Abstract: A portable cleansing device (20) for cleaning small items, such as a pacifier (80), with pressurized liquid. The invention consists of a container (22) with a lid (46) that is removably attached to the container for maintaining liquid-tight integrity. A vertical partition (52) within the container forms a fresh liquid reservoir (56) for storing fresh water and a waste liquid repository (64) for storing waste water. A cleaning chamber (68) is formed having an inner wall (70) that is spaced from the container to create a void (72) therebetween that incorporates a number of nozzle openings (74). A liquid pump (78) is attached to the container and is in fluid communication with the void and with the fresh liquid reservoir. When the pump is manually energized, water is forced from the reservoir through the nozzles, thus spraying pressurized water onto the object positioned within the cleaning chamber, with the water accumulating and stored in the repository beneath the chamber.

Abstract: The invention relates to an apparatus for scarifying the interior surface of a sewer pipe. The apparatus consists of a chassis, with an outer frame coupled to the chassis and an inner frame slidably coupled to the outer frame. Two extendible arms are attached to opposite sides of the inner frame. Each arm has a nozzle assembly mounted on the end, each nozzle assembly having a plurality of fluid jets for spray water onto the interior surface of the pipeline. The nozzle assembly may be pivotally mounted to allow for greater control of the fluid jets. The apparatus further includes a propulsion system for movement of the apparatus along the pipeline.

Abstract: The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.

Abstract: A method for processing a substrate is provided which includes generating a fluid meniscus on the surface of the vertically oriented substrate, and moving the fluid meniscus over the surface of the vertically oriented substrate to process the surface of the substrate.

Abstract: A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that different faces of the object are simultaneously cleaned. At least two gas feeding devices, having one means each for directing a gas flow onto the surface of the object to be cleaned, open into a cleaning chamber supplying a pressurized cleaning gas. At least two extraction means are connected to the outside of the cleaning chamber for discharging the gas fed to the cleaning chamber. The object can be introduced into the cleaning chamber through at least one gap. At least two ionization means are used to ionize the gas and the particles that are present in the cleaning chamber. One ionization means each is mounted between a direction means and an extraction means.

Abstract: An improved self-propelled harvester. The self-propelled harvester passes through a field to be harvested, while laborers place produce on a conveyor belt thereon. The produce is passed through a washing station, where it is preferably exposed to sideward and downward spray. Thereafter, the produce is transported upward along an elevator belt assembly, toward a trailer. The elevator belt assembly preferably has a plurality of flights located on rods positioned between side belts. The rods are spaced sufficiently so that leaves, debris and excess water can readily pass therethrough.

Abstract: An instrument treatment station includes a station body having a first and second elongate and spaced channel walls. The channel walls define an elongate instrument channel therebetween. The station body defines an elongate drain channel in fluid communication with the instrument channel. The station body further defines a source port in fluid communication with the instrument channel for delivering a fluid flow into the instrument channel for treating an instrument therein. The instrument treatment station may accommodate arrays of aligned instruments.

Abstract: A substrate treatment apparatus comprises a treatment vessel, a substrate holder for rotating the substrate in a horizontal plane in the treatment vessel, a nozzle unit arranged in an upper part of the treatment vessel such that a liquid is downwardly fed, a feed line for feeding the liquid to the nozzle unit, and a chamber enclosing therein the apparatus in its entirety. The nozzle unit is constructed in a form of a bar such that as viewed in plan, the liquid ejected from the nozzle unit reaches the substrate with an area range having a length not smaller than a diameter of the substrate and a width smaller than the diameter of the substrate.

Abstract: The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.

Abstract: An etching/cleaning apparatus is provided, which makes it possible to effectively remove an unnecessary material or materials existing on a semiconductor wafer without damaging the device area with good controllability. The apparatus comprises (a) a rotating means for holding a semiconductor wafer and for rotating the wafer in a horizontal plane; the wafer having a device area and a surface peripheral area on its surface; the surface peripheral area being located outside the device area; and (b) an edge nozzle for emitting an etching/cleaning liquid toward a surface peripheral area of the wafer. The etching/cleaning liquid emitted from the edge nozzle selectively removes an unnecessary material existing in the surface peripheral area.

