Abstract: To provide an ultrasonic processing device that is capable of effectively carrying out a cleaning operation, a resist-stripping operation, etc. by projecting ultrasonic uniformly over an entirety of the ultrasonic processing target region by means of ultrasonic oscillation elements each having a width smaller than an ultrasonic processing target region of a processing object, as well as to provide an electronic parts fabrication method using the foregoing device, a plurality of ultrasonic oscillation elements are arranged so as to planarly extend in a glass substrate transport direction and in a glass substrate width direction, and projected figures obtained by projecting said ultrasonic oscillation elements to a plane perpendicular to the glass substrate transport direction form a single belt-like region of a width exceeding a width of the ultrasonic processing target region.

Abstract: The invention is a foot washer comprising; a coupler valve capable of attachment to a shower outlet, a main hose coupled with the coupler valve to allow feeding of water from the coupler valve through the main hose, a hollow frame capable of receiving a flow of water from a main hose, one or more nozzles capable of spraying water from the hollow frame, whereby a user placing a foot near the frame can receive a foot washing.

Abstract: This invention relates to an installation for pickling a metal band by immersion through at least one bath (3) filled with a pickling liquid contained in a tank (1). According to the invention, each tank (1) is provided with at least one row of injection nozzles (5) distributed longitudinally and supplied with pressurized pickling liquid in order to make at least one series of liquid jets reaching inside the bath (3), whereas the said nozzles (5) are placed at different levels matching the shape of the curve followed by the band (2) in the tank (1) so that the liquid jet injected into the bath (3) by each nozzle (5) is directed straightforwardly to the portion (23) of the band (2) passing in front of the nozzle in question.

Abstract: A cleaning device for cleaning individual items of cutlery includes a liquid-proof container having spray nozzles with a supply line within the liquid-proof container through which a cleaning fluid is able to be sprayed, the container having a base with an outlet and an aperture through which an item of cutlery is able to be partially inserted into the container for cleaning. The spray nozzles within the container are, preferably, stationary relative to the item of cutlery being cleaned and directed so that the cleaning fluid strikes the item of cutlery inserted into the container for cleaning with a control device for controlling the supply of the cleaning fluid passing through the supply line to the spray nozzles. There is at least one slot in the top side of the cleaning device, so that the item of cutlery can be stored in close proximity to the liquid-proof container.

Abstract: A floating cleaning device that cleans marine growth from float and skirt type oil booms. The cleaning device is a floating platform with ramps at the front and rear with tracks that guide the movement of the oil boom past a series of spray washers supplied with pressurized water to remove the marine growth from the oil boom.

Abstract: An apparatus and a method for removing coating layers from the top of alignment marks on a wafer are described. The apparatus includes a cleaning chamber that is a cavity and a lid member suspended in the cavity, a wafer chuck that is rotatably mounted in the lid member for holding a wafer in an upside down position such that the alignment marks are facing downwardly, and at least two solvent dispensing arms mounted in an outer peripheral area of the lid member that are immediately adjacent to the chuck for dispensing a flow of solvent upwardly toward the active surface of the wafer when the wafer is held in a stationary position, each of the at least two solvent dispensing arms are positioned corresponding to a position of one of the alignment marks.

Abstract: The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes an upper plate, a lower plate and a gas manifold disposed there between. A substrate is disposed in the processing cavity without contacting other chamber components by a Bernoulli effect and/or by a fluid cushion above and/or below the substrate. Fluid is flowed into the processing cavity at an angle relative to a radial line of the substrate to induce rotation of the substrate during a cleaning and drying process. A cleaning process involves flowing one or more fluids onto a surface of the substrate during its rotation. One-sided and two-sided cleaning and drying is provided.

Abstract: A washer for use in industrial applications includes a housing with a series of opposing spray nozzles. Material to be processed entering the housing is suspended between the opposing spray nozzles under fluid pressure and, by virtue of the angle of the opposing spray nozzles, the material is both transported and cleaned on its way through the washer.

Abstract: An automotive vehicle washing system includes a frame comprising a bridge member end opposed and support sections mounted for linear reciprocating movement on spaced apart support rails. Pivoting washing nozzle support arms are mounted on the bridge section and are interconnected by a drive motor and drive pulleys to move in opposite directions to wash the sides and opposite ends of a vehicle. Each arm includes movable arm sections supporting spaced apart nozzle assemblies which may move toward each other or away from each other to size a vehicle according to its width. Each arm includes opposed elongated beam members which also provide fluid conducting passages for conducting washing fluids to the nozzle assemblies. Certain ones of the nozzle assemblies are drivenly connected to an oscillating servomotor. The servomotor is also used to position the pivoting arm sections through a lost motion coupling and a gear drive unit.

