Abstract: In a method and apparatus for cleaning the front surface of a mounted lens a web is moved to a lowered position against the lens. A first segment of the web is then slackened. The first segment of web is then rubbed against the lens. Following the rubbing the web is pulled taut while the web is still in the lowered position. A second segment of web can be wiped against the lens while the web is held taut. The first segment can be wet and the second segment dry.

Abstract: A cleaning container and method for using the same for chemically cleaning elongated members including quartz thermocouple sleeves including a first body member and a second body member said first body member and second body member respectively forming a first containing space and a second containing space including a first means for reversibly compressively sealing the first body member and the second body member to a form a combined containing space for sealably holding a cleaning solution level; a cap member disposed at a distal end of the first body member said cap member including a second means for reversibly compressively sealing a first opening in communication with the first containing space; and, a second opening centrally disposed in a distal end of the second containing space said second opening including a third means for reversibly compressively sealing around at least one elongated member penetrating through said second opening.

Abstract: Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a substrate, and a sonic box in the processing chamber for supplying sonic waves substantially perpendicularly to the substrate. The sonic box may comprises a membrane, and a transducer coupled to the membrane.

Abstract: A rinsing lid for a wet bench cleaning chamber used in the rinsing of acids, chemicals and/or particles from semiconductor wafers. The rinsing lid includes a lid housing having an upper water reservoir for receiving a stream of deionized water or other cleaning liquid. A water distribution plate is provided in the lid housing beneath the water reservoir. Small water openings extend through the water distribution plate at the water inlet end, and large water openings extend through the water distribution plate at the opposite end, of the lid housing. A nozzle plate provides multiple nozzle openings in the lid housing beneath the water distribution plate. The large water openings at the end of the lid housing opposite the water inlet end compensate for diminishing water pressure along the length of the lid housing, providing water sprays of uniform force and volume.

Abstract: A retainer for supporting gun parts in an ultrasonic bath is provided with a plurality of supports that retain such gun parts in positions whereby cleaning of such parts by ultrasonic means is optimized. The retainer supports are specifically configured to maximize the removal of dirt and debris from gun parts, and certain supports are adjustable to accommodate a variety of gun makes and models. The retainer is also constructed to prevent direct contact between gun parts, which might otherwise result in unnecessary wearing at such contact locations.

Abstract: A method and a device for producing an adhesive surface on a substrate which can be bonded to another substrate. In an implementation, the technique includes treating the surface of the substrate by wet chemical etching to remove an oxide layer and to provide a hydrophobic surface, and exposing the etched hydrophobic surface to a gaseous ozone atmosphere to provide a dry hydrophilic surface. A device for producing an adhesive surface on a substrate according to an implementation includes a bath with an etchant for removing an oxide layer from the surface of the substrate and to produce a hydrophobic surface, and a container having an inner volume that surrounds the bath. The inner volume also includes a gaseous ozone atmosphere to produce a dry hydrophilic surface.

Abstract: A household dishwasher that includes a drain pan designed to relocate leaking fluids to an observable location. The dishwasher is a standard dishwasher with a drain pan for collecting water that unintentionally falls from the interior of the dishwasher. The drain pan is angled for diverting the collected water to a predetermined location exterior to the household dishwasher where an occupant of the household may view the water.

Abstract: The apparatus includes a sponge capable of having a fluid therein. The sponge has a first surface that can be placed in contact with the coating. High and low frequency transducers are positioned in contact with the second surface of the sponge. A method performing the invention includes the steps of providing a sponge having a first surface for contact with the substrate, providing ultrasonic transducers in contact with a second surface of the sponge opposite from the first surface, saturating the sponge with water to provide a path of water extending from the transducers to the substrate, and activating the transducers to generate (i) a low frequency acoustic field; and (ii) a high frequency acoustic field; and thereby (iii) micron-sized vapor or cavitation bubbles which impinge upon the paint on the substrate to remove the paint from the substrate.

Abstract: A method and apparatus for connecting an engine flushing system for flushing the lubrication system of an engine having a detachable engine lubricant filter, with the detachable lubricant filter having an engine lubricant outlet portion and an engine lubricant inlet portion contained within a casing of the detachable engine lubricant filter is disclosed, which may comprise at least one flushing system connection unit adapted to connect the flushing system to at least one of the engine lubricant inlet portion and engine lubricant outlet portion of the detachable lubricant filter through the casing of the detachable engine lubricant filter.