Abstract: A substrate cleaning apparatus is provided that includes a cleaning cup for receiving a to-be-cleaned substrate, a table in the cleaning cup, a first, second, and third nozzles, a pure water heating mechanism configured to supply hot pure water, a branch line, a control mechanism, and an open/close valve, provided between the branch line and the pipe, wherein the open/close valve is configured to interrupt emission of hot water from the third nozzle by opening the open/close valve to lower the pressure in the pipe.

Abstract: An eyeglass cleaning station with a wash chamber and tissue dispenser. The wash chamber has removable nozzles for adjusting spray and a primer bulb pump that operates by hand.

Abstract: The present invention is related to a method and apparatus for liquid treating and drying a substrate, such as a semiconductor wafer, the method comprising the step of immersing a substrate or a batch of substrates in a tank filled with a liquid, and removing the substrate(s) through an opening so that a flow of the liquid takes place through the opening during removal of the substrate. Simultaneously with the removal, a reduction of the surface tension of the liquid is caused to take place near the intersection line between the liquid and the substrate. For acquiring such a tensio-active effect, a uniform flow of a gas or vapor is used, or/and a local application of heat. The invention is equally related to an apparatus for performing the method of the invention.

Abstract: A self propelled fence painting system for painting a length of fence. The self propelled fence painting system includes a housing that includes a front wall, a back wall and an upper end wall that is coupled to and extends between the front and back walls. The front and back walls are spaced away from each other defining a paint spraying space between the front and back walls of the housing. In one embodiment of the present invention, a portion of the fence to be painted is positionable in the paint spraying space. A drive assembly is mounted on the front wall of the housing for driving the housing on a surface. A spraying assembly is mounted on the front and back walls of the housing for spraying paint into the paint spraying space of the housing. A plurality of guide assemblies guides the system along the length of the fence.

Abstract: An apparatus for cleaning a substrate is provided. The apparatus comprises a plurality of rollers adapted to support a substrate in a vertical orientation, a scrubber brush adapted to contact a substrate supported by the plurality of rollers, and a sonic nozzle positioned at an elevation below the elevation of the scrubber brush and adapted so as to output a sonicated fluid spray that contacts a beveled edge or a major surface of the substrate such that fluid having sufficient sonic energy to harm the scrubber brush will not contact the scrubber brush.

Abstract: The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes a chamber body having a processing cavity defined therein. A substrate is disposed in the processing cavity without contacting other chamber components by a Bernoulli effect and/or by a fluid cushion above and/or below the substrate. Fluid is flowed into the processing cavity at an angle relative to a radial line of the substrate to induce and/or control rotation of the substrate during a cleaning and drying process.

Abstract: A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.

Abstract: A novel chemistry, system and application technique reduces contamination of semiconductor wafers and similar substrates and enhances and expedites processing. A stream of liquid chemical is applied to the workpiece surface. Ozone is delivered either into the liquid process stream or into the process environment. The ozone is preferably generated by a high capacity ozone generator. The chemical stream is provided in the form of a liquid or vapor. A boundary layer liquid or vapor forms on the workpiece surface. The thickness of the boundary layer is controlled. The chemical stream may include ammonium hydroxide for simultaneous particle and organic removal, another chemical to raise the pH of the solution, or other chemical additives designed to accomplish one or more specific cleaning steps.

Abstract: A cleaning equipment for a spraying paint gun includes a container, a branch sum up, a pipeline structure, an auxiliary rock set, a coth-hook set, and a buckle structure. The pipeline structure is settled inside the container whereas the auxiliary rock set is fixed and settled on the pipeline structure. The cloth-hook set is settled on the branch sum up of the fixed container whereas the buckle structure is used to fix the brake shaft and the handle of the spraying paint gun so that inside the pipeline of the spraying paint gun it is open.