Abstract: A decontamination device (10) includes a washing chamber (12) defined by a series of sidewalls. Upper and lower shelves (30, 32) are horizontally disposed within the washing chamber. The lower shelf is a rigid non-removable structure divided into three washing sections (42, 44, 46). The upper shelf is disposed vertically above the lower shelf and is slidably mounted within the washing chamber. The upper shelf comprises first, second, and third washing sections (82a, 82b, 82c) and a channel (78) operatively connected to the three shelf sections. The channel provides cleaning solutions to the shelf sections. Each of the washing sections and the shelf sections receive a spindle header (50) having a series of spindles (58) over which glassware is placed. A sealing connector, disposed on each washing section and shelf section, registers with and seals around a manifold of the spindle header and provides cleaning solutions from the channel to the spindle header.

Abstract: An arrangement for cleaning the mirror element of an outside rear view mirror is disclosed. The arrangement includes a washing nozzle, which is disposed in the region of the outside rear view mirror on a motor vehicle and from which a jet of a cleaning liquid may be discharged. The position of the mirror element (1) relative to the body of the motor vehicle is variable, whereas the washing nozzle (9) is connected in a fixed manner to the body. To improve the cleaning action of the washing to nozzle (9), the mirror element (2) may be adjusted between a normal position, in which the driver may observe the traffic behind him in the mirror element (2), and a cleaning position, in which an advantageous angle for cleaning, in particular a steep angle arises between the mirror plane of the mirror element (2) and the jet of cleaning liquid.

Abstract: A drum washer has a base, a barrel support structure, and a water delivery system. A hollow drum is turned over and placed on the drum washer by inserting a spray head of the water delivery system through a hole in a top cover of the drum and into the interior of the drum. The barrel support structure holds the drum at a fixed angle while water is sprayed from the spray head onto interior surfaces of the drum. The water rinses the interior surfaces of the drum and drains out the hole in the top cover of the drum.

Abstract: A cookware washer includes a wash chamber, and a lower rack positioned within said wash chamber. The lower rack includes a substantially unobstructed bottom surface.

Abstract: A system for processing a workpiece includes a head attached to a head lifter. A workpiece is supported in the head between an upper rotor and a lower rotor. A base has a bowl for containing a liquid. The head is movable by the head lifter from a first position vertically above the bowl, to a second position where the workpiece is at least partially positioned in the bowl. The bowl has a contour section with a sidewall having a radius of curvature which increases adjacent to a drain outlet in the bowl, to help rapid draining of liquid from the bowl. The head has a load position, where the rotors are spaced apart by a first amount, and a process position, where the rotors are engaged and sealed against each other. For rapid evacuation of fluid, the head also has a fast drain position, where the rotors are moved apart sufficiently to create an annular drain gap.

Abstract: An eyewear cleaning apparatus for removing particles from the lenses of eyewear includes a housing having a bottom wall, and an outer wall including a first end wall, a second end wall, a first side wall and a second side wall. A compartment is positioned in the housing adjacent to the first end wall. A pump is positioned in the compartment. A container is positioned in the compartment and is fluidly coupled to the pump. A delivery pipe is fluidly coupled, to the pump and extends around the interior of the housing. A first pair of nozzles is in communication with the delivery pipe and extend toward the second end wall. A second pair of nozzles is in communication with the delivery pipe and extend toward the first end wall. A first mount is positioned in the housing and is adapted for receiving a bridge portion of eyewear.

Abstract: An improved pot and pan washing machine is provided including wash tank, a self-draining parallel flow pump connected to the wash tank, a self-cleaning intake manifold within the wash tank, flush mounted jet nozzles within the wash tank, and a non-welded field joint for connecting two portions of the washing machine together as a single unit. The pump is located on a side of the wash tank. Fluid enters the pump in a first direction and is discharged in a second direction that is substantially parallel to the first direction. The discharge fluid is unobstructed as it enters an outlet manifold located along the rear wall of the wash tank. Directional tubes of the nozzles then divert the fluid from the outlet manifold into jet streams that are directed towards the bottom wall of the wash tank. The jet streams skim across the top of the intake manifold to blow away debris.

