Abstract: An acid pickling tank 11 is filled with an acid liquid L, and a lid 12 is attached to the acid pickling tank 11. A central part of the lid 12 is depressed downwards to form a covering portion 12b. The covering portion 12b is located at a lower position than the liquid level of the acid liquid L in the acid pickling tank 11 to cover a free surface of the acid liquid L. Immersion guide rolls 20a to 20e are provided on the covering portion 12b, support blocks 21a to 21e are provided at the bottom of the acid pickling tank 11, and skids 23a to 23e are provided on the support blocks 21a to 21e via a bottom plate 22. Thus, the free surface of the acid liquid L in the acid pickling tank 11 is decreased to suppress a loss of the acid, and prevent an overflow of the acid liquid L to the outside of the tank, thereby making acid pickling of the strip steel plate S efficient.

Abstract: A spraying device that is readily assembled and suitable for use with all types of curtains. The device includes two upper metal sheets and one supply line for both nozzle strips. An external holding device, such as a suction member, is used to support the device. The construction of the nozzle and nozzle strips provide a homogeneous cleaning of the entire length of the curtain.

Abstract: The disclosure of this application relates to a new and innovative method and apparatus for removing a variety of contaminants from soil, sediment, fine sand and clay. The disclosure describes an apparatus in which contaminated material that is comprised of particles having a size less than about 5 mm in diameter are injected into a zone of discharge from one or a number of nozzles. These nozzles are positioned to discharge liquid or cleaning fluid at a pressure from about 2000 psi to about 20,000 psi. The cleaned material is then collected and separated into liquid and solid phases. The solids, when cleaned by the use of this apparatus, can then be returned to the site without danger of contamination of the surrounding area and no disposal costs are incurred for disposition of contaminated soil.

Abstract: A method including the consecutive steps of: dipping a wafer in a washing solution in a washing chamber; replacing the washing solution by a first chemical solution in the washing chamber receiving therein the wafer, the first chemical solution including at least one chemical; dipping the wafer in the first chemical solution after stopping the replacing; and replacing the first chemical solution by a second chemical solution including the at least one chemical and having a concentration lower than a concentration of said first chemical solution. The number of the particles remaining on the wafer is significantly reduced compared with a conventional method to improve the removing rate of the particles deposited onto the wafer.

Abstract: An acid pickling tank body 11 is partitioned with a partition wall 12 into a first tank 13 and a second tank 14. The first tank 13 and the second tank 14 are filled with acid liquids L1 and L2, respectively, of different concentrations. A lid 15 is attached to the top of the acid pickling tank body 11. On the lid 15, immersion guide rolls 25a to 25d, 26a to 26d are mounted. On the bottom surface of the first tank 13 and the second tank 14, skids 31a to 31e, 32a to 32d are mounted via support blocks 27a to 27e, 28a to 28d. A liquid seal 22 is provided which has a cushion nozzle 38 for jetting the acid liquids L1 and L2 toward the surface of a strip steel plate S. traveling above the partition wall 12 for the first tank 13 and the second tank 14.

Abstract: A high pressure pump (14) supplies cleaning fluid from a reservoir (12) to spray nozzles (20) inside a washing chamber (10). The spray nozzles (20) spray the cleaning fluid over a load to be cleaned. Used cleaning fluid is collected in a sump (30). A sump pump (32) drains the sump. The combination of the high pressure pump and sump pump provides more efficient cleaning of the load and eliminates the requirement for a deep sump beneath the washer. A vertical traveler (22), having a pair of counterbalanced spray arms (24), raises and lowers the spray nozzles counter cyclically; a detergent injection system (50) accurately meters a correct amount of detergent is added to the cleaning fluid; and a filtration device (34) filters suspended material from the used cleaning fluid and uses a portion of the cleaning fluid to clean itself.

Abstract: Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or stepped rear base. In one form, the probe is made of one piece, and in another, the rod fits into a socket in the base. This enables a rod to be made of material which is compatible with the cleaning solution, while the base may be of a different material. A heat transfer member acoustically coupled to the probe base and to a transducer conducts heat away from the transducer. A housing for the heat transfer member and the transducer supports those components and provides means for conducting coolant through the housing to control the temperature of the transducer. In another arrangement, an end of the housing is coupled between the transducer and the probe.