Abstract: Improved immersion vessel configurations for treatment of precision manufactured devices such as semiconductor wafers are provided. In one aspect, an immersion vessel is provided wherein the sidewalls of the immersion vessel are less than about 10 mm from the major surfaces of the wafer or wafers. In another aspect, an immersion vessel provided with a megasonic transducer has a cleaning zone that is progressively smaller in width from the area proximal to the transducer to the area that is distal from the transducer. In another aspect, an immersion vessel is provided having at least one movable sidewall to provide variable volume capacity of liquid in the vessel. In another aspect, a self-cleaning wafer liquid treatment system is provided having a plurality of cascade chambers.

Abstract: A container receiving dental appliances includes a pair of top and bottom members which are relatively displaceable between open and close positions of the container. Each of the members is provided with a respective plurality of apertures, so that the top and bottom members form a compartment therebetween in the closed position of the container which is traversed by a plurality of liquid streams passing through the apertures during washing of dental appliances enclosed in the container.

Abstract: A removable cartridge for a detergent dispensing system for a dishwasher comprising: a storage unit containing a plurality of cylindrical or spherical detergent tablets arranged in two or more rows with curved surfaces of adjacent tablets touching such that when the cartridge is upright the tablets will move under gravity towards a transfer station, a transfer station comprising ejection means to eject a tablet from the transfer station through a transfer port out of the cartridge, a transfer seal associated with the transfer port to prevent ingress of moisture into the cartridge.

Abstract: Ozone gas having a high ozone concentration is generated by a solid electrolyte electrolytic process. An ozone solution is prepared by injecting the ozone gas into an acidic solution of pH 6 or below. The ozone solution heated at a temperature in the range of 50° to 90° C. is supplied to a contaminated object to oxidize and dissolve a chromium oxide film by an oxidizing dissolving process. The ozone solution used in the oxidizing dissolving process is irradiated with ultraviolet rays to decompose ozone contained in the ozone solution, the ozone solution is passed through an ion-exchange resin to remove ions contained in the ozone solution. An oxalic acid solution is supplied to the contaminated object to dissolve an iron oxide film by a reductive dissolving process.

Abstract: A second housing whose center portion is depressed and whose end portion around the center portion is formed like a visor is arranged around a first housing whose center portion is depressed and whose end portion around the center portion is formed like a visor, and a hollow portion is formed between the first housing and the second housing by sandwiching a packing between the end portions of the housings. Further, degassed water for preventing empty heating is filled in the hollow portion, and an ultrasonic transducer is placed on the surface of the center portion of the first housing. A weight for preventing the vibration of the wall is provided on the wall surface of the second housing. Since the vibration of the wall of the housing is suppressed by the weight, vibration energy returns toward the bottom surface of the center of the housing through water and is radiated from the bottom surface efficiently as ultrasonic waves.

Abstract: Arrangement for improving the drying performance of an automatic dish washer

Abstract: A retaining device for a steam swab includes a first primary clamp, a second primary clamp and an auxiliary clamp. Each of the first primary clamp, the second primary clamp and the auxiliary clamp are respectively pivotal relative to the upper casing and are provided with bosses so that a fabric of the steam swab is able to be securely clamped by the first primary clamp, the second primary clamp and the auxiliary clamp.

Abstract: Based on an insert (1) having insert compartments (4, 5, 6) separated from one another by separating walls (7, 8), according to the invention at least two insert compartments (4, 5; 5, 6) are provided with compartment floors (4′, 5′; 5′, 6′), arranged in different heights, for loading different silverware pieces (2, 3) and/or small dishes. Overall, the insert (1) embodied according to the invention leads to essentially improved drying results compared to conventional solutions for the silverware pieces (2, 3) and/or small dishes loaded into the insert. The silverware pieces (2, 3) and/or the small dishes may, depending on their respective length/size/shape, be loaded into the insert compartment (4, 5, 6) having the corresponding compartment floor (4′, 5′, 6′), positioned in a suitable height, so that they stand on the compartment floor and are no longer required to be hung.

Abstract: Insert for a dish basket of an automatic dish washer Based on an insert having openings (9) for the penetration of dish washing liquid (10), limited by ridges (1, 2, 3, 4) in-plane crossing at crossing points (5, 6, 7, 8), ridges (1, 2, 3, 4) are embodied according to the invention at the crossing points (5, 6, 7, 8) in such a sloped manner, that they are provided with a rhomb shaped cross-section. Due to the rhomb shaped profile of the ridges (1, 2, 3, 4) embodied in a sloped manner a type of double pyramid (12) is formed, by which the dish washing liquid (10) can autonomously run off downwards over the sloped planes provided on all sides of the rhombus, particularly in the critical locations. Thus, the residue of the dish washing liquid (10) on horizontal planes and numerous contact points is avoided, particularly at the crossing points (5, 6, 7, 8.