Abstract: A reticle having a pellicle frame and pellicle membrane is cleaned without removing or damaging the pellicle membrane. A cover encases the pellicle membrane and pellicle frame, sealing the pellicle from the external environment during a cleaning process. The cover fits around the periphery of the pellicle frame and covers the pellicle membrane. An edge of the cover in contact with the reticle forms a seal. The reticle is fastened to reticle supports on a spin chuck during the cleaning process. An anchor plate presses the cover to the reticle, maintaining the pellicle sealed from the external environment. The cover and reticle are sandwiched together between the anchor plate and spin chuck.

Abstract: The invention is a foot washer comprising; a coupler valve capable of attachment to a shower outlet, a main hose coupled with the coupler valve to allow feeding of water from the coupler valve through the main hose, a hollow frame capable of receiving a flow of water from a main hose, one or more nozzles capable of spraying water from the hollow frame, whereby a user placing a foot near the frame can receive a foot washing.

Abstract: A semiconductor deposition system in accordance with the present invention includes a CMP apparatus operative to planarize an active surface of a semiconductor wafer, and a wafer cleaner for cleaning wafer after the CMP process. The wafer cleaner preferably includes a wafer rotating mechanism, a steam inlet for applying steam to the active surface of the wafer as it is rotated and a liquid inlet for simultaneously applying a liquid to the back side surface of the wafer. A method for manufacturing an integrated circuit in accordance with the present invention includes subjecting an active surface of the wafer to a plurality of processes selected from a group including deposition, patterning, doping, planarization, ashing and etching, and steam cleaning the active surface at least once before, during, and after the plurality of processes. Preferably, an aqueous vapor phase is applied to the first surface of the wafer as an aqueous liquid phase is applied to the other surface of the wafer.

Abstract: A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.

Abstract: A nozzle applies fluid (e.g., heated gas) to a solder region of a circuit board component having a set of fluid-delivery edges and a set of fluid-escape edges. The nozzle includes a top member to connect with a fluid source, and a set of fluid-delivery side members coupled to the top member. Each fluid-delivery side member extends from the top member and around a respective fluid-delivery edge of the circuit board component when the circuit board component engages with the nozzle. Each fluid-delivery side member defines (i) at least a portion of a fluid-delivery channel that extends from a vicinity adjacent the top member toward the solder region of the circuit board component when the circuit board component engages with the nozzle, and (ii) a barrier that substantially prevents fluid from escaping from the solder region along the respective fluid-delivery edge for that fluid-delivery side member.

Abstract: A circuit board-washing device includes a pair of elongated upper and lower spraying casings located directly over and fixed relative to a tank, which contains a detergent that is forced into the casings. Each of the casings has a chamber and a horizontal wall, which is formed with two longitudinal rows of holes that are in fluid communication with the chamber. The walls of the casings define a washing space therebetween for movement of a horizontal circuit board therethrough in a transverse direction of the casings. The space is slightly wider than the board. The detergent is sprayed from the casings onto the board via the holes, and subsequently falls into the tank for recycle.

Abstract: A water pump normally used in a system circulating pool water through a filter cartridge 26 is used to clean the filter cartridge by coupling a 3-way or inline valve 32 and a tee 36 in the piping 12 between the pump 16 and the filter. In a first valve position, the filter housing receives the entire water output from the pump, and in a second position, the entire water output of the pump is diverted to a flexible hose 52 secured to a first water discharge wand 58. A circular ring-shaped manifold 64 with an array of discharge apertures 66 directs streams of water radially outward into the filter cartridge in a direction opposite the normal flow of water for hydraulically flushing debris from the filter cartridge. A second wand with a C-shaped manifold (FIG. 5) is then connected to the hose and used to direct water streams onto the outer periphery of the filter cartridge.

Abstract: The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes a chamber body having a processing cavity defined therein. A substrate is disposed in the processing cavity without contacting other chamber components by a Bernoulli effect and/or by a fluid cushion above and/or below the substrate. Fluid is flowed into the processing cavity at an angle relative to a radial line of the substrate to induce and/or control rotation of the substrate during a cleaning and drying process.

Abstract: An apparatus for cleaning a substrate has a process bowl that has a first circumferential zone and a second circumferential zone. That apparatus also has a support located in the process bowl that supports a substrate, and a megasonic transmitter located in the first circumferential zone. The apparatus also comprises a cleaning liquid dispenser that includes an outlet. The dispenser is mounted on the process bowl and is configured to apply liquid to a surface of the substrate through the outlet. The dispenser is positioned in the second circumferential zone. The first circumferential zone and the second circumferential zone are selected to minimize non-uniformity of the propagation of megasonic energy caused by the dispensing of cleaning liquid onto the substrate.