Abstract: An automotive vehicle washing system includes a frame comprising a bridge member end opposed and support sections mounted for linear reciprocating movement on spaced apart support rails. Pivoting washing nozzle support arms are mounted on the bridge section and are interconnected by a drive motor and drive pulleys to move in opposite directions to wash the sides and opposite ends of a vehicle. Each arm includes movable arm sections supporting spaced apart nozzle assemblies which may move toward each other or away from each other to size a vehicle according to its width. Each arm includes opposed elongated beam members which also provide fluid conducting passages for conducting washing fluids to the nozzle assemblies. Certain ones of the nozzle assemblies are drivenly connected to an oscillating servomotor. The servomotor is also used to position the pivoting arm sections through a lost motion coupling and a gear drive unit.

Abstract: A system for cleaning golf clubs having a detergent nozzle and rinse nozzle which move in a rectilinear fashion across the face of the golf club irons placed generally horizontally therein. The golf club irons may be placed generally horizontally in a right hand and left hand configuration such that the face of each golf club iron lies in grooves at an angle generally between 15 and 30 degrees relative to a detergent nozzle of a cleaning assembly. The generally trapezoidal lid is then closed around the golf club irons. As the lid is closed, complementary grooves form slots around the handle of the golf club irons. The golf club cleaning system may then be activated by inserting a coin into a control box . When activated, the cleaning system translates along a track assembly while the detergent nozzle imparts a stream of detergent from a detergent container to the faces of the golf club irons.

Abstract: An improved pot and pan washing machine is provided including a low suction intake manifold and a partition for capturing a substantial portion of the wash action of the washing machine within a segregated area. The intake manifold of the instant invention includes a plurality of voids having a void concentration that increases as the distance from the source of suction (such as a pump or intake inlet) increases. The partition (or divider) of the instant invention can be removed and repositioned within the wash tank through the use of channels along the walls of the wash tank that receive the partition.

Abstract: A device is disclosed for cleaning dental trays at least partly filled with a moulding material. The device has a container, a pump for placing a cleaning liquid under pressure, and a spray nozzle for spraying the pressurized cleaning liquid into the container. A method is also disclosed for cleaning dental trays at least partly filled with a moulding material.

Abstract: A device for pickling strip-shaped or wire-shaped material has guiding mechanisms for feeding and guiding the material in a serpentine path formed by several loops having vertical sections and liquid delivery devices positioned to bring the material into contact with a pickling liquid. At least two vertical pickling cells are provided in the apparatus, each with two vertical sections. Each of the individual cells are activated and deactivated optionally and independently of one another to be able to change or set the effective pickling length exactly, even in purely chemical pickling processors, and thus obtain a precisely definable, variable pickling effect, while retaining the space-saving design of the plant.

Abstract: A system for processing a workpiece includes a head attached to a head lifter. A workpiece is supported in the head between an upper rotor and a lower rotor. A base has a bowl for containing a liquid. The head is movable by the head lifter from a first position vertically above the bowl, to a second position where the workpiece is at least partially positioned in the bowl. The bowl has a contour section with a sidewall having a radius of curvature which increases adjacent to a drain outlet in the bowl, to help rapid draining of liquid from the bowl. The head has a load position, where the rotors are spaced apart by a first amount, and a process position, where the rotors are engaged and sealed against each other. For rapid evacuation of fluid, the head also has a fast drain position, where the rotors are moved apart sufficiently to create an annular drain gap.

Abstract: A sheet metal washer system for cleaning metal blanks includes a washer cassette with an open bottom that is selectively mounted on a tank assembly, a drive motor assembly and a filter assembly. The washer cassette includes an inlet opening and an exit opening with upper and lower entry rollers having a first predetermined durometer positioned adjacent to the inlet opening and upper and lower exit rollers having a second predetermined durometer positioned adjacent the exit opening. Upper and lower manifolds for delivering cleaning fluid from the filter assembly to the interior of the washer cassette are positioned between the entry and exit rollers. The sheet metal blank is cleaned by the entry rollers and dried by the exit rollers, as it passes through the sheet metal washer. The washer cassette preferably includes a safety mechanism for locking the upper entry and exit rollers into a storage position when the washer system is not in use.