Abstract: The present invention provides a cleaning equipment provided with a cleaning solution tank, a cleaning solution supply route for supplying the cleaning solution stored in the cleaning solution tank to a cleaning bath, a cleaning solution return route for returning the cleaning solution that has been supplied to the cleaning bath to the cleaning solution tank, a gas supply route for supplying a purge gas into the cleaning solution tank, and a gas discharge route for discharging the purge gas from the cleaning solution tank. Moreover, a cleaning solution discharge opening of the cleaning solution return route is immersed in the cleaning solution stored in the cleaning solution tank.

Abstract: A method using atomic hydrogen for removing carbon contamination from optical surfaces. The method is particularly useful for removing carbon and hydrocarbon contamination in-situ from the surface of the multilayer optics used for extreme ultraviolet lithography (EUVL) without degrading the quality of the optical surface. Atomic hydrogen at pressures in the range of about 10−3 and 10−4 Torr without the potentially detrimental heating of the optic is used to provide cleaning rates of about 6-60 Å/hr.

Abstract: A decontamination device (10) includes a washing chamber (12) defined by a series of sidewalls. Upper and lower shelves (30, 32) are horizontally disposed within the washing chamber. The lower shelf is a rigid non-removable structure divided into three washing sections (42, 44, 46). The upper shelf is disposed vertically above the lower shelf and is slidably mounted within the washing chamber. The upper shelf comprises first, second, and third washing sections (82a, 82b, 82c) and a channel (78) operatively connected to the three shelf sections. The channel provides cleaning solutions to the shelf sections. Each of the washing sections and the shelf sections receive a spindle header (50) having a series of spindles (58) over which glassware is placed. A sealing connector, disposed on each washing section and shelf section, registers with and seals around a manifold of the spindle header and provides cleaning solutions from the channel to the spindle header.

Abstract: A dishwasher having the advantage of fast interrupt of the operation of its dishwasher components is disclosed. The dishwasher has an openable cabinet and a washing compartment disposed within the openable cabinet. The dishwasher further includes a handle associated with the openable cabinet for opening the cabinet to provide access to the washing compartment and a sensor in operative communication with the handle such that when a user grasps the handle, the sensor senses the user's presence prior to opening the cabinet so that operation of the dishwasher can be interrupted.

Abstract: A single piece tub support and frame for a dishwasher has a unitary support member that includes a pair of laterally spaced U-shaped upright end portions and an intermediate inverted U-shaped upright portion. The intermediate portion fits over the top and sides of the dishwasher tub rearwardly adjacent the front flange portion thereof. When the U-shaped end portions clear the bottom wall of the tub, they resiliently spring inward into supporting positions under the bottom wall. The unitary support member greatly reduces the number of components required, reduces manufacturing time and cost, and maintains the tub in its designed shape.

Abstract: The clipper oil stand has a reservoir for containing a suitable oil for cleaning, lubricating, disinfecting, and scenting the blades of a hair clipper. The reservoir has at least one sidewall and a bottom wall for containing the oil, and a cover attached to the sidewall by a hinge. A well having sloped sidewalls and a perforated bottom wall depends from the cover. A sloped cradle is mounted on top of the cover. The hair clippers are placed in the cradle, blade end downwards, the clipper blades extending through an opening in the bottom of the cradle so that oil filling into the well from the reservoir cleans and lubricates the hair clipper blades.

Abstract: An improved dishwasher is provided with a lower rack, a middle rack, and an upper rack. Each rack has a spray arm associated therewith. A fourth spray arm may also be provided for enhanced cleaning of objects in the racks. The lower rack is a low profile tineless rack for holding flat and shallow objects. The middle and upper racks have bottom portions sloping in opposite directions so as to accommodate larger items, such as dinner plates, in each rack. The middle and upper racks are independently vertically adjustable with respect to one another.

Abstract: In one aspect, a dishwasher comprising a controller coupled to a human machine interface comprising an indicator corresponding to a dishwasher model type is described. The dishwasher further comprises a cabinet comprising a tub having a front opening and forming a wash chamber, at least one rack extending into the wash chamber, a water pump for pumping water into the dishwasher, and a door engaged to the cabinet for closing the tub front opening. The controller is configured to control operation of at least the pump based on the model type indicator.