Abstract: Objects of the present invention lies on reduction of washing water quantity, and pressure loss of the washing water to the maximum by improving a flow passage of a medical instrument washer.

Abstract: The present invention is directed to a manifold for temporarily blocking the air intake of the compressor section of a combustion turbine to facilitate cleaning. A manifold suitable for providing a temporary seal about the air intake of the compressor section and through which a foamed cleaning solution can be pumped is disclosed. The manifold is conveniently provided as a flexible manifold body having an inflatable tubular member along the periphery thereof for sealing with the air intake and a plurality of hose connections through which a foamed cleaning solution can be delivered to the compressor section of the combustion turbine. Particulate films and contaminants adhering to the internal components of the compressor section of a turbine are readily removed by pumping a foamed cleaning solution such as a foamed, aqueous surfactant solution through the manifold and into the compressor section.

Abstract: A system and process for removing unwanted fibers from a forming fabric during a wet papermaking process is disclosed. The system includes a scarfing shower configured to emit a cleaning fluid that contacts the forming fabric. In particular, the cleaning fluid tangentially contacts the forming fabric while the forming fabric is being guided around a turning roll. Preferably, the cleaning fluid is emitted in a direction that is opposite to the direction at which the forming fabric is moving.

Abstract: Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or stepped rear base. In one form, the probe is made of one piece, and in another, the rod fits into a socket in the base. This enables a rod to be made of material which is compatible with the cleaning solution, while the base may be of a different material. A heat transfer member acoustically coupled to the probe base and to a transducer conducts heat away from the transducer. A housing for the heat transfer member and the transducer supports those components and provides means for conducting coolant through the housing to control the temperature of the transducer. In another arrangement, an end of the housing is coupled between the transducer and the probe.

Abstract: A swimming pool filter cleaning device including a cylindrical ring-like housing having an upper end, a lower end, an inner surface and an outer surface defining a central opening. The housing has a hollow interior. The housing is dimensioned for receiving a cylindrical pool filter within the central opening thereof. The housing has a water hose connector extending outwardly from the inner surface thereof. The water hose connector is in communication with the hollow interior. The water hose connector has an open outer end adapted for coupling with a standard water hose. A first set of spray nozzles are disposed within the upper end of the housing in a spaced relationship. The first set of spray nozzles are in communication with the hollow interior of the housing.

Abstract: A process and apparatus for locally removing any material, such as a refractory metal, in particular tungsten, from any desired area of a wafer, such as an alignment mark area of a silicon wafer in process during the formation of integrated circuits thereon.

Abstract: An apparatus for cleaning golf clubs having an enclosure with a lower reservoir for holding water and an upper spray chamber in communication with said lower reservoir. The spray chamber houses a cleaning path for cleaning golf clubs. The cleaning path is defined by a plurality of opposingly spaced bristle brushes with a plurality of high pressure spray nozzles strategically located between the bristle brushes. A low volume/high pressure pump is utilized for providing highly pressurized fluid to the spray nozzles. Golf clubs are inserted along the cleaning path of the apparatus wherein all portions of the golf club are cleaned through the use of the bristle brushes and the high pressure spraying of fluid.

Abstract: The present invention provides a method of cleaning a plurality of machine frames including the steps of positioning a plurality of directional nozzles near and oriented toward the surface of the machine frames at selected heights relative thereto and simultaneously and continuously spraying a cleaning solution from the directional nozzles onto the machine frames. The present invention further includes rinsing the machine frames by spraying water from the directional nozzles onto the machine frames, and allowing the machine frames to dry. In the preferred embodiment of the present invention, the cleaning solution and water are heated, and sprayed onto the machine frames at a varying flow rate and spray pattern to allow for a more complete application of the cleaning solution and water onto the machine frames.

Abstract: A frame for rinsing scuba equipment comprises a lower portion having a base, an external water connection, and a hose connection, lower vertical support members which also carry water to a middle portion having an article rinsing unit, equipment supporting arms, and a BCD rinsing unit, an upper portion being supported by a water carrying vertical support member and including a hanger unit for vertically suspending a body garment, and a water outlet having a nozzle that provides an oscillating spray pattern reaching the interior of the body garment.