Abstract: A cleaning apparatus in accordance with the present invention includes a first inflow section, provided on a first side surface of a cleaning tank having a substantially rectangular parallelopiped shape, having two inflow openings, a second inflow section, provided on a second side surface facing the first side surface, having inflow openings, and outflow openings for releasing a cleaning liquid flown in from the first and second inflow sections. The cleaning liquid flowing in from the inflow openings forms complex and strong flows in the cleaning tank, thus removing contaminants on a cleaning target evenly and efficiently without nonuniformity and preventing stagnation of the cleaning liquid in the cleaning tank. The cleaning liquid released in filtered by a circulatory section and is allowed to flow into the cleaning tank again through a pipe.

Abstract: The improved rinse tank includes an external shell and an internal shell. For one embodiment, the external shell preferably defines a five sided open-top tank with a top open to the atmosphere. The internal shell is preferably disposed within the external shell and has a configuration that will accommodate at least two semiconductor wafer boats filled with six inch semiconductor wafers. The external shell is preferably sized large enough to completely immerse the wafer boat and wafers in water when the rinse tank is filled. A chamber may be formed between the external shell and the internal shell within the lower portion of the rinse tank. Two or more deionized water inlets may be provided at the bottom of the rinse tank at opposite corners. Three or more compressed air nozzles may also be provided at the lower portion of the rinse tank. Multiple deionized water jet ports are provided at the internal shell.

Abstract: A cleaning system and method utilizing sonic whistle and other agitation methods to enhance the soil removal and mass transport capacity of the liquid carbon dioxide at low process temperatures. Agitation devices disposed in or couple to a cleaning chamber, and cause the liquid carbon dioxide to ultrasonically emulsify and disperse non-miscible liquids or insoluble solids, such as remove low solubility oils and greases. Cleaning is accomplished at temperatures between −68° F. and 32° F., and the temperature of the liquid carbon dioxide is typically below 32° F.

Abstract: To provide an ultrasonic processing device that is capable of effectively carrying out a cleaning operation, a resist-stripping operation, etc. by projecting ultrasonic uniformly over an entirety of the ultrasonic processing target region by means of ultrasonic oscillation elements each having a width smaller than an ultrasonic processing target region of a processing object, as well as to provide an electronic parts fabrication method using the foregoing device, a plurality of ultrasonic oscillation elements are arranged so as to planarly extend in a glass substrate transport direction and in a glass substrate width direction, and projected figures obtained by projecting said ultrasonic oscillation elements to a plane perpendicular to the glass substrate transport direction form a single belt-like region of a width exceeding a width of the ultrasonic processing target region.

Abstract: A device for cleaning a nasal coagulator or similar instrument. The nasal coagulator is of the type that has a generally cylindrical sidewall defining a bore, in which char or the like accumulates. The device has a generally cylindrical sidewall which defines a chamber, and a flared trumpet-like ending. A prong is located within the chamber, and two slit apertures are foxed in the sidewall to communicate the chamber and the exterior of the device. In use, the coagulator is inserted into the cleaning device so that that the prong loosens any char, and the coagulator is rotated so that the char exits the slit apertures.

Abstract: A object processing system is disclosed. The object processing system includes processing modules for performing process steps on objects, and hydrodynamic transport chutes coupled between the processing modules for transporting the object in a substantially touchless manner between the processing modules. Each substantially touchless hydrodynamic transport chute includes a transfer slot formed between two walls. Formed in the walls and directed into the transfer slot are support nozzles angled towards the output side of the transfer slot for creating fluid flow and fluid bearings in the transfer slot and urging objects through the transfer slot. In addition, induction nozzles are formed in the walls near the input side of the transfer slot for inducing objects into the input side of the transfer slot. A base supports the first and second walls and is grooved in substantial alignment with the transfer slot for receiving and bottom-centering objects in the transfer slot.