Abstract: A dishwasher basket for storing at least one valve of toddler training cups in a dishwasher for cleaning. The dishwasher basket is assembled by a top shell and a bottom shell. The dishwasher basket is attached to a top rack of the dishwasher by a basket attachment right above the water jet source, such that cleaning effect is enhanced by the pressure generated by the water jet. In another aspect, a soaking container is disclosed, suitable for soaking the dishwasher basket and its contents. The soaking container has a suction cup affixed to its bottom to thereby anchor the container to a counter top or similar surface. Also, the soaking container has a lid to prevent foreign material from falling into the soaking solution and to limit spillage of the soaking solution. The soaking container advantageously facilitates cleaning of the valves.

Abstract: A dishwasher basket, having an upper compartment providing a common storage area for various types of accessories and a lower compartment particularly designed for storing baby bottle nipples. The lower compartment has two trays so structured that nipples rest therein with a specific angular orientation to achieve optimal cleaning effect. The dishwasher basket further has a spinning storage compartment insertable between the tray underneath the upper compartment. The spinning storage compartment has at least one rotor therein to rotate about the central axis thereof. The spinning storage compartment may be used to store small articles such as valves of toddler training cups. The angular orientation of the valves relative to the water jet is varied as the rotor rotates, such that the valves can be thoroughly cleaned.

Abstract: A dishwasher basket for storing at least one valve of toddler training cups in a dishwasher for cleaning. The dishwasher basket is assembled by a top shell and a bottom shell. The top shell and bottom shell are substantially symmetrical to each other. At one part of the peripheries, the top and bottom shells are hinged with each other. At the opposing part of the peripheries, a latching means is formed, such that the dishwasher basket can be open for loading or unloading the valves, and close to securely lodging the valves therein for cleaning in the dishwasher. The dishwasher basket is attached to a top rack of the dishwasher by a basket attachment right above the water jet source, such that cleaning effect is enhanced by the pressure generated by the water jet.

Abstract: A dish-cleaning appliance comprising a sink defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid onto the dish rack to effect the cleaning of any dishes along the rack. The lid is mounted to the sink and is movable to selectively cover the open top of the bowl. A latch is provided to hold the lid in the closed position. The latch comprises a catch and a strike, with the strike having an integrated handle resulting in a small form factor.

Abstract: The invention is directed to a cleaning device (RV) with a housing (1) and with a cleaning bath (8) for receiving an appliance of personal use, in particular a shaving head (S) of a shaving apparatus (R), with a replaceably arranged cleaning liquid container (3) having an inlet port (15) and an outlet port (18), a sealing element (51) for sealing the outlet port (18), a liquid impelling assembly (6) adapted to be driven by a motor (5) for propelling a cleaning liquid (11) from the cleaning liquid container (3) into the cleaning bath (8) whose draining conduit (9) is adapted to be coupled to an inlet port (15) of the cleaning liquid container (3), wherein provision is made for a sealing element (14) between the draining conduit (9) and the inlet port (15), and the flow cross section of the draining conduit (9) is dimensioned such as to enable the cleaning liquid (11) with contaminants to drain into the cleaning liquid container (3) and gaseous medium to escape from the cleaning liquid container (3).

Abstract: A dishwashing machine comprises a stationary housing with an open front face and at least two structures for supporting wash load items. The support structures are able to slide horizontally with respect to the housing through the open front face of the housing. At least one of the support structures is capable of sliding horizontally jointly with a door, which closes the open front face of the housing, and is adapted to move in a substantially vertical direction along an inner surface of the door. The inner surface of the door is able to accommodate the front bulk of at least another one of the remaining support structures.

Abstract: A machine for cleaning a die by using electrolysis and ultrasonic vibration which has in combination a degreasing processing system, an electrolytic-cleaning system with an electrolyte circulator system, and a rinse system. The die, in a container, is dipped into an electrolytic liquid tank with an ultrasonic vibrator, and it is electrolyzed in a cleaning medium for large sized dies and die components.