Abstract: A wafer processing chamber “chamber” is provided. Broadly speaking, the chamber allows a fluid flow and a fluid pressure within the chamber to be controlled in a variable manner. More specifically, the chamber utilizes removable plates that can be configured to control the fluid flow and the fluid pressure in an inner volume within the chamber. Also, the removable plates can be used to separate the inner volume within the chamber from an outer volume within the chamber. In this manner, the removable plates can be used to create a pressure differential between the inner volume within the chamber and the outer volume within the chamber. A lower pressure in the outer volume within the chamber requires less outer chamber strength to withstand the lower pressure. A lower outer chamber strength requirement translates into an overall decrease in chamber size.

Abstract: The present invention provides a novel, curb-conforming, multi-nozzle spray nozzle apparatus and a mobile pressure washing unit to permit curb cleaning without requiring human intervention. In addition, the novel, curb-conforming, multi-nozzle spray nozzle apparatus of the present invention is configured to address a variety of curb shapes, rather than the simple straight configurations of the prior art. The combination of these two items permit a significant reduction in the time and energy required to clean the curbs and sidewalks of a large neighborhood.

Abstract: A method facilitates washing a gas turbine engine combustor. The method comprises coupling a nozzle assembly against the combustor, wherein the nozzle assembly includes an inlet end, a discharge end, a hollow nozzle body extending therebetween, and a centerbody positioned within the nozzle body, coupling the nozzle assembly to a fluid source, and discharging an annulus of fluid from the nozzle assembly into the combustor to facilitate removing particulate matter from the combustor.

Abstract: A method and a device for washing a drain pipe allowing a nozzle to be rotated along the inner peripheral surface of a pipe even in a lateral pipe, wherein the positions of a plurality of injection holes (10, 11, 12, and 13) formed in the nozzle (1) are formed and the amount of high pressure water jetted from each of the injection holes (10, 11, 12, and 13) are regulated so that the specific injection hole (10) only among the plurality of injection holes is set so as to be opposed always to the inner peripheral surface (5a) of the pipe.

Abstract: An automated kitchenware washing tank has a pump system with a pump and fluid conduits to couple the pump between an intake opening through one of the walls and discharge openings in the wall of the tank. At least some of the discharge openings are preferably formed in at least one angled portion of the tank wall that faces downwardly into the tank, and, more preferably, on two opposed angled portions that face downwardly into the tank. A control system may be coupled to the pump for controlling the speed with which the pump supplies cleaning fluid to the discharge openings. The control system comprises a speed selector that is adapted to allow a user to activate the speed selector to select between at least two different speeds for pumping the cleaning fluid to the discharge openings. In operation, the automated washing tank pumps cleaning fluid from within the tank through the intake outlet through the fluid conduits and out of the discharge openings into the tank to create turbulence within the tank.

Abstract: An improved pot and pan washing machine is provided including wash tank, a self-draining parallel flow pump connected to the wash tank, a self-cleaning intake manifold within the wash tank, flush mounted jet nozzles within the wash tank, and a non-welded field joint for connecting two portions of the washing machine together as a single unit. The pump is located on a side of the wash tank. Fluid enters the pump in a first direction and is discharged in a second direction that is substantially parallel to the first direction. The discharge fluid is unobstructed as it enters an outlet manifold located along the rear wall of the wash tank. Directional tubes of the nozzles then divert the fluid from the outlet manifold into jet streams that are directed towards the bottom wall of the wash tank. The jet streams skim across the top of the intake manifold to blow away debris.

Abstract: A method for cleaning a semiconductor substrate is provided. The method initiates with introducing a liquid onto the top surface of the semiconductor substrate. Then, a bottom surface of a resonator is coupled to a top surface of a semiconductor substrate through the liquid. Next, sonic energy is transmitted through the resonator to the liquid. Then, the liquid is heated through the bottom surface of the resonator. A method for applying localized heating to a cleaning chemistry during a cleaning operation of a semiconductor substrate is also provided. The method initiates with positioning a resonator to contact a surface of a cleaning chemistry applied to a semiconductor substrate. Then, heat energy is simultaneously applied with the sonic energy through the resonator to clean the semiconductor substrate. A device for cleaning a semiconductor substrate and system for cleaning a semiconductor substrate are also provided.