Abstract: The invention encompasses method and apparatus for cleaning screen used in screen printing machine for printing of solder paste onto a surface of a printed circuit board. The apparatus includes two upper and lower cleaning chambers 4, 5 which are provided on upper and lower sides of the screen 2 in opposed relationship with each other in such a manner that the two chambers are in watertight contact with the upper and lower surfaces 2A, 2B, of screen 2, respectively and are communicated with each other through openings 2C in the screen 2. The upper and lower cleaning chambers are essential components of the apparatus for carrying out cleaning the solder paste residue adhered to inner peripheral surfaces of the openings 2C in the screen 2 as well as the solder paste residue adhered to the upper and lower surfaces 2A, 2B from the screen 2. A wash liquid supply means is provided for supplying wash liquid into each of the chambers 4, 5 to wash away the past residues adhered to the screen 2.

Abstract: A toy car wash apparatus includes a plurality of hollow tubes and a plurality of hollow connectors for connecting the tubes together to form a framework having an open front and open back. The apparatus includes an adapter for connecting the apparatus to a water source under pressure. A plurality of water nozzles are coupled to various tubes for dispensing water into an interior space defined by the framework. An actuator is rotatably coupled to each nozzle such that rotation of the actuator selectively adjusts the flow of water dispensed from the nozzle. A pair of wheels are pivotally attached to one end of the framework which in a vertical position for permitting lateral and longitudinal placement of the apparatus. The wheels are pivotally retractable for allowing the framework to bear against a ground surface following placement of the framework. A variety of other water dispensing devices can be mounted to the framework.

Abstract: In a spin dryer for semiconductor wafers, the wafer is held beneath a platen with its active side (i.e., the side containing the components or circuitry) facing upward. One or more nozzles spray rinse water on the top surface of the wafer and the wafer is rotated to remove the excess rinse water, thereby drying the wafer. A splash guard adjacent the edge of the wafer insures that the excess rinse water thrown off by the spinning wafer is deflected downward where it cannot again come into contact with the active side of the wafer. The platen is rotated dry at the same time, with no rinse water being splashed back onto the active side of the wafer. The spin dryer also includes a separate section which cleans and dries the end-effector of the robot which inserts the wafer into the spin dryer while the wafer is being dried.

Abstract: An etching apparatus for etching a printed circuit board includes a transport mechanism for horizontally transporting a printed circuit board in a transporting direction so that a height of the printed circuit board during etching is kept at a transport position, a plurality of upper spray nozzles for injecting an etchant to a top surface of the printed circuit board transported by the transport mechanism, and a plurality of lower spray nozzles for injecting an etchant to a bottom surface of the printed circuit board. In the etching apparatus, a flow rate of the etchant injected to the top surface of the printed circuit board is made greater than a flow rate of the etchant injected to the bottom surface of the printed circuit board by an arrangement of the upper spray nozzles and the lower spray nozzles.

Abstract: A storage apparatus for photoresist dispensing nozzles has solvent inlets positioned directly opposite the nozzles when the nozzles are in their home positions. Photoresist cleaning solvent is introduced through these inlets at periodic intervals and directly applied on the nozzles to keep them clean.

Abstract: A double side cleaning apparatus includes a pair of roll-like brushes and at least one cleaning brush. The roll-like brushes are driven to rotate in opposite directions, and a semiconductor wafer is arranged between them in a non-contact manner. The cleaning brush is arranged near the pair of roll-like brushes. While the semiconductor wafer is arranged between the pair of roll-like brushes and its upper and lower surfaces are being cleaned, the cleaning brush brushes the side surface of the semiconductor wafer. A cleaning agent is supplied from the pair of roll-like brushes to the semiconductor wafer to clean it. Since the upper and lower surfaces of the semiconductor wafer are cleaned in a non-contact manner, dust can be removed efficiently (within a short period of time and a small space).

Abstract: A cleaning mechanism for mold devices includes one or more rails for slidably supporting a slide. An actuator is coupled to the slide for moving the slide along the rails. The slide may be releasably coupled to the actuator by a latch. A heating device is disposed on the slide for supporting and for heating the mold devices. One or more nozzles are disposed in the housing for supplying water or cleaning agent or pressurized air into the housing and for cleaning the mold devices. A rotating device may further be used for rotating the nozzles.

Abstract: A cleaning apparatus and method in accordance with the present invention includes a first inflow section, provided on a first side surface of a cleaning tank having a substantially rectangular parallelopiped shape, having two inflow openings, a second inflow section, provided on a second side surface facing the first side surface, having inflow openings, and outflow openings for releasing a cleaning liquid flown in from the first and second inflow sections. The cleaning liquid flowing in from the inflow openings forms complex and strong flows in the cleaning tank, thus removing contaminants on a cleaning target evenly and efficiently without nonuniformity and preventing stagnation of the cleaning liquid in the cleaning tank. The cleaning liquid released in filtered by a circulatory section and is allowed to flow into the cleaning tank again through a pipe.