Abstract: A new apparatus is provided that can be applied to clean outer edges of semiconductor substrates. Under the first embodiment of the invention, a brush is mounted on the surface of the substrate around the periphery of the substrate, chemicals are fed to the surface that is being cleaned by means of a hollow core on which the cleaning brush is mounted. The surface that is being cleaned rotates at a relatively high speed thereby causing the chemicals that are deposited on this surface (by the brush) to remain in the edge of the surface. Under the second embodiment of the invention, a porous roller is mounted between a chemical reservoir and the surface that is being cleaned, the surface that is being cleaned rotates at a relatively high speed. The chemicals that are deposited by the interfacing porous roller onto the surface that is being cleaned therefore remain at the edge of this surface thereby causing optimum cleaning action of the edge of the surface.

Abstract: Dishwashing machine comprising an outer casing (1) and a loading door (6) which is adapted to only close by means of sliding motions in a direction that is substantially perpendicular to the open front face of the washing vessel of the machine. Within the thickness of the door (6) there are accommodated functional and hydraulic component parts (30, 15, 20, 25, 35, 5, 22, 36). Of some of these component parts, the portions requiring to be reached by the user are arranged along the upper edge (10) of the door (6).

Abstract: A vapor vent for use with an industrial washing machine that increases heat performance of the industrial washing machine by removing vapors from outside two sets of curtain structures rather than in between the curtain structures. The design of the vapor vent is such that vapors and/or steam are extracted from the outer surface of the outer curtain structures proximate the openings of a conveyor type washer without extracting heat from the internal cavity of the housing unit. The vapor vent achieves this by being mounted externally from the vent cowl so as to suction vapors and/or steam that have escaped the outermost curtain, outer curtain structure. This is an improvement upon the old design that withdrew vapors as well as heat from within the machine because the vent is mounted into the vent cowl and has a detrimental effect on the heat performance of the machine.

Abstract: A shield or deflector for a dishwashing machine rack is disclosed. The deflector has a bottom wall and a front wall that permits food particles to be caught or deflected away from the floor when the rack extends beyond the door of the dishwashing machine when the door is in an open position. The deflector is removably or permanently mounted on the rack.

Abstract: The present invention relates to a wrap around booster (10), and more specifically, the present invention relates to a wrap around booster (10) for use with a high temperature dishwashing machine (40). The wrap around booster (10) heats the water of the dishwashing machine (40) from approximately 110-140° F. to at least 150° F. in the wash tank (11) and at least 180° F. in the rinse tank (26). This is accomplished by keeping a relatively constant volume of water in the rinse tank (26) containing the wrap around booster (10), which maintains the rinse tank water at least 180° F. The rinse tank water surrounds the wash tank (11). The warmer water in the rinse tank (26) surrounding the wash tank (11) therefore heats the water contained in the wash tank (11) through convection. Therefore, one heating system does the work of two heating systems.

Abstract: A floating cleaning device that cleans marine growth from float and skirt type oil booms. The cleaning device is a floating platform with ramps at the front and rear with tracks that guide the movement of the oil boom past a series of spray washers supplied with pressurized water to remove the marine growth from the oil boom.

Abstract: A cleaning container and method for using the same for chemically cleaning elongated members including quartz thermocouple sleeves including a first body member and a second body member said first body member and second body member respectively forming a first containing space and a second containing space including a first means for reversibly compressively sealing the first body member and the second body member to a form a combined containing space for sealably holding a cleaning solution level; a cap member disposed at a distal end of the first body member said cap member including a second means for reversibly compressively sealing a first opening in communication with the first containing space; and, a second opening centrally disposed in a distal end of the second containing space said second opening including a third means for reversibly compressively sealing around at least one elongated member penetrating through said second opening.

Abstract: A steam mop. A housing contains a water reservoir for storing water and a heating plate outside the water reservoir. The reservoir dispenses water to the heating element which heats the dispensed water to produce steam substantially instantaneously. The reservoir preferably includes a mechanism for dispensing additional water to the heating element on demand to produce a “burst of steam.” Preferably an absorbent cloth to which is attached a relatively stiff perimeter frame adapted to fit around the bottom of the housing is provided, the cloth assembly being easily removable for cleaning.

Abstract: A system for preventing contaminants and particulates from coming into contact with a back side of a workpiece as the workpiece is vacuum held on a chuck or robotic end effector.

Abstract: A wafer guide for supporting at least one semiconductor wafer during a cleaning process, includes side panels having a plurality of side fixing grooves on an upper surface thereof for stabilizing the at least one semiconductor wafer and for maintaining a sufficient distance between a surface of the at least one semiconductor wafer and an adjacent surface; a center panel having a plurality of center fixing grooves on the upper surface thereof for supporting the at least one semiconductor wafer, each of the plurality of center fixing grooves having inner walls, wherein a contact line is formed on each of the inner walls of the center fixing grooves, and wherein the center panel is positioned between the pair of side panels; and a pair of fixing plates, one of the pair of fixing plates being fixedly attached at each end of the center panel and the pair of side panels.