Abstract: Cleaning fluid is sprayed upwards from under a substantially horizontally-held object to be cleaned for cleaning the underside of the object. At this time, an accelerating fluid accelerates the cleaning fluid to change its spraying direction toward a surface of the object, then the cleaning fluid is sprayed onto the surface to be cleaned.

Abstract: A device for cleaning a swimming pool filter of the flexible tube type and wherein the pool may either be either of the standard backyard type or the larger commercial type pool. The flexible tubes are banded together to form a removable flexible tube nest which is inserted into the pool filter. The cleaning device of the instant invention has an inner tube having a plurality of small apertures formed there through and essentially at one end thereof and circumferentially around the tube. The opposite end of this tube has a plurality of spacers about its circumference to separate it from an outer tube into which it is inserted. An end cap having a female hose connector is disposed over this end of the inner tube. A lever type hose valve is inserted into the hose connector and water supply is connected to the hose valve.

Abstract: A container receiving dental appliances includes a pair of top and bottom members which are relatively displaceable between open and close positions of the container. Each of the members is provided with a respective plurality of apertures, so that the top and bottom members form a compartment therebetween in the closed position of the container which is traversed by a plurality of liquid streams passing through the apertures during washing of dental appliances enclosed in the container.

Abstract: A sheet metal washer system for cleaning metal blanks includes a washer cassette with an open bottom that is selectively mounted on a tank assembly, a drive motor assembly and a filter assembly. The washer cassette includes an inlet opening and an exit opening with upper and lower entry rollers having a first predetermined durometer positioned adjacent to the inlet opening and upper and lower exit rollers having a second predetermined durometer positioned adjacent the exit opening. Upper and lower manifolds for delivering cleaning fluid from the filter assembly to the interior of the washer cassette are positioned between the entry and exit rollers. The sheet metal blank is cleaned by the entry rollers and dried by the exit rollers, as it passes through the sheet metal washer. The washer cassette preferably includes a safety mechanism for locking the upper entry and exit rollers into a storage position when the washer system is not in use.

Abstract: A system for cleaning grates includes a first power wash portion for applying a pressurized wash fluid to a first side of a grate, and a second power wash portion for applying a further pressurized wash fluid to a second side of the grate. A receiving portion, which is detachable from the first power wash portion, receives the grate, and a transport arrangement transports the grate along a grate path through the first and second power wash portions. A grate delivery portion, which is detachable from the second power wash portion to enhance portability and facilitate maneuverability, delivers the grate after it has been transported through the second power wash portion. A grate drive arrangement engages mechanically with the grate and urges same along the grate path from the receiving portion to the first power wash portion.

Abstract: Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or stepped rear base. In one form, the probe is made of one piece, and in another, the rod fits into a socket in the base. This enables a rod to be made of material which is compatible with the cleaning solution, while the base may be of a different material. A heat transfer member acoustically coupled to the probe base and to a transducer conducts heat away from the transducer. A housing for the heat transfer member and the transducer supports those components and provides means for conducting coolant through the housing to control the temperature of the transducer. In another arrangement, an end of the housing is coupled between the transducer and the probe.

Abstract: Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or stepped rear base. In one form, the probe is made of one piece, and in another, the rod fits into a socket in the base. This enables a rod to be made of material which is compatible with the cleaning solution, while the base may be of a different material. A heat transfer member acoustically coupled to the probe base and to a transducer conducts heat away from the transducer. A housing for the heat transfer member and the transducer supports those components and provides means for conducting coolant through the housing to control the temperature of the transducer. In another arrangement, an end of the housing is coupled between the transducer and the probe.

Abstract: A drum washer has a base, a barrel support structure, and a water delivery system. A hollow drum is turned over and placed on the drum washer by inserting a spray head of the water delivery system through a hole in a top cover of the drum and into the interior of the drum. The barrel support structure holds the drum at a fixed angle while water is sprayed from the spray head onto interior surfaces of the drum. The water rinses the interior surfaces of the drum and drains out the hole in the top cover of the drum.

Abstract: A cookware washer includes a wash chamber, and a lower rack positioned within said wash chamber. The lower rack includes a substantially unobstructed bottom surface.