Abstract: The present invention provides an apparatus for cleaning semiconductor workpieces following a Chemical Mechanical Planarization ("CMP") procedure. Initially, a workpiece is scrubbed to remove some of the slurry material and other contaminants on the surfaces of the workpiece. Next, the workpiece is transported into a chemical-etch cleaning station wherein the workpiece is positioned horizontally such that both the upper and lower surfaces are substantially exposed. The workpiece then is immersed in a cleaning solution which is moved around the various surfaces of the workpiece. The workpiece is immersed in the cleaning solution for a sufficient length of time to remove an appropriate layer of oxide, thereby removing contaminants and smoothing micro scratches from the surfaces of the workpiece.

Abstract: A particulate removal system has for its purpose to remove settled material from vessels and tanks such as those common to the petroleum industry. system comprises means of suspending settled particulate material and evacuating the material in such a manner so as not to disturb overlying liquid layers.

Abstract: A vehicle washing apparatus of the gantry type is adapted to reciprocate linearly along the length of a vehicle. Both upper washing mechanisms and side washing mechanisms are tiltably mounted on the gantry so as to tilt around the front and rear of the vehicle for optimal cleansing thereof. Pairs of fixed spray nozzles for delivering a pre-soak solution are positioned along each side and the top of the apparatus with one nozzle in each pair being angled rearwardly relative to a vehicle to spray the front and a side of the vehicle and another nozzle in each pair being angled forwardly relative to a vehicle to spray the rear and a side of the vehicle. An auxiliary delivery system for a paint conditioner or the like is disposed on the gantry for delivering the solution to the sides and top of the vehicle in horizontal rows and may be delivered in different colors for aesthetic purposes. The paint conditioner can be rinsed from the vehicle with the tiltable washing mechanisms.

Abstract: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.

Abstract: In a spin dryer for semiconductor wafers, the wafer is held beneath a platen with its active side (i.e., the side containing the components or circuitry) facing upward. One or more nozzles spray rinse water on the top surface of the wafer and the wafer is rotated to remove the excess rinse water, thereby drying the wafer. A splash guard adjacent the edge of the wafer insures that the excess rinse water thrown off by the spinning wafer is deflected downward where it cannot again come into contact with the active side of the wafer. The platen is rotated dry at the same time, with no rinse water being splashed back onto the active side of the wafer. The spin dryer also includes a separate section which cleans and dries the end-effector of the robot which inserts the wafer into the spin dryer while the wafer is being dried.

Abstract: This invention concerns a novel pickling apparatus for removing oxides from the surface of a plurality of parallel laterally spaced wires, continuously moving axially through an enclosed pickling area. The pickling area encompasses one or more sections of turbulent hot acid (hydrochloric or other) pickling liquor submerging the wires. Each section essentially comprises a flooded turbulent processing tray, corrosion resistant centrifugal re-circulating pump, lower reservoir tank and wire wiping components. The pickling fluid is pumped from the lower reservoir tank into the processing tray through laterally (with respect to wire direction) mounted headers. Each header has a plurality of holes to discharge the fluid into the process tray in highly turbulent manner. Weirs at each end of the tray support the wires and flood the tray.

Abstract: In a warewashing machine, a power wash zone is adapted to function either in a pot washing mode or in a warewashing mode. A valve controls the flow of water into an upper manifold. In the pot washing mode when the flow of water into the upper manifold is decreased, the flow into a lower manifold is correspondingly increased. This results in an increase flow rate and pressure striking a pot.

Abstract: A shoe cleaning device using liquid sprays and including a housing with a base portion and two side portions. The side portions are spaced from each other and extend upwardly from the base portion to form a U-shaped opening through the housing. In the preferred embodiment, rollers support the user's shoe as it is moved through the housing. Crisscrossing, upwardly directed sprays then strike and clean the shoe bottom while downwardly directed side sprays clean the shoe sides. Any portions of the upwardly directed, crisscrossing sprays not striking the user's shoe are captured in the opposing side portions and directed into the base portion. In this manner, the bottoms and sides of the user's shoes can be effectively cleaned without getting the user's leg or the tops of the shoes wet.