Abstract: An ultrasonic vibrating apparatus and an ultrasonic cleaning apparatus capable of permitting ultrasonic cleaning of a wafer to be carried out using an existing cleaning tank and while keeping the object immersed in cleaning liquid. An ultrasonic wave is irradiated to a cleaned object while keeping it immersed in cleaning liquid stored in a cleaning tank formed with an upper opening. A vibrating plate is securely mounted thereon with an ultrasonic transducer through a wave transmission element and arranged so as to close the upper opening of the cleaning tank in a cover-like manner. The vibrating plate is so arranged that a vibrating surface thereof downwardly faces and is immersed in the cleaning liquid.

Abstract: A device for rinsing bores (1) including comprising a rinsing head (2) insertable in a bore (1), a delivery channel (3) for delivery rinsing medium (4) to the rinsing head (2) and having at lest one outlet opening (6) in a region of the rinsing head (2), and a return channel (5) for returning the rinsing medium out of the bore (1) and having at least one return opening (7) in the region of the rinsing head (2).

Abstract: A decontamination device (10) includes a washing chamber (12) defined by a series of sidewalls. Upper and lower shelves (30, 32) are horizontally disposed within the washing chamber. The lower shelf is a rigid non-removable structure divided into three washing sections (42, 44, 46). The upper shelf is disposed vertically above the lower shelf and is slidably mounted within the washing chamber. The upper shelf comprises first, second, and third washing sections (82a, 82b, 82c) and a channel (78) operatively connected to the three shelf sections. The channel provides cleaning solutions to the shelf sections. Each of the washing sections and the shelf sections receive a spindle header (50) having a series of spindles (58) over which glassware is placed. A sealing connector, disposed on each washing section and shelf section, registers with and seals around a manifold of the spindle header and provides cleaning solutions from the channel to the spindle header.

Abstract: Provided is a “parts washer” that includes a fluid that performs a cleaning function and maintains the viability of microorganisms in the fluid which biodegrade organic material in contact with a biological component, the parts. “Parts” include objects befouled with organic material and/or particulate matter. The cleaning fluid includes a surfactant that functions to separate organic waste from the parts being washed. A multi-tiered basin houses the cleaning fluid and the biological component living within the fluid that breaks down organic wastes produced by the cleaning fluid. The multi-tiered basin which forms the mechanical component of the washer, includes a sink member with a false bottom, and a support grid and filter to support microorganisms interposed between the false bottom and a bottom panel of the sink member.

Abstract: A washing appliance such as a dishwasher where a top-loading wash chamber is slidable out of cabinet for loading and unloading has a cabinet-mounted chamber lid which is power driven down onto the open top of the wash chamber during the washing cycle. Linear actuators or motors mounted in opposite sides of the appliance cabinet are coupled to opposite sides of the lid to pull the lid down when the chamber has been slid back into the cabinet. In a preferred embodiment rotating dc motors are used to rotate a threaded nut which in turn produces linear motion in a threaded shaft engaged within the nut and connected to the lid.

Abstract: In one embodiment of a liquid processing apparatus, a cleaning unit (CLN) 12 includes a rotary plate 61, supporting members 64a, holding members 64b, a chemical nozzle 51 for supplying a wafer W with a chemical liquid, a spring 120 and a pressing mechanism 121 both of which moves each of the holding members 64b. The pressing mechanism 121 moves the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a and conversely, the wafer W is supported by the supporting members 64a while the wafer W is apart from the holding members 64b. The spring 120 holds the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a. By supplying the wafer W held by the holding members 64b with the cleaning liquid, it is possible to prevent an occurrence of unprocessed portions on the cleaned wafer W, accomplishing a uniform cleaning for the wafer W.

Abstract: A microelectronic substrate handling device comprising first and second support structures spaced from each other, the first support structure having a series of upper teeth defining a series of upper notches extending along a length of the first support structure and a series of lower teeth defining a series of lower notches extending along a length of the first support structure, each of the upper and lower notches opening toward the second support structure, wherein the upper and lower notches are offset from each other by a predetermined offset distance so that an edge of a microelectronic device will fit differently within the upper and lower notches of the first support structure when supported between the first and second support structures.