Abstract: An automated kitchenware washing tank has a pump system with a pump and fluid conduits to couple the pump between an intake opening through one of the walls and discharge openings in the wall of the tank. At least some of the discharge openings are preferably formed in at least one angled portion of the tank wall that faces downwardly into the tank, and, more preferably, on two opposed angled portions that face downwardly into the tank. A control system may be coupled to the pump for controlling the speed with which the pump supplies cleaning fluid to the discharge openings. The control system comprises a speed selector that is adapted to allow a user to activate the speed selector to select between at least two different speeds for pumping the cleaning fluid to the discharge openings. In operation, the automated washing tank pumps cleaning fluid from within the tank through the intake outlet through the fluid conduits and out of the discharge openings into the tank to create turbulence within the tank.

Abstract: Shower tubing which enhances the spray uniformity of deionized water or other rinsing fluid on multiple semiconductor wafers in a wet bench to improve uniformity in the particle-removing capability of the wet bench. Each of a pair of parallel shower tubes in a wet bench cleaning bath is fitted with multiple, closely-adjacent shower nozzles which provide a substantially uniform spray of deionized water or other cleansing or rinsing chemical to all of multiple substrates in the bath.

Abstract: A closed loop pressure washing system including a pressure washer device for pressure washing an object having a contaminant, and for recovering the the contaminant. The pressure washing system includes a supporting mechanism arranged to support the object while a washing fluid is flowed over the object to remove the contaminant. A collection arrangement is included at least partially located below the supporting mechanism. The collection arrangement is further arranged to receive raw run-off fluid from the support mechanism. A flush assembly is arranged to at least periodically impinge rinsing fluid onto the supporting mechanism to hydro-dynamically sweep the contaminants collecting on the support mechanism into the collection system.

Abstract: A scrubbing assembly for a wafer-cleaning device is provided. The wafer-cleaning device is provided with a base. The scrubbing assembly comprises a scrubber, a cup and an oscillator. The scrubber is disposed on the base in a manner such that it can move between a first position and a second position. The scrubber scrubs a wafer when it locates in the first position. The cup, for receiving DI water, is disposed on the base. The scrubber locates inside the cup and contacts the DI water when it locates in the second position. The oscillator is disposed at the cup, and it vibrates the DI water when the scrubber locates inside the cup and is contact with the DI water.

Abstract: The invention relates to a device to be used in processing of a surface of metal object to be processed which surface is essentially continuously in onwards motion. According to the invention a processing agent (1) is to be directed to the surface (5) to be processed by nozzles (6) in at least one position so that at most 70 per cent of the surface (5) to be processed is under processing in one position of directing processing agent (1).

Abstract: An eyeglass cleaning station with a wash chamber and tissue dispenser. The wash chamber has removable nozzles for adjusting spray and a primer bulb pump that operates by hand.

Abstract: An arrangement and method for the degassing small high-aspect ratio drilled holes or vias which are present in panels such as printed circuit boards prior to wet chemical processing, including copper plating of the vias, in order to remove any air or gas bubbles from the vias tending to inhibit the reliable plating thereof. This is carried out through the utilization of an ultrasonic prewetting in a liquid bath preceding cleaning for the electroless plating process, thereby enabling all of the vias or holes to be degassed; in effect, having air removed and the vias or holes filled with liquid; thereby allowing subsequent process cleansing solutions to easily flow into the respective holes or vias in order to facilitate the electroless copper plating process.

Abstract: A kind of cleaning equipment of the spraying paint gun which is comprised of a container, a branch sum up, a pipeline structure, an auxiliary rock set, a cloth-hook set, and a buckle means; The pipeline structure is settled inside the container whereas the auxiliary rock set is being fixed and settled on the pipeline structure; the cloth-hook set is settled on the branch sum up of the fixed container whereas the buckle means is used to fix the brake shaft and the handle of the spraying paint gun so that inside the pipeline of the spraying paint gun it is open; by means of the assemble layout of the direct-flowing spraying vent and the frozy spraying vent standing vertically or with inclination on the pipeline structure and after the cleaning solvent is being injected into the pipeline structure, the purpose of fully cleaning up the paint solution resides in the inner pipeline of the spraying paint gun could be fulfilled.