Abstract: An improved apparatus for washing foodstuffs is provided. The invented apparatus utilizes hydro-energy to sufficiently clean a number of different types of foodstuffs processed thereby, while effectively using water circulating therethrough. The apparatus is configured to clean various types of foodstuffs ranging from different plant products to fish, such as sardines. The apparatus comprises a product loading assembly coupled to a cleansing flume, that is coupled to an overflow assembly. The loading assembly comprises a conical receiving section having a plurality of spray nozzles positioned about its inner periphery to form a turbulent water flow therethrough, that completely submerges product as it passes through the assembly. The conical receiving section ensures that a maximum product-water mixture is achieved to form a slurry that optimizes water usage and quickly cleans the product.

Abstract: A continuous-flow warewashing apparatus that includes: a substantially rectangular tub having four side walls and a floor; a pump; a tub outlet channel coupled between the tub and the inlet port of the pump for providing fluid communication between the tub interior and the pump; and an array of outlet nozzles, where each of the outlet nozzles are in fluid communication with the outlet port of the pump and extend into the tub interior so as to provide a continuous-flow of washing fluid into the tub. A substantial portion of the outlet nozzles are positioned substantially along a first one of the side walls and pointed towards a second one of the side walls immediately adjacent to the first one of the side walls, such that the nozzles are adapted to jet fluid in a whirlpool-like manner substantially about the perimeter of the tub.

Abstract: Contaminants are removed from oil well components by high pressure jets of hot water. The water and removed contaminants are retained and moved by suction to a holding tank for environmentally acceptable disposal. Rod strings move through a housing assembly which is attached to the pumping tee of the well. Nozzles in the housing assembly apply the water. The water and contaminants are sucked from an outlet in the lower bell cap of the housing assembly. The nipple in the bell cap extends upward at least to the upper edge of the bell cap to prevent water and contaminants from entering the well. Suction is provided by a suction pump which draws air from the holding tank. To decontaminate a tube one end of the tube is sealed off and a tee fitting assembly is attached to the other end. A nozzle fitting on a hose (termed a snake) propels itself through the tube as it removes contaminants. The contaminants and water from the nozzles exit through the tee fitting into a hose to the holding tank.

Abstract: Apparatus for removing a ceramic core from a casting in a relatively rapid manner wherein the casting and a fluid spray nozzle are disposed in a manner to expose a region of the core to a core dissolving fluid discharge of the nozzle and a core dissolving fluid is discharged from the nozzle toward the core region to contact the core region and dissolve core material therefrom and progressively from further regions of the core within the casting as they become exposed as core material is progressively removed. The discharge of fluid from the nozzle can be interrupted periodically to allow dissolved core material and fluid to drain from inside the casting or, alternately, the casting and nozzle can be relatively moved so that the casting can drain and/or forced air can be directed at the casting to this same end at a location spaced apart form the nozzle.

Abstract: In an apparatus for treating an article comprising a treatment bridge with a head beam which is arranged above the article and two side beams which are arranged at the sides of the article and extend transversely to the head beam, and delivery devices which are arranged on the beams for respectively directing at least one treating agent at the article, in order to improve the transportability of the bridge, it is proposed that the side beams of the bridge be pivotable from a working position in which they stand transversely to the head beam to a resting position in which they are arranged parallel to the head beam.

Abstract: An apparatus and method for washing, drying, and/or otherwise cleaning or processing flexible, substantially planar sheets is provided. The apparatus includes a guiding means for receiving at least one sheet and guiding the sheet through the apparatus; a plurality of rollers which rotate to move the at least one sheet through the apparatus and provide tension to the sheet for processing; and one or more cleaning stations or processing chambers for processing (such as washing, rinsing, and drying) the at least one tensioned sheet. The method and apparatus are particularly suitable for cleaning reusable tier sheets used to separate layers of stacked articles.