Abstract: A closed-loop pressure washing system including a pressure washer device for pressure washing an object having a contaminant, and for recovering the contaminant. The pressure washing system includes a supporting mechanism arranged to support the object while a washing fluid is flowed over the object to remove the contaminant. A collection arrangement is included at least partially located below the supporting mechanism. The collection arrangement is further arranged to receive raw run-off fluid from the support mechanism. A flush assembly is arranged to at least periodically impinge rinsing fluid onto the supporting mechanism to hydro-dynamically sweep contaminants collecting on the support mechanism into the collection arrangement.

Abstract: A high pressure pump (14) supplies cleaning fluid from a reservoir (12) to spray nozzles (20) inside a washing chamber (10). The spray nozzles (20) spray the cleaning fluid over a load to be cleaned. Used cleaning fluid is collected in a sump (30). A sump pump (32) drains the sump. The combination of the high pressure pump and sump pump provides more efficient cleaning of the load and eliminates the requirement for a deep sump beneath the washer. A vertical traveler (22), having a pair of counterbalanced spray arms (24), raises and lowers the spray nozzles counter cyclically; a detergent injection system (50) accurately meters a correct amount of detergent is added to the cleaning fluid; and a filtration device (34) filters suspended material from the used cleaning fluid and uses a portion of the cleaning fluid to clean itself.

Abstract: A reticle having a pellicle frame and pellicle membrane is cleaned without removing or damaging the pellicle membrane. A cover encases the pellicle membrane and pellicle frame, sealing the pellicle from the external environment during a cleaning process. The cover fits around the periphery of the pellicle frame and covers the pellicle membrane. An edge of the cover in contact with the reticle forms a seal. The reticle is fastened to reticle supports on a spin chuck during the cleaning process. An anchor plate presses the cover to the reticle, maintaining the pellicle sealed from the external environment. The cover and reticle are sandwiched together between the anchor plate and spin chuck.

Abstract: An apparatus for disinfecting a user's hands has a spray chamber or an open spray zone with an opening for a user to insert his or her hands into the chamber. A supply of a disinfecting solution is provided, and preferably comprises a storage tank with a concentrated solution. This solution is mixed with an incoming freshwater supply, e.g. in a venturi valve, and supplied through spray nozzles into the chamber. A sensor detects the presence of a user's hands and automatically operates the spray nozzles for a predetermined time. The apparatus can also include a fan with its own timer, to provide a supply of drying air. Thus, a user can insert his or her hands, disinfect them with the disinfecting solution, remove the hands and dry them, without requiring any manual operation.

Abstract: An apparatus for cleaning dried photoresist from a photoresist dispensing nozzle. The tip of the photoresist dispensing nozzle is inserted through an opening in a nozzle base. A catch pan is positioned beneath the nozzle base. A solvent dispensing needle is inserted through an opening in the catch pan to face the photoresist dispensing nozzle tip and sprays solvent onto the photoresist dispensing nozzle tip. The catch pan collects the solvent and dissolved photoresist particles. The catch pan includes a drain for draining the solvent and the dissolved photoresist particles.

Abstract: A cleaning device which washes each of the components of a paint sprayer from the correct angle to ensure that all residue is properly removed. The invention provides a mechanism for aligning cleaning nozzles with the components of the paint sprayer. Holding devices precisely position components of the paint sprayer such that they align the components to be cleaned with adapters happening solvent spray nozzles. Each holding device is aligned with individual spray nozzles that spray cleaning fluid onto surfaces from which paint is to be removed. Adjustable spray nozzles are provided which allow the cleaning device to be adjusted such that the it can be used with paint sprayers having different configurations. An alternative embodiment provides a kit assembly that can be retrofitted to a conventional cleaning machine. Alternatively, the device may be used with other tools which are disassembled prior to cleaning.

Abstract: A load station is used in a planarizing machine to perform several useful functions related to handling of a wafer. By centering the wafer with respect to a spindle carrier the load station interrupts the accumulation of positional errors. The load station never makes solid contact with the wafer, but instead the wafer is continually levitated on three cushions of water that are directed upwardly against the lower face of the wafer. The presence of the wafer partially impedes the flow of water from the nozzles used for levitation causing an increase in the water pressure immediately upstream of the nozzles. This increased pressure is sensed and used as an indicator of the presence of a wafer at the load station. The load station further includes a nozzle that directs a stream against the lower side of the wafer so as to elevate the wafer from the load station into the carrier.

Abstract: The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes an upper plate, a lower plate and a gas manifold disposed there between. A substrate is disposed in the processing cavity without contacting other chamber components by a Bernoulli effect and/or by a fluid cushion above and/or below the substrate. Fluid is flowed into the processing cavity at an angle relative to a radial line of the substrate to induce rotation of the substrate during a cleaning and drying process. A cleaning process involves flowing one or more fluids onto a surface of the substrate during its rotation. One-sided and two-sided cleaning and drying is provided.

Abstract: A denture wash for more thoroughly and easily cleaning dentures. The denture wash includes a lower assembly comprising a bottom wall, four walls, a plurality of nozzles, a first central nozzle, and a pump, a upper unit assembly comprising a lid, four walls, a plurality of nozzles, and a second central nozzle, and a denture holding assembly.

Abstract: The hollow article cleaning apparatus comprisis a positioning means for positioning a hollow article to be cleaned in a fixed position, a plurality of cleaning medium injecting means movably disposed between an open position separated from a plurality of cleaning openings of said hollow article disposed by said positioning means and an intimate contact position that is in intimate contact with said cleaning openings for injecting a cleaning medium from said cleaning openings, a plurality of driving means for moving each of said cleaning medium injecting means between said open position and said intimate contact position, a cleaning medium supplying means for supplying said cleaning medium comprising a mixture of a cleaning liquid and a compressed air to each of said cleaning medium injecting means, and a control means for bringing each of said cleaning medium injecting means into intimate contact with said plurality of cleaning openings of said hollow article alternately for a fixed time, and for operating sa

Abstract: An apparatus for cleaning a substrate comprises a spin chuck for holding a substrate substantially horizontally a rotation driving mechanism for rotating the spin chuck, a lower nozzle having a plurality of liquid outlet ports facing both a peripheral portion and a center portion of a lower surface oaf the substrate held by the spin chuck, a process liquid supply mechanism for supplying a first process liquid to the lower nozzle, and a controller for controlling operations of the process liquid supply mechanism and the rotation driving mechanism, individually, in which the controller controls the rotation driving mechanism to rotate the spin chuck and controls the process liquid supply mechanism to supply a first process liquid to the lower nozzle, thereby outputting the first process liquid toward the peripheral portion and the center portion of the lower surface of the substrate.

Abstract: A steam washing device comprising a metal body having a recess housing the part to be washed, the recess being provided with ducts for introducing the steam into the recess and discharging it from the recess; there being provided three ducts for introducing the steam and one for discharging the steam; the recess being defined by a wall of a sleeve provided with through holes communicating the recess with a steam expansion chamber; one of the ducts being adapted to introduce the steam into the expansion chamber, whereas the remaining two ducts are adapted to introduce the steam into the recess; a slit opening in the chamber forming a steam sucking duct that in turn is connected with the system exhaust duct.

Abstract: An apparatus and method for removing contaminants from the probe tip of a coordinate measurement machine. The apparatus includes a cleaning chamber and a number of spray nozzles arranged to direct a cleaning solution onto the probe tip from multiple directions. The spray nozzles are adjustable to vary the distance between the head of each nozzle and the probe tip. A photoelectric sensor is provided to detect the presence of the probe tip within the cleaning chamber. A control valve is opened in response to detection of the probe tip to selectively deliver a cleaning fluid to the spray nozzles. A timer selectively controls the commencement and/or the duration of the spray cycle. The cleaning solution preferably comprises a mixture of compressed air and isopropyl alcohol, intermixed by a fluidic mixer. The mixer is preferably adjustable to regulate the amount of isopropyl alcohol intermixed with the compressed air.

Abstract: An apparatus for processing a workpiece in a micro-environment is set forth. The apparatus includes a rotor motor and a workpiece housing. The workpiece housing is connected to be rotated by the rotor motor. The workpiece housing further defines a substantially closed processing chamber therein in which one or more processing fluids are distributed across at least one face of the workpiece by centripetal acceleration generated during rotation of the housing.

Abstract: An apparatus and method are provided for cleaning (removing) contaminating particles and/or films from substrate surfaces such as semiconductor wafers during the fabrication process for making electronic components. The method and apparatus use a liquified gas contained in a distributor which has been energized with megasonic energy in the distributor and the energized liquefied gas directed as a stream against the surface to be cleaned from an outlet distribution nozzle of the distributor. The stream is preferably impinged on the substrate surface at an acute angle. The preferred liquified gas is carbon dioxide.

Abstract: Disclosed herein are novel devices and methods for cleaning filters, preferably pool filters. The subject device and methods provide the advantages of cleaning the entire circumference of a cylindrical pool filter while minimizing the spray of water and debris onto the operator.