint roller drill attachment as well as the paint roller. Moreover, high-speed rotation of the paint roller drill attachment via the drill enables wet paint to be spun off of the paint roller. The paint roller drill attachment includes a paint roller portion that is affixed to the hexagonal drill bit. The paint roller portion includes a plurality of rib members that span between a first member and a second member.
    Type: Grant
    Filed: July 28, 2015
    Date of Patent: May 9, 2017
    Inventor: Anthony Guy
  • Patent number: 9623449
    Abstract: A dielectric window cleaning apparatus may be used for cleaning a dielectric window of a plasma processing device. The dielectric window cleaning apparatus may comprise a window support base, a fluid containing enclosure, a window rotating mechanism, a spray arm, and multiple fluid spraying nozzles. The fluid containing enclosure may include at least one overflow containment sidewall and may be located at least partially under and at least partially around a portion of the window support base. The window rotating mechanism may be operatively connected to the window support base and may rotate the window support base. The spray arm may be in fluid communication with a fluid source and may include a fluid flow channel. The multiple fluid spraying nozzles may each expel fluid from the fluid flow channel in a window cleansing spray.
    Type: Grant
    Filed: April 9, 2012
    Date of Patent: April 18, 2017
    Assignee: Lam Research Corporation
    Inventors: Armen Avoyan, Hong Shih, Cliff LaCroix, John Daugherty
  • Patent number: 9136155
    Abstract: A method and device for treating a wafer-shaped article utilizes a novel clamping mechanism, which permits wafer shift to be performed with reduced wear to the chuck pins. A wafer is rotated on a spin chuck that has a plurality of pins positioned at a periphery of the wafer shaped article. The pins each have a head portion which, in a service position, extends radially inwardly of and above the wafer. Gas is supplied onto a surface of the wafer facing the spin chuck at a flow rate sufficient to displace the wafer upwardly into contact with the head portions of the pins. This serves to clamp the wafer against the head portions of the pins. However, the pins contact the wafer only on upwardly oriented wafer surfaces and the wafer is supported from below solely by the gas flow.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: September 15, 2015
    Assignee: LAM RESEARCH AG
    Inventors: Kei Kinoshita, Philipp Engesser
  • Patent number: 9032979
    Abstract: An improved portable cleaning system for use in cleaning heat exchanger tube bundles, fin-fans, towers and other elongated components. The cleaning system comprises a cleaning unit having a cleaning enclosure that receives and cleans the component and a control unit that controls the operation of the system. The cleaning unit has a cleaning enclosure defining a chamber sized and configured to receive the component through a sealable lid. A roller assembly rotates the component while a spray assembly sprays cleaning fluid over and into the rotating component. The cleaning fluid is heated in the chamber using surface heating elements attached to heat transfer plates along sections of the chamber walls. A vapor recovery system captures and treats toxic vapors. In use, the cleaning system is transported to a facility to clean the components on-site using cleaning fluid supplied by the facility and discharging waste to the facility.
    Type: Grant
    Filed: February 17, 2014
    Date of Patent: May 19, 2015
    Inventor: Gary I Hays
  • Patent number: 9022047
    Abstract: A rotisserie skewer, basket and parts cleaning assembly is provided. The assembly is located within a wash tank that includes a jet nozzle to expel a stream of fluid into said wash tank. The assembly is rotatably mounted within the wash tank and is capable of holding parts for cleaning.
    Type: Grant
    Filed: January 25, 2008
    Date of Patent: May 5, 2015
    Assignee: Unified Brands, Inc.
    Inventors: John Cantrell, Mark Churchill, Michael P. Licata, David Gast
  • Patent number: 8997764
    Abstract: An apparatus for treating a wafer-shaped article, comprises a spin chuck for holding a wafer-shaped article in a predetermined orientation, at least one upper nozzle for dispensing a treatment fluid onto an upwardly facing surface of a wafer-shaped article when positioned on the spin chuck, and at least one lower nozzle arm comprising a series of lower nozzles extending from a central region of the spin chuck to a peripheral region of the spin chuck. The series of nozzles comprises a smaller nozzle in a central region of the spin chuck and a larger nozzle in a peripheral region of the spin chuck. In the method according to the invention, a heated liquid is supplied through the series of nozzles so as to supply more heat to peripheral regions of a wafer than to central regions.
    Type: Grant
    Filed: May 27, 2011
    Date of Patent: April 7, 2015
    Assignee: Lam Research AG
    Inventor: Michael Puggl
  • Publication number: 20150090305
    Abstract: A liquid processing apparatus performs a liquid processing on a rotating substrate by supplying a processing liquid. Surrounding members surround a region including an upper space of a cup body surrounding the rotating substrate and provided with an opening above the substrate. An air flow forming portion forms a descending air flow from an upper side of the cup body. A bottom surface portion blocks between the cup body and the surrounding member along a circumferential direction. An exhaust port is provided above the bottom surface portion and outside the cup body to exhaust an atmosphere in a region surrounded by the surrounding members and the bottom surface portion.
    Type: Application
    Filed: September 11, 2014
    Publication date: April 2, 2015
    Inventors: Terufumi Wakiyama, Norihiro Ito, Jiro Higashijima
  • Publication number: 20150083171
    Abstract: A method for treating at least one substrate (15), particularly wafers, in a liquid medium (3). In a first step, the substrate (15) is lifted in the liquid medium (3) until the substrate (15) is at least partially lifted out of the liquid medium (3) and, in a second step, is passed on at least one point protruding out of the liquid medium (3).
    Type: Application
    Filed: April 26, 2013
    Publication date: March 26, 2015
    Applicant: AWT ADVANCED WET TECHNOLOGIES GMBH
    Inventors: Hans Hauger, Werner Schulz
  • Publication number: 20150075571
    Abstract: A substrate processing apparatus includes a substrate holding means that holds a substrate horizontally, a substrate rotating means that rotates a substrate held by the substrate holding means about a vertical rotation axis passing through the substrate, a discharging member that discharges a processing liquid toward the substrate, and a high-temperature processing liquid pipe that supplies a processing liquid of a temperature higher than that of the discharging member to the flow passage. The discharging member includes a plurality of discharge ports respectively disposed at a plurality of positions different in distance from the rotation axis and a flow passage connected sequentially to the plurality of discharge ports in order from outside to inside. The discharging member discharges a processing liquid supplied from the flow passage to the plurality of discharge ports from the plurality of discharge ports toward the substrate.
    Type: Application
    Filed: March 26, 2013
    Publication date: March 19, 2015
    Inventor: Atsuyasu Miura
  • Publication number: 20150068562
    Abstract: An open top tank assembly for performing forced immersion oscillatory cleaning of products, parts, assemblies or other materials with or without non-line of sight (NLOS) features, wherein the apparatus repeats a process during application of pressure gradients to the fluid in the tank to develop a consistent rhythmic oscillation that creates movement of product in a center cavity of the tank to repeatedly transfer the fluid through the product to clean the product.
    Type: Application
    Filed: November 10, 2014
    Publication date: March 12, 2015
    Inventor: Nicholas Glen Littleton
  • Patent number: 8956465
    Abstract: [Problem] To provide a liquid processing method with which, while alleviating a watermark occurring in the surface of a substrate, it is possible to hydrophobize the surface using a hydrophobing gas. [Solution] A substrate (W), retained in substrate retaining parts (21, 22, 23), is rotated and has a liquid compound supplied to the surface thereof, whereby a liquid process is carried out. Next, a rinse liquid is supplied to the surface of the substrate (W) while the substrate (W) is rotated, and the liquid compound is replaced with the rinse liquid. Next, supplying a hydrophobing gas for hydrophobizing the surface of the substrate (W) and supplying the rinse liquid to the surface of the substrate (W) after supplying the hydrophobing gas are repeated alternately, thus hydrophobizing the substrate (W). Next, the rinse liquid is removed by rotating the substrate (W), drying the substrate (W).
    Type: Grant
    Filed: January 11, 2013
    Date of Patent: February 17, 2015
    Assignee: Tokyo Electron Limited
    Inventor: Jun Nonaka
  • Patent number: 8932672
    Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: January 13, 2015
    Assignee: SCREEN Semiconductor Solutions Co., Ltd.
    Inventors: Koji Kaneyama, Masashi Kanaoka, Tadashi Miyagi, Kazuhito Shigemori, Shuichi Yasuda, Tetsuya Hamada
  • Patent number: 8916003
    Abstract: A wafer scrubber is disclosed, including a chamber, and a holder connecting to a spindle disposed in the chamber, wherein the holder supports a wafer, and the wafer spins to remove water on the wafer, and a meshed inner cup comprising a plurality of through holes disposed between the holder and a wall of the chamber, wherein the meshed inner cup receives water from a surface of the wafer and rotates around the spindle to release the water through the through holes.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: December 23, 2014
    Assignee: Nanya Technology Corporation
    Inventors: Jeng-Hsing Jang, Yi-Nan Chen, Hsien-Wen Liu
  • Publication number: 20140352738
    Abstract: A liquid dispenser for a wafer processing system includes a supply tube with an inlet at one end and an outlet at the other end. Attached to the supply tube at the outlet end is a liquid reservoir. The liquid reservoir has a dispensing plate that has an outlet for dispensing liquid onto a wafer. There is also a dispensing valve for controlling the dispensing of the liquid.
    Type: Application
    Filed: May 28, 2014
    Publication date: December 4, 2014
    Applicant: BEIJING SEVENSTAR ELECTRONICS CO. LTD.
    Inventors: Don C. Burkman, Cary M. Ley, Kevin T. O'Dougherty, Charlie A. Peterson
  • Patent number: 8893734
    Abstract: A cleaning apparatus for a power driven buffing pad includes a wash plate mounted in a cleaning solution reservoir that provides agitating and cleaning contact with the pad mounted on an operating driver. The wash plate can be reciprocated vertically by the operator against a biasing arrangement to operate a pump to deliver cleaning solution from the reservoir to the face of the pad in contact with the wash plate.
    Type: Grant
    Filed: May 26, 2011
    Date of Patent: November 25, 2014
    Assignee: Lake Country Manufacturing, Inc.
    Inventor: Scott S. McLain
  • Patent number: 8888925
    Abstract: A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: November 18, 2014
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Masanobu Sato, Hiroyuki Yashiki, Mai Yamakawa, Takayoshi Tanaka, Ayumi Higuchi, Rei Takeaki
  • Publication number: 20140332036
    Abstract: A device and method for treatment of a substrate treatment surface of a substrate with a fluid by immersion of the substrate treatment surface into the fluid, The device includes: receiving means for receiving the fluid with an immersion opening and immersion means for immersion of the substrate treatment surfaces through the immersion opening into the receiving means, Rotation means are provided for rotation of the receiving means for at least predominant discharge of the fluid from the receiving means.
    Type: Application
    Filed: September 22, 2011
    Publication date: November 13, 2014
    Applicant: EV GROUP E. THALLNER GMBH
    Inventors: Thomas Glinsner, Ronald Holzleitner, Thomas Wieser, Florian Schmid
  • Patent number: 8877076
    Abstract: A substrate treatment apparatus is used for treating a major surface of a substrate with a chemical liquid. The substrate treatment apparatus includes: a substrate holding unit which holds the substrate; a chemical liquid supplying unit having a chemical liquid nozzle which supplies the chemical liquid onto the major surface of the substrate held by the substrate holding unit; a heater having an infrared lamp to be located in opposed relation to the major surface of the substrate held by the substrate holding unit to heat the chemical liquid supplied onto the major surface of the substrate by irradiation with infrared radiation emitted from the infrared lamp, the heater having a smaller diameter than the substrate; and a heater moving unit which moves the heater along the major surface of the substrate held by the substrate holding unit.
    Type: Grant
    Filed: February 26, 2013
    Date of Patent: November 4, 2014
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Sei Negoro, Ryo Muramoto, Toyohide Hayashi, Koji Hashimoto, Yasuhiko Nagai
  • Patent number: 8878775
    Abstract: A display device and a control method thereof are discussed. A display device and a control method thereof according to an embodiment of the present invention comprise a display unit displaying an object; a receiver receiving a wireless signal from a three dimensional (3D) pointing device recognizing a three dimensional motion; and a controller calculating a trajectory of the 3D pointing device corresponding to at least one of an absolute coordinate area and a relative coordinate area based on the received wireless signal and determining a position of the displayed object according to a property of an area to which the trajectory belongs and displaying the determined position.
    Type: Grant
    Filed: January 12, 2011
    Date of Patent: November 4, 2014
    Assignee: LG Electronics Inc.
    Inventors: Sanghyun Cho, Janghee Lee, Youk Kwon, Youngwan Lim, Sijin Kim, Joomin Kim
  • Publication number: 20140311534
    Abstract: A sealing mask has a pair of principal surfaces opposed to each other and a plurality of through-holes opening in the pair of principal surfaces and is used for sealing predetermined cells out of a plurality of cells in a honeycomb structure. A cleaning device for the sealing mask is provided with: a rotator configured to support the sealing mask and rotate the sealing mask around a central axis L1 intersecting with the pair of principal surfaces; and a sprayer having a nozzle for spraying a cleaning liquid on one of the principal surfaces.
    Type: Application
    Filed: December 13, 2012
    Publication date: October 23, 2014
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masaharu Mori, Ying Gong
  • Publication number: 20140311532
    Abstract: A substrate processing apparatus has a substrate rotating device 10, 20 for holding and rotating a substrate W, a cleaning device 41 configured to clean a substrate W which is rotated by the substrate rotating device 10, 20 at predetermined rotating speed, a movement device 42 configured to move the cleaning device 41 between a cleaning position P3 and a separate position P2, and a control unit 64. The control unit 64 controls the movement device 42 so that the cleaning device 41 located at the separate position P2 starts moving toward the cleaning position P3 before a rotating speed of the substrate W held by the substrate rotating device 10, 20 reaches the predetermined rotating speed and the cleaning device 41 reaches the cleaning position P3 after a rotating speed of the substrate W reaches the predetermined rotating speed. Therefore, it is possible to improve the throughput in the substrate cleaning step.
    Type: Application
    Filed: April 22, 2014
    Publication date: October 23, 2014
    Applicant: EBARA CORPORATION
    Inventors: Toshio YOKOYAMA, Junji KUNISAWA, Mitsuru MIYAZAKI, Teruaki HOMBO, Naoki TOYOMURA
  • Patent number: 8857452
    Abstract: A spray device for cleaning residue from a filter member. In one embodiment, the spray device includes a tubular stem telescopically slideable in a sleeve. A coil spring surrounds the stem and resists movement of the stem out of the sleeve. A tubular halo with nozzles is fastened to the end of the tubular stem so that when a pressurized fluid is applied to the stem, the stem is forced out of the sleeve against the spring force, thereby causing the halo to travel along a cylindrical filter surface. The pressurized fluid is also jetted from the nozzles and cleans the cylindrical surface. When the pressurized fluid is removed from the spray device, the spring retracts the stem and the halo back to a rest position. In another embodiment, the halo is replaced with a nozzle head that moves within a cylindrical filter surface to be cleaned.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: October 14, 2014
    Inventor: John D. Martin
  • Publication number: 20140290703
    Abstract: A substrate processing apparatus includes a substrate supporting part for supporting a substrate in a horizontal state, an upper nozzle for discharging deionized water as a cleaning solution toward a center portion of an upper surface of the substrate, and a substrate rotating mechanism for rotating the substrate supporting part together with the substrate around a central axis directed in a vertical direction. In the substrate processing apparatus, the plurality of discharge ports are provided in the upper nozzle, and the flow rate of the deionized water to be supplied onto the center portion of the substrate from the upper nozzle can be ensured, with the flow rate of the deionized water from each discharge port reduced. It is thereby possible to perform appropriate cleaning of the upper surface of the substrate while suppressing electrification at the center portion of the substrate.
    Type: Application
    Filed: March 26, 2014
    Publication date: October 2, 2014
    Applicant: DAINIPPON SCREEN MFG. CO., LTD.
    Inventors: Kenji KOBAYASHI, Kenji IZUMOTO, Akihisa IWASAKI, Takemitsu MIURA, Kazuhide SAITO
  • Publication number: 20140290701
    Abstract: A substrate processing apparatus includes: a storage tank configured to store a liquid; a substrate support unit 10 configured to rotatably, horizontally support a substrate W; and a plate driving unit 30a configured to move the substrate support unit 10 between an immersion position at which the substrate W is immersed into the liquid stored in the storage tank, and a separation position located above the immersion position, at which the substrate W is separated from the liquid stored in the storage tank. The substrate processing apparatus also includes a rotary drive unit 30M configured to rotate the substrate W supported by the substrate support unit 10, and liquid supply units 10n, 20m and 20n configured to supply a liquid to the substrate W that is being rotated by the rotary drive unit in the separation position.
    Type: Application
    Filed: October 16, 2012
    Publication date: October 2, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shuichi Nagamine, Yusuke Hashimoto
  • Publication number: 20140261572
    Abstract: The inventive substrate treatment apparatus includes a change controlling unit which changes at least one of a protection liquid application position relative to a liquid droplet nozzle and a protection liquid incident angle relative to the liquid droplet nozzle, the protection liquid application position being a position at which the protection liquid is applied on an upper surface of the substrate, the protection liquid incident angle being an angle at which the protection liquid is incident on the liquid application position; wherein the change controlling unit controls the liquid application position and the incident angle in a first condition when the spraying region is located on an upper surface center portion of the substrate, and controls the liquid application position and the incident angle in a second condition when the spraying region is located on an upper surface peripheral portion of the substrate.
    Type: Application
    Filed: February 28, 2014
    Publication date: September 18, 2014
    Applicant: DAINIPPON SCREEN MFG.CO., LTD.
    Inventors: Kota SOTOKU, Takayoshi TANAKA, Masanobu SATO
  • Patent number: 8834672
    Abstract: A knife edge ring apparatus is provided for use during semiconductor manufacturing which includes a ring-shaped body having an inner side wall, an outer side wall and a top surface having a predetermined width. A multi-staged inclined portion is formed in the outer side wall and a plurality of discharge holes penetrate the body. Each of the discharge holes have an inlet associated therewith positioned at the inclined portion. The knife edge ring allows developer and cleaning solution to be discharged away from the wafer. A method of cleaning the bottom surface of a semiconductor wafer is also provided which employs the use of the knife edge ring. Developer is supplied onto the top surface of a wafer. Spraying solution is sprayed onto the bottom surface of the wafer.
    Type: Grant
    Filed: March 12, 2013
    Date of Patent: September 16, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Dug-Kyu Choi
  • Patent number: 8833380
    Abstract: A device for treating a disc-like article with a fluid, including elements for dispensing a fluid onto the article and a chuck for holding and rotating the article around an axis perpendicular thereto, the chuck including a base body, a drive ring, and gripping members for contacting the article at its edge. The gripping members are eccentrically movable with respect to the center of the article and driven by a drive ring rotatably mounted to the base body so that the drive ring is rotatable against the base body around the axis. The relative rotational movement of the drive ring against the base body is carried out by either holding the base body and rotating the drive ring or by holding the drive ring and rotating the base body, whereby the to-be-held-part (drive ring or base body) is held without touching the respective to-be-held-part by magnetic force.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: September 16, 2014
    Assignee: Lam Research AG
    Inventors: Rainer Obweger, Franz Kumnig, Thomas Wirnsberger
  • Publication number: 20140256143
    Abstract: The present disclosure provides one embodiment of a method of fabricating an integrated circuit. The method includes forming a patterned hard mask on a substrate; performing a fabrication process to the substrate through openings of the patterned hard mask; performing a first etch process to remove the patterned hard mask; and applying an NHD solution to the substrate, wherein the NHD solution includes ammonium hydroxide, hydrogen peroxide and deionized water with ratios tuned such that the NHD solution is weak basic.
    Type: Application
    Filed: March 10, 2013
    Publication date: September 11, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventor: Taiwan Semiconductor Manufacturing Company, Ltd.
  • Patent number: 8821681
    Abstract: Disclosed is an apparatus for wet treatment of a disc-like article, which comprises: a spin chuck for holding and rotating the disc-like article, and an inner edge nozzle dispensing treatment liquid directed towards a first peripheral region of the first surface of the disc-like article, wherein the first surface is facing the spin chuck and the first peripheral region is defined as being a region of the first surface with an inner radius (ri), which is greater than 1 cm less than the disc-like article's radius (ra), wherein the inner edge nozzle is positioned in a stationary manner between the disc-like article (when placed on the spin chuck) and the spin chuck, wherein the inner edge nozzle is feed through a central pipe, which is disposed in a stationary manner and penetrates centrally through the spin chuck, for supplying a treatment liquid against a first surface of the disc-like article.
    Type: Grant
    Filed: July 3, 2008
    Date of Patent: September 2, 2014
    Assignee: Lam Research AG
    Inventors: Michael Puggl, Alexander Schwartzfurtner, Dieter Frank
  • Patent number: 8815017
    Abstract: A method of manufacturing a semiconductor device includes: holding a semiconductor substrate with a surface inclined with respect to the vertical direction and the horizontal direction; and immersing the semiconductor substrate in a cleaning solution including an acid.
    Type: Grant
    Filed: July 26, 2013
    Date of Patent: August 26, 2014
    Assignee: Fujitsu Limited
    Inventors: Shirou Ozaki, Masayuki Takeda, Norikazu Nakamura, Junichi Kon
  • Publication number: 20140202503
    Abstract: A system for cleaning a substrate includes a carrier and a cleaning station. The carrier is capable of holding the substrate and is movably coupled to a pair of guide tracks extending a length of the system. The cleaning station includes a force applicator, a gate and a dispenser. The force applicator has an applicator length and is coupled to the cleaning station, is rotatable and is adjustable to a first height off the surface of the carrier during cleaning. The gate is a hollow structure disposed at a trailing edge of the force applicator. The gate is set to a height off the carrier surface that is less than or equal to the first height. The gate includes a gate length that at least spans the applicator length. The dispenser is disposed at a leading edge of the force applicator and is configured to supply cleaning solution during cleaning.
    Type: Application
    Filed: March 25, 2014
    Publication date: July 24, 2014
    Applicant: Lam Research Corporation
    Inventors: Jeffrey J. Farber, Ji Zhu, Carl Woods, John M. de Larios
  • Patent number: 8757180
    Abstract: In a processing block, a plurality of back surface cleaning units and a main robot are provided. The main robot is provided between the back surface cleaning units provided on one side of the processing block and the back surface cleaning units provided on the other side of the processing block. A reversing unit used to reverse a substrate and a substrate platform used to transfer and receive substrates between an indexer robot and the main robot are provided adjacent to each other in the vertical direction between the indexer robot and the processing block. The main robot transports substrates among the plurality of back surface cleaning units, the substrate platform, and the reversing unit.
    Type: Grant
    Filed: February 12, 2008
    Date of Patent: June 24, 2014
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventor: Ichiro Mitsuyoshi
  • Patent number: 8758855
    Abstract: A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: June 24, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Nobuhiro Ogata, Hiroichi Inada, Taro Yamamoto, Akihiro Fujimoto
  • Publication number: 20140166055
    Abstract: An apparatus for cleaning wafers includes a chamber, a rotatable substrate holder inside the chamber, a nozzle above the rotatable substrate holder, a cover facing downward and fluidly coupled with the nozzle. The rotatable substrate holder is configured to mount one or more semiconductor wafers on the rotatable substrate holder. The nozzle is configured to spray a cleaning medium onto the one or more semiconductor wafers. The cover is of a shape having a top edge with a top cross-sectional area and a bottom edge with a bottom cross-sectional area.
    Type: Application
    Filed: December 13, 2012
    Publication date: June 19, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chia-Hung HUANG, Jeng-Jyi HWANG, Chi-Ming YANG
  • Patent number: 8734593
    Abstract: A substrate treatment apparatus includes: substrate holding unit which horizontally holds a substrate; a rotating unit which rotates the substrate held by the substrate holding unit about a vertical axis; and a first nozzle having a first opposing face to be opposed to a region of a lower surface of the substrate inward of a peripheral portion of the substrate in spaced relation to the lower surface of the substrate during rotation of the substrate by the rotating unit and a treatment liquid spout provided in the first opposing face for filling a space defined between the lower surface of the substrate and the first opposing face with a treatment liquid spouted from the treatment liquid spout to keep the space in a liquid filled state.
    Type: Grant
    Filed: March 10, 2011
    Date of Patent: May 27, 2014
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Takuya Kishimoto, Koji Ando
  • Publication number: 20140109941
    Abstract: A holding device including a first sucking section for sucking a wafer (substrate) from a side on which a dicing tape (supporting film) is adhered; a structure that supports a dicing frame (frame part) and covers a first region which (i) is on a surface of the dicing tape to which surface the wafer is not adhered and (ii) is between the wafer and the dicing frame; and a second sucking section for sealing a boundary between the structure and at least one of the dicing frame and the first region.
    Type: Application
    Filed: May 25, 2012
    Publication date: April 24, 2014
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Atsushi Miyanari
  • Patent number: 8684014
    Abstract: Disclosed is a liquid processing apparatus and a liquid processing method, which can process an entire wafer at a sufficiently high temperature and can sufficiently suppress adhesion of particles on a surface of the wafer, when the peripheral portion of the wafer is processed. The liquid processing apparatus includes a holding part to hold the substrate, a rotation driving part to rotate the holding part, and a shield unit. The shield unit includes an opposed plate opposed to the substrate held by the holding part, a heating part to heat the substrate through the opposed plate, and a heated gas supplying part to supply heated gas to a surface of the substrate held by the holding part.
    Type: Grant
    Filed: August 3, 2010
    Date of Patent: April 1, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Yoshifumi Amano, Tsuyoshi Mizuno
  • Patent number: 8671961
    Abstract: An apparatus for cleaning and conditioning the surface of a semiconductor substrate such as wafer includes a rotatable chuck, a chamber, a rotatable tray for collecting cleaning solution with one or more drain outlets, multiple receptors for collecting multiple cleaning solutions, a first motor to drive chuck, and a second motor to drive the tray. The drain outlet in the tray can be positioned directly above its designated receptor located under the drain outlet. The cleaning solution collected by the tray can be guided into designated receptor. One characteristic of the apparatus is having a robust and precisely controlled cleaning solution recycle with minimum cross contamination.
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: March 18, 2014
    Assignee: ACM Research (Shanghai) Inc.
    Inventors: Voha Nuch, David Wang, Yue Ma, Fufa Chen, Jian Wang, Yunwen Huang, Liangzhi Xie, Chuan He
  • Publication number: 20140053882
    Abstract: A liquid processing apparatus including: a second housing; a first housing capable of being brought into contact with the second housing; a holding part configured to hold an object to be processed; a rotation driving part configured to rotate the object to be processed held by the holding part; front-side process-liquid supply nozzle configured to supply a process liquid onto a peripheral portion of a front surface of the object to be processed held by the holding part; and a storage part disposed on a side of a rear surface of the object to be processed held by the holding part, the storage part being configured to store the process liquid having been passed through the object to be processed. The respective first housing and the second housing can be moved in one direction, so that the first housing and the second housing can be brought into contact and separated from each other.
    Type: Application
    Filed: October 29, 2013
    Publication date: February 27, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Yoshifumi AMANO, Satoshi KANEKO
  • Patent number: 8656936
    Abstract: Apparatuses, and related methods, for processing a workpiece that include a particular barrier structure that can overlie and cover a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular movable member that can be positioned over and moved relative to a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular ceiling structure that can overlie a processing chamber. Nozzle devices, and related methods, that include a particular annular body. Nozzle devices, and related methods, that include a particular first, second, and third nozzle structure.
    Type: Grant
    Filed: July 9, 2008
    Date of Patent: February 25, 2014
    Assignee: Tel FSI, Inc.
    Inventors: Jimmy D. Collins, Samuel A. Cooper, James M. Eppes, Alan D. Rose, Kader Mekias
  • Patent number: 8617318
    Abstract: A liquid processing apparatus including: a second housing; a first housing capable of being brought into contact with the second housing; a holding part configured to hold an object to be processed; a rotation driving part configured to rotate the object to be processed held by the holding part; front-side process-liquid supply nozzle configured to supply a process liquid onto a peripheral portion of a front surface of the object to be processed held by the holding part; and a storage part disposed on a side of a rear surface of the object to be processed held by the holding part, the storage part being configured to store the process liquid having been passed through the object to be processed. The respective first housing and the second housing can be moved in one direction, so that the first housing and the second housing can be brought into contact and separated from each other.
    Type: Grant
    Filed: May 25, 2009
    Date of Patent: December 31, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Yoshifumi Amano, Satoshi Kaneko
  • Publication number: 20130306102
    Abstract: A method of manufacturing a semiconductor device includes: holding a semiconductor substrate with a surface inclined with respect to the vertical direction and the horizontal direction; and immersing the semiconductor substrate in a cleaning solution including an acid.
    Type: Application
    Filed: July 26, 2013
    Publication date: November 21, 2013
    Applicant: FUJITSU LIMITED
    Inventors: Shirou OZAKI, Masayuki TAKEDA, Norikazu NAKAMURA, Junichi KON
  • Patent number: 8584687
    Abstract: A sonication cleaning system is provided. The sonication cleaning system includes a cleaning tank configured to contain a liquid and a flow control system configured to cause a gradient cross flow of the liquid through the cleaning tank. The system further includes a sonication generator configured to agitate the liquid in the cleaning tank and a controller configured to vary a power applied to the sonication generator to agitate the liquid in the cleaning tank based on an oscillation position of a workpiece within the cleaning tank.
    Type: Grant
    Filed: June 25, 2010
    Date of Patent: November 19, 2013
    Assignee: WD Media, LLC
    Inventors: Chaoyuan C. Chen, Bing-Shiuan Chang
  • Patent number: 8584837
    Abstract: A device for storing shaving razor blades in a manner which prolongs usability includes containment for storing cleaned razor blades and for storing a razor handle. The interior of the housing compartment comprises a reservoir configured for retaining a volume of a cleaning and preserving solution. After shaving, a user detaches the razor blade from the handle and places it within a blade cleaning assembly which provides a means to submerge the blade into the solution. The razor blade is then retrieved for subsequent shaving. The device also provides a removable blade cartridge being especially useful for storing clean blades while traveling.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: November 19, 2013
    Inventor: Wayne C. Mather
  • Patent number: 8580042
    Abstract: An apparatus for cleaning and conditioning the surface of a semiconductor substrate such as wafer includes a rotatable chuck, a chamber, a rotatable tray for collecting cleaning solution with one or more drain outlets, multiple receptors for collecting multiple cleaning solutions, a first motor to drive chuck, and a second motor to drive the tray. The drain outlet in the tray can be positioned directly above its designated receptor located under the drain outlet. The cleaning solution collected by the tray can be guided into designated receptor. One characteristic of the apparatus is having a robust and precisely controlled cleaning solution recycle with minimum cross contamination.
    Type: Grant
    Filed: December 10, 2007
    Date of Patent: November 12, 2013
    Assignee: ACM Research (Shanghai) Inc.
    Inventors: Voha Nuch, David Wang, Yue Ma, Fufa Chen, Jian Wang, Yunwen Huang, Liangzhi Xie, Chuan He
  • Publication number: 20130291905
    Abstract: A substrate treatment apparatus is provided, which includes: a seal chamber including a chamber body having an opening, a lid member provided rotatably with respect to the chamber body and configured to close the opening, and a first liquid seal structure which liquid-seals between the lid member and the chamber body, the seal chamber having an internal space sealed from outside; a lid member rotating unit which rotates the lid member; a substrate holding/rotating unit which holds and rotates a substrate in the internal space of the seal chamber; and a treatment liquid supplying unit which supplies a treatment liquid to the substrate rotated by the substrate holding/rotating unit.
    Type: Application
    Filed: July 2, 2013
    Publication date: November 7, 2013
    Inventors: Akio HASHIZUME, Yuya AKANISHI, Kenji KAWAGUCHI, Manabu YAMAMOTO