Abstract: The present invention relates to a wafer cleaning machine having an input station, a water track, a cleaning station, a rinsing station, a spin-dry station, and a load station. The input station includes two or more wafer supply areas for a continuous supply of wafers to the water track. After the wafers enter the water track from the input station, the wafers are transported down the track into the wafer cleaning station. The wafer cleaning station comprises a plurality of pairs of rollers which pull the wafers through the cleaning station and thereby clean the top and bottom flat surfaces of the wafers. A one-piece cleaning fluid manifold formed within the upper panel of the cleaning station facilitates effective distribution of the cleaning fluid to the rollers. From the cleaning station, the wafers are transported to a rinse station. From the rinsing station, the workpieces are transferred to a dual spin-dry station.

Abstract: A fully automatic eyeglass cleaning apparatus includes a vessel partially filled with a cleaning fluid, wherein a mechanism is included to accept and hold a pair of eyeglasses to be cleaned. The mechanism lowers the eyeglasses into the volume of fluid, and provides for a duration of vibratory cleaning activities (within the volume of fluid). Subsequently the eyeglasses are raised above the volume of fluid and are then dried by the application of directed streams of heated air that impinge upon the eyeglasses. After sufficient periods of time are provided for fluidic cleaning and drying, the eyeglasses are raised and may be removed from the mechanism by a user.

Abstract: A wafer processing apparatus is provided and includes a wafer carrier positioned in a processing vessel and arranged to support a plurality of wafers within the processing vessel such that the wafers define respective wafer gaps between adjacent wafers. A drive assembly is arranged to position respective processing plates in the respective wafer gaps such that respective major plate surfaces oppose respective major wafer surfaces. The processing plates are arranged to initiate a wafer processing operation.

Abstract: An improved and simplified apparatus and method for washing leafy plant products is provided. The invented apparatus utilizes hydro-energy for sufficiently cleaning plant products being processed thereby, while effectively using water recirculating therethrough. The apparatus comprises a plant product loading assembly coupled to a cleansing flume. The loading assembly comprises a conical receiving section having a plurality of spray nozzles located about the periphery thereof to form a turbulent water flow through the loading assembly that completely submerges plant product disposed in the receiving section. This ensures that a maximum amount of plant product mixes with the water to form a slurry that optimizes water usage and quickly cleans the product. The flow rate of the water flowing through the spray nozzles does not damage the plant product. The configuration of the loading assembly inhibits collection of debris for maintaining sanitation of the apparatus.

Abstract: A blank material washing booth includes a chamber for washing a blank material with a washing liquid. The chamber has a pair of upper and lower vacuum rolls for removing a used washing liquid. The washing booth also has a liquid droplet collecting device which is positioned upstream of a mist collecting device and removes a mist generated when the blank material is washed under a high pressure. The chamber has a swingable door at an inlet and an outlet for the blank material so as to achieve improved seal.

Abstract: A hand sanitizing apparatus which uses at least two electrostatic emitters to dispense germicidal fluid to substantially all the surfaces of a user's hands when both hands are placed in proximity to the electrostatic emitters. The apparatus comprises a frame on which are mounted electrostatic emitters in preferably two cells which separate spray directed at one hand from spray directed at the other hand, a reservoir of germicidal fluid in fluid communication with the electrostatic emitters, a power source adapted to supply electrostatic energy to the electrostatic emitters, and a dispensing cycle actuator which is operated by the user to distribute electrostatic energy from the power source to the electrostatic emitters so that a predetermined quantity of germicidal fluid is directed from each electrostatic emitter toward each of the user's hands during the dispensing cycle. In one embodiment each hand is sprayed with an opposite charge.

Abstract: The present invention provides a screen plate cleaning station having nozzles for discharging a cleaning liquid to clean a screen plate which has been set in place, the station comprising a hood-like cleaning zone setting means which are provided on both sides of the screen plate in such a manner that their extremities are in contact with the both surfaces of the screen plate, thereby defining substantially equal cleaning zones on the both sides to prevent the cleaning liquid discharged from the nozzles from scattering.

Abstract: A cleaning system and method utilizing sonic whistle agitation to enhance the soil removal and mass transport capacity of the liquid carbon dioxide at low process temperatures. Sonic whistles are within a cleaning chamber, and liquid carbon dioxide is forced out of the sonic whistle jets to ultrasonically emulsify and disperse non-miscible liquids or insoluble solids, such as remove low solubility oils and greases, in the liquid carbon dioxide contained in the cleaning chamber. Cleaning is accomplished at temperatures between -68.degree. F. and 88.degree. F., and the temperature of the liquid carbon dioxide is typically below 32.degree. F.

Abstract: Produce, whether vegetable and/or fruit, is supported upon a screen basket (18) suspended within a closed cabinet (12). Each of a plurality of nozzles (334) disposed about the basket (18) emits a filled cone (338) of washing fluid (333) to scour the produce and to dislodge by agitation and flotation debris therefrom. After filtering of the washing fluid (333) through a screen (30) in the cabinet (12), the washing fluid is recycled by a pump (84) pumping the washing fluid (333) from a collection trough (80) to the nozzles (334). Preferably, the washing fluid (333) is slightly acidic.

Abstract: A development processing apparatus includes a processing unit for storing a substrate S and a processing solution supply nozzle arranged above the substrate S stored in the processing unit. A processing solution storage is formed inside the supply nozzle. A supply passage for supplying the processing solution into the solution storage is connected to the supply nozzle. A plurality of eject holes for ejecting the processing solution in the solution storage are formed in a lower surface of the supply nozzle. In this processing apparatus, the upper surface of the solution storage consists of at least one inclined surface, and an exhaust port is formed in a high portion of the inclined surface.

Abstract: Two similar representative versions of an eye glass cleaning machine constructed in accordance with the principles of the invention are seen. In each version an enclosure providing a base having a bowl forming an eye glass cavity supports a pair of eye glasses to be cleaned by means of adjustable clips. In the first version of the invention, a heated cleaning fluid and waste fluid tank and a rinse water tank are filled by a two-way drain valve. In the second version, a heated cleaning fluid tank, a rinse water tank and a waste tank are filled by a three-way drain valve. In both versions of the invention, an electronics card controls the operation of a pump, air pump and a solenoid valve, which determines from which tank (cleaning fluid or rinse water) the fluid supplied to spray nozzles will be taken. The electronics also controls heating elements in the cleaning fluid and rinse water tanks.

Abstract: Novel rinse troughs accomplish thorough uniform rinsing. The troughs are suitable for one or more essentially planar objects having substantially the same shape. The troughs ensure that each surface is rinsed uniformly. The new troughs provide uniform rinse fluid flow over the objects' surfaces to accomplish a more thorough rinse than prior art troughs.

Abstract: The invention relates to a device for cleaning a moving transport belt in a papermaking machine, for instance a dry or wet wire belt or a felt belt, having at least one nozzle which can be directed against the transport belt for spraying the woven belt with liquid or gaseous fluid. A suction chamber 18 surrounds and cooperates with the cleaning nozzle (8), so that dirt and/or water mist detached by the nozzle jet (27) from the transport belt (4) or residual water are drawn into the suction chamber (18) and led away, avoiding dirtying or contamination of the nearby area.

Abstract: The present invention is a pad scrubber that cleans the planarizing surface of a polishing pad used in CMP processing of semiconductor wafers. The pad scrubber has a fluid manifold, a first nozzle attached to one side of the manifold, and a second nozzle attached to another side of the manifold. The first nozzle directs a first fluid stream generally outwardly toward a peripheral edge of the pad, and the second nozzle directs a second fluid stream generally outwardly to the peripheral edge of the pad and also toward the first fluid stream. The first and second fluid streams converge on the planarizing surface of the pad to separate accumulated waste matter from the polishing pad and to create a contained stream of separated particles that flows across the planarizing surface to the peripheral edge of the pad.

Abstract: A continuous-flow pot and pan washing system comprising a frame; a substantially rectangular tub mounted on the frame, where the side walls of the tub are shorter in length than the back and front walls of the tub; a pump mounted to the frame; a tub outlet channel coupled between the back wall of the tub and an inlet port of the pump, providing fluid communication between the tub interior and the pump; a manifold mounted to a first one of the sidewalls, having a manifold inlet coupled to, and a fluid communication with, the outlet port of the pump; and an array of outlet nozzles extending from the manifold, through the sidewall and into the tub interior, where a substantial portion of the outlet nozzles are angled towards one of the front or back walls such that the nozzles are adapted to jet fluid in a whirlpool-like manner substantially about the perimeter of the tub. Preferably the nozzle array includes nozzles positioned at least two vertical